CN104091756A - Nozzle device of washing machine - Google Patents
Nozzle device of washing machine Download PDFInfo
- Publication number
- CN104091756A CN104091756A CN201410340168.7A CN201410340168A CN104091756A CN 104091756 A CN104091756 A CN 104091756A CN 201410340168 A CN201410340168 A CN 201410340168A CN 104091756 A CN104091756 A CN 104091756A
- Authority
- CN
- China
- Prior art keywords
- tube body
- deionized water
- flowtube
- minute
- branch gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
Abstract
A nozzle device of a washing machine comprises an N2 flow tube, a deionized water dropper and an N2 nozzle. The N2 flow tube is designed in the shape of an inverted T, and a main gas inlet tube body of the N2 flow tube is communicated with a first branch gas tube body and a second branch gas tube body which are arranged on the two sides of the main gas inlet tube body respectively. The deionized water dropper is arranged at the end of the first branch gas tube body of the N2 flow tube. The N2 nozzle is arranged at the end of the second branch gas tube body of the N2 flow tube. According to the nozzle device, the N2 flow tube which is designed in the shape of the inverted T is arranged, the first branch gas tube body and the second branch gas tube body which are communicated with each other are arranged on the two sides of the main gas inlet tube body of the N2 flow tube respectively, the deionized water dropper is arranged at the end of the first branch gas tube body of the N2 flow tube, the N2 nozzle is arranged at the end of the second branch gas tube body of the N2 flow tube, the flow rate of water at the junction of deionized water and a silicon chip to be washed can be increased, particle defect removal capacity can be enhanced, meanwhile, damage of aspect-ratio and fragile figures can be avoided, and a washing window is additionally arranged.
Description
Technical field
The present invention relates to technical field of semiconductors, relate in particular to a kind of ejecting device of washer board.
Background technology
Along with integrated circuit technique node is more and more less, technique is also more and more harsh to the requirement of grain defect (Particle).At 65nm, with lower node, undersized grain defect (<0.5 μ m) becomes the one of the main reasons that hinders the raising of chip yield.Simultaneously, traditional slot type cleans, reduction along with technology node size, in order to reduce the etching of acid solution to relevant film, dilutionization more and more, this has just greatly lowered acid solution and has utilized chemical action to remove the ability of particle size, makes to want merely slot type to clean and can not meet the requirement of advanced process to grain defect.
Its good degranulation defect ability of washer board has effectively met the demand of advanced process, makes it often with slot type, clean together and use.Existing washer board cleans chip surface by physical action, and concrete principle is to be blown into N at shower nozzle mouth
2, N
2can make the sub-water of degranulation of shower nozzle mouth form drop, arrive chip surface.Increase N
2flow, has increased drop and has arrived the speed of chip surface, thereby improved the ability of the degranulation defect of washer board.But described washer board, when removing depth-width ratio or fragile figure, increases N
2flow, drop is at a high speed easy to damage figure, and for example cleaning after etching polysilicon, can cause the fracture of polycrystalline line, causes yield of devices loss; Reduce N
2flow, cleansing power is not enough.
Therefore the problem existing for prior art, this case designer relies on the industry experience for many years of being engaged in, and active research improvement, so there has been the ejecting device of a kind of washer board of the present invention.
Summary of the invention
The present invention be directed in prior art, traditional washer board, when removing depth-width ratio or fragile figure, increases N
2flow, drop is at a high speed easy to damage figure, causes yield of devices loss; Reduce N
2flow, the defect such as cleansing power deficiency provides a kind of ejecting device of washer board.
In order to address the above problem, the invention provides a kind of ejecting device of washer board, the ejecting device of described washer board, comprising: N
2flowtube, is
type design, and described N
2the main air inlet pipe of flowtube is communicated with setting with the first minute bronchus and the second minute bronchus that are separately positioned on described main air inlet pipe both sides; Deionized water water dropper, is arranged on described N
2first minute bronchial end of flowtube, and with vertical setting of silicon chip to be cleaned; N
2shower nozzle, is arranged on described N
2second minute bronchial end of flowtube, and with vertical setting of described silicon chip to be cleaned.
Alternatively, described deionized water water dropper and described N
2shower nozzle interval arranges, and described spacing distance L > 5cm.
