CN105404045A - Anti-electromagnetic wave brightening film and preparation method thereof - Google Patents

Anti-electromagnetic wave brightening film and preparation method thereof Download PDF

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CN105404045A
CN105404045A CN201510874879.7A CN201510874879A CN105404045A CN 105404045 A CN105404045 A CN 105404045A CN 201510874879 A CN201510874879 A CN 201510874879A CN 105404045 A CN105404045 A CN 105404045A
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anti
layer
electromagnetic
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film
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朱文峰
王善文
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东莞市纳利光学材料有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/118Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133504Diffusing, scattering, diffracting elements
    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133308LCD panel immediate support structure, e.g. front and back frame or bezel
    • G02F2001/133334Electromagnetic shield
    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133504Diffusing, scattering, diffracting elements
    • G02F2001/133507Luminance enhancement films

Abstract

The invention discloses an anti-electromagnetic wave brightening film and a preparation method thereof, and usage performance can be improved; the anti-electromagnetic wave brightening film comprises an upper brightening film and a lower brightening film; the upper brightening film comprises A base material, an anti-electromagnetic structure layer and a diffusion layer; the A base material comprises an A optical surface and a B optical surface; the anti electromagnetic structure is arranged on the A optical surface of the A base material; the diffusion layer is stacked on the B optical surface of the A base material; the lower brightening film comprises B base material and a B prism structure layer arranged on the B base material. The anti-electromagnetic wave brightening film can have anti-electromagnetic wave function, and can optimize the brightening film functions; in addition, the preparation method is simple, and suitable for mass production.

Description

一种抗电磁波増亮膜及其制备方法 An anti-electromagnetic wave zo bright film and method

技术领域 FIELD

[0001] 本发明涉及一种光学保护膜,尤其是涉及一种液晶显示器背光模组中的抗电磁波增亮膜。 [0001] The present invention relates to an optical protective film, particularly to an anti-electromagnetic wave a liquid crystal display brightness enhancing film of a backlight module.

背景技术 Background technique

[0002] 液晶显示器有着能耗低、重量轻、无辐射、无闪烁等优点,是目前市面上主流的显示器,但液晶作为一种被动发光材料,需要依靠背光模组才能实现图像的显示,一般来说, 背光模组由光源、反射膜、导光板、光学模组组成,其中光学模组包含下增亮膜、上增亮膜, 增亮膜一般包含基材和棱镜结构层,上增亮膜含雾化层。 [0002] The liquid crystal display has a low power consumption, light weight, no radiation, no flicker, etc., it is the mainstream market monitor, but a passive liquid crystal as a light emitting material, a backlight module can be implemented to rely on the displayed image, generally , the backlight module light source, a reflection film, a light guide plate composed of the optical module, wherein the optical module comprises the brightness enhancing film, a brightness enhancing film, a brightness enhancing film structure generally comprises a substrate layer and the prism, the brightening spray-containing film layer. 而目前市场上的增亮膜功能比较单一,不具备抗电磁波的功能,不能满意满足市场的需求。 At present brightness enhancement film features on the market relatively simple, does not have the anti-electromagnetic wave function, can not meet the needs of the market.

发明内容 SUMMARY

[0003] 本发明的目的是为了克服现有技术的不足,提供一种抗电磁波增亮膜,提升其使用性能。 [0003] The object of the present invention is to overcome the deficiencies of the prior art, there is provided a dual brightness enhancement film anti-electromagnetic wave, to enhance its performance.

[0004] 为达到上述目的,本发明采用以下方案: [0004] To achieve the above object, the present invention employs the following solutions:

