CN103885081B - For launching the grid mould of imaging device, detector and transmitting imaging device - Google Patents

For launching the grid mould of imaging device, detector and transmitting imaging device Download PDF

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Publication number
CN103885081B
CN103885081B CN201410084432.5A CN201410084432A CN103885081B CN 103885081 B CN103885081 B CN 103885081B CN 201410084432 A CN201410084432 A CN 201410084432A CN 103885081 B CN103885081 B CN 103885081B
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China
Prior art keywords
housing
grid
grid mould
wall
detector
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CN103885081A (en
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许剑锋
石涵
黄秋
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Sino science and Technology (Shenzhen) Co., Ltd.
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许剑锋
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Priority to CN201410084432.5A priority Critical patent/CN103885081B/en
Publication of CN103885081A publication Critical patent/CN103885081A/en
Priority to PCT/CN2015/073813 priority patent/WO2015135446A1/en
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01TMEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16Measuring radiation intensity
    • G01T1/20Measuring radiation intensity with scintillation detectors
    • G01T1/202Measuring radiation intensity with scintillation detectors the detector being a crystal

Abstract

The present invention provides a kind of for launching the grid mould of imaging device, detector and transmitting imaging device.This grid mould includes: housing;Multiple transverse walls, it is positioned at housing and laterally extending along institute's housing in parallel to each other;And multiple longitudinal wall, it is positioned at housing and in parallel to each other along the longitudinal direction extension of housing, lower space in housing is separated into the multiple grid groove arranged in a matrix fashion by plurality of transverse wall and multiple longitudinal wall, and multiple transverse wall and multiple longitudinal wall have, along the center from the outer thoughtful housing of housing, the height being gradually reduced.This grid mould is by transverse wall exactly and the height of longitudinal wall, it is possible to controls high-energy photon exactly and buries in oblivion the projective distribution producing visible ray subgroup, and then can reach optimal crystal decoding effect.This grid mould can be assembled made by transverse wall and longitudinal wall (such as thin slice), can realize accurately controlling to its surface property and appearance and size, significantly improve detector performance.

Description

For launching the grid mould of imaging device, detector and transmitting imaging device
Technical field
The present invention relates to launch imaging system, in particular it relates to a kind of inspection for launching imaging device Survey the grid mould of device, there is the detector of this grid mould and there is the transmitting imaging of this detector Equipment.
Background technology
Transmitting imaging device including Positron emission tomography equipment has been used for medical diagnosis.With just As a example by electron emission imaging device, it utilizes the positron isotopes positive electron that produces of decay and human body Interior negatron is die out the phenomenon of effect, leads to what people's internal injection marked with positron isotopes Compound, the method using complex probe, utilize detector to detect γ photon produced by effect of dieing out, Obtain the most isotopic distributed intelligence, computer carry out rebuilding combinatorial operation, thus obtain people The three-dimensional tomographic image of internal labeled compound distribution.
Launch imaging device generally include support frame and multiple detectors on the support frame are installed. As a example by Positron emission tomography equipment, detector mainly includes three parts, as it is shown in figure 1, The crystal matrix 110 being made up of discrete scintillation crystal, glass light conducting shell 120 and the photomultiplier transit of lower floor Pipe (PMT) matrix 130.The grooving 121 of different depth, grooving it is carved with in glass light conducting shell 120 The matrix that the lower surface of 121 glass light conducting shells 120 is divided into, and this matrix and discrete crystal composition Crystal matrix 110 one_to_one corresponding.Reflectorized material is inserted in grooving 121.
The high-energy photon (γ photon) of 511 electron-volts of positron annihilation generation, at crystal matrix 110 In a certain crystal bar inside react, be converted into visible ray subgroup.Owing to scintillation crystal is except top Five faces outside face are all covered by reflecting piece, it is seen that light subgroup can only be penetrated from the end face of scintillation crystal, and Enter glass light conducting shell 120.Visible ray subgroup from glass light conducting shell 120 out after, enter PMT square Battle array 130.By in PMT matrix 130, the size of the visible light signal that each PMT unit collects, With centroid algorithm (Anger Logic), which in crystal matrix 110 of high-energy photon can be calculated The internal reaction occurred of individual scintillation crystal.This process is referred to as crystal decoding.
