CN105126614B - A kind of low temperature plasma gas odor removal - Google Patents
A kind of low temperature plasma gas odor removal Download PDFInfo
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 12
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- 238000004332 deodorization Methods 0.000 claims abstract description 9
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052753 mercury Inorganic materials 0.000 claims abstract description 8
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- KMAKOBLIOCQGJP-UHFFFAOYSA-N indole-3-carboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CNC2=C1 KMAKOBLIOCQGJP-UHFFFAOYSA-N 0.000 claims description 8
- KWIUHFFTVRNATP-UHFFFAOYSA-N Betaine Natural products C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 claims description 7
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 claims description 6
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 4
- 239000004593 Epoxy Substances 0.000 claims description 4
- 239000002202 Polyethylene glycol Substances 0.000 claims description 4
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 claims description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 4
- 229960003237 betaine Drugs 0.000 claims description 4
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 claims description 4
- 229920001223 polyethylene glycol Polymers 0.000 claims description 4
- 229940051841 polyoxyethylene ether Drugs 0.000 claims description 4
- 229920000056 polyoxyethylene ether Polymers 0.000 claims description 4
- GLZPCOQZEFWAFX-UHFFFAOYSA-N Geraniol Chemical compound CC(C)=CCCC(C)=CCO GLZPCOQZEFWAFX-UHFFFAOYSA-N 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- OGLDWXZKYODSOB-SNVBAGLBSA-N alpha-phellandrene Natural products CC(C)[C@H]1CC=C(C)C=C1 OGLDWXZKYODSOB-SNVBAGLBSA-N 0.000 claims description 3
- 239000008367 deionised water Substances 0.000 claims description 3
- 229910021641 deionized water Inorganic materials 0.000 claims description 3
- -1 p-ureidophenylarsine Chemical compound 0.000 claims description 3
- 229920001444 polymaleic acid Polymers 0.000 claims description 3
- KTCHEMONOXOHMN-UHFFFAOYSA-M sodium 2,2,3,3,4-pentahydroxyhexanoate Chemical compound OC(C(C(C(=O)[O-])(O)O)(O)O)CC.[Na+] KTCHEMONOXOHMN-UHFFFAOYSA-M 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- OGLDWXZKYODSOB-UHFFFAOYSA-N α-phellandrene Chemical compound CC(C)C1CC=C(C)C=C1 OGLDWXZKYODSOB-UHFFFAOYSA-N 0.000 claims description 3
- KWIUHFFTVRNATP-UHFFFAOYSA-O N,N,N-trimethylglycinium Chemical compound C[N+](C)(C)CC(O)=O KWIUHFFTVRNATP-UHFFFAOYSA-O 0.000 claims 1
- 230000003647 oxidation Effects 0.000 abstract description 9
- 241000894006 Bacteria Species 0.000 abstract description 6
- 244000005700 microbiome Species 0.000 abstract description 6
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 abstract description 5
- 239000000428 dust Substances 0.000 abstract description 5
- 239000002245 particle Substances 0.000 abstract description 5
- 238000005516 engineering process Methods 0.000 abstract description 4
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- 239000007789 gas Substances 0.000 description 21
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- 239000013067 intermediate product Substances 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 231100000331 toxic Toxicity 0.000 description 3
- 230000002588 toxic effect Effects 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000006555 catalytic reaction Methods 0.000 description 2
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- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
- 150000003384 small molecules Chemical class 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
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- DNJIEGIFACGWOD-UHFFFAOYSA-N ethanethiol Chemical compound CCS DNJIEGIFACGWOD-UHFFFAOYSA-N 0.000 description 1
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- 239000000203 mixture Substances 0.000 description 1
- 239000010813 municipal solid waste Substances 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 210000000056 organ Anatomy 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
