CN105590828B

CN105590828B - Double multipole convergence ion guides, hyperbolic ion guide and method

Info

Publication number: CN105590828B
Application number: CN201510752359.9A
Authority: CN
Inventors: L·霍华德; J·L·伯奇; K·R·牛顿
Original assignee: Agilent Technologies Inc
Current assignee: Agilent Technologies Inc
Priority date: 2014-11-11
Filing date: 2015-11-06
Publication date: 2018-01-12
Anticipated expiration: 2035-11-06
Also published as: US9449804B2; DE102015222258B4; DE102015222258A1; US20160133452A1; CN105590828A

Abstract

It is disclosed double fields multipole convergence ion guide, hyperbolic ion guide and method.Ion guide generates：First RF fields of N ranks, wherein, N is equal to or the integer more than 2；And the 2nd RF fields of 2N ranks, it is superimposed upon on the first RF fields.Corresponding first and second electrode sets can generate the first and second RF fields.Another ion guide can include convergence inlet part, thereafter exit part.The contraction section can have hyperbolic profile.Hyperbolic profile can be presented with the electrode that the torsion relative to ion guide axle configures.

Description

Double multipole convergence ion guides, hyperbolic ion guide and method

Technical field

The present invention relates to the ion guide that can be for example utilized in spectrometer system.

Background technology

Mass spectrograph (MS) system generally includes the ion gun of the molecule for ionizing interest sample, is followed by providing various functions One or more plasma processing apparatus, be followed by for different mass-to-charge ratioes (or m/z ratios, or more simply " matter based on ion Amount ") mass analyzer that is separated to it, it is followed by the ion detector that the ion of quality classification is reached.MS analyses produce Mass spectrum, its for the relative abundance of the detected ion of instruction a series of peak values as their m/z than function.

The ion guide of gas filling is the ion processing in the processing stream between ion gun and mass analyzer The example of equipment.The ion guide of gas filling can be located near ion gun, here, ion guide can pass ion Send by one or more pressure reduction stages, it reduces down gas pressure to the low-down operation of the analyzer part of system in succession Pressure (high vacuum).The ion guide of gas filling can also be located in collision junior unit, here, ion guide can be used Make collision junior unit, or can be used for reducing beam dimensions, for the rear class of system.In both cases, ion guides Device serves multiple functions：A) ion is transported through by the region containing gas, b with seldom ion loss) ion is transmitted By vacuum level (decompression) wall, c) reduce the emittances (the smaller product for obtaining beam cross-section and divergence) of ion beams, d) All foregoing functions are completed close in the whole mass range of instrument.

The a large amount of existing designs for fairly good completing many targets in these targets are available.However, on from , lasting demand be present in the further improvement in terms of the design and performance of sub- guiding device.For example, it is desirable in wider mass range And/or with compared to the improvement that ion transmission is carried out for the possible bigger pressure drop of current design.Draw it is also expected to reducing current ion Lead the cost of device or the system comprising them.

The content of the invention

Solve foregoing problems and/or those skilled in the art have been observed other problems in order to all or part of, this It is open that the method described in implementation presented below, processing, system, device, instrument by way of example are provided And/or equipment.

According to one embodiment, a kind of ion guide, including：Entrance point；The port of export, it is along guiding device wheelbase institute State at entrance point distance；First RF field generators, its be configured to generate N ranks the first RF fields, wherein, N be equal to or Integer more than 2, the first RF field generators include along the guiding device axle extending and relative to the guiding device axle Circumferentially spaced multiple first electrodes, wherein, the first electrode is around between the entrance point and the port of export Guiding device volume；And the 2nd RF field generator, its be configured to the 2N ranks that generation is superimposed upon on the first RF fields and The 2nd RF fields penetrated between each first electrode, the 2nd RF field generators include one or more second electrodes.

According to another embodiment, a kind of ion guide, including：Entrance point；The port of export, it is along guiding device wheelbase institute State at entrance point distance；And multiple electrodes, it extends to the port of export from the entrance point, and draws relative to described It is circumferentially spaced to lead device axle, the multiple electrode configures including hyperbolic so that the electrode is inscribed to have to be drawn relative to described The guiding device volume from the entrance point to the port of export for the hyperbolic radial boundary led device axle and scanned.

According to another embodiment, a kind of ion guide, including：Entrance point；The port of export, it is along guiding device wheelbase institute State at entrance point distance；And multiple electrodes, it extends to the port of export from the entrance point, and draws relative to described Lead that device axle is circumferentially spaced, the multiple electrode is oriented with the windup-degree relative to the guiding device axle, wherein, it is described Electrode is inscribed with the hyperbolic radial boundary scanned relative to the guiding device axle from the entrance point to the port of export Guiding device volume.

According to another embodiment, a kind of method for being used to assemble ion beams, including：The ion beams are sent and passed through Ion guide, the ion guide include：Entrance point；The port of export, its along entrance point described in guiding device wheelbase certain At distance；And multiple multipole electrodes, it is around the guiding device volume between the entrance point and the port of export；Sending institute While stating ion beams, the first RF fields of N ranks are applied to the ion beams, wherein, N is equal to or whole more than 2 Number；And the 2nd RF fields of 2N ranks are applied to the ion beams, wherein, the 2nd RF fields are superimposed upon the first RF On field, and penetrated between each multipole electrode.

According to another embodiment, a kind of method for being used to assemble ion beams, including：Send the ion beams by from Sub- guiding device, the ion guide include：Entrance point；The port of export, its along entrance point described in guiding device wheelbase certain away from From place；And multiple electrodes, it extends to the port of export from the entrance point, and relative to the guiding device axle in circumference Upper interval, the multiple electrode configure including hyperbolic so that the electrode is inscribed to have and scanned relative to the guiding device axle Hyperbolic radial boundary the guiding device volume from the entrance point to the port of export；And sending the ion beams Meanwhile radial direction RF containing fields are applied to the ion beams.

According to another embodiment, a kind of method for being used to assemble ion beams, including：Send the ion beams by from Sub- guiding device, the ion guide include：Entrance point；The port of export, its along entrance point described in guiding device wheelbase certain away from From place；And multiple electrodes, it extends to the port of export from the entrance point, and relative to the guiding device axle in circumference Upper interval, the multiple electrode are oriented relative to the guiding device axle with windup-degree, wherein, the electrode is inscribed to have phase The guiding device volume from the entrance point to the port of export of the hyperbolic radial boundary scanned for the guiding device axle；With And while the ion beams are sent, radial direction RF containing fields are applied to the ion beams.

According to another embodiment, a kind of spectrometer system is configured to carry out any method disclosed herein.

According to another embodiment, a kind of spectrometer system, including：Ion gun and/or ion detector；And as this institute Ion guide described in disclosed any embodiment.

When checking the following drawings and embodiment, miscellaneous equipment of the invention, device, system, method, feature with And advantage will be or will be clear for those skilled in the art.It is intended to all these spare systems, method, feature and advantage It is included in the description, within the scope of the invention, and is protected by appended claims.

Brief description of the drawings

By referring to the following drawings, the present invention may be better understood.Component in accompanying drawing is not necessarily to scale, but The principle of the present invention is shown emphatically.In the accompanying drawings, identical reference specifies corresponding part through different accompanying drawings.

Fig. 1 is according to the schematic side of the example of the ion guide of some embodiments (length to) view.

Fig. 2A is the perspective view according to one end (import or export) of the example of the first electrode set of some embodiments.

Fig. 2 B are the perspective views of two in each first electrode shown in the Fig. 2A being electrically interconnected.

Fig. 3 A are the examples according to first electrode set of some embodiments at entrance point and second electrode set (in transverse plane) schematic end.

Fig. 3 B are in the first electrode set shown in the end of ion inlet orifice part or Fig. 3 A at ion outlet end (in transverse plane) schematic end.

Fig. 4 is according to the side of another example of the ion guide of some embodiments (length to) view.

Fig. 5 A are having according to described by the hyperbolic surface scanned relative to ion guide axle of some embodiments The side view (y-z plane) of the example of the guiding device volume of hyperbolic radial boundary.

Fig. 5 B are the perspective views of the guiding device volume shown in Fig. 5 A.

Fig. 6 A are the (transverse planes according to the example of the first electrode set at ion inlet orifice end of some embodiments In) end-view.

Fig. 6 B are the perspective views of the first electrode set shown in Fig. 6 A.

