CN104001704A - Multi-station rotary support special for rotary washing device - Google Patents

Multi-station rotary support special for rotary washing device Download PDF

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Publication number
CN104001704A
CN104001704A CN201410210657.0A CN201410210657A CN104001704A CN 104001704 A CN104001704 A CN 104001704A CN 201410210657 A CN201410210657 A CN 201410210657A CN 104001704 A CN104001704 A CN 104001704A
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CN
China
Prior art keywords
pole
station
pivoted frame
hub disk
shroud
Prior art date
Application number
CN201410210657.0A
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Chinese (zh)
Other versions
CN104001704B (en
Inventor
关宏武
舒福璋
姚立新
段成龙
冯小强
Original Assignee
中国电子科技集团公司第四十五研究所
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Publication date
Application filed by 中国电子科技集团公司第四十五研究所 filed Critical 中国电子科技集团公司第四十五研究所
Priority to CN201410210657.0A priority Critical patent/CN104001704B/en
Publication of CN104001704A publication Critical patent/CN104001704A/en
Application granted granted Critical
Publication of CN104001704B publication Critical patent/CN104001704B/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • B08B3/022Cleaning travelling work

Abstract

The invention relates to a multi-station rotary support special for a rotary washing device. The multi-station rotary support comprises a front disc and a back disc, three station structures for containing chip boxes are formed between the front disc and the back disc by welding three sets of inner and outer left supporting rods, inner and outer right supporting rods and pressing rods. The pressing rods are sleeved with damping sleeves in a connected mode to be used for limiting movement of chips under the centrifugal force effect. The position, below the damping sleeves, of the inner side of the back disc is provided with small cushion blocks in a welding mode for limiting the positions of the chip boxes, and the position, at the position of a center hole, of the outer side of the back disc is provided with a hollow driven shaft and a transmission key in a welded mode to be used for being connected with a motor output shaft. The station structures are circumferentially and evenly distributed around the center of the rotary support, the problem that the chip washing effect is influenced by microparticles generated when the dynamic equilibrium value is high is solved, and the chip washing quality is remarkably improved. The multi-station rotary support is driven by a motor to be capable of simultaneously carrying the chips in the three chip boxes to conduct rotary washing, the chips are far away from the rotating center of the multi-station rotary support special for the rotary washing device, spin-drying is easily carried out in one work procedure, the production efficiency is greatly improved, and the production cost is reduced.

Description

Spin rinse device-specific multistation pivoted frame

Technical field

The present invention relates to a kind of wafer flushing device, particularly relate to a kind of spin rinse device-specific multistation pivoted frame.

Background technology

In IC and related industry, spin rinse equipment is the indispensable frock of the purifying processing of wafer, the pivoted frame of spin rinse equipment especially wafer rinse the important device in frock.In production, wafer is placed in wafer case, and wafer case is arranged on the pivoted frame of spin rinse equipment, and the rotation of driven by motor pivoted frame is rinsed the wafer in wafer case.The placement body that is only provided with a wafer case on the pivoted frame of tradition spin rinse equipment, this placement body can only be with and carry a wafer case and a small amount of wafer is rinsed.There is following defect in traditional pivoted frame that is only provided with a wafer case storing body: the quantity of 1, placing because of wafer on pivoted frame is few, wafer cleaning inefficiency; 2, wafer case is arranged on the center of pivoted frame, and wafer is because drying weak effect near pivot; 3, wafer case is taking pivoted frame pivot as pivot, wafer case and its horizontal section of placement body of laying wafer case are irregular shape surfaces, some system points are near apart from rotary middle point, and some system points are far away apart from rotary middle point, and in pivoted frame rotary course, dynamic balancing value is high.The lower microparticle producing of dynamic balancing vibration can affect wafer cleaning effect, causes wafer cleanliness factor to decline, and product qualified rate reduces.

Summary of the invention

The placement body that the object of the invention is to provide a kind of wafer case is many, the quantity of a clean wafers is many, and cleaning efficiency is high, dries effective to wafer, dynamic balancing value is low, the spin rinse device-specific multistation pivoted frame that purifying finished wafer qualification rate after treatment is high.

The object of the invention is to realize.Spin rinse device-specific multistation pivoted frame of the present invention is characterised in that: described spin rinse device-specific multistation pivoted frame comprises a shroud and a hub disk, between described shroud and hub disk, be provided with three stations of placing wafer case, the outer surface of described shroud is provided with three wafer case and imports and exports, a described wafer case is imported and exported with a station and is formed one group of station structure, the axial line of described three groups of station structures all equates with axis of rotation line parallel and the distance of spin rinse device-specific multistation pivoted frame, described three groups of station structures in spin rinse device-specific multistation pivoted frame alternate 120 ° uniform.

