CN105891609B - A kind of preparation method of thermomechanical formula electromagnetic radiation detector - Google Patents
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Abstract
The invention proposes a kind of thermomechanical formula electromagnetic radiation detector, which is made of Meta Materials wave-absorber, supporting leg and substrate, on a transparent substrate using surface sacrificial process preparation, forms the suspension movable structure of supporting leg support Meta Materials wave-absorber.When carrying out detection imaging, the electromagnetic wave energy being incident on Meta Materials wave-absorber is converted into thermal energy, and supporting leg bends after temperature change；Separately there is a branch of visible light to pass through transparent substrates to be incident on the mirror surface of Meta Materials wave-absorber, the deflection angle for reading Meta Materials wave-absorber changes and distribution, realizes the detection imaging to electromagnetic wave.Electromagnetic radiation detector provided by the invention has sensitivity and high resolution, reliability and uniformity are good, and outstanding advantages of low cost and simple preparation process, it can be used as detector individually to work independently, array can also be arranged into work as image device, flexible design can be carried out according to the wavelength and application request of detected electromagnetic wave.
Description
Technical Field
The invention belongs to the technical field of electromagnetic radiation detection imaging, relates to a design and preparation method of a thermal mechanical electromagnetic radiation detector, and particularly relates to an optical readout electromagnetic radiation detector which is prepared on a transparent substrate and is based on a metamaterial absorber.
Background
The photon type detector has obvious advantages in response time and detection sensitivity, and has wide application in the aspects of high-energy electromagnetic radiation (such as x-ray and α ray) and visible light detection, infrared and terahertz imaging and the like, but as the wavelength of the electromagnetic radiation increases, photon energy is weakened, the detection of the photon type detector in the infrared, terahertz and microwave bands needs huge and high-cost low-temperature equipment to inhibit noise, and as the target wavelength increases, the detection difficulty is larger and larger.
In recent years, metamaterials have come into the sight of researchers as a new type of artificial electromagnetic material. Metamaterial is a general term for artificial composite structures or composite materials with extraordinary physical properties that natural materials do not have, and is a periodic structure formed by combining different units designed from natural materials, and the physical properties of the metamaterial do not depend on the chemical components of the natural materials forming the metamaterial, but depend on the geometric shapes, sizes, directions, arrangement modes and the like of the forming units. When electromagnetic waves are incident on the metamaterial, the artificially designed periodic unit structures interact with the electromagnetic waves just like atoms in natural materials interact with the electromagnetic waves. By careful design, metamaterials can have properties that cannot be achieved by natural materials, and therefore have many special applications, such as perfect wave absorbers, negative refractive indexes, perfect lenses and the like. Since the experimental verification in 2008, the metamaterial wave absorber has been widely researched as an important application of the metamaterial, and the working wave band is gradually expanded to terahertz, infrared and even visible light wave bands from microwave.
The preparation of metamaterials into movable structures and the transformation of the movable structures into devices capable of realizing special functions are important directions for future application of metamaterials, and some movable metamaterial-based 'metamaterials' can realize functions such as modulators, optical switches and the like. At present, a sandwich structure of an upper resonant structure, a middle dielectric layer and a lower reflector surface is generally adopted by a metamaterial wave absorber, selective single-band, multi-band and broadband absorption of the metamaterial wave absorber can be realized by using different resonant structures and dielectric layer materials, however, most researches are only directed at the absorption characteristics of the metamaterial wave absorber, and the metamaterial wave absorber is rarely applied to functional devices.
