CN104459966A - Optical imaging system for ultraviolet and visible light detection microscope - Google Patents
Optical imaging system for ultraviolet and visible light detection microscope Download PDFInfo
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- CN104459966A CN104459966A CN201410620550.3A CN201410620550A CN104459966A CN 104459966 A CN104459966 A CN 104459966A CN 201410620550 A CN201410620550 A CN 201410620550A CN 104459966 A CN104459966 A CN 104459966A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/02—Objectives
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/001—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras
- G02B13/0015—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras characterised by the lens design
Abstract
The invention provides an optical imaging system for an ultraviolet and visible light detection microscope. The optical imaging system comprises a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, a seventh lens, an eighth lens, a ninth lens, a tenth lens, an eleventh lens, a twelfth lens, a thirteenth lens, a fourteenth lens, a fifteenth lens, a sixteenth lens, a seventeenth lens and an eighteenth lens in sequence in the direction of the optical axis of the optical imaging system, wherein the first lens, the second lens, the third lens and the fourth lens form a first lens group G1, and the combined focal length of the first lens group G1 is 200 mm; the fifth lens, the sixth lens, the seventh lens, the eighth lens, the ninth lens, the tenth lens, the eleventh lens, the twelfth lens, the thirteenth lens, the fourteenth lens, the fifteenth lens, the sixteenth lens, the seventeenth lens and the eighteenth lens form a second lens group G2, and the combined focal length of the second lens group G2 is 4 mm; the amplification factor from an object plane to an image plane is 1/50, the radius of the view field of an object space is 10 mm, and the numerical aperture of an image space is realized to be 0.85. The optical imaging system is totally made of high-transparency i-line glass, and the imaging quality approaches perfect imaging; moreover, the optical imaging system is compact in structure and capable of completely meeting the technical requirements of the ultraviolet and visible light detection microscope.
Description
Technical field
The present invention relates to a kind of imaging optical system, particularly a kind of for visible-microscopical imaging optical system of UV detect.
Background technology
In every field such as physics, chemistry, material science, life sciences, ultraviolet microscope constantly expands range of application; Especially in semi-conductor industry and optoelectronics industry field, ultraviolet microscope has become a kind of very important testing equipment.Ultraviolet microscope may be used for the detection of litho pattern after the technological processs such as exposure, development, etching on silicon chip (or mask), can the whole structure of the upper litho pattern of rapid scan silicon chip (or mask), litho pattern live width (CD) and defects detection etc. can be measured.
Ultraviolet microscope can also be used for the detection of semiconductor packages litho pattern, printed circuit board (PCB) (PCB) litho pattern and defect etc.; Especially for Advanced Packaging and high density interconnecting board (HDI plate) technology, its litho pattern has developed into several micron dimension, and its defects detection requires to develop into sub-micrometer scale.In order to improve the yield of Advanced Packaging litho pattern and HDI plate litho pattern, need a kind of UV detect optical microscope with sub-micrometer scale resolution.In addition, in order to improve the efficiency of detection and alleviate the labour intensity of operator, based on ccd image acquisition technique, microcobjective enlarged image can be projected on CCD photosurface, just can take into picture or video carries out analyzing and processing again, make the flexibly easy to operate of checkout equipment like this.Microcobjective optical system is the microscopical core apparatus of this kind of detection, such as, the microscope that videomicroscopy or digit microscope are exactly is receiving device with CCD camera or CMOS camera, this kind of microscopical major advantage is the robotization being convenient to realize with computing machine detection and information processing.
Along with the lasting guiding of the market demand, semiconductor technology, Advanced Packaging, High density of PCB plate technique (as HDI plate) etc. also constantly make progress, and corresponding testing equipment also needs to improve constantly its technical indicator to mate the testing requirement of photoetching technique.For the demand of Advanced Packaging and HDI plate technique, industry needs the detection ultraviolet microscope providing a kind of submicron resolution, and form ultraviolet microscope pick-up unit with imageing sensor (as CCD camera), and microcobjective optical system is the core apparatus of detection ultraviolet microscope, determine the key technical indexes of ultraviolet microscope.Visible-UV detect microscope adopts beam splitting system, both can combinationally use with imageing sensor (as CCD camera), and can combinationally use again observe for operator with eyepiece.
Application number is the Chinese patent (on October 13 1988 applying date, applying for artificial State-Run Huabei Optical Instrument Factory) of 88109146.4, discloses a kind of optical system of wide-apperture objective lens for microprojection, is applicable to plate making machine object lens.Its numerical aperture is 0.417, and enlargement ratio is 10 times, and operation wavelength is visible ray (with C light, D light, the representative of F light), and be made up of 7 lens, structure is simple, and enlargement ratio is lower, and numerical aperture is less.Its major defect is that peripheral field resolution is low, distortion is large, is not content with Advanced Packaging and HDI plate litho pattern detects microscopical technical need.
