CN103894354A - Substrate cleaner - Google Patents
Substrate cleaner Download PDFInfo
- Publication number
- CN103894354A CN103894354A CN201210579739.3A CN201210579739A CN103894354A CN 103894354 A CN103894354 A CN 103894354A CN 201210579739 A CN201210579739 A CN 201210579739A CN 103894354 A CN103894354 A CN 103894354A
- Authority
- CN
- China
- Prior art keywords
- brush
- brush holder
- cleaning
- cleaning device
- base plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 37
- 238000004140 cleaning Methods 0.000 claims abstract description 89
- 239000004677 Nylon Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 229920001778 nylon Polymers 0.000 claims description 3
- 239000012459 cleaning agent Substances 0.000 abstract description 14
- 238000000034 method Methods 0.000 abstract description 6
- 239000004065 semiconductor Substances 0.000 abstract description 5
- 238000012423 maintenance Methods 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- 125000001165 hydrophobic group Chemical group 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000003599 detergent Substances 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/12—Brushes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/20—Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor
Landscapes
- Cleaning In General (AREA)
- Brushes (AREA)
Abstract
本发明涉及一种基板清洗装置，具体地讲涉及一种半导体工艺中的基板清洗装置。该清洗装置包括清洗刷和刷架，所述刷架为长方体状，并垂直于所述基板的传送方向设置，所述刷架的相对于所述基板的一面上设置有所述清洗刷。本发明的基板清洗装置有效增大了清洗刷与基板间的接触面积，增强了清洗效果，从而降低了清洗剂的消耗量，节约了工艺成本。
The invention relates to a substrate cleaning device, in particular to a substrate cleaning device in a semiconductor process. The cleaning device includes a cleaning brush and a brush holder. The brush holder is in the shape of a cuboid and arranged perpendicular to the conveying direction of the substrate. The cleaning brush is arranged on a side of the brush holder opposite to the substrate. The substrate cleaning device of the present invention effectively increases the contact area between the cleaning brush and the substrate, enhances the cleaning effect, thereby reduces the consumption of cleaning agent and saves the process cost.
Description
Technical field
The present invention relates to a kind of base plate cleaning device, relate to specifically the base plate cleaning device in a kind of semiconductor technology.
Background technology
Semiconductor technology is to cleannes and connect validity and have very large requirement, therefore, needs substrate to carry out surface clean in production process, to reduce the Superficial Foreign Body such as particle, greasy dirt, spot of substrate surface, thereby improves the surface adhesion force of substrate.
Clean principle: the organic molecule in cleaning agent contains hydrophilic group and hydrophobic group conventionally, according to " structure of matter similar person mix ", in the time having greasy dirt to exist, organic molecule hydrophobic group one end attracts with oil, and hydrophilic group one end, towards water, forms thin film little oil droplet is surrounded, stop little oil droplet to be bonded to each other, thereby obtain taking oil as dispersate, the emulsion taking water as dispersant, has reached the object of deoiling.In prior art, generally adopt washer with roller brush to clean substrate surface, it is to utilize the rotation of cylindric round brush to clean the substrate of its below.In cleaning process, between round brush and substrate, form the contact area of a tangent plane, but this contact area is less; In order effectively to remove substrate surface foreign matter, conventionally need to increase detergent concentration, and spray a large amount of cleaning agents at contact surface.This has just caused a large amount of consumption of cleaning agent.In semiconductor technology, the general KOH solution adopting containing surfactant of cleaning agent, expensive, a large amount of consumption of cleaning agent certainly will cause the rising of semiconductor technology cost.
Therefore, need a kind of base plate cleaning device badly, can, ensureing, under the prerequisite of cleaning performance, to reduce the consumption of cleaning agent, reduce process costs.
Summary of the invention
The object of this invention is to provide a kind of base plate cleaning device, strengthen cleaning performance by the contact area that increases cleaning brush and substrate, thereby reduce the consumption of cleaning agent, reduce process costs.
In order to achieve the above object, the invention provides a kind of base plate cleaning device, comprise cleaning brush and brush holder, described brush holder is rectangular-shaped, and perpendicular to the direction of transfer setting of described substrate, in the one side with respect to described substrate of described brush holder, be provided with described cleaning brush.While adopting described base plate cleaning device cleaning base plate surface, the contact area between cleaning brush and substrate is the area of cleaning brush.Under the consistent prerequisite of the diameter of the wide and round brush of the prior art of described cleaning brush, base plate cleaning device of the present invention has effectively increased the contact area between cleaning brush and substrate.
