CN105652512A - Color filter and manufacturing method thereof - Google Patents
Color filter and manufacturing method thereof Download PDFInfo
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- CN105652512A CN105652512A CN201610243959.7A CN201610243959A CN105652512A CN 105652512 A CN105652512 A CN 105652512A CN 201610243959 A CN201610243959 A CN 201610243959A CN 105652512 A CN105652512 A CN 105652512A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Abstract
The invention provides a color filter and a manufacturing method thereof and relates to the field of a liquid crystal display. The problem of the prior art that the technique is complex because a flat layer is required to be manufactured in the manufacturing process of the color filter is solved. The embodiment of the invention provides the color filter and the manufacturing method thereof. The color filter comprises a black matrix layer and a color filtering layer, wherein the black matrix layer is formed on a substrate; the color filtering layer is formed in a sub-pixel region limited by the black matrix layer; the black matrix layer with the cross section of big-top small-bottom shape and the color filtering layer with the cross section of small-top big-bottom shape have a coincident area; and the membrane thickness in the coincident area is as same as the membrane thickness in the non-coincident area. The black matrix layer and the color filtering layer have the coincident area and the membrane thickness in the coincident area is as same as the membrane thickness in the non-coincident area, so that the manufacturing for the flat layer is not required and the manufacturing technique is simple.
Description
Parent application number: 201210050318.1, the applying date: on February 29th, 2012
Technical field
The present invention relates to field of liquid crystal, particularly relate to a kind of colored filter and manufacture method thereof.
Background technology
Liquid crystal display (LiquidCrystalDisplay, LCD) for the original paper of non-active luminescence, must be transmitted through the backlight of inside and light source is provided, collocation drives IC and LCD Controlling, the GTG forming dichromatism black, white shows, again through colored filter (ColorFilter, CF) red (R), green (G), blue (B) three kinds of chromatic filter layers form colored display picture, therefore, colored filter is the key components and parts of liquid crystal display colorization. Quality own not only determines the quality of LCDs, and also determines the yield of subsequent technique.
When current technique makes colored filter, chromatic filter layer needs and some overlapping region of black matrix, the purpose of this way is to avoid light leak, owing to chromatic filter layer volume when baking can shrink, if chromatic filter layer does not overlap with black matrix during design, that very easily causes light leak defect after baking. Although this way avoids light leak, but the region that chromatic filter layer overlaps with black matrix is higher than sub-pixel district and so-called " section is poor ". Box technique is had very adverse influence by follow-up by section difference, can upset the orientation of liquid crystal, therefore to make flatness layer (OC) when making colored filter, eliminate section poor, add a step processing technology.
As can be seen here prior art exists, the problem needing to make flatness layer complex process in the manufacturing process of colored filter.
Summary of the invention
It is an object of the invention to for existence in prior art, the problem needing to make flatness layer complex process in the manufacturing process of colored filter, the embodiment of the present invention provide a kind of colored filter and manufacture method, this colored filter includes, including the black matrix layer being formed on substrate, and it is formed at the color layers on the sub-pixel region that black matrix layer limits, its middle section is the black matrix layer of up big and down small shape, with the region that the chromatic filter layer that cross section is lower big little correspondingly-shaped has coincidence, and the thicknesses of layers of overlapping region is identical with the thicknesses of layers in non-coincidence region,
Black matrix layer cross section is shaped as falling from power stepped, first sublayer narrower including lower width and wider the second sublayer of upper width, and the cross sectional shape of chromatic filter layer is positive step;
Wherein the sensitive material one of the first sublayer neutralizes in the sensitive material two of the second sublayer and all includes alkali soluble resin, the content of the alkali soluble resin of sensitive material one is more than the content of the alkali soluble resin of sensitive material two, sensitive material one and sensitive material two be, positive photoetching rubber or negative photoresist.
Further, the alkali soluble resin percentage by weight of sensitive material one is 5%-79%, and the alkali soluble resin percentage by weight of sensitive material two is 0.05%-30%.