[0005] -种抗电磁波增亮膜,包含有:上增亮膜与下增亮膜,上增亮膜包含A基材、抗电磁结构层以及扩散层;A基材包含A光学面和B光学面,抗电磁结构层设置在A基材的A光学面,扩散层层叠在A基材的B光学面;下增亮膜包括B基材、B棱镜结构层,B棱镜结构层设置在B基材上;抗电磁结构层为添加有抗电磁波材料的丙烯酸类树脂结构层;上增亮膜与下增亮膜的棱镜单体长度方向相互垂直,即抗电磁结构层与B棱镜结构层的棱镜单体长度方向相互垂直;棱镜单体截面为一等腰三角形,抗电磁结构层与B棱镜结构层的棱镜高度d2为15~30μm,棱镜单体之间的间距d4为20~40μm,棱镜单体截面为等腰三角形, 顶角角度α为85~95°。 [0005] - two anti-electromagnetic wave brightness enhancement film, comprising: a brightness enhancing film and a lower brightness enhancing film, a brightness enhancing film comprises a substrate A, anti-electromagnetic structure layer and a diffusion layer; A substrate comprising an optical surface A and B optical surface, anti-electromagnetic a structural layer provided on the optical surface of the base material a, B of the optical diffusion layer is laminated on the surface of the substrate a; B comprising a substrate under the dual brightness enhancement film, a prism structure layer B, layer B disposed on the prism structure B a substrate; anti-electromagnetic structure layer is added with an acrylic resin layer structure anti-electromagnetic material; brightness enhancing prism film longitudinal direction monomer and a brightness enhancement film under perpendicular to each other, i.e., anti-electromagnetic structure layer and the prism structure layer B monomer longitudinal direction of the prism perpendicular to each other; a cross-section of isosceles triangle prisms monomer, and B anti-electromagnetic structure of the prism layer of the prism structure layer height d2 of 15 ~ 30μm, the spacing d4 between the prisms monomers 20 ~ 40μm, the prism monomer cross-section of an isosceles triangle, apex angle α of 85 ~ 95 °.

[0006] 在其中一些实施例中,所述Α基材与Β基材为PET膜、PC膜或ΡΜΜΑ膜,Α基材与Β 基材厚度d0为23~100μm;扩散层为添加有光扩散粒子的扩散层,扩散层厚度d3为4~ 10μm〇 [0006] In some of these embodiments, the [alpha] substrate and Β substrate is a PET film, PC film or a film ΡΜΜΑ, [alpha] substrate and Β base thickness d0 is 23 ~ 100μm; add a light diffusion layer is a diffusion particle diffusion layer, the diffusion layer thickness d3 of 4 to 10μm〇

[0007] 在其中一些实施例中,所述扩散层和抗电磁结构层分置在A基材的两面,B棱镜结构层由若干平行的丙烯酸类树脂棱镜单体组成。 [0007] In some of these embodiments, the anti-diffusion layer, and both sides of the split electromagnetic structure of the substrate layer A, B prism structure of the prism layer made of acrylic resin, the monomer composition of several parallel.

[0008] 在其中一些实施例中,所述扩散层的原料组成及重量份为: [0008] In some of these embodiments, the feedstock composition and the parts by weight of the diffusion layer is:

[0009] 丙烯酸类树脂40~75份, 40 to 75 parts by [0009] an acrylic resin,

[0010] 光扩散粒子3~15份; [0010] The light-diffusing particles are 3 to 15 parts;

[0011] 光扩散粒子为ΡΜΜΑ粒子、PS粒子、Si02粒子或TiO2粒子的一种及其组合,粒子大小为2~5urn。 [0011] The light-diffusing particles, a particle ΡΜΜΑ PS Si02 particles or TiO2 particles and combinations of particles, a particle size of 2 ~ 5urn.

[0012] 在其中一些实施例中,所述抗电磁结构层的原料组成及重量份为: [0012] In some of these embodiments, the anti-magnetic material of the layer composition and structure of parts by weight:

[0013] 丙烯酸类树脂40~75份, 40 to 75 parts by [0013] an acrylic resin,

[0014] 抗电磁波材料8~26份; 8 to 26 parts by [0014] anti-electromagnetic wave material;

[0015] 抗电磁波材料的原料组成及重量份为: [0015] Composition of raw materials and parts by weight of an anti-electromagnetic wave material is:

[0016] 纳米银颗粒2CH35份, 溶剂46~70份, 增稠剂4~5.5份, 分散剂3~5份; [0016] 2CH35 parts of silver nanoparticles, 46 to 70 parts solvent, 5.5 parts thickener ~ 4, 3 to 5 parts of a dispersant;

[0017] 溶剂为松油醇(1~5份)与无水乙醇(45~65份)混合,增稠剂为乙基纤维素, 分散剂为司班-85。 [0017] The solvent is terpineol (1-5 parts) and ethanol (45 ~ 65 parts) were mixed, the thickener is ethyl cellulose, dispersant Span -85.