Preferably, described base plate cleaning device also comprises rotating shaft, guide rail and linear actuator, and described rotating shaft is through described brush holder, and centered by longitudinal symmetry axis of described brush holder axis; Described guide rail parallel is in the direction of transfer setting of described substrate, and described brush holder is erected on described guide rail by described rotating shaft, and moves back and forth along described guide rail under the driving of described linear actuator.Described cleaning brush along with described brush holder along substrate direction of transfer move back and forth, thereby further improved the cleaning efficiency to substrate.
Described rotating shaft is hollow structure, and inside is provided with at least one mozzle, and the number of mozzle is preferably four, on the tube wall of described mozzle, is distributed with aperture.On the axial wall of rotating shaft and on brush holder sidewall, be equipped with the passage flowing out for cleaning agent.Cleaning agent sprays to substrate surface by the passage on the aperture on mozzle tube wall and rotating shaft axial wall and on brush holder sidewall, thereby without shower is set separately.
On four faces that are parallel to described rotating shaft of described brush holder, be provided with described cleaning brush.When using after certain hour, brush holder, along described rotating shaft 90-degree rotation, is changed to a clean cleaning brush and cleaned, thereby can extend the maintenance period of cleaning device, saving cost of upkeep.
Described cleaning brush is removably mounted on described brush holder.In the time that cleaning brush uses a period of time to clear up or to change, only cleaning brush need be pulled down, and without the whole brush holder of dismounting.
Described brush holder perpendicular to longitudinal cross section be square.The material of the bristle of described cleaning brush is nylon.
Compared with prior art, base plate cleaning device of the present invention has the following advantages:
1) adopt the brush rocker structure of cuboid, effectively increased the contact area of cleaning brush and substrate, strengthened cleaning performance, thereby be conducive to reduce the consumption of cleaning agent, reduction process costs;
2) cleaning brush is along with brush holder moves back and forth along guide rail, thereby further improved the cleaning efficiency to substrate;
3) design of Multi hole guide pipe, makes cleaning agent spray to substrate surface by the aperture on mozzle tube wall, thereby without shower is set separately;
4) brush holder is parallel on the four sides of rotating shaft and is provided with cleaning brush, thereby can change cleaning brush by rotation brush holder, has extended the maintenance period of cleaning device, has saved cost of upkeep;
5) cleaning brush is removably mounted on brush holder, is convenient to cleaning and the replacing of cleaning brush, thus the maintenance cost of having saved cleaning device.
Brief description of the drawings
Fig. 1 is the structural representation of base plate cleaning device of the present invention;
Fig. 2 is the structural representation of the mozzle of base plate cleaning device of the present invention.
Detailed description of the invention
Below in conjunction with the drawings and specific embodiments, the present invention is further detailed explanation.
A kind of base plate cleaning device, as shown in Figure 1, comprises cleaning brush, brush holder 1, guide rail 2, rotating shaft 3 and linear actuator, and brush holder 1 is rectangular-shaped, and two sides that its minor face surrounds are square.Brush holder 1, perpendicular to the direction of transfer setting of substrate, is provided with cleaning brush in the one side of brush holder 1 with respect to substrate.Rotating shaft 3 is through brush holder 1, and centered by longitudinal symmetry axis of brush holder 1 axis; Guide rail 2 is parallel to the direction of transfer of substrate, and brush holder 1 is erected on guide rail 2 by rotating shaft 3, and moves back and forth along guide rail 2 under the driving of linear actuator.
Rotating shaft 3 is hollow structure, and inside is provided with four mozzle 4(as shown in Figure 2), on the tube wall of mozzle 4, be distributed with aperture 5; On the axial wall of rotating shaft 3 and on four faces that are parallel to rotating shaft 3 of brush holder 1, be equipped with aperture.Cleaning agent sprays to substrate surface by the aperture on aperture and brush holder 1 sidewall on the aperture on mozzle tube wall, rotating shaft 3 axial walls, thereby without shower is set separately.
