CN105716224A - VAPORIZING container, vaporizer, and VAPORIZING DEVICE - Google Patents

VAPORIZING container, vaporizer, and VAPORIZING DEVICE Download PDF

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Publication number
CN105716224A
CN105716224A CN201510802057.8A CN201510802057A CN105716224A CN 105716224 A CN105716224 A CN 105716224A CN 201510802057 A CN201510802057 A CN 201510802057A CN 105716224 A CN105716224 A CN 105716224A
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CN
China
Prior art keywords
vaporizer
fluent
liquid level
gasification
underlying space
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CN201510802057.8A
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Chinese (zh)
Inventor
田口明広
矢田秀贵
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株式会社堀场Stec
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Priority to JP2014259536 priority Critical
Priority to JP2014-259536 priority
Application filed by 株式会社堀场Stec filed Critical 株式会社堀场Stec
Publication of CN105716224A publication Critical patent/CN105716224A/en

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Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22STEAM GENERATION
    • F22BMETHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B15/00Water-tube boilers of horizontal type, i.e. the water-tube sets being arranged horizontally
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24HFLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT GENERATING MEANS, IN GENERAL
    • F24H1/00Water heaters having heat generating means, e.g. boiler, flow- heater, water-storage heater
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22STEAM GENERATION
    • F22BMETHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B1/00Methods of steam generation characterised by form of heating method
    • F22B1/28Methods of steam generation characterised by form of heating method in boilers heated electrically
    • F22B1/282Methods of steam generation characterised by form of heating method in boilers heated electrically with water or steam circulating in tubes or ducts
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22STEAM GENERATION
    • F22BMETHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B1/00Methods of steam generation characterised by form of heating method
    • F22B1/28Methods of steam generation characterised by form of heating method in boilers heated electrically
    • F22B1/30Electrode boilers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22STEAM GENERATION
    • F22BMETHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B33/00Steam-generation plants, e.g. comprising steam boilers of different types in mutual association
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22STEAM GENERATION
    • F22BMETHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B35/00Control systems for steam boilers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24HFLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT GENERATING MEANS, IN GENERAL
    • F24H9/00Details
    • F24H9/18Arrangement or mounting of grates, burners, or heating elements

Abstract

This invention is a continuous type vaporizing device that makes it possible to output a large flow rate of the material gas stably while the vaporizing device is downsized. The vaporizing device comprises a vaporizing tank (11) that has a vaporizing chamber (11a) and that outputs a material gas that is produced by vaporizing the liquid material that is introduced into the vaporizing chamber (11a), a heater that promotes vaporization of the liquid material in the vaporizing chamber by heating the vaporization tank (11), and a partition wall (6) that partitions a lower space of the vaporizing chamber (11a) into a first lower space (11e) into which the liquid material is introduced first and a second lower space (11f) into which the liquid material that overflows from the first lower space (11e) is introduced.

Description

Gasification container, gasifier and gasification installation

Technical field

The present invention relates to the gasification installation etc. of the hot type making liquid semiconductor material gas.

Background technology

Semi-conducting material includes without freon such at normal temperatures for the semi-conducting material of liquid.In semi-conductor manufacturing system, when adopting this liquid semiconductor material, it is necessary to utilize and liquid semiconductor material is heated so that the hot type gasification installation of its aerification.

Representative gasification installation as this purposes, such as have, in the process of regulation, the material of necessary q.s is stored in gasification container, and be vaporized and export the gasification installation of the memory type of material gas, and limit continuously or intermittently imports fluent material limit to gasification container and is vaporized thus the gasification installation of the type that is continuously introduced into as material gas output.

As long as owing to the gasification installation of memory type stores the fluent material of q.s in gasification container, without being used for importing the complicated flow passage structure of described fluent material and valve control, and the heating and temperature control of gasification container is not required too high fast-response yet.Therefore, the gasification installation of memory type has the advantage easily carrying out the stable of material gas and flow output greatly.On the other hand, there is gasification container easily to maximize and the shortcoming that is difficult to densification.

