CN105870154B - A kind of array substrate and preparation method thereof, OLED display - Google Patents
A kind of array substrate and preparation method thereof, OLED display Download PDFInfo
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- CN105870154B CN105870154B CN201610279538.XA CN201610279538A CN105870154B CN 105870154 B CN105870154 B CN 105870154B CN 201610279538 A CN201610279538 A CN 201610279538A CN 105870154 B CN105870154 B CN 105870154B
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/81—Anodes
- H10K50/813—Anodes characterised by their shape
Abstract
The embodiment of the present invention provides a kind of array substrate and preparation method thereof, OLED display, is related to field of display technology, the light extraction efficiency of display device can be improved.The array substrate includes anode, organic material functional layer, cathode and the pixel defining layer of setting on substrate, the anode extends in the pixel defining layer, and the part that the anode extends in the pixel defining layer includes inclined surface, the angle of the inclined surface and the substrate is less than 90 °；The light of inclined surface described in the directive that the inclined surface is used to issue the organic material functional layer reflects.For improving display device light extraction efficiency.
Description
Technical field
The present invention relates to field of display technology more particularly to a kind of array substrate and preparation method thereof, OLED display.
Background technique
Currently, OLED (Organic Light Emitting Diode, Organic Light Emitting Diode) display device is due to tool
Have self-luminous, wide viewing angle, fast response time, can softening the features such as and receive significant attention.
Existing OLED display, as shown in Figure 1, including anode 10, organic material functional layer 20 and cathode 30, difference
It is separated between sub-pixel by pixel defining layer 40.However, since what is issued from organic material functional layer 20 is parallel to organic material
The light (as shown by the arrows in Figure 1) of material functional layer 20 can not be emitted from display device, thus reduce going out for OLED display
Light efficiency.
Summary of the invention
The embodiment of the present invention provides a kind of array substrate and preparation method thereof, OLED display, and display can be improved
The light extraction efficiency of device.
In order to achieve the above objectives, the embodiment of the present invention adopts the following technical scheme that
In a first aspect, providing, a kind of array is basic, including anode on substrate, organic material functional layer, cathode is arranged
And pixel defining layer, which is characterized in that the anode extends in the pixel defining layer, and the anode extend to it is described
Part in pixel defining layer includes inclined surface, and the angle of the inclined surface and the substrate is less than 90 °；The inclined surface is used for
The light of inclined surface described in the directive issued to the organic material functional layer reflects.
Preferably, the anode include set gradually the first transparency conducting layer over the substrate, metallic reflector and
Second transparency conducting layer.
It is further preferred that first transparency conducting layer is arranged close to the substrate, the metallic reflector and described
Second transparency conducting layer extends in the pixel defining layer.
It is further preferred that the material of the metallic reflector is Ag；First transparency conducting layer and described second is thoroughly
The material of bright conductive layer is ITO.
Preferably, the substrate is flexible substrate.
Preferably, above-mentioned array substrate further includes thin film transistor (TFT), the drain electrode of the thin film transistor (TFT) and anode electricity
Connection.
Second aspect provides a kind of OLED display, further includes encapsulated layer including above-mentioned array substrate.
The third aspect provides a kind of preparation method of array substrate, comprising: forms pixel defining layer, the pixel defines
Layer defines sublayer including the first pixel of stacking and the second pixel defines sublayer；Anode is formed, the anode extends to described the
One pixel defines sublayer and second pixel defines between sublayer, and the anode extends to the portion in the pixel defining layer
Dividing includes inclined surface, and the angle of the inclined surface and the substrate is less than 90 °；The inclined surface is used for organic material functional layer
The light of inclined surface described in the directive of sending is reflected；Form organic material function layer and cathode.
Preferably, the anode include sequentially form the first transparency conducting layer over the substrate, metallic reflector and
Second transparency conducting layer.
It is further preferred that the method specifically includes: by a patterning processes, forming described over the substrate
One transparency conducting layer；First pixel, which is formed, by a patterning processes defines sublayer；Position is formed by a patterning processes
The metallic reflector and second transparency conducting layer above first transparency conducting layer, the metallic reflector and
Second transparency conducting layer also extends into first pixel and defines above sublayer；Described is formed by a patterning processes
Two pixels define sublayer；The organic material functional layer is formed by evaporation process；Cathode is formed by evaporation process.
