CN105005070B - The discriminating method and its device of doubtful ion beam after a kind of accelerator analysis magnet - Google Patents
The discriminating method and its device of doubtful ion beam after a kind of accelerator analysis magnet Download PDFInfo
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- CN105005070B CN105005070B CN201510303403.8A CN201510303403A CN105005070B CN 105005070 B CN105005070 B CN 105005070B CN 201510303403 A CN201510303403 A CN 201510303403A CN 105005070 B CN105005070 B CN 105005070B
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Abstract
The invention discloses the discriminating method and its device of doubtful ion beam after a kind of accelerator analysis magnet.The present invention installs a pair of symmetrical electrostatic deflection plates parallel with doubtful ion beam direct of travel additional after analysis magnet；Doubtful ion beam reaches ion beam location detector by electrostatic deflection plates, by the off-centered distance on ion beam location detector, determines whether to test required ion beam, and obtain shared share is how many.The present invention is not limited the accelerator type for producing doubtful ion beam；To doubtful ion beam caused by electrostatic accelerator, it is more convenient that correlation screens calculating；Species and number to doubtful ion beam do not limit；The line stability of doubtful ion beam is not required；The beam intensity of doubtful ion beam is not strict with, as long as the doubtful ion beam can be arrived by used ion beam location detector measurement；General principle is clear, and examination is simple in construction, and cost is low, using reliable.
Description
Technical field
The present invention relates to a kind of Zhen of doubtful ion beam after electromagnetic technique application field, more particularly to accelerator analysis magnet
Other method and its device.
Background technology
Under normal circumstances, from accelerator output ion beam composition it is not single, they either energy difference or
Quality is different.Therefore, often will be different in line with deflected ion beam analysis element in order to obtain required ion beam
The ion component of energy or different quality separates, and chooses the ion of the single component to suit the requirements by deflecting analysis system
System, to ensure the purity of ion beam, it is ensured that the experimental study work that correlation is carried out using ion beam is smoothed out.
Common deflected ion beam analysis element includes：Electrostatic analyzer, deflection magnet, switching magnet, analysis magnet and
Intersect split-field analyser etc., wherein with the most extensive of analysis magnet application.
Analysis magnet as a kind of Ion Momentum analyzer, its select needed for ion general principle for:
The magnetic field that wherein B is applied by analysis magnet, Q are the quantity of electric charge of ion institute band, and M is the quality of ion, and V is ion
Speed, R be analysis magnet radius of curvature.
From formula (1) if the momentum MV that can be seen that ion is identical with quantity of electric charge Q ratio, even if the quality of ion
Two kinds of ions of identical, analysis magnet are not also can not separate them from principle with speed.
The ion beam obtained after accelerator accelerates, generally, main component are the ion beam of certain single component,
Proportion would generally be very high in total ion beam for it, if the ion to be chosen of experiment is exactly the total ion beam of this composition
The single ionic of main component, the magnetic field of analysis magnet is adjusted according to formula (1), it is met that ion needed for experiment smoothly leads to
The momentum analysis condition needed is crossed, then by the ion that analysis magnet obtains without suspected of ion beam needed for the very high experiment of purity.
But if proportion share is very small in total beam of the ion beam composition to be chosen before analysis magnet, or
The presence of ion beam composition needed for the experiment is determined even without very assurance, in this case by analysis after magnet, to obtaining
The ion beam for meeting analysis magnet momentum analysis condition obtained, it is necessary to which very conscientious is treated, it is impossible to which blindness thinks
The ion beam obtained after analysis magnet is the ion beam needed for experiment.Because on the one hand, the ion beam of particle booster entrance
Purity may not be very high, and the high energy ion beam on the other hand drawn after accelerator accelerates generally will before analysis magnet is entered
Various situations may be occurred during walking by walking several meters of even more than ten meters of distance, energetic ions, as part ion with
The collision scattering of transit duct wall, or the interaction with residual gas molecule in transit pipeline, lose portion of energy, lose
Portion outer layer electronics is removed, outer layer capture electronics, produces foreign ion with certain energy etc., these uncontrollable factors are usual
In the case of can cause the non-required ion that produces sub-fraction, and they can meet analysis magnet to by testing just
The momentum analysis condition set by ion beam is needed, so as to pass through analysis magnet.For being obtained after analysis magnet but
It can not very affirm whether it is ion beam needed for experiment, it is doubtful ion beam that we, which define it,.How this doubtful ion is judged
Whether beam is ion beam needed for experiment, or ion beam share shared in these doubtful ion beams needed for experiment be it is how many,
At present accelerator routine in use, the doubtful ion beam that is obtained to magnet by analysis of not good method is carried out
Screen.