Fig. 7 A are according to side cross-sectional view of the configuration of some embodiments as the example of the second electrode of tapered solid wall.

Fig. 7 B are configuration the cutting as the example of taper grid or multiple second electrodes of grid according to some embodiments Surface side view.

Fig. 7 C are multiple axles of the diameter with successive reduction on the direction of ion processing stream according to some embodiments To the side cross-sectional view of the example of the annular second electrode at ground interval.

Embodiment

Fig. 1 is according to the schematic side of the example of the ion guide 100 of some embodiments (length to) view.Ion Guiding device 100 is generally with the length along longitudinal axis or ion guide axle 104 and orthogonal with ion guide axle 104 Transverse plane in lateral cross section.The geometry of the one or more assemblies of ion guide 100 guides relative to ion Device axle 104 can be symmetrical, and in the case, ion guide axle 104 is considered as central shaft.For the purpose of reference, Fig. 1 provides cartesian coordinate system, wherein, z-axis corresponds to ion guide axle 104, and the section of ion guide 100 is positioned at horizontal stroke Into x-y plane.According to Fig. 1 visual angle, overall ion is advanced generally along the ion guide axle for being considered as ion optical axis 104 are from left to right oriented to.

Ion guide 100 generally includes：Ion inlet orifice end 108；Ion outlet end 112, it, which is deployed in along ion, draws Device axle 104 is led at certain distance of sub- entrance point 108；Shell 116, it encapsulates ion inlet orifice end 108 and ion outlet end 112 Between ion guide 100 intraware.At the ion inlet orifice end 108 from upstream equipment (for example, such as ion gun, on Swim ion guide, ion trap, mass filter, fragment ions equipment etc.) receive ion.For this purpose, ion inlet orifice End 108 can include the gas conduction limiting aperture on ion guide axle 104, and can also include people in the art The associate ion optical device that member is understood.In the example shown, slash (skimmer) plate 120 is divided (also referred to as to divide slash to bore or sample Cone) alignedly it is arranged on the aperture at ion inlet orifice end 108 on shell 116, this helps to prevent undesired neutral molecule from entering Enter ion guide 100.Ion is emitted into upstream device (for example, such as downstream ion guides from ion outlet end 112 Device, ion trap, mass filter, fragment ions equipment, ion beams cooler, mass analyzer etc.).For this purpose, Ion outlet end 112 can include the gas conduction limiting aperture on longitudinal axis 104, and can also include associate ion light device Part.

Ion guide 100 be configured to diametrically by ion be closed to along ion guide axle 104 assemble from Sub-beam.That is, ion guide 100 be configured to allow ion flow through in the axial direction while about beam ion in footpath Motion on to direction (in the horizontal x-y plane in Fig. 1).Ion guide 100 is also configured to assemble ion beams, that is, receives Hold back the volume occupied by ion phase space.In this way, ion beams have at ion inlet orifice end 108 and caused from previous The maximized relatively large beam acceptance (admittance) of the ioncollection of plasma processing apparatus, and at ion outlet end 112 Place is with the maximized relatively small beam emittance of ion transmission caused into subsequent ion processing equipment.Therefore, ion Guiding device 100, which is configured to send ion in a manner of causing the loss of ion to minimize, passes through ion guide 100.One In a little embodiments, ion guide 100 can also be configured to ion is advanced through ion guide 100 and in the axial direction Accelerate them, to prevent stall, and/or in other embodiments, to promote fragment ions.Alternatively or additionally, this area It should be understood to the one skilled in the art that it can configure and be located at ion inlet orifice end 108 and ion outlet end 112 (near or) for this purpose Ion optical device.In certain embodiments, ion guide 100 may be configured to reduce kinetic energy (the i.e. cooling or " heat of ion Change " ion), in this case, it is possible to utilize inert buffer gas (such as nitrogen in the ion guide 100 for being suitable for cooling Gas, argon gas etc.).In some embodiments of necessary tandem mass spectrometry, ion guide 100 may be configured to crack (precursor Or " parent ") ion, (product or " daughter ") ion is cracked to produce, in this case, it is possible to for collision induced dissociation (CID) appropriate pressure, which is in ion guide 100, utilizes inert buffer gas (such as nitrogen, argon gas etc.).

In certain embodiments, ion guide 100 includes the first RF field generators, and it is configured to generate N ranks Two-dimentional multipole RF radial-sealings field (the first RF fields), wherein, N is equal to or the integer more than 2.The example of N rank RF fields includes But it is not limited to quadrupole (N=2), sextupole (N=3) and the ends of the earth (N=4) field.Therefore, the first RF field generators can include electrode Linear (two dimension) multipole arrangement.More specifically, the first RF field generators can include multiple first electrodes 124, its along from Sub- guiding device axle 104 extends and circumferentially spaced relative to ion guide axle 104, thus around can diametrically seal Close the ion guide volume axially extended of ion.For simplicity, Fig. 1 only show one of first electrode 124 to It is right, typically provide one or more additional counter electrode pairings wherein should be understood that.

Ion guide 100 also includes RF voltage sources, and it is connected with first electrode 124, and such as the first RF voltage sources 128 show As describing to meaning property.In certain embodiments, RF voltage sources (such as the first RF voltage sources 128) are considered as the first RF A part for field generator.First RF voltages are applied to first electrode 124, the sound of first electrode 124 by the first RF voltage sources 128 The first RF fields should be generated in ion guide volume in this.Parameter (RF driving frequencies Ω, the amplitude V of first RF voltages_RFWith Phase) ion that is chosen so as to desired qualities scope (m/z scopes) is diametrically enclosed in ion and draws in a stable manner Lead in device volume.In certain embodiments so that be the mass range stablized in guiding device volume in the radial motion of ion It is as wide as possible.Generally, RF driving frequencies Ω and amplitude V_RFIt is straight with the desired qualities scope and minimum encapsulation of ion guide volume Footpath and demarcate.As a non-limiting example, minimum for about 2.3mm encapsulates diameter and from about 50Da to about 3000Da mass range, RF driving frequencies Ω can be 9MHz, and zero arrives the amplitude V of peak value_RFCan be about 110V.One In a little embodiments, direct current (DC) the voltage U of desired value_DCIt can be superimposed upon on the first RF voltages so that the first RF fields are to close Into RF/DC fields, it can be carried out with according to it is expected to repair stable mass range, as understood by those skilled in the art that Sample.

Ion guide 100 can also include DC voltage source, and it is connected with first electrode 124, such as the first DC voltage source 132 As schematically describing.DC voltage source 132 can be by way of generating axial DC potential gradients by the first D/C voltage V_DC First electrode 124 is applied to, therefore ensures that ion continues to drift about in the forward direction, even because multiple with buffer gas Collision and after kinetic energy loss.It should be noted that axial DC potential gradients as a part for two-dimentional radial-sealing field with can add Above-mentioned D/C voltage U_DCBe separation and it is distinguishing.

The pole that the quantity of the first electrode 124 utilized can correspond in the first RF fields that first electrode 124 is generated Quantity.Thus, for example, four electrodes can generate quadrupole field, six electrodes can generate hexapole field, and eight electrodes can give birth to Into ends of the earth field, the rest may be inferred.Along this compared with each first electrode 124 is in the section in for the horizontal plane of an axle Each first electrode 124 that axle slightly extends can be regarded as rod, therefore be properly termed as bar.In fact, it is expected exponent number It is achievable that pure or preferable multipole fields, which are attributed to the inevitable finite size of bar and are not,.In certain embodiments, each The section of bar can be bending.That is, at least a portion on each bar or its surface inside guiding device can be with Equipped with the engineering profile of the purity of enhancing multipole fields.For example, the section of each bar can be presented inside guiding device Hyperbolic surface.However, being attributed to the fact that hyperbolic surface is physically blocked, gained multipole fields are still undesirable, because while One or more higher order fields have insignificant influence on ion motion, but these higher order fields intrinsically produced may fold It is added in desired multipole fields.In certain embodiments, bar can be shaped as straight circular cylinder (cylinder with circular cross-section), It is compromise between the degree of field purity realized that this can represent manufacturing cost.In other embodiments, bar can be more Side shape (such as bar shaped).