To this, although the gasification installation being continuously introduced into type has the advantage that can make gasification container miniaturization, but there is the shortcoming exporting material gas with being difficult to stable and big flow.This is because, with gasification in gasification container the partial response that exports must assure that and constantly import new fluent material, so needing the control response of fluent material import volume.Such as, if described control is not in time, then there is following danger: because making the fluent material not gasified overflow to the excessive importing fluent material of gasification container, and export from the export mouth of material gas, thus causing unexpected fault etc..

So, during in order to prevent the spilling of fluent material that excessive importing causes and add urgent output shut-down mechanism, can frequently there is output halted state, bring baneful influence can to semiconductor processes itself, so essence can not be constituted solve the countermeasure of the problems referred to above.

And, the problems referred to above are also much in the gasification installation of memory type.

Patent documentation 1: Japanese Laid-Open Patent Publication 2004-157719

Summary of the invention

The present invention is in view of the above problems, it is therefore an objective to provide the gasification installation etc. that semiconductor-fabricating device etc. uses, that maintain compactedness meanwhile, it is capable to stable and big flow export material gas.

Namely, the gasification container of the present invention has vaporizer, make the liquid material vaporization of the described vaporizer of importing and the material gas generated is derived, wherein, described gasification container includes partition wall, and the underlying space of described vaporizer is separated into initial the first underlying space importing fluent material and imports the second underlying space of the fluent material overflowed from described first underlying space by described partition wall.

According to said structure, owing to initially flowing into the fluent material of the first underlying space from partition wall to a period of time that the second underlying space overflows, liquid level is held essentially constant, so the described time can be utilized to carry out liquid surface height controlling.Therefore, mechanism for liquid surface height controlling needs not to be expensive and that response is good mechanism, just the fluent material amount (liquid level) in vaporizer can be maintained at suitable scope, thus solve the compactedness as problem of the present invention and quantizing greatly simultaneously.

As long as fluent material being started in the target liquid level altitude range of the liquid level fluent material that is set in vaporizer overflowed to described second underlying space, or above described target liquid level altitude range, liquid surface height controlling just becomes easy, and the effect above will become notable.

In order to carry out the stable supplying of big flow material gas in compact vaporizer, preferably not only to ensure to import, to vaporizer, the fluent material matched with the amount derived as material gas and carry out described liquid surface height controlling, also the fluent material in vaporizer is maintained and guarantee that the gasification of gasification promotes temperature.

Therefore it may further be preferable that include the multiple heat transfer pieces highlighted from the internal face of described vaporizer.This is because, efficiently transmitted to fluent material by the heat of multiple heat transfer pieces self-heating device in the future, even if so fluent material is constantly imported compact vaporizer, accelerating liquid material replacing velocity quantizing greatly to realize, can also pass through to eliminate the temperature thus caused to reduce, promote temperature thus quickly being heated by fluent material and maintaining gasification.

In order to realize the simplification manufactured, it is preferred that including: in block main body, being formed has bottom outlet at predetermined surface opening;And lid, the opening of bottom outlet is had to form described vaporizer described in closing, there is bottom outlet described in being formed by being bored a hole in multiple positions of the described predetermined surface of described main body, form the rubble between perforation and perforation partly as described heat transfer piece function.

For the heat to the more efficient transmission of fluent material from heater, it is preferred that the wall body forming described vaporizer can bury the heater for heated liquid material underground.

Additionally, the gasifier of the present invention includes: the gasification container of above-mentioned any one;And heater, heat described gasification container, promote the liquid material vaporization in described vaporizer.

The gasification installation of the present invention includes: described gasifier;Liquid level sensor, detects the liquid level of the fluent material stored in described vaporizer;Flow control valve, is arranged on the fluent material guiding in channel connected with described vaporizer;And controlling organization, control described flow control valve so that the liquid level that described liquid level sensor detects is in regulation target liquid level altitude range.

According to the present invention of said structure, owing to initially flowing into the fluent material of the first underlying space from partition wall to a period of time that the second underlying space overflows, liquid level is held essentially constant, so the described time can be utilized reliably to carry out liquid surface height controlling.Therefore, in the described gasification installation being continuously introduced into type etc., that maintain compactedness meanwhile, it is capable to stable and big flow export material gas.