In the detector design of tradition Positron emission tomography equipment, a ring of most critical is glass light guides In layer 120, the degree of depth of grooving 121 is arranged.Irrational grooving 121 degree of depth is arranged, and can cause bigger Crystal solution code error even mistake.Otherwise, rational grooving 121 degree of depth is arranged, it is possible to greatly Reduce crystal solution code error.Therefore the processing of detector is even more important.But, tradition positron emission Detector in imaging device needs to be carved into glass light conducting shell 120 grooving 121 of different depth.Cut The width of groove 121 typically requires and space between single discrete scintillation crystal in crystal matrix 110 Unanimously.On the other hand, in order to improve the detector sensitivity to the high-energy photon of 511 electron-volts, Between discrete scintillation crystal the smaller the better.Therefore, the width of grooving is typically at 100 microns. Inserting reflectorized material in the narrowest grooving, technological requirement is higher.And deep for grooving 121 Degree, as it was previously stated, in order to obtain optimal crystal decoding effect, be provided with one to grooving 121 degree of depth Fixed required precision (such as 200 micron accuracy), traditional cutting technique ratio is relatively inaccessible to this requirement.
Therefore, it is necessary to propose the grid mould of a kind of detector for launching imaging device, have The detector of this grid mould and there is the transmitting imaging device of this detector, to solve prior art Present in problem.
Summary of the invention
According to an aspect of the present invention, it is provided that the grid of a kind of detector for launching imaging device Mould, including: housing;Multiple transverse walls, it is positioned at described housing and in parallel to each other along institute State the laterally extending of housing;And multiple longitudinal wall, it is positioned at described housing and edge in parallel to each other The longitudinal direction described housing extends, and wherein said multiple transverse walls and the plurality of longitudinal wall are by described shell Internal lower space is separated into the multiple grid groove arranged in a matrix fashion, and the plurality of transverse wall Have along the center from the outer thoughtful described housing of described housing with the plurality of longitudinal wall and be gradually reduced Height.
Preferably, the plurality of transverse wall is formed by multiple transverse slice respectively, and the plurality of longitudinal direction Wall is formed by multiple longitudinal thin slices respectively, wherein said multiple transverse slice and the plurality of longitudinal thin slice On be respectively arranged with the grooving that them can be made to be mutually inserted, the plurality of transverse slice and the plurality of Longitudinal thin slice at described grooving grafting to form the plurality of grid groove.
Preferably, the diapire of described housing and the surface towards described enclosure interior of sidewall, Yi Jisuo The side stating multiple transverse wall and the plurality of longitudinal wall is provided with reflection layer.
Preferably, the top of the housing of described grid mould is open, and sets at described top Being equipped with connecting portion, described connecting portion is for being connected with the photosensor layer of described detector.
Preferably, the described housing of described grid mould be seal, the roof of described housing from The transparent material of photon is made.
Preferably, the space in described housing is filled with photoconduction liquid.
Preferably, the described housing of described grid mould is provided with on the sidewall of described housing Device for casting and/or exhaust apparatus.
Preferably, described grid mould also includes that exhaust apparatus, described exhaust apparatus include one or many The guide plate of individual umbrella, is formed with steam vent at the top center of each described guide plate.
According to another aspect of the present invention, also provide for a kind of detector for launching imaging device, Described detector includes: crystal layer, and described crystal layer includes the multiple flicker crystalline substances arranged in a matrix fashion Body;Any one grid mould as above, described crystal layer is connected to the bottom of described grid mould, And the plurality of scintillation crystal respectively with the plurality of grid groove one_to_one corresponding of described grid mould, institute Photoconduction liquid it is filled with in stating grid mould;And photosensor layer, described photosensor layer is connected to The top of described grid mould, described photosensor layer includes multiple optical sensor.
