CN105088194A - Chemical vapor deposition equipment heated by microwaves - Google Patents
Chemical vapor deposition equipment heated by microwaves Download PDFInfo
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- CN105088194A CN105088194A CN201510535620.XA CN201510535620A CN105088194A CN 105088194 A CN105088194 A CN 105088194A CN 201510535620 A CN201510535620 A CN 201510535620A CN 105088194 A CN105088194 A CN 105088194A
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- chemical vapor
- cavity
- microwave heating
- vapor depsotition
- depsotition equipment
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Abstract
The invention relates to chemical vapor deposition equipment heated by microwaves. The equipment comprises a cavity; a disc-shaped hanging rack is arranged inside the cavity; a main shaft is arranged on the disc-shaped hanging rack; the upper end of the main shaft is connected with a power device; a rotating shaft is arranged below the disc-shaped hanging rack; the rotating shaft is connected with the main shaft through a transmission gear; the lower end of the rotating shaft is connected with cylindrical base bodies; a thermal insulation layer is arranged on the inner wall of the cavity; an air inlet device is connected to the bottom of the cavity; a water cooling interlayer is arranged on the outer wall of the air inlet device, and one or more baffles distributed uniformly are arranged inside the air inlet device; the side wall of the cavity is connected with horn-shaped waveguide tubes. According to the chemical vapor deposition equipment, the microwave heating power is adjusted through a microwave generator, and then the heating speed and temperature are adjusted; the heating efficiency is high, the accuracy of coating film thickness is guaranteed, a coated film is uniform in thickness, and the surface of the film is smooth.
Description
Technical field
The invention belongs to chemical vapor deposition (CVD) technical field, particularly relate to a kind of chemical vapor depsotition equipment of microwave heating.
Background technology
Chemical vapour deposition (English: ChemicalVaporDeposition, to be called for short CVD) is a kind of chemical technology being used for production high purity, high-performance solid-state material.Semiconductor industry uses this technology to produce thin-film material mostly, traditional CVD manufacturing process is placed on by matrix in equipment cavity, then cavity is vacuumized and be heated to temperature of reaction and keep, then pass into reactant gases in cavity, make its reactive deposition on matrix.The gas of the tail gas that reaction generates and not fully reaction is then extracted out processed by vacuum pump.But in existing CVD equipment, be use conventional graphite heating body heating cavity mostly, then cavity makes the gas inputted reach temperature of reaction by ir radiation.The equipment also had uses microwave direct heating reactant gases, makes it react and be deposited on matrix.These type of heating have high, the inefficient shortcoming of energy consumption.
Summary of the invention
Not enough for above-mentioned prior art, the invention provides a kind of chemical vapor depsotition equipment of microwave heating.
The present invention is achieved by the following technical solutions:
A kind of chemical vapor depsotition equipment of microwave heating, it is characterized in that, described equipment comprises: cavity, disc hanger is provided with in described cavity, main shaft is provided with above described disc hanger, the upper end connecting power device of described main shaft, rotating shaft is provided with below described disc hanger, described rotating shaft is connected with main shaft by transmitting gear, the lower end connecting cylinder shape matrix of described rotating shaft, described cavity inner wall is provided with thermal insulation layer, diffuser is connected with in the bottom of described cavity, described diffuser outer wall is provided with water-cooling sandwich, inside is provided with one or more equally distributed baffle plate, the sidewall of described cavity is connected with trumpet-shaped waveguide.
According to above-mentioned equipment, it is characterized in that, described cavity upper end is provided with the upper cover plate, the lower end that have air outlet and is provided with the lower cover having inlet mouth.
According to above-mentioned equipment, it is characterized in that, outside described disc hanger, be covered with quartz socket tube, be provided with even gas distribution plate bottom described quartz socket tube, described even gas distribution plate is wire netting.
According to above-mentioned equipment, it is characterized in that, described power set comprises: be arranged on the motor above described cavity, and the belt pulley be connected with described motor.
According to above-mentioned equipment, it is characterized in that, described trumpet-shaped waveguide is connected with microwave generator.
According to above-mentioned equipment, it is characterized in that, in described trumpet-shaped waveguide, be provided with diaphragm seal.
According to above-mentioned equipment, it is characterized in that, described horn-like waveguide comprises the interconnective waveguide pipeline section of two joints, and described two joint waveguide pipeline section joint flange places are provided with wire cloth shield gasket pad.
According to above-mentioned equipment, it is characterized in that, the flaring angular range of described horn-like waveguide is between 45 ° ~ 65 °.
According to above-mentioned equipment, it is characterized in that, the lagging material that described thermal insulation layer adopts is glass fibre.
According to above-mentioned equipment, it is characterized in that, described baffle plate is three.
According to above-mentioned equipment, it is characterized in that, be provided with three inlet mouths bottom described diffuser, be connected with inlet pipe respectively.
According to above-mentioned equipment, it is characterized in that, be connected with escape pipe with the air outlet on described cavity upper cover plate, described escape pipe is connected with scrap metal tail gas absorption bucket, is connected with spray scrubber with scrap metal tail gas absorption bucket.