Accompanying drawing explanation

Fig. 1 indicates that the integrally-built schematic diagram of the gasification installation of one embodiment of the present invention.

Fig. 2 indicates that the axonometric chart of the gasification container of same embodiment.

Fig. 3 indicates that the top view of the main body of the gasification container of same embodiment.

Fig. 4 indicates that the right view of the main body of the gasification container of same embodiment.

Fig. 5 is the line A-A sectional drawing in Fig. 3.

Fig. 6 is the line B-B sectional drawing in Fig. 3.

Fig. 7 indicates that the axonometric chart of the preheating container of same embodiment.

Fig. 8 indicates that the front view of the configuration structure of the gasifier of the gasification installation of same embodiment, preheater, flow control valve etc..

Description of reference numerals

100 gasification installations

1 gasifier

11 gasification containers

111 main bodys

112 lids

121 heaters

11a vaporizer

11e the first underlying space

11g bores a hole

11f the second underlying space

11h has bottom outlet

3 controlling organizations (import volume controlling organization)

31 flow control valves

32 liquid level sensors

5 heat transfer pieces

Detailed description of the invention

Hereinafter, with reference to the accompanying drawings of an embodiment of the invention.

(1) summary of the gasification installation 100 of present embodiment

The gasification installation 100 of present embodiment is such as assembled in semi-conductor manufacturing system, for supplying the material gas of regulation flow to the process chamber of semi-conductor manufacturing system.

And as it is shown in figure 1, gasification installation 100 includes: gasifier 1, make the liquid material vaporization of importing and export described material gas;Preheater 2, preheats and imports described gasifier 1 by fluent material;Import volume controlling organization 3, controls to import the flow of the fluent material of described gasifier 1 from described preheater 2;And mass flow controller 7, it is connected with the delivery outlet of described gasifier 1, controls the mass flow of described material gas.

Then, each several part of described gasification installation 100 is described.

(2) structure of gasifier 1

As it is shown in figure 1, described gasifier 1 includes: gasification container 11, there is in inside vaporizer 11a;And vaporizer temperature control device 12, it is controlled, and the gasification that the fluent material temperature in described vaporizer 11a remains the regulation promoting gasification promotes temperature.

As shown in Fig. 2~Fig. 5, described gasification container 11 arranges described vaporizer 11a in the inside of the metalwork of block (more specifically rectangular-shaped) in strip, and on an end face vertical with its long side direction, offer the introducing port 11b for importing fluent material to described vaporizer 11a, and for by material gas from the described vaporizer 11a export mouth 11c derived.Its long side direction is set to horizontal direction by described gasification container 11, and described export mouth 11c is to be positioned at the posture configuration above introducing port 11b, be stored in the underlying space of described vaporizer 11a from the described introducing port 11b fluent material imported, the material gas of liquid material vaporization is full of superjacent air space and exports from described export mouth 11c.

As it is shown in figure 1, described vaporizer temperature control device 12 includes: heater 121, it is installed on gasification container 11;Temperature sensor 123, directly or indirectly measures the temperature of vaporizer fluent material;And control circuit for heater 122, control described heater 121, so that the temperature that described temperature sensor 123 measures becomes described gasification and promotes temperature.Described heater 121 is rod member, and as shown in Fig. 2 etc., described heater 121 inserts heater hole 11d, described heater hole 11d and at the one end face opening of described gasification container 11 and extends along described long side direction.

(3) structure of preheater 2

As shown in Figure 1 and Figure 7, described preheater 2 includes: preheating container 21, has preheating chamber 21a in inside;And preheating chamber temperature control device 22, it is controlled, fluent material temperature in described preheating chamber 21a is remained the preheating temperature of the regulation lower than described gasification promotion temperature, and as it has been described above, preheated fluent material is derived to described gasifier 1 by described preheater 2.