[0018] -种抗电磁波增亮膜的制造方法,制造方法如下: [0018] - A method of manufacturing, the method for producing seed brightness enhancing film anti-electromagnetic follows:

[0019] (1)、选用23~100μπι厚度的PET、PC或PMMA作为A基材,在A基材的B光学面涂布扩散层,涂布方式为微凹涂布或刮刀式涂布; [0019] (1), the choice of thickness 23 ~ 100μπι PET, PC or PMMA substrate as A, B in the optical diffusion surface of the coating layer A of the substrate, a micro gravure coating method of coating or knife coating;

[0020](2)、在A基材的A光学面用花纹辊转印添加有抗电磁波材料的丙烯酸类树脂涂布,并经烤箱与UV光源固化而形成带有若干平行棱镜单体的抗电磁结构层,得到上增亮膜; [0020] (2), the optical surface A of the substrate A was added using pattern roll transferred acrylic resin coating material, anti-electromagnetic wave, and oven cured with UV light to form an anti-parallel prisms with several monomers magnetic structure layer to obtain a brightness enhancing film;

[0021] 花纹辊为金属轮,表面电镀100~500μm厚度的铜层或镍层,表面微结构经单点金刚石刀具车削或激光成形加工而成; [0021] The pattern roll is a metal wheel, surface plating copper layer 100 to a thickness of 500μm or nickel layer, the surface microstructure of the tool by single point diamond turning, or laser shaping processed;

[0022] (3)、选用23~100μπι厚度的PET、PC或PMMA作为B基材,在B基材的上面用花纹辊转印丙烯酸类树脂涂布,并经烤箱与UV光源固化而形成带有若干平行棱镜单体的B棱镜结构层,得到下增亮膜; [0022] (3), the choice of the thickness of 23 ~ 100μπι PET, PC or PMMA as a substrate B, the substrate B in the above with acrylic resin transfer pattern roll coating, and oven cured with the UV light source is formed with a plurality of parallel prisms have a prism structure layer B monomers, to give the brightness enhancement film;

[0023] (4)、各自做好的上增亮膜、下增亮膜,使用时叠加使用,成为具有抗电磁波效果的增亮膜。 [0023] (4), each well on the brightness enhancement film, the brightness enhancement film, the use of superimposed use, become brightness enhancing film having anti-electromagnetic effects.

[0024] 本发明主要提供一种抗电磁波增亮膜,相比传统结构的增亮膜,其在提供轴向亮度增益的同时,能具有抗电磁波功能,优化增亮膜的功能,提高其使用价值。 [0024] The present invention provides an anti-electromagnetic wave brightness enhancing film, a brightness enhancement film compared to the conventional structure, which while providing on-axis brightness gain, having anti-electromagnetic energy function, a brightness enhancement film to optimize function and enhance its use value. 同时该制备方法简单,适用于大量生产。 Meanwhile, the preparation method is simple and suitable for mass production.

附图说明 BRIEF DESCRIPTION

[0025]图1为本发明实施例上增亮膜的示意图; [0025] FIG. 1 is a schematic embodiment of a brightness enhancement film on the embodiment of the invention;

[0026]图2为本发明实施例下增亮膜的示意图; [0026] FIG. 2 is a schematic diagram of the embodiment of the present invention, a brightness enhancing film;

[0027]图3为本发明实施例的结构示意图; [0027] Fig 3 a schematic view of the structure of an embodiment of the present invention;

[0028] 图4为本发明实施例的立体示意图。 [0028] FIG 4 a perspective schematic of an embodiment of the present invention.

[0029]附图标记说明: [0029] REFERENCE NUMERALS:

[0030] 上增亮膜10,A基材11,抗电磁结构层12,扩散层13,下增亮膜20,B基材21, B棱镜结构层22。 [0030] The brightness enhancing film 10, A substrate 11, anti-electromagnetic structure layer 12, diffusion layer 13, the luminance enhancement film 20, B substrate 21, B 22 of the prism structure layer.