In certain embodiments, first electrode 124 is considered as including entering along the ion that ion guide axle 104 extends Oral area point 136 and ion outlet part 140.Ion inlet orifice part 136 extends and is transitioned into ion from ion inlet orifice end 108 Oral area point 140, ion outlet part 140 extends to ion outlet end 112.In ion inlet orifice part 136, first electrode set 124 have convergence (taper) geometry.Therefore, in ion inlet orifice part 136, first electrode 124 is oriented in towards ion On the direction that guiding device axle 104 points to so that on the direction towards ion outlet end 112, first electrode 124 is circular Circle spacing between the area of section of guiding device volume and each adjacent first electrode 124 is to reduce.In ion outlet part In 140, first electrode set 124 can have straight or substantially geometry, wherein, each first electrode 124 parallel to Or it is arranged essentially parallel to guiding device axle 104.In certain embodiments, ion outlet part 140 can dissipate, or ion outlet portion Points 140 a part of can dissipate for example at ion outlet end 112.Therefore, guiding device volume is in ion inlet orifice part 136 In be taper, and be cylindrical, substantially cylinder-shaped, diverging in ion outlet part 140 or partly dissipate.In ion In inlet part 136, the convergence geometry of first electrode 124, the first RF fields aggregation ion beams are attributed to.Therefore, beam Emittance is reduced in the transition position from convergence geometry to straight geometry from the maximum at ion inlet orifice end 108 Minimum value.In ion outlet part 140, the ion that the first RF fields can greatly retain up to ion outlet end 112 is penetrated The emittance of the reduction of beam.

First electrode 124 generally can extend to ion outlet end 112 along guiding device axle 104 from ion inlet orifice end 108. Depending on embodiment, ion inlet orifice end 108 can correspond to one end of shell 116, first electrode 124 one end or the two (i.e. Each end of shell 116 and first electrode 124 can be generally at same axial position).Similarly, ion outlet end 112 can With the opposite end corresponding to shell 116, first electrode 124 opposite end or the two.According to any of unknown or later exploitation Suitable technology, first electrode 124 can be assembled, be aligned and in ion guide 100, and be coupled to electronics and set It is standby.

The axial length of ion inlet orifice part 136 can be identical or different with the axial length of ion outlet part 140. In some embodiments, in view of promoting specific function (such as such as ion cooling, decompression etc.), ion outlet part can be selected 140 axial length.

In certain embodiments, ion guide 100 can include the one or more that first electrode 124 is extended through Vacuum chamber (pressure reduction stage).Shell 116 is configured to that vacuum chamber is encapsulated and limited in the form of liquid closed.In shown implementation In example, ion guide 100 includes：First vacuum chamber, it is horizontal that it is defined in the first transverse wall 144 and second of shell 116 Between wall 146；And second vacuum chamber, it is defined between the second transverse wall 146 of shell 116 and the 3rd transverse wall 148. Fig. 1 also partly shows the 3rd vacuum chamber on the right by the 3rd transverse wall 148.3rd vacuum chamber can be ion guiding The part of device 100, or can be the input of another plasma processing apparatus (such as such as mass filter or mass analyzer). Each vacuum chamber can include vacuum ports (not shown), and it is coupled to the true of the pressure rating in control respective vacuum chamber room Empty set is united.For example, gas pressure can be reduced to the grade lower than first front chamber by each follow-up vacuum chamber.Finally, press Power can be reduced to the high vacuum grade needed for mass analyzer.It is ion cooler in the operation of ion guide 100 Some embodiments in, the first vacuum chamber is maintained to be cracked at appropriate gas pressure for thermalized ions without producing. In some embodiments of the operation of ion guide 100 for collision junior unit, the first vacuum chamber is maintained at for phase appropriate CID At higher gas pressure.In certain embodiments, the operation of the first vacuum chamber is collision junior unit, and the second vacuum chamber is grasped As ion cooler.In order to realize the purpose of ion cooling and/or fragment ions, one of multiple in vacuum chamber can wrap Ingress port (not shown) is included, it is used to introduce buffer gas.

In the embodiment shown, first electrode 124 extends through the first vacuum chamber, the second vacuum chamber and into the In three vacuum chambers.Each in transverse wall 144,146 and 148 has size to cause the aperture of gas conduction minimum, But accommodating first electrode 124 passes through aperture simultaneously.

In the other embodiments that ion guide 100 is located in single vacuum chamber, ion guide 100 can match somebody with somebody It is set to along guiding device axle and barometric gradient is provided.

Fig. 2A is the perspective view according to one end (import or export) of the first electrode set 224 of some embodiments.Fig. 2A Six first electrodes 224 (sextupole arrangement) are only illustrated by way of example, it should be appreciated that less than six or more than six can be provided One electrode 224.In an exemplary embodiment, the V of common form_RFCos (Ω t) the RF voltages of two phase place the first are applied to the first electricity Pole 224 so that be applied to fixed electrode signal and be applied to the signal to the adjacent electrode on the either side of fixed electrode Phase differs 180 degree.In fig. 2, including the electrode 224A (such as the first, the 3rd and the 5th electrode) that is electrically interconnected to each other with And the first electrode 224 for the electrode 224B (such as the second, the 4th and the 6th electrode) being electrically interconnected to each other schematically describes the feelings Condition.With it, around the movement of guiding device axle, (i.e. electrode 224A and 224B is handed over each electrode 224A (or 224B) around guiding device axle For positioning) and it is adjacent with two electrode 224B (or 2224A) on either side.First RF voltage sources are diagrammatically depicted as The first RF voltages are applied to electrode 224A RF voltage sources 228A at first phase and are shifting 180 degree away from first phase Second phase at the first RF voltages are applied to other electrode 224B RF voltage sources 228B.

Also as shown in Figure 2 A, in certain embodiments, each first electrode 224 can include electrical insulation parts 274 (such as Kernel) and around insulation component 274 outside resistance element 276 (such as layer or coating).Insulation component 274 may be constructed in Such as insulative polymer, ceramics or insulating oxide compound.Resistance element 276 may be constructed in for example resistive ink, metal oxygen Compound, metal, metal alloy, graphite or conducting polymer.RF voltage sources 228A and 228B are positioned to carry out with resistance element 276 Signal communication.Resistance element 276, which can be fabricated to, shows extreme uniformly resistive layer, with along all first electrodes 224 Length provides the axial D/C voltage gradient of substantially homogeneity.Can be by the way that D/C voltage be applied into the relatively each of resistance element 276 Hold to generate DC gradients, without using the separation electrostatic lenses in inlet and outlet or the separation in inlet and outlet Electrode segment.First DC sources are diagrammatically depicted as the first D/C voltage being applied to electrode 224A DC sources 232A and by first DC voltages are applied to other electrode 224B DC sources 232B.In certain embodiments, the amplitude of the RF voltages applied for All first electrodes 224 are identicals, and the value of the D/C voltage applied is at one end or at the other end for first electrode 224 Identical.

Fig. 2 B are the perspective views of two in the first electrode 224 being electrically interconnected.Fig. 2 B, which are schematically shown, is coupled to first The RF voltage sources 278 and 286 and DC voltage source 282 and 290 of the opposite ends of electrode 224.Typically, from it is end-to-end along The uniformly applied RF voltages of length of each first electrode 224.Therefore, schematically, RF voltage sources 278 can be with RF voltages Source 286 is identical.However, the value of the D/C voltage 290 applied at the port of export of each first electrode 224 can be differently configured from The value of the D/C voltage 282 applied at entrance point so that generation accelerates the axial electric field gradient of ion as described above.At some In embodiment, RF voltages can be applied only to the end of first electrode 224 or the middle of first electrode 224.Can be such as Promote the operation by providing the first electrode 224 with three layers of configuration, in described three layers configuration, kernel is conduction material Material, it is circular for insulating barrier, insulating barrier and then circular by outside resistive layer.The example of three layers of configuration is described in United States Patent (USP) No.7, in 064,322, its complete content is incorporated by reference into this.