Preheating container 21 is same with described gasification container 11, in the inside of the metalwork of block (more specifically rectangular-shaped) in strip, described preheating chamber 21a is set, and on an end face vertical with its long side direction, offer the introducing port 21b for importing fluent material to described preheating chamber 21a, and for by preheated fluent material from the described preheating chamber 21a export mouth 21c derived.

As it is shown in fig. 7, long side direction is set to horizontal direction by described preheating container 21, and configure in the way of described export mouth 21c is positioned at above introducing port 21b.Additionally, described preheating chamber 21a includes: a plurality of (in this case 4) extend runner 21d~21g, extend along long side direction;And connecting passage 21h~21j, connect the end of described extension runner 21d~21g, so that described extension runner 21d~21g series connection.And, the initiating terminal extending runner 21d being positioned at most upstream is described introducing port 21b, and the clearing end extending runner 21g being positioned at most downstream is described export mouth 21c.These extend runner 21d~21g and are set to, and the runner that extends of upstream side is positioned at the lower section extending runner in downstream.Thus, even if fluent material gasifies in described preheating chamber 21a and becomes material gas, described material gas also can flow to export mouth 21c side naturally, will not remain in preheating chamber 21a.

As it is shown in figure 1, described preheating chamber temperature control device 22 includes: secondary heater 221, it is installed on described preheating chamber 21a;Temperature sensor 223, directly or indirectly measures the temperature of preheating chamber fluent material;And secondary heater control circuit 222, control described secondary heater 221, so that the temperature that described temperature sensor 223 measures becomes described preheating temperature.Described secondary heater 221 is rod member, as it is shown in fig. 7, described secondary heater 221 inserts secondary heater hole 21k, described secondary heater hole 21k is at the central opening of another end face of described preheating container 21 and extends along described long side direction.It addition, during from another end view described, described extension runner 21d~21g is configured to surround secondary heater hole 21k.Thereby, it is possible to the heat produced by secondary heater 221 extremely efficiently transmits to the fluent material in preheating chamber 21a.And in the present embodiment, the extension runner 21d extending runner 21g and most upstream of most downstream is oppositely disposed across secondary heater hole 21k.Thereby, it is possible to prevent situations below as far as possible: the fluent material extended in runner 21g of the most downstream of the highest temperature is subject to the impact of the fluent material extended in runner 21d of the most upstream of lowest temperature and temperature reduces.

(4) structure of import volume controlling organization 3

As it is shown in figure 1, described import volume controlling organization 3 includes: flow control valve 31, it is arranged on the connecting passage of preheating container 21 and gasification container 11;As the liquid level sensor 32 of fluent material detecting device, detect the amount of the fluent material stored in described vaporizer 11a;And valve controling circuit 33, drive described flow control valve 31 to control to import the flow of the fluent material of gasification container 11, so that the fluent material amount that described liquid level sensor 32 detects is in regulation target zone.

Described flow control valve 31 is such as cylindrical at this, possesses not shown laminated piezoelectric element and the valve body driven by described laminated piezoelectric element, and described flow control valve 31 is the break-make open and close valve only taking and fully opening/completely close both values.It addition, in the present embodiment, as shown in Figure 8, described flow control valve 31, described gasification container 11 and described preheating container 21 are in the posture that long side direction is level, and are vertically installed on a side of the tabular block part 4 holded up.Described tabular block part 4 is the integrated package (manifoldblock) being formed with inner flow passage, and inner flow passage includes: for supplying the second runner 4b of export mouth 21c and the flow control valve 31 of the first flow 4a of fluent material, connection preheating container 21 to the introducing port 21b of preheating container 21, connect the 3rd runner 4c of the introducing port 11b of flow control valve 31 and gasification container 11 and export the 4th runner 4d of the material gas after gasifying from the export mouth 11c of gasification container 11.So, will be formed with the tabular block part 4 of inner flow passage 4a~4d and hold up, and by be respectively at the preheating container 21 of flat-hand position, flow control valve 31 and gasification container 11 under be installed on described tabular block part 4 successively, it is achieved thereby that densification.

Described liquid level sensor 32 is such as float-type liquid level sensor, for detecting the liquid level of the fluent material stored in the first underlying space 11e, at this as it is shown in figure 5, the probe of described liquid level sensor 32 inserts downward installation from the upper wall surface of described gasification container 11.