具体实施方式 Detailed ways

[0031] 为能进一步了解本发明的特征、技术手段以及所达到的具体目的、功能,解析本发明的优点与精神,藉由以下通过实施例对本发明做进一步的阐述。 [0031] The further understanding of the characteristics of the present invention, and the technical means to achieve particular purposes, features, advantages and analytical spirit of the invention, the following further illustrated by the present invention through examples.

[0032] 本增亮膜组包括上增亮膜10和下增亮膜20,上增亮膜10包括A基材11、抗电磁结构层12、扩散层13,抗电磁波材料添加在抗电磁结构层12里,扩散层13和抗电磁结构层12分置在A基材11的两面;下增亮膜20包括B基材21、B棱镜结构层22。 [0032] The brightness enhancing film of the present brightness enhancement film 10 includes an upper group and a lower brightness enhancement film 20, the brightness enhancement film 10 comprises a substrate 11 A, anti-electromagnetic structure layer 12, diffusion layer 13, an anti-anti-electromagnetic wave material is added in the structure layer 12, the diffusion layers on both surfaces 13 and electromagnetic structure of the split layer 12 a of the substrate 11; the brightness enhancement film 20 comprises a substrate 21 is B, 22 B of the prism structure layer. 抗电磁结构层12为添加有抗电磁波材料的丙烯酸类树脂结构层,B棱镜结构层22由若干平行的丙烯酸类树脂棱镜单体组成。 Anti-electromagnetic structure layer 12 is added with an acrylic resin anti-layer structural material of electromagnetic waves, B prism structure layer 22 of an acrylic resin monomer plurality of parallel prisms composition.

[0033] 增亮膜基材(A基材11与B基材21)材料为PET、PC、PMMA等其中一种,厚度d0为23 ~100μm〇 [0033] The brightness enhancing film substrate (A substrate 11 and the substrate 21 B) material is PET, PC, PMMA and other one, a thickness of 23 ~ d0 100μm〇

[0034] 扩散层13的原料组成及重量份为:包括丙烯酸类树脂和光扩散粒子,光扩散粒子包含PMMA粒子、PS粒子、Si02粒子、TiO2等粒子一种或几种,粒子大小为2~5μm。 Composition of raw materials and parts by weight [0034] The diffusion layer 13 include: an acrylic resin and light-diffusing particles 2 ~ 5μm, the light diffusing particles comprise particles of PMMA, PS particles, Si02 particles, one or several - TiO2 particles such as particle size .

[0035] 抗电磁结构层12的原料组成及重量份为:丙烯酸类树脂40~75份,抗电磁波材料8~26份;抗电磁波材料成分主要为纳米银颗粒(20~35份),溶剂为松油醇(1~5份) 与无水乙醇(45~65份)混合,增稠剂为乙基纤维素(4~5. 5份),分散剂为司班-85 (3~ 5份)。 [0035] The feed composition and the parts by weight of an anti-electromagnetic structure layer 12 is: 40 to 75 parts of an acrylic resin, 8 to 26 parts by anti-electromagnetic material; anti-electromagnetic wave material composed mainly of silver nanoparticles (20 to 35 parts), the solvent is terpineol (1-5 parts) and ethanol (45 ~ 65 parts) were mixed, the thickener is ethyl cellulose (4 to 5.5 parts), the dispersant is Span -85 (3 to 5 parts ). 扩散层涂布方式为微凹涂布或刮刀式涂布。 Diffusion layer is a micro gravure coating method or a coating knife coating.

[0036] 抗电磁结构层12与B棱镜结构层22包含设置成规律的棱镜单体,棱镜单体高度d2为15~30μm,间距d4为20~40μm,其截面为等腰三角形,等腰三角形顶角角度α为85~95°。 [0036] The structural layer 12 and the anti-electromagnetic prism structure layer B comprising monomer prism 22 arranged at regular prism height d2 of the monomers 15 ~ 30μm, the distance d4 of 20 ~ 40μm, which cross section is an isosceles triangle, isosceles triangle apex angle α of 85 ~ 95 °. 抗电磁结构层12棱镜单体为添加有抗电磁波材料的丙烯酸类树脂经花纹辊转印并经UV光源固化而成,Β棱镜结构层22棱镜单体为丙烯酸类树脂经花纹辊转印并经UV 光源固化而成。 Anti-electromagnetic prism structure layer 12 is added with the monomer material, anti-electromagnetic acrylic resin was cured by the pattern roll and the transfer from a UV light source, Β prism structure of the prism layer 22 is an acrylic resin monomer was transferred pattern roll and dried UV light curing is made. 花纹辊为金属轮,表面电镀100~500μm厚度的铜层或镍层,表面微结构经单点金刚石刀具车削或激光成形加工而成。 A metal wheel pattern roll, a copper layer or nickel layer thickness of 100 ~ 500μm plated surface, surface microstructure by single point diamond turning, or laser cutter from molding.

