CN105428283B - 引线框架浸泡设备 - Google Patents
引线框架浸泡设备 Download PDFInfo
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- CN105428283B CN105428283B CN201511032141.2A CN201511032141A CN105428283B CN 105428283 B CN105428283 B CN 105428283B CN 201511032141 A CN201511032141 A CN 201511032141A CN 105428283 B CN105428283 B CN 105428283B
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- 238000002791 soaking Methods 0.000 title claims abstract description 29
- 230000005540 biological transmission Effects 0.000 claims abstract description 32
- 239000004065 semiconductor Substances 0.000 claims abstract description 13
- 239000000126 substance Substances 0.000 claims abstract description 12
- 238000007599 discharging Methods 0.000 claims abstract description 8
- 239000000463 material Substances 0.000 claims description 6
- 229910000831 Steel Inorganic materials 0.000 claims description 3
- 239000010959 steel Substances 0.000 claims description 3
- 238000007654 immersion Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances data:image/svg+xml;base64,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 data:image/svg+xml;base64,PD94bWwgdmVyc2lvbj0nMS4wJyBlbmNvZGluZz0naXNvLTg4NTktMSc/Pgo8c3ZnIHZlcnNpb249JzEuMScgYmFzZVByb2ZpbGU9J2Z1bGwnCiAgICAgICAgICAgICAgeG1sbnM9J2h0dHA6Ly93d3cudzMub3JnLzIwMDAvc3ZnJwogICAgICAgICAgICAgICAgICAgICAgeG1sbnM6cmRraXQ9J2h0dHA6Ly93d3cucmRraXQub3JnL3htbCcKICAgICAgICAgICAgICAgICAgICAgIHhtbG5zOnhsaW5rPSdodHRwOi8vd3d3LnczLm9yZy8xOTk5L3hsaW5rJwogICAgICAgICAgICAgICAgICB4bWw6c3BhY2U9J3ByZXNlcnZlJwp3aWR0aD0nODVweCcgaGVpZ2h0PSc4NXB4JyB2aWV3Qm94PScwIDAgODUgODUnPgo8IS0tIEVORCBPRiBIRUFERVIgLS0+CjxyZWN0IHN0eWxlPSdvcGFjaXR5OjEuMDtmaWxsOiNGRkZGRkY7c3Ryb2tlOm5vbmUnIHdpZHRoPSc4NS4wJyBoZWlnaHQ9Jzg1LjAnIHg9JzAuMCcgeT0nMC4wJz4gPC9yZWN0Pgo8dGV4dCB4PScxMy4zJyB5PSc1My42JyBjbGFzcz0nYXRvbS0wJyBzdHlsZT0nZm9udC1zaXplOjIzcHg7Zm9udC1zdHlsZTpub3JtYWw7Zm9udC13ZWlnaHQ6bm9ybWFsO2ZpbGwtb3BhY2l0eToxO3N0cm9rZTpub25lO2ZvbnQtZmFtaWx5OnNhbnMtc2VyaWY7dGV4dC1hbmNob3I6c3RhcnQ7ZmlsbDojRTg0MjM1JyA+SDwvdGV4dD4KPHRleHQgeD0nMjguMicgeT0nNjIuOScgY2xhc3M9J2F0b20tMCcgc3R5bGU9J2ZvbnQtc2l6ZToxNXB4O2ZvbnQtc3R5bGU6bm9ybWFsO2ZvbnQtd2VpZ2h0Om5vcm1hbDtmaWxsLW9wYWNpdHk6MTtzdHJva2U6bm9uZTtmb250LWZhbWlseTpzYW5zLXNlcmlmO3RleHQtYW5jaG9yOnN0YXJ0O2ZpbGw6I0U4NDIzNScgPjI8L3RleHQ+Cjx0ZXh0IHg9JzM1LjAnIHk9JzUzLjYnIGNsYXNzPSdhdG9tLTAnIHN0eWxlPSdmb250LXNpemU6MjNweDtmb250LXN0eWxlOm5vcm1hbDtmb250LXdlaWdodDpub3JtYWw7ZmlsbC1vcGFjaXR5OjE7c3Ryb2tlOm5vbmU7Zm9udC1mYW1pbHk6c2Fucy1zZXJpZjt0ZXh0LWFuY2hvcjpzdGFydDtmaWxsOiNFODQyMzUnID5PPC90ZXh0Pgo8L3N2Zz4K O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminum Chemical compound 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[Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N copper Chemical compound 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Classifications
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
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- H—ELECTRICITY
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Abstract
本发明公开了一种引线框架浸泡设备。引线框架浸泡设备包括放料装置、处理槽,和取料装置。所述处理槽包括槽体、传动机构和固持机构。所述槽体具有槽腔,该槽体的槽腔用于灌装化学处理液。所述传动机构设置在所述槽体的槽腔内。所述固持机构包括至少两个限位件。所有相邻两个限位件之间间隔设置且所述间隔大于或等于半导体引线框架的厚度。所述放料装置包括第一夹持机械手。所述第一夹持机械手设置在所述槽体上方。所述第一夹持机械手可升降并可水平移动地设置。所述第二夹持机械手设置在所述槽体上方。所述第二夹持机械手可升降并可水平移动地设置。所述引线框架浸泡设备对引线框架处理更全面。
Description
引线框架浸泡设备
技术领域
[0001] 本发明涉及一种半导体引线框架的处理设备,特别涉及一种引线框架浸泡设备。
背景技术
[0002] 在集成电路领域,一般需要采用半导体引线框作为集成电路芯片的载体。半导体 引线框架采用诸如金丝、铝丝、铜丝的键合材料实现芯片内部电路引出端与外引线的电气 连接,形成电气回路的关键结构件,它起到了和外部导线连接的桥梁作用。由于集成芯片的 高精度的生产要求,需要半导体引线框架光滑而没有毛刺。因而,一般需要进行化学浸泡, 从而便于进一步加工处理。现有技术中用于占用空间的限制,导致化学浸泡时间较短,从而 影响浸泡效果。现有的引线框架浸泡设备,引线框架部分浸泡在化学处理液中,不能完全浸 入处理液内,对有些引线框架不适用。
发明内容
[0003] 本发明的目的是为了克服现有技术中的不足,提供可对引线框架处理更全面的引 线框架浸泡设备。
[0004] 为实现以上目的,本发明通过以下技术方案实现:
[0005] 引线框架浸泡设备,其特征在于:包括放料装置、处理槽,和取料装置;