For complex dielectric constant of epsilonrComplex permeability of murOf complex refractive index ofWhen an electromagnetic wave is incident on the surface of the electromagnetic medium at an incident angle θ, the reflectivity (square of the reflection coefficient mode) of the electromagnetic wave can be obtained by the following formula, corresponding to the polarization of the transverse electric mode (TE) and the transverse magnetic mode (TM):
in the case of normal incidence, the above equation can be simplified as:
wherein,is the wave impedance of the medium, andis the free-space wave impedance. For the metamaterial wave absorber, because a sandwich structure of an upper layer resonance structure, a middle medium layer and a lower layer reflector is adopted, when electromagnetic waves enter, transmitted waves are blocked by a continuous reflector, so that the absorption rate can be expressed as:
the dielectric constant epsilon of the metamaterial wave absorber top layer resonant structure can be adjusted by adjusting the size, the period, the geometric shape and the like of the metamaterial wave absorber top layer resonant structurer(ω); the magnetic permeability mu can be adjusted by adjusting the thickness and electromagnetic property of the middle dielectric layer and changing the coupling between the dielectric layer and the top resonant structurer(ω). Therefore, under the proper design, the wave impedance of the metamaterial wave absorber can be enabled at a specific frequencyAnd free space wave impedance Z0Equal, impedance matching is achieved, and 100% absorption can be achieved.
Disclosure of Invention
The invention provides a thermal mechanical electromagnetic radiation detector based on a metamaterial wave absorber, aiming at the defects of the existing electromagnetic radiation detection imaging technology, wherein the electromagnetic radiation detector consists of the metamaterial wave absorber, supporting legs and a substrate, the metamaterial wave absorber is prepared on the transparent substrate through a micro-nano processing method, and the metamaterial wave absorber is fixed on the substrate through the supporting legs to form a suspended movable structure. The metamaterial wave absorber is a sandwich structure consisting of an upper periodic resonant structure, a middle medium layer and a lower reflector surface, and the size and the shape of the resonant structure and the thickness of the medium layer can be adjusted according to different target wavelengths. The electromagnetic radiation detector works in a non-refrigeration environment, can work as a detector independently, and can also work as an imaging device by arranging a plurality of detectors into a one-dimensional or two-dimensional array, so that the imaging of electromagnetic waves with specific wavelengths is realized, and particularly the detection imaging in infrared and terahertz wave bands is realized.
When detection imaging is carried out, the upper periodic resonant structure of the metamaterial wave absorber faces to an object to be detected or an electromagnetic wave source, and another beam of visible light penetrates through the transparent substrate and is incident on the reflecting mirror surface of the metamaterial wave absorber in a collimation mode. When the energy of the incident electromagnetic wave is focused on the metamaterial wave absorber, the metamaterial wave absorber absorbs the energy of the electromagnetic wave and converts the energy into heat; because one part of the supporting leg for supporting the metamaterial wave absorber is made of two materials with greatly different thermal expansion coefficients, the supporting leg is bent due to temperature change to drive the metamaterial wave absorber to deflect, visible light penetrates through the transparent substrate and is aligned to the reflecting mirror surface of the metamaterial wave absorber, the reflecting mirror surface reflects incident visible light, the optical detection system reads out the deflection angle change of the metamaterial wave absorber or the deflection distribution of the metamaterial wave absorber in the detector array, and finally, the detection or imaging of electromagnetic waves is realized through the data processing module.
In order to achieve the purpose, the invention adopts the following technical scheme:
a thermomechanical electromagnetic radiation detector is composed of a metamaterial wave absorber, supporting legs and a substrate, wherein the metamaterial wave absorber is a structure for absorbing incident electromagnetic waves, is fixedly supported on the substrate through anchor points under the support of the supporting legs to form a suspended movable structure, and can deflect on a plane perpendicular to the substrate.
The metamaterial wave absorber is of a sandwich structure consisting of a resonance structure positioned at the top layer, a middle medium layer and a reflector positioned at the bottom layer. The resonant structure and the middle medium layer on the top layer can be repeatedly overlapped with each other to realize broadband absorption or multi-band absorption. The resonant structure is a periodically arranged sub-wavelength structure, and can realize resonant coupling of the metamaterial wave absorber and an incident electromagnetic wave electric field. The shape, size, arrangement mode, period and the like of the sub-wavelength metal structure are determined by the wavelength of the detected electromagnetic wave, and the shape of the resonance structure comprises a square block type, a square-shaped structure, a split ring type structure, a cross-shaped structure, an H-shaped structure, a double-split ring type structure, a yarrow cold cross type structure and the like; different resonant structures can form a multi-band or broadband metamaterial wave absorber in a mutual nesting, combination, superposition and other modes; the material for preparing the resonant structure can be a metal film, such as gold, aluminum, copper and the like, or a doped semiconductor film material such as silicon or germanium and the like, or a metal silicide, such as cobalt silicide, titanium silicide or tungsten silicide and the like, or a metal oxide, such as vanadium oxide and the like, or a metal nitride, such as titanium nitride and the like, or other high-conductivity materials, such as graphene, carbon nanotubes and other film materials.