The content of the invention
For the high energy ion beam for accelerating to draw in the prior art to accelerated device, choosing is analyzed by the momentum of analysis magnet
After taking, the doubtful ion beam of the acquisition existing problem and shortage when being judged and being screened, the present invention proposes one kind to doubtful
Ion beam carries out simple Zhen method for distinguishing, and doubtful ion beam is carried out using this method to analyze and judge accordingly, can be known
Whether the doubtful ion beam that magnet obtains by analysis is ion beam needed for experiment, and ion beam needed for experiment is in analysis of magnetic
Shared share is how many in doubtful ion beam after iron.
It is an object of the present invention to provide a kind of discriminating method of doubtful ion after accelerator analysis magnet.
The discriminating method of doubtful ion, comprises the following steps after the accelerator analysis magnet of the present invention：
1) mass M of ion beam, speed V as needed for known experiment0With the quantity of electric charge Q of institute band, according to formulaDetermine the magnetic field intensity that analysis magnet should apply, Commissioning Analysis magnet, obtain doubtful ion beam after analysis magnet
Beam intensity；
2) a pair of symmetrical electrostatic deflection plates parallel with doubtful ion beam direct of travel are installed additional after analysis magnet, it is doubtful
The center of ion beam is the symmetrical centre of electrostatic deflection plates, and the distance between two electrostatic deflection plates is 2D, and it is along doubtful ion beam
The effective length of direct of travel is L, and the voltage applied in two electrostatic deflection plates is the constant pressure of the adjustable Symmetrical of size,
I.e.：One electrostatic deflection plates adds positive high pressure U, and another electrostatic deflection plates then adds negative high pressure-U, applies in electrostatic deflection plates
In the case of high pressure U, uniform electric field E will be produced between two electrostatic deflection plates：So as to be hung down with doubtful ion beam
Uniform electric field is established on straight direction；
3) along doubtful ion beam direct of travel, in the place for being S with electrostatic deflection plates distance, place ion beam location and visit
Survey device；
4) determine not applying any voltage in electrostatic deflection plates, in the case that uniform electric field is not present, pass through analysis of magnetic
By electrostatic deflection plates after iron, doubtful ion beam reaches the position of ion beam location detector, using this position as origin O, and
Measure ion beam intensity I at thiss；
5) after applying voltage U in electrostatic deflection plates, in the case of producing uniform electric field E, by after analysis magnet by
Electrostatic deflection plates, doubtful ion beam reach the position of ion beam location detector, and it is X points to set this point, and is measured at the point
Ion beam intensity It；
6) distance between O points and X points, i.e., the deflection distance d of doubtful ion beam are measured；
7) associated arguments of ion beam as needed for experiment calculate it (electrostatic are inclined by electrostatic deflection plates by after analysis magnet
The electrostatic high-pressure U for producing uniform electric field E is applied with flap), reach ion beam location detector position deviate O points away from
From, obtain testing needed for ion beam deflection distance calculated value d0；
If 8) deflection distance calculated value ds of the deflection distance d in ion beam needed for experiment0Error allow in the range of,
Then judge that the ion beam at X points is ion beam needed for experiment；
9) the ion beam intensity I that will be measured in X pointstWith the ion beam intensity I measured in O pointssCompare, then can obtain
The ratio shared in doubtful ion beam of ion beam needed for experiment.