In sum, the injection apparatus of washer board of the present invention is by setting
the N of type design
2flowtube, and at described N
2the main air inlet pipe both sides of flowtube arrange respectively first minute bronchus and the second minute bronchus being interconnected, at described N
2first minute bronchial end of flowtube arranges deionized water water dropper, at described N
2second minute bronchial end of flowtube arranges N
2shower nozzle, not only can improve the flow velocity of deionized water and silicon chip surface intersection water to be cleaned, strengthens degranulation defect ability, has avoided the damage of depth-width ratio and fragile figure simultaneously, has increased clean window.
Accompanying drawing explanation
Figure 1 shows that the structural representation of the ejecting device of washer board of the present invention.
Embodiment
By describe in detail the invention technology contents, structural feature, reached object and effect, below in conjunction with embodiment and coordinate accompanying drawing to be described in detail.
Refer to Fig. 1, Figure 1 shows that the structural representation of the ejecting device of washer board of the present invention.In the present invention, the ejecting device 1 of described washer board cleans the ability of depth-width ratio and fragile figure for improving described washer board.The ejecting device 1 of described washer board, comprising: N
2flowtube 11, described N
2flowtube 11 is
type design, and described N
2the main air inlet pipe 111 of flowtube 11 is communicated with setting with the first minute bronchus 112 and the second minute bronchus 113 that are separately positioned on described main air inlet pipe 111 both sides; Deionized water water dropper 12, described deionized water water dropper 12 is arranged on described N
2the end of first minute bronchus 112 of flowtube 11, and with the vertical setting of silicon chip 2 to be cleaned; N
2shower nozzle 13, described N
2shower nozzle 13 is arranged on described N
2the end of second minute bronchus 113 of flowtube 11, and with the vertical setting of described silicon chip to be cleaned 2.
In order to disclose more intuitively the present invention's technical scheme, highlight the present invention's beneficial effect, now in conjunction with concrete execution mode, set forth.In order better to implement the present invention's technical scheme, as execution mode particularly, preferably, described deionized water water dropper 12 and described N
2shower nozzle 13 intervals arrange, and described spacing distance L > 5cm.
Please continue to refer to Fig. 1, in the cleaning process of silicon chip 2, work as N
2by the N of described ejecting device 1
2the main air inlet pipe 111 of flowtube 11 enters, just to the first minute bronchus 112 and bronchus 113 shuntings in second minute that are positioned at described main air inlet pipe 111 both sides.Wherein, by described main air inlet pipe 111 shuntings, entered the N of described first minute bronchus 112
2deionized water 3 is carried out to current-carrying, to be ejected on silicon chip to be cleaned 2; By described main air inlet pipe 111 shuntings, entered the N of described second minute bronchus 113
2be ejected on described silicon chip to be cleaned 2, and the flow velocity that is injected in the deionized water 3 on described silicon chip 2 is increased, improve degranulation defect ability.
As those skilled in the art, hold intelligibly, the more existing washer board of the injection apparatus 1 of washer board of the present invention, at identical N
2under flow, the injection apparatus 1 of washer board of the present invention can effectively improve the flow velocity of deionized water 3 and the surperficial intersection water of silicon chip 2 to be cleaned, strengthens degranulation defect ability, has avoided the damage of depth-width ratio and fragile figure simultaneously, has increased clean window.
In sum, the injection apparatus of washer board of the present invention is by setting
the N of type design
2flowtube, and at described N
2the main air inlet pipe both sides of flowtube arrange respectively first minute bronchus and the second minute bronchus being interconnected, at described N
2first minute bronchial end of flowtube arranges deionized water water dropper, at described N
2second minute bronchial end of flowtube arranges N
2shower nozzle, not only can improve the flow velocity of deionized water and silicon chip surface intersection water to be cleaned, strengthens degranulation defect ability, has avoided the damage of depth-width ratio and fragile figure simultaneously, has increased clean window.
Those skilled in the art all should be appreciated that, in the situation that not departing from the spirit or scope of the present invention, can carry out various modifications and variations to the present invention.Thereby, if when any modification or modification fall in the protection range of appended claims and equivalent, think that the present invention contains these modifications and modification.
Claims (2)
1. an ejecting device for washer board, is characterized in that, the ejecting device of described washer board, comprising:
N
2flowtube, is
type design, and described N
2the main air inlet pipe of flowtube is communicated with setting with the first minute bronchus and the second minute bronchus that are separately positioned on described main air inlet pipe both sides;
Deionized water water dropper, is arranged on described N
2first minute bronchial end of flowtube, and with vertical setting of silicon chip to be cleaned;
N
2shower nozzle, is arranged on described N
2second minute bronchial end of flowtube, and with vertical setting of described silicon chip to be cleaned.