More specifically, described valve controling circuit 33 accepts the output from described liquid level sensor 32, and when the liquid level that described liquid level sensor 32 detects exceedes the target liquid level altitude range of regulation, close described flow control valve 31, when lower than described target liquid level altitude range, open described flow control valve 31.It addition, target liquid level altitude range can have amplitude, it is also possible to be a bit.

And, as it is shown in figure 1, described valve controling circuit 33 is together with described control circuit for heater 122 and secondary heater control circuit 222, physically it is set to the circuit of one.Owing to described circuit such as has the digital circuit being made up of CPU, memorizer, communication interface etc., and the analog circuit being made up of ADC, DAC, amplifier, buffer etc., so by making peripheral circuit carry out action according to the regulated procedure of storage in described memorizer, as function such as aforesaid valve controling circuit 33, control circuit for heater 122, secondary heater control circuits 222.

(5) structure of mass flow controller 7

Although not illustrating in detail, but described mass flow controller 7 is such as the differential mass flow controller being connected of the export mouth 11c with gasifier 1, by to make the pressure reduction of the front and back of not shown flow resistive element become in the way of namely desired value become aimed quality flow, control the flow control valve of internal setting, thus controlling the mass flow of the material gas exported from described gasifier 1.

(6) feature structure of this gasification installation 100

In the present embodiment, described gasification container 11 possesses following feature structure.

Namely, as shown in Fig. 2, Fig. 3, Fig. 5, characteristic point is in that: be provided with partition wall 6, the underlying space of vaporizer 11a is divided into the first underlying space 11e and the second underlying space 11f by described partition wall 6, described first underlying space 11e is the space of the end face side offering introducing port 11b, and described second underlying space 11f is the space of another end face side.The capacity of the first underlying space 11e is set as more than 8~10 times of the capacity of the second underlying space 11f.It addition, the superjacent air space of described vaporizer 11a is not separated but continuous.Additionally, described liquid level sensor 32 is arranged on the surface of described first underlying space 11e, the liquid level of described first underlying space 11e can be detected.

Then, features described above point is illustrated.

Gasification container 11 in present embodiment includes: in block main body 111, and being formed has bottom outlet 11h in predetermined surface (in this case upper surface) upper shed along long side direction;And plate-shaped lid 112, there is the opening of bottom outlet 11h to form described vaporizer 11a described in closing.

Such as by the upper surface drill bit etc. of metal derby part being cut (digging) processing, and cross-matrix shape multiple punching and have first underlying space 11e and the superjacent air space thereof of bottom outlet 11h described in being formed.The whole diameter of perforation 11g herein is identical, and perforation spacings is slightly larger than described penetration hole diameter.Its result, remains non-cutting tip after bit bore between each perforation 11g, in the present embodiment, by a part for non-cutting tip described in cutting, forms the multiple rubble parts 5 extending along short side direction and arranging at equal intervals along long side direction during vertical view.

These rubble parts 5 undertake the function as aforesaid heat transfer piece 5.The upper end level of described rubble part and heat transfer piece 5 is set below the opening surface of bottom outlet 11h, and described heat transfer piece 5 does not extend to the superjacent air space of vaporizer 11a.Thereby it is ensured that the gas circulation of superjacent air space.Additionally, be set to separate with the medial surface having bottom outlet 11h by each heat transfer piece 5, so that fluent material is not stored in whole first underlying space 11e stagnantly.

Additionally in the present embodiment, the quantity along the perforation 11g of short side direction arrangement is 3, and the degree of depth of the perforation 11g of central authorities is set to the depth as shallow of the perforation 11g than two ends.Thus, form, at the lower zone of the perforation 11g of described central authorities, the heater hole 11d inserted for aforementioned heater 121.

On the other hand, described partition wall 6 is configured to extend along short side direction, during vertical view, its each end is continuous with the medial surface having bottom outlet 11h, the upper end level of described partition wall 6 is set in the Near The Upper Limit of the target liquid level altitude range controlled by described import volume controlling organization 3, or above the upper limit of described target liquid level altitude range.

