CN105740540A - Method for searching characteristic graphs of layouts in mask design - Google Patents

Method for searching characteristic graphs of layouts in mask design Download PDF

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Publication number
CN105740540A
CN105740540A CN201610064033.1A CN201610064033A CN105740540A CN 105740540 A CN105740540 A CN 105740540A CN 201610064033 A CN201610064033 A CN 201610064033A CN 105740540 A CN105740540 A CN 105740540A
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China
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domain
datagraphic
feature pattern
encoded radio
region unit
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CN201610064033.1A
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CN105740540B (en
Inventor
张兴洲
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Shanghai Huahong Grace Semiconductor Manufacturing Corp
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Shanghai Huahong Grace Semiconductor Manufacturing Corp
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    • GPHYSICS
    • G06COMPUTING; CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00Computer-aided design [CAD]
    • G06F30/30Circuit design
    • G06F30/39Circuit design at the physical level
    • G06F30/392Floor-planning or layout, e.g. partitioning or placement
    • GPHYSICS
    • G06COMPUTING; CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00Computer-aided design [CAD]
    • G06F30/30Circuit design
    • G06F30/39Circuit design at the physical level
    • G06F30/398Design verification or optimisation, e.g. using design rule check [DRC], layout versus schematics [LVS] or finite element methods [FEM]

Abstract

The invention discloses a method for searching characteristic graphs of layouts in mask design. The method comprises the following steps: 1, coding data graphs of a layout, and the coding comprises the following sub-steps: 11, dividing the data graphs into a plurality of area blocks on the layout, 12, obtaining one code of each area block according to the condition whether graphs exist in the area blocks of the data graphs, and 13, synthesizing the codes of the area blocks of the data graphs so as to form code values of the data graphs; and 2, searching characteristic graphs in the layout, and the searching comprises the following sub-steps: 21, obtaining code values of to-be-searched characteristic graphs, 22, comparing the code values of the characteristic graphs with the code values of the data graphs in the layout, and 23, determining whether characteristic graphs exist in the layout according to the code value comparison result. According to the method disclosed in the invention, automatic search of characteristic graphs in layouts can be realized, so that the omission of characteristic graphs in the layouts can be avoided, the workload of manual check can be decreased, and the working efficiency can be improved.

