CN104342733A - Nickel plating method of stainless-steel-base glass sealing element - Google Patents

Nickel plating method of stainless-steel-base glass sealing element Download PDF

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Publication number
CN104342733A
CN104342733A CN201410585557.6A CN201410585557A CN104342733A CN 104342733 A CN104342733 A CN 104342733A CN 201410585557 A CN201410585557 A CN 201410585557A CN 104342733 A CN104342733 A CN 104342733A
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CN
China
Prior art keywords
nickel plating
grams per
per liter
nickel
activation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201410585557.6A
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Chinese (zh)
Inventor
沈涪
郭茂玉
李奎
钱竹平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BENGBU FUYUAN ELECTRONIC TECHNOLOGY Co Ltd
Original Assignee
BENGBU FUYUAN ELECTRONIC TECHNOLOGY Co Ltd
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Publication date
Application filed by BENGBU FUYUAN ELECTRONIC TECHNOLOGY Co Ltd filed Critical BENGBU FUYUAN ELECTRONIC TECHNOLOGY Co Ltd
Priority to CN201410585557.6A priority Critical patent/CN104342733A/en
Publication of CN104342733A publication Critical patent/CN104342733A/en
Pending legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34Pretreatment of metallic surfaces to be electroplated
    • C25D5/36Pretreatment of metallic surfaces to be electroplated of iron or steel
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • C23C18/36Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

The invention relates to a nickel plating method of a stainless-steel-base glass sealing element, which is characterized in that chemical nickel plating activation is used instead of the original nickel electroplating activation step, wherein the chemical nickel plating solution comprises 20-25g/L nickel sulfate, 25-30g/L sodium hypophosphite, 10-15g/L sodium acetate, 7-10g/L acetic acid, 0.002-0.003g/L thiocarbamide and 10-20g/L urea; and the pH value is controlled at 4.5-4.9, the temperature is 87-90 DEG C, and the reaction time is 5-30 minutes. By using the urea as the additive to be coordinated with the nickel ions, the autocatalysis activity of the nickel ions with sodium hypophosphite on the metal surface is enhanced, so that the potential of the plated surface quickly becomes negative, thereby promoting the occurrence of the nickel reduction reaction and ensuring the binding force of the coating. The hydrochloric acid solution is used as the solution for washing and removing scales, thereby avoiding glass corrosion.

Description

A kind of stainless steel substrate glass sealing element nickel plating process
Technical field
The invention belongs to electroplating technology field, relate to a kind of stainless steel substrate glass sealing element nickel plating process.
Background technology
Conventional stainless steel electroplating technology is first electrochemical deoiling and electrochemical degreasing, after descaling, with hydrochloric acid and nickelous chloride flash nickel, stainless steel surface is activated, last re-plating nickel and other coating with the sulphuric acid soln cleaning of fluoride ion.In this technique, the sulphuric acid soln of fluoride ion has certain corrodibility to glass, can destroy glass sealed knot body airtight construction; And electronickelling can cause thickness of coating uneven because distribution of current is uneven, affect quality product.
Summary of the invention
Object of the present invention is exactly solve in common process the solution corrosion that exists and the even problem of uneven coating, provides a kind of stainless steel substrate glass sealing element nickel plating process.
the technical solution used in the present invention is as follows:
A kind of stainless steel substrate glass sealing element nickel plating process, mainly comprise electrochemical deoiling and electrochemical degreasing, pickling descale, the activation of flash nickel, electronickelling and other plating steps, it is characterized in that:
Chemical nickel plating activation is adopted to replace former electronickelling activation, wherein mainly the consisting of of chemical nickel-plating solution: single nickel salt 20 ~ 25 grams per liter, inferior sodium phosphate 25 ~ 30 grams per liter, sodium acetate 10 ~ 15 grams per liter, acetic acid 7 ~ 10 grams per liter, thiocarbamide 0.002 ~ 0.003 grams per liter, urea 10 ~ 20 grams per liter, chemical nickel plating activation control PH4.5. ~ 4.9, temperature is 87 ~ 90 DEG C, and the reaction times is 5 ~ 30 minutes.
On the basis of technique scheme, the present invention can also do following improvement:
Former fluorine-containing pickling descaling step is changed into the hydrochloric acid soln cleaning utilizing the water adding this hydrochloric acid 50% ~ 100% volume in concentration 37% hydrochloric acid to form to descale, control temperature is at 40 ~ 50 DEG C.
The invention has the advantages that: the present invention is using urea as additive and nickel ion coordination, improve the autocatalytic activity of nickel ion in metallic surface and inferior sodium phosphate, the current potential on plated surface can be made to become rapidly negative, facilitate nickel reduction reaction and occur, ensure that binding force of cladding material.Use hydrochloric acid soln as the solution of eccysis oxide skin simultaneously, avoid glass corrosion.
Embodiment
Embodiment 1
Technical process: get stainless steel substrates 10 (model 1Cr18Ni9, size 5mm × 100mm × 0.5mm) and put into 50 DEG C of alkali electroless except oil solution and soak 5min, then electrochemical degreasing (negative electrode oil removing mode, Dk1A/dm in this solution 2) 0.5min, the stainless steel substrates handled well is put into the hydrochloric acid soln that the water that adds this hydrochloric acid 1 times of volume by concentration 37% hydrochloric acid is formed, temperature keeps 45 DEG C to soak 5min, eccysis oxide skin.Then carry out chemical nickel plating, wherein mainly the consisting of of chemical nickel-plating solution: single nickel salt 25 grams per liter, inferior sodium phosphate 25 grams per liter, sodium acetate 12 grams per liter, acetic acid 10 grams per liter, thiocarbamide 0.003 grams per liter, urea 15 grams per liter.The PH adopting salt of wormwood or ammoniacal liquor regulator solution is 4.8, and the temperature keeping solution is 88 DEG C.Stainless steel test piece is dropped at every turn a slice in chemical nickel-plating solution, reaction times 0.5h, taken out by test specimen, deionized water wash, enters subsequent processing after drying up.
Embodiment 2
The processing step of the present embodiment is identical with embodiment 1, unlike, do not add urea in technical process.
Embodiment 3
The processing step of the present embodiment is identical with embodiment 1, unlike, the amount adding urea is 5 grams per liters.
Embodiment 4
The processing step of the present embodiment is identical with embodiment 1, unlike, the amount adding urea is 10 grams per liters.
Embodiment 5
The processing step of the present embodiment is identical with embodiment 1, unlike, the amount adding urea is 20 grams per liters.
Embodiment 6
The processing step of the present embodiment is identical with embodiment 1, unlike, the amount adding urea is 25 grams per liters.
Test piece good for Plating is carried out cripping test around φ 1.6mm axle.Test-results sees the following form:
Test-results table is bent after chemical nickel plating
As known from the above examples, add urea in above-mentioned chemical nickel-plating solution after, the bonding force of stainless steel substrate and coating can be improved, when urea content quality of coating within the scope of 10 ~ 20 grams per liters is best.