Wherein, in step 1), known energy W that the accelerated device of the ion beam as needed for experiment obtains after accelerating, according to public affairs
FormulaCan be with the speed V of ion beam needed for experiment with computing0。
In step 7), the associated arguments of ion beam as needed for experiment calculate position when it reaches ion beam location detector
The distance for deviateing O points is put, obtains the deflection distance calculated value d of ion beam needed for testing0, comprise the following steps：
A) setting experiment needed for ion beam can pass through analysis magnet momentum analyze so as to reach experiment target chamber bar
Part is：
Wherein MV0It is respectively the electrically charged amount of the momentum of ion beam needed for experiment and institute with Q, B and R are respectively analysis magnet
The radius of curvature of uniform magnetic field and analysis magnet；
B) determine that ion passes through the time T required for uniform electric field：
C) the acceleration a that ion is acted on obtaining in uniform electric field by electric field force is determined：
D) determine that ion leaves speed of the uniform electric field because of normally incident direction obtained from the effect of electric field force：
E) determine that ion beam is deviateing the distance of O points with battery lead plate distance for S place, obtain deflection distance calculated value d0：
F) can be obtained after combining formula (6) and formula (2)
From formula (7), in the case where other physical quantitys are all fixed, the deflection distance of ion beam is solely dependent upon ion
Speed during incident uniform electric field, therebetween inversely.
In step 8), parameter known to the correlation of ion as needed for experiment, d is calculated according to formula (7)0, and by actual survey
The deflection distance d of the doubtful ion beam of amount and ion beam needed for experiment deflection distance calculated value d0Make comparisons, if d0-Δd≤
d≤d0+ Δ d, then doubtful ion beam is screened as ion beam needed for experiment, wherein, Δ d is error permissible value, error permissible value Δ d
The size of line spot should be no more than.
If in the range of error permission, the deflection distance d and deflection distance calculated value d that actually measure0It can not kiss
Close, then illustrate in doubtful ion beam ion beam composition needed for experiment not be present, it be some meet needed for experiment from
Beamlet passes through the set of the spuious doubtful ion beam of analysis magnet momentum analysis condition, can not be transported to ion beam reality
Test target chamber and carry out the experimental study work relevant with ion beam interaction.
If ion beam needed for experiment is to accelerate to obtain by electrostatic accelerator, formula (7) can also further letter
Change, set the terminal voltage of electrostatic accelerator as UHV, then, formula (7) can be exchanged into：
For single-stage electrostatic accelerator：
For swindletron：
It is another object of the present invention to provide a kind of screening device of doubtful ion after accelerator analysis magnet.
The screening device of doubtful ion includes after the accelerator analysis magnet of the present invention：A pair of electrostatic deflection plates and ion beam
Position sensor；Install a pair of symmetrical electrostatic deflection plates parallel with doubtful ion beam direct of travel additional after analysis magnet, doubt
Center like ion beam is the symmetrical centre of electrostatic deflection plates, and the distance between two electrostatic deflection plates is 2D, and it is along doubtful ion
The effective length of beam direct of travel is L, and the voltage applied in two electrostatic deflection plates is the perseverance of the adjustable Symmetrical of size
Pressure, i.e.,：One electrostatic deflection plates adds positive high pressure U, and another electrostatic deflection plates then adds negative high pressure-U, applied in electrostatic deflection plates
Add high pressure in the case of U, uniform electric field E will be produced between two electrostatic deflection plates,So as in the vertical of ion beam
Uniform electric field is established on direction；Along doubtful ion beam direct of travel, in the place for being S with electrostatic deflection plates distance, place from
Beamlet position sensor；Electrostatic deflection plates are passed through by the doubtful ion beam after analysis magnet, reach ion beam location detector.
Ion beam location detector is shielded using quartz, or other positions sensitive detector.Ion beam location detector
Height H meets：Wherein dmaxThe maximum deflection distance of ion beam location detector is reached for doubtful ion beam.
