CN103894354B - Substrate cleaner - Google Patents

Abstract

The invention relates to a substrate cleaning device, in particular to a substrate cleaning device in a semiconductor process. The cleaning device includes a cleaning brush and a brush holder. The brush holder is in the shape of a cuboid and arranged perpendicular to the conveying direction of the substrate. The cleaning brush is arranged on a side of the brush holder opposite to the substrate. The substrate cleaning device of the present invention effectively increases the contact area between the cleaning brush and the substrate, enhances the cleaning effect, thereby reduces the consumption of cleaning agent and saves the process cost.

Description

A substrate cleaning device

technical field

The invention relates to a substrate cleaning device, in particular to a substrate cleaning device in a semiconductor process.

Background technique

The semiconductor process has great requirements on cleanliness and bonding effectiveness. Therefore, the surface of the substrate needs to be cleaned during the production process to reduce surface foreign matter such as particles, oil stains, and spots on the substrate surface, thereby improving the surface adhesion of the substrate.

Cleaning principle: The organic molecules in the cleaning agent usually contain hydrophilic groups and hydrophobic groups. According to "similar material structure dissolves", when there is oil, the hydrophobic end of the organic molecule attracts the oil, and the hydrophilic end faces Water forms a thin film to surround small oil droplets and prevent small oil droplets from combining with each other, so as to obtain an emulsion with oil as the dispersant and water as the dispersant, achieving the purpose of oil removal. In the prior art, a roller brush cleaning machine is generally used to clean the surface of the substrate, which uses the rotation of the cylindrical roller brush to clean the substrate below it. During the cleaning process, a tangential contact area is formed between the roller brush and the substrate, but the contact area is small; in order to effectively remove foreign matter on the substrate surface, it is usually necessary to increase the concentration of the cleaning agent and spray a large amount of cleaning agent on the contact surface. This results in a large consumption of cleaning agent. In the semiconductor process, the cleaning agent generally uses a KOH solution containing a surfactant, which is expensive, and the large consumption of the cleaning agent will inevitably lead to an increase in the cost of the semiconductor process.

Therefore, there is an urgent need for a substrate cleaning device, which can reduce the consumption of cleaning agents and reduce the process cost under the premise of ensuring the cleaning effect.

Contents of the invention

The object of the present invention is to provide a substrate cleaning device, which enhances the cleaning effect by increasing the contact area between the cleaning brush and the substrate, thereby reducing the consumption of cleaning agents and reducing the process cost.

In order to achieve the above object, the present invention provides a substrate cleaning device, which includes a cleaning brush and a brush holder, the brush holder is in the shape of a cuboid and arranged perpendicular to the conveying direction of the substrate. One side is provided with the cleaning brush. When using the substrate cleaning device to clean the surface of the substrate, the contact area between the cleaning brush and the substrate is the area of the cleaning brush. On the premise that the width of the cleaning brush is consistent with the diameter of the roller brush in the prior art, the substrate cleaning device of the present invention effectively increases the contact area between the cleaning brush and the substrate.

Preferably, the substrate cleaning device further includes a rotating shaft, a guide rail and a linear drive, the rotating shaft passes through the brush holder, and takes the longitudinal axis of symmetry of the brush holder as the central axis; the guide rail is parallel to the The conveying direction of the substrate is set, and the brush holder is erected on the guide rail through the rotating shaft, and reciprocates along the guide rail driven by the linear driver. The cleaning brush reciprocates along with the brush holder along the conveying direction of the substrate, thereby further improving the cleaning efficiency of the substrate.

The rotating shaft is a hollow structure, and at least one guide tube is arranged inside, and the number of guide tubes is preferably four, and small holes are distributed on the tube wall of the guide tube. Channels for the cleaning agent to flow out are provided on the shaft wall of the rotating shaft and on the side wall of the brush holder. The cleaning agent is sprayed to the surface of the substrate through the small holes on the pipe wall of the guide pipe and the channels on the wall of the rotating shaft and the side wall of the brush holder, so that there is no need to separately arrange a spray pipe.

The cleaning brushes are all arranged on the four surfaces of the brush holder parallel to the rotating shaft. After using for a certain period of time, the brush holder is rotated 90 degrees along the rotating shaft, and a clean cleaning brush is replaced for cleaning, thereby prolonging the maintenance cycle of the cleaning device and saving maintenance costs.

The cleaning brush is detachably installed on the brush holder. When the cleaning brush needs to be cleaned or replaced after being used for a period of time, it is only necessary to remove the cleaning brush without disassembling the entire brush holder.

The cross-section perpendicular to the longitudinal direction of the brush holder is a square. The bristles of the cleaning brush are made of nylon.