[0037] 各自做好上增亮膜10和下增亮膜20,叠加使用就好。 [0037] each well on the brightness enhancement film 10 and the lower brightness enhancement film 20, like the use of overlay. 同时,上增量膜10上的扩散层已通过微凹或刮刀涂布得到;下增亮膜20只有棱镜结构,没有扩散层。 Meanwhile, the diffusion layer 10 has a film obtained by incremental micro gravure or knife coating; 20 only the brightness enhancement film prismatic structure, there is no diffusion layer.

[0038] 在其中一个实施例中,A基材11选用50μπι的PET,扩散层13采用微凹涂布,厚度d3为7~10μm,其中,光扩散粒子为3μm的Si02粒子,经烤箱与UV灯后完成扩散层13涂布。 [0038] In one embodiment, PET A selection 50μπι substrate 11, the diffusion layer 13 using a micro gravure coating, a thickness d3 of 7 ~ 10μm, wherein the light-diffusing particles is 3μm Si02 particles, dried and UV oven after the completion of light diffusion layer 13 is coated.

[0039] 在A基材11的另一面涂布抗电磁结构层12。 [0039] A substrate 11 on the other surface a coating layer against electromagnetic structure 12. A基材11上面用花纹辊转印添加有抗电磁波材料的丙烯酸类树脂,采用花纹辊转印方式涂布;抗电磁波材料成分主要为纳米银颗粒(26份),溶剂为松油醇(3份)与无水乙醇(60份)混合,增稠剂为乙基纤维素(4.7 份),分散剂为司班-85 (3. 8份),主胶为丙烯酸类树脂,经烤箱与UV灯后完成抗电磁结构层12涂布。 A substrate 11 is added with the above pattern roll transferred acrylic resin anti-electromagnetic wave material, pattern roll transfer system using a coating; anti-electromagnetic wave material composed mainly of silver nanoparticles (26 parts), the solvent is terpineol (3 parts) and ethanol (60 parts) were mixed, the thickener is ethyl cellulose (4.7 parts), the dispersant is Span -85 (3.8 parts), an acrylic resin, a main rubber, and oven-UV after the completion of the lamp against electromagnetic structure of the coating layer 12.

[0040] 抗电磁结构层12高度为23μm,间距为33μm,截面为等腰直角三角形,得到上增亮膜10 ; [0040] The structural layer 12 against electromagnetic height of 23 m, a pitch of 33 m, an isosceles right triangle cross-section, obtained on the brightness enhancement film 10;

[0041] 下增亮膜20按上述结构层方式涂布。 Applying a structural layer 20 above embodiment [0041] of the brightness enhancing film.

[0042] 各自做好的上增亮膜10、下增亮膜20,使用时叠加使用,成为具有抗电磁波效果的增亮膜。 [0042] each well on the brightness enhancement film 10, 20, using the overlay using a brightness enhancing film, a brightness enhancing film having anti-electromagnetic wave becomes effect.

[0043] 以上所述实施例仅表达了本发明的部分实施方式,其描述较为具体和详细,但并不能因此而理解为对本发明范围的限制。 [0043] The above embodiments are only expressing part of the embodiment of the present invention, and detailed description thereof is more specific, but can not therefore be construed as limiting the scope of the present invention. 应当指出的是,对于本领域的普通技术人员来说, 在不脱离本发明构思的前提下,还可以做出若干变形和改进,这些都属于本发明的保护范围。 It should be noted that those of ordinary skill in the art, without departing from the spirit of the present invention, can make various changes and modifications, which fall within the protection scope of the present invention. 因此,本发明的保护范围应以所附权利要求为准。 Accordingly, the scope of the invention should be defined by the appended claims.