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- 229910001923 silver oxide Inorganic materials 0.000 description 1
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- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical class S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 1
- 229910052815 sulfur oxide Inorganic materials 0.000 description 1
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- Physical Or Chemical Processes And Apparatus (AREA)
- Disinfection, Sterilisation Or Deodorisation Of Air (AREA)
- Treating Waste Gases (AREA)
Abstract
本发明公开了一种低温等离子气体除臭装置，所述装置包括不锈钢反应箱以及在不锈钢反应箱两端设置的进气口、出气口。不锈钢反应箱内靠近进气口一侧依次设置活性炭过滤层、低温等离子反应腔，低温等离子反应腔内平行设置多组反应极板，低温等离子反应腔四周内壁上均匀安装多个紫外汞灯，并且四周内壁涂覆催化氧化反应涂层。本装置将低温等离子技术与涂层催化氧化、紫外氧化技术完美结合，成功解决了等离子体在净化过程中存在氧化不完全和臭氧残留导致二次污染的问题，降低了低温等离子的能耗。通过本装置处理的废气，恶臭气体的除率达到98%以上，有害微生物、细菌的去除率达到98.9%，粉尘颗粒的去除率达到96.2%。
The invention discloses a low-temperature plasma gas deodorization device, which comprises a stainless steel reaction box and air inlets and gas outlets arranged at both ends of the stainless steel reaction box. An activated carbon filter layer and a low-temperature plasma reaction chamber are arranged in turn in the stainless steel reaction box near the air inlet. Multiple sets of reaction plates are arranged in parallel in the low-temperature plasma reaction chamber. Multiple ultraviolet mercury lamps are evenly installed on the inner walls of the low-temperature plasma reaction chamber, and The surrounding inner walls are coated with a catalytic oxidation reaction coating. This device perfectly combines low-temperature plasma technology with coating catalytic oxidation and ultraviolet oxidation technology, successfully solves the problems of incomplete oxidation and secondary pollution caused by residual ozone in the plasma purification process, and reduces the energy consumption of low-temperature plasma. The exhaust gas treated by this device has a removal rate of more than 98% for malodorous gas, 98.9% for harmful microorganisms and bacteria, and 96.2% for dust particles.
Description
技术领域technical field
本发明涉及一种低温等离子气体除臭装置，属于环境保护中的废气处理领域。The invention relates to a low-temperature plasma gas deodorization device, which belongs to the field of waste gas treatment in environmental protection.
背景技术Background technique
恶臭污染物是指一切刺激嗅觉器官引起人们不愉快及损害生活环境的气体物质。常见恶臭污染物按组成可分为含硫化合物、含氮化合物、卤素及衍生物、烃类以及含氧有机化合物等。城市生活垃圾堆放地由于空气不流通，经发酵后释放出的气体中经常含有上述物质，因此会有较大的恶臭气味，严重影响生活环境已经人体健康。Odor pollutants refer to all gaseous substances that stimulate the olfactory organs to cause people's unpleasantness and damage the living environment. Common odor pollutants can be divided into sulfur-containing compounds, nitrogen-containing compounds, halogens and their derivatives, hydrocarbons, and oxygen-containing organic compounds according to their composition. Due to the lack of air flow in the municipal solid waste dump site, the gas released after fermentation often contains the above-mentioned substances, so there will be a relatively large stench, which seriously affects the living environment and human health.
恶臭污染物常可采用稀释扩散法、中和法、吸收法、吸附法、热破坏法、微生物法等治理，但上述方法都有缺陷，比如吸收法需要消耗吸收剂，且处理效率不高，恶臭污染物仅由气相转移到液相，无法彻底消除。吸附法对低浓度恶臭气体脱除效率较高，但吸附剂需及时更换或再生，恶臭污染物仅由气相转移到固相，也无法彻底消除。热破坏法虽然能彻底消除污染物，但由于设备易腐蚀，消耗燃料，处理成本高，易形成二次污染等缺陷极大限制了其应用。Odor pollutants can often be treated by dilution diffusion method, neutralization method, absorption method, adsorption method, thermal destruction method, microbial method, etc., but the above methods have defects, such as the absorption method needs to consume absorbent, and the treatment efficiency is not high. Odor pollutants are only transferred from the gas phase to the liquid phase and cannot be completely eliminated. The adsorption method has a high removal efficiency for low-concentration odorous gases, but the adsorbent needs to be replaced or regenerated in time, and the odorous pollutants can only be transferred from the gas phase to the solid phase, and cannot be completely eliminated. Although the thermal destruction method can completely eliminate pollutants, its application is greatly limited due to defects such as easy corrosion of equipment, fuel consumption, high treatment cost, and easy formation of secondary pollution.