Spin rinse device-specific multistation pivoted frame of the present invention, in wherein said every group of station structure, all including is the left outer pole of, the right pole in outside, inner side left branching rod, the right pole in inner side, depression bar, damping sleeve pipe and two small cushion blocks, described shroud and hub disk are by three groups of left outer poles, the right pole in outside, inner side left branching rod and the right pole in inner side are integrally welded by locating hole separately on shroud and hub disk respectively, a damping sleeve pipe of described depression bar interference fits ground socket, the rear end of described depression bar is welded on hub disk by locating hole, front end is fitted and connected on the locating slot of shroud by damping sleeve pipe, described integrally welded shroud, the left outer pole of hub disk and same group, the right pole in outside, inner side left branching rod, the right pole in inner side, depression bar and damping sleeve pipe and wafer case are imported and exported the placement body that forms a wafer case, small cushion block is all welded in described hub disk inner side below described each damping sleeve pipe, the center of described shroud and hub disk is respectively provided with a centre bore, a hollow driven shaft is welded in the outside of described hub disk on centre bore, and described hollow driven shaft jointly welds a driving key with hub disk on outside.

Spin rinse device-specific multistation pivoted frame of the present invention, the radially section of wherein said left outer pole, the right pole in outside, inner side left branching rod, the right pole in inner side is all L-shaped, and the L shaped right angle place of the L-shaped right pole in left outer pole, outside of described radially section, inner side left branching rod, the right pole in inner side all has some water dumpings hole.

Spin rinse device-specific multistation pivoted frame of the present invention, the end face of wherein said small cushion block and the medial surface of wafer case are fitted and connected, the outer surface of described damping sleeve pipe rotation dynamically the wafer peak restraint in lower and wafer case be fitted and connected.

Spin rinse device-specific multistation pivoted frame of the present invention, wafer case import and export shape and wafer case end surface shape on wherein said shroud are basic identical.

Spin rinse device-specific multistation pivoted frame of the present invention, on wherein said hollow driven shaft, be socketed motor output shaft, the keyway arranging on described motor output shaft is inlayed and is connected with described driving key, and the hollow driven shaft of described hub disk is threaded with described motor output shaft 14 by penetrating its hollow connecting bolt.

Spin rinse device-specific multistation pivoted frame difference from prior art of the present invention is that spin rinse device-specific multistation pivoted frame of the present invention forms three station structures of placing wafer case by three groups of right poles of medial and lateral left branching rod and medial and lateral and depression bar welding between forward and backward dish.Depression bar outer cover is connected to shock-absorbing sleeve pipe for limiting the movement of wafer under centrifugal action.The position of a small cushion block for restraint wafer case welded in hub disk inner side below each damping sleeve pipe.Hub disk outside is used for being connected with motor output shaft at central hole welded hollow driven shaft and driving key.Station structure is circumference uniform distribution around spin rinse device-specific multistation pivoted frame pivot and arranges, this structure makes to drive the spin rinse device-specific multistation pivoted frame dynamic balancing value that wafer case is rotated to decline, thereby solve traditional pivoted frame under High Rotation Speed and driven the insoluble dynamic equilibrium problems of wafer case, weaken dynamic balancing and occurred the impact of microparticle on wafer cleaning effect, the cleaning quality of wafer is significantly improved.The hollow driven shaft of spin rinse device-specific multistation pivoted frame is fixed by connecting bolt and motor output shaft by specific purpose tool, can be simultaneously with carrying three wafer case and the wafer in wafer case being rotated to cleaning.Wafer in station, all away from the pivot of spin rinse device-specific multistation pivoted frame, is easy to be dried at one in-process, has greatly improved production efficiency, has reduced production cost.

Below in conjunction with accompanying drawing, spin rinse device-specific multistation pivoted frame of the present invention is described further.

Brief description of the drawings

Fig. 1 is spin rinse device-specific multistation turret shaft side view.

Fig. 2 is spin rinse device-specific multistation pivoted frame Facad structure figure.

Fig. 3 is depression bar and the damping sleeve pipe installation diagram of spin rinse device-specific multistation pivoted frame.

Fig. 4 is driven shaft, motor output shaft, connecting bolt and the spin rinse device-specific multistation pivoted frame installation diagram on hub disk.

