CN104915062B - A kind of array substrate and touch control display apparatus - Google Patents

A kind of array substrate and touch control display apparatus Download PDF

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Publication number
CN104915062B
CN104915062B CN201510357246.9A CN201510357246A CN104915062B CN 104915062 B CN104915062 B CN 104915062B CN 201510357246 A CN201510357246 A CN 201510357246A CN 104915062 B CN104915062 B CN 104915062B
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CN
China
Prior art keywords
touch control
line
control electrode
via
bridge
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CN201510357246.9A
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Chinese (zh)
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CN104915062A (en
Inventor
彭涛
崔萌
王慧敏
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厦门天马微电子有限公司
天马微电子股份有限公司
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Priority to CN201510357246.9A priority Critical patent/CN104915062B/en
Publication of CN104915062A publication Critical patent/CN104915062A/en
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Publication of CN104915062B publication Critical patent/CN104915062B/en

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Abstract

The invention discloses a kind of array substrate and touch control display apparatus, the array substrate includes:Substrate;The multi-strip scanning line and multiple data lines of insulation intersection on the substrate are set, and multi-strip scanning line extends in a first direction, and the data line extends in a second direction;Common electrode layer above film layer where data line, common electrode layer include multiple touch control electrode blocks interval setting and arranged with array way;A plurality of touch control electrode line, the every touch control electrode line are connected by one first connection structure touch control electrode block corresponding with one;The scan line or the data line include:With the cabling portion of the touch control electrode line same layer, and the bridge with the different layer of touch control electrode line, adjacent cabling portion is connect by one second connection structure with the bridge, the present invention completes touch control electrode line and scan line or data line in same manufacture craft, the manufacturing process of special making touch control electrode line together can be reduced, and then production efficiency can be improved.

Description

A kind of array substrate and touch control display apparatus

Technical field

The present embodiments relate to LCD Technology field more particularly to a kind of array substrate and touch-control display dresses It sets.

Background technology

Liquid crystal display, English are commonly referred to as LCD (Liquid Crystal Display), are belong to flat-panel screens one Kind.With the development of science and technology, LCD also develops towards light, thin target, either wide viewing angle is shown, low power consumption, thickness are thin, Or the advantages that zero radiation, user can be allowed to enjoy best visual effect.

Display with touch function is what the technology based on feature-richization generated, and relatively common touch technology has In-cell touch technologies and On-cell touch technologies.Wherein, In-cell touch technologies refer to being embedded into touch panel function The technology of LCD display intralamellar part, On-cell touch technologies refer to that touch panel function is embedded into color membrane substrates and polarisation Technology between plate.Since In-cell touch technologies can make display more frivolous, more it is concerned.

The array substrate of the touch control display apparatus of the prior art increases device due to needing that touch-control cabling is separately provided Thickness, reduce transmitance and increase the time of processing procedure, reduce production efficiency.

Invention content

A kind of array substrate of offer of the embodiment of the present invention and touch control display apparatus reduce processing procedure quantity to realize, improve life Produce the effect of efficiency.

In a first aspect, an embodiment of the present invention provides a kind of array substrates, including:

Substrate;

The multi-strip scanning line and multiple data lines of insulation intersection on the substrate are set, and the multi-strip scanning line is along the One direction extends, and the data line extends in a second direction;

Common electrode layer above film layer where the data line, the common electrode layer include multiple interval settings And the touch control electrode block arranged with array way;

A plurality of touch control electrode line, the every touch control electrode line pass through one first connection structure touch-control electricity corresponding with one Pole block connection;

The scan line or the data line include:With the cabling portion of the touch control electrode line same layer, and with it is described touch The bridge of the different layer of electrode wires is controlled, adjacent cabling portion is connect by one second connection structure with the bridge.

Second aspect, the embodiment of the present invention also provide a kind of touch control display apparatus, and packet first aspect present invention is provided Array substrate.

Technical solution provided by the invention, set the scan line or the data line to include and the touch control electrode The cabling portion of line same layer, and the structure with the bridge of the different layer of touch control electrode line, and adjacent cabling portion passes through one Two connection structures are connect with the bridge, and the every touch control electrode line is touched by the way that one first connection structure is corresponding with one Control electrode block connection, compared with the existing technology, the technical solution can by touch control electrode line with scan line or data line same It is completed in manufacture craft, the manufacturing process of special making touch control electrode line together can be reduced, and then production efficiency can be improved.

Furthermore the embodiment of the present invention is by touch control electrode line and scan line cabling portion or data line cabling portion in same making work It is completed in skill, makes it that need not be arranged on planarization layer again, improve the flatness of pixel electrode and public electrode, improved The display effect of display device.

Description of the drawings

Fig. 1 is a kind of vertical view of array substrate provided in an embodiment of the present invention;

Fig. 2 is the structural schematic diagram of scan line bridge provided in an embodiment of the present invention and light shield layer same layer insulation set;

Fig. 3 is a kind of structural schematic diagram of first connection structure provided in an embodiment of the present invention;

Fig. 4 is the structural schematic diagram of another first connection structure provided in an embodiment of the present invention;

Fig. 5 is the structural representation of scan line bridge provided in an embodiment of the present invention and touch control electrode block same layer insulation set Figure;

When Fig. 6 is scan line bridge and touch control electrode block same layer insulation set, another structure of the second connection structure Schematic diagram;

Fig. 7 is the structural representation of scan line bridge provided in an embodiment of the present invention and pixel electrode same layer insulation set Figure;

When Fig. 8 is scan line bridge and pixel electrode same layer insulation set, another structure of the second connection structure is shown It is intended to;

When Fig. 9 is scan line bridge and pixel electrode same layer insulation set, another structure of the second connection structure is shown It is intended to;

First connection structure when the lower sections provided in an embodiment of the present invention for being located at touch control electrode block when pixel electrode Figure 10 Structural schematic diagram;

Second connection structure when Figure 11 is the lower section provided in an embodiment of the present invention for being located at touch control electrode block when pixel electrode Structural schematic diagram;

Figure 12 is the vertical view of another array substrate provided in an embodiment of the present invention;

Figure 13 is data line when including cabling portion and bridge, the knot of data line bridge and light shield layer same layer insulation set Structure schematic diagram;

Figure 14 is a kind of structural schematic diagram for first connection structure that present invention implementation provides;

When Figure 15 is data line bridge and light shield layer same layer insulation set, another structural representation of the second connection structure Figure;

Figure 16 is that the structure of data line bridge provided in an embodiment of the present invention and touch control electrode block same layer insulation set is shown It is intended to;

Figure 17 is the structural schematic diagram of data line bridge provided in an embodiment of the present invention and pixel same layer insulation set;

When Figure 18 is data line bridge and pixel electrode same layer insulation set, another structure of the second connection structure is shown It is intended to.

Specific implementation mode

The present invention is described in further detail with reference to the accompanying drawings and examples.It is understood that this place is retouched The specific embodiment stated is used only for explaining the present invention rather than limitation of the invention.It also should be noted that in order to just Only the parts related to the present invention are shown in description, attached drawing rather than entire infrastructure.