低温等离子体是近年来新兴的一种废气处理方法，主要通过等离子体放电过程中产生的大量活性物种，这些活性物种和由活性物种产生的臭氧轰击污染物分子，使其电离、解离和激发，然后能引发一系列复杂的物理、化学反应，使复杂的大分子污染物转变为简单的小分子安全物质，或使有毒有害物质转变为无毒无害或低毒低害物质，从而使污染物得以降解去除。但是，等离子体在净化过程中可产生毒性更高的中间产物或者是分子更大，比原分子更难降解的中间产物，存在氧化不完全和臭氧残留导致二次污染的问题，同时过高的处理成本也是制约其应用的关键。Low-temperature plasma is an emerging exhaust gas treatment method in recent years. It mainly uses a large number of active species generated during the plasma discharge process. These active species and the ozone generated by the active species bombard pollutant molecules to ionize, dissociate and excite them. , and then can trigger a series of complex physical and chemical reactions, so that complex macromolecular pollutants can be transformed into simple small molecule safe substances, or toxic and harmful substances can be transformed into non-toxic, harmless or low-toxic and low-hazardous substances, thereby making pollution substances are degraded and removed. However, during the purification process, plasma can produce more toxic intermediate products or intermediate products with larger molecules and more difficult to degrade than the original molecules. There are problems of incomplete oxidation and secondary pollution caused by ozone residues. At the same time, too high The processing cost is also the key to restrict its application.
发明内容Contents of the invention
本发明的目的是提供一种低温等离子气体除臭装置，所述装置包括不锈钢反应箱以及在不锈钢反应箱两端设置的进气口、出气口。不锈钢反应箱内靠近进气口一侧依次设置活性炭过滤层、低温等离子反应腔，低温等离子反应腔内平行设置多组反应极板，低温等离子反应腔四周内壁上均匀安装多个紫外汞灯，反应极板和紫外汞灯与不锈钢反应箱外部的电源相连，并且四周内壁涂覆催化氧化反应涂层，催化氧化反应涂层包括以下按重量分数计的组分；The object of the present invention is to provide a low-temperature plasma gas deodorization device, which comprises a stainless steel reaction box and air inlets and gas outlets arranged at both ends of the stainless steel reaction box. The activated carbon filter layer and the low-temperature plasma reaction chamber are arranged in turn in the stainless steel reaction box near the air inlet. Multiple sets of reaction plates are arranged in parallel in the low-temperature plasma reaction chamber, and multiple ultraviolet mercury lamps are evenly installed on the inner walls of the low-temperature plasma reaction chamber. The pole plate and the ultraviolet mercury lamp are connected to the power supply outside the stainless steel reaction box, and the surrounding inner wall is coated with a catalytic oxidation reaction coating, and the catalytic oxidation reaction coating includes the following components by weight fraction;
硅酸乙酯 10-18份，10-18 parts of ethyl silicate,
聚顺丁烯二酸 15-21份，15-21 parts of polymaleic acid,
月桂醇聚氧乙烯醚 0.8-1.2份，Lauryl alcohol polyoxyethylene ether 0.8-1.2 parts,
(25R)-5α-螺甾(烷)-3β-醇 0.8-1.4份，(25R)-5α-spirosta(alkane)-3β-ol 0.8-1.4 parts,
3-吲哚甲酸 4-8份，4-8 parts of 3-indolecarboxylic acid,
二戊烯 4-10份，Dipentene 4-10 parts,
五羟基己酸钠 10-20份，10-20 parts of sodium pentahydroxycaproate,
聚乙二醇 0.5-1.1份，0.5-1.1 parts of polyethylene glycol,
磷酸三甲酚酯 8-12份，Tricresyl phosphate 8-12 parts,
三甲铵乙内酯 2-5份，2-5 parts of betaine,
2-甲基-5-(1-甲基乙基)-1,3-环己二烯 10-16份，10-16 parts of 2-methyl-5-(1-methylethyl)-1,3-cyclohexadiene,
纳米银 2-5份，Nano silver 2-5 parts,
对脲基苯胂酸 2-4份，2-4 parts of p-ureidophenylarsine,
2,6-二甲基-2,6-辛二烯-8-醇 6-12份，2,6-Dimethyl-2,6-octadien-8-ol 6-12 parts,
烯丙基聚氧烷基环氧基醚 6-10份，Allyl polyoxyalkylene epoxy ether 6-10 parts,
去离子水 20-30份。20-30 parts of deionized water.