Claims (6)

1. 一种抗电磁波增亮膜,包含有:上增亮膜(10)与下增亮膜(20),其特征在于,所述上增亮膜(10)包含A基材(11)、抗电磁结构层(12)化及扩散层(13);所述A基材(11)包含A光学面和B光学面,所述抗电磁结构层(12)设置在A基材(11)的A光学面,所述扩散层(1扣层叠在A基材(11)的B光学面;所述下增亮膜(20)包括B基材(21)、B棱镜结构层(22),所述B棱镜结构层(22)设置在B基材(21)上;所述抗电磁结构层(12)为添加有抗电磁波材料的丙締酸类树脂结构层; 所述抗电磁结构层(12)与B棱镜结构层(22)由若干平行的棱镜单体组成;所述抗电磁结构层(12)与B棱镜结构层(22)的棱镜单体长度方向相互垂直;所述棱镜单体截面为一等腰Ξ角形,所述抗电磁结构层(12)与B棱镜结构层(22)的棱镜高度为15~30μm,所述棱镜单体之间的间距为20~40μm,所述棱镜单体截面为等腰Ξ角 A brightness enhancement film anti-electromagnetic wave, comprising: a brightness enhancing film (10) and a lower brightness enhancing film (20), wherein said brightness enhancing film (10) comprises a substrate A (11), anti-electromagnetic structure layer (12) and of the diffusion layer (13); said a base material (11) comprising an optical surface a and B optical surface, the anti-electromagnetic structure layer (12) provided on the substrate a (11) a optical surface, said diffusion layer (an optical surface fastener B a laminated base (11); said lower brightness enhancing film (20) comprising a substrate B (21 is), the prism structure layer B (22), the said layer B prism structure (22) disposed on the substrate B (21); an electromagnetic structure layer (12) is added with the anti-propan-associative structure type resin layer anti-electromagnetic material; anti-electromagnetic said structural layer (12 ) B and a prism structure layer (22) by a plurality of parallel prisms monomer composition; anti-electromagnetic said structure layer (12) and a prism structure layer B (22) perpendicular to the longitudinal direction of each prism monomers; cross section of the prism monomer Ξ is an isosceles triangle, the anti-electromagnetic structure layer (12) and a prism height B of the prism structure layer (22) is 15 ~ 30μm, the spacing between the prisms monomer is 20 ~ 40μm, the single prism body section angle isosceles Ξ 形,顶角角度为85~ 95。。 Shape, apex angle of 85 to 95 ..
2. 根据权利要求1所述的一种抗电磁波增亮膜,其特征在于,所述A基材(11)与B基材(21)为PET膜、PC膜或PMMA膜,所述A基材(11)与B基材(21)厚度为23~100μπι; 所述扩散层(13)为添加有光扩散粒子的扩散层,所述扩散层(13)厚度为4~10μm。 2. An anti-electromagnetic wave brightness enhancing film according to claim 1, wherein said A substrate (11) and the base B (21) PET film, PC or PMMA film is a film, the group A material (11) and the base B (21) having a thickness of 23 ~ 100μπι; the diffusion layer (13) is added light diffusing particles diffusion layer, said diffusion layer (13) having a thickness of 4 ~ 10μm.
3. 根据权利要求1所述的一种抗电磁波增亮膜,其特征在于,所述扩散层(13)和抗电磁结构层(12)分置在A基材(11)的两面;所述B棱镜结构层(22)由若干平行的丙締酸类树脂棱镜单体组成。 3. An anti-electromagnetic wave brightness enhancing film according to claim 1, characterized in that the layer (13) and electromagnetic structure layer (12) split on both sides of the substrate A (11) of said diffusion; the B prism structure layer (22) consists of propionic acid associative monomers plurality of parallel prisms resin composition.
4. 根据权利要求2所述的一种抗电磁波增亮膜,其特征在于,所述扩散层(13)的原料组成及重量份为: 丙締酸类树脂40~75份, 光扩散粒子3~15份; 所述光扩散粒子为PMMA粒子、PS粒子、Si化粒子或TiO2粒子的一种及其组合,粒子大小为2~5μηι。 4. The brightness enhancing film of an anti-electromagnetic wave according to claim 2, wherein said feed composition and the parts by weight of diffusion layer (13) is: 40 to 75 parts malonic acid associative resin, light-diffusing particles 3 to 15 parts; the light diffusing particles are PMMA particles, PS particles, Si and a combination thereof or the particles, the particle size of the TiO2 particles is 2 ~ 5μηι.