Description

The lookup method of the feature pattern of domain in mask plate design
Technical field
The present invention relates to a kind of semiconductor integrated circuit method of manufacturing technology, particularly relate to the lookup method of the feature pattern of domain in the design of a kind of mask plate.
Background technology
Scribing sheet groove structures design is after mask plate designs business relay products design data input checking, and EB processes the design carried out before making with mask plate, and wherein EB processes to generate for layer calculation and is used for the data that mask plate makes.Mainly carry out the domain arrangement design of line of cut according to the dimensions of mask plate according to the size of chip, line of cut is placed the various lithography alignments needed for goods engineering and the figure of test simultaneously, ultimately produces the final layout data before mask plate makes.
Along with the technique related in mask plate design business is on the increase, check whether the alignment test badge in scribe line data is placed the work such as complete and satisfied placement requirement and also become more complicated therewith and be prone to make mistakes.nullEach layer photoetching is required for its corresponding alignment patterns (mark),One new technique generally has individual even hundreds of alignments up to a hundred or resolution chart altogether,For 0.13 μm of technique: BOXMARK44,ROTMARK8,WAM51,LSA15,FIA32,PCM65,Amount to 215,Wherein BOXMARK is for detecting the resolution chart of exposure quality after a piece of silicon chip (Wafer) has exposed,ROTMARK is for the alignment mark of first step photoetching engineering,WAM is the alignment mark of a kind of wafer,LSA is laser step alignment mark,FIA is an imaging alignment mark,PCM is the resolution chart for characterisitic parameters various needed for characterization processes,It is all different types of alignment of using of semiconductor integrated circuit manufacture or resolution chart.
As shown in Figure 1A, it is the domain that in mask plate design, feature pattern places mistake;Being placed with alignment mark 103 in domain 101, as shown in broken box 102, the placement location of this alignment mark 103 is also incorrect so that extend to the alignment mark 103 in device cell region can and device cell overlapping.And as shown in Figure 1B, be that in mask plate design, feature pattern places correct domain;In region shown in broken box 103, the placement location of alignment mark 103 is correct, and alignment mark 103 and device cell are not overlapping.
Owing in designing at mask plate, alignment mark or resolution chart are relatively more, in mask plate design process, need some mark are positioned, so that check whether there is leakage is put, originally relying primarily on the search function in domain instrument, unit (cell) title searching mark checks whether placed these figures.But, this method only detects some and leaks the situation put, then cannot realize when producing to be improperly situated as shown in Figure 1A judging, because Figure 1A placed alignment mark 103 really, be contrasted it can be found that placed alignment mark 103 in domain by the title of alignment mark 103;But due to the situation that the alignment mark 103 in Figure 1A exists and other device cell is overlapping, when there is this overlapping situation, alignment mark 103 will not work again, the same with the effect that leakage is put, but existing method cannot check this situation automatically;Needing to adopt artificial method inspection, this obviously can increase workload, reduces work efficiency, and also can bring human error.
Summary of the invention
The technical problem to be solved is to provide in the design of a kind of mask plate the lookup method of feature pattern of domain, it is achieved to the lookup automatization of feature pattern in domain, it is to avoid the omission of feature pattern in domain.
For solving above-mentioned technical problem, in mask plate provided by the invention design, the lookup method of the feature pattern of domain comprises the steps:
Step one, datagraphic to domain are encoded, including following step by step:
Step 11, on domain, described datagraphic is divided into multiple region unit.
Step 12,1 coding according to the described region unit obtaining correspondence with or without figure actual in each described region unit of described datagraphic.
Step 13, comprehensive described datagraphic 1 of each described region unit coding form the encoded radio of corresponding described datagraphic.
Step 2, in described domain, carry out the lookup of feature pattern, including following step by step:
Step 21, the method for step one is adopted to obtain the encoded radio of the described feature pattern to search.
Step 22, the encoded radio of each described datagraphic in the encoded radio of described feature pattern and described domain is compared.
If there is the encoded radio of the described datagraphic identical with the encoded radio of described feature pattern in the described domain of step 23, then encoded radio is identical described datagraphic and described feature pattern match;If being absent from the encoded radio of the described datagraphic identical with the encoded radio of described feature pattern in described domain, then in described domain, described feature pattern has been put in leakage.
Further improving and be, datagraphic described in step one obtains by the data of described domain carry out data block division.
Further improve and be, each region unit composition two-dimensional arrangements structure of a described datagraphic in step 11.
Further improving is that in step 12, when including figure in described region unit, 1 encoded radio of this region unit is 1, and when not having figure in described region unit, 1 encoded radio of this region unit is 0.
Further improve and be, in step 13,1 encoded radio of region unit described in each row of the same string of described datagraphic is added, according to weight, the decimal number that these row formed are corresponding, and each decimal number arranging described correspondence of described datagraphic carries out 1 dimension arrangement according to the order of row and forms the encoded radio of described datagraphic.
Further improving is that it is be automatically obtained by software mode that step 2 carries out the lookup of feature pattern in described domain.
Further improving is that described feature pattern includes alignment mark or resolution chart.
Further improving and be, in step 11, each described region unit between each row of described datagraphic is formed by decile.
Further improving is that, in step 11, each described region unit between each row of described datagraphic is formed by decile.
The present invention, by the datagraphic in domain carrying out the division of region unit and encoding, searches it is achieved thereby that only pass through that the comparison of encoded radio just can be carried out feature pattern automatic, quick in domain, so the automatization that the present invention can realize feature pattern searches.