The doubtful ion beam that the present invention obtains after analyzing magnet momentum by analysis carries out true and false discriminating, when ion is vertical
When incidence enters equally distributed electric field, ion will be acted on by the electric field force vertical with ion incidence direction, in the electricity
In the presence of field force, ion along incident direction moved on incidence rate while, will in the direction vertical with incident direction
Make the uniformly accelerated motion that acceleration keeps fixed, until ion passes through the uniform electric field.Now the direction of advance of ion will deviate from
It enters incident direction during uniform electric field, and is moved ahead in the direction with constant speed, and the size of its speed will be entered by ion
Velocity magnitude when entering uniform electric field and through the decision of both the speed obtained by electric field acceleration after uniform electric field.Ion is inclined
Size from former incident direction will depend on following factor：(1) speed of incident ion；(2) size of uniform electric field；
(3) ion passes through the time used in uniform electric field.Ion leave after uniform electric field with constant speed along with original direct of travel
The location of the direction for having fixed angle is advanced, with the increase of travel distance, ion is in vertical former direct of travel plane
Just further away from its should where home position.The present invention is exactly based on to be comprehensively utilized to any of the above factor, the amount of being subject to
Change analysis, so as to realize whether as ion beam needed for experiment judges the doubtful ion beam obtained to magnet by analysis,
And know the share that ion beam is shared in these doubtful ion beams needed for experiment is how many.
Advantages of the present invention：
1st, realize to doubtful ion beam whether be experiment needed for ion beam simple examination；
2nd, the accelerator type for producing doubtful ion beam is not limited, can is electrostatic accelerator or convolution
Accelerator or other kinds of accelerator；
3rd, to doubtful ion beam caused by electrostatic accelerator, it is more convenient that correlation screens calculating；
4th, the mounted analysis magnet of accelerator system is taken full advantage of, is not required to that extra analysis magnet device is installed again；
5th, Ion beam application system is equipped with electrostatic scanning system such as after accelerator analysis magnet, can directly utilize electrostatic scanning
Battery lead plate is not required to additionally install electrostatic deflection plates again as electrostatic deflection plates；
6th, the species to doubtful ion beam and number do not limit；
7th, the line stability of doubtful ion beam is not required；
8th, the beam intensity of doubtful ion beam is not strict with, as long as the doubtful ion beam can be by used ion
Beam position detector measurement arrives；
9th, general principle is clear, and examination is simple in construction, and cost is low, using reliable.
Brief description of the drawings
Fig. 1 be the present invention accelerator analysis magnet after doubtful ion screening device one embodiment schematic diagram.
Embodiment
Below in conjunction with the accompanying drawings, by embodiment, the present invention will be further described.
As shown in figure 1, in the present embodiment, the screening device of doubtful ion includes after accelerator analysis magnet：A pair quiet
Electric deflection plate 2 and ion beam location detector 7；Installed additional after analysis magnet 1 a pair it is parallel with doubtful ion beam direct of travel
Symmetrical electrostatic deflection plates 2, the center of doubtful ion beam are the symmetrical centre of electrostatic deflection plates, between two electrostatic deflection plates away from
From being L for 2D, its effective length along doubtful ion beam direct of travel, the voltage applied in two electrostatic deflection plates is size
The constant pressure of adjustable Symmetrical, i.e.,：One electrostatic deflection plates adds positive high pressure U, and another electrostatic deflection plates then adds negative height
Pressure-U, in the case where electrostatic deflection plates apply high pressure U, uniform electric field E will be produced between two electrostatic deflection plates,So as to establish uniform electric field in the vertical direction of ion beam；Along ion beam direct of travel, with electrostatic deflection plates
Distance is S place, places ion beam location detector；Ion beam 3 enters analysis of magnetic before the analysis magnet come out from accelerator
Iron 1, by the doubtful ion beam 4 after analysis magnet 1, by electrostatic deflection plates 2, reach ion beam location detector 7.Wherein, 5
It is the track of doubtful ion beam when electrostatic deflection plates are not added with voltage, 6 be the doubtful ion beam after electrostatic deflection plates making alive
Track.