Compared with the prior art, the substrate cleaning device of the present invention has the following advantages:

1) The brush holder structure of the cuboid effectively increases the contact area between the cleaning brush and the substrate, and enhances the cleaning effect, thereby helping to reduce the consumption of cleaning agents and process costs;

2) The cleaning brush reciprocates along the guide rail with the brush holder, thereby further improving the cleaning efficiency of the substrate;

3) The design of the porous guide tube enables the cleaning agent to spray to the surface of the substrate through the small holes on the tube wall of the guide tube, so that there is no need to set up a separate spray tube;

4) There are cleaning brushes on the four sides of the brush holder parallel to the rotation axis, so that the cleaning brushes can be replaced by rotating the brush holder, which prolongs the maintenance cycle of the cleaning device and saves maintenance costs;

5) The cleaning brush is detachably installed on the brush holder, which facilitates the cleaning and replacement of the cleaning brush, thus saving the maintenance cost of the cleaning device.

Description of drawings

Fig. 1 is a schematic structural view of a substrate cleaning device of the present invention;

FIG. 2 is a schematic structural view of the draft tube of the substrate cleaning device of the present invention.

detailed description

The present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

Example 1

A substrate cleaning device, as shown in Figure 1, includes a cleaning brush, a brush holder 1, a guide rail 2, a rotating shaft 3 and a linear drive, the brush holder 1 is in the shape of a cuboid, and the two sides surrounded by its short sides are square. The brush holder 1 is arranged perpendicular to the conveying direction of the substrate, and a cleaning brush is arranged on the side of the brush holder 1 opposite to the substrate. The rotating shaft 3 passes through the brush holder 1, and takes the longitudinal axis of symmetry of the brush holder 1 as the central axis; the guide rail 2 is parallel to the conveying direction of the substrate, and the brush holder 1 is erected on the guide rail 2 through the rotating shaft 3, and driven by the linear drive Move back and forth along the guide rail 2.

The rotating shaft 3 is a hollow structure with four guide tubes 4 inside (as shown in Figure 2), and small holes 5 are distributed on the tube wall of the guiding tube 4; Small holes are arranged on the four faces parallel to the rotating shaft 3 . The cleaning agent is sprayed to the surface of the substrate through the small holes on the pipe wall of the draft tube, the small holes on the shaft wall of the rotating shaft 3 and the small holes on the side wall of the brush holder 1, so that there is no need to separately arrange a spray pipe.

The bristles of the cleaning brush are made of nylon. The cleaning brush is detachably installed on the brush holder 1. When the cleaning brush needs to be cleaned or replaced after being used for a period of time, it is only necessary to remove the cleaning brush without disassembling the entire brush holder.

When the substrate cleaning device of the present invention is used to clean the surface of the substrate, the contact area between the cleaning brush and the substrate is the area of the cleaning brush. On the premise that the width of the cleaning brush is consistent with the diameter of the roller brush in the prior art, the substrate cleaning device of the present invention effectively increases the contact area between the cleaning brush and the substrate, and enhances the cleaning effect, thereby helping to reduce the The consumption of cleaning agent is reduced, and the process cost is saved. The cleaning brush can reciprocate along with the brush holder along the conveying direction of the substrate, further improving the cleaning efficiency of the substrate.

Example 2

The content in this embodiment that is the same as that in Embodiment 1 will not be described again.

In this embodiment, cleaning brushes are provided on the four surfaces of the brush holder 1 parallel to the rotating shaft 3 . In order to effectively clean the surface of the substrate, the cleaning brush needs to be replaced periodically. When the cleaning brush needs to be replaced, the brush holder 1 is rotated 90 degrees along the rotating shaft 3, and a clean cleaning brush is replaced to continue cleaning, thereby prolonging the maintenance cycle of the cleaning device and saving maintenance costs.

The above descriptions are only preferred embodiments of the present invention, and should not be used to limit the scope of the present invention. Equivalent changes made according to the claims of the present invention still fall within the scope of the present invention.

Claims (5)

1. A substrate cleaning device, characterized in that it comprises a cleaning brush and a brush holder, the brush holder is cuboid, and is arranged perpendicular to the conveying direction of the substrate, and the side of the brush holder relative to the substrate is The cleaning brush is arranged on it; it also includes a rotating shaft, a guide rail and a linear drive, the rotating shaft passes through the brush holder, and takes the longitudinal axis of symmetry of the brush holder as the central axis; the guide rail is parallel to the In the conveying direction of the substrate, the brush holder is erected on the guide rail through the rotating shaft, and reciprocates along the guide rail under the drive of the linear driver; the rotating shaft is a hollow structure with at least one root guide tube, the tube wall of the guide tube is distributed with small holes; the rotating shaft plays a role in supporting the brush holder; the brush holder is provided on four surfaces parallel to the rotating shaft There are said cleaning brushes. 2. The substrate cleaning device according to claim 1, characterized in that the number of the guide pipes is four. 3. The substrate cleaning device according to claim 1, wherein the cleaning brush is detachably mounted on the brush holder. 4 . The substrate cleaning device according to claim 1 , wherein the cross-section perpendicular to the longitudinal direction of the brush holder is square. 5. The substrate cleaning device according to claim 1, characterized in that the material of the bristles of the cleaning brush is nylon.