Fig. 1 is a kind of vertical view of array substrate provided in an embodiment of the present invention, as shown in Figure 1, the array substrate is specific Including:Substrate 11;The multi-strip scanning line 12 and multiple data lines 13 for the insulation intersection being arranged on the substrate 11, it is described a plurality of Scan line 12 extends in a first direction, and the data line 13 extends in a second direction;In 13 place film layer of the data line The common electrode layer 14 of side, the common electrode layer 14 include multiple touch control electrode blocks interval setting and arranged with array way 141;A plurality of touch control electrode line 15, the every touch control electrode line 15 pass through one first connection structure touch-control electricity corresponding with one Pole block 141 connects.

In order to save processing procedure, production efficiency is improved, sets the scan line to having structure:

The scan line 12 includes:With the cabling portion 121 of 15 same layer of touch control electrode line, and with the touch control electrode The bridge 122 of 15 different layer of line, adjacent cabling portion 121 are connect by one second connection structure with the bridge 122.Specifically , it in manufacture craft, can on the substrate 11 be formed after a metal layer, be formed simultaneously using patterning processes a plurality of along first The scan line 12 and a plurality of touch control electrode line 15 extended in a second direction that direction extends, the multi-strip scanning extended in a first direction Line 12 is spaced apart by touch control electrode line 15 and forms cabling portion 121.To realize that scan line can be successfully delivered scanning signal, then need The cabling portion 121 mutually disconnected along first direction is linked together, that is, need setting and touch control electrode line 15 non-same layer across Socket part 122 forms a plurality of complete scan line 12.

Compared with the existing technology, the technical solution that the present embodiment is provided, by by touch control electrode line 15 and scan line 12 Cabling portion 121 completed in same manufacture craft, without individually increasing processing procedure because making touch control electrode line, reduce together Manufacture craft, and then improve production efficiency.

Furthermore in the prior art, in order to improve the flatness of pixel electrode and public electrode, can be arranged in data line layer The larger planarization layer of a layer thickness.But due to touch control electrode line need be arranged on planarization layer, with and touch control electrode Block connects, and the presence of touch control electrode line reduces the flatness of pixel electrode and public electrode, affects display effect.The present invention Embodiment completes touch control electrode line 15 and the cabling portion 121 of scan line 12 in same manufacture craft, makes it that need not set again It sets on planarization layer, improves the flatness of pixel electrode and public electrode, improve the display effect of display device.

On the basis of the above embodiments, a plurality of touch control electrode line 15 is arranged in a second direction to extend, described the On one direction, there is interval between the cabling portion 121 of the adjacent scan line 12, described touch is provided at the interval 121 Control electrode wires 15.Further, the orthographic projection of the touch control electrode line 15 on the substrate 11 and the data line 13 are in the base Orthographic projection overlapping on plate 11.The benefit being arranged in this way is to ensure that touch control electrode line 15 does not influence the aperture opening ratio of each pixel unit.

For in above-described embodiment, setting the scan line to include the cabling portion with the touch control electrode line same layer, And the bridge with the different layer of touch control electrode line, adjacent cabling portion are connected by one second connection structure and the bridge It connects, specific there are many realization methods, such as the position setting of bridge, adjacent cabling portion to pass through one second connection structure and institute State the mode etc. of bridge connection.In addition, the touch control electrode line passes through one first connection structure touch-control electricity corresponding with one The connection of pole block also there are many realization method, below each preferred embodiment is described in detail.

Scan line includes described in array substrate provided in an embodiment of the present invention:With the cabling of the touch control electrode line same layer Portion, and the bridge with the different layer of touch control electrode line, adjacent cabling portion pass through one second connection structure and the bridging Portion connects.Due to having interval, interval to be provided with touch control electrode line between scan line cabling portion, it is therefore desirable to setting and scanning The bridge of line cabling portion and the different layer of touch control electrode line, specifically, the bridge can be same with the light shield layer of array substrate Layer insulation set, can also with touch control electrode block same layer insulation set, or with pixel electrode same layer insulation set.

Fig. 2 is the structural schematic diagram of scan line bridge provided in an embodiment of the present invention and light shield layer same layer insulation set, The structural schematic diagram is the sectional view of the A-A ' lines along Fig. 1, as shown in Fig. 2, the array substrate includes:Substrate 21;Setting exists The multi-strip scanning line 22 and multiple data lines 23 of insulation intersection on the substrate 21, the multi-strip scanning line 22 is along first direction Extend, the data line 23 extends in a second direction;Common electrode layer 24 above 23 place film layer of the data line, institute It includes multiple touch control electrode blocks 241 interval setting and arranged with array way to state common electrode layer 24;A plurality of touch control electrode line 25, the every touch control electrode line 25 is connected by one first connection structure touch control electrode block 241 corresponding with one.It is described to sweep Retouching line 22 includes:With the cabling portion 221 of 25 same layer of touch control electrode line, and the bridging with 25 different layer of the touch control electrode line Portion 222, adjacent cabling portion 221 are connect by one second connection structure with the bridge 222.The array substrate further includes Light shield layer 26 between the substrate 21 and the 221 place film layer of cabling portion of the scan line 22, the scan line 22 Bridge 222 and 26 same layer insulation set of the light shield layer.

Specifically, multi-strip scanning line 22 and the insulation intersection of multiple data lines 23 limit the pixel list of multiple matrix arrangements Member, each pixel unit include a thin film transistor switch 27, and the light shield layer 26 is located at the thin film transistor switch 27 Semiconductor layer 271 towards the side of substrate 21, the light for blocking backlight module generation prevents light irradiation from leading to film The semiconductor layer 271 of transistor switch 27 degenerates and prevents thin film transistor switch 27 from generating leakage current.Specifically, this implementation The array substrate of example can form bridge 222 while forming light shield layer 26 on the base plate (21 during manufacture craft, The length of bridge 222 in a first direction can be set as the spacing in adjacent traces portion 221 on first direction, can also be set as omiting More than above-mentioned spacing.The embodiment of the present invention is by the way that the bridge 222 of the scan line 22 and 26 same layer of the light shield layer to insulate Setting, the two is completed in same manufacture craft, therefore reduces one of manufacture craft again, further improves production efficiency.

In the preparation process of array substrate, after forming the bridge 222 of light shield layer 26 and scan line 22, and in shading Layer 26 and 222 top of bridge are formed with insulating layer 210, and are punched on insulating layer 210, are formed and run through the insulating layer The cabling portion 221 of 210 the second via 28, scan line 22 is electrically connected by the second via 28 with the completion of bridge 222, this implementation In example, the second connection structure for connecting cabling portion 221 and bridge 222 is above-mentioned the second via through insulating layer 28。

In above-mentioned each implementation, due to being separated with data line, touch-control electricity between touch control electrode line and corresponding touch control electrode block It when polar curve is electrically connected by the first connection structure with touch control electrode, need to insulate with data line, that is, need to bypass data line, specific It can be realized there are two types of mode when realization.