Additionally, after figure is encoded, owing to encoded radio is relevant with actual graphic structure, when problems such as actual graphical overlap, encoded radio can change, encoded radio is just different with the encoded radio of the feature pattern required to look up after changing, and by just checking the problems such as actual graphical overlaps after comparing, is avoided that the situation that the figure caused because of cells overlap cannot check out when losing in the process of the present invention.
Owing to the inventive method can carry out automatization's lookup by software, it is possible to reduce the workload of hand inspection, improve work efficiency.
Accompanying drawing explanation
Below in conjunction with the drawings and specific embodiments, the present invention is further detailed explanation:
Figure 1A is the domain that in mask plate design, feature pattern places mistake;
Figure 1B is that in mask plate design, feature pattern places correct domain;
Fig. 2 is the flow chart of the lookup method of the feature pattern of domain in the design of embodiment of the present invention mask plate;
Fig. 3 A to Fig. 3 C is the schematic diagram being encoded in process to the datagraphic of domain in embodiment of the present invention method;
Fig. 4 is the domain overall schematic in embodiment of the present invention method, the datagraphic of domain being encoded.
Detailed description of the invention
As in figure 2 it is shown, be the flow chart of the lookup method of the feature pattern of domain in the design of embodiment of the present invention mask plate;As shown in Fig. 3 A to Fig. 3 C, it it is the schematic diagram in embodiment of the present invention method, the datagraphic of domain being encoded in process;As shown in Figure 4, it is the domain overall schematic in embodiment of the present invention method, the datagraphic of domain being encoded.
In the design of embodiment of the present invention mask plate, the lookup method of the feature pattern of domain comprises the steps:
Step one, datagraphic to domain are encoded, including following step by step:
Step 11, on domain, described datagraphic is divided into multiple region unit.
Described datagraphic includes various alignment mark or resolution chart.As shown in Figure 3A, it is necessary to place in four angles placement ROTMARK202, Fig. 3 A of scribe line 201 and show 4 ROTMARK202.
As shown in Figure 3 B, show the structure of ROTMARK202, include multiple strip structure 203, between each strip structure 203, there is interval, multiple strip structures 203 are vertical with scribe line centrage 201a to be placed, the width of multiple strip structures 203 is 6 μm, and interval is also 6 μm, and the length of strip structure 203 can regulate.
Needing in the embodiment of the present invention ROTMARK202 shown in Fig. 3 B is encoded, refer to shown in Fig. 3 C, ROTMARK202 has been divided into multiple region unit on domain, piecemeal carries out according to the vertical dotted line 205 of many horizontal dotted lines 204 therein and Duo Gen.It can be seen that each region unit of ROTMARK202 constitutes two-dimensional arrangements structure, wherein each described region unit between each row of ROTMARK202 is formed by decile.And the height of each described region unit between each row of ROTMARK202 has certain difference, this is to align according to the height of multiple strip structures 203 to carry out dividing.
From the foregoing, it will be observed that in the embodiment of the present invention, each described region unit between each row of described datagraphic is formed by decile.Each described region unit between each row of described datagraphic can divide according to time graph, also can be formed by decile.
Step 12,1 coding according to the described region unit obtaining correspondence with or without figure actual in each described region unit of described datagraphic.In the embodiment of the present invention, when including figure in described region unit, 1 encoded radio of this region unit is 1, and when not having figure in described region unit, 1 encoded radio of this region unit is 0.
As shown in Figure 3 C, in each region unit of ROTMARK202, the code segment with figure is 1, it does not have the code segment of figure is 0.
Step 13, comprehensive described datagraphic 1 of each described region unit coding form the encoded radio of corresponding described datagraphic.In the embodiment of the present invention, 1 encoded radio of region unit described in each row of the same string of described datagraphic is added, according to weight, the decimal number that these row formed are corresponding, and each decimal number arranging described correspondence of described datagraphic carries out 1 dimension arrangement according to the order of row and forms the encoded radio of described datagraphic.
As shown in Figure 3 C, the ten's digit of the row corresponding to labelling 206 is the encoded radio of ROTMARK202, every coding is all that the encoded radio of each region unit of respective column is added by weight and obtains, the weight of the encoded radio of the row corresponding to weight greater than flag 208 of the encoded radio of row corresponding to labelling 207 in Fig. 3 C.
The coding being only a datagraphic as shown in figs. 3 a-3 c, includes multiple datagraphic in the domain of a complete mask plate, described datagraphic require over the data to described domain carry out data block divide obtain.As shown in Figure 4, wherein four datagraphics of signal place, respectively as shown in labelling P1, P2, P3 and P4, each datagraphic all have employed such as upper type and is encoded.
Step 2, in described domain, carry out the lookup of feature pattern, including following step by step:
Step 21, the method for step one is adopted to obtain the encoded radio of the described feature pattern to search.
In the embodiment of the present invention, described feature pattern includes alignment mark or resolution chart, and these feature patterns are required for placing in mask plate designs.
Step 22, the encoded radio of each described datagraphic in the encoded radio of described feature pattern and described domain is compared;
If there is the encoded radio of the described datagraphic identical with the encoded radio of described feature pattern in the described domain of step 23, then encoded radio is identical described datagraphic and described feature pattern match;If being absent from the encoded radio of the described datagraphic identical with the encoded radio of described feature pattern in described domain, then in described domain, described feature pattern has been put in leakage.
In the embodiment of the present invention, the lookup carrying out feature pattern in described domain is to be automatically obtained by software mode.After datagraphic being encoded due to the present invention, the datagraphic searching correspondence in domain only needs to adopt the method that encoded radio compares to realize, these realize easily via software, realize automatization to search, not only search precision high, check that out the problem that the figure that cells overlap causes is lost, additionally it is possible to reduce the workload of hand inspection, improve work efficiency.
Above by specific embodiment, the present invention is described in detail, but these have not been construed as limiting the invention.Without departing from the principles of the present invention, those skilled in the art it may also be made that many deformation and improvement, and these also should be regarded as protection scope of the present invention.

