CN105695992A - 一种低角度依赖的蓝色SiO2胶体晶体膜的制备方法 - Google Patents

一种低角度依赖的蓝色SiO2胶体晶体膜的制备方法 Download PDF

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CN105695992A
CN105695992A CN201610078139.7A CN201610078139A CN105695992A CN 105695992 A CN105695992 A CN 105695992A CN 201610078139 A CN201610078139 A CN 201610078139A CN 105695992 A CN105695992 A CN 105695992A
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crystal film
colloidal crystal
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王莉丽
王秀锋
刘派
伍媛婷
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Shaanxi University of Science and Technology
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer

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Abstract

本发明涉及一种低角度依赖的蓝色SiO2胶体晶体膜的制备方法，属于光子晶体结构色制备技术领域。取平均粒径为310±10nm SiO2微球，配制浓度为1-3wt％的SiO2胶体溶液，超声分散2-4h；将清洗过的基片垂直固定在超声分散的SiO2胶体溶液中，放入干燥箱中，控制干燥时间为24-30h，干燥温度为40-65℃；采用蒸镀仪在组装好的SiO2胶体晶体膜表面镀厚度为5-10nm的碳膜，提供了一种光吸收背景，使其在光子禁带的反射率增强，而对禁带以外波长的反射率降低，吸收了杂散光，宏观上呈色表现为低角度依赖性，呈现单一蓝色，不再是彩虹色。

Description

一种低角度依赖的蓝色SiO2胶体晶体膜的制备方法
技术领域
本发明属于光子晶体结构色制备技术领域，特别涉及一种低角度依赖的蓝色SiO2胶体晶体膜的制备方法。
背景技术
结构色是当光线照射到物体表面的时候，通过可见光与物质的物理上的微观结构发生相互作用，产生的对某些波长的选择性反射和透射的效应，导致我们感知到颜色。结构色现象在自然界中并不少见，比如蓝色的天空源自瑞利散射，水面上油渍的颜色源自薄膜干涉，彩虹源自折射等。结构色与物质微结构和材料性质有关，只要产生结构色的微结构极其材料的物理性质不变，结构色永不褪色。结构色是运用结构产生颜色，比色素更环保，结构色通常具有虹彩效应，所以，在替代传统色剂、防伪和装饰领域有着很广阔的应用前景。
常见的胶体晶体主要有聚苯乙烯胶体晶体，聚甲基丙烯酸甲酯胶体晶体和SiO2胶体晶体。SiO2胶体晶体以其制备工艺简单，不需要特殊的设备，制备过程不会造成任何环境污染在结构色应用方面具有潜在的优势。目前，胶体晶体的制备方法主要有电子微加工法、激光全息法和胶体自组装法等。物理制备方法一般较为复杂、费时、成本高，又需要多个步骤才能完成。相比之下，胶体自组装法是一种简单、快速和廉价的化学制备方法。然而，胶体自组装法制备的SiO2胶体晶体结构不可避免的会引入一些随机的缺陷，比如堆垛层错、粒子的缺失、取向的不可控制和位错等，这些随机缺陷会降低禁带的反射率，散射禁带以外波长的光。
目前，人工合成的SiO2胶体晶体膜通常在特定的角度反射出彩虹色，有一定的角度依赖性，也就是说SiO2胶体晶体膜的颜色不是一成不变的，会根据观察者入射光角度的不同而呈现不同的颜色，因而限制了它在防伪和装饰领域的应用。如何获得明确的单一颜色，而不是彩虹色，成为今后的一个重点研究方向。
发明内容
为了克服上述现有技术的缺点，本发明的目的在于提供一种低角度依赖的蓝色SiO2胶体晶体膜的制备方法，以解决目前SiO2胶体晶体膜呈色具有角度依赖性，呈现彩虹色，不能获得明确的单一蓝色的问题。
为了实现上述目的，本发明采用的技术方案是：
一种低角度依赖的蓝色SiO2胶体晶体膜的制备方法，包括如下步骤：
(1)取平均粒径为310±10nmSiO2微球，放入乙醇中搅拌均匀，配制浓度为1-3wt％的SiO2胶体溶液，超声分散2-4h；
(2)用去离子水清洗基片，然后分别在去离子水和乙醇中超声清洗30-90min后烘干备用，将清洗过的基片垂直固定在已超声分散的SiO2胶体溶液中，放入烘箱中24-30h缓慢烘干得到组装好的SiO2胶体晶体膜，烘干温度为40-65℃；
(3)将从烘箱中取出的SiO2胶体晶体膜放入蒸镀仪中镀碳膜，使SiO2胶体晶体膜表面的碳膜厚度为5-10nm，即可得到单一蓝色SiO2胶体晶体膜。
所述基片为玻璃基片、金属基片、有机基片等。
所述步骤(3)中，通过控制镀膜电流和碳丝的粗细实现对SiO2胶体晶体膜表面的碳膜厚度的控制。例如，设置镀膜电流为60mA。
与现有技术相比，本发明的有益效果是：
(1)本发明所得的单一蓝色SiO2胶体晶体膜微观上呈现高质量的密排六方结构，由于该胶体晶体膜表面喷涂了一层很薄的碳膜，提供了一种光吸收背景，使其在光子禁带的反射率增强，对禁带以外波长的反射率降低，同时吸收了杂散光，宏观上呈现单一蓝色(R:27G:79B:147；C:100％M:60％Y:0％K:15％)，不再是彩虹色。
(2)本发明所得的单一蓝色SiO2胶体晶体膜无毒、永不退色，是一种环境友好材料，同时，该胶体晶体膜具有不可复制性，在防伪和装饰领域有着广阔的应用前景。
(3)本发明所得的单一蓝色SiO2胶体晶体膜制备工艺简单，不需要特殊的设备，制备过程不会造成任何环境污染。
附图说明
图1和图2是本发明组装后的蓝色SiO2胶体晶体膜微观形貌图。
具体实施方式
下面结合附图和实施例详细说明本发明的实施方式。
本发明一种低角度依赖的蓝色SiO2胶体晶体膜的制备方法，包括如下步骤：
(1)取少量单分散性、均一性良好的平均粒径为310±10nmSiO2微球，放入一定量的乙醇中搅拌均匀，配制浓度为1-3wt％的SiO2胶体溶液，超声分散2-4h；
(2)用去离子水清洗基片，然后分别在去离子水和乙醇中超声清洗30-90min后烘干备用。将清洗过的基片垂直固定在已超声分散的SiO2胶体溶液中，将其移入干燥箱中，控制干燥时间为24-30h，温度为40-65℃；
(3)将从烘箱中取出的已经组装好的SiO2胶体晶体膜放入蒸镀仪中镀碳膜，设置镀膜电流为60mA，通过碳丝的粗细来调整碳膜的厚度，使SiO2胶体晶体膜表面的碳膜厚度为5-10nm，即可得到单一蓝色SiO2胶体晶体膜。
本发明得到的单一蓝色SiO2胶体晶体膜如图1和2所示，可见其微观上呈现高质量的密排六方结构，宏观上呈色表现为低角度依赖性，呈现单一蓝色，不再是彩虹色。