Preferably, the plurality of scintillation crystal is respectively inserted in the plurality of grid groove, and described many The height of individual transverse wall and the plurality of longitudinal wall is not less than the height of described scintillation crystal.
Preferably, bottom surface and the side of the plurality of scintillation crystal is connected to described net by reflectorized material Grid mold.
Preferably, described crystal layer is at the end being externally attached to described grid mould of described grid mould Face.
Preferably, described grid mould also includes that exhaust apparatus, described exhaust apparatus include one or many The guide plate of individual umbrella, is formed with steam vent at the top center of each described guide plate, described in lead In plate gap between the plurality of optical sensor.
Preferably, the described gap between the plurality of optical sensor is provided with lock gas chamber.
According to a further aspect of the invention, a kind of transmitting imaging device, described transmitting imaging are also provided for Equipment includes any one detector as above.
Grid mould according to the present invention is by transverse wall exactly and the height of longitudinal wall, it is possible to accurately Ground controls high-energy photon and buries in oblivion the projective distribution producing visible ray subgroup, and then can reach optimal crystalline substance Body decoding effect.Further, this grid mould can be assembled system by transverse wall and longitudinal wall (such as thin slice) Make, can realize accurately controlling to its surface property and appearance and size, significantly improve detector performance.Example As, can also lay on the housing of grid mould and transverse wall and longitudinal wall easily as required Reflection layer.
Introducing the concept of a series of reduced form in summary of the invention, this will be in detailed description of the invention portion Further describe in point.Present invention part is not meant to attempt to limit required guarantor The key feature of the technical scheme protected and essential features, more do not mean that and attempt to determine required guarantor The protection domain of the technical scheme protected.
Below in conjunction with accompanying drawing, describe advantages and features of the invention in detail.
Accompanying drawing explanation
The drawings below of the present invention is used for understanding the present invention in this as the part of the present invention.Accompanying drawing shows Go out embodiments of the present invention and description thereof, be used for explaining the principle of the present invention.In the accompanying drawings,
Fig. 1 is the schematic diagram of the existing detector for Positron emission tomography equipment;
The front view of the grid mould of an embodiment is invented according to Fig. 2 A;
The sectional view of the grid mould transversely cutting of an embodiment is invented according to Fig. 2 B;
The grid mould sectional view along longitudinally cutting of an embodiment is invented according to Fig. 2 C;
The schematic diagram of the grid mould that an embodiment makes is invented according to Fig. 3 A-3E;
Sectional view and the top view of the detector of an embodiment is invented according to Fig. 4 A-4B;
The sectional view of the detector of another embodiment is invented according to Fig. 5;
The sectional view of the detector of invention further embodiment according to Fig. 6;
Top view and the sectional view of the detector of another embodiment is invented according to Fig. 7 A-7B.
Detailed description of the invention
In the following description, a large amount of concrete details is given to provide the most thorough to the present invention Understanding.It will be apparent, however, to one skilled in the art that the present invention can be without These details one or more and be carried out.In other example, in order to avoid sending out with the present invention Life is obscured, and is not described for technical characteristics more well known in the art.
In order to thoroughly understand the present invention, detailed structure will be proposed in following description.Obviously, originally Inventive embodiment is not limited to the specific details that those skilled in the art is familiar with.The present invention's Preferred embodiment is described in detail as follows, but in addition to these describe in detail, the present invention can also have Other embodiments.