Claims (9)

1. the lookup method of the feature pattern of domain in a mask plate design, it is characterised in that comprise the steps:
Step one, datagraphic to domain are encoded, including following step by step:
Step 11, on domain, described datagraphic is divided into multiple region unit;
Step 12,1 coding according to the described region unit obtaining correspondence with or without figure actual in each described region unit of described datagraphic;
Step 13, comprehensive described datagraphic 1 of each described region unit coding form the encoded radio of corresponding described datagraphic;
Step 2, in described domain, carry out the lookup of feature pattern, including following step by step:
Step 21, the method for step one is adopted to obtain the encoded radio of the described feature pattern to search;
Step 22, the encoded radio of each described datagraphic in the encoded radio of described feature pattern and described domain is compared;
If there is the encoded radio of the described datagraphic identical with the encoded radio of described feature pattern in the described domain of step 23, then encoded radio is identical described datagraphic and described feature pattern match;If being absent from the encoded radio of the described datagraphic identical with the encoded radio of described feature pattern in described domain, then in described domain, described feature pattern has been put in leakage.
2. the lookup method of the feature pattern of domain in mask plate design as claimed in claim 1, it is characterised in that: datagraphic described in step one obtains by the data of described domain carry out data block division.
3. the lookup method of the feature pattern of domain in mask plate design as claimed in claim 1, it is characterised in that: each region unit composition two-dimensional arrangements structure of a described datagraphic in step 11.
4. the lookup method of the feature pattern of domain in mask plate design as claimed in claim 3, it is characterized in that: in step 12, when including figure in described region unit, 1 encoded radio of this region unit is 1, and when not having figure in described region unit, 1 encoded radio of this region unit is 0.
5. the lookup method of the feature pattern of domain in mask plate design as claimed in claim 4, it is characterized in that: in step 13,1 encoded radio of region unit described in each row of the same string of described datagraphic is added, according to weight, the decimal number that these row formed are corresponding, and each decimal number arranging described correspondence of described datagraphic carries out 1 dimension arrangement according to the order of row and forms the encoded radio of described datagraphic.
6. the lookup method of the feature pattern of domain in mask plate design as claimed in claim 4, it is characterised in that: it is be automatically obtained by software mode that step 2 carries out the lookup of feature pattern in described domain.
7. the lookup method of the feature pattern of domain in mask plate design as claimed in claim 1, it is characterised in that: described feature pattern includes alignment mark or resolution chart.
8. the lookup method of the feature pattern of domain in mask plate design as claimed in claim 3, it is characterised in that: in step 11, each described region unit between each row of described datagraphic is formed by decile.
9. the lookup method of the feature pattern of domain in mask plate design as claimed in claim 8, it is characterised in that: in step 11, each described region unit between each row of described datagraphic is formed by decile.
CN201610064033.1A 2016-01-29 2016-01-29 The lookup method of the pattern image of domain in mask plate design Active CN105740540B (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106934122A (en) * 2016-12-30 2017-07-07 北京华大九天软件有限公司 A kind of method for accelerating conductor fig annexation in generation domain

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CN103853866A (en) * 2012-12-07 2014-06-11 上海华虹宏力半导体制造有限公司 Method and system for verifying ROM (Read Only Memory) code data graphs in aggregate data layout
CN103901740A (en) * 2012-12-24 2014-07-02 上海华虹宏力半导体制造有限公司 Placement method of lithography alignment mark
CN104795383A (en) * 2014-01-20 2015-07-22 中芯国际集成电路制造(上海)有限公司 Alignment mark, alignment mark detection method and alignment mark detection device
CN104865789A (en) * 2015-06-08 2015-08-26 中国科学院微电子研究所 Mask plate and photoetching method
US20150302129A1 (en) * 2014-04-17 2015-10-22 Qualcomm Incorporated Mask assignment technique for m1 metal layer in triple-patterning lithography

Patent Citations (5)

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Publication number Priority date Publication date Assignee Title
CN103853866A (en) * 2012-12-07 2014-06-11 上海华虹宏力半导体制造有限公司 Method and system for verifying ROM (Read Only Memory) code data graphs in aggregate data layout
CN103901740A (en) * 2012-12-24 2014-07-02 上海华虹宏力半导体制造有限公司 Placement method of lithography alignment mark
CN104795383A (en) * 2014-01-20 2015-07-22 中芯国际集成电路制造(上海)有限公司 Alignment mark, alignment mark detection method and alignment mark detection device
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106934122A (en) * 2016-12-30 2017-07-07 北京华大九天软件有限公司 A kind of method for accelerating conductor fig annexation in generation domain
CN106934122B (en) * 2016-12-30 2020-01-14 北京华大九天软件有限公司 Method for accelerating generation of conductor graph connection relation in layout

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