The dielectric layer can be a silicon-based dielectric material, such as silicon nitride or silicon oxide, or a polymer, such as Polyimide (Polyimide) and Parylene-C (Parylene-C); the thickness of the metamaterial wave absorber can be adjusted based on the dielectric constant of the metamaterial and the geometric shape and size of the top layer resonance structure, so that the equivalent dielectric constant and equivalent magnetic conductivity of the metamaterial wave absorber are adjusted to be matched with the impedance of a free space, and the purpose of improving the absorption efficiency of incident electromagnetic waves is achieved.
The reflecting mirror surface is a metal or metal compound film with good reflection effect on incident electromagnetic waves, and the thickness of the reflecting mirror surface is larger than the skin depth of the electromagnetic waves, so that the transmission of the incident electromagnetic waves is eliminated. Incident electromagnetic waves are coupled between the top layer resonance structure and the bottom layer reflector surface through the middle medium layer, so that resonance coupling of the metamaterial wave absorber and the incident electromagnetic wave magnetic field is realized. In addition, the mirror surface must also have good reflection efficiency for visible light to achieve optical read-out operation.
The supporting legs are structures for supporting the metamaterial wave absorber and can enable the metamaterial wave absorber to deflect on a plane vertical to the substrate; the legs comprise deformation legs and thermal isolation legs; the deformation supporting leg is composed of two materials with the thermal expansion coefficient difference as large as possible, wherein one layer of the materials is a material with a high thermal expansion coefficient, such as metal, polymer and the like, and the other layer of the materials is a semiconductor medium material with smaller thermal conductivity and thermal expansion coefficient, such as silicon nitride, silicon oxide and the like; after the metamaterial wave absorber absorbs electromagnetic radiation energy, the electromagnetic radiation energy is converted into heat to be transmitted to the deformation supporting leg, and the supporting leg is deformed by the double-material effect; the thickness ratio and the length of the two materials on the deformation supporting leg can be adjusted to obtain the deformation amount as large as possible; the thermal isolation leg only comprises a semiconductor medium material with smaller thermal conductivity, the semiconductor medium material can be consistent with a material with smaller thermal conductivity and thermal expansion coefficient, and the thickness and the length of the thermal isolation leg can be adjusted to obtain the maximum thermal insulation efficiency; the semiconductor dielectric material of the supporting leg can be the same as the middle dielectric layer material of the metamaterial wave absorber and is prepared in the same preparation step; one end of the deformation supporting leg is connected with the metamaterial wave absorber, the other end of the deformation supporting leg is connected with the thermal isolation supporting leg, one end of the thermal isolation supporting leg is connected with the deformation supporting leg, and the other end of the thermal isolation supporting leg is fixedly supported on the substrate; the number and arrangement mode of the deformation supporting legs and the thermal isolation supporting legs can be various, and the deformation supporting legs and the thermal isolation supporting legs can be linear, broken lines, double broken lines, multi-broken lines and the like.
The substrate supporting the electromagnetic radiation detector is a wafer of material having a high transmission of visible light, such as glass, quartz, polymers, and the like. When the electromagnetic radiation detector works, reading visible light is collimated by the transparent substrate surface and is incident on the reflecting mirror surface of the metamaterial wave absorber, target electromagnetic radiation is focused on the resonant structure on the top layer of the metamaterial wave absorber through the lens, the metamaterial wave absorber converts electromagnetic wave energy into heat, the supporting legs deform to drive the metamaterial wave absorber to deflect, the optical reading system reads the deflection quantity of the metamaterial wave absorber or the deflection distribution of the metamaterial wave absorber in the detector array, and finally, the incident electromagnetic wave is detected or imaged through the data image processing module. The design can enable electromagnetic waves to be directly incident on the metamaterial wave absorber, avoids energy loss of the electromagnetic waves, improves the absorption efficiency of the detector on the incident electromagnetic waves, and is particularly suitable for uncooled imaging of infrared and terahertz wave bands.
