CN105467598A - A laser illuminating optical system combining a semiconductor laser and a diffractive optical element - Google Patents
A laser illuminating optical system combining a semiconductor laser and a diffractive optical element Download PDFInfo
- Publication number
- CN105467598A CN105467598A CN201510913075.3A CN201510913075A CN105467598A CN 105467598 A CN105467598 A CN 105467598A CN 201510913075 A CN201510913075 A CN 201510913075A CN 105467598 A CN105467598 A CN 105467598A
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- optical element
- diffraction optical
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- semiconductor laser
- light field
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
- G02B27/425—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in illumination systems
Abstract
The invention belongs to the field of photoelectric communication, and especially relates to a laser illuminating optical system combining a semiconductor laser and a diffractive optical element. The system comprises a laser irradiation light source and a diffractive optical element. After the laser irradiation light source irradiates on the diffractive optical element, a light field of the laser irradiation light source is subjected to optical modulation of the diffractive optical element, and a laser light field is spread along a specific angle area. Through design and adjusting of the microstructure of the diffractive optical element, divergence angle design of the needed complex illumination light field is realized. According to the invention, diffractive optical design and optical modulation are carried out on light field parameters of a laser irradiation light source through the diffractive optical element to raise the light intensity utilization efficiency of the laser irradiation light source and enable flexible control of the shape of light field distribution and light intensity distribution; and a complex illumination light field can be realized according to needs of application systems such as monitor shooting and human eye observation.
Description
Technical field
The invention belongs to photoelectric communication field, particularly relate to the laser lighting optical system that a kind of semiconductor laser is combined with diffraction optical element.
Background technology
Semiconductor laser possesses that volume is little, power is large, electro-optical efficiency advantages of higher, possesses the multiple advantages producing illumination light field, for field of laser illumination provides good device.But because semiconductor laser is on light propagation direction, the angle of divergence is asymmetric, and distribution of light intensity presents Gauss or super-Gaussian distribution, simultaneously on its fast axle and slow-axis direction, the difference of the M2 factor is very large, the optical design system of traditional illumination light field, the light field of noise spectra of semiconductor lasers cannot carry out good process, realize the needs of laser lighting light field.Current existing method for designing uses the modes such as lens, catoptron, microlens array, scattering sheet, spatial light modulator (as mask sheet, liquid crystal display etc.), realizes the modulation of noise spectra of semiconductor lasers light field, realizes the output of required illumination light field.This traditional design mode be by reflecting, blocking, the method for imaging, incident field is modulated, the optical element of method for designing is complicated, quantity is more, light utilization ratio is very low, and function singleness, cannot realize complicated illumination light field, such as, for applications such as the asymmetric rectification of light distribution of widespread use, more than 1000 meters long distance illuminations, traditional design all cannot realize.Traditional lighting light field design simultaneously, its optical device size is large, cost is very high, very high to application environmental requirement, the fine dust of surface optical device all can cause the major defect of special-shaped light field, above-mentioned factor is that the use of this product causes a lot of disadvantageous factor, the serious market application limiting product.
In modern technologies, along with optoelectronic device, systematic difference develops, the application of each photovoltaic field to the illumination light field of active light source luminescence is more and more extensive, require also to improve constantly, as night-vision monitoring equipment, industrial lighting equipment, ultra-wide angle capture apparatus, the development in the fields such as overlength distance capture apparatus, complexity is proposed to active illumination light field, harsh requirement, its optical system of traditional lamp optical system is complicated, size is very large, cost is very high, and regulate complicated, need the movement of multi-disc lens, uniting and adjustment, and light field control mode is simple, optical field distribution complicated and changeable can not be realized, cannot meet the demand of application, based on the development of diffraction optics and laser technology, provide technical foundation for realizing special lighting laser light field, diffraction optical element is novel optical element just ripe gradually in the recent period, its design concept and traditional dioptrics possess essential distinction, carry out light field modulation design based on the Wave-front phase characteristic of light field, belong to other nanometer micro-optical device of wavelength level, in the light field region of 1 mm size, the light field control module of hundreds of millions magnitudes can be realized, input light field is enriched, regulate flexibly, almost can realize the requirement of the output light field of any complexity, its size is little, powerful, light intensity utilization ratio is high, it is the important application technology of following lighting field.
Semiconductor laser possesses numerous superior optical properties such as power is large, volume is little, electro-optical efficiency is high, it is the preferred optical accessories producing illumination light field, but due to the optical characteristics of its complexity, make traditional optical design mode, device cannot be combined with semiconductor laser to design and realize final optical index, the serious application and development limiting semiconductor laser.