Example one
Si is chosen from total ion beam of swindletron output7+Ion is ion beam needed for experiment, accelerator
Terminal voltage UHVFor 5MV.Si after analysis magnet7+The discriminating method of ion comprises the following steps：
1) it can be seen from given condition, the Si of swindletron output7+The energy of ion is 40MeV, can be counted according to this
Calculate Si7+The speed V of ion0, substitute into formula (2) and calculate Si7+Ion separates before analysis magnet in ion beam, point
Analysis magnet needs the magnetic field intensity B=7543Gs applied, Commissioning Analysis magnet, is to be swept near 7545Gs as magnetic field in magnetic field intensity
Debugging is retouched, is measured when magnetic field intensity is 7520Gs, 2nA doubtful ion beam is obtained after analysis magnet；
2) electrostatic deflection plates of a pair of symmetric metals parallel with doubtful ion beam direct of travel are installed additional after analysis magnet,
The center of doubtful ion beam is the symmetrical centre of electrostatic deflection plates, and the distance 2D between two electrostatic deflection plates is 4cm, and it is along doubtful
The effective length L of ion beam direct of travel is 43cm, and the voltage applied in two electrostatic deflection plates is that size is adjustable positive and negative
Symmetrical constant pressure U is 10kV, so as to establish uniform electric field in the vertical direction of ion beam
3) along doubtful ion beam direct of travel, in the place with electrostatic deflection plates distance S for 5m, ion beam location is placed
Detector；
4) determine not applying any voltage in electrostatic deflection plates, in the case that uniform electric field is not present, pass through analysis of magnetic
By electrostatic deflection plates after iron, doubtful ion beam reaches the position of ion beam location detector, using this position as origin O, and
Measure the intensity I of now O points ion beams=1.9nA；
5) (voltage respectively+the 10kV in two electrostatic deflection plates after voltage U is 10kV is applied in electrostatic deflection plates
With -10kV), in the case of producing uniform electric field E, by after analysis magnet by electrostatic deflection plates, it is inclined with electrostatic by being placed on
Flap distance determines that doubtful ion beam reaches the position of ion beam location detector by S ion beam location detector, sets
This point is X points, and measures ion beam intensity I at the pointt=1.9nA；
6) distance between O points and X points, i.e., the deflection distance d=10cm of doubtful ion beam are measured；
7) corresponding Si is calculated according to formula (9) and the associated arguments provided7+The deflection distance calculated value d of ion0
=9.8cm；
8) error permissible value Δ d should be no more than the size of line spot, in the doubtful ion Screening assay, line spot
Point size is approximately 8mm, so as to choose Δ d=5mm, compares deflection distance d and ion beam needed for experiment deflection distance d0,
In the range of error allows, then judge that the ion beam at X points is ion beam needed for experiment；
9) the ion beam intensity I that will be measured in X pointstWith the ion beam intensity I measured in O pointssCompare, then can obtain
Ion beam Si needed for all experiments in doubtful ion beam7+Ion.