The electromagnetic radiation detector can be prepared on a transparent substrate by using any surface sacrificial layer process; the sacrificial layer material comprises a semiconductor dielectric material or a polymer material, such as silicon dioxide, polyimide and the like; the sacrificial layer material is prepared on the transparent substrate in a spin coating or deposition mode, and after anchor points are prepared and formed on the sacrificial layer, the metamaterial wave absorber and the support legs are prepared; and finally, carrying out dry etching or wet etching technology to remove the sacrificial layer, so that the metamaterial wave absorber is suspended under the support of the support leg and is fixedly supported on the transparent substrate through the anchor point.
A method of fabricating the electromagnetic radiation detector on a glass substrate using polyimide as a sacrificial layer, comprising the steps of:
1) spin-coating polyimide on the transparent glass substrate and curing to form a sacrificial layer;
2) depositing a thin metal layer as a reflecting mirror surface material;
3) etching the mirror metal layer by using photoresist as a mask, etching the polyimide sacrificial layer by using oxygen plasma by using the photoresist and the mirror metal layer as the mask to form an anchor point;
4) performing secondary photoetching and corroding the mirror surface metal layer by taking the photoresist as a mask to form a reflecting mirror surface on the lower layer of the metamaterial wave absorber;
5) depositing low-stress silicon nitride, wherein the layer of material is used for preparing a first layer structure of the deformation supporting leg, a thermal isolation supporting leg and an intermediate medium layer of the metamaterial wave absorber;
6) depositing another layer of metal as another layer of material of the deformation support leg, wherein the thickness ratio of the another layer of metal to the thickness of the silicon nitride meets the requirement that the deformation support leg is subjected to thermal expansion mismatch to generate as large as possible deformation;
7) performing third photoetching and corroding the metal in the step 6 by taking the photoresist as a mask to form another layer of structure on the deformation supporting leg;
8) after the fourth photoetching, depositing a third layer of thin metal, and forming a resonance structure of an upper layer in the metamaterial wave absorber by adopting a stripping process;
9) photoetching and etching silicon nitride for the fifth time to form a dielectric layer of the metamaterial wave absorber, a first layer structure of the deformation supporting leg and the thermal isolation supporting leg;
10) and etching the polyimide sacrificial layer by using oxygen plasma, and releasing the metamaterial wave absorber to form the suspended electromagnetic radiation detector.
In summary, the invention provides a thermomechanical electromagnetic radiation detector based on a metamaterial absorber and a preparation method thereof, and the thermomechanical electromagnetic radiation detector has the following advantages:
1) the electromagnetic radiation detector provided by the invention adopts the metamaterial wave absorber as an absorption material of incident electromagnetic waves, so that the defects of insufficient absorptivity of natural materials and non-adjustable absorption characteristics are overcome, the metamaterial wave absorber has nearly perfect absorption characteristics at specific wavelengths, and the sensitivity of devices can be greatly improved; in addition, the metamaterial wave absorber has the advantage of flexible design, the structure and the size of the metamaterial wave absorber can be adjusted according to the detection requirements of electromagnetic waves of different wave bands, selective detection or broadband detection can be realized according to actual requirements, and the application range of a device is enlarged;
2) according to the method for preparing the electromagnetic radiation detector on the transparent substrate, read-out visible light is made to be incident on the bottom layer reflecting mirror surface from the substrate surface, so that electromagnetic waves to be detected are directly incident on the upper layer resonance structure of the metamaterial wave absorber, the loss of the substrate to electromagnetic wave energy can be avoided, the absorption efficiency of the electromagnetic wave energy is greatly improved, and the sensitivity of the detector is improved;
3) compared with the focal plane array prepared by a bulk silicon process, the focal plane array prepared by the sacrificial layer process has the advantages that the uniformity and the reliability are obviously improved, the preparation process is simple, and the cost is lower;
4) the polyimide sacrificial layer process provided by the invention is a low-temperature and low-cost preparation process, and is suitable for substrate materials which cannot resist high temperature, such as glass and the like. Meanwhile, the oxygen plasma dry etching is adopted to etch the polyimide release suspension structure, so that the problem of suspension structure failure caused by wet etching release is avoided;
5) the electromagnetic radiation detector provided by the invention adopts an optical reading mode, and an optical reading system can integrally process the output signal information of the detector, so that the electromagnetic radiation detector provided by the invention can be used as a detector to work independently, and can also be arranged into a one-dimensional or two-dimensional array to work as an imaging device, the information processing amount is not increased basically when the number of the detectors in the array is increased, and compared with an electrical reading mode, the preparation process of the optical reading type focal plane array is simple, the scale of the array is easy to increase, and the spatial resolution of the detector is improved.