Fig. 5 is that analyse and observe and setting angle schematic diagram spin rinse device-specific multistation pivoted frame side.

Fig. 6 is driven shaft, motor output shaft, connecting bolt and the specific purpose tool assembly relation partial enlarged drawing on hub disk.

Fig. 7 is shroud and depression bar and damping sleeve pipe assembly relation part partial enlarged drawing.

Fig. 8 is spin rinse device-specific multistation pivoted frame 3 D stereo cutaway view.

Detailed description of the invention

As shown in Figure 1 and Figure 2, spin rinse device-specific multistation pivoted frame of the present invention comprises a shroud 1 and a hub disk 8, is provided with three stations of placing wafer case 12 between shroud 1 and hub disk 8.The outer surface of shroud 1 is provided with three wafer case and imports and exports.A wafer case is imported and exported with a station and is formed one group of station structure.The axial line of three groups of station structures all equates with axis of rotation line parallel and the distance of spin rinse device-specific multistation pivoted frame.Three groups of station structures in spin rinse device-specific multistation pivoted frame alternate 120 ° uniform.

As shown in Figure 1, Figure 2, shown in Fig. 3, Fig. 4, Fig. 5, Fig. 7, in every group of station structure, all including is the right pole 5 in left outer pole 3, outside, inner side left branching rod 2, the right pole 6 in inner side, depression bar 4, damping sleeve pipe 9 and two small cushion blocks 7 of.Shroud 1 and hub disk 8 are integrally welded by locating hole separately on shroud 1 and hub disk 8 respectively by three groups of left outer poles 3, the right pole 5 in outside, the right pole 6 of inner side left branching rod 2 and inner side.A damping sleeve pipe 9 of depression bar 4 interference fits ground sockets, the rear end of depression bar 4 is welded on hub disk 8 by locating hole, and front end is fitted and connected on the locating slot of shroud 1 by damping sleeve pipe 9.Integrally welded shroud 1, hub disk 8 and the right pole 5 in left outer pole 3, outside, inner side left branching rod 2, the right pole 6 in inner side, depression bar 4 and the damping sleeve pipe 9 of same group and the placement body of a wafer case 12 of wafer case import and export formation.Hub disk 8 inner sides are all welded with two small cushion blocks 7 below each damping sleeve pipe 9.

As shown in Fig. 1, Fig. 4, Fig. 5, Fig. 6, Fig. 8, the center of shroud 1 and hub disk 8 is respectively provided with a centre bore.A hollow driven shaft 11 is welded in the outside of hub disk 8 on centre bore.Hollow driven shaft 11 jointly welds a driving key 10 with hub disk 8 on outside.On hollow driven shaft 11, be socketed motor output shaft 14.The keyway arranging on motor output shaft 14 is inlayed and is connected with driving key 10.In hollow driven shaft 11, through a connecting bolt 15, use specific purpose tool 16, by connecting bolt 15, hub disk 8 and motor output shaft 14 are threaded togather and are rotated by driven by motor spin rinse device-specific multistation pivoted frame.

As shown in Fig. 1, Fig. 5, Fig. 6, Fig. 8, the radially section of left outer pole 3, the right pole 5 in outside, inner side left branching rod 2, the right pole 6 in inner side is all L-shaped.Radially the L shaped right angle place of the L-shaped right pole 5 in left outer pole 3, outside of section, inner side left branching rod 2, the right pole 6 in inner side all has some water dumpings hole.

As shown in Figure 5, Figure 8, the medial surface of the wafer case 12 under the end face of two small cushion blocks 7 and partical gravity effect is fitted and connected.The outer surface of damping sleeve pipe 9 rotation dynamically the wafer 13 peak restraints in lower and wafer case 12 be fitted and connected.

As shown in Figure 1, the import and export of the wafer case on shroud 1 shape is identical with wafer case 12 end surface shape.

Use spin rinse device-specific multistation pivoted frame of the present invention, first wafer 13 is packed into three wafer case 12, more respectively wafer case 12 is put into the placement body (referring to Figure of description 1) that spin rinse device-specific multistation pivoted frame is made up of left outer pole 3, the right pole 5 in outside, inner side left branching rod 2, the right pole 6 in inner side, depression bar 4 and damping sleeve pipe 9.Wafer case 12 afterbodys are contacted with small cushion block 7 and make whole wafer case 12 upper and lower, left and right respectively with left outer pole 3, the right pole 5 in outside, inner side left branching rod 2, that the right pole 6 in inner side contacts is firm.In the present invention, because motor output shaft 14 used and horizontal plane upwards become 10 degree angles, the spin rinse device-specific multistation pivoted frame being connected with motor also upwards becomes 10 degree angles (referring to accompanying drawing 5) with horizontal plane, so wafer case 12 produces the component below left under gravity G effect, this component makes wafer case 12 contact with small cushion block 7, and wafer case 12 can not produce fore-and-aft direction and moves in rotary course.Wafer 13 is located by wafer case 12 and damping sleeve pipe 9, guarantee wafer 13 in rotary course all the time in wafer case 12.Wafer 13 and wafer case 12 enter operation flow process after loading.