It addition, the upper end level of described rubble part 5 is set as identical or more lower slightly than the upper end level of described partition wall 6 with the upper end level of described partition wall 6.Additionally, described introducing port 11b is set in the position lower than the upper end level of described partition wall 6, described export mouth 11c is set in higher than the upper end level of described partition wall 6 and upper limit for height than described target liquid level altitude range position.

(7) action specification of gasification installation 100

Then, the action of the gasification installation 100 of said structure is described.

Fluent material is imported into gasification container 11 after being imported into preheating container 21 and preheating and stores, and fluent material is heated in gasification container 11 and gasifies, and becomes material gas.Described material gas exports from the export mouth 11c of gasification container 11 continuously when the mass flow controller being in described export mouth 11c downstream controls flow.

On the other hand, due to the output of material gas, the fluent material in vaporizer 11a gradually decreases, and its liquid level constantly reduces, when the liquid level of fluent material is lower than described target liquid level altitude range, import volume controlling organization 3 detects that this situation opens flow control valve 31.Then, fluent material flows into vaporizer 11a makes liquid level rise, but when described liquid level exceedes regulation target zone, import volume controlling organization 3 detects that this situation closes flow control valve 31.

So, when importing fluent material intermittently in vaporizer 11a, material gas is exported continuously from vaporizer 11a.Additionally, utilize vaporizer temperature control device 12 that the fluent material temperature in vaporizer 11a is controlled during this period, in order to the gasification remaining the regulation promoting gasification promotes temperature.

(8) effect that gasification installation 100 produces

Generally, if it is desired to the densification realizing vaporizer Simultaneous Stabilization export the material gas of big flow, be necessarily required to import the fluent material of big flow in vaporizer, its flow-control needs fast-response.Namely, become big owing to the liquid level of the fluent material in vaporizer changes speed, if so the response speed of the import volume controlling organization being made up of liquid level sensor, control circuit, flow control valve etc. can not be simply increased, then import volume controlling organization can not follow the variation speed of described liquid level, consequently, it is possible to the fault that the fluent material producing not gasify overflows from export mouth.Especially because the rate of climb of liquid level becomes quite fast, so the fast-response for the control of this situation becomes particularly significant.

To this, according to this gasification installation 100, the fluent material initially flowing into the first underlying space 11e of vaporizer 11a overflows from partition wall 6 and flows into the second underlying space 11f, in a period of time overflowed, liquid level keeps constant, add and described liquid level is set in the position more slightly higher than the upper limit of target liquid level altitude range, so the response of described import volume controlling organization 3 need not be improved limpingly, liquid level can be utilized to keep the described time of somewhat constant, fully the fluent material amount (liquid level) in vaporizer 11a is controlled as appropriate value.

Therefore, liquid level sensor 32 need not adopt response speed and the expensive sensor of sensing excellent performance, and flow control valve 31 can use cheap break-make open and close valve etc., not only controls cost, it is also possible to play compact and big quantizing such desired performance.

Additionally, when filling fluent material, when fluent material is all to the second underlying space 11f spilling, if the fluent material original state of described spilling remains and accumulates, then described second underlying space 11f is eventually full of by fluent material every time.And, once described state occurs, cannot expect that fluent material is crossed partition wall 6 from the first underlying space 11e and flowed into the second such effect of underlying space 11f subsequently, thus above-mentioned function again can not be played, namely, fluent material is utilized to make liquid level keep constant to the spilling of the second underlying space 11f, thus delaying the control time of flow control valve 31.

; due to described liquid material vaporization; described fluent material is refilled and is arrived the upper end of partition wall 6 thus again spilling into the period till the second underlying space 11f; in circulation before this to second underlying space 11f overflow liquid material vaporization and almost disappear, so the problems referred to above will not be there are.On the contrary, need to set the import volume of fluent material and the liquid level area etc. of the second underlying space 11f as follows: described fluent material is refilled and cross partition wall 6 thus again spilling into the period till the second underlying space 11f, spills into the liquid material vaporization of the second underlying space 11f and disappear in circulation before this.