Fig. 3 A are the first electrode set at ion inlet orifice end (beginning of the ion inlet orifice part 136 i.e. shown in Fig. 1) place 124 (in transverse plane) schematic end.Again, sextupole arrangement is only illustrated by way of example.First electrode 124 inscribed half Footpath r₀Guiding device volume 352.Guiding device volume 352 generally corresponds to ion guide 100 (Fig. 1) interior zone, its In, two-dimentional RF containing fields can be applied by first electrode 124 to limit stable ion.Dashed circle 354 is described in ion Ion acceptance envelope or beam " diameter " at entrance point.In fact, the actual cross-section area of ion beams can have more Oval shape, wherein, oval orientation changes according to sexual cycle period for applying RF voltages in transverse plane.Pass through ratio Compared with Fig. 3 B are to be produced in the transition for ion outlet part 140 at the end of the ion inlet orifice part 136 of (Fig. 1) or in ion (in transverse plane) schematic end of the first electrode set 124 at the port of export (i.e. the end of ion outlet part 140) place Figure.The convergence geometry of ion inlet orifice part 136 is attributed to, the cross-sectional area of guiding device volume 352 is reduced (according to smaller Radius r₀It is obvious), the circle spacing between each adjacent first electrode 124 is reduced.The RF that convergence ion inlet orifice part 136 is generated Ion beams are compressed and under assembling to smaller emission of ions degree envelope, it is described by the dashed circle 356 in Fig. 3 B And also it is included in Fig. 3 A, for the comparison with bigger initial beam emittance (or acceptance 354).

The RF voltages for being applied to first electrode 124 create pseudo- potential well described by below equation in guiding device volume：

Wherein, the rank of n=multipoles, the electric charge of ions of the e=in units of coulomb, RF amplitudes of the V=in units of volt, R=is with the radial distance away from guiding device axle that millimeter (mm) is unit, r₀In=the multipole electrode set by units of mm Connect radius, atomic masses of the m=with atomic mass unit (amu) for the ion of unit, Ω=with radian per second (r/s) is unit The RF voltages applied angular frequency.When background collisions gas also occurs, ion generally will lose energy because of collision gas Amount, and in the track near the minimum pseudo- potential near guiding device axle that sinks.However, at the lower end of mass range, place It will be advanced at a higher speed in mutually synthermal ion, and the bigger distance that will be advanced in each RF cycles, and can be with Exited as RF fields consistently change phase and by potential barrier.This is a kind of " low quality unstability ", and in the equipment In for mass range, lower limitation is set.Stability is m Ω²r₀ ²/ V function.Pseudo- potential is being received with first electrode 124 Holding back becomes further separation and reduces at the larger end of ion inlet orifice part 136, and it is more poorly efficient that ion, which suppresses,.Become It is clear that the quality bandwidth of convergence equipment is limited to the high quality puppet potential at larger end and the low quality at small end Unstability.Quality bandwidth can be improved by increasing RF driving frequencies and voltage.However, for exiting vacuum for capturing The structure of the useful size of the ion of entrance or mass filter, it is difficult that frequency increase must be surmounted into about 10MHz.Especially It is in the high gas pressure equipment operated in the case that mean free path is close to electrode stem interval, increase voltage is because of voltage breakdown And it is limited.Increase frequency adds power, and this causes bigger cost and temperature and integrity problem to also have driving transformer In self-resonance limitation.

, can be by applying the 2nd RF voltages in the opening position of ion guide 100 so as to the 2nd RF electricity according to this teaching It is pressed in and is penetrated between each gap between each adjacent first electrode 124 to overcome the conflict to quality bandwidth to limit.The operation has There is the effect for the second higher order RF multipole fields (the 2nd RF fields) that generation is superimposed upon on the first RF fields.Compared with the first RF fields, the Two RF fields are 2N ranks.If thus, for example, the first RF fields are hexapole fields, the 2nd RF fields will be 12 pole fields.Synthesis the One example of the RF fields of one RF fields/the 2nd includes but is not limited to the hexapole field of quadrupole/ends of the earth field and the ends of the earth/ten.

Fig. 1 shows to realize the example of the 2nd RF fields.Ion guide 100 includes the 2nd RF field generators, and it is configured to Generate the 2nd RF fields of the 2N ranks for being superimposed upon on the first RF fields and being penetrated between each first electrode 124.Send out 2nd RF fields Raw device includes one or more second electrodes 160, its part or whole length along ion inlet orifice part 136 and position.Can It is in the form of by single electrode or similar to first electrode 124 as extending along guiding device axle 104 and each other in circumference The multiple electrodes at upper interval provide second electrode 160.Alternatively, second electrode 160 can have and be retouched below by way of example The other configurations stated.

Second electrode 160 can be located at the outside (therefore around first electrode 124) of first electrode 124, in the case, Second electrode 160 is properly termed as outer electrode, and first electrode 124 is properly termed as internal electrode.In other embodiments, the second electricity Pole 160 can be located in the gap between each corresponding pairing of adjacent first electrode 124.In other embodiments, second electrode 160 can be partially in outside first electrode 124, but extend into or through the gap between each first electrode 124.

The RF voltage sources of ion guide 100 include the 2nd RF voltage sources 164, and it is connected with second electrode 160.One In a little embodiments, RF voltage sources (such as the 2nd RF voltage sources 164) are considered as a part for the 2nd RF field generators.2nd RF Voltage source 164 is by common form V_RFCos (Ω t) the 2nd RF voltages are applied to second electrode 160, and it is generated in response to this Penetrate the envelope of first electrode 124 and the 2nd RF fields entered in guiding device volume.In certain embodiments, the 2nd RF electricity Pressure is single-phase RF potentials.The 2nd RF voltages can be applied at any phase relative to the phase for applying the first RF voltages.

The DC voltage source of ion guide 100 can also include the second DC voltage source 168, and it is connected with second electrode 160. In certain embodiments, second electrode 160 can have the first electrode shown in described above and Fig. 2A and Fig. 2 B Similar composite insulation/resistive the configuration of 124 embodiment.In operation, it may be desirable that the DC potentials in second electrode 160 are set Must be identical with the DC potentials in the first electrode 124 at ion inlet orifice end 108, to cause DC potentials to second electrode 160 Influence to minimize.

In certain embodiments, second electrode 160 can be arranged in the outside of first electrode 124, and be in and first The similar convergence mode of electrode 124.Therefore, it is located at the situation at the first radius away from guiding device axle 104 in first electrode 124 Under, second electrode 160 can be located at the second radius away from guiding device axle 104 up to certain deviant different from the first radius.Institute Stating skew can keep constant along guiding device axle 104, i.e., the convergent angle of second electrode 160 can be with first electrode 124 Convergent angle is identical.Alternatively, the skew can change along guiding device axle 104, i.e. the convergent angle of second electrode 160 can With different from the convergent angle of first electrode 124.It can select to offset as needed, to avoid (being attributed to Paschen ' S laws) voltage breakdown while obtain desired 2nd RF fields into the penetration in guiding device volume.For example, it can repair Whole skew, to obtain the desired qualities scope for treating to be closed by ion guide 100.Furthermore, it is possible to so that skew is in second electrode 160 downstream end ratio is smaller at upstream end, or vice versa it is as the same.In view of field is penetrated on downstream direction with each first electrode The fact that the interval between 124 reduces and reduced, penetrates for strengthening in the field of the downstream end of first electrode 124, under reduction The skew swum at end can be useful.In addition, although increase skew may need to increase RF voltages with each first electrode Desired potential is kept in gap between 124, but if it is expected, then skew can increase with realize bigger breakdown strength or Easier gas is allowed to escape.In addition, skew can for example by by second electrode 160 substitute arrangement in different sizes or Installation hardware is configured in a manner of the position to allow second electrode 160 is adjusted but adjustable.

Suitably select to serve supply containing field for the driving frequency of the 2nd RF fields, for should be on the contrary each first The part for the mass range being lost in growth gap between electrode 124.The driving frequency of 2nd RF fields can set and must be less than The driving frequency of first RF fields so that no matter its relatively large 2R₀How, high quality puppet potential is all still substantial.This is right Ion is radially released outside equipment with establishment in not only reducing effective pseudo- potential in gas pressure but also extending gas Operation after the vacuum inlet (such as divide and skim device 120, capillary or aperture) of the radial velocity vector of aerodynamic drag It is especially important.The radial gas must be overcome by the pseudo- potential force of opposite direction.Although the fictitious force is similar to pseudo- electricity Gesture is the statistics construction based on the path with variation phase space and multiple ions of RF phases, but can be by radius Differential is carried out to pseudo- potential equation to obtain effective field E_pseudo(in units of volts/meter) come it is approximate it, it is as follows：

Configured for specific multipole：

For sextupole.

For 12 poles.

Then, power E_pseudox e.Power is equal to zero at center line (guiding device axle) place, and radially increases.