Fig. 3 is a kind of structural schematic diagram of first connection structure provided in an embodiment of the present invention, and Fig. 3 is the B-B ' along Fig. 1 A kind of sectional view of line, as shown in figure 3, first connection structure includes and 25 same layer of touch control electrode line and is connected with each other Connection liner 291, and the exposure connection liner 291 the first via 292, the touch control electrode line 25 passes through the company Liner 291 and first via 292 is connect to connect with the corresponding touch control electrode block 241.It should be noted that connection liner As long as 291 can aid in around data line 23 when being connect upwards with touch control electrode block 241, the embodiment of the present invention is to described The shape of connection liner 291 is not restricted.

Due to punching the too deep hidden danger brought in manufacture craft, by first connection structure be set as include with it is described The connection of touch control electrode line same layer and interconnection liner, at least two sub- vias and at least one via liner, the touch-control Electrode wires are padded by the connection, at least two sub- vias and at least one via pad and the corresponding touch control electrode block Connection.Fig. 4 is the structural schematic diagram of another first connection structure provided in an embodiment of the present invention, as shown in figure 4, described first Connection structure includes padding 291 with the connection of 25 same layer of touch control electrode line and interconnection liner 291, the exposure connection The first sub- via 292a, the first via liner 293 in the first sub- via 292a, the first via of exposure liner 293 Second sub- via 292b.The first via liner 293 and 23 same layer of the data line, and the first sub- via 292a is covered, and And first via liner 293 and connection liner 291 be electrically connected.The touch control electrode line 25 passes through connection liner 291, institute The first sub- via 292a, the first via liner 293 and the second sub- via 292b is stated to connect with corresponding touch control electrode block 241.

It in structure shown in Fig. 4, can be formed on substrate after a metal layer, forming scan line using patterning processes walks Line portion, with the touch control electrode line 25 of scan line cabling portion same layer, and with 25 same layer of touch control electrode line and be connected with each other Connection liner 291, then forms second insulating layer 220, is punched in second insulating layer 220 by lithographic technique, is formed First sub- via 292a, the first sub- via 292a expose connection liner 291, are then re-formed in second insulating layer 220 One metal layer, and form data line 23 and the first via liner 293, first via liner 293 and data by patterning processes Line 23 disconnects and mutually insulated, and the first via liner 293 is completed to be electrically connected with liner 291 is connect, and covers described first Sub- via 292a;Again the first via liner 293 with third insulating layer 230 is formed on data line 23, by lithographic technique the 230 sides punch on three insulating layers, form the second sub- via 292b, and the second sub- via 292b exposes the first via lining Pad 293 re-forms touch control electrode block 241, and the first via liner 293 is electrically connected with touch control electrode block 241, to realize Touch control electrode line 25 is electrically connected with touch control electrode block 241.The benefit being arranged in this way is, can be to avoid due to touch control electrode line 25 The distance between touch control electrode block 241 is excessive, avoids in manufacture craft due to punching the too deep hidden danger brought.

Fig. 5 is the structural representation of scan line bridge provided in an embodiment of the present invention and touch control electrode block same layer insulation set Figure, which is the sectional view of the A-A ' lines along Fig. 1, as shown in figure 5, the array substrate includes:Substrate 31;Setting The multi-strip scanning line 32 and multiple data lines 33 of insulation intersection on the substrate 31, the multi-strip scanning line 32 is along first party To extension, the data line 33 extends in a second direction;Common electrode layer 34 above 33 place film layer of the data line, The common electrode layer 34 includes multiple touch control electrode blocks 341 interval setting and arranged with array way;A plurality of touch control electrode Line 35, the every touch control electrode line 35 are connected by one first connection structure touch control electrode block 341 corresponding with one.It is described Scan line 32 includes:With the cabling portion 321 of 35 same layer of touch control electrode line, and with 35 different layer of the touch control electrode line across Socket part 322, adjacent cabling portion 321 are connect by one second connection structure with the bridge 322.The touch control electrode block 341 with the 322 same layer insulation set of bridge of the scan line 32.

Wherein, bridge 322 and the setting of 341 same layer of touch control electrode block, specifically, array substrate shown in fig. 5 can be During manufacture craft, bridge 322 is formed while forming touch control electrode block 341, bridge 322 is in a first direction Length can be set as the spacing in adjacent traces portion 321 on first direction, can also be set as being slightly larger than above-mentioned spacing.The present invention is real Example is applied by the way that by the bridge 322 of the scan line 32 and 341 same layer insulation set of the touch control electrode block, the two is in same system Make to complete in technique, therefore reduce one of manufacture craft again, further improves production efficiency.

When the bridge and when touch control electrode block same layer insulation set, second can there are two types of sides when being connected to specific implementation Formula is realized.

As shown in figure 5, first passing through the second via 36 that etching forms the cabling portion 321 for exposing the scan line 32, then The bridge 322 of the scan line 32, the cabling portion 321 of the scan line 32 are formed while forming touch control electrode block 341 It is electrically connected with the completion of bridge 222 by the second via 36.In the present embodiment, the cabling portion for connecting the scan line 32 321 and the second connection structure of bridge 322 be above-mentioned through insulating layer between cabling portion 321 and touch control electrode block 341 Second via 36.

Due to punching the too deep hidden danger brought in manufacture craft, second connection structure can be set as including at least Two sub- vias and at least one via liner, the cabling portion of the scan line passes through described at least two sub- vias and at least one A via liner is connected with the bridge of the scan line.Fig. 6 is scan line bridge and touch control electrode block same layer insulation set When, another structural schematic diagram of the second connection structure, as shown in fig. 6, second connection structure includes the exposure scanning The first sub- via 36a in the cabling portion 321 of line 32, the second sub- via of the first via liner 37, the first via of exposure liner 37 36b.Wherein, 37 the first sub- via 36a of covering of the first via liner, the cabling portion 321 passes through the described first sub- via 37 electrical connection of 36a and the first via liner;Second sub- via 36b exposes the first via liner 37, and the first via pads 37 connect with the bridge 322.

It in structure shown in Fig. 6, can be formed on substrate after a metal layer, forming scan line using patterning processes walks Line portion 321, the touch control electrode line 35 with 321 same layer of scan line cabling portion, then form the first insulating layer 310, by etching skill Art is punched on the first insulating layer 310, forms the first sub- via 36a, which exposes the scan line Then 32 cabling portion 321 re-forms a metal layer on the first insulating layer 310, and forms data line 33 by patterning processes With the first via liner 37, first via liner 37 is disconnected with data line 33 and mutually insulated, and the first via liner 37 It completes to be electrically connected by the first sub- via 36a and the cabling portion 321 of the scan line 32;Again in the first via liner 37 and data Second insulating layer 320 is formed on line 33, is punched above second insulating layer 320 by lithographic technique, and the second insulation is formed Second sub- via 36b of layer, the second sub- via 36b expose the first via liner 37, re-form 341 He of touch control electrode block The bridge 322 of scan line 32, bridge 322 is electrically connected by the second sub- via 36b with the first via liner 37, to realize The cabling portion 321 of the scan line 32 and being electrically connected for the bridge 322 of scan line 32.The benefit being arranged in this way is, can be with Avoid since the distance between cabling portion 321 and bridge 322 are excessive, in manufacture craft due to punch it is too deep bring it is hidden Suffer from.First connection structure provided in an embodiment of the present invention is similar with above-mentioned Fig. 3 and mode shown in Fig. 4, and therefore not to repeat here.