Above-described embodiment is described the preferred embodiment of the present invention; not scope of the present invention is limited; design under the prerequisite of spirit not departing from the present invention; various distortion and improvement that those of ordinary skill in the art make technical scheme of the present invention, all should fall in the definite protection domain of the claims in the present invention book.

Claims (6)

1. a spin rinse device-specific multistation pivoted frame, it is characterized in that: described spin rinse device-specific multistation pivoted frame comprises a shroud (1) and a hub disk (8), between described shroud (1) and hub disk (8), be provided with three stations of placing wafer case (12), the outer surface of described shroud (1) is provided with three wafer case and imports and exports, a described wafer case is imported and exported with a station and is formed one group of station structure, the axial line of described three groups of station structures all equates with axis of rotation line parallel and the distance of spin rinse device-specific multistation pivoted frame, described three groups of station structures in spin rinse device-specific multistation pivoted frame alternate 120 ° uniform.
2. the flushing device Special multi-station pivoted frame that turns according to claim 1, it is characterized in that: in described every group of station structure, all including is the left outer pole (3) of, the right pole in outside (5), inner side left branching rod (2), the right pole in inner side (6), depression bar (4), damping sleeve pipe (9) and two small cushion blocks (7), described shroud (1) and hub disk (8) are by three groups of left outer poles (3), the right pole in outside (5), it is integrally welded that inner side left branching rod (2) and the right pole in inner side (6) are passed through respectively on shroud (1) and hub disk (8) locating hole separately, described depression bar (4) interference fits ground damping sleeve pipe of socket (9), the rear end of described depression bar (4) is welded on hub disk (8) by locating hole, front end is fitted and connected on the locating slot of shroud (1) by damping sleeve pipe (9), described integrally welded shroud (1), the left outer pole (3) of hub disk (8) and same group, the right pole in outside (5), inner side left branching rod (2), the right pole in inner side (6), depression bar (4) and damping sleeve pipe (9) and wafer case are imported and exported the placement body that forms a wafer case (12), small cushion block (7) is all welded in described hub disk (8) inner side below described each damping sleeve pipe (9), the center of described shroud (1) and hub disk (8) is respectively provided with a centre bore, a hollow driven shaft (11) is welded in the outside of described hub disk (8) on centre bore, described hollow driven shaft (11) jointly welds a driving key (10) with hub disk (8) on outside.
3. spin rinse device-specific multistation pivoted frame according to claim 1 and 2, it is characterized in that: the radially section of described left outer pole (3), the right pole in outside (5), inner side left branching rod (2), the right pole in inner side (6) is all L-shaped, the L-shaped left outer pole (3) of described radially section, the right pole in outside (5), inner side left branching rod (2), the right angle place that the right pole in inner side (6) is L shaped all have some water dumpings hole.
4. spin rinse device-specific multistation pivoted frame according to claim 1 and 2, it is characterized in that: the medial surface of the end face of described small cushion block (7) and wafer case (12) is fitted and connected, the outer surface of described damping sleeve pipe (9) rotation dynamically wafer (13) the peak restraint in lower and wafer case (12) be fitted and connected.
5. spin rinse device-specific multistation pivoted frame according to claim 1, is characterized in that: wafer case import and export shape and wafer case (12) end surface shape on described shroud (1) are basic identical.
6. spin rinse device-specific multistation pivoted frame according to claim 1 and 2, it is characterized in that: described hollow driven shaft (11) upper socket motor output shaft (14), the upper keyway arranging of described motor output shaft (14) is inlayed and is connected with described driving key (10), and the hollow driven shaft (11) of described hub disk (8) is threaded with described motor output shaft (14) by penetrating its hollow connecting bolt (15).
CN201410210657.0A 2014-05-19 2014-05-19 Spin rinse device-specific multistation pivoted frame CN104001704B (en)

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Application Number Priority Date Filing Date Title
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CN104001704B CN104001704B (en) 2016-08-17