Summary of the invention
The present invention is in order to solve the defect and deficiency that exist in above-mentioned prior art, provide a kind of optical property making full use of semiconductor laser, and optical element is few, size is little, light utilization ratio is high, can more than 90% be reached, optical function is very abundant, can meet the laser lighting optical system be combined with diffraction optical element with semiconductor laser of demand of arbitrary shape, light distribution illumination light field.
Technical scheme of the present invention: the laser lighting optical system that a kind of semiconductor laser is combined with diffraction optical element, comprise semiconductor laser radiation source and diffraction optical element, after semiconductor laser radiation source irradiates diffraction optical element, the light field of semiconductor laser radiation source passes through the optical modulation of this diffraction optical element, laser light field is propagated along specific angular regions, by the microscopic appearance of design modifying diffraction optical element, realize the angle of divergence design of required complicated illumination light field.
Preferably, described diffraction optical element is the angle of divergence performance for Semiconductor Laser Irradiation light source, carries out the design of light field angle of divergence modulation, for realizing the optical field distribution needed for optical system.
Preferably, described diffraction optical element is the light distribution performance for Semiconductor Laser Irradiation light source, carries out the modulation design of optical field distribution, for realizing the optical field distribution needed for optical system.
Preferably, described diffraction optical element, according to the light distribution requirement exporting illumination light field, to the light field of modulated semiconductor laser, carries out again the modulation design of optical field distribution, for realizing the optical field distribution needed for optical system.
Preferably, described semiconductor laser radiation source and diffraction optical element realize the design of required special-shaped light field, after light source irradiation diffraction optical element, form the light field of the certain light intensity distribution possessing overall optical system and need, the specific angle of divergence.
Preferably, described diffraction optical element is fresnel diffraction optical element or Fraunhofer diffraction optical element.
Preferably, described diffraction optical element possesses the function be adjusted to respectively X and the Y-direction angle of divergence of incident field, the angle of divergence of incident field is carried out Homogenization Treatments, realize the design optimization of the special-shaped light field of required laser lighting, after light source irradiation diffraction optical element, form the light field possessing the specific angle of divergence that overall optical system needs.
Preferably, described diffraction optical element possesses the function be adjusted to respectively the X of incident field and the luminous size of Y-direction, the luminous size of incident field is carried out Homogenization Treatments, realize the design optimization of the special-shaped light field of required laser lighting, after light source irradiation diffraction optical element, form the light field possessing the specific luminous size that overall optical system needs.
Preferably, the Wave-front phase of incident field carries out being adjusted to process by the design that the described diffraction optical element wavefront properties possessed for incident field carries out phase-modulation, realizes the design optimization of the special-shaped light field of required laser lighting.
Diffraction optical element is by the wavefront modification to incident field, realize the intensity Distribution Design of outgoing light field, generation principle and the traditional design of the illumination light field of its arbitrary shape, the angle of divergence have essential distinction, use a slice diffraction optical element can replace the function of the multiple optical devices in classic method, optical element is few, size is little, and light utilization ratio increases substantially, and can reach more than 90%, optical function is very abundant, can meet the demand of illuminated field of arbitrary shape, light distribution.
Diffraction optical element of the present invention is the optical parametric of based semiconductor laser instrument, and using for optical system needs, and designs and exports illumination light field distribution; Incorporate the design factor of incident light angle of divergence compression in this diffraction optical element, regulated the position of diffraction optical element, coordinate with the light field position of semiconductor laser and regulate, can the parameter of the illumination light field of regulation output accurately.
Laser coordinates the laser illumination system of diffraction optical element, is designed, the laser lighting light field can realize any complexity, acquiring a special sense by the combination of laser light field and diffraction optical element.
The diffraction optical element that the present invention applies, first the angle of divergence for semiconductor laser is asymmetric, the asymmetric characteristic of the M2 factor, be designed with angle compressibility factors different accordingly by the fast axle of diffraction optical element noise spectra of semiconductor lasers and the light of slow-axis direction, the light field of semiconductor laser can be carried out the homogenising of angle direction by this performance; Simultaneously also for Gauss or the super-Gaussian characteristic of semiconductor laser light distribution, carry out subregional light intensity process, this design performance realizes the homogenising of the light distribution of noise spectra of semiconductor lasers; On the basis of above-mentioned two designs, the incident field of semiconductor laser diffracted optical element is modulated to lighting angle symmetry, the uniform light field of light distribution, diffraction optical element is again for the requirement of output light field, new light field modulation is added again to modulated light field, the output light field required for realization.