Further, sensitive material one also includes: percentage by weight is the mineral black of 5%-45%, percentage by weight is the dispersant of 0.5%-67%, percentage by weight is the dispersion resin of 0.05%-30%, percentage by weight is the unsaturated vinyl monomer of 2%-25%, percentage by weight is the epoxy resin of 0.05%-10%, percentage by weight is the solvent of 20%-80%, percentage by weight is the light initiator of 0.05%-10%, percentage by weight is the capillary additive of change of 0.01%-2%, and sensitive material two also includes: percentage by weight is the mineral black of 5%-45%, percentage by weight is the dispersant of 0.5%-67%, percentage by weight is the dispersion resin of 0.05%-30%, percentage by weight is the unsaturated vinyl monomer of 2%-25%, percentage by weight is the epoxy resin of 0.05%-10%, percentage by weight is the solvent of 20%-80%, percentage by weight is the light initiator of 0.05%-10%, percentage by weight is the capillary additive of change of 0.01%-2%.
Further, changing capillary additive is levelling agent, planarization agent and silane coupler.
Further, unsaturated vinyl monomer is multi-functional acrylate's monomer.
The embodiment of the present invention also provides for the manufacture method of a kind of colored filter, is used for manufacturing colored filter as the aforementioned, including:
The sensitive material one of black matrix layer is applied to substrate surface;
Black matrix sensitive material two is applied on the black matrix layer that material is sensitive material one, sensitive material one and sensitive material two are positive photoetching rubber, or sensitive material one and sensitive material two are negative photoresist, wherein sensitive material one neutralizes and all includes alkali soluble resin in sensitive material two, and the content of the alkali soluble resin of sensitive material one is more than the content of the alkali soluble resin of sensitive material two;
Adopting mask plate that sensitive material one and sensitive material two are exposed, and develop, Formation cross-section is the black matrix layer of up big and down small shape, and the sub-pixel region that cross section is lower big little correspondingly-shaped;
Chromatic filter layer is formed in sub-pixel region.
Further, after the sensitive material one of black matrix layer is applied to substrate surface, carry out front baking, afterwards black matrix sensitive material two be applied on black matrix sensitive material one and carry out baking before once again.
Owing to black matrix layer and chromatic filter layer have the region of coincidence, and the thicknesses of layers of overlapping region is identical with the thicknesses of layers in non-coincidence region, and from without making flatness layer, manufacturing process is simple.
Accompanying drawing explanation
Fig. 1 is colorful filter structure figure provided by the invention;
Fig. 2 is the double exposure manufacture method flow chart of colored filter provided by the invention;
Fig. 3 is the colorful filter structure figure with sub-pixel region provided by the invention;
Fig. 4 is the single exposure manufacture method flow chart of colored filter provided by the invention.
Detailed description of the invention
For making embodiments of the invention solve the technical problem that, technical scheme and advantage clearly, be described in detail below in conjunction with the accompanying drawings and the specific embodiments.
The embodiment that the present embodiment provides is a kind of colored filter, as shown in Figure 1, including, it is formed at the black matrix layer 20 on substrate 10, and it is formed at the chromatic filter layer 30 on the sub-pixel region that black matrix layer 20 limits, its middle section is the black matrix layer 20 of up big and down small shape, and the chromatic filter layer 30 that cross section is lower big little shape has the region 40 of coincidence, and the thicknesses of layers of overlapping region is identical with the thicknesses of layers in non-coincidence region 41.
Region 40 owing to overlapping is identical with the thicknesses of layers in non-coincidence region 41 as shown in Figure 1, from without making flatness layer, simplifies manufacturing process.
As one of them preferred scheme, black matrix layer 20 cross sectional shape is stepped for falling from power, first sublayer 21 narrower including lower width and wider the second sublayer 22 of upper width, and the cross sectional shape of chromatic filter layer 30 is positive step.
As one of them preferred scheme, black matrix layer 20 cross sectional shape is the inverted trapezoidal that longer bottom, upper base is shorter.
As one of them preferred scheme, black matrix layer 20 cross sectional shape is del.