Fig. 7 is the structural representation of scan line bridge provided in an embodiment of the present invention and pixel electrode same layer insulation set Figure, which is the sectional view of the A-A ' lines along Fig. 1, as shown in fig. 7, the array substrate includes:Substrate 41;Setting The multi-strip scanning line 42 and multiple data lines 43 of insulation intersection on the substrate 41, the multi-strip scanning line 42 is along first party To extension, the data line 43 extends in a second direction;Common electrode layer 44 above 43 place film layer of the data line, The common electrode layer 44 includes multiple touch control electrode blocks 441 interval setting and arranged with array way;A plurality of touch control electrode Line 45, the every touch control electrode line 45 are connected by one first connection structure touch control electrode block 441 corresponding with one.It is described Scan line 42 includes:With the cabling portion 421 of 45 same layer of touch control electrode line, and with 45 different layer of the touch control electrode line across Socket part 422, adjacent cabling portion 421 are connect by one second connection structure with the bridge 422.Multi-strip scanning line 42 and more The insulation of data line 43, which intersects, limits multiple pixel units being arranged in array, and each pixel unit includes a pixel electrode 46, bridge 422 and the 46 same layer insulation set of the pixel electrode of the scan line 42.

Can be during manufacture craft, while forming pixel electrode 46 specifically, in structure shown in Fig. 7 Bridge 422 is formed, the length of bridge 422 in a first direction can be set as on first direction between adjacent traces portion 421 Away from can also be set as being slightly larger than above-mentioned spacing.The embodiment of the present invention is by by the bridge 422 of the scan line 42 and the picture 46 same layer insulation set of plain electrode, the two is completed in same manufacture craft, therefore reduces one of manufacture craft again, further Improve production efficiency.

When the bridge and pixel electrode same layer insulation set, second can be there are two types of mode when being connected to specific implementation It realizes.

As shown in fig. 7, first passing through the second via 47 that etching forms the cabling portion 421 for exposing the scan line 42, then The bridge 422 of the scan line 42 is formed while forming pixel electrode 46, the cabling portion 421 of the scan line 42 passes through Second via 47 is electrically connected with the completion of bridge 422.In the present embodiment, 421 He of cabling portion for connecting the scan line 42 Second connection structure of bridge 422 is above-mentioned the second via through insulating layer between cabling portion 421 and pixel electrode 46 47。

When Fig. 8 is scan line bridge and pixel electrode same layer insulation set, another structure of the second connection structure is shown It is intended to, as shown in figure 8, second connection structure includes the first sub- via in the cabling portion 421 of the exposed scan line 42 The second sub- via 47b of 47a, the first via liner 48 for covering the first sub- via 47a, the first via of exposure liner 48, wherein The first via liner 48 and cabling portion 421 are electrically connected.The cabling portion 421 of the scan line 42 passes through the described first sub- mistake Hole 47a, the first via pad the 48, second sub- via 47b and are connect with the bridge 422 of the scan line 42.

It in scheme shown in Fig. 8, can be formed on substrate after a metal layer, forming scan line using patterning processes walks Line portion 421, the touch control electrode line 45 with 421 same layer of scan line cabling portion, then form the first insulating layer 410, by etching skill Art is punched on the first insulating layer 410, forms the first sub- via 47a, which exposes the scan line Then 42 cabling portion 421 re-forms a metal layer on the first insulating layer 410, and forms data line 43 by patterning processes With the first via liner 48, first via liner 48 is disconnected with data line 43 and mutually insulated, and the first via liner 48 It completes to be electrically connected with the cabling portion 421 of the scan line 42, and covers the first sub- via 47a;Again the first via liner 48 with Second insulating layer 420, touch control electrode block 441, third insulating layer 430 are formed on data line 43.It is exhausted second by lithographic technique Edge layer 420 and the top of third insulating layer 430 are punched, and are formed through the second insulating layer 420 and third insulating layer 430 Second sub- via 47b.Second sub- via 47b exposes the first via liner 48, re-forms pixel electrode 46 and scan line 42 bridge 422, and the first via liner 48 is electrically connected with the bridge 422 of scan line 42, to realize described sweep Retouch being electrically connected for the cabling portion 421 of line 42 and the bridge 422 of scan line 42.The benefit being arranged in this way is, can to avoid due to The distance between cabling portion 421 and bridge 422 are excessive, due to punching the too deep hidden danger brought in manufacture craft.

On the basis of the above embodiments, when Fig. 9 is scan line bridge and pixel electrode same layer insulation set, second connects Another structural schematic diagram of binding structure, as shown in figure 9, second connection structure includes the cabling of the exposed scan line 42 The first sub- via 47a in portion 421, the second sub- via 47b, the second via lining of the first via liner 48a, exposure third pad 48a Pad the sub- via 47c of third of 48b, exposure the second via liner 48b, wherein the first via liner 48a covers the first sub- mistake Hole 47a, the second via liner 48b cover the second sub- via 47b.The cabling portion 421 of the scan line 42 passes through described One sub- via 47a, the first via liner 48a, the second sub- via 47b, the second via liner the 48b and sub- via 47c of third with The bridge 422 of the scan line 42 connects.

It in structure shown in Fig. 9, in specific preparation process, can be formed after a metal layer, be used on substrate Patterning processes form scan line cabling portion 421, the touch control electrode line 45 with 421 same layer of scan line cabling portion, then form first Insulating layer 410 is punched by lithographic technique on the first insulating layer 410, and the first sub- via 47a, the first sub- mistake are formed Hole 47a exposes the cabling portion 421 of the scan line 42, then re-forms a metal layer on the first insulating layer 410, and pass through Patterning processes form data line the 43 and first via liner 48a, which pads 48a and data line 43 and disconnect and mutually absolutely Edge, and the first via liner 48a completes to be electrically connected with the cabling portion 421 of the scan line 42, and cover the first sub- via 47a;Again in the first via liner 48a and formation second insulating layer 420 on data line 43, by lithographic technique in second insulating layer It is punched on 420, forms the second sub- via 47b, which exposes the first via liner 48a;Described Touch control electrode block 441 is formed on two insulating layers 420 and the second via pads 48b, which pads 48b and touch control electrode block 441 disconnections and mutually insulated, and the second via liner 48b covers the second sub- via 47b, and it is electric with the second via liner 48a Connection.It is padded in second via and forms third insulating layer 430 above 48b and the touch control electrode block 441, by etching skill Art is punched on third insulating layer 430, forms the sub- via 47c of third, and the sub- via 47c of third exposes second via Pad 48b;Re-form the bridge 422 of pixel electrode 46 and scan line 42, and the second via liner 48b and scan line 42 Bridge 422 is electrically connected, to realize being electrically connected for the cabling portion 421 of the scan line 42 and the bridge 422 of scan line 42 It connects.First connection structure provided in an embodiment of the present invention is similar with above-mentioned Fig. 3 and mode shown in Fig. 4, and therefore not to repeat here.