On the other hand, the gasification installation 100 of present embodiment is described above, owing to being provided with multiple heat transfer piece 5 prominent from its inwall one in vaporizer 11a, the heat of self-heating device 121 transmits to fluent material efficiently in the future, even if so constantly importing the fluent material of big flow and the replacing velocity of accelerating liquid material to compact vaporizer 11a, it also is able to eliminate thing followed temperature reduce, quick heated liquid material also maintains gasification promotion temperature, it is possible to stably export material gas under big flow.Particularly in the present embodiment, described heat transfer piece 5 have employed the rubble part that perforation is formed, and its section configuration becomes with concavo-convex irregularly shaped, thus surface area is significantly increased, and can realize the conduction of heat of ultrahigh in efficiency.

Additionally, heater 121 is embedded in the inside (inserting heater hole 11d) of the metallic walls for forming gasification container 11, consider from the angle that can efficiently transmit the heat from heater 121, it helps achieve the effect above.Additionally, the leading portion at gasifier 1 arranges preheater 2, it helps the material gas stable output under big flow.This is because, temperature change when fluent material flows into vaporizer 11a diminishes, it is easy to maintain the temperature of fluent material in described vaporizer 11a.

(9) variation

It addition, the invention is not restricted to above-mentioned embodiment.

For example, it is possible to arrange the prolongation that the upper end from partition wall just extends further up.Now, by described prolongation perforate etc., it is possible to make fluent material overflow from the first underlying space to the second underlying space at the height same with above-mentioned embodiment.

In addition, as liquid level sensor, above-mentioned embodiment have employed the liquid level sensor of float-type, but heat capacity type can also be adopted (such as to make the resistance flowing through constant current become sensor main body, described resistance is made such as to generate heat with the temperature of projecting environment, the difference of the specific heat capacity of gas and liquid is utilized to make the temperature of described resistance produce change when described resistance is in gas and when soaking in a liquid, change according to consequent resistance value senses liquid level) and other ultrasonic type, static capacitive, pressure type, the various liquid level sensor such as vibration type.

As described heat capacity type liquid level sensor, for instance the heat capacity type liquid level sensor being made up of platinum temperature detecting resistance (Pt sensor) can be considered.

Additionally, as heat capacity type liquid level sensor, it may be considered that possessing the heat capacity type liquid level sensor of thermocouple temperature sensor and heating member, described heating member makes the temperature temperature higher than reference-junction of the measuring junction of described thermocouple temperature sensor.Described heating member is provided in around measuring junction or neighbouring such as Pt sensor, makes the temperature temperature higher than reference-junction of measuring junction in advance.It addition, reference-junction is arranged on the position do not heated by described heating member.Thereby, it is possible to the output (temperature of the temperature-reference-junction of measuring junction) during larger fluid material measuring junction, it is possible to the liquid level of good detection fluent material.On the other hand, when not utilizing heating member heating measuring junction, the output (temperature of the temperature-reference-junction of measuring junction) during fluent material contact thermography contact is less, it is difficult to the liquid level of good detection fluent material.This is because, the temperature of the gas phase (material after gasification) in the temperature of the liquid phase (fluent material) in vaporizer and vaporizer is substantially the same, though fluent material contact thermography contact, it is also difficult to produce temperature difference relative to reference-junction.

In above two heat capacity type liquid level sensor, if it is considered that sensor miniaturization and response, then the heat capacity type liquid level sensor that preferably platinum temperature detecting resistance (Pt sensor) is constituted.On the other hand, if it is considered that the evaluated error that the variation reducing environment temperature causes, then the heat capacity type liquid level sensor of temperature sensor and above-mentioned heating member it is preferably provided with.

And, emergent stopping mechanism can be set, namely, second liquid level sensor is set, its liquid level being capable of detecting when in vaporizer exceedes the upper end level of described target liquid level scope and partition wall and close to the situation near export mouth, when described second liquid level sensor detects that liquid level is close to, time near export mouth, closing the flow control valve importing fluent material to vaporizer, and notify the content of emergent stopping.Utilize this structure, even if there is unexpected situation (such as liquid level sensor breaks down), it is also possible to be reliably prevented the fluent material not gasified and overflow.