The material of the bristle of cleaning brush is nylon.Cleaning brush is removably mounted on brush holder 1.When needing cleaning or change after cleaning brush using a period of time, only cleaning brush need be pulled down, and without the whole brush holder of dismounting.
While adopting base plate cleaning device cleaning base plate of the present invention surface, the contact area between cleaning brush and substrate is the area of cleaning brush.Under the consistent prerequisite of the diameter of the wide and round brush of the prior art of described cleaning brush, base plate cleaning device of the present invention has effectively increased the contact area between cleaning brush and substrate, strengthen cleaning performance, thereby be conducive to reduce the consumption of cleaning agent, saved process costs.Cleaning brush can move back and forth along substrate direction of transfer along with brush holder, has further improved the cleaning efficiency to substrate.
Content identical with embodiment 1 in the present embodiment repeats no more.
In the present embodiment, on four faces that are parallel to rotating shaft 3 of brush holder 1, be provided with cleaning brush.For effective cleaning base plate surface, cleaning brush needs periodic replacement.In the time that needs are changed cleaning brush, brush holder 1, along rotating shaft 3 90-degree rotations, is changed to a clean cleaning brush and proceeded cleaning, thereby can extend the maintenance period of cleaning device, save cost of upkeep.
The above, be only preferred embodiment of the present invention, the interest field that can not limit the present invention with this, and the equivalent variations of doing according to the claims in the present invention, still belongs to the scope that the present invention is contained.
Claims (8)
1. a base plate cleaning device, is characterized in that, comprises cleaning brush and brush holder, and described brush holder is rectangular-shaped, and perpendicular to the direction of transfer setting of described substrate, in the one side with respect to described substrate of described brush holder, is provided with described cleaning brush.
2. base plate cleaning device according to claim 1, characterized by further comprising rotating shaft, guide rail and linear actuator, and described rotating shaft is through described brush holder, and centered by longitudinal symmetry axis of described brush holder axis; Described guide rail parallel is in the direction of transfer of described substrate, and described brush holder is erected on described guide rail by described rotating shaft, and moves back and forth along described guide rail under the driving of described linear actuator.
3. base plate cleaning device according to claim 1 and 2, is characterized in that described rotating shaft is hollow structure, and inside is provided with at least one mozzle, on the tube wall of described mozzle, is distributed with aperture.
4. base plate cleaning device according to claim 3, the number that it is characterized in that described mozzle is 4.
5. base plate cleaning device according to claim 3, is characterized in that being provided with described cleaning brush on four faces that are parallel to described rotating shaft of described brush holder.
6. base plate cleaning device according to claim 5, is characterized in that described cleaning brush is removably mounted on described brush holder.
7. base plate cleaning device according to claim 5, what it is characterized in that described brush holder is square perpendicular to longitudinal cross section.
8. base plate cleaning device according to claim 5, the material that it is characterized in that the bristle of described cleaning brush is nylon.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210579739.3A CN103894354B (en) | 2012-12-27 | 2012-12-27 | Substrate cleaner |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210579739.3A CN103894354B (en) | 2012-12-27 | 2012-12-27 | Substrate cleaner |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103894354A true CN103894354A (en) | 2014-07-02 |
| CN103894354B CN103894354B (en) | 2017-02-08 |
Family
ID=50986102
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210579739.3A Expired - Fee Related CN103894354B (en) | 2012-12-27 | 2012-12-27 | Substrate cleaner |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103894354B (en) |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2565420Y (en) * | 2002-08-30 | 2003-08-13 | 骆仲逵 | Mouth-rinsing device |