所述不锈钢反应箱的箱体截面形状为正方形或圆形。The cross-sectional shape of the stainless steel reaction box is square or circular.
低温等离子反应腔的长度约为不锈钢反应箱长度的1/3-2/3。The length of the low-temperature plasma reaction chamber is about 1/3-2/3 of the length of the stainless steel reaction box.
本发明的优点在于：The advantages of the present invention are:
（1）本装置将低温等离子技术与涂层催化氧化、紫外氧化技术完美结合，成功解决了等离子体在净化过程中可产生毒性更高的中间产物或者是分子更大，比原分子更难降解的中间产物，存在氧化不完全和臭氧残留导致二次污染的问题，降低了低温等离子的能耗；(1) This device perfectly combines low-temperature plasma technology with coating catalytic oxidation and ultraviolet oxidation technology, and successfully solves the problem that the plasma can produce more toxic intermediate products or larger molecules during the purification process, which are more difficult to degrade than the original molecules The intermediate product has the problem of incomplete oxidation and secondary pollution caused by residual ozone, which reduces the energy consumption of low-temperature plasma;
（2）涂层中月桂醇聚氧乙烯醚、(25R)-5α-螺甾(烷)-3β-醇、3-吲哚甲酸、聚乙二醇、2,6-二甲基-2,6-辛二烯-8-醇、烯丙基聚氧烷基环氧基醚等几种物质具有羟基、甲氧基等官能团，在紫外照射和等离子电场的作用下释放出大量的羟基自由基、氧原子自由基，可以补充等离子电场生成自由基的不足。同时现有技术中使用的催化剂均为贵重金属催化剂，催化机理为降低反应活化能，与本发明中的催化机理完全不同，降低了催化反应的成本和装置的重量、简化了内部结构。(2) Lauryl alcohol polyoxyethylene ether, (25R)-5α-spirosta(alkane)-3β-ol, 3-indolecarboxylic acid, polyethylene glycol, 2,6-dimethyl-2, Several substances such as 6-octadiene-8-ol and allyl polyoxyalkylene epoxy ether have functional groups such as hydroxyl and methoxy, and release a large number of hydroxyl radicals under the action of ultraviolet radiation and plasma electric field , Oxygen atom free radicals, can supplement the lack of free radicals generated by the plasma electric field. Simultaneously, the catalysts used in the prior art are all precious metal catalysts, and the catalytic mechanism is to reduce the reaction activation energy, which is completely different from the catalytic mechanism of the present invention, which reduces the cost of the catalytic reaction and the weight of the device, and simplifies the internal structure.
（3）硅酸乙酯、磷酸三甲酚酯、三甲铵乙内酯三种物质复配，产生良好的附着性以及绝缘性，是涂层能够很好的附着在低温等离子反应腔表面，并且能够起到绝缘作用，无需再低温等离子反应腔内再设置绝缘材料。(3) Ethyl silicate, tricresyl phosphate, and betaine are compounded to produce good adhesion and insulation, so that the coating can be well attached to the surface of the low-temperature plasma reaction chamber, and can It plays an insulating role, and there is no need to install insulating materials in the low-temperature plasma reaction chamber.