It should be noted that the top that pixel electrode is located at the touch control electrode block is illustratively arranged in Fig. 2-Fig. 9, and simultaneously Non- limitation of the present invention.The position of pixel electrode and touch control electrode block is not restricted in array substrate of the present invention, at other In embodiment, in addition to pixel electrode shown in the various embodiments described above is located at the top of the touch control electrode block, the pixel electricity It can also extremely be arranged with the touch control electrode block same layer or the pixel electrode is located at below the touch control electrode block.When described After the relative position of pixel electrode and touch control electrode block changes, to avoid bringing hidden danger since punching is too deep in manufacture craft, Corresponding first connection structure and the second connection structure need to adjust accordingly, for example, first connection structure the son for including The quantity of number of vias, via liner;And second include in connection structure sub- number of vias, the quantity of via liner can send out Changing.But as long as first connection structure can be such that the every touch control electrode line is connected with corresponding touch control electrode block, Second connection structure makes the adjacent cabling portion of scan line be connected with corresponding bridge.

First connection structure when the lower sections provided in an embodiment of the present invention for being located at touch control electrode block when pixel electrode Figure 10 Structural schematic diagram.As shown in Figure 10, first connection structure includes and 55 same layer of touch control electrode line and interconnection Connection liner 591, the exposure first sub- via 592a for connecting liner 591, the first mistake in the first sub- via 592a Hole liner 593, exposure first via pad 593 the second sub- via 592b, in the described second sub- via 592b Second via liner 594, exposure second via pad the 594 sub- via 592c of third.Second via liner 594 with 56 same layer of the pixel electrode, and the second via 592b is covered, 593 electricity of the second via liner 594 and the first via liner Property connection;The first via liner 593 and 53 same layer of the data line, and the first via 592a is covered, and the first via Liner 593 and connection liner 591 are electrically connected.The touch control electrode line 55 passes through connection liner 591, the first sub- mistake Hole 592a, the first via pad the 593, second sub- via 592b, the second via pad the 594 and sub- via 592c of third with it is right The touch control electrode block 541 answered connects.In the structure shown in Figure 10, it can be formed on substrate after a metal layer, using composition Technique forms scan line cabling portion, the touch control electrode line 55 with scan line cabling portion same layer, and with the touch control electrode line 55 The connection of same layer and interconnection liner 591, then forms second insulating layer 520, by lithographic technique in second insulating layer 520 On punched, formed the first sub- via 592a, the first sub- via 592a expose connection liner 591, then second absolutely It re-forms a metal layer in edge layer 520, and 53 and the first via liner 593, first mistake is formed data line by patterning processes Hole liner 593 is disconnected with data line 53 and mutually insulated, and the first via liner 593 is completed to be electrically connected with liner 591 is connect, And the covering first sub- via 592a;Again in the first via liner 593 and formation third insulating layer 530 on data line 53, lead to Over etching technology is punched above third insulating layer 530, forms the second sub- via 592b, and the second sub- via 592b exposes The first via liner 593 forms pixel electrode 56 and the second via liner 594 on the third insulating layer 530, described Second via liner 594 is disconnected with pixel electrode 56 and mutually insulated, and the second via liner 594 and the first via pad 592 complete electrical connection, and cover the second sub- via 592b;It is formed again on pixel electrode 56 in the second via liner 594 4th insulating layer 540 is punched by lithographic technique above the 4th insulating layer 540, and the sub- via 592c of third, third are formed Sub- via 592c exposes second via liner 594, re-forms touch control electrode block 541, and the second via liner 594 with Touch control electrode block 541 is electrically connected, to realize being electrically connected for touch control electrode line 55 and touch control electrode block 541.It is arranged in this way Benefit is, can to avoid due to the distance between touch control electrode line 55 and touch control electrode block 541 it is excessive, avoid in manufacture craft Due to punching the too deep hidden danger brought.

Second connection structure when Figure 11 is the lower section provided in an embodiment of the present invention for being located at touch control electrode block when pixel electrode Structural schematic diagram.Illustratively, it for when the scan line bridge and the pixel electrode same layer are arranged, carries out detailed Description.As shown in figure 11, second connection structure includes the first sub- via in the cabling portion 621 of the exposed scan line 62 The second sub- via 67b of 67a, the first via liner 68 for covering the first sub- via 67a, the first via of exposure liner 68, wherein The first via liner 68 and cabling portion 621 are electrically connected.The cabling portion 621 of the scan line 62 passes through the described first sub- mistake Hole 67a, the first via pad the 68, second sub- via 67b and are connect with the bridge 622 of the scan line 62.Shown in Figure 11 It in scheme, can be formed on substrate after a metal layer, scan line cabling portion 621 and scan line are formed using patterning processes Then the touch control electrode line 65 of 621 same layer of cabling portion forms the first insulating layer 610, by lithographic technique in the first insulating layer 610 On punched, form the first sub- via 67a, which exposes the cabling portion 621 of the scan line 62, so It re-forms a metal layer on the first insulating layer 610 afterwards, and 63 and the first via liner 68 is formed data line by patterning processes, First via liner 68 is disconnected with data line 63 and mutually insulated, and the first via liner 68 is walked with the scan line 62 Line portion 621 completes electrical connection, and covers the first sub- via 67a;Again second is formed on the first via liner 68 and data line 63 Insulating layer 620 is punched by lithographic technique in second insulating layer 620, and the second sub- via 67b, the second sub- via are formed 67b exposes the first via liner 68.Pixel electrode 66 and scan line bridging are formed above the second insulating layer 620 Portion 622, and the first via liner 68 is electrically connected with the bridge 622 of scan line 62, to realize the scan line 62 Cabling portion 621 is electrically connected with the bridge 622 of scan line 62.Then third insulation is being formed where pixel electrode above film layer Layer 630, touch control electrode block 641.

In order to save processing procedure, improve production efficiency, the data line of the array substrate can also be set to include and institute State the cabling portion of touch control electrode line same layer and the structure with the bridge of the different layer of touch control electrode line, wherein adjacent walks Line portion is connect by one second connection structure with the bridge.Figure 12 is another array substrate provided in an embodiment of the present invention Vertical view, as shown in figure 12, the array substrate includes:Substrate 71;The insulation being arranged on the substrate 71 is intersected more Scan line 72 and multiple data lines 73, the multi-strip scanning line 72 extend in a first direction, and the data line 73 is along second party To extension;Common electrode layer 74 above 73 place film layer of the data line, the common electrode layer 74 include multiple Every setting and with the touch control electrode block 741 of array way arrangement;A plurality of touch control electrode line 75, the every touch control electrode line 75 are logical One first connection structure touch control electrode block 741 corresponding with one is crossed to connect.