One preferred scheme of the present embodiment is the first sublayer 21 and the second sublayer 22 adopts photoresist of different nature, and photoresist, according to its chemical reaction mechanism and development principle, can divide negative photoresist and positive photoresist two class. What form insoluble material after illumination is negative photoresist; Otherwise, it is insoluble to some solvent, what become soluble substance after illumination is positive photoresist. Detailed description is exactly the sensitive material one of the first sublayer 21 is positive photoetching rubber, then the sensitive material two of the second sublayer 22 is exactly negative photoresist, and the sensitive material one of the first sublayer 21 is negative photoresist, then the sensitive material two of the second sublayer is exactly positive photoetching rubber.
One preferred scheme of the present embodiment is the photoresist that the first sublayer 21 and the second sublayer 22 adopt same nature, that is sensitive material one and sensitive material two are positive photoetching rubber, or sensitive material one and sensitive material two are negative photoresist, being a difference in that of sensitive material one and sensitive material, both alkali soluble resin content is different, and the content of the alkali soluble resin of sensitive material one is more than the content of the alkali soluble resin of sensitive material two. as preferably scheme, the alkali soluble resin percentage by weight of sensitive material one is 5%-79%, the alkali soluble resin percentage by weight of sensitive material two is 0.05%-30%, so when development, identical alkali-soluble agent is adopted can easier to obtain wider the second sublayer 22 of the first narrower sublayer 21 of cross section and cross section, thus obtaining the black matrix layer 20 that cross section is up big and down small shape. following component and ratio can be adopted during actual enforcement, sensitive material one includes: percentage by weight is the mineral black of 5%-45%, percentage by weight is the dispersant of 0.5%-67%, percentage by weight is the dispersion resin of 0.05%-30%, percentage by weight is the alkali soluble resin of 5%-79%, percentage by weight is the unsaturated vinyl monomer of 2%-25%, percentage by weight is the epoxy resin of 0.05%-10%, percentage by weight is the solvent of 20%-80%, percentage by weight is the light initiator of 0.05%-10%, percentage by weight is the capillary additive of change of 0.01%-2%.Sensitive material two includes: percentage by weight is the mineral black of 5%-45%, percentage by weight is the dispersant of 0.5%-67%, percentage by weight is the dispersion resin of 0.05%-30%, percentage by weight is the alkali soluble resin of 0.05%-30%, percentage by weight is the unsaturated vinyl monomer of 2%-25%, percentage by weight is the epoxy resin of 0.05%-10%, percentage by weight is the solvent of 20%-80%, percentage by weight is the light initiator of 0.05%-10%, percentage by weight is the capillary additive of change of 0.01%-2%.
The present embodiment changes capillary additive and can adopt levelling agent, planarization agent and silane coupler. Unsaturated vinyl monomer is multi-functional acrylate's monomer.
Another embodiment provided by the invention is the manufacture method of a kind of colored filter, is used for manufacturing colored filter as the aforementioned, as in figure 2 it is shown, include:
Step 101, positive photoetching rubber is applied to substrate surface.
Step 102, negative photoresist is applied on positive photoetching rubber.
Negative photoresist is exposed, and develops by step 103, employing mask plate.
Step 104, directly positive photoetching rubber being exposed, and develop, Formation cross-section is black matrix layer and the sub-pixel region of up big and down small shape.
Step 105, sub-pixel region formed chromatic filter layer.