The present invention provides the grid mould of a kind of detector for launching imaging device, this grid mould It is mainly used in substituting glass light conducting shell of the prior art, especially substitutes the grooving in glass light conducting shell. As seen in figs. 2a-2c, this grid mould includes housing 210, multiple transverse wall 220 and multiple longitudinal direction Wall 230.Transverse wall 220 is positioned at housing 210, and horizontal along housing 210 in parallel to each other Extend.Longitudinal wall 230 is positioned at housing 210, and longitudinal direction along housing 210 is prolonged in parallel to each other Stretch.As shown in Fig. 2 B-2C, multiple transverse walls 220 and multiple longitudinal wall 230 are by housing 210 Lower space be separated into multiple grid groove, the plurality of grid groove arranges in a matrix fashion.In height side Upwards, multiple transverse walls 220 and multiple longitudinal wall 230 can start upwards from the bottom surface of housing 210 Extend, it is also possible to upwardly extend spaced a distancely with bottom surface.Under both modes, launch The crystal layer of the detector of imaging device can have different structures, hereinafter by the structure of binding crystal layer Make and it is respectively described.Additionally, multiple transverse walls 220 and multiple longitudinal wall 230 are along from shell The center of the outer thoughtful housing 210 of body 210 has the height being gradually reduced.As hereinafter will described in, This transverse wall 220 and longitudinal wall 230 mainly replace the grooving in glass light conducting shell of the prior art, The closer to peripheral wall (including the transverse wall 220 of periphery and longitudinal wall 230), there is the highest height, Mainly for making the decoded positions avoiding the scintillation crystal at edge mix.The height of each wall is usual Need to be determined by repetition test.
Transverse wall 220 and longitudinal wall 230 can be formed by any-mode, and transverse wall 220 Can be single or multiple lift structure with longitudinal wall 230.Each transverse wall 220 and longitudinally in each wall 230 Can be spliced to form by multiple discrete sheets, so, multiple are connected with each other to be separated to form multiple Grid groove.Certainly, each transverse wall 220 and longitudinally in each wall 230 can also be the component of full wafer. With reference to Fig. 3 A-3E, it is provided that a kind of full wafer structure manufacture transverse wall 220 and longitudinal wall 230 of using Mode.
As shown in figs 3 a and 3b, first provide thin slice 220 ', this thin slice 220 ' can be super thin metal sheet, Ultra-thin PVC sheet etc., can be typically 50-120 micron.Then, under such as thin slice 220 ' Grooving 221 is set at the correct position in portion, to form transverse slice.Each transverse wall 220 can For the transverse slice using the method to make.Similarly, wall also can be above-mentioned for using longitudinally in each Longitudinal thin slice that method is made, difference is the grooving 231 (seeing Fig. 3 C) on longitudinal thin slice It is disposed thereon portion.As example, it is also possible to use various known including 3D printing technique Technology makes the transverse wall 220 shown in Fig. 3 B and has longitudinal wall 230 (ginseng of similar structures See Fig. 3 C).
As shown in Figure 3 C, transverse slice can make transverse slice with the thinnest with grooving on longitudinal thin slice Sheet is mutually inserted, the most multiple transverse slice and multiple longitudinal thin slice grafting at grooving, can be formed Multiple grid groove, as shown in Figure 3 D.Then this grid groove is fixed in housing 210, in order to enable The internal structure of housing 310 is enough shown, Fig. 3 E illustrate only a part for housing.
It should be noted that transverse wall 220 illustrated in Fig. 3 A-3E and longitudinal wall 230 are only used for The principle of the preferred embodiment is described, is not intended to transverse wall 220 and the quantity of longitudinal wall 230 herein It is limited to illustrate embodiment.It is true that the transverse wall 220 being finally plugged in together and longitudinal wall 230 Corresponding to the grooving in existing glass light conducting shell, the grid groove being separated to form can be brilliant with flicker respectively The length and width of body one_to_one corresponding, i.e. grid groove is corresponding with the length and width of scintillation crystal respectively (such as grid groove equal sized or be slightly less than the size of scintillation crystal), therefore, transverse wall 220 To determine according to actual should being used for the quantity of longitudinal wall 230.