| CN1748879A (en) * | 2004-09-13 | 2006-03-22 | 大日本网目版制造株式会社 | Method and device for treating base bored |
| JP2007335796A (en) * | 2006-06-19 | 2007-12-27 | Tokyo Ohka Kogyo Co Ltd | Cleaning roller |
| CN201699040U (en) * | 2010-06-23 | 2011-01-05 | 刘韵清 | Solar panel automatic cleaning device |
| CN102388335A (en) * | 2009-05-12 | 2012-03-21 | 夏普株式会社 | Substrate washing method and substrate washing apparatus |
| CN202178261U (en) * | 2011-09-01 | 2012-03-28 | 上海正泰太阳能科技有限公司 | Self-cleaning solar cell assembly |
| CN102416393A (en) * | 2011-09-29 | 2012-04-18 | 南通美能得太阳能电力科技有限公司 | Automatic dust collector of solar module |
| CN102479669A (en) * | 2010-11-29 | 2012-05-30 | 中芯国际集成电路制造(上海)有限公司 | Wafer brush cleaning device and wafer brush cleaning method |
-
2012
- 2012-12-27 CN CN201210579739.3A patent/CN103894354B/en not_active Expired - Fee Related
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2565420Y (en) * | 2002-08-30 | 2003-08-13 | 骆仲逵 | Mouth-rinsing device |
| CN1748879A (en) * | 2004-09-13 | 2006-03-22 | 大日本网目版制造株式会社 | Method and device for treating base bored |
| JP2007335796A (en) * | 2006-06-19 | 2007-12-27 | Tokyo Ohka Kogyo Co Ltd | Cleaning roller |
| CN102388335A (en) * | 2009-05-12 | 2012-03-21 | 夏普株式会社 | Substrate washing method and substrate washing apparatus |
| CN201699040U (en) * | 2010-06-23 | 2011-01-05 | 刘韵清 | Solar panel automatic cleaning device |
| CN102479669A (en) * | 2010-11-29 | 2012-05-30 | 中芯国际集成电路制造(上海)有限公司 | Wafer brush cleaning device and wafer brush cleaning method |
| CN202178261U (en) * | 2011-09-01 | 2012-03-28 | 上海正泰太阳能科技有限公司 | Self-cleaning solar cell assembly |
| CN102416393A (en) * | 2011-09-29 | 2012-04-18 | 南通美能得太阳能电力科技有限公司 | Automatic dust collector of solar module |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103894354B (en) | 2017-02-08 |
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| C06 | Publication | ||
| PB01 | Publication | ||
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| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 102209 Beijing city Changping District town Beiqijia Hongfu Pioneer Park No. 15 hospital Patentee after: BEIJING CHUANGYU TECHNOLOGY Co.,Ltd. Address before: 102209 Beijing city Changping District town Beiqijia Hongfu Pioneer Park No. 15 hospital Patentee before: BEIJING HANERGY CHUANGYU S&T Co.,Ltd. |
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| CP01 | Change in the name or title of a patent holder | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 102200 room A129-1, Zhongxing Road, Changping District science and Technology Park, Beijing, China, 10 Patentee after: DONGTAI HI-TECH EQUIPMENT TECHNOLOGY Co.,Ltd. Address before: 102200 room A129-1, Zhongxing Road, Changping District science and Technology Park, Beijing, China, 10 Patentee before: DONGTAI HI-TECH EQUIPMENT TECHNOLOGY (BEIJING) Co.,Ltd. |
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| CP03 | Change of name, title or address | ||
| CP03 | Change of name, title or address |
Address after: 102200 room A129-1, Zhongxing Road, Changping District science and Technology Park, Beijing, China, 10 Patentee after: DONGTAI HI-TECH EQUIPMENT TECHNOLOGY (BEIJING) Co.,Ltd. Address before: 102209 Beijing city Changping District town Beiqijia Hongfu Pioneer Park No. 15 hospital Patentee before: Beijing Chuangyu Technology Co.,Ltd. |
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| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20200609 Address after: 518112 Room 403, unit 2, building C, Dongfang Shengshi, Jinpai community, Buji street, Longgang District, Shenzhen City, Guangdong Province Patentee after: Shenzhen yongshenglong Technology Co.,Ltd. Address before: 102200 room A129-1, Zhongxing Road, Changping District science and Technology Park, Beijing, China, 10 Patentee before: DONGTAI HI-TECH EQUIPMENT TECHNOLOGY Co.,Ltd. |
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Effective date of registration: 20210219 Address after: Unit 611, unit 3, 6 / F, building 1, yard 30, Yuzhi East Road, Changping District, Beijing 102208 Patentee after: Zishi Energy Co.,Ltd. Address before: Room 403, unit 2, building C, Dongfang Shengshi, Jinpai community, Buji street, Longgang District, Shenzhen, Guangdong 518112 Patentee before: Shenzhen yongshenglong Technology Co.,Ltd. |
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| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170208 |