Because the superposition of two RF fields, compared with conventional linear Multipole ion guiding device, in not same order multipole item, no In the case of with voltage and different frequency, the embodiment of ion guide 100 disclosed herein can realize bigger penetrate Beam pressure contracts, and sends from all-mass scope ion caused by sample, is operated at higher pressure, and preferably tolerant of radial gas Body velocity.Furthermore, it is possible to realize afore-mentioned by lower voltage and power, reduce the cost of electronic equipment simultaneously And improve reliability.Furthermore, it is possible to by single inner member (such as single (no segmentation) first electrode set 124) come Afore-mentioned is realized, therefore avoids the cost of the concurrent of fringing field, alignment issues and construction multipolarity equipment.In addition, ion Guiding device 100 is suited well for operation as collision junior unit, because it can receive to exit quadrupole mass filter or other The big ion phase space of prior device, send and parent ion is cooled down with collision mode while cracking ion, and Subsequent quality filter plant (such as quadrupole or flight time will be sent to than currently achieved remote smaller ion phase space (TOF) analyzer) in.Therefore, ion guide 100 can enable higher overall system transmission, and broader mass range passes Defeated and improved MS and MS-MS spectrum.

As described above, RF driving frequencies Ω and amplitude V_RFEncapsulated with desired qualities scope and the minimum of ion guide volume Diameter and demarcate.The above is continued at for about 2.3mm minimum encapsulation diameter and from about 50Da to about 3000Da's The non-limiting example that mass range provides, the driving frequency (first frequency) of the first RF fields can be 9MHz, and the 2nd RF fields Driving frequency (second frequency) can be 1MHz.In certain embodiments, second frequency be in first frequency 50% or more In small scope.In certain embodiments, the zero of the first RF fields to peak amplitude (the first peak amplitude) can be about 110V, and the zero of the 2nd RF fields to peak amplitude (the second peak amplitude) can be about 250V.Ion disclosed herein draws The mass range that leading device can send will be depended on for first frequency, second frequency, the first peak amplitude and the second peak value Value selected by amplitude.In certain embodiments, the beam at the accessible ion inlet orifice of ion guide disclosed herein Acceptance diameter can be about 3 for the ratio of the beam acceptance diameter at the ion outlet of first electrode:1, and at it In its embodiment, 3 can be below or above:1.

It will be understood by those skilled in the art that in all embodiments disclosed herein, ion guide generated Two RF fields, which are similar to the first RF fields, intentionally to be generated by the operation of electronic equipment.2nd RF fields are with for higher order The enough field intensities in field apply with to the higher intentionally of the notable useful effect of ion closing and/or ion beams compression Rank field.So the 2nd RF field will be different from any or even can be generated when lacking the 2nd RF fields in ion guide (i.e. intrinsic, and general inevitable) higher order field unintentionally.The example of higher order field includes being attributed to space-electricity unintentionally Lotus effect and to be attributed to actual limitation that electrode applied (such as processing and assembling flaw, geometry discontinuity, non- Ideal form etc.) and field that caused perturbation (field defect, edge effect, distortion etc.) is generated.So generated it is any this It with the 2nd RF fields compared with is relatively weak to be not intended to higher order fields a bit, and is usually to localize very much, and will without pair The remarkable result of ion.Another example of the 2nd RF fields generated as sign ion guide, but be not intended to be limited to any Embodiment disclosed herein, the 2nd RF fields can have 10% or bigger field intensity as the field for applying the first RF fields.

Fig. 4 is according to the side of another example of the ion guide 400 of some embodiments (length to) view.Ion guides Device 400 generally has along in the length of ion guide axle 404 and the transverse plane orthogonal with ion guide axle 404 Lateral cross section.Ion guide 400 generally includes：Ion inlet orifice end 408；And ion outlet end 412, it is guided along ion Device axle 404 is deployed at certain distance of sub- entrance point 408.Ion guide 400 can also include shell (not shown), its The intraware of the ion guide 400 between ion inlet orifice end 408 and ion outlet end 412 is encapsulated, as described above.Shown In embodiment, a point slash plate 420 is arranged at ion inlet orifice end 408.

Ion guide 400 includes the first RF field generators, and it is configured to the first RF fields for generating N ranks, wherein, N It is equal to or the integer more than 2.In the embodiment shown, the first RF field generators include multiple first electrodes 424, its along from Sub- guiding device axle 104 extends and circumferentially spaced relative to ion guide axle 104, thus around diametrically close from The ion guide volume axially extended of son.Due to that can be arranged as described above using other multipoles, therefore Fig. 4 only passes through Example shows that sextupole arranges (wherein, showing three first electrodes 424).As described above, RF or RF/DC power can be fed to One electrode 424.First electrode 424 is considered as including the He of ion inlet orifice part 436 extended along ion guide axle 404 Ion outlet part 440.Ion inlet orifice part 436 extends from ion inlet orifice end 408 and is transitioned into ion outlet part 440, Ion outlet part 440 extends to ion outlet end 412.In ion inlet orifice part 436, first electrode set 424, which has, receives Hold back (taper) geometry.In ion outlet part 440, first electrode set 424 has straight or substantially straight cylinder Shape geometry.In the embodiment shown, first electrode 424 is bent so that limit convergence ion inlet orifice part 436 and straight from Subexit part 440.Bending in first electrode 424 provides the mistake from ion inlet orifice part 436 to ion outlet part 440 Cross.

Ion guide 400 also includes the 2nd RF field generators, its be configured to generation be superimposed upon on the first RF fields and 2nd RF fields of the 2N ranks penetrated between each first electrode 424.In the embodiment shown, the 2nd RF field generators include single Individual second electrode 460 (or outer electrode), its part or whole length along ion inlet orifice part 436 is around first electrode 424.Second electrode 460 can be or can include solid wall, and as indicated, wall can be the ion with first electrode 424 The similar taper of inlet part 436.The convergent angle of second electrode 460 can be with the ion inlet orifice part of first electrode 424 436 convergent angles are identical or different, as described above.Alternatively, second electrode 460 can have below by way of described by example Other configurations.

, can be by the way that ion guide electrode be arranged, oriented and/or is configured to have along drawing according to other embodiments Lead device axle and in face of guiding device volume hyperbolic configure realize ion guide electrode (and therefore ion guide hold Product) converge to straight (or substantially straight) geometry.That is, when watched from side or length to visual angle (such as In Fig. 1 or Fig. 4 y-z plane view) when, ion guide electrode sets show the hyperbolic profile in face of guiding device volume. Therefore, hyperbolic ion guide electrode sets are actually inscribed with the hyperbolic radial boundary scanned relative to guiding device axle Guiding device volume.Correspondingly, for r₀Value as it is moved along guiding device axle and is changed, and correspond to electrode sets institute Point on the hyperbolic curve of presentation.In other words, the outer boundary of guiding device volume is really or the approximate rotation relative to guiding device axle The bi-curved surface turned.

Fig. 5 A are the guiding with hyperbolic radial boundary described by the hyperbolic surface 502 scanned relative to guiding device axle The side view (y-z plane) of the example of device volume.Fig. 5 B are the perspective views of the guiding device volume shown in Fig. 5 A.The shape of hyperbolic curve Shape or width can be wide, i.e., the degree of eccentricity can be big.The ion guide electrode of inscribed hyperbolic radial boundary can edge Any part extension of hyperbolic curve, and can include or can not include the summit of hyperbolic curve.In some embodiments In, the hyperbolic configuration of guiding device electrode is such：Guiding device volume is in the axle than ion inlet orifice end closer to ion outlet end To at there is the least radius r away from guiding device axle₀.In certain embodiments, the whole length of electrode sets provides hyperbolic and matched somebody with somebody Put.In other embodiments, a part of length of electrode sets provides hyperbolic configuration, and is then transitioned into straight cylinder or another Outer shape.

In certain embodiments, it is double by having along guiding device axle (i.e. in Fig. 1, Fig. 4 or Fig. 5 A y-z planes) Each guiding device electrode of curvature come realize hyperbolic configure.These guiding device electrodes can be by electric with first shown in Fig. 4 The similar mode in pole 424 and arranged but there is unique bending in addition, guiding device electrode is formed as having smooth hyperbolic bent Rate.