Diffraction optical element possesses the feature that volume is little, installation is simple, cost is low, significantly can reduce the volume of optical system, reduces the cost of optical articles; Simultaneously to possess optical index tolerance larger for diffraction optical element, relative to spatial light modulator, fine dust, the dirty impact on special-shaped light field in its territory, transparent zone are very little, lower to the requirement of applied environment, complicated and diversified applied environment can be adapted to, fully achieve that the high light utilization ratio of light field, low cost, optical texture simplicity of design, size are little, high precision angle of divergence regulating system, improve function and the applicability of optical system greatly.
The present invention is designed and optical modulation by the diffraction optics of the light field parameter of diffraction optical element noise spectra of semiconductor lasers radiation source, make it can make full use of the optical property of semiconductor laser, and optical element is few, size is little, light utilization ratio is high, can more than 90% be reached, optical function is very abundant, can meet the demand of arbitrary shape, light distribution illumination light field.
Accompanying drawing explanation
Fig. 1 is the equivalent schematic of the fast axle angle of divergence of semiconductor laser of the present invention;
Fig. 2 is the equivalent schematic of semiconductor laser slow axis divergence of the present invention;
Fig. 3 is the equivalent schematic of semiconductor laser radiation source and diffraction optical element X-direction in the present invention;
Fig. 4 is the equivalent schematic of semiconductor laser radiation source and diffraction optical element Y-direction in the present invention.
Embodiment
Below in conjunction with accompanying drawing, the present invention is further detailed explanation, but be not limiting the scope of the invention.
As shown in Figure 1, the function of diffraction optical element is: incident beam is the laser beam of a parallel or divergent shape, incident beam irradiates diffraction optical element and realizes an outgoing light field, this diffraction optical element is the optical characteristics according to incident field, carry out targeted design, regulate the wavefront of incident field, realize the Fourier transform of incident field to required outgoing light field.LASER Light Source and diffraction optical element position are fixed, only by the adjustment of a slice diffraction optical element, the angle of divergence design of required complicated illumination light field can be realized, optical function is powerful, significantly can reduce the size of illuminator simultaneously, reduce the cost of illuminator, extend application and the application mode of laser illumination system.
As shown in Figures 2 and 3, the function 1 of diffraction optical element of the present invention: due to I
θand the impact of dx and dy, the real spherical wave of X and Y-direction converges focus and is not positioned on lasing fluorescence face, but along the intersection point of spherical wave backpropagation, the focus point of its X-direction and Y-direction is fx and fy to the distance of diffraction optical element respectively as shown in the figure.The X-direction of diffraction optical element inside possesses to be compressed (being similar to a focal length is the lens combination of fx) θ x angle, the y direction of diffraction optical element inside possesses to be compressed (being similar to a focal length is the lens combination of fy) θ y angle, divergent beams form the beam divergence angle homogenising of X, Y-direction after the modulation of this diffraction optical element, θ ox and θ oy ratio are about 1:1, for the light field process needs realizing post laser illumination.
The function 2 of the diffraction optical element of patent of the present invention: design has incorporated and designed for the Homogenization Treatments of dx and dy simultaneously, suppose that dx is less than dy, the X-direction of diffraction optical element inside possesses carries out size process (being similar to the lens that is of a size of dx) to dx, the y direction of diffraction optical element inside possesses carries out size process (being similar to the lens that is of a size of dy) to dy, the light beam of laser forms X after the modulation of this diffraction optical element, the beam sizes homogenising of Y-direction, significantly improve the ratio of spot size, for realizing post laser illumination light field needs.
Claims (9)
1. the laser lighting optical system be combined with diffraction optical element with semiconductor laser, it is characterized in that: it comprises semiconductor laser radiation source and diffraction optical element, after semiconductor laser radiation source irradiates diffraction optical element, the light field of semiconductor laser radiation source passes through the optical modulation of this diffraction optical element, laser light field is propagated along specific angular regions, by the microscopic appearance of design modifying diffraction optical element, realize the design of required complicated illumination light field.
2. the laser lighting optical system that is combined with diffraction optical element of a kind of semiconductor laser according to claim 1, it is characterized in that: described diffraction optical element is the angle of divergence performance for Semiconductor Laser Irradiation light source, carries out the design of light field angle of divergence modulation; For realizing the optical field distribution needed for optical system.
3. the laser lighting optical system that is combined with diffraction optical element of a kind of semiconductor laser according to claim 1, it is characterized in that: described diffraction optical element is the light distribution performance for Semiconductor Laser Irradiation light source, carries out the modulation design of optical field distribution; For realizing the optical field distribution needed for optical system.