The embodiment of the present invention provides a kind of array substrate and preparation method thereof, OLED display, due in array substrate
The anode part that extends in pixel defining layer, and extend in pixel defining layer include inclined surface, in this way from organic material
Functional layer issue light, after being mapped to inclined surface, so that it may the face of being inclined by reflects away, compared with the existing technology in, by anode
Flat structures are made into, and the light for being parallel to organic material functional layer issued from organic material functional layer can not be emitted, this
Inclined surface in inventive embodiments can make the light issued from organic material functional layer that can be reflected after being mapped to inclined surface
It goes out, thus when the array substrate is applied to display device, the light extraction efficiency of display device can be improved.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments of invention for those of ordinary skill in the art without creative efforts, can be with
It obtains other drawings based on these drawings.
Fig. 1 is a kind of structural schematic diagram for array substrate that the prior art provides；
Fig. 2 is a kind of structural schematic diagram one of array substrate provided in an embodiment of the present invention；
Fig. 3 (a) is a kind of structural schematic diagram two of array substrate provided in an embodiment of the present invention；
Fig. 3 (b) is a kind of structural schematic diagram three of array substrate provided in an embodiment of the present invention；
Fig. 4 is a kind of structural schematic diagram four of array substrate provided in an embodiment of the present invention；
Fig. 5 is a kind of structural schematic diagram of display device provided in an embodiment of the present invention；
Fig. 6 is a kind of flowage structure schematic diagram of the preparation method of array substrate provided in an embodiment of the present invention；
Fig. 7 is a kind of flowage structure schematic diagram of the specific preparation method of array substrate provided in an embodiment of the present invention.
Appended drawing reference:
10- anode；The first transparency conducting layer of 101-；102- metallic reflector；The second transparency conducting layer of 103-；20- is organic
Material function layer；201- electron transfer layer；202- luminescent layer；203- hole transmission layer；204- electron injecting layer；The hole 205- note
Enter layer；30- cathode；40- pixel defining layer；The first pixel of 401- defines sublayer；The second pixel of 402- defines sublayer；50- substrate；
60- thin film transistor (TFT)；601- drain electrode；602- source electrode；603- active layer；604- gate insulation layer；605- grid；70- encapsulated layer.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
The embodiment of the present invention provides a kind of array substrate, and as shown in Fig. 2, Fig. 3 (a), Fig. 3 (b) and Fig. 4, including setting exists
Anode 10, organic material functional layer 20, cathode 30 and pixel defining layer 40 on substrate 50；Anode 10 extends to pixel and defines
In layer 40, and the part that anode 10 extends in pixel defining layer 40 includes inclined surface, and the inclined surface and the angle theta of substrate 50 are small
In 90 °；Wherein, the light for the directive inclined surface that the inclined surface is used to issue organic material functional layer 20 is reflected (such as Fig. 2
Shown in middle arrow).
It should be noted that first, in the embodiment of the present invention, anode 10 is opaque, 30 light transmission of cathode.It is not right based on this
The material of anode 10 and cathode 30 is defined.
Second, as shown in Fig. 3 (a), Fig. 3 (b) and Fig. 4, organic material functional layer 20 may include 201 He of electron transfer layer
Certainly electronics can also be set as needed as shown in Fig. 3 (a) in hole transmission layer 203 and luminescent layer 202 between the two
Implanted layer 204 and hole injection layer 205.
Wherein, electron transfer layer 201 should have certain electronics transport capacity and good film forming and stability, and electronics passes
The material of defeated layer 201 can be metallo-chelate, azole compounds, phenodiazine phenanthrene derivative etc., such as can be with are as follows: AlQ3 (three (8-
Oxyquinoline) aluminium), BPhen (4,7- diphenyl -1,10- phenanthrolene), TmPyPB ([(3- pyridyl group) -3- of 1,3,5- tri-
Phenyl] benzene), OXD-7 (2,2'- (1,3- phenyl) two [5- (4- tert-butyl-phenyl) -1,3,4- oxadiazoles]).