Fig. 6 A and Fig. 6 B show another example of the ion guide electrode configured with the hyperbolic along guiding device axle.Tool Say, Fig. 6 A are (in transverse plane) end-views of the first electrode set 624 at ion inlet orifice end, and Fig. 6 B are the first electricity body The perspective view of polar set 624.Again, sextupole arrangement is only illustrated by way of example.In this embodiment, first electrode 624 is configured to Straight cylindrical bar.However, first electrode 624 is arranged and oriented relative to guiding device axle so that they are inscribed with relative In the guiding device volume for the hyperbolic radial boundary that guiding device axle scans, such as shown in Fig. 5 A and Fig. 5 B.Specifically, the first electricity Pole 624 is oriented relative to guiding device axle with windup-degree, as shown in Fig. 6 A and Fig. 6 B.Therefore, first electrode 624 is around guiding Device axle " torsion ", is but still straight cylindrical bar, and result is that they show hyperbolic profile along guiding device axle.In some implementations In example, during windup-degree may be at from the several years to the scope of almost 180 degree.It is bent that different windup-degrees provides different hyperbolics Rate.By the appropriate selection of the windup-degree and inlet and outlet diameter, gained hyperbolic geometry shape can provide be followed by it is (several ) straight part contraction section, reproduce for example than the general effect of the configuration shown in as described above and Fig. 4.With Another way states that straight bar (both first electrode 624 or first electrode 624 and second electrode 660) is with positioned at the double of rotation Mode on the surface of curved surface and orient.The orientation causes opening position of the surface residing for straight bar from two shaft ends of each bar The position of one of each rod end is changed into relative to the hyperbolic of the other end " torsion " in the special circumstances of the taper of the same anglec of rotation Face.

The torsion configuration of first electrode 624 can provide some particular advantages.For example, configured with known ion guide Compare, reverse configuration can allow first electrode 624 together closer to ground in groups.This allows first electrode 624 true through two The smaller aperture that compares between vacant level so that can carry out more limited gas conduction between each vacuum level and Bigger pressure drop.As another example, boomerang effect can be applied to all gas stream in ion guide by reversing configuration, This can promote the energy dissipation in gas molecule.

Therefore, straight first electrode 624 can initially be arranged as being formed similar to traditional infinite sum Multipole ion guiding device Straight taper part.Once display in this way, while the straight cylindrical geometry of first electrode 624 is retained, The fixator of one end of first electrode 624 is kept just then to reverse up to scope from several years up to almost certain angle of 180 degree.Also It is to say, the torsion of first electrode 624 is completed in the case of actually not bending or reversing the material of first electrode 624.So With the effect for forming the packaged guiding device volume with the hyp shape rotated relative to central shaft.

Fig. 6 A also illustrate second electrode set 660.In the embodiment shown, second electrode 660 is and the phase of first electrode 624 As extension rod, the quantity of the second electrode 660 provided is identical with first electrode 624 (in this example, six).Second Electrode 660 can be positioned as such：They are in the outside of each first electrode 624 (from radial direction visual angle) and (from transverse plane Relative to the visual angle for having Angle Position in guiding device axle) between be interspersed.Alternatively, can be according to disclosed herein any Other embodiments configure second electrode 660.As indicated, second electrode 660 also there is the hyperbolic similar to first electrode 624 to match somebody with somebody Put.As described above, the first RF voltages, the 2nd RF voltages and axial DC gradients can be applied to first electrode 624 and second electrode 660。

It should be understood that according to any configuration (such as configuration shown in Fig. 1 to Fig. 6 B) described herein, implementation of the invention Example covers the ion guide for only providing first electrode.Can be real in the case where not providing the 2nd RF voltages or second electrode These existing embodiments.

In other embodiments, (including the first RF generators and the 2nd RF generators) double field ions can be provided to draw Device is led, wherein, first electrode does not include contraction section.For example, first electrode can be arranged in straight cylindrical geometry. In these embodiments, first electrode, which can be included in, applies the inlet part that is limited in the case of the 2nd RF fields, after pick out Oral area point.Therefore, the RF containing fields that ion guide is generated can from the RF fields (N ranks) of synthesis the first in inlet part/ 2nd RF fields (2N ranks) are transitioned into the first RF fields (N ranks) in exit portion.This configuration can not restrain even Desired beam compression ratio is produced in the case of geometry.In these embodiments, second electrode can also have straight Cylindrical geometries, or alternatively, due to it is expected to provide the different-effect to ion closing, therefore can have convergence or hair Dissipate geometry.

Fig. 7 A, Fig. 7 B and Fig. 7 C show the other examples of the configuration for second electrode.Fig. 7 A are that configuration is real as taper The side cross-sectional view of the second electrode 760 of heart wall.In certain embodiments, wall can have one or more vias 762, to promote Enter gas flowing.Fig. 7 B are side cross-sectional view of the configuration as multiple second electrodes 766 of taper grid, wherein, second electrode 766 extend along guiding device axle and are restrained towards guiding device axle.In certain embodiments, also provide and multiple to be axially spaced Annular second electrode 770.These second electrodes 770 have the diameter of successive reduction on the direction of ion processing flow.Second Therefore the combination of electrode 766 and 770 forms taper grid.Fig. 7 C are that have to reduce in succession on the direction of ion processing flow The side cross-sectional view of multiple annular second electrodes 772 being axially spaced of diameter.Each second electrode 772 individually can may be used Addressed by RF sources and DC sources according to expectation.In another embodiment (not specifically illustrated), second electrode can be relative to guiding Device axle extends and circumferentially arranges (similar to the example of above-mentioned first electrode), and each second electrode is segmented into along second Multiple segmentations that the direction that electrode extends is spaced.In the case, each second electrode 772 can individually can be by RF Source and DC sources address according to expectation.In any previous embodiment of second electrode, second electrode can have cylinder several What shape rather than shown taper or convergence geometry, or alternatively, due to it is expected to provide the different-effect to ion closing, Therefore there can be diverging geometry.

Exemplary embodiment

The exemplary embodiment provided according to the subject content of the disclosure includes but is not limited to following：

1. a kind of ion guide, it includes：Entrance point；The port of export, it is along entrance point described in guiding device wheelbase At distance；First RF field generators, it is configured to the first RF fields for generating N ranks, wherein, N is equal to or whole more than 2 Number, the first RF field generators include along the guiding device axle extend and relative to the guiding device axle circumferentially between Every multiple first electrodes, wherein, the first electrode is around guiding device volume between the entrance point and the port of export； And the 2nd RF field generator, it is configured to the 2N ranks that generation is superimposed upon on the first RF fields and described each first The 2nd RF fields penetrated between electrode, the 2nd RF field generators include one or more second electrodes.

2. ion guide as described in Example 1, wherein, the first electrode includes：Inlet part, its from it is described enter Mouth end extends and restrained towards the guiding device axle；And exit portion, it extends to the outlet from the inlet part End.

3. ion guide as described in Example 2, wherein, the second electrode is along the inlet part around described First electrode.

4. the ion guide as described in embodiment 2 or 3, wherein, the first electrode along the exit portion extremely A few part limits straight cylindrical volume.

5. the ion guide as described in any one of embodiment 2 to 4, wherein, the first electrode bending so that institute State first electrode to restrain toward each other in the inlet part, and straight cylindrical is transitioned into the exit portion.

6. the ion guide as described in any one of previous embodiment, wherein, the first RF field generators configuration For generating axial DC gradients along the length of the ion guide.

7. the ion guide as described in any one of previous embodiment, it includes：Axial DC gradients generation configuration, its Selected from the packet for being formed in following item：Each first electrode includes：Insulation component；And resistance element, it is around the insulation Element；Each second electrode includes：Insulation component；And resistance element, it is around the insulation component；And foregoing item two Person.

8. ion guide as described in Example 7, it includes：DC voltage source, it is connected with the resistance element, and At least a portion for being configured to the length along the first electrode or the second electrode generates axial DC gradients.

9. the ion guide as described in any one of previous embodiment, wherein, the multiple first electrode includes double Song configuration so that the guiding device volume has the hyperbolic radial boundary scanned relative to the guiding device axle.

10. ion guide as described in Example 9, wherein, the hyperbolic configuration of the first electrode is such： The guiding device volume has away from the guiding device axle most at than axial point of the entrance point closer to the port of export Minor radius.

11. the ion guide as described in embodiment 9 or 10, wherein, the hyperbolic configuration extends to from the entrance point The port of export.

12. the ion guide as described in any one of embodiment 9 to 11, wherein, it is each in the first electrode It is individual to be configured to straight cylindrical bar.

13. the ion guide as described in any one of embodiment 9 to 12, wherein, the first electrode with relative to The windup-degree of the guiding device axle and orient.