Example two
Si is chosen from total ion beam of swindletron output8+Ion as experiment needed for ion beam, accelerate
The terminal voltage U of deviceHVFor 4MV.Si after analysis magnet8+The discriminating method of ion comprises the following steps：
1) it can be seen from given condition, the Si of swindletron output8+The energy of ion is 36MeV, can be counted according to this
Calculate Si8+The speed V of ion0, substitute into formula (2) and calculate Si8+Ion separates before analysis magnet in ion beam, point
Analysis magnet needs the magnetic field intensity B=6261Gs applied, Commissioning Analysis magnet, is to be swept near 6261Gs as magnetic field in magnetic field intensity
Debugging is retouched, is measured when magnetic field intensity is 6200Gs, 0.8nA doubtful ion beam is obtained after analysis magnet；
2) electrostatic deflection plates of a pair of symmetric metals parallel with doubtful ion beam direct of travel are installed additional after analysis magnet,
The center of doubtful ion beam is the symmetrical centre of electrostatic deflection plates, and the distance 2D between two electrostatic deflection plates is 4cm, and it is along doubtful
The effective length L of ion beam direct of travel is 43cm, and the voltage applied in two electrostatic deflection plates is that size is adjustable positive and negative
Symmetrical constant pressure U is 10kV, so as to establish uniform electric field in the vertical direction of ion beam
3) along doubtful ion beam direct of travel, in the place with electrostatic deflection plates distance S for 5m, ion beam location is placed
Detector；
4) determine not applying any voltage in electrostatic deflection plates, in the case that uniform electric field is not present, pass through analysis of magnetic
By electrostatic deflection plates after iron, doubtful ion beam reaches the position of ion beam location detector, using this position as origin O, and
Measure the intensity I of now O points ion beams=0.75nA；
5) (voltage respectively+the 10kV in two electrostatic deflection plates after voltage U is 10kV is applied in electrostatic deflection plates
With -10kV), in the case of producing uniform electric field E, by after analysis magnet by electrostatic deflection plates, it is inclined with electrostatic by being placed on
Flap distance determines that doubtful ion beam reaches the position of ion beam location detector by S ion beam location detector, sets
This point is X points, and measures ion beam intensity I at the pointt=0.73nA；
6) distance between O points and X points, i.e., the deflection distance d=17cm of doubtful ion beam are measured；
7) corresponding Si is calculated according to formula (9) and the associated arguments provided8+The deflection distance calculated value d of ion0
=12.3cm；
8) error permissible value Δ d should be no more than the size of line spot, in the doubtful ion Screening assay, line spot
Point size is approximately 7mm, so as to choose Δ d=7mm., compare deflection distance d with experiment needed for ion beam deflection distance d0,
Not in the range of error permission, then it is not ion beam needed for experiment to judge the ion beam at X points, after analysis magnet it is doubtful from
In beamlet, ion beam Si needed for experiment is practically free of8+Ion.
It is finally noted that the purpose for publicizing and implementing mode is that help further understands the present invention, but ability
The technical staff in domain is appreciated that：Without departing from the spirit and scope of the invention and the appended claims, it is various replacement and
Modification is all possible.Therefore, the present invention should not be limited to embodiment disclosure of that, the scope of protection of present invention with
The scope that claims define is defined.
Claims (9)
1. the discriminating method of doubtful ion after a kind of accelerator analysis magnet, it is characterised in that the discriminating method includes following
Step：
1) mass M of ion beam, speed V as needed for known experiment0With the quantity of electric charge Q of institute band, according to formulaIt is determined that
The magnetic field intensity that analysis magnet should apply, Commissioning Analysis magnet, obtain the beam intensity of doubtful ion beam after analysis magnet, B and R
The respectively radius of curvature of the uniform magnetic field of analysis magnet and analysis magnet；
2) a pair of symmetrical electrostatic deflection plates parallel with doubtful ion beam direct of travel, doubtful ion are installed additional after analysis magnet
The center of beam is the symmetrical centre of electrostatic deflection plates, and the distance between two electrostatic deflection plates is 2D, and it advances along doubtful ion beam
The effective length in direction is L, and the voltage applied in two electrostatic deflection plates is the constant pressure of the adjustable Symmetrical of size, quiet
In the case that electric deflection plate applies high pressure U, uniform electric field E will be produced between two electrostatic deflection plates：So as to
Doubtful ion beam establishes uniform electric field on vertical direction；
3) along doubtful ion beam direct of travel, in the place for being S with electrostatic deflection plates distance, ion beam location detection is placed
Device；
4) determine not applying any voltage in electrostatic deflection plates, in the case that uniform electric field is not present, after analysis magnet
By electrostatic deflection plates, doubtful ion beam reaches the position of ion beam location detector, using this position as origin O, and measures
Ion beam intensity I at thiss；
5) after applying voltage U in electrostatic deflection plates, in the case of producing uniform electric field E, by after analysis magnet by electrostatic
Deflecting plates, doubtful ion beam reach the position of ion beam location detector, and it is X points to set this point, and measures ion at the point
Beam intensity It；
6) distance between O points and X points, i.e., the deflection distance d of doubtful ion beam are measured；
7) associated arguments of ion beam as needed for experiment calculate it by, by electrostatic deflection plates, reaching ion beam after analysis magnet
The distance of O points is deviateed in the position of position sensor, obtains the deflection distance calculated value d of ion beam needed for testing0；
If 8) deflection distance calculated value ds of the deflection distance d in ion beam needed for experiment0Error allow in the range of, then judge
Ion beam at X points is ion beam needed for experiment；
9) the ion beam intensity I that will be measured in X pointstWith the ion beam intensity I measured in O pointssCompare, then must can test
Required ion beam ratio shared in doubtful ion beam.