The thermal stability of 203 Ying Yougao of hole transmission layer, and small potential barrier is formed with anode 10, hole transmission layer 203
Material can link diamines biphenyl for triaromatic amine class series, benzidine derivative, intersection construction.Such as can for NPB (N,
N'- diphenyl-N, N'- (1- naphthalene) -1,1'- biphenyl -4,4'- diamines), TCTA (4,4 ', 4 "-Tri (9-carbazoyl)
Triphenylamine, 4,4', 4 "-three (carbazole -9- base) triphenylamines), m-MTDATA (4,4', 4 "-Tris (N-3-
Methylphenyl-N-phenylamino) triphenylamine, 4,4', 4 "-three (N-3- methylphenyl-N-phenyl amino)
Triphenylamine) etc..
Third, for inclined surface and substrate 50 angle theta without limiting, specifically can with visual angle according to display device into
Row setting, inclined surface and the angle theta of substrate 50 are smaller, and the visual angle of display device is bigger, and inclined surface and the angle theta of substrate 50 are got over
Greatly, the visual angle of display device is smaller.Preferably, the angle theta of inclined surface and substrate 50 is 30 ° or so.
4th, it for the material of pixel confining layer 40, such as can be organic photosensitive material.It is arranged in the embodiment of the present invention
Pixel confining layer 40 is to avoid the occurrence of mixed color phenomenon to keep apart different sub-pixels.
The embodiment of the present invention provides a kind of array substrate, since the anode 10 in array substrate extends to pixel defining layer 40
It is interior, and the part extended in pixel defining layer 40 includes inclined surface, the light issued in this way from organic material functional layer 20 is being penetrated
To after inclined surface, so that it may the face of being inclined by reflects away, compared with the existing technology in, anode 10 is made into flat structures, and is made
Obtaining can not be emitted from the light for being parallel to organic material functional layer 20 that organic material functional layer 20 issues, in the embodiment of the present invention
Inclined surface can make the light issued from organic material functional layer 20 that can be reflected after being mapped to inclined surface, thus working as should
When array substrate is applied to display device, the light extraction efficiency of display device can be improved.
Preferably, anode 10 includes the first transparency conducting layer 101, the metallic reflector 102 being successively set on substrate 50
With the second transparency conducting layer 103.
It, can when anode 10 is the first transparency conducting layer 101, metallic reflector 102 and the second 103 structure of transparency conducting layer
To be as shown in Fig. 3 (a), the first transparency conducting layer 101 is flat structures, metallic reflector 102 and the second transparency conducting layer 103
It extends in pixel confining layer 40, at this point, metallic reflector 102 and the second transparency conducting layer 103 can pass through a composition work
Skill is formed.It is also possible to as shown in Fig. 3 (b), the first transparency conducting layer 101, metallic reflector 102 and the second transparency conducting layer
103 each extend in pixel confining layer 40, at this point, the first transparency conducting layer 101, metallic reflector 102 and the second electrically conducting transparent
Layer 103 is formed by a patterning processes.
It should be noted that for the material of the first transparency conducting layer 101 and the second transparency conducting layer 102, as long as thoroughly
It is bright and conductive, such as can be ITO (Indium Tin Oxide, tin indium oxide), AZO (Aluminum Zinc
Oxide, aluminum zinc oxide), IZO (Indium Zinc Oxide, indium zinc oxide), GZO (Gallium Zinc Oxide, zinc oxide
Gallium) etc. one of or it is a variety of.The material of first transparency conducting layer 101 and the second transparency conducting layer 102 can be identical, can also be with
It is different.
For the material of metallic reflector 102, with light that is being issued to organic material functional layer 20 and being mapped to inclined surface
It subject to being reflected, such as can be one of Ag (silver), Cu (copper), Au (gold) etc. or a variety of.
In the embodiment of the present invention, when anode 10 is the first transparency conducting layer 101, metallic reflector 102 and second transparent is led
When 103 structure of electric layer, anode 10 has high work function and high reflectance.
Since Ag has high reflectance and high conductivity, luminous efficiency, thus preferred, metallic reflector can be improved
102 material is Ag.Since ITO has many advantages, such as low square resistance and light transmittance can achieve 75%~86%, thus it is preferred, the
The material of one transparency conducting layer 101 and the second transparency conducting layer 103 is ITO.When anode 10 is ITO/Ag/ITO structure, anode
10 there is high work function and high reflectance can reduce anode 10 and organic material function in this way while improving luminous efficiency
The potential barrier of ergosphere 20 is conducive to organic material functional layer 20 and shines.