Drawings
Fig. 1A is a schematic perspective view of an electromagnetic radiation detector according to the present invention, and fig. 1B is a schematic perspective view of a two-dimensional array of the electromagnetic radiation detector according to the present invention;
fig. 2A is a schematic top view of a metamaterial wave absorber, and fig. 2B is a schematic cross-sectional structure of the metamaterial wave absorber;
FIGS. 3A-3H are schematic diagrams of the top layer resonant structure geometry of several other metamaterial absorber, and FIG. 3I is a schematic cross-sectional diagram of a metamaterial absorber with multiple layer resonant structures;
fig. 4A is a schematic top view of the electromagnetic radiation detector of the present invention, and fig. 4B is a schematic side view of the electromagnetic radiation detector of the present invention and its operation principle;
FIG. 5 is a flow chart of the manufacturing process of the electromagnetic radiation detector according to the present invention and a photograph of the manufactured detector and array electron microscope;
like reference symbols in the various drawings indicate like elements.
Wherein:
101-a metamaterial absorber; 102-a leg; 103-a substrate; 201-a resonant structure; 202-a dielectric layer; 203-mirror face; 401-deformation legs; 402-thermal isolation legs; 501-sacrificial layer.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the structure and method of the present invention will be described in detail with reference to the accompanying drawings.
A thermomechanical electromagnetic radiation detector based on a metamaterial wave absorber is disclosed, as shown in FIG. 1A, and comprises a metamaterial wave absorber (101), two legs (102) supporting the metamaterial wave absorber and a substrate (103); the metamaterial wave absorber (101) is suspended and fixedly supported on the transparent substrate (103) under the support of the support legs (102), and can deflect on a plane vertical to the substrate; the electromagnetic radiation detectors may work independently as a single detector, or may be arranged in a one-dimensional or two-dimensional array to work as an imaging device, and fig. 1B is a schematic view of a three-dimensional structure of the two-dimensional array formed by the electromagnetic radiation detectors.
The metamaterial wave absorber (101) is shown in fig. 2A in a plan view and is of a two-dimensional periodic structure; as shown in the cross-sectional view of fig. 2B, the metamaterial wave absorber (101) is a sandwich structure composed of a resonant structure (201) located at the top layer, an intermediate dielectric layer (202) and a reflective mirror surface (203) located at the bottom layer.