Application number is the Chinese patent (October 26 2012 applying date) of 201210418310.6, discloses a kind of microcobjective optical system for video imaging.This patent of invention adopts 18 pieces of lens to achieve the video imaging of wide spectral range (360nm ~ 550nm), large-numerical aperture (NA=0.85), Large visual angle (0.3mm), but for the application described by this patent, and potential other side should be used for say, also have some needs improve part:
In ■ embodiment table one, have employed the optical material of 12 kinds of trades mark altogether, wherein a kind is HOYA Products, and 11 kinds is SCHOTT Products.Segment glass material transmitance used is lower, such as, the N-LAF33 material of what its 1st piece of lens adopted is SCHOTT company, the transmitance code of this material is 39/32, represent for 10mm heavy sheet glass material transmitance in 390nm wavelength to be 80%, in 320nm wavelength, transmitance is 5%, as shown in Figure 1, for the operation wavelength 360nm of this patent, interior transmitance is necessarily less than 80%; 2nd piece of lens are N-LAK12 materials of SCHOTT company, and transmitance code is 37/31, and for the operation wavelength 360nm of this patent, interior transmitance is necessarily less than 80%; In addition, N-LAK34 material transmitance code is the transmitance code of 37/28, SF5 material is 37/33, shows that the two is necessarily less than 80% to transmitance in operation wavelength 360nm; N-LAK22 and N-KZFS11 material transmitance code is all 36/30, shows that the two is 80% to transmitance in operation wavelength 360nm; Like this, select a large amount of low transmission materials, total transmitance of this optical system must be caused too low.
The relative distortion of this optical system of ■ is 0.03%, and corresponding to 0.3mm visual field, the distortion that so can calculate in this visual field is 0.03%*0.3mm=90nm, and for the testing requirement of application described by this patent, the distortion of this magnitude is larger.
■ is according to data in this patent Example table 1, and the conjugate distance calculating this optical system is 469.8mm, and show that this optical system is long, structure is not compact.
■, according to the description of this patent of invention, claims and adopts the two heart conceptual design far away of object space, image space, but do not provide the data of telecentricity deviation.
The overwhelming majority of this optical system of ■ adopts balsaming lens group, if to the technical field application of heavy dose of demands such as Advanced Packaging photoetching, the photoetching of HDI plate, plate making photoetching, so this optical system can not be applied to heavy dose of exposure applications owing to there being cementing layer.
Summary of the invention
The object of the present invention is to provide a kind of for visible-microscopical imaging optical system of UV detect, this visible-microscopical imaging optical system of UV detect, may be used for the detection of the litho pattern such as Advanced Packaging, HDI plate after exposure, development, etching, can be used for the whole structure of rapid scan litho pattern, can be used for measuring litho pattern live width (CD) etc.
Visible-UV detect microscope adopts beam splitting system, both can combinationally use with imageing sensor (as CCD camera), and can combinationally use again observe for operator with eyepiece.
The described enlargement ratio for visible-microscopical imaging optical system of UV detect is 1/50 times, image-side numerical aperture NA is 0.85, operating wavelength range is i line, h line and g line, i.e. main three spectral lines 365.0nm, 404.7nm, 435.8nm of high-pressure sodium lamp, true field radius is 10mm, and image space radius is 0.2mm.
The object of the present invention is achieved like this:
A kind of for visible-microscopical imaging optical system of UV detect, with CCD photosurface for object plane is positioned at upside, with sample surface for image planes are positioned at downside, because light path is reversible, according to reverse optical path design, light is propagated from the CCD photosurface of upside to the sample surface of downside.Described imaging optical system along its optical axis direction, comprises the first lens successively from object plane to image planes, second lens, 3rd lens, until the 18 lens and aperture diaphragm, the first described lens are the meniscus lens having negative power and bend towards image planes, the second described lens, 6th lens, 8th lens, 9th lens, 11 lens, 13 lens, 15 lens, 17 lens are biconvex positive lens, the 3rd described lens, 5th lens, 7th lens, tenth lens, 16 lens are double-concave negative lens, the 4th described lens are the meniscus lens having positive light coke and bend towards object plane, the 12 described lens and the 14 lens are the meniscus lens having negative power and bend towards object plane, the 18 described lens are the meniscus lens having positive light coke and bend towards image planes, aperture diaphragm is between the 12 lens and the 13 lens, described imaging optical system, all 18 pieces of lens all adopt the i line glass of OHARA company high permeability, select the glass material of 6 kinds of trades mark altogether, the 4th wherein said lens, 8th lens, 9th lens, 11 lens, 15 lens, SFPL51Y glass material selected by 17 lens, and PBL25Y glass material selected by the 14 described lens, and SFSL5Y glass material selected by the 5th described lens, the first described lens, 6th lens, 7th lens, 13 lens, 16 lens adopt PBM2Y glass material, the second described lens, tenth lens, 12 lens, BSM51Y glass material selected by 18 lens, and BAL15Y glass material selected by the 3rd described lens.