2. the ejecting device of washer board as claimed in claim 1, is characterized in that, described deionized water water dropper and described N
2shower nozzle interval arranges, and described spacing distance L > 5cm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410340168.7A CN104091756A (en) | 2014-07-17 | 2014-07-17 | Nozzle device of washing machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410340168.7A CN104091756A (en) | 2014-07-17 | 2014-07-17 | Nozzle device of washing machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104091756A true CN104091756A (en) | 2014-10-08 |
Family
ID=51639462
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410340168.7A Pending CN104091756A (en) | 2014-07-17 | 2014-07-17 | Nozzle device of washing machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104091756A (en) |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01207923A (en) * | 1988-02-16 | 1989-08-21 | Toshiba Ceramics Co Ltd | Venturi tube type silicon source vaporization device |
| CN1184715A (en) * | 1996-12-02 | 1998-06-17 | 三菱电机株式会社 | Double fluid nozzle for cleaning, and device and method for cleaning therewith |
| JPH11319743A (en) * | 1998-05-08 | 1999-11-24 | Kurita Water Ind Ltd | Feed piping for gas dissolved washing-water |
| US20020064961A1 (en) * | 2000-06-26 | 2002-05-30 | Applied Materials, Inc. | Method and apparatus for dissolving a gas into a liquid for single wet wafer processing |
| US20040206452A1 (en) * | 2000-09-22 | 2004-10-21 | Dainippon Screen Mfg. Co., Ltd. | Substrate processing apparatus |
| WO2005104200A1 (en) * | 2004-04-23 | 2005-11-03 | Tokyo Electron Limited | Substrate cleaning method, substrate cleaning equipment, computer program and program recording medium |
| CN1965395A (en) * | 2004-04-06 | 2007-05-16 | 东京毅力科创株式会社 | Board cleaning apparatus, board cleaning method, and medium with recorded program to be used for the method |
| US20110061684A1 (en) * | 2009-09-09 | 2011-03-17 | Hiroshi Tomita | Cleaning method for semiconductor wafer |
| CN103008299A (en) * | 2012-11-30 | 2013-04-03 | 北京七星华创电子股份有限公司 | Gas-liquid two-phase spray cleaning device and cleaning method |
| CN203631506U (en) * | 2013-12-09 | 2014-06-04 | 中芯国际集成电路制造(北京)有限公司 | Cleaning device used for cleaning wafer |
-
2014
- 2014-07-17 CN CN201410340168.7A patent/CN104091756A/en active Pending
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01207923A (en) * | 1988-02-16 | 1989-08-21 | Toshiba Ceramics Co Ltd | Venturi tube type silicon source vaporization device |
| CN1184715A (en) * | 1996-12-02 | 1998-06-17 | 三菱电机株式会社 | Double fluid nozzle for cleaning, and device and method for cleaning therewith |
| JPH11319743A (en) * | 1998-05-08 | 1999-11-24 | Kurita Water Ind Ltd | Feed piping for gas dissolved washing-water |
| US20020064961A1 (en) * | 2000-06-26 | 2002-05-30 | Applied Materials, Inc. | Method and apparatus for dissolving a gas into a liquid for single wet wafer processing |
| US20040206452A1 (en) * | 2000-09-22 | 2004-10-21 | Dainippon Screen Mfg. Co., Ltd. | Substrate processing apparatus |
| CN1965395A (en) * | 2004-04-06 | 2007-05-16 | 东京毅力科创株式会社 | Board cleaning apparatus, board cleaning method, and medium with recorded program to be used for the method |
| WO2005104200A1 (en) * | 2004-04-23 | 2005-11-03 | Tokyo Electron Limited | Substrate cleaning method, substrate cleaning equipment, computer program and program recording medium |
| US20110061684A1 (en) * | 2009-09-09 | 2011-03-17 | Hiroshi Tomita | Cleaning method for semiconductor wafer |
| CN103008299A (en) * | 2012-11-30 | 2013-04-03 | 北京七星华创电子股份有限公司 | Gas-liquid two-phase spray cleaning device and cleaning method |
| CN203631506U (en) * | 2013-12-09 | 2014-06-04 | 中芯国际集成电路制造(北京)有限公司 | Cleaning device used for cleaning wafer |
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|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20141008 |