In order to save processing procedure, production efficiency is improved, sets the data line to having structure:The data line 73 wraps It includes:With the cabling portion 731 of 75 same layer of touch control electrode line, and the bridge 732 with 75 different layer of the touch control electrode line, phase Adjacent cabling portion 731 is connect by one second connection structure with the bridge 732.Specifically, in manufacture craft, Ke Yi It is formed on substrate 71 after a metal layer, a plurality of data line 73 extended in a second direction and more is formed simultaneously using patterning processes The touch control electrode line 75 that item extends in a first direction, the multiple data lines 53 extended in a second direction are spaced by touch control electrode line 55 Open form is at cabling portion 731.To realize that data line can be successfully delivered data-signal, then the disconnection that will extend in a second direction is needed Cabling portion 731 link together, that is, need setting and the bridge 732 of 75 non-same layer of touch control electrode line, formed a plurality of complete Data line 73.

Compared with the existing technology, the technical solution that the present embodiment is provided, by by touch control electrode line 75 and data line 73 Cabling portion 731 completed in same manufacture craft, without individually increasing processing procedure because making touch control electrode line, reduce together Manufacture craft, and then improve production efficiency.

Furthermore in the prior art, in order to improve the flatness of pixel electrode and public electrode, can be arranged in data line layer The larger planarization layer of a layer thickness.But due to touch control electrode line need be arranged on planarization layer, with and touch control electrode Block connects, and the presence of touch control electrode line reduces the flatness of pixel electrode and public electrode, affects display effect.The present invention Embodiment completes in the cabling portion of touch control electrode line and data line in same manufacture craft, makes it that need not again be arranged flat Change on layer, improves the flatness of pixel electrode and public electrode, improve the display effect of display device.

On the basis of the above embodiments, a plurality of touch control electrode line is arranged to extend in a first direction, described second On direction, there is interval, the interval to be provided with the touch control electrode line between the cabling portion of the adjacent data line.

Further, the orthographic projection of the touch control electrode line on the substrate and the scan line be on the substrate Orthographic projection is overlapped.

For in above-described embodiment, setting the data line to include the cabling portion with the touch control electrode line same layer, And the bridge with the different layer of touch control electrode line, adjacent cabling portion are connected by one second connection structure and the bridge Connect, it is specific there are many realization method, below each preferred embodiment is described in detail.

Data line includes described in array substrate provided in an embodiment of the present invention:With the cabling of the touch control electrode line same layer Portion, and the bridge with the different layer of touch control electrode line, adjacent cabling portion pass through one second connection structure and the bridging Portion connects.Due to having interval, interval to be provided with touch control electrode line between data line cabling portion, it is therefore desirable to setting and data The bridge of line cabling portion and the different layer of touch control electrode line, specifically, the bridge can be same with the light shield layer of array substrate Layer insulation set, can also with touch control electrode block same layer insulation set, or with pixel electrode same layer insulation set.

Figure 13 is data line when including cabling portion and bridge, the knot of data line bridge and light shield layer same layer insulation set Structure schematic diagram, the structural schematic diagram are the sectional view of the A-A ' lines along Figure 12, and as shown in figure 13, the array substrate includes:Base Plate 81;The multi-strip scanning line 82 and multiple data lines 83 for the insulation intersection being arranged on the substrate 81, the multi-strip scanning line 82 extend in a first direction, and the data line 83 extends in a second direction;Public affairs above 83 place film layer of the data line Common electrode layer 84, the common electrode layer 84 include multiple touch control electrode blocks 841 interval setting and arranged with array way;It is more Bar touch control electrode line 85, the every touch control electrode line 85 pass through one first connection structure touch control electrode block corresponding with one 841 connections.The data line 83 includes:With the cabling portion 831 of 85 same layer of touch control electrode line, and with the touch control electrode The bridge 832 of 85 different layer of line, adjacent cabling portion 831 are connect by one second connection structure with the bridge 832.It is described Array substrate further includes the light shield layer 86 between the substrate 81 and the 821 place film layer of cabling portion of the scan line 82, The bridge 832 of the data line 83 and 86 same layer insulation set of the light shield layer.

Specifically, multi-strip scanning line 82 and the insulation intersection of multiple data lines 83 limit the pixel list of multiple matrix arrangements Member, each pixel unit include a thin film transistor switch 87, and the light shield layer 86 is located at the thin film transistor switch 87 Semiconductor layer 871 towards the side of substrate 81, the light for blocking backlight module generation prevents light irradiation from leading to film The semiconductor layer 871 of transistor switch 87 degenerates and prevents thin film transistor switch 87 from generating leakage current.Specifically, this implementation The array substrate of example can form data line 83 while forming light shield layer 86 on substrate 81 during manufacture craft Bridge 832, the length of bridge 832 in a second direction can be set as the spacing in adjacent traces portion 831 in second direction, It can be set as being slightly larger than above-mentioned spacing.The embodiment of the present invention is by by the bridge 832 of the data line 83 and the light shield layer 86 same layer insulation sets, the two are completed in same manufacture craft, therefore reduce one of manufacture craft again, are further improved Production efficiency.

Figure 14 is a kind of structural schematic diagram for first connection structure that present invention implementation provides, and Figure 14 is the B-B ' along Figure 12 A kind of sectional view of line, as shown in figure 14, first connection structure include the first via of the exposed touch control electrode line 85 88, the touch control electrode line 85 is connected by first via 88 with the corresponding touch control electrode block 841.

When the data line includes cabling portion and bridge, and the bridge is with light shield layer same layer insulation set, second It can be realized there are two types of mode when being connected to specific implementation.First way first passes through etching and is formed described in exposure as shown in figure 13 Then the third via 89 of 83 bridge 832 of data line forms the data line 83 while forming touch control electrode block 841 The cabling portion 831 in cabling portion 831, the data line 83 is electrically connected by third via 89 with the completion of bridge 832.The present embodiment In, the second connection structure for connecting 83 cabling portion 831 of the data line and bridge 832 is above-mentioned third via 89.

When Figure 15 is data line bridge and light shield layer same layer insulation set, another structural representation of the second connection structure Figure, as shown in figure 15, second connection structure includes the first sub- via of the bridge 832 of the exposed data line 83 891a, the first via liner 892 in the described first sub- via 891a, exposure first via pad the second of 892 Sub- via 891b.Wherein, the first via liner 892 and the scan line same layer, and the first sub- via 891a is covered, it is described First via liner 892 is electrically connected with bridge 832.The data line bridge 832 passes through the described first sub- via 891a, One via liner 892 and the second sub- via 891b are connected with corresponding data line cabling portion 831.In structure shown in figure 15 In, it can be formed on substrate after a metal layer, form light shield layer 86, data line bridge 832 using patterning processes, then The first insulating layer 810 is formed, is punched on the first insulating layer 810 by lithographic technique, the first sub- via 891a is formed, it should Firstth sub- via 891a exposes the data line bridge 832.Then a metal layer is re-formed on the first insulating layer 810, And by patterning processes formed scan line 82 and the first via liner 892, first via liner 892 with scan line 82 disconnect and Mutually insulated, and the first via liner 892 is electrically connected with the completion of the bridge 832 of the data line 83, and cover the first son Via 891a.Again in the first via liner 892 and formation second insulating layer 820 in scan line 82, by lithographic technique second 820 top of insulating layer is punched, and forms the second sub- via 891b through second insulating layer 820, the second sub- via 891b is sudden and violent Expose the first via liner 892.Then a metal layer is re-formed in second insulating layer 820, and passes through patterning processes shape Cabling portion 831 at data line and touch control electrode line 85.The cabling portion 831 is served as a contrast by the first sub- via 891a, the first via Pad 892 and the second sub- via 891b are electrically connected with the completion of the bridge 832.The benefit being arranged in this way is, can to avoid by It is excessive in the distance between cabling portion 831 and bridge 832, due to punching the too deep hidden danger brought in manufacture craft.