（4）涂层中的氧化银与紫外线共同作用，可以将气体中存在的有害微生物、细菌有效杀灭。(4) The silver oxide in the coating and the ultraviolet rays work together to effectively kill harmful microorganisms and bacteria in the gas.
（5）通过紫外光催化、催化氧化、电场的协同效应，废气中的臭味物质、有害微生物、细菌等被有效地彻底去除。(5) Through the synergistic effect of ultraviolet light catalysis, catalytic oxidation, and electric field, odorous substances, harmful microorganisms, bacteria, etc. in the exhaust gas are effectively and completely removed.
通过本反应器处理的废气，恶臭气体的除率达到98%以上，有害微生物、细菌的去除率达到98.9%，粉尘颗粒的去除率达到96.2%。The exhaust gas treated by this reactor has a removal rate of more than 98% for malodorous gas, 98.9% for harmful microorganisms and bacteria, and 96.2% for dust particles.
附图说明Description of drawings
图1是低温等离子气体除臭装置的示意图；Fig. 1 is the schematic diagram of low temperature plasma gas deodorization device;
图2是低温等离子反应腔的横截面示意图；Fig. 2 is a schematic cross-sectional view of a low-temperature plasma reaction chamber;
图中：1-不锈钢反应箱、2-进气口、3-出气口、4-活性炭过滤层、5-低温等离子反应腔、6-紫外汞灯、7-催化氧化反应涂层、8-反应极板、9-电源。In the figure: 1-stainless steel reaction box, 2-inlet, 3-outlet, 4-activated carbon filter layer, 5-low temperature plasma reaction chamber, 6-ultraviolet mercury lamp, 7-catalytic oxidation reaction coating, 8-reaction polar plate, 9-power supply.
具体实施方式detailed description
为了更好地理解本发明，下面结合附图对本发明作进一步的详细说明。In order to better understand the present invention, the present invention will be further described in detail below in conjunction with the accompanying drawings.
如图1所示，一种低温等离子气体除臭装置，所述装置包括不锈钢反应箱1以及在不锈钢反应箱两端设置的进气口2、出气口3。不锈钢反应箱1内靠近进气口2一侧依次设置活性炭过滤层4、低温等离子反应腔5，低温等离子反应腔5内平行设置多组反应极板8，低温等离子反应腔5四周内壁上均匀安装多个紫外汞灯6，反应极板8和紫外汞灯7与不锈钢反应箱外部的电源9相连，并且四周内壁涂覆催化氧化反应涂层7，催化氧化反应涂层7包括以下按重量分数计的组分；As shown in FIG. 1 , a low-temperature plasma gas deodorization device includes a stainless steel reaction box 1 and an air inlet 2 and an air outlet 3 arranged at both ends of the stainless steel reaction box. In the stainless steel reaction box 1, near the air inlet 2, an activated carbon filter layer 4 and a low-temperature plasma reaction chamber 5 are arranged in sequence. In the low-temperature plasma reaction chamber 5, multiple sets of reaction plates 8 are arranged in parallel, and the inner walls of the low-temperature plasma reaction chamber 5 are uniformly installed A plurality of ultraviolet mercury lamps 6, the reaction plate 8 and the ultraviolet mercury lamp 7 are connected to the power supply 9 outside the stainless steel reaction box, and the surrounding inner wall is coated with a catalytic oxidation reaction coating 7, and the catalytic oxidation reaction coating 7 includes the following by weight fraction components;
硅酸乙酯 10-18份，10-18 parts of ethyl silicate,
聚顺丁烯二酸 15-21份，15-21 parts of polymaleic acid,
月桂醇聚氧乙烯醚 0.8-1.2份，Lauryl alcohol polyoxyethylene ether 0.8-1.2 parts,