On this basis, 30 material of cathode is preferably Ag/Mg (magnesium), and wherein Ag/Mg is relatively thin, semi-transparent.
Preferably, as shown in Fig. 3 (a), the first transparency conducting layer 101 is arranged close to substrate 50, metallic reflector 102 and the
Two transparency conducting layers 103 extend in pixel defining layer 40.
This is allowed for when the array substrate further includes thin film transistor (TFT), and the drain electrode of thin film transistor (TFT) need to be with 10 electricity of anode
Connection, is arranged to flat structures close to substrate 50 for the first transparency conducting layer 101 in anode 10, is conducive to thin film transistor (TFT)
Drain electrode is electrically connected with the first transparency conducting layer 101 in anode 10, and metallic reflector 102 and the second transparency conducting layer 103 prolong
It reaches in pixel defining layer 40, the light for the directive inclined surface that can be issued to organic material functional layer 20 reflects, to improve
Light extraction efficiency.
Preferably, substrate 50 is flexible substrate.
Wherein, the material of flexible substrate can be PET (polyethylene terephthalate), PI (polyimides) etc..
In the embodiment of the present invention, when substrate 50 is flexible substrate, and array substrate is applied to display panel, display panel is
Flexible display panels.
Preferably, as shown in figure 4, above-mentioned array substrate further includes thin film transistor (TFT) 60, the drain electrode 601 of thin film transistor (TFT) 60
It is electrically connected with anode 10.
Wherein, thin film transistor (TFT) 60 includes drain electrode 601, source electrode 602, active layer 603, gate insulation layer 604 and grid 605.
Thin film transistor (TFT) 60 is a kind of semiconductor unit with switching characteristic, such as can be amorphous silicon type film crystal
Pipe or low-temperature polysilicon thin film transistor (TFT) or oxide type thin film transistor (TFT) or organic type thin film transistor (TFT) etc., specifically
It is not limited here.
The thin film transistor (TFT) 60 can be top gate type, is also possible to bottom gate type, is not limited thereto (with bottom gate in Fig. 4
Illustrated for type thin film transistor (TFT)).
The embodiment of the present invention provides a kind of OLED display, as shown in figure 5, including above-mentioned array substrate, further includes
Encapsulated layer 70.The display device can be with are as follows: oled panel, mobile phone, tablet computer, television set, display, laptop,
Any products or components having a display function such as Digital Frame, navigator.
The embodiment of the present invention provides a kind of OLED display, defines since the anode 10 in array substrate extends to pixel
In layer 40, and the part extended in pixel defining layer 40 includes inclined surface, the light issued in this way from organic material functional layer 20,
After being mapped to inclined surface, so that it may the face of being inclined by reflects display device, compared with the existing technology in, anode 10 is made into flat
Structure, and the light for being parallel to organic material functional layer 20 issued from organic material functional layer 20 can not be gone out from display device
It penetrates, and the inclined surface in the embodiment of the present invention can make the light issued from organic material functional layer 20 after being mapped to inclined surface
To be reflected, thus improve the light extraction efficiency of display device.
The embodiment of the present invention provides a kind of preparation method of array substrate as shown in figs 2-4, as shown in Figure 6, comprising:
S100, pixel defining layer 40 is formed, pixel defining layer 40 includes that the first pixel of stacking defines sublayer 401 and second
Pixel defines sublayer 402.
Wherein, sublayer 401 is defined for the first pixel and the second pixel defines the material of sublayer 402, such as can be to have
Machine photosensitive material.Pixel confining layer 40 is arranged in the embodiment of the present invention to be avoided the occurrence of to keep apart different sub-pixels
Mixed color phenomenon.
S101, anode 10 is formed, anode 10 extends to that the first pixel defines sublayer 401 and the second pixel defines sublayer 402
Between, and the part that anode 10 extends in pixel defining layer 40 includes inclined surface, the inclined surface and the angle theta of substrate 50 are small
In 90 °；The light that the inclined surface is used to issue 20 two sides of organic material functional layer reflects.