Imaging optical system of the present invention comprises 18 pieces of described lens and an aperture diaphragm, wherein the first lens form the first mirror group G1 to the 4th lens, its combined focal length is 200mm, the 5th described lens form the second mirror group G2 to the 18 lens, its combined focal length is 4mm, and the enlargement ratio of the imaging optical system described in ensureing like this is 1/50 times.
Imaging optical system of the present invention compared with prior art, has following advantage and good effect:
1, imaging optical system of the present invention all adopts the i line glass of high permeability, and all lens all adopt the separate lenses structure of separation, without glued construction, image quality is close to improving imaging, both may be used for visible-UV detect microscope, may be used for again the fields such as plate making lithographic objective;
2, imaging optical system of the present invention adopts cramped construction design, and object-image conjugate is apart from having greatly improved with compared with first technology;
3, the relative distortion maximal value of imaging optical system of the present invention is 0.01%, corresponds to the distortion of 20nm, meets the technical requirement for visible-UV detect microscope or plate making lithographic objective etc. and application requirement completely.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of the interior transmitance code CC implication of optical glass material;
Fig. 2 is structure and the index path of imaging optical system of the present invention;
Fig. 3 is that the diffraction modulation transfer function MTF of imaging optical system of the present invention schemes;
Fig. 4 is the distribution plan of the RMS wave aberration of imaging optical system of the present invention;
Fig. 5 is spherical aberration, astigmatism, the curvature of field, the distortion distribution plan of imaging optical system of the present invention;
Fig. 6 is the telecentricity error map of imaging optical system of the present invention.
Embodiment
Below will be described in further detail for visible-microscopical imaging optical system of UV detect, but protection scope of the present invention should do not limited with this of the present invention.
A kind of for visible-microscopical imaging optical system of UV detect, as seen described-UV detect microscope, may be used for the detection of the litho pattern such as Advanced Packaging, HDI plate after exposure, development, etching, can be used for the whole structure of rapid scan litho pattern, can be used for measuring litho pattern live width (CD) etc.
Visible-UV detect microscope adopts beam splitting system, both can combinationally use with imageing sensor (as CCD camera), and can combinationally use again observe for operator with eyepiece.
The enlargement ratio β of the microscopical microcobjective of as seen described-UV detect is 1/50 times, and image-side numerical aperture NA is 0.85, and operating wavelength range is i line, h line and g line, i.e. main three spectral lines 365.0nm, 404.7nm, 435.8nm of high-pressure sodium lamp.
In order to overcome the low problem of Chinese patent 201210418310.6 transmitance, imaging optical system of the present invention also has an important application, namely for fields such as plate making lithographic objectives, therefore, all lens of the present invention all adopt the i line glass of high permeability, the PBM2Y glass that wherein transmitance is minimum is greater than 98.6% at 365nm wavelength for transmitance in the thick material of every 10mm, and in other material, transmitance is all more than 99%.
In addition, imaging optical system of the present invention does not adopt glued construction, and whole 18 lens all adopt the separate lenses structure of separation.
In order to overcome the problem of Chinese patent 201210418310.6 object-image conjugate apart from longer (469.8mm), imaging optical system of the present invention adopts cramped construction design, and conjugate distance has larger compression.
As seen described-UV detect microscope detector used is CCD camera, and its Pixel Dimensions is 13 × 13 μm
2, photosurface is of a size of 13.312 × 13.312mm
2the diameter of its correspondence is 18.826mm, using the object plane of CCD camera photosurface as imaging optical system of the present invention, and gets certain design margin, so determine that true field radius is 10mm, because microcobjective enlargement ratio is 1/50 times, like this, image space radius is 0.2mm, this position is considered as object plane by general microcobjective, amplify again through eyepiece secondary imaging after certain multiplying power, because light path is reversible, the present invention adopts reverse optical path to design.