Heat transfer piece can be projecting from the arbitrary portion of vaporizer inwall.Same with above-mentioned embodiment, it is considered to the judicial convenience of manufacture, for instance can from the back side of lid projecting heat transfer piece integratedly.

In above-mentioned embodiment, the rubble formed because of perforation 11g partly as heat transfer piece 5, but the shape of heat transfer piece is not limited to this, it is also possible to utilize mould to be integrally formed gasification container and heat transfer piece.Additionally, above-mentioned embodiment middle punch diameter is set to identical, penetration hole diameter can also be different.

Heater can not be embedded in gasification container, but adopts the type covering gasification container surroundings.

Flow control valve is not limited to break-make open and close valve, it is also possible to be aperture continually varying type.

Additionally, this invention is not limited to above-mentioned embodiment, it is possible to carry out various deformation without departing from the scope of the subject in the invention.

Claims (7)

1. a gasification container, has vaporizer, makes the liquid material vaporization of the described vaporizer of importing and the material gas generated is derived, and described gasification container is characterised by,
Including partition wall, the underlying space of described vaporizer is separated into initial the first underlying space importing fluent material and imports the second underlying space of the fluent material overflowed from described first underlying space by described partition wall.
2. gasification container according to claim 1, it is characterized in that, fluent material starts in the target liquid level altitude range of the liquid level fluent material that is set in vaporizer overflowed to described second underlying space, or above described target liquid level altitude range.
3. gasification container according to claim 1, it is characterised in that include the multiple heat transfer pieces highlighted from the internal face of described vaporizer.
4. gasification container according to claim 3, it is characterised in that including:
In block main body, being formed has bottom outlet at predetermined surface opening;And
Lid, has the opening of bottom outlet to form described vaporizer described in closing,
Bottom outlet is had described in being formed by being bored a hole in multiple positions of the described predetermined surface of described main body,
Form the rubble between perforation and perforation partly as described heat transfer piece function.
5. gasification container according to claim 1, it is characterised in that the wall body forming described vaporizer can bury the heater for heated liquid material underground.
6. a gasifier, it is characterised in that including:
Gasification container described in any one in claim 1 to 5;And
Heater, heats described gasification container, promotes the liquid material vaporization in described vaporizer.
7. a gasification installation, it is characterised in that including:
Gasifier described in claim 6;
Liquid level sensor, detects the liquid level of the fluent material stored in described vaporizer;
Flow control valve, is arranged on the fluent material guiding in channel connected with described vaporizer;And
Controlling organization, controls described flow control valve so that the liquid level that described liquid level sensor detects is in regulation target liquid level altitude range.
CN201510802057.8A 2014-12-22 2015-11-19 VAPORIZING container, vaporizer, and VAPORIZING DEVICE CN105716224A (en)

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JP2014-259536 2014-12-22

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CN203857673U (en) * 2014-03-24 2014-10-01 孙奉仲 Constant-temperature water tank

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WO1994006529A1 (en) * 1992-09-21 1994-03-31 Mitsubishi Denki Kabushiki Kaisha Liquid gasification apparatus
US5761378A (en) * 1995-04-13 1998-06-02 Helen Of Troy Limited Hair curler steamer with PTC heater and thermally isolated cold and hot water reservoirs
US6169852B1 (en) * 1999-04-20 2001-01-02 The Hong Kong University Of Science & Technology Rapid vapor generator
JP2006045637A (en) * 2004-08-06 2006-02-16 Nuclear Fuel Ind Ltd Bubbling type vaporizer
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CN203857673U (en) * 2014-03-24 2014-10-01 孙奉仲 Constant-temperature water tank

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US20160178187A1 (en) 2016-06-23
TWI679715B (en) 2019-12-11
TW201624590A (en) 2016-07-01
JP2016119478A (en) 2016-06-30
KR20160076426A (en) 2016-06-30

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Application publication date: 20160629