Claims (2)

1. a stainless steel substrate glass sealing element nickel plating process, mainly comprise electrochemical deoiling and electrochemical degreasing, pickling descale, electronickelling activation, electronickelling step, it is characterized in that:
Chemical nickel plating activation is adopted to substitute former electronickelling activation step, the solution that wherein chemical nickel plating adopts mainly consists of: single nickel salt 20 ~ 25 grams per liter, inferior sodium phosphate 25 ~ 30 grams per liter, sodium acetate 10 ~ 15 grams per liter, acetic acid 7 ~ 10 grams per liter, thiocarbamide 0.002 ~ 0.003 grams per liter, urea 10 ~ 20 grams per liter, control PH4.5. ~ 4.9, the temperature of chemical nickel plating activation is 87 ~ 90 DEG C, 5 ~ 30 minutes reaction times.
2. a kind of stainless steel substrate glass sealing element nickel plating process according to claim 1, it is characterized in that: pickling descaling step is: utilize concentration 37% hydrochloric acid to add the hydrochloric acid soln eccysis oxide skin of 50% ~ 100% water formation, control temperature is at 40 ~ 50 DEG C.
CN201410585557.6A 2014-10-28 2014-10-28 Nickel plating method of stainless-steel-base glass sealing element Pending CN104342733A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410585557.6A CN104342733A (en) 2014-10-28 2014-10-28 Nickel plating method of stainless-steel-base glass sealing element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410585557.6A CN104342733A (en) 2014-10-28 2014-10-28 Nickel plating method of stainless-steel-base glass sealing element

Publications (1)

Publication Number Publication Date
CN104342733A true CN104342733A (en) 2015-02-11

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Family Applications (1)

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CN201410585557.6A Pending CN104342733A (en) 2014-10-28 2014-10-28 Nickel plating method of stainless-steel-base glass sealing element

Country Status (1)

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CN (1) CN104342733A (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60228678A (en) * 1984-04-26 1985-11-13 Agency Of Ind Science & Technol Formation of metallic film on surface of high molecular material
CN1182808A (en) * 1996-11-20 1998-05-27 山东矿业学院 Acidic chemical plating nickel solution and plating method
US20050031788A1 (en) * 2003-07-02 2005-02-10 Rohm And Haas Electronic Materials, L.L.C. Metallization of ceramics
CN1818141A (en) * 2006-03-31 2006-08-16 北京航空航天大学 Method for coating Ni-P layer in same liquid by chemically plating and electrobath
CN101348905A (en) * 2008-09-04 2009-01-21 南昌航空大学 Middle-temperature acidic electroless nickel plating-phosphor alloy formula
CN102953054A (en) * 2012-11-19 2013-03-06 鲁东大学 Chemical nickel-phosphorus alloy plating solution

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60228678A (en) * 1984-04-26 1985-11-13 Agency Of Ind Science & Technol Formation of metallic film on surface of high molecular material
CN1182808A (en) * 1996-11-20 1998-05-27 山东矿业学院 Acidic chemical plating nickel solution and plating method
US20050031788A1 (en) * 2003-07-02 2005-02-10 Rohm And Haas Electronic Materials, L.L.C. Metallization of ceramics
CN1818141A (en) * 2006-03-31 2006-08-16 北京航空航天大学 Method for coating Ni-P layer in same liquid by chemically plating and electrobath
CN101348905A (en) * 2008-09-04 2009-01-21 南昌航空大学 Middle-temperature acidic electroless nickel plating-phosphor alloy formula
CN102953054A (en) * 2012-11-19 2013-03-06 鲁东大学 Chemical nickel-phosphorus alloy plating solution

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
张允诚: "《电镀手册》", 31 January 2007, 国防工业出版社 *

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Application publication date: 20150211