Because CCD camera Pixel Dimensions is 13 μm, be 260nm after microcobjective 50 doubly reduces, according to Rayleigh resolution formula
wherein, λ adopts operation wavelength h line (404.7nm) when calculating, and can calculate process factor k
1be 0.546, this shows: microcobjective numerical aperture NA selected 0.85, the characteristic dimension for 260nm can be differentiated completely.
The constrained parameters of imaging optical system of the present invention are as shown in table 1.
The constrained parameters of table 1 imaging optical system
| Constraint project | Parameter |
| Operating wavelength range | 365.0nm、404.7nm、435.8nm |
| True field radius (CCD photosurface) | 10mm |
| Image-side numerical aperture (measured sample face) | 0.85 |
| Enlargement ratio | 1/50 times |
| Object-image conjugate is apart from (system overall length) | <270mm |
| Image space working distance | >0.5mm |
| RMS wave aberration | < 71m λ (i.e. 28.7nm, according to h line) |
Imaging optical system of the present invention embodiment as shown in Figure 2, with CCD photosurface for object plane 101 is positioned at upside, with sample surface for image planes 202 are positioned at downside, because light path is reversible, according to reverse optical path design, light is propagated from the CCD photosurface 101 of upside to the sample surface 202 of downside.Described imaging optical system along its optical axis direction, comprises the first lens L1 successively from object plane to image planes, second lens L2, 3rd lens L3, until the 18 lens L18 and aperture diaphragm, the first described lens L1 is the meniscus lens having negative power and bend towards image planes 202, the second described lens L2, 6th lens L6, 8th lens L8, 9th lens L9, 11 lens L11, 13 lens L13, 15 lens L15, 17 lens L17 is biconvex positive lens, the 3rd described lens L3, 5th lens L5, 7th lens L7, tenth lens L10, 16 lens L16 is double-concave negative lens, the 4th described lens L4 is the meniscus lens having positive light coke and bend towards object plane 101, the 12 described lens L12 and the 14 lens L14 is the meniscus lens having negative power and bend towards object plane 101, the 18 described lens L18 is the meniscus lens having positive light coke and bend towards image planes 202, described aperture diaphragm is between the 12 lens L12 and the 13 lens L13 (303 position), the all 18 pieces of lens of described imaging optical system all adopt the i line glass of OHARA company high permeability, select the glass material of 6 kinds of trades mark altogether, the 4th wherein said lens L4, 8th lens L8, 9th lens L9, 11 lens L11, 15 lens L15, 17 lens L17 selects SFPL51Y glass material, and the 14 described lens L14 selects PBL25Y glass material, and the 5th described lens L5 selects SFSL5Y glass material, the first described lens L1, 6th lens L6, 7th lens L7, 13 lens L13, 16 lens L16 adopts PBM2Y glass material, the second described lens L2, tenth lens L10, 12 lens L12, 18 lens L18 selects BSM51Y glass material, and the 3rd described lens L3 selects BAL15Y glass material.
Imaging optical system of the present invention comprises 18 pieces of described lens and an aperture diaphragm, wherein the first lens L1 forms the first mirror group G1 to the 4th lens L4, its combined focal length is 200mm, the 5th described lens L5 forms the second mirror group G2 to the 18 lens L18, its combined focal length is 4mm, and the enlargement ratio of the imaging optical system described in ensureing like this is 1/50 times.
According to the constrained parameters of imaging optical system in table 1 above, the design data of imaging optical system of the present invention is as shown in table 2, and table 2 gives the specific design parameter value of each block lens of the imaging optical system of the present embodiment.
The design parameter of table 2 imaging optical system of the present invention
Imaging optical system of the present invention adopts cramped construction design, can calculating object-image conjugate apart from being 260.1mm, having greatly improved with compared with first technology (patent 201210418310.6 conjugate distance is 469.8mm) according to data in table 2.
When under the Parameter Conditions such as operating wavelength range, true field radius, image-side numerical aperture in Table 1, according to the analytical calculation of specialty optics design software CODE_V, its aberration correction degree is as follows:
Fig. 3 shows the modulation transfer function of the imaging optical system of the present embodiment, close to diffraction limit.Fig. 4 is the distribution of the RMS wave aberration of the imaging optical system of the present embodiment, in visual field, RMS wave aberration maximal value is that (RMS wave aberration is 28.913m λ to 11.7nm, 11.7nm is obtained according to h line computation), which reflects the image quality of imaging optical system of the present invention close to improving imaging.Fig. 5 is spherical aberration, astigmatism, the curvature of field, the distortion figure of the imaging optical system of the present embodiment, wherein, the maximal value of relative distortion is 0.01%, corresponds to the distortion of 20nm, with compared with first technology (distortion of patent 201210418310.6 is 90mm), have greatly improved.