4. the laser lighting optical system that is combined with diffraction optical element of a kind of semiconductor laser according to claim 1, it is characterized in that: described diffraction optical element is according to the light distribution requirement exporting illumination light field, to the light field of modulated semiconductor laser, carry out again the modulation design of optical field distribution, for realizing the optical field distribution needed for optical system.
5. the laser lighting optical system that is combined with diffraction optical element of a kind of semiconductor laser according to claim 1, it is characterized in that: described semiconductor laser radiation source and diffraction optical element realize the design of required special-shaped light field, after light source irradiation diffraction optical element, form the light field of the certain light intensity distribution possessing overall optical system and need, the specific angle of divergence.
6. the laser lighting optical system that is combined with diffraction optical element of a kind of semiconductor laser according to claim 1, is characterized in that: described diffraction optical element is fresnel diffraction optical element or Fraunhofer diffraction optical element.
7. the laser lighting optical system that is combined with diffraction optical element of a kind of semiconductor laser according to claim 1, it is characterized in that: described diffraction optical element possesses the function be adjusted to respectively X and the Y-direction angle of divergence of incident field, the angle of divergence of incident field is carried out Homogenization Treatments, realize the design optimization of the special-shaped light field of required laser lighting, after light source irradiation diffraction optical element, form the light field possessing the specific angle of divergence that overall optical system needs.
8. the laser lighting optical system that is combined with diffraction optical element of a kind of semiconductor laser according to claim 1, it is characterized in that: described diffraction optical element possesses the function be adjusted to respectively the X of incident field and the luminous size of Y-direction, the luminous size of incident field is carried out Homogenization Treatments, realize the design optimization of the special-shaped light field of required laser lighting, after light source irradiation diffraction optical element, form the light field possessing the specific luminous size that overall optical system needs.
9. the laser lighting optical system that is combined with diffraction optical element of a kind of semiconductor laser according to claim 1, it is characterized in that: the Wave-front phase of incident field carries out being adjusted to process by the design that the described diffraction optical element wavefront properties possessed for incident field carries out phase-modulation, realize the design optimization of the special-shaped light field of required laser lighting.
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| CN201510913075.3A CN105467598A (en) | 2015-12-11 | 2015-12-11 | A laser illuminating optical system combining a semiconductor laser and a diffractive optical element |
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| CN201510913075.3A CN105467598A (en) | 2015-12-11 | 2015-12-11 | A laser illuminating optical system combining a semiconductor laser and a diffractive optical element |
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Cited By (4)
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| CN110207940A (en) * | 2019-06-25 | 2019-09-06 | 中国航天空气动力技术研究院 | A kind of High-speed transient schlieren system applying to large tunnel |
| CN110548991A (en) * | 2019-09-06 | 2019-12-10 | 深圳市大德激光技术有限公司 | Light field distribution control method and system for laser welding of precise structural part of power battery |
| CN111522144A (en) * | 2020-05-15 | 2020-08-11 | 珠海迈时光电科技有限公司 | Laser beam splitter |
| CN114296245A (en) * | 2021-12-09 | 2022-04-08 | 华中光电技术研究所（中国船舶重工集团公司第七一七研究所） | Raman beam shaping device |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN110207940A (en) * | 2019-06-25 | 2019-09-06 | 中国航天空气动力技术研究院 | A kind of High-speed transient schlieren system applying to large tunnel |
| CN110548991A (en) * | 2019-09-06 | 2019-12-10 | 深圳市大德激光技术有限公司 | Light field distribution control method and system for laser welding of precise structural part of power battery |
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| CN111522144B (en) * | 2020-05-15 | 2022-08-23 | 珠海迈时光电科技有限公司 | Laser beam splitter |
| CN114296245A (en) * | 2021-12-09 | 2022-04-08 | 华中光电技术研究所（中国船舶重工集团公司第七一七研究所） | Raman beam shaping device |
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Effective date of registration: 20170922 Address after: 314500, building 3, building 1156, Gaoqiao Road, Gaoqiao Town, Tongxiang, Zhejiang, Jiaxing 8, China Applicant after: Jiaxing Yu light photoelectric technology Co. Ltd. Address before: 2 No. 452, No. 6, No. 310000, Poplar Street, Xiasha Economic Development Zone, Zhejiang, Hangzhou Province, 0804 Applicant before: HANGZHOU DONG SHANG OPTOELECTRONICS TECHNOLOGY CO., LTD. |
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