(25R)-5α-螺甾(烷)-3β-醇 0.8-1.4份，(25R)-5α-spirosta(alkane)-3β-ol 0.8-1.4 parts,
3-吲哚甲酸 4-8份，4-8 parts of 3-indolecarboxylic acid,
二戊烯 4-10份，Dipentene 4-10 parts,
五羟基己酸钠 10-20份，10-20 parts of sodium pentahydroxycaproate,
聚乙二醇 0.5-1.1份，0.5-1.1 parts of polyethylene glycol,
磷酸三甲酚酯 8-12份，Tricresyl phosphate 8-12 parts,
三甲铵乙内酯 2-5份，2-5 parts of betaine,
2-甲基-5-(1-甲基乙基)-1,3-环己二烯 10-16份，10-16 parts of 2-methyl-5-(1-methylethyl)-1,3-cyclohexadiene,
纳米银 2-5份，Nano silver 2-5 parts,
对脲基苯胂酸 2-4份，2-4 parts of p-ureidophenylarsine,
2,6-二甲基-2,6-辛二烯-8-醇 6-12份，2,6-Dimethyl-2,6-octadien-8-ol 6-12 parts,
烯丙基聚氧烷基环氧基醚 6-10份，Allyl polyoxyalkylene epoxy ether 6-10 parts,
去离子水 约20-30份。About 20-30 parts of deionized water.
所述不锈钢反应箱1的箱体截面形状为正方形或圆形。低温等离子反应腔5的长度约为不锈钢反应箱1长度的1/3-2/3。The cross-sectional shape of the stainless steel reaction box 1 is square or circular. The length of the low-temperature plasma reaction chamber 5 is about 1/3-2/3 of the length of the stainless steel reaction box 1 .
低温等离子气体除臭装置的工作过程如下：The working process of the low temperature plasma gas deodorization device is as follows:
废气由进气口2进入不锈钢反应箱1内部，通过活性炭过滤层4拦截气体中粉尘颗粒，以减少粉尘颗粒对后续反应极板以及涂层的损伤，提升后续反应效率。之后气体进入低温等离子反应腔5，接通电源后，低温等离子反应腔5内的多组反应极板高压放电产生臭氧分子、羟基自由基、氧自由基和高能电子等强氧化性物质，气体中产生恶臭的大分子在上述强氧化物质和紫外线的复合作用下分解为小分子，同时分解产生的小分子接触到低温等离子反应腔5四周内壁涂覆的催化氧化反应涂层，在涂层的催化氧化下，得到二氧化碳、氮氧化物、硫氧化物水等无机分子。同时气体中存在的细菌、有害微生物也在强氧化物质和紫外线的复合作用下被杀死。The exhaust gas enters the interior of the stainless steel reaction box 1 through the air inlet 2, and the dust particles in the gas are intercepted by the activated carbon filter layer 4, so as to reduce the damage of the dust particles to the subsequent reaction plates and coatings, and improve the subsequent reaction efficiency. Afterwards, the gas enters the low-temperature plasma reaction chamber 5. After the power is turned on, the high-voltage discharge of multiple groups of reaction plates in the low-temperature plasma reaction chamber 5 produces strong oxidizing substances such as ozone molecules, hydroxyl radicals, oxygen free radicals, and high-energy electrons. The macromolecules that generate bad odor are decomposed into small molecules under the combined action of the above-mentioned strong oxidizing substances and ultraviolet rays. Under oxidation, inorganic molecules such as carbon dioxide, nitrogen oxides, and sulfur oxides are obtained. At the same time, bacteria and harmful microorganisms in the gas are also killed under the compound action of strong oxidizing substances and ultraviolet rays.
通过本反应器处理的废气，恶臭气体的除率达到98%以上，有害微生物、细菌的去除率达到98.9%，粉尘颗粒的去除率达到96.2%。The exhaust gas treated by this reactor has a removal rate of more than 98% for malodorous gas, 98.9% for harmful microorganisms and bacteria, and 96.2% for dust particles.
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