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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105036039A (en) * 2015-07-24 2015-11-11 镇江市顶智微电子科技有限公司 System for rinsing, screening, conveying, feeding and filling pharmaceutical chemical biological reagent bottles and conveying bottle covers
CN105129703A (en) * 2015-07-24 2015-12-09 镇江市顶智微电子科技有限公司 Washing, screening, conveying, filling, cap screwing and labelling system for medical chemical biological reagent bottles
CN105129698A (en) * 2015-07-17 2015-12-09 镇江市顶智微电子科技有限公司 Washing and screening system for medical and biochemical reagent bottles
CN105129701A (en) * 2015-07-17 2015-12-09 镇江市顶智微电子科技有限公司 Washing system for medical and biochemical reagent bottles
CN105129702A (en) * 2015-07-24 2015-12-09 镇江市顶智微电子科技有限公司 Washing, screening, conveying, filling and cap screwing method for medical chemical biological reagent bottles
CN105129699A (en) * 2015-07-17 2015-12-09 镇江市顶智微电子科技有限公司 Washing, screening and conveying system for medical and biochemical reagent bottles
CN105129704A (en) * 2015-07-24 2015-12-09 镇江市顶智微电子科技有限公司 Washing, screening, conveying, cap conveying and filling system for medical chemical biological reagent bottles
CN105312287A (en) * 2015-11-27 2016-02-10 重庆大江工业有限责任公司 Shift tooling for cleaning of hydraulic oil pipe of vehicle
CN106024674A (en) * 2016-05-11 2016-10-12 中国电子科技集团公司第四十五研究所 Multi-station rotating stand device for washing and drying equipment and method for cleaning wafer
TWI688438B (en) * 2016-07-27 2020-03-21 大陸商上海新昇半導體科技有限公司 Cassette cleaning apparatus

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CN202042466U (en) * 2011-05-20 2011-11-16 国电宁夏太阳能有限公司 Rotating basket for cleaning polycrystalline silicon block
JP2012089661A (en) * 2010-10-19 2012-05-10 Micro Engineering Inc Substrate processing device and substrate processing method

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Publication number Priority date Publication date Assignee Title
WO2002004136A1 (en) * 2000-07-07 2002-01-17 Semitool, Inc. Dual cassette centrifugal processor
CN2489463Y (en) * 2001-06-25 2002-05-01 吴湘涵 Cleaning device for sheeting electronic element
CN2543617Y (en) * 2002-05-10 2003-04-09 吴永清 Adjustable positioning device for cleaning-machine
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Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105129698A (en) * 2015-07-17 2015-12-09 镇江市顶智微电子科技有限公司 Washing and screening system for medical and biochemical reagent bottles
CN105129701A (en) * 2015-07-17 2015-12-09 镇江市顶智微电子科技有限公司 Washing system for medical and biochemical reagent bottles
CN105129699A (en) * 2015-07-17 2015-12-09 镇江市顶智微电子科技有限公司 Washing, screening and conveying system for medical and biochemical reagent bottles
CN105036039A (en) * 2015-07-24 2015-11-11 镇江市顶智微电子科技有限公司 System for rinsing, screening, conveying, feeding and filling pharmaceutical chemical biological reagent bottles and conveying bottle covers
CN105129703A (en) * 2015-07-24 2015-12-09 镇江市顶智微电子科技有限公司 Washing, screening, conveying, filling, cap screwing and labelling system for medical chemical biological reagent bottles
CN105129702A (en) * 2015-07-24 2015-12-09 镇江市顶智微电子科技有限公司 Washing, screening, conveying, filling and cap screwing method for medical chemical biological reagent bottles
CN105129704A (en) * 2015-07-24 2015-12-09 镇江市顶智微电子科技有限公司 Washing, screening, conveying, cap conveying and filling system for medical chemical biological reagent bottles
CN105312287A (en) * 2015-11-27 2016-02-10 重庆大江工业有限责任公司 Shift tooling for cleaning of hydraulic oil pipe of vehicle
CN106024674A (en) * 2016-05-11 2016-10-12 中国电子科技集团公司第四十五研究所 Multi-station rotating stand device for washing and drying equipment and method for cleaning wafer
CN106024674B (en) * 2016-05-11 2019-02-22 中国电子科技集团公司第四十五研究所 A method of it rinsing the dedicated multistation rotary frame device of drying equipment and cleans chip
TWI688438B (en) * 2016-07-27 2020-03-21 大陸商上海新昇半導體科技有限公司 Cassette cleaning apparatus

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