Claims (4)

1.一种低角度依赖的蓝色SiO2胶体晶体膜的制备方法，其特征在于，包括如下步骤：
(1)取平均粒径为310±10nmSiO2微球，放入乙醇中搅拌均匀，配制浓度为1-3wt％的SiO2胶体溶液，超声分散2-4h；
(2)用去离子水清洗基片，然后分别在去离子水和乙醇中超声清洗30-90min后烘干备用，将清洗过的基片垂直固定在已超声分散的SiO2胶体溶液中，放入烘箱中24-30h缓慢烘干得到组装好的SiO2胶体晶体膜，烘干温度为40-65℃；
(3)将从烘箱中取出的SiO2胶体晶体膜放入蒸镀仪中镀碳膜，使SiO2胶体晶体膜表面的碳膜厚度为5-10nm，即可得到单一蓝色SiO2胶体晶体膜。
2.根据权利要求1所述低角度依赖的蓝色SiO2胶体晶体膜的制备方法，其特征在于，所述基片为玻璃基片、金属基片或有机基片。
3.根据权利要求1所述低角度依赖的蓝色SiO2胶体晶体膜的制备方法，其特征在于，所述步骤(3)中，通过控制镀膜电流和碳丝的粗细实现对SiO2胶体晶体膜表面的碳膜厚度的控制。
4.根据权利要求1所述低角度依赖的蓝色SiO2胶体晶体膜的制备方法，其特征在于，所述步骤(3)中，设置镀膜电流为60mA。
CN201610078139.7A 2016-02-03 2016-02-03 一种低角度依赖的蓝色SiO2胶体晶体膜的制备方法 Pending CN105695992A (zh)

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