14. the ion guide as described in any one of embodiment 9 to 11, wherein, it is each in the first electrode It is individual that there is hyperbolic curvature.

15. the ion guide as described in any one of embodiment 9 to 14, wherein, one or more of second electricity Has hyperbolic configuration.

16. the ion guide as described in any one of previous embodiment, wherein, one or more of second electrodes With the configuration selected from the packet for being formed in following item：Single second electrode, it is included with taper or cylindrical geometries Wall；Single second electrode, it includes the wall with taper or cylindrical geometries, and have in the wall one or Multiple vias；Grid, it has taper or cylindrical geometries, and multiple including extending along the guiding device axle Two electrodes；Multiple annular second electrodes being axially spaced, it has constant diameter or the diameter of successive reduction；Grid, it has There are taper or cylindrical geometries, and multiple second electrodes including extending along the guiding device axle and multiple axial directions The annular second electrode at ground interval；Multiple second electrodes, it extends along the guiding device axle and relative to the guiding device Axle is circumferentially spaced, and the external volume with taper, cylinder or hyperbolic geometry shape；Multiple second electrodes, its edge The guiding device axle to extend and circumferentially spaced relative to the guiding device axle, and external there is taper or cylinder The volume of geometry, wherein, each second electrode be segmented into along the second electrode extend direction be spaced it is more Individual segmentation；Multiple second electrodes, it is passed through between the corresponding adjacent pair of the first electrode；It is and one or more of Second electrode is around the first electrode.

17. the ion guide as described in any one of previous embodiment, wherein, the first electrode is located at away from described At first radius of guiding device axle, the second electrode is located at the second radius away from the guiding device axle, the second electrode With the upstream end at the entrance point and axially opposite downstream end, second radius are different from first radius Up to the skew selected from the packet for being formed in following item：Constant skew is kept along the guiding device axle；Along the guiding device The skew of axle change；And in the downstream end skew smaller than at the upstream end.

18. the ion guide as described in any one of previous embodiment, it includes：RF voltage sources, it is configured to First RF voltages are applied to the first electrode at first frequency, and by the 2nd RF voltages than the first frequency One or more of second electrodes are applied at lower second frequency.

19. ion guide as described in Example 18, wherein, the second frequency be in first frequency 50% or more In small scope.

20. the ion guide as described in any one of previous embodiment, it includes：RF voltage sources, are configured to The first RF voltages are applied to the first packet of the first electrode at first phase, and at second phase by described in First RF voltages are applied to the second packet of the first electrode, wherein, each first electrode and institute in first packet At least one first electrode stated in second packet is adjacent, and wherein, the second phase is away from first phase displacement 180 Degree.

21. the ion guide as described in any one of previous embodiment, it includes：RF voltage sources, it is configured to Single-phase RF voltages are applied to one or more of second electrodes.

22. the ion guide as described in any one of previous embodiment, it includes：Multiple vacuum levels, wherein, it is described First electrode extends through at least two in the vacuum level.

23. ion guide as described in Example 22, it includes：Wall, it is between at least two vacuum level, institute State wall have aperture on the guiding device axle and positioned at than the entrance point closer to the port of export.

Ion guide as described in Example 23, wherein, the multiple first electrode configures including hyperbolic so that described Guiding device volume has the hyperbolic radial boundary scanned relative to the guiding device axle, and the guiding device volume has At the wall or its nearby least radius away from the guiding device axle.

25. a kind of ion guide, it includes：Entrance point；The port of export, it is along entrance point described in guiding device wheelbase At distance；And multiple electrodes, it extends to the port of export from the entrance point, and relative to the guiding device axle in circle It is spaced on week, the multiple electrode configures including hyperbolic so that the electrode is inscribed to have and swept relative to the guiding device axle The guiding device volume from the entrance point to the port of export for the hyperbolic radial boundary retouched.

26. ion guide as described in Example 25, wherein, each in the electrode is configured to straight cylinder Body.

27. the ion guide as described in embodiment 25 or 26, wherein, the electrode is with relative to the guiding device axle Windup-degree and orient.

28. ion guide as described in Example 25, wherein, each in the electrode has hyperbolic curvature.

29. the ion guide as described in any one of embodiment 25 to 28, wherein, extend to institute from the entrance point The electrode for stating the port of export is first electrode, and also includes one or more second electrodes.

30. ion guide as described in Example 29, wherein, one or more of second electrodes have selected from composition In the configuration of the packet of following item：Single second electrode, it includes the wall with taper or cylindrical geometries；Single second Electrode, it includes the wall with taper or cylindrical geometries, and has one or more vias in the wall；Grid Lattice, it has taper or cylindrical geometries, and multiple second electrodes including extending along the guiding device axle；It is multiple The annular second electrode being axially spaced, it has constant diameter or the diameter of successive reduction；Grid, it has taper or cylinder Shape geometry, and multiple second electrodes including extending along the guiding device axle and multiple annulars being axially spaced Second electrode；Multiple second electrodes, its along the guiding device axle extend and relative to the guiding device axle circumferentially between Every, and the external volume with taper, cylinder or hyperbolic geometry shape；Multiple second electrodes, it is along the guiding device Axle extends and circumferentially spaced relative to the guiding device axle, and the external appearance with taper or cylindrical geometries Product, wherein, each second electrode is segmented into multiple segmentations that the direction extended along the second electrode is spaced；Multiple Two electrodes, it is passed through between the corresponding adjacent pair of the first electrode；One or more of second electrodes are around described First electrode；And one or more of second electrodes surround described first along the convergent region of hyperbolic radial boundary Electrode.

31. the ion guide as described in embodiment 29 or 30, wherein, the first electrode is configured to generate N ranks The first RF fields, wherein, N is equal to or the integer more than 2, and one or more of second electrodes are configured to generation and are superimposed upon 2nd RF fields of the 2N ranks penetrated on the first RF fields and between each first electrode.

32. a kind of ion guide, it includes：Entrance point；The port of export, it is along entrance point described in guiding device wheelbase At distance；And multiple electrodes, it extends to the port of export from the entrance point, and relative to the guiding device axle in circle It is spaced on week, the multiple electrode is oriented with the windup-degree relative to the guiding device axle, wherein, the inscribed tool of the electrode There is holding from the entrance point to the guiding device of the port of export for the hyperbolic radial boundary scanned relative to the guiding device axle Product.

33. the ion guide as described in embodiment 32, wherein, each in the electrode is configured to straight cylinder Body.

34. the ion guide as described in embodiment 32 or 33, wherein, extend to the port of export from the entrance point The electrode is first electrode, and also includes one or more second electrodes.

35. the ion guide as described in embodiment 34, wherein, one or more of second electrodes have selected from composition In the configuration of the packet of following item：Single second electrode, it includes the wall with taper or cylindrical geometries；Single second Electrode, it includes the wall with taper or cylindrical geometries, and has one or more vias in the wall；Grid Lattice, it has taper or cylindrical geometries, and multiple second electrodes including extending along the guiding device axle；It is multiple The annular second electrode being axially spaced, it has constant diameter or the diameter of successive reduction；Grid, it has taper or cylinder Shape geometry, and multiple second electrodes including extending along the guiding device axle and multiple annulars being axially spaced Second electrode；Multiple second electrodes, its along the guiding device axle extend and relative to the guiding device axle circumferentially between Every, and the external volume with taper, cylinder or hyperbolic geometry shape；Multiple second electrodes, it is along the guiding device Axle extends and circumferentially spaced relative to the guiding device axle, and the external appearance with taper or cylindrical geometries Product, wherein, each second electrode is segmented into multiple segmentations that the direction extended along the second electrode is spaced；Multiple Two electrodes, it is passed through between the corresponding adjacent pair of the first electrode；One or more of second electrodes are around described First electrode；And one or more of second electrodes surround described first along the convergent region of hyperbolic radial boundary Electrode.

36. the ion guide as described in embodiment 34 or 35, wherein, the first electrode is configured to generate N ranks The first RF fields, wherein, N is equal to or the integer more than 2, and one or more of second electrodes are configured to generation and are superimposed upon 2nd RF fields of the 2N ranks penetrated on the first RF fields and between each first electrode.