For inclined surface and substrate 50 angle theta without limiting, can specifically be set with visual angle according to display device
It sets, inclined surface and the angle theta of substrate 50 are smaller, and the visual angle of display device is bigger, and inclined surface and the angle theta of substrate 50 are bigger, show
The visual angle of showing device is smaller.Preferably, the angle theta of inclined surface and substrate 50 is 30 ° or so.
S102, organic material function layer 20 and cathode 30 are formed.
Wherein, formed organic material function layer 20 may include to be formed electron transfer layer 201 and hole transmission layer 203, with
And luminescent layer 202 between the two, electron injecting layer 204 and hole injection layer 205 can also be formed as needed certainly.In shape
At organic material functional layer 20 include electron injecting layer 204, electron transfer layer 201, luminescent layer 202, hole transmission layer 203 and
In the case where hole injection layer 205, forms organic material function layer 20 and be specifically as follows: on the substrate 50 for being formed with anode 10
One layer of hole injection layer 205 is deposited, and be successively deposited on the substrate 30 for be vapor-deposited with hole injection layer 205 hole transmission layer 203,
Luminescent layer 202, electron transfer layer 201 and electron injecting layer 204 can form organic material function layer 20 in this way.
On this basis, cathode 30 can be formed in the top of organic material functional layer 20 by vapour deposition method.
Herein, anode 10 is opaque, 30 light transmission of cathode.Based on this, the material of anode 10 and cathode 30 is not defined.
The embodiment of the present invention provides a kind of preparation method of array substrate, since the anode 10 in array substrate extends to picture
Element defines in layer 40, and the part extended in pixel defining layer 40 includes inclined surface, sends out in this way from organic material functional layer 20
Light out, after being mapped to inclined surface, so that it may the face of being inclined by reflects away, compared with the existing technology in, anode 10 is made into flat
Smooth structure, and the light for being parallel to organic material functional layer 20 issued from organic material functional layer 20 can not be emitted, and this
The light that inclined surface in inventive embodiments can be such that organic material functional layer 20 issues can be reflected after being mapped to inclined surface
It goes out, thus when the array substrate is applied to display device, the light extraction efficiency of display device can be improved.
Preferably, anode 10 includes the first transparency conducting layer 101, the metallic reflector 102 being sequentially formed on substrate 50
With the second transparency conducting layer 103.
Wherein, for the material of the first transparency conducting layer 101 and the second transparency conducting layer 102, as long as transparent and electrically conductive
, such as one of can be ITO, AZO, IZO, GZO etc. or a variety of.First transparency conducting layer 101 and second is transparent
The material of conductive layer 102 may be the same or different.
For the material of metallic reflector 102, with light that is being issued to organic material functional layer 20 and being mapped to inclined surface
It subject to being reflected, such as can be one of Ag, Cu, Au etc. or a variety of.
Herein, when anode 10 is 103 structure of the first transparency conducting layer 101, metallic reflector 102 and the second transparency conducting layer
When, it can be as shown in Fig. 3 (a), the first transparency conducting layer 101 is flat structures, metallic reflector 102 and the second electrically conducting transparent
Layer 103 extends in pixel confining layer 40, at this point, metallic reflector 102 and the second transparency conducting layer 103 can pass through a structure
Figure technique is formed；It is also possible to as shown in Fig. 3 (b), the first transparency conducting layer 101, metallic reflector 102 and the second electrically conducting transparent
Layer 103 each extends in pixel confining layer 40, at this point, the first transparency conducting layer 101, metallic reflector 102 and second transparent are led
Electric layer 103 is formed by a patterning processes.
In the embodiment of the present invention, when anode 10 is the first transparency conducting layer 101, metallic reflector 102 and second transparent is led
When 103 structure of electric layer, anode 10 has high work function and high reflectance.
Based on this, as shown in Fig. 3 (a), the above method is as shown in fig. 7, specifically include:
S200, pass through a patterning processes, form the first transparency conducting layer 101 on substrate 50.
S201, sublayer 401 is defined by first pixel of patterning processes formation.
Wherein, the shape of sublayer 401 is defined, for the first pixel the metallic reflection formed in following step S202 can be made
It include subject to inclined surface in layer 102.
S202, the metallic reflector 102 for being located at 101 top of the first transparency conducting layer and the are formed by patterning processes
Two transparency conducting layers 103, metallic reflector 102 and the second transparency conducting layer 103 also extend into the first pixel and define in sublayer 401
Side.