[0006] 所述处理槽包括槽体、传动机构和固持机构,所述槽体具有槽腔,该槽体的槽腔用 于灌装化学处理液;所述传动机构设置在所述槽体的槽腔内;所述固持机构包括至少两个 限位件,该至少两个限位件沿所述传动机构的运转方向依次排列设置,所有相邻两个限位 件之间间隔设置且所述间隔大于或等于半导体引线框架的厚度;
[0007] 所述放料装置包括第一夹持机械手,所述第一夹持机械手设置在所述槽体上方, 所述第一夹持机械手可升降并可水平移动地设置;
[0008] 所述取料装置包括第二夹持机械手,所述第二夹持机械手设置在所述槽体上方, 所述第二夹持机械手可升降并可水平移动地设置。
[0009] 优选地,所述限位件为止档柱或止档壁。
[0010] 优选地,所述固持机构还包括支撑件。所述支撑件设置在所述传动机构上。所述限 位件设置在所述支撑件上。
[0011] 优选地,所述支撑件开设有缺口及突出部。所述支撑件的突出部及缺口在沿所述 传动机构的运转方向上分别设置在所述支撑件的前端和尾端。所述缺口具有与所述突出部 相同的形状及尺寸。相邻两个支撑件中的一个支撑件的突出部设置为延伸至另一个支撑件 的缺口内。
[0012] 优选地,所述限位件包括主体、底端及顶端。所述限位件的底端设置在所述传动机 构上。相邻两个限位件的顶端之间的间距设置为大于所述相邻两个限位件的主体之间的间 距。
[0013] 优选地,所述限位件的主体为圆柱形,所述限位件的底端为圆锥形。
[0014] 优选地,所述传动机构为链条或钢带;所述链条包括多个依次连接的链节。
[0015] 优选地,所述相邻两个限位件之间的间距与一个链节长度相同。
[0016] 优选地,所述链条的链节上设置有安装座,所述安装座沿与所述链条的运转方向 垂直的方向突出设置;
[0017] 所述固持机构还包括支撑件,所述支撑件设置在所述安装座上;所述限位件设置 在所述支撑件上。
[0018] 优选地,所述引线框架浸泡设备还包括动力装置。所述动力装置设置为输出动力 以驱动所述传动机构运转。
[0019] 优选地,所述引线框架浸泡设备还包括上盖。所述上盖设置在所述槽体的槽腔的 开口上。所述上盖的前端开设有入料口。所述上盖的尾端开设有取料口。
[0020] 优选地,还包括第一驱动装置和第二驱动装置,所述第一驱动装置驱动所述第一 夹持机械手升降地设置;所述第二驱动装置驱动所述第二夹持机械手水平移动地设置。
[0021] 优选地,所述第一夹持机械手设置在第一安装座上,所述第一安装座可升降地设 置在第二安装座上;所述第二安装座可水平移动地设置在支架上。
[0022] 优选地,所述第一安装座上设置有第一导轨,所述第二安装座套装在所述第一导 轨上,所述第二安装座可沿所述第一导轨升降地设置在所述第一导轨上;所述支架上设置 有第二导轨,所述第二安装座可沿所述第二导轨滑动地设置在所述第二导轨上;所述第一 导轨竖直设置;所述第二导轨水平设置。
[0023] 优选地,所述第二夹持机械手与所述第一夹持机械手以相同的方式可升降并可水 平移动地设置。
[0024] 本发明提供的引线框架浸泡设备的固持机构将半导体引线框架维持在竖直位置, 也即是半导体引线框架的厚度方向即为化学浸泡槽的长度方向或运转方向,使得半导体引 线框架占用空间小且浸泡时间长,从而获得了较佳的处理效果。使用本发明,可将引线框架 全部浸入化学处理液内,处理效果更好。
附图说明
[0025] 图1为本发明的引线框架浸泡设备的结构示意图。
[0026]图2为图1的第一夹持机械手的结构示意图。
[0027]图3为图1的处理槽的结构示意图。
[0028]图4为图3的引处理槽包括上盖时的结构示意图。
[0029]图5为图3中的A处的放大示意图。
[0030]图6为图5中的部分第一限位件设置在支撑件、链节上的结构示意图之一。
[0031]图7为图6的部分第一限位件设置在支撑件、链节上的结构示意图之二。
[0032]图8为图6的部分第一限位件设置在支撑件、链节上的立体分解图。
具体实施方式
[0033]下面结合附图对本发明进行详细的描述:
[0034]如图1至4所不,其为本发明提供的一种引线框架浸泡设备1〇〇。所述引线框架浸泡 设备100包括所述放料装置、所述取料装置及处理槽103。所述引线框架浸泡设备100包括槽 体101、传动机构110、固持机构120及动力装置130。所述放料装置包括第一夹持机械手105。 所述第一夹持机械手105设置在所述槽体101上方。所述第一夹持机械手105可升降并可水 平移动地设置。所述取料装置包括第二夹持机械手107。所述第二夹持机械手1 〇7设置在所 述槽体101上方。所述第二夹持机械手107可升降并可水平移动地设置。