The present embodiment is thereon coats positive photoetching rubber, positive photoetching rubber scribbles negative photoresist, mask plate is adopted to be placed on negative photoresist, the region that hope is remained is exposed, corresponding solvent is adopted to develop again, owing to for corresponding solvent, forming insolubility material after negative photoresist exposure, region without exposure is solable matter, and the negative photoresist so carrying out development post-exposure district is retained. At step 104, do not use mask plate, directly positive photoetching rubber is exposed, and develop, all being exposed beyond the negative photoresist overlay area retained in upper step owing to removing, form solable matter after positive photoetching rubber exposure, the region without exposure remains insolubility material. Simultaneously because the marginal portion below negative photoresist overlay area, inevitably it is subject to certain illumination, also solable matter can be formed, the region that after development, positive photoetching rubber retains will be slightly less than the region that negative photoresist retains, and then as it is shown on figure 3, on the substrate 10 Formation cross-section be the sub-pixel region 31 of the black matrix layer 20 of up big and down small shape and corresponding up-small and down-big shape. Last as it is shown in figure 1, form chromatic filter layer 30 in sub-pixel region. In order to ensure that positive photoetching rubber and negative photoresist will not interpenetrate, after positive photoetching rubber is applied to substrate surface, carry out front baking, afterwards negative photoresist be applied on positive photoetching rubber and carry out baking before once again.
Wherein in step 101, it is also possible to be that negative photoresist is applied to substrate surface, in a step 102, positive photoetching rubber is applied on negative photoresist simultaneously. Adopt mask plate that the positive photoetching rubber on upper strata is exposed in step 103, and develop. Directly negative photoresist being exposed, and develop at step 104, Formation cross-section is black matrix layer and the sub-pixel region of up big and down small shape.
Another embodiment provided by the invention is the manufacture method of a kind of colored filter, is used for manufacturing colored filter as the aforementioned, as shown in Figure 4, and including:
Step 201, the sensitive material one of black matrix layer is applied to substrate surface.
Step 202, black matrix sensitive material two is applied on the black matrix layer that material is sensitive material one.
Sensitive material one and sensitive material two are exposed, and develop by step 203, employing mask plate, and Formation cross-section is the black matrix layer of up big and down small shape, and the sub-pixel region that cross section is lower big little correspondingly-shaped.
Step 204, sub-pixel region formed chromatic filter layer.
In the present embodiment, sensitive material one and sensitive material two are positive photoetching rubber, or sensitive material one and sensitive material two are negative photoresist, wherein sensitive material one neutralizes and all includes alkali soluble resin in sensitive material two, and the content of the alkali soluble resin of sensitive material one is more than the content of the alkali soluble resin of sensitive material two. it is negative photoresist for sensitive material one and sensitive material two, adopt mask plate that sensitive material one and sensitive material two are exposed, mask plate is placed on sensitive material two rete the region that hope is remained and is exposed, corresponding solvent is adopted to develop again, due to for corresponding solvent, insolubility material is formed after negative photoresist exposure, region without exposure is solable matter, the negative photoresist so carrying out development post-exposure district is retained, for the present embodiment, sensitive material one is identical with the exposure region of sensitive material two place rete, content due to the alkali soluble resin of following one layer of sensitive material one, content more than the alkali soluble resin of above one layer of sensitive material two. during development, what one layer of sensitive material one was washed away below is more, and above one layer of sensitive material two washed away less, and then as it is shown on figure 3, on the substrate 10 Formation cross-section be the sub-pixel region 31 of the black matrix layer 20 of up big and down small shape and corresponding up-small and down-big shape. last as it is shown in figure 1, form chromatic filter layer 30 in sub-pixel region. in order to ensure that positive photoetching rubber and negative photoresist will not interpenetrate, after positive photoetching rubber is applied to substrate surface, carry out front baking, afterwards negative photoresist be applied on positive photoetching rubber and carry out baking before once again.
It is last it is noted that above example is only limited in order to technical scheme to be described, although the present invention being described in detail with reference to preferred embodiment, it will be understood by those within the art that: technical scheme still can be modified or equivalent replace by it, and these amendments or be equal to replacement amended technical scheme also can not be made to depart from the spirit and scope of technical solution of the present invention.