Advantageous Effects of the present invention, the invention provides a kind of chemical vapor depsotition equipment of microwave heating, not only heating efficiency is high, also ensures the accurate of coating film thickness, and the film thickness plated is even, smooth surface.Temperature rise rate of the present invention is high, and plated film efficiency is high, and surface deposition efficiency is high, and Heating temperature is easy to control, cheap for manufacturing cost.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention.
Fig. 2 is the structural representation of waveguide of the present invention.
Embodiment
As shown in Figure 1, a kind of chemical vapor depsotition equipment of microwave heating, comprise: cavity 1, disc hanger 2 is provided with in cavity, main shaft is provided with above disc hanger, the upper end connecting power device of main shaft, junction adopts vacuum mechanical sealing member to ensure sealing, rotating shaft is provided with below disc hanger, rotating shaft is connected with main shaft by transmitting gear, the lower end of rotating shaft connects the cylindrical base 3 of each different size, wherein, power set comprises: be arranged on the motor 4 above cavity, and the belt pulley 5 to be connected with motor, power set can realize disc hanger and cylindrical base rotates, the reactant gases entered is deposited on matrix equably, rotary rpm is adjustable, in 1 ~ 200r/min scope, cavity inner wall is provided with thermal insulation layer 6 for insulation, and the lagging material that thermal insulation layer adopts is glass fibre, diffuser is connected with in the bottom of cavity, diffuser outer wall is provided with water-cooling sandwich 7, inside is provided with one or more equally distributed stainless steel baffle plate 8, preferably three, baffle plate, is provided with inlet mouth 19 and is connected with inlet pipe bottom diffuser, preferred inlet mouth is three, water-cooling sandwich causes inlet mouth interface because of overheated leakage to prevent thermal radiation in cavity, and baffle plate serves the effect of mixing to input gas, also divides the microwave that may leak to reflect to inside cavity simultaneously, prevents microwave from leakage further, cavity wall is connected with trumpet-shaped waveguide 9, its position is the altitude range that matrix hangs, trumpet-shaped waveguide expands the area of microwave radiation, preferably, flaring angular range is between 45 ° ~ 65 °, diaphragm seal 10 is provided with in trumpet-shaped waveguide, sealing sheet is little by dielectric loss, wave penetrate capability well, the highlyest can to make the tetrafluoroethylene of resistance to temperature 260 DEG C, while guarantee cavity can be evacuated to certain vacuum tightness, loss as far as possible few for microwave sent in cavity, trumpet-shaped waveguide is connected with microwave generator 11, cavity upper end is provided with the upper cover plate 12, the lower end that have air outlet and is provided with the lower cover 13 having inlet mouth, cavity and upper and lower cover plate thereof can make by microwave reflection material by stainless steel etc., escape pipe 14 is connected with the air outlet on cavity upper cover plate, escape pipe is connected with scrap metal tail gas absorption bucket, spray scrubber is connected with scrap metal tail gas absorption bucket, in order to process tail gas, absorb bucket for filling loose scrap metal (mainly iron filings), spray scrubber is divided into two-stage to absorb, and absorption liquid is the NaOH solution of concentration 0.1 ~ 5M, outside disc hanger, be covered with quartz socket tube 15, for the reaction chamber deposited as gas reaction, be provided with even gas distribution plate 16 bottom quartz socket tube, preferably, even gas distribution plate is wire netting, in order to prevent microwave from leakage in cavity by while input even gas distribution, preferably, tubaeform waveguide comprises the interconnective waveguide pipeline section 17,17 ', two of two joints and saves waveguide pipeline section joint flange place and be provided with wire cloth shield gasket pad 18, to prevent microwave leakage.
During use, start microwave generator and microwave heating is carried out to the matrix in cavity, in cavity, pass into reactant gases by diffuser, carry out deposition reaction, deposition reaction terminates, film former material, and tail gas is processed by scrap metal tail gas absorption bucket and spray scrubber.
The foregoing is only preferred embodiment of the present invention, not in order to limit the present invention, all any amendments done within the spirit and principles in the present invention, equivalent replacement or improvement etc., all should be included within protection scope of the present invention.
Claims (11)
1. the chemical vapor depsotition equipment of a microwave heating, it is characterized in that, described equipment comprises: cavity, disc hanger is provided with in described cavity, main shaft is provided with above described disc hanger, the upper end connecting power device of described main shaft, rotating shaft is provided with below described disc hanger, described rotating shaft is connected with main shaft by transmitting gear, the lower end connecting cylinder shape matrix of described rotating shaft, described cavity inner wall is provided with thermal insulation layer, diffuser is connected with in the bottom of described cavity, described diffuser outer wall is provided with water-cooling sandwich, inside is provided with one or more equally distributed baffle plate, the sidewall of described cavity is connected with trumpet-shaped waveguide.
2. the chemical vapor depsotition equipment of a kind of microwave heating according to claim 1, is characterized in that, described cavity upper end is provided with the upper cover plate, the lower end that have air outlet and is provided with the lower cover having inlet mouth.