[0035]如图2所示,本发明还包括第一驱动装置1051,所述第一驱动装置1051驱动所述第 一夹持机械手105升降地设置。所述第一夹持机械手105设置在第一安装座1052上,所述第 一安装座1052可升降地设置在第二安装座1053上。第一驱动装置1051为气缸,驱动第一安 装座1052上升及下降。所述第二安装座1053可水平移动地设置在支架1054上。所述第一安 装座1052上设置有第一导轨1055,所述第二安装座1051套装在所述第一导轨1055上。所述 第二安装座1053可沿所述第一导轨1055升降地设置在第一导轨1055上。所述支架1054上设 置有第二导轨1056,所述第二安装座1051可沿所述第二导轨1056滑动地设置在所述第二导 轨1056上;所述第一导轨1055竖直设置;所述第二导轨1056水平设置。由于第一夹持机械手 1〇5与第二夹持机械手107结构可以相同,第二机械手107可使用相同的结构可升降并可水 平移动地设置,在此就不再赘述。
[0036]所述槽体101具有槽腔。所述槽体101的槽腔用于灌装化学处理液。在本实施例中, 半导体引线框架通过化学处理液的处理能够便于去除毛刺。所述槽体101可以设置在长方 体槽。可以想到的是,所述槽体101的上方具有开口。
[0037] 请一并参阅图5、图6及图7,所述传动机构110设置在所述槽体101内。所述传动机 构110用于带动引线框架。所述传动机构110可以为钢带、皮带等传输带。在本实施例中,所 述传动机构110采用链条实现传动。所述链条的数量只要满足传输要求即可。在本实施例 中,为了平衡受力以便于传输,所述链条为两条,且该两条链条平行设置。可以想到的是,所 述链条由多个链节依次连接而成。当然,所述传动机构110可以包括齿轮以带动链条。所述 传动机构110的链节还突出设置有安装座115。所述安装座115便于实现对下述限位件121的 设置。
[0038] 可以想到的是,可以采用人力转动传动机构110的方式实现半导体引线框架的传 输。在本实施例中采用动力装置130驱动所述传动机构110运转。所述动力装置130可以为电 动机。
[0039]所述固持机构120用将半导体引线框架在运转过程中不脱落,以实现化学处理液 的浸泡。所述固持机构12〇包括至少两个限位件121。所述限位件121沿所述传动件机构110 的运转方向设置在该传动机构110上,以跟随所述传动机构110运转。在本实施例中,所述每 一个链条上设置有一排限位件121。在同一排内的相邻限位件121之间间隔设置。该间隔大 于或等于引线框架的厚度,使得引线框架沿竖直方向容置在槽体101内,从而使得合理利用 了槽体1 〇 1的内部空间,使得槽体1 〇 1的长度能够较短,同时延长浸泡时间而达到较佳的处 理效果。所述限位件121可以为止挡柱或止挡壁,只要能够实现阻挡使得引线框架竖直设置 在槽体101内即可。所述止挡壁可以为盲孔、槽腔的侧壁实现竖直插设限位件121即可。在本 实施例中,所述限位件121为止档柱。所述限位件121包括主体128、底端127及顶端129。所述 底端127插设或焊接在所述传动机构110上。为了便于顺利对准及实现插设,所述相邻的顶 端120之间的间隔大于所述相邻主体128之间的间距。具体地,在本实施例中,所述主体128 为圆柱形,所述顶端129为圆锥形。
[0040] 为了便于安装及提高支撑性能,所述固持机构120还包括支撑件122。所述支撑件 122设置为板状。所述支撑件122设置在所述传动机构110的链节上。所述支撑件122开设有 缺口 123及突出部124。所述缺口 123、突出部124分别设置在所述支撑件122的前端和尾端。 需要说明的是,在本实施例中出现的“前”、“后”指的是沿传动机构110的运转方向的前后方 向。
[0041] 所述限位件121设置在支撑件122上。所述缺口 123、突出部124能够保证所有限位 件121的安装孔或焊接部沿同一条直线排列。所述相邻两个限位件121之间个间隔与所述一 个链节长度相同,从而保证链条的链节转动一个单位链节就能传输一个引线框架,从而便 于对速度的控制。