5. 根据权利要求2所述的一种抗电磁波增亮膜,其特征在于,所述抗电磁结构层(12) 的原料组成及重量份为: 丙締酸类树脂40~75份, 抗电磁波材料8~26份; 所述抗电磁波材料的原料组成及重量份为: 纳米银颗粒20~35份, 溶别46~70份, 增稠剂4~5.5份, 分散剂3~日份; 溶剂为松油醇与无水乙醇混合,增稠剂为乙基纤维素,分散剂为司班-85 ; 溶剂为松油醇:1~5份与无水乙醇:45~65份的混合。 An anti-electromagnetic wave brightness enhancing film according to claim 2, wherein the anti-magnetic layer structure (12) and parts by weight of the composition of the raw material: 40 to 75 parts malonic acid resin association, anti-electromagnetic 8 to 26 parts by material; anti-electromagnetic the raw material composition and the parts by weight: nano silver particles 20 to 35 parts, respectively 46 to 70 parts of solvent, 4 to 5.5 parts thickeners, dispersants ~ 3 days parts; solvent ethanol is mixed with terpineol, ethyl cellulose thickener, dispersant Span -85; terpineol solvent: 1 to 5 parts of ethanol: mixing 45 to 65 parts.
6. -种如权利要求1~5任一项所述抗电磁波增亮膜的制造方法,其特征在于,制造方法如下: (1) 、选用23~100μπι厚度的阳T、PC或PMMA作为A基材(11),在A基材(11)的B光学面涂布扩散层(13),涂布方式为微凹涂布或刮刀式涂布; (2) 、在A基材(11)的A光学面用花纹漉转印添加有抗电磁波材料的丙締酸类树脂涂布,并经烤箱与UV光源固化,而形成带有若干平行棱镜单体的抗电磁结构层(12),得到上增亮膜(10); 花纹漉为金属轮,表面电锻100~500μm厚度的铜层或儀层,表面微结构经单点金刚石刀具车削或激光成形加工而成; (3) 、选用23~100μπι厚度的阳T、PC或PMMA作为B基材(21),在B基材(21)的上面用花纹漉转印丙締酸类树脂涂布,并经烤箱与UV光源固化而形成带有若干平行棱镜单体的B棱镜结构层(22),得到下增亮膜(20); (4) 、各自做好的上增亮膜(10)、下增亮膜 6 - Species 1 to 5 for producing an electromagnetic wave method according to any one of the anti-dual brightness enhancement film as claimed in claim, characterized in that the production method is as follows: male T, PC, or of PMMA (1), the choice of the thickness of 23 ~ 100μπι as A a substrate (11), in the substrate a (11) B of the optical diffusion surface of the coating layer (13), a micro gravure coating method of coating or knife coating; (2), the substrate a (11) a surface of the optical pattern added with glistening transferred propan associative acid resin coating material, anti-electromagnetic wave, and oven cured with UV light to form an anti-electromagnetic structure layer (12) having a plurality of parallel prisms monomers, to give the brightness enhancing film (10); a metal pattern round glistening, forging surface potential meter 100 to the copper layer or the thickness of the layer of 500μm, surface microstructure by single point diamond turning, or laser cutter from molding; (3), the choice of 23 Yang ~ T, PC, or PMMA 100μπι thickness as the base B (21), above the base B (21) is associated with malonic acid transfer pattern glistening coating resin, and oven cured with the UV light source is formed with B has a prism structure layer (22) a plurality of parallel prisms monomers, to give the brightness enhancing film (20); (4), each well on the brightness enhancement film (10), the brightness enhancement film 20),使用时叠加使用,成为具有抗电磁波效果的增亮膜。 20), using the superposition use, become brightness enhancing film having anti-electromagnetic effects.
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