Figure 16 is that the structure of data line bridge provided in an embodiment of the present invention and touch control electrode block same layer insulation set is shown It is intended to, which is the sectional view of the A-A ' lines along Figure 12, and as shown in figure 16, the array substrate includes:Substrate 91; The multi-strip scanning line 92 and multiple data lines 93 for the insulation intersection being arranged on the substrate 91, the multi-strip scanning line 92 is along the One direction extends, and the data line 93 extends in a second direction;Public electrode above 93 place film layer of the data line Layer 94, the common electrode layer 94 include multiple touch control electrode blocks 941 interval setting and arranged with array way;A plurality of touch-control Electrode wires 95, the every touch control electrode line 95 are connected by one first connection structure touch control electrode block 941 corresponding with one, The data line 93 includes:With the cabling portion 931 of 95 same layer of touch control electrode line, and with 95 different layer of the touch control electrode line Bridge 932, adjacent cabling portion 931 is connect by one second connection structure with the bridge 932.

The 932 same layer insulation set of bridge of the touch control electrode block 941 and the data line 93.Specifically, this implementation The array substrate of example can be that bridge 932 is formed while forming touch control electrode block 941 during manufacture craft, across The length of socket part 932 in a second direction can be set as the spacing in adjacent traces portion 931 in second direction, can also be set as bigger In above-mentioned spacing.The embodiment of the present invention passes through the bridge 932 of the data line 93 and 941 same layer of touch control electrode block is exhausted Edge is arranged, and the two is completed in same manufacture craft, therefore reduces one of manufacture craft again, further improves production effect Rate.

As shown in figure 16, when the data line bridge and touch control electrode block same layer insulation set, etching shape is first passed through At the third via 96 in the exposure 93 cabling portion 931 of data line, then formed while forming touch control electrode block 941 described The cabling portion 931 of the bridge 932 of data line 93, the data line 93 is electrically connected by third via 96 and the completion of bridge 932 It connects.In the present embodiment, second connection structure in cabling portion 931 and bridge 932 for connecting the data line 93 is State third via 96.First connection structure provided in an embodiment of the present invention is similar with mode shown in above-mentioned Figure 14, does not make herein It repeats.

Figure 17 is the structural schematic diagram of data line bridge provided in an embodiment of the present invention and pixel same layer insulation set, should Structural schematic diagram is the sectional view of the A-A ' lines along Figure 12, and as shown in figure 17, the array substrate includes:Substrate 101;Setting exists The multi-strip scanning line 102 and multiple data lines 103 of insulation intersection on the substrate 101, the multi-strip scanning line 102 is along first Direction extends, and the data line 103 extends in a second direction;Public electrode above 103 place film layer of the data line Layer 104, the common electrode layer 104 include multiple touch control electrode blocks 1041 interval setting and arranged with array way;It is a plurality of Touch control electrode line 105, the every touch control electrode line 105 pass through one first connection structure touch control electrode block corresponding with one 1041 connections, the data line 103 include:With the cabling portion 1031 of 105 same layer of touch control electrode line, and with the touch-control The bridge 1032 of 105 different layer of electrode wires, adjacent cabling portion 1031 pass through one second connection structure and the bridge 1032 Connection.Multi-strip scanning line 102 and the insulation of multiple data lines 103, which intersect, limits multiple pixel units being arranged in array, each Pixel unit includes a pixel electrode 106, and the pixel electrode 106 and 1032 same layer of bridge of the data line 103 are exhausted Edge is arranged.Specifically, the array substrate of the present embodiment can be during manufacture craft, the same of pixel electrode 106 is being formed When form data line bridge 1032, the length of bridge 1032 in a second direction can be set as adjacent traces in second direction The spacing in portion 1031 can also be set as being slightly larger than above-mentioned spacing.The embodiment of the present invention is by by the bridge of the data line 103 1032 with 106 same layer insulation set of the pixel electrode, the two is completed in same manufacture craft, therefore reduces one of system again Make technique, further improves production efficiency.

When the data line includes cabling portion and bridge, and the bridge is with pixel electrode same layer insulation set, the Two can realize when being connected to specific implementation there are two types of mode.First way first passes through etching and forms exposure institute as shown in figure 17 The third via 107 in 103 cabling portion 1031 of data line is stated, then forms the data line while forming pixel electrode 106 The cabling portion 1031 of 103 bridge 1032, the data line 103 is electrically connected by third via 107 and the completion of bridge 1032 It connects.In the present embodiment, the second connection structure for connecting 103 cabling portion 1031 of the data line and bridge 1032 is State third via 107.

When Figure 18 is data line bridge and pixel electrode same layer insulation set, another structure of the second connection structure is shown It is intended to, as shown in figure 18, second connection structure includes the first sub- via of the bridge 1031 of the exposed data line 103 1071a, the first via liner 1072, exposure first via pad 1072 the second sub- via 1071b.Wherein, described One via liner, 1072 the first sub- via 1071a of covering.The data line bridge 1032 passes through the described first sub- via 1071a, the first via liner 1072 and the second sub- via 1071b are connect with data line cabling portion 1031.

It in the structure shown in Figure 18, can be formed on substrate after a metal layer, be formed and scanned using patterning processes Then line 102 forms the first insulating layer;It is formed on the first insulating layer after a metal layer, data is formed using patterning processes Line cabling portion 1031 and touch control electrode line 105, then re-form second insulating layer, by lithographic technique over the second dielectric into Row punching, forms the first sub- via 1071a, which exposes data line cabling portion 1031;Then in institute It states and forms touch control electrode block 1041 and the first via liner 1072, the touch control electrode block 1041 and first above second insulating layer Via liner 1072 disconnects and mutually insulated, and the first via liner 1072 passes through the first sub- via 1071a and the data Complete electrical connection in line cabling portion 1031;Third to be formed above 1041 and first via of touch control electrode block liner 1072 exhausted again Edge layer is punched by lithographic technique above third insulating layer, and the second sub- via through third insulating layer is formed 1071b, the second sub- via 1071b expose the first via liner 1072;Re-form pixel electrode 106 and data line across Socket part 1032.Bridge 1032 is electrically connected by the second sub- via 1071b with the first via liner 1072, described to realize The cabling portion 1031 of data line 103 is electrically connected with the bridge 1032 of data line 103.The benefit being arranged in this way is can to keep away Exempt from since the distance between cabling portion 1031 and bridge 1032 are excessive, in manufacture craft due to punch it is too deep bring it is hidden Suffer from.First connection structure provided in an embodiment of the present invention is similar with mode shown in above-mentioned Figure 14, and therefore not to repeat here.