[0042] 为了密封防止化学处理液挥发及对环境及人体造成损伤,所述引线框架浸泡设备 100还包括上盖140。所述上盖140设置在所述槽体101的槽腔的开口上。为了便于进料及取 料,所述上盖140的前端开设有入料口 142,所述上盖的尾端开设有取料口 144。
[0043] 使用时,第一夹持机械手105水平移动以夹取引线框架,然后移动至槽腔上方,第 二底座1053沿竖直方向不动,则第一安装座1〇52可带动第一夹持机械手105升降。第一夹持 机械手105夹持引线框架下降后可将引线框架从入料口 142放入槽腔内的固持机构120上。 反之,第二夹持机械手107可自取料口 144从槽腔内的固持机构120上夹取引线框架后上升, 再水平移动并输送至指定的位置。
[0044]本发明中的实施例仅用于对本发明进行说明,并不构成对权利要求范围的限制, 本领域内技术人员可以想到的其他实质上等同的替代,均在本发明保护范围内。
Claims (13)
1.引线框架浸泡设备,其特征在于:包括放料装置、处理槽,和取料装置; 所述处理槽包括槽体、传动机构和固持机构,所述槽体具有槽腔,该槽体的槽腔用于灌 装化学处理液;所述传动机构设置在所述槽体的槽腔内;所述固持机构包括至少两个限位 件,该至少两个限位件沿所述传动机构的运转方向依次排列设置,所有相邻两个限位件之 间间隔设置且所述间隔大于或等于半导体引线框架的厚度; 所述放料装置包括第一夹持机械手,所述第一夹持机械手设置在所述槽体上方,所述 第一夹持机械手可升降并可水平移动地设置; 所述取料装置包括第二夹持机械手,所述第二夹持机械手设置在所述槽体上方,所述 第二夹持机械手可升降并可水平移动地设置。
2. 根据权利要求1所述的引线框架浸泡设备,其特征在于:所述限位件为止档柱或止档 壁。
3. 根据权利要求1所述的引线框架浸泡设备,其特征在于:所述固持机构还包括支撑 件,所述支撑件设置在所述传动机构上,所述限位件设置在所述支撑件上。
4. 根据权利要求3所述的引线框架浸泡设备,其特征在于:所述支撑件开设有缺口及突 出部,所述支撑件的突出部及缺口在沿所述传动机构的运转方向上分别设置在所述支撑件 的前端和尾端,所述缺口具有与所述突出部相同的形状及尺寸,相邻两个支撑件中的一个 支撑件的突出部设置为延伸至另一个支撑件的缺口内。
5. 根据权利要求1所述的引线框架浸泡设备,其特征在于:所述限位件包括主体、底端 及顶端,所述限位件的底端设置在所述传动机构上,相邻两个限位件的顶端之间的间距设 置为大于所述相邻两个限位件的主体之间的间距。
6. 根据权利要求1所述的引线框架浸泡设备,其特征在于:所述传动机构为链条或钢 带;所述链条包括多个依次连接的链节。
7. 根据权利要求6所述的引线框架浸泡设备,其特征在于:所述链条的链节上设置有安 装座,所述安装座沿与所述链条的运转方向垂直的方向突出设置;所述固持机构还包括支 撑件,所述支撑件设置在所述安装座上;所述限位件设置在所述支撑件上。
8. 根据权利要求1所述的引线框架浸泡设备,其特征在于:所述引线框架处理槽还包括 动力装置,所述动力装置设置为输出动力以驱动所述传动机构运转。
9. 根据权利要求1所述的引线框架浸泡设备,其特征在于:所述引线框架处理槽还包括 上盖,所述上盖设置在所述槽体的槽腔的开口上,所述上盖的前端开设有入料口,所述上盖 的尾端开设有取料口。
10.根据权利要求1所述的引线框架浸泡设备,其特征在于:还包括第一驱动装置和第 二驱动装置,所述第一驱动装置驱动所述第一夹持机械手升降地设置;所述第二驱动装置 驱动所述第二夹持机械手水平移动地设置。
11. 根据权利要求10所述的引线框架浸泡设备,其特征在于:所述第一夹持机械手设置 在第一安装座上,所述第一安装座可升降地设置在第二安装座上;所述第二安装座可水平 移动地设置在支架上。
12. 根据权利要求11所述的引线框架浸泡设备,其特征在于:所述第一安装座上设置有 第一导轨,所述第二安装座套装在所述第一导轨上,所述第二安装座可沿所述第一导轨升 降地设置在所述第一导轨上;所述支架上设置有第二导轨,所述第二安装座可沿所述第二 导轨滑动地设置在所述第二导轨上;诉讼第一导轨竖直设置;所述第二导轨水平设置。
13.根据权利要求1所述的引线框架浸泡设备,其特征在于:所述第二夹持机械手与所 述第-夹娜械手以綱的方式可升降并可水平移动地设置。
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