The resonant structure (201) is a periodically arranged sub-wavelength structure, and can realize resonant coupling of the metamaterial wave absorber and an incident electromagnetic wave electric field. The shape, size, arrangement mode, period and the like of the sub-wavelength metal structure are determined by the wavelength of the detected electromagnetic wave; the material for preparing the resonant structure may be metal, such as gold, aluminum, copper, or the like, or semiconductor material such as doped silicon or germanium, or metal silicide, such as cobalt silicide, titanium silicide, or tungsten silicide, or metal oxide, such as vanadium oxide, or the like, or metal nitride, such as titanium nitride, or other high conductivity material, such as graphene, carbon nanotube, or the like. In addition to the square-shaped resonant structure shown in fig. 2, other resonant structures are shown in fig. 3, including "square" (fig. 3A), split ring (fig. 3B), "cross" (fig. 3C), "H" (fig. 3D), double split ring (fig. 3E), and "yersinia cross" (fig. 3F). Moreover, the resonant structures can form multi-band or broadband absorption in a mutual nesting, combination, superposition and other modes; fig. 3G shows a dual-band absorption resonant structure formed by nesting a square-shaped resonant structure and a cross-shaped resonant structure, and fig. 3H shows a broadband absorption resonant structure implemented by multiplexing a plurality of square-shaped resonant structures of different sizes in one periodic unit. The resonant structure (201) and the middle dielectric layer (202) on the top layer in the metamaterial wave absorber (101) can be repeatedly overlapped with each other to realize broadband absorption or multi-band absorption, and as shown in fig. 3I, a cross-sectional view of a three-band or broadband metamaterial wave absorber structure formed by overlapping three resonant structures and dielectric layers with different sizes is shown.
The dielectric layer (202) can be a silicon-based dielectric material, such as silicon nitride or silicon oxide, or a polymer, such as Polyimide (Polyimide) and Parylene-C (Parylene-C); the thickness of the dielectric layer (201) can be adjusted based on the dielectric constant of the material and the geometric shape and size of the top layer resonance structure (201), so that the equivalent dielectric constant and equivalent magnetic conductivity of the metamaterial wave absorber are adjusted to be matched with the impedance of a free space, and the purpose of improving the absorption efficiency of incident electromagnetic waves is achieved.
The reflecting mirror surface (203) is a metal or metal compound thin film having a good reflecting effect on incident electromagnetic waves, and the thickness of the reflecting mirror surface is larger than the skin depth of the electromagnetic waves, so that the transmission of the incident electromagnetic waves is eliminated. In addition, the mirror surface (203) must also have good reflection efficiency for visible light to achieve optical read-out operation. Incident electromagnetic waves are coupled between the top layer resonance structure (201) and the bottom layer reflection mirror surface (203) through the middle medium layer (202), and therefore resonant coupling of the metamaterial wave absorber and the magnetic field of the incident electromagnetic waves is achieved.
As shown in the top view of FIG. 4A and the side view of FIG. 4B, the leg (102) is a structure for supporting the metamaterial absorber, and comprises two sections, namely a deformation leg (401) and a thermal isolation leg (402). The deformation supporting leg (401) is composed of two materials with the difference of the thermal expansion coefficients as large as possible, one layer of the material is a material with a high thermal expansion coefficient, such as metal, polymer and the like, and the other layer of the material is a semiconductor medium material with smaller thermal conductivity and thermal expansion coefficient, such as silicon nitride, silicon oxide and the like; the thickness ratio of the two materials and the length of the deformation leg (401) can be adjusted to obtain as large an amount of deformation as possible. The thermal isolation leg (402) only comprises a semiconductor medium material with small thermal conductivity, the semiconductor medium material can be consistent with one layer of material of the deformation leg (401), and the thickness and the length of the thermal isolation leg (402) can be adjusted to obtain the maximum thermal insulation efficiency. The semiconductor medium material can be the same as the material of the middle medium layer (202) of the metamaterial wave absorber (101) and is prepared in the same preparation step. One end of the deformation supporting leg (401) is connected to the metamaterial wave absorbing body (101), and the other end of the deformation supporting leg is connected to the thermal isolation supporting leg (402); one end of the thermal isolation leg (402) is connected to the deformation leg (401), and the other end of the thermal isolation leg is fixedly supported on the substrate (103) through an anchor point. The number and arrangement mode of the deformation supporting legs (401) and the thermal isolation supporting legs (402) can be various, including a straight line type, a broken line type, a double broken line type, a multi-broken line type and the like.