S203, sublayer 402 is defined by second pixel of patterning processes formation.
S204, organic material function layer 20 is formed by evaporation process.
S205, cathode 30 is formed by evaporation process.
In the embodiment of the present invention, it is contemplated that it can also include thin film transistor (TFT) 60 in array substrate, thin film transistor (TFT) 60
Drain electrode 601 is electrically connected with anode 10, by forming the flat structures of the first transparency conducting layer 101 on substrate 50, is conducive to thin
The drain electrode 601 of film transistor is electrically connected with the first transparency conducting layer 101 in anode 10, and defines sublayer 401 in the first pixel
And second pixel define and form metallic reflector 102 and the second transparency conducting layer 103 between sublayer 402, metallic reflector 102 can
It is reflected with the light of the directive inclined surface issued to organic material functional layer 20, to improve light extraction efficiency.
The above description is merely a specific embodiment, but scope of protection of the present invention is not limited thereto, any
Those familiar with the art in the technical scope disclosed by the present invention, can easily think of the change or the replacement, and should all contain
Lid is within protection scope of the present invention.Therefore, protection scope of the present invention should be based on the protection scope of the described claims.
Claims (7)
1. a kind of array substrate, including anode, organic material functional layer, cathode and pixel defining layer on substrate is arranged,
It is characterized in that, the anode extends in the pixel defining layer, and the anode extends in the pixel defining layer
Part includes inclined surface, and the angle of the inclined surface and the substrate is less than 90 °；The anode includes being successively set on the lining
The first transparency conducting layer, metallic reflector and the second transparency conducting layer on bottom；First transparency conducting layer is close to the lining
Bottom setting, the metallic reflector and second transparency conducting layer extend in the pixel defining layer；
The light of inclined surface described in the directive that the inclined surface is used to issue the organic material functional layer reflects.
2. array substrate according to claim 1, which is characterized in that the material of the metallic reflector is Ag；Described
The material of one transparency conducting layer and second transparency conducting layer is ITO.
3. array substrate according to claim 1, which is characterized in that the substrate is flexible substrate.
4. array substrate according to claim 1-3, which is characterized in that it further include thin film transistor (TFT), it is described thin
The drain electrode of film transistor is electrically connected with the anode.
5. a kind of OLED display, which is characterized in that including the described in any item array substrates of claim 1-4, further include
Encapsulated layer.
6. a kind of preparation method of array substrate characterized by comprising
Pixel defining layer is formed, the pixel defining layer includes that the first pixel of stacking defines sublayer and the second pixel defines son
Layer；
Anode is formed, the anode extends to that first pixel defines sublayer and second pixel defines between sublayer, and
The part that the anode extends in the pixel defining layer includes inclined surface, and the angle of the inclined surface and substrate is less than 90 °；
The light of inclined surface described in the directive that the inclined surface is used to issue organic material functional layer reflects；The anode include according to
The first transparency conducting layer, metallic reflector and the second transparency conducting layer of secondary formation over the substrate；
Form organic material function layer and cathode；
Wherein, the pixel defining layer and the anode are formed, is specifically included:
By a patterning processes, first transparency conducting layer is formed over the substrate；
First pixel, which is formed, by a patterning processes defines sublayer；
The metallic reflector and described second being located above first transparency conducting layer is formed by a patterning processes
Transparency conducting layer, the metallic reflector and second transparency conducting layer also extend into first pixel and define in sublayer
Side；
Second pixel, which is formed, by a patterning processes defines sublayer.
7. preparation method according to claim 6, which is characterized in that described to form organic material function layer and cathode, tool
Body includes:
The organic material functional layer is formed by evaporation process；
The cathode is formed by evaporation process.
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| CN106992204B (en) * | 2017-04-25 | 2019-12-20 | 京东方科技集团股份有限公司 | OLED array substrate, preparation method thereof and display device |
| CN107799569A (en) * | 2017-09-16 | 2018-03-13 | 合肥惠科金扬科技有限公司 | A kind of pixel defining layer module of QLED display panels |
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| CN108493230A (en) * | 2018-05-31 | 2018-09-04 | 京东方科技集团股份有限公司 | Display base plate and its manufacturing method, display panel |
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