It should be noted that Figure 12-Figure 18, which is illustratively set as the data line, is set as cabling portion and bridge When structure, pixel electrode is located at the top of public electrode.The structure that cabling portion and bridge are set as with the scan line is similar, The position of pixel electrode and touch control electrode block is not restricted in array substrate of the present invention, in other embodiments, except above-mentioned Pixel electrode shown in each embodiment is located at outside the top of the touch control electrode block, and the pixel electrode can also be with the touch-control Electrode block same layer is arranged or the pixel electrode is located at below the touch control electrode block.When the pixel electrode and touch control electrode After the relative position variation of block, to avoid bringing hidden danger, corresponding first connection structure since punching is too deep in manufacture craft It need to be adjusted accordingly with the second connection structure, such as the sub- number of vias for including of first connection structure, via liner Quantity;And second include in connection structure sub- number of vias, the quantity of via liner can change.But as long as described First connection structure can be such that the every touch control electrode line is connected with corresponding touch control electrode block, and the second connection structure makes data The adjacent cabling portion of line is connected with corresponding bridge.

The embodiment of the present invention also provides a kind of touch control display apparatus, and the touch control display apparatus includes the various embodiments described above institute The array substrate stated, since the touch control display apparatus described in the present embodiment includes above-mentioned array substrate, technical principle and generation Technique effect it is similar with above-mentioned array substrate, therefore have advantageous effect same as above-mentioned array substrate, it is no longer superfluous here It states.It should be noted that it can also include that other are used to support touch-control display dress that the embodiment of the present invention, which provides touch control display apparatus, Set the circuit and device of normal work.Above-mentioned touch control display apparatus can be mobile phone, tablet computer, Electronic Paper, digital photo frame In one kind.

Technical solution provided by the invention, set the scan line or the data line to include and the touch control electrode The cabling portion of line same layer, and the structure with the bridge of the different layer of touch control electrode line, and adjacent cabling portion passes through one Two connection structures are connect with the bridge, and the every touch control electrode line is touched by the way that one first connection structure is corresponding with one Control electrode block connection, compared with the existing technology, the technical solution can by touch control electrode line with scan line or data line same It is completed in manufacture craft, the manufacturing process of special making touch control electrode line together can be reduced, and then production efficiency can be improved.

Furthermore the embodiment of the present invention is by touch control electrode line and scan line cabling portion or data line cabling portion in same making work It is completed in skill, makes it that need not be arranged on planarization layer again, improve the flatness of pixel electrode and public electrode, improved The display effect of display device.

Note that above are only presently preferred embodiments of the present invention and institute's application technology principle.It will be appreciated by those skilled in the art that The present invention is not limited to specific embodiments described here, can carry out for a person skilled in the art it is various it is apparent variation, It readjusts and substitutes without departing from protection scope of the present invention.Therefore, although being carried out to the present invention by above example It is described in further detail, but the present invention is not limited only to above example, without departing from the inventive concept, also May include other more equivalent embodiments, and the scope of the present invention is determined by scope of the appended claims.

Claims (15)

1. a kind of array substrate, which is characterized in that including:
Substrate;
The multi-strip scanning line and multiple data lines of insulation intersection on the substrate are set, and the multi-strip scanning line is along first party To extension, the data line extends in a second direction;
Common electrode layer where the data line above film layer, the common electrode layer include multiple intervals be arranged and with The touch control electrode block of array way arrangement;
A plurality of touch control electrode line, the every touch control electrode line pass through one first connection structure touch control electrode block corresponding with one Connection;
The scan line or the data line include:With the cabling portion of the touch control electrode line same layer, and with the touch-control electricity The bridge of the different layer of polar curve, adjacent cabling portion are connect by one second connection structure with the bridge;
Light shield layer between film layer where the substrate and the scan line, the bridge of the scan line or the number Bridge according to line and the light shield layer same layer insulation set.
2. array substrate according to claim 1, which is characterized in that the scan line includes same with the touch control electrode line When the cabling portion of layer and bridge with the different layer of touch control electrode line, a plurality of touch control electrode line prolongs in a second direction It stretches, in said first direction, there is interval, the interval to be provided with described between the cabling portion of the adjacent scan line Touch control electrode line.
3. array substrate according to claim 1, which is characterized in that the data line includes same with the touch control electrode line When the cabling portion of layer and bridge with the different layer of touch control electrode line, a plurality of touch control electrode line prolongs along first direction It stretches, in this second direction, there is interval, the interval to be provided with described between the cabling portion of the adjacent data line Touch control electrode line.
4. array substrate according to claim 2, which is characterized in that the positive throwing of the touch control electrode line on the substrate Shadow is Chong Die with the orthographic projection of the data line on the substrate.
5. array substrate according to claim 3, which is characterized in that the positive throwing of the touch control electrode line on the substrate Shadow is Chong Die with the orthographic projection of the scan line on the substrate.
6. array substrate according to claim 1, which is characterized in that the array substrate further includes:
Multiple pixel units being arranged in array, each pixel unit include a pixel electrode, the pixel electrode with it is described Touch control electrode block same layer or the setting of different layer.
7. array substrate according to claim 2, which is characterized in that first connection structure includes and the touch-control is electric The connection of polar curve same layer and interconnection pads, and the first via that the exposure connection pads, the touch control electrode line are logical The connection liner and first via is crossed to connect with the corresponding touch control electrode block.
8. array substrate according to claim 2, which is characterized in that first connection structure includes and the touch-control is electric The connection of polar curve same layer and interconnection liner, at least two sub- vias and at least one via liner, the touch control electrode line It is connected with the corresponding touch control electrode block by connection liner, at least two sub- vias and at least one via liner.
9. array substrate according to claim 2, which is characterized in that second connection structure includes the exposure scanning Second via in line cabling portion, the bridge phase that the cabling portion of the scan line passes through the second via described in this and the scan line Even.
10. array substrate according to claim 2, which is characterized in that second connection structure includes at least two sons Via and at least one via liner, the cabling portion of the scan line passes through described at least two sub- vias and at least one via Liner is connected with the bridge of the scan line.
11. array substrate according to claim 3, which is characterized in that first connection structure, which includes that exposure is described, to be touched The first via of electrode wires is controlled, the touch control electrode line is connected by first via with the corresponding touch control electrode block.
12. array substrate according to claim 3, which is characterized in that first connection structure includes at least two sons Via and at least one via liner, the touch control electrode line are padded by described at least two sub- vias and at least one via It is connected with the corresponding touch control electrode block.
13. array substrate according to claim 3, which is characterized in that second connection structure includes the exposure number According to the third via in line cabling portion, bridge that the cabling portion of the data line passes through third via and the data line described in this It is connected.
14. array substrate according to claim 3, which is characterized in that second connection structure includes at least two sons Via and at least one via liner, the cabling portion of the data line passes through described at least two sub- vias and at least one via Liner is connected with the bridge of the data line.
15. a kind of touch control display apparatus, which is characterized in that including claim 1-14 any one of them array substrates.
CN201510357246.9A 2015-06-25 2015-06-25 A kind of array substrate and touch control display apparatus CN104915062B (en)

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