2. discriminating method as claimed in claim 1, it is characterised in that in step 1), ion beam is accelerated as needed for experiment
The known energy W that device obtains after accelerating, according to formulaThe speed V of ion beam needed for experiment is calculated0。
3. discriminating method as claimed in claim 1, it is characterised in that in step 7), the correlation of ion beam as needed for experiment
The distance of O points is deviateed in its position when reaching ion beam location detector of Parameters Calculation, obtains the deflection of ion beam needed for testing
Apart from calculated value d0, comprise the following steps：
A) set experiment needed for ion beam can pass through analysis magnet momentum analyze so as to reach experiment target chamber condition as：
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Wherein MV0It is respectively the electrically charged amount of the momentum of ion beam needed for experiment and institute with Q, B and R are respectively the uniform of analysis magnet
Magnetic field and the radius of curvature of analysis magnet；
B) determine that ion passes through the time T required for uniform electric field：
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C) the acceleration a that ion is acted on obtaining in uniform electric field by electric field force is determined：
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D) determine that ion leaves speed V of the uniform electric field because of normally incident direction obtained from the effect of electric field force1：
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E) determine that ion beam is deviateing the distance of O points with battery lead plate distance for S place, obtain deflection distance calculated value d0：
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F) can be obtained after combining formula (6) and formula (2)
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</mrow>
</mrow>
The deflection distance calculated value d of ion beam as needed for being calculated experiment in formula (6)0。
4. discriminating method as claimed in claim 1, it is characterised in that in step 8), the doubtful ion beam that will actually measure
Deflection distance d with experiment needed for ion beam deflection distance calculated value d0Make comparisons, if d0-Δd≤d≤d0+ Δ d, then discriminate
Not doubtful ion beam is ion beam needed for experiment, wherein, Δ d is error permissible value, and error permissible value Δ d is no more than line spot
Size.
5. discriminating method as claimed in claim 3, it is characterised in that if ion beam needed for experiment is added by single-stage electrostatic
Fast device accelerates what is obtained, then formula (6) is converted to：Wherein, UHVFor the end electricity of single-stage electrostatic accelerator
Pressure.
6. discriminating method as claimed in claim 3, it is characterised in that if ion beam needed for experiment is added by tandem
Fast device accelerates what is obtained, then formula (6) is converted to：Wherein, UHVFor the end of swindletron
Voltage.
A kind of 7. discriminating method of doubtful ion after any one accelerator analysis magnet for as described in claim 1-6
Screening device, it is characterised in that the screening device includes：A pair of electrostatic deflection plates and ion beam location detector；Dividing
A pair of symmetrical electrostatic deflection plates parallel with doubtful ion beam direct of travel are installed additional after analysis magnet, and the center of doubtful ion beam is
The symmetrical centre of electrostatic deflection plates, the distance between two electrostatic deflection plates is 2D, and it is effective along doubtful ion beam direct of travel
Length is L, and the voltage applied in two electrostatic deflection plates is the constant pressure of the adjustable Symmetrical of size, is applied in electrostatic deflection plates
Add high pressure in the case of U, uniform electric field E will be produced between two electrostatic deflection plates,So as in the vertical of ion beam
Uniform electric field is established on direction；Along doubtful ion beam direct of travel, in the place for being S with electrostatic deflection plates distance, place from
Beamlet position sensor；Electrostatic deflection plates are passed through by the doubtful ion beam after analysis magnet, reach ion beam location detector.