The substrate (103) supporting the electromagnetic radiation detector is a wafer of material having a high transmission of visible light, such as glass, quartz, polymer, etc. When the electromagnetic radiation detector works, reading visible light is collimated and incident on a reflecting mirror surface (203) of a metamaterial wave absorber (101) through a transparent substrate (103), target electromagnetic radiation is focused on a top-layer resonant structure (201) of the metamaterial wave absorber (101) through a lens, the metamaterial wave absorber converts electromagnetic wave energy into heat, supporting legs deform to drive the metamaterial wave absorber to deflect, an optical reading system reads the deflection quantity of the metamaterial wave absorber or the deflection distribution of the metamaterial wave absorber in a detector array, and finally detection or imaging of electromagnetic waves is achieved through a data processing module. As shown in FIG. 4B, the design can enable electromagnetic waves to be directly incident on the metamaterial wave absorber, so that the energy loss of the electromagnetic waves is avoided, the absorption efficiency of the detector on the incident electromagnetic waves is improved, and the method is particularly suitable for uncooled imaging of infrared and terahertz wave bands.
The electromagnetic radiation detector can be prepared on a transparent substrate (103) by using any surface sacrificial layer process. The sacrificial layer material (501) comprises a semiconductor dielectric material and a polymer material, such as silicon dioxide, polyimide and the like; the sacrificial layer material is prepared on the transparent substrate (103) in a spin coating or deposition mode, and after anchor points are prepared and formed on the sacrificial layer, the metamaterial wave-absorbing body (101) and the support legs (102) are prepared; and finally, carrying out dry etching or wet etching technology, removing the sacrificial layer (501) and releasing the electromagnetic radiation detector.
A method for preparing the electromagnetic radiation detector on a glass substrate by using polyimide as a sacrificial layer, wherein the process flow chart is shown in fig. 5, and the method comprises the following steps:
1) spin-coating polyimide on a transparent glass substrate, and curing at a certain temperature to form a sacrificial layer (501) with a thickness of 1-10 μm, wherein the cross-sectional view of the structure is as shown in FIG. 5A;
2) depositing a thin layer of metal gold/chromium, wherein the thickness of gold is 20-200 nm to ensure good flatness and reflectivity of the reflector surface, and chromium is an adhesion layer between gold and a dielectric layer and is 5-30 nm;
3) performing first photoetching, corroding chromium/gold by taking the photoresist as a mask, etching the polyimide sacrificial layer by using oxygen plasma by taking the photoresist and the chromium/gold as the mask, and forming an anchor point, wherein the structural cross-sectional view is shown as a figure 5B;
4) performing secondary photoetching and corroding chromium/gold by taking the photoresist as a mask to form a reflecting mirror surface at the lower layer of the metamaterial wave absorber, wherein the structural section view is shown as a figure 5C;
5) depositing low-stress silicon nitride with the thickness of 0.2-2 microns, wherein the layer of material is used for preparing a middle dielectric layer of the metamaterial wave absorber, a layer of the deformation supporting leg and the thermal isolation supporting leg, the thickness of the material is required to meet the performance requirements of the deformation supporting leg, the thermal isolation supporting leg and the metamaterial wave absorber, and the structural section is shown in fig. 5D;
6) depositing metal aluminum as another layer of material of the deformation supporting leg, wherein the thickness of the deposited metal aluminum is 0.1-1.5 mu m, and the thickness ratio of the aluminum to the silicon nitride meets the requirement that the deformation of the deformation supporting leg is as large as possible due to thermal expansion mismatch;
7) performing third photoetching and etching aluminum by using the photoresist as a mask to form a layer of structure of the deformation support leg, wherein the structural section is shown as figure 5E;
8) after the fourth photoetching, depositing metal chromium/gold, wherein the thickness of gold is 20-200 nm, the thickness of chromium is 5-30 nm, chromium is an adhesion layer between the gold and the dielectric layer, and a stripping process is adopted to form a resonance structure of an upper layer in the metamaterial wave absorber, and the structural section view is shown in fig. 5F;
9) performing fifth photoetching, and etching silicon nitride by using the photoresist and the aluminum as masks to form a dielectric layer of the metamaterial wave absorber, another layer of structure of the deformation supporting leg and the thermal isolation supporting leg, wherein the structural section is shown as fig. 5G;
10) and (3) isotropically etching the polyimide sacrificial layer by using oxygen plasma, releasing the metamaterial absorber, and forming a suspended electromagnetic radiation detector, wherein the structural section view is shown in fig. 5H.