3. the chemical vapor depsotition equipment of a kind of microwave heating according to claim 1, is characterized in that, is covered with quartz socket tube, is provided with even gas distribution plate bottom described quartz socket tube outside described disc hanger, and described even gas distribution plate is wire netting.
4. the chemical vapor depsotition equipment of a kind of microwave heating according to claim 1, is characterized in that, described power set comprises: be arranged on the motor above described cavity, and the belt pulley be connected with described motor.
5. the chemical vapor depsotition equipment of a kind of microwave heating according to claim 1, is characterized in that, described trumpet-shaped waveguide is connected with microwave generator.
6. the chemical vapor depsotition equipment of a kind of microwave heating according to claim 1, is characterized in that, in described trumpet-shaped waveguide, be provided with diaphragm seal.
7. the chemical vapor depsotition equipment of a kind of microwave heating according to claim 1, is characterized in that, described horn-like waveguide comprises the interconnective waveguide pipeline section of two joints, and described two joint waveguide pipeline section joint flange places are provided with wire cloth shield gasket pad.
8. the chemical vapor depsotition equipment of a kind of microwave heating according to claim 1, is characterized in that, the flaring angular range of described horn-like waveguide is between 45 ° ~ 65 °.
9. the chemical vapor depsotition equipment of a kind of microwave heating according to claim 1, is characterized in that, described baffle plate is three.
10. the chemical vapor depsotition equipment of a kind of microwave heating according to claim 1, is characterized in that, is provided with three inlet mouths, is connected respectively with inlet pipe bottom described diffuser.
The chemical vapor depsotition equipment of 11. a kind of microwave heatings according to claim 1, it is characterized in that, be connected with escape pipe with the air outlet on described cavity upper cover plate, described escape pipe is connected with scrap metal tail gas absorption bucket, is connected with spray scrubber with scrap metal tail gas absorption bucket.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510535620.XA CN105088194B (en) | 2015-08-28 | 2015-08-28 | A kind of chemical vapor depsotition equipment of microwave heating |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201510535620.XA CN105088194B (en) | 2015-08-28 | 2015-08-28 | A kind of chemical vapor depsotition equipment of microwave heating |
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| Publication Number | Publication Date |
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| CN105088194A true CN105088194A (en) | 2015-11-25 |
| CN105088194B CN105088194B (en) | 2018-01-09 |
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| CN201510535620.XA Active CN105088194B (en) | 2015-08-28 | 2015-08-28 | A kind of chemical vapor depsotition equipment of microwave heating |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109309035A (en) * | 2018-11-08 | 2019-02-05 | 德淮半导体有限公司 | Semiconductor processing chamber and forming method thereof, semiconductor technology device |
Citations (6)
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| US5582648A (en) * | 1988-11-15 | 1996-12-10 | Canon Kabushiki Kaisha | Apparatus for preparing a functional deposited film by microwave plasma chemical vapor deposition |
| CN2782708Y (en) * | 2005-03-28 | 2006-05-24 | 应用材料公司 | Mixer for mixing technological gas |
| CN202490566U (en) * | 2012-01-13 | 2012-10-17 | 苏州纺织机械有限公司 | Tail gas absorbing and treating device of tank |
| CN103074613A (en) * | 2012-12-25 | 2013-05-01 | 王奉瑾 | Microwave excitation CVD coating equipment |
| CN103718644A (en) * | 2011-08-04 | 2014-04-09 | 松下电器产业株式会社 | Microwave heating device |
| CN104726850A (en) * | 2013-12-23 | 2015-06-24 | 朱雨 | Microwave-plasma chemical vapor deposition equipment |
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2015
- 2015-08-28 CN CN201510535620.XA patent/CN105088194B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5582648A (en) * | 1988-11-15 | 1996-12-10 | Canon Kabushiki Kaisha | Apparatus for preparing a functional deposited film by microwave plasma chemical vapor deposition |
| CN2782708Y (en) * | 2005-03-28 | 2006-05-24 | 应用材料公司 | Mixer for mixing technological gas |
| CN103718644A (en) * | 2011-08-04 | 2014-04-09 | 松下电器产业株式会社 | Microwave heating device |
| CN202490566U (en) * | 2012-01-13 | 2012-10-17 | 苏州纺织机械有限公司 | Tail gas absorbing and treating device of tank |
| CN103074613A (en) * | 2012-12-25 | 2013-05-01 | 王奉瑾 | Microwave excitation CVD coating equipment |
| CN104726850A (en) * | 2013-12-23 | 2015-06-24 | 朱雨 | Microwave-plasma chemical vapor deposition equipment |
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| 国家发展和改革委员会资源节约和环境保护司编: "《国家重点节能技术推广目录汇编2011~2012》", 31 December 2013, 中国财政经济出版社 * |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109309035A (en) * | 2018-11-08 | 2019-02-05 | 德淮半导体有限公司 | Semiconductor processing chamber and forming method thereof, semiconductor technology device |
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| CN105088194B (en) | 2018-01-09 |
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