8. screening device as claimed in claim 7, it is characterised in that the ion beam location detector is shielded using quartz.
9. screening device as claimed in claim 7, it is characterised in that the height H of the ion beam location detector meets：Wherein dmaxThe maximum deflection distance of ion beam location detector is reached for doubtful ion beam.
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| CN105979694B (en) * | 2016-04-26 | 2018-10-26 | 东莞中子科学中心 | A kind of pre-cut beam device for beam burst control |
| CN107121694A (en) * | 2017-05-26 | 2017-09-01 | 宜昌后皇真空科技有限公司 | A kind of method and system for monitoring pulse gas cluster ions beam on-line |
| CN109814148B (en) * | 2019-03-14 | 2023-02-03 | 中国科学院近代物理研究所 | High-energy quasi-monoenergetic electron beam ground calibration system of detector |
| CN110213877A (en) * | 2019-06-21 | 2019-09-06 | 中国科学院近代物理研究所 | Bundle device is split for the ion beam of beam simultaneously for a kind of multiple terminals |
| CN111293031B (en) * | 2020-03-19 | 2023-05-23 | 中国科学院近代物理研究所 | Multi-mass-to-charge-ratio ion beam mass spectrum analysis device and method |
| CN112201560B (en) * | 2020-09-25 | 2021-07-13 | 中国地质大学（北京） | Ion deflection device and method |
| CN114566304A (en) * | 2022-03-24 | 2022-05-31 | 兰州大学 | Pulse beam group forming device with ion mass-to-charge ratio discrimination function |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1147144A (en) * | 1995-07-17 | 1997-04-09 | 易通公司 | In situ removal of contaminants from interior surfaces of ion beam implanter |
| CN1205440A (en) * | 1997-07-12 | 1999-01-20 | 易通公司 | System and method for detecting neutral particles in ion beam |
| CN1906728A (en) * | 2003-12-04 | 2007-01-31 | 日新意旺机械股份公司 | Ion beam apparatus |
| CN101558469A (en) * | 2006-09-19 | 2009-10-14 | 艾克塞利斯科技公司 | System and magnetic scanning and correction of an ion beam |
| CN101563750A (en) * | 2006-09-29 | 2009-10-21 | 瓦里安半导体设备公司 | Technique for improved ion beam transport |
| CN103560070A (en) * | 2013-10-30 | 2014-02-05 | 中国地质科学院地质研究所 | Ion optical device, ion source and target ion generating method by utilization of ion source |
| CN104183447A (en) * | 2013-05-27 | 2014-12-03 | 斯伊恩股份有限公司 | High-energy ion injection device |
-
2015
- 2015-06-05 CN CN201510303403.8A patent/CN105005070B/en not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1147144A (en) * | 1995-07-17 | 1997-04-09 | 易通公司 | In situ removal of contaminants from interior surfaces of ion beam implanter |
| CN1205440A (en) * | 1997-07-12 | 1999-01-20 | 易通公司 | System and method for detecting neutral particles in ion beam |
| CN1906728A (en) * | 2003-12-04 | 2007-01-31 | 日新意旺机械股份公司 | Ion beam apparatus |
| CN101558469A (en) * | 2006-09-19 | 2009-10-14 | 艾克塞利斯科技公司 | System and magnetic scanning and correction of an ion beam |
| CN101563750A (en) * | 2006-09-29 | 2009-10-21 | 瓦里安半导体设备公司 | Technique for improved ion beam transport |
| CN104183447A (en) * | 2013-05-27 | 2014-12-03 | 斯伊恩股份有限公司 | High-energy ion injection device |
| CN103560070A (en) * | 2013-10-30 | 2014-02-05 | 中国地质科学院地质研究所 | Ion optical device, ion source and target ion generating method by utilization of ion source |
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