The electron microscope photographs of the electromagnetic radiation detector and the detector array prepared by the above process are shown in fig. 5I and 5J, respectively.
Claims (3)
1. A method for manufacturing a thermomechanical electromagnetic radiation detector is characterized in that: the electromagnetic radiation detector comprises a metamaterial wave absorber, supporting legs and a substrate, wherein the metamaterial wave absorber is of a structure for absorbing electromagnetic radiation and is of a sandwich structure consisting of a resonant structure positioned on the top layer, a medium layer in the middle and a reflecting mirror surface on the bottom layer; one end of the supporting leg is connected to the metamaterial wave absorber, and the other end of the supporting leg is fixedly supported on the substrate, so that the metamaterial wave absorber forms a suspended movable structure; the support legs comprise deformation support legs and thermal isolation support legs; the deformation supporting leg is composed of two materials with different thermal expansion coefficients, wherein one layer of the material is a metal aluminum material with a high thermal expansion coefficient, and the other layer of the material is a silicon nitride semiconductor medium material with low thermal conductivity and a thermal expansion coefficient; the electromagnetic radiation detector works in a non-refrigeration environment, a single detector works independently, or a plurality of detectors are arranged into a one-dimensional or two-dimensional array to serve as an imaging device, so that detection imaging of electromagnetic waves with specific wavelengths is realized; the electromagnetic radiation detector is prepared on a transparent substrate by using a surface sacrificial layer technology process, and comprises the following steps:
(1) spin-coating polyimide on the transparent glass substrate and curing to form a sacrificial layer;
(2) depositing a thin layer of metallic gold/chromium as the bottom mirror layer, wherein chromium is an adhesion layer between the gold and the dielectric layer;
(3) etching the polyimide sacrificial layer by using oxygen plasma dry method by using photoresist as a mask to corrode the chromium/gold for the first time, and then using the photoresist and the chromium/gold together as the mask to form anchor points;
(4) etching the chromium/gold by taking the photoresist as a mask to form a reflecting mirror surface at the lower layer of the metamaterial absorber;
(5) depositing low-stress silicon nitride with a certain thickness, wherein the material of the layer is used as a medium layer in the middle of the metamaterial wave absorber, a material with low thermal conductivity and thermal expansion coefficient in the deformable support leg and a material of the thermal isolation support leg;
(6) depositing metal aluminum as a material layer with high thermal expansion coefficient in the deformation support leg;
(7) etching aluminum by taking the photoresist as a mask to form a layer of structure of the deformation support leg;
(8) depositing metal chromium/gold after the fourth photoetching, wherein the chromium is an adhesion layer between the gold and the dielectric layer, and forming a resonance structure on the top layer of the metamaterial wave absorber by adopting a stripping process;
(9) etching silicon nitride by using the photoresist and the aluminum as a mask to form a medium layer in the middle of the metamaterial wave absorber, another layer of structure of the deformation supporting leg and the thermal isolation supporting leg;
(10) and (3) isotropically etching the polyimide sacrificial layer by using oxygen plasma to form a suspended metamaterial wave absorber, and preparing the electromagnetic radiation detector.
2. The method of claim 1, wherein: the shape, size, arrangement mode and period of the resonance structure are determined by the wavelength of the detected electromagnetic wave, wherein the shape of the resonance structure comprises a square block type, a square opening type, a split ring type, a cross type, an H type, a double split ring type and a Jelu scattering cold cross type; the resonant structures form a multi-band or broadband metamaterial wave absorber in a mutual nesting, combination and superposition mode.
3. The method of claim 1, wherein: the thickness of the reflector is larger than the skin depth of incident electromagnetic waves.
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