Claims (7)
1. a colored filter, including the black matrix layer being formed on substrate, and it is formed at the chromatic filter layer on the sub-pixel region that black matrix layer limits, it is characterized in that, its middle section is the black matrix layer of up big and down small shape, it is that the lower greatly above chromatic filter layer of little correspondingly-shaped has the region of coincidence with cross section, and the thicknesses of layers of overlapping region is identical with the thicknesses of layers in non-coincidence region;
Black matrix layer cross section is shaped as falling from power stepped, first sublayer narrower including lower width and wider the second sublayer of upper width, and the cross sectional shape of chromatic filter layer is positive step;
Wherein the sensitive material one of the first sublayer neutralizes in the sensitive material two of the second sublayer and all includes alkali soluble resin, the content of the alkali soluble resin of sensitive material one is more than the content of the alkali soluble resin of sensitive material two, sensitive material one and sensitive material two be, positive photoetching rubber or negative photoresist.
2. colored filter according to claim 1, it is characterised in that the alkali soluble resin percentage by weight of sensitive material one is 5%-79%, the alkali soluble resin percentage by weight of sensitive material two is 0.05%-30%.
3. colored filter according to claim 2, it is characterised in that sensitive material one also includes: percentage by weight is the mineral black of 5%-45%, percentage by weight is the dispersant of 0.5%-67%, percentage by weight is the dispersion resin of 0.05%-30%, percentage by weight is the unsaturated vinyl monomer of 2%-25%, percentage by weight is the epoxy resin of 0.05%-10%, percentage by weight is the solvent of 20%-80%, percentage by weight is the light initiator of 0.05%-10%, percentage by weight is the capillary additive of change of 0.01%-2%, and sensitive material two also includes: percentage by weight is the mineral black of 5%-45%, percentage by weight is the dispersant of 0.5%-67%, percentage by weight is the dispersion resin of 0.05%-30%, percentage by weight is the unsaturated vinyl monomer of 2%-25%, percentage by weight is the epoxy resin of 0.05%-10%, percentage by weight is the solvent of 20%-80%, percentage by weight is the light initiator of 0.05%-10%, percentage by weight is the capillary additive of change of 0.01%-2%.
4. colored filter according to claim 3, it is characterised in that changing capillary additive is levelling agent, planarization agent and silane coupler.
5. colored filter according to claim 3, it is characterised in that unsaturated vinyl monomer is multi-functional acrylate's monomer.
6. a manufacture method for colored filter, for manufacturing the colored filter as described in claim 1-5 any claim, it is characterised in that including:
The sensitive material one of black matrix layer is applied to substrate surface;
Black matrix sensitive material two is applied on the black matrix layer that material is sensitive material one, sensitive material one and sensitive material two are positive photoetching rubber, or sensitive material one and sensitive material two are negative photoresist, wherein sensitive material one neutralizes and all includes alkali soluble resin in sensitive material two, and the content of the alkali soluble resin of sensitive material one is more than the content of the alkali soluble resin of sensitive material two;
Adopting mask plate that sensitive material one and sensitive material two are exposed, and develop, Formation cross-section is the black matrix layer of up big and down small shape, and the sub-pixel region that cross section is lower big little correspondingly-shaped;
Chromatic filter layer is formed in sub-pixel region.
7. the manufacture method of colored filter according to claim 6, it is characterized in that, after the sensitive material one of black matrix layer is applied to substrate surface, carry out front baking, afterwards black matrix sensitive material two be applied on black matrix sensitive material one and carry out baking before once again.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201610243959.7A CN105652512A (en) | 2012-02-29 | 2012-02-29 | Color filter and manufacturing method thereof |
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| CN201610243959.7A CN105652512A (en) | 2012-02-29 | 2012-02-29 | Color filter and manufacturing method thereof |
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| CN201210050318.1A Division CN102707357B (en) | 2012-02-29 | 2012-02-29 | Colored filter and manufacture method thereof |
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| CN105652512A true CN105652512A (en) | 2016-06-08 |
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| CN111266934A (en) * | 2020-02-29 | 2020-06-12 | 湖南大学 | Method for manufacturing ion beam polished monolithic integrated Fabry-Perot cavity full-color filter in large batch |
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| CN108121156A (en) * | 2017-12-12 | 2018-06-05 | 深圳市晶特智造科技有限公司 | Photoresist step cutting pattern production method |
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