37. a kind of method for being used to assemble ion beams, methods described include：The ion beams are sent and pass through ion Guiding device, the ion guide include：Entrance point；The port of export, it is in certain distance along entrance point described in guiding device wheelbase Place；And multiple multipole electrodes, it is around the guiding device volume between the entrance point and the port of export；Send it is described from While sub-beam, the first RF fields of N ranks are applied to the ion beams, wherein, N is equal to or the integer more than 2； And the 2nd RF fields of 2N ranks are applied to the ion beams, wherein, the 2nd RF fields are superimposed upon the first RF fields On, and penetrated between each multipole electrode.

38. the method as described in embodiment 37, wherein, the first electrode includes：Inlet part, it is from the entrance point Extend and restrained towards the guiding device axle；And exit portion, it extends to the port of export from the inlet part, and And the 2nd RF fields are superimposed upon in the inlet part on the first RF fields.

39. the method as described in embodiment 37 or 38, wherein, the multiple multipole electrode configures including hyperbolic so that institute Stating guiding device volume has the hyperbolic radial boundary scanned relative to the guiding device axle.

40. the method as described in any one of embodiment 37 to 39, wherein, the multipole electrode is first electrode, is applied The first RF fields are added to include：First RF voltages are applied to the first electrode, and apply the 2nd RF fields to include：Will 2nd RF voltages are applied to one or more second electrodes.

41. a kind of method for being used to assemble ion beams, methods described include：The ion beams are sent by ion to draw Device is led, the ion guide includes：Entrance point；The port of export, it is at certain distance along entrance point described in guiding device wheelbase； And multiple electrodes, it extends to the port of export from the entrance point, and relative to the guiding device axle circumferentially between Every the multiple electrode configures including hyperbolic so that the electrode is inscribed double with what is scanned relative to the guiding device axle The guiding device volume from the entrance point to the port of export of bent radial boundary；And sending the same of the ion beams When, radial direction RF containing fields are applied to the ion beams.

42. the method as described in embodiment 41, wherein, the radial direction RF containing fields are the first RF fields of N ranks, wherein, N It is equal to or the integer more than 2, and also includes：Apply the 2nd RF fields of 2N ranks so that the 2nd RF fields are described double It is superimposed upon on the first RF fields in the contraction section of song configuration, and is penetrated between each electrode.

43. the method as described in embodiment 41 or 42, wherein, including the electrode of hyperbolic configuration is first electrode, and And the 2nd RF fields are applied to one or more second electrodes.

44. a kind of method for being used to assemble ion beams, methods described include：The ion beams are sent by ion to draw Device is led, the ion guide includes：Entrance point；The port of export, it is at certain distance along entrance point described in guiding device wheelbase； And multiple electrodes, it extends to the port of export from the entrance point, and relative to the guiding device axle circumferentially between Every, the multiple electrode is oriented relative to the guiding device axle with windup-degree, wherein, the electrode is inscribed have relative to The guiding device axle and the guiding device volume from the entrance point to the port of export of hyperbolic radial boundary scanned；And While sending the ion beams, radial direction RF containing fields are applied to the ion beams.

45. the method as described in embodiment 44, wherein, the radial direction RF containing fields are the first RF fields of N ranks, wherein, N It is equal to or the integer more than 2, and also includes：Apply the 2nd RF fields of 2N ranks so that the 2nd RF fields are described double It is superimposed upon in the contraction section of bent radial boundary on the first RF fields, and is penetrated between each electrode.

46. the method as described in embodiment 44 or 45, wherein, the electrode oriented with the windup-degree is the first electricity Pole, and the 2nd RF fields are applied to one or more second electrodes.

It should be understood that term " passing through signal communication " as used herein represent two or more systems, equipment, component, Method or submodule can communicate with each other via the signal advanced on certain type of signal path.Signal can be Communication, power, data or energy signal, it can be along between first and second system, equipment, component, module or submodule Signal path information, power or energy are sent to second system from the first system, equipment, component, module or submodule, set Standby, component, module or submodule.Signal path can include physics, electricity, magnetic, electromagnetism, electrochemistry, light, wired or wireless company Connect.Signal path can also include spare system between first and second system, equipment, component, module or submodule, set Standby, component, module or submodule.

More generally, for example, " connection " and " with ... connect " term (such as first assembly and the second component are " even It is logical " or " in connection ") it is used herein to indicate structure between two or more components or key element, function, machinery, electricity, letter Number, light, magnetic, electromagnetism, ion or stream control relation.So a component is referred to as the fact that connect with the second component being not intended to Exclude the possibility that add-on assemble can occur between first and second component and/or be operably associated or combine therewith.

It should be understood that without departing from the scope of the invention, thus it is possible to vary various aspects of the invention or details.This Outside, description purpose above only be explanation, and not limit purpose --- the present invention is defined by the claims.

Claims

1. a kind of ion guide, it includes：

Entrance point；

The port of export, it is along described in guiding device wheelbase at the distance of entrance point one；

First RF field generators, it is configured to the first RF fields for generating N ranks, wherein, N is equal to or the integer more than 2, institute State the first RF field generators include along the guiding device axle extend and it is circumferentially spaced relative to the guiding device axle Multiple first electrodes, wherein, the first electrode is around the guiding device volume between the entrance point and the port of export；And

2nd RF field generators, its be configured to generation be superimposed upon it is on the first RF fields and each first electrode it Between the 2nd RF fields of 2N ranks that penetrate, the 2nd RF field generators include one or more second electrodes.

2. ion guide as claimed in claim 1, wherein, the first electrode includes：Inlet part, it is from the import End extends and restrained towards the guiding device axle；Exit portion, it extends to the port of export from the inlet part, and Also include the configuration selected from following formed group：

The second electrode is along the inlet part around the first electrode；

At least a portion of the first electrode along the exit portion limits straight cylindrical volume；

The first electrode bending so that the first electrode restrains toward each other in the inlet part, and described Straight cylindrical arrangement is transitioned into exit portion；And

Two or more combination of the above.

3. ion guide as claimed in claim 1, wherein, the first RF field generators are configured to along the ion The length of guiding device generates axial DC gradients.

4. ion guide as claimed in claim 1, wherein, the multiple first electrode configures including hyperbolic so that described Guiding device volume has the hyperbolic radial boundary scanned relative to the guiding device axle.

5. the ion guide as described in any one of Claims 1-4, it includes：RF voltage sources, it is configured to First RF voltages are applied to the first electrode by one frequency, and with the second frequency lower than the first frequency by second RF voltages are applied to one or more of second electrodes.

6. the ion guide as described in any one of Claims 1-4, it includes：RF voltage sources, it is configured to list Phase RF voltages are applied to one or more of second electrodes.

7. a kind of ion guide, it includes：

Entrance point；

Multiple electrodes, it extends to the port of export from the entrance point, and relative to the guiding device axle circumferentially between Every the multiple electrode configures including hyperbolic so that the electrode is inscribed to be had relative to guiding device axle scanning ground hyperbolic The guiding device volume from the entrance point to the port of export of radial boundary,

Wherein, the electrode is oriented with the windup-degree relative to the guiding device axle.

8. ion guide as claimed in claim 7, wherein, the electrode of the port of export is extended to from the entrance point It is first electrode, and also includes one or more second electrodes.

9. the ion guide as described in any one of claim 4 or 8, wherein, one or more of second electrode tools By the configuration selected from following formed group：

Single second electrode, it includes the wall with taper or cylindrical geometries；

Single second electrode, it includes the wall with taper or cylindrical geometries, and have in the wall one or Multiple vias；

Grid, it has taper or cylindrical geometries, and multiple second electricity including extending along the guiding device axle Pole；

Multiple annular second electrodes being axially spaced, its diameter that there is constant diameter or reduce in succession；

Grid, it has taper or cylindrical geometries, and multiple second electricity including extending along the guiding device axle Pole and multiple annular second electrodes being axially spaced；

Multiple second electrodes, it extends and circumferentially spaced relative to the guiding device axle along the guiding device axle, and And the external volume with taper, cylinder or hyperbolic geometry shape；

Multiple second electrodes, it extends and circumferentially spaced relative to the guiding device axle along the guiding device axle, and And the external volume with taper or cylindrical geometries, wherein, each second electrode is segmented into along the second electrode Multiple segmentations that the direction of extension is spaced；

Multiple second electrodes, it is passed through between the first electrode of respective adjacent pair；

One or more of second electrodes are around the first electrode；

One or more of second electrodes are along the convergent region of hyperbolic radial boundary around the first electrode；And

One or more of second electrodes have hyperbolic configuration.