Fig. 6 is the object space telecentricity error of the imaging optical system of the present embodiment, and wherein maximal value is 5.15mrad.
Adopt imaging optical system of the present invention, meet completely for visible-microscopical technical requirement of UV detect, image quality is excellent, and reaches as seen actual-microscopical application requirement of UV detect.
Claims (10)
1. one kind for visible-microscopical imaging optical system of UV detect, from object plane to image planes along its optical axis direction comprise successively the first lens, the second lens, the 3rd lens ..., the 12 lens, aperture diaphragm, the 13 lens ..., the 18 lens, it is characterized in that:
The first described lens are the meniscus lens having negative power and bend towards image planes, the second described lens, 6th lens, 8th lens, 9th lens, 11 lens, 13 lens, 15 lens, 17 lens are biconvex positive lens, the 3rd described lens, 5th lens, 7th lens, tenth lens, 16 lens are double-concave negative lens, the 4th described lens are the meniscus lens having positive light coke and bend towards object plane, the 12 described lens and the 14 lens are the meniscus lens having negative power and bend towards object plane, the 18 described lens are the meniscus lens having positive light coke and bend towards image planes,
All 18 pieces of lens all adopt the i line glass of OHARA company high permeability, select the glass material of 6 kinds of trades mark altogether, the 4th described lens, 8th lens, 9th lens, 11 lens, 15 lens, SFPL51Y glass material selected by 17 lens, PBL25Y glass material selected by the 14 described lens, SFSL5Y glass material selected by the 5th described lens, the first described lens, 6th lens, 7th lens, 13 lens, 16 lens adopt PBM2Y glass material, the second described lens, tenth lens, 12 lens, BSM51Y glass material selected by 18 lens, BAL15Y glass material selected by the 3rd described lens.
2. imaging optical system according to claim 1, is characterized in that, the first described lens form the first mirror group to the 4th lens, and its combined focal length is 200mm.
3. imaging optical system according to claim 1, is characterized in that, the 5th described lens form the second mirror group to the 18 lens, and its combined focal length is 4mm.
4. imaging optical system according to claim 1, is characterized in that, the enlargement ratio from object plane to image planes is 1/50.
5. imaging optical system according to claim 1, is characterized in that, image-side numerical aperture is greater than 0.50.
6. imaging optical system according to claim 5, is characterized in that, image-side numerical aperture equals 0.85.
7. imaging optical system according to claim 1, is characterized in that, true field radius is greater than 1.00mm.
8. imaging optical system according to claim 7, is characterized in that, true field radius equals 10.00mm.
9. imaging optical system according to claim 1, is characterized in that, operating wavelength range is i line, h line and g line, i.e. main three spectral lines 365.0nm, 404.7nm, 435.8nm of high-pressure sodium lamp.
10. imaging optical system according to claim 1, is characterized in that, object-image conjugate distance, and namely system overall length is less than 261mm.
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Cited By (2)
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| CN106772976A (en) * | 2017-02-28 | 2017-05-31 | 浙江大学 | A kind of microcobjective and the wide visual field high-resolution imaging system with the microcobjective |
| CN117270185A (en) * | 2023-11-17 | 2023-12-22 | 长春长光智欧科技有限公司 | Micro-optical system with large numerical aperture and wide spectrum |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106772976A (en) * | 2017-02-28 | 2017-05-31 | 浙江大学 | A kind of microcobjective and the wide visual field high-resolution imaging system with the microcobjective |
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| CN106772976B (en) * | 2017-02-28 | 2019-09-20 | 浙江大学 | A kind of microcobjective and wide visual field high-resolution imaging system |
| CN117270185A (en) * | 2023-11-17 | 2023-12-22 | 长春长光智欧科技有限公司 | Micro-optical system with large numerical aperture and wide spectrum |
| CN117270185B (en) * | 2023-11-17 | 2024-02-20 | 长春长光智欧科技有限公司 | Micro-optical system with large numerical aperture and wide spectrum |
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Effective date of registration: 20190925 Address after: Room 601-10, 6th floor, No. 2, Jingyuan Beijie, Beijing Economic and Technological Development Zone, Daxing District, Beijing, 100176 Patentee after: Beijing Guowang Optical Technology Co., Ltd. Address before: 800-211 201800 post office box, Shanghai, Shanghai, Jiading District Patentee before: Shanghai Optical Precision Machinery Inst., Chinese Academy of Sciences |