As shown in FIGURE 3 E, the diapire of housing 210 and sidewall towards the surface within housing 210, And reflection layer can be provided with on the side of multiple transverse walls and multiple longitudinal wall.This reflection layer Can be that (such as ESR is reflective for spraying, plated film (such as spraying or silver-plated film) or sticking reflecting material Sheet) formed.The thickness of ESR (Enhanced Specular Reflector) reflecting piece is at 40 microns Left and right, such as 38 microns.As high-efficient reflecting mirror, ESR is in whole visible spectrum Reflectivity is all more than 98%, higher than current other kinds of reflector plate.ESR itself is thin by macromolecule Film layer group becomes, and is the reflector plate material of more environmental protection.Certainly, the present invention is not excluded for housing 210 And the embodiment that transverse wall 220 and longitudinal wall 230 are made by reflectorized material.
Preferably, the top of housing 210 is provided with connecting portion, and this connecting portion is for the light with detector Sensor layer 420 connects, as shown in figs. 4 a-4b.Figure includes four light with photosensor layer 420 As a example by sensor.As example, optical sensor can be photomultiplier (PMT).Photosensor layer After 420 housings 210 being connected to grid mould, formed in housing 210 and seal space.This sealing is empty Between be used for filling photoconduction liquid 430.Photoconduction liquid 430 can be to connect it in photosensor layer 420 Before be filled in housing 210, it is also possible to pass through after photosensor layer 420 is connected to housing 210 Additionally it is arranged on the device for casting on housing (seeing the fill openings shown in Fig. 5 and connector 500) Fill.
Photoconduction liquid 430 is the fluent material under normal temperature.Photoconduction liquid preferably has following performance to be wanted Ask: stable chemical nature, nontoxic;420nm light decay lowers;Optical conductivity higher (about 1.5);Viscous Stagnant coefficient low (low viscosity, preventing from bubbling produces).As example, photoconduction liquid 430 is permissible For meeting the mineral oil of conditions above, Silica (such as the Viscasil series of General Corporation) etc..
In other embodiments, the housing 210 of grid mould can also be to seal, i.e. housing 210 This is as the component sealed.In order to enable photon to enter photosensor layer 420, the top of housing 210 Wall is made up of the transparent material of optical photon.Further, the space in housing 210 can be filled with Photoconduction liquid 430.This means before forming the housing 210 sealed, to fill photoconduction liquid 430. Photoconduction liquid can not certainly be filled in advance in housing 210, but on the housing 210 sealed Device for casting 500 shown in Fig. 5 is set.So according to using needs, can fill at any time, mend Fill or change photoconduction liquid.
In the case of housing 210 itself is containment member, photosensor layer 420 can be by bonding The mode of material adhesion or other any appropriate is fixed to the upper surface of housing 210.However, it is desirable to say Bright is, it is seen that before light subgroup arrives photosensor layer 420 from photoconductive layer, need through photoconductive layer And the jointing material between photosensor layer 420.Therefore, the choosing and processing technology pair of jointing material The performance impact of detector is the biggest.On the one hand, the jointing material that light transmission is bad not only affects crystal Decoding, energy resolution and temporal resolution to detector also have large effect.On the other hand, Jointing material usually has the liquid of certain coefficient of viscosity.When bonding each parts, in jointing material Being likely to produce bubble, decode crystal, the energy resolution of detection head and temporal resolution produce broken The impact of bad property.Even if not producing bubble in adhesion process, part adhesive material is by factors such as temperature Impact, be likely to produce crack or bubble in long-term use process, affect the use of detector. Therefore, when the above considers, the top preferably by housing 210 is open, should Being provided with connecting portion at top, this connecting portion is for being connected with photosensor layer 420, such as Fig. 4 A institute Show.In the preferred embodiment, photoconduction liquid 430 directly contacts with photosensor layer 420, so Visible ray subgroup from photoconduction liquid 430 out after can be directly entered photosensor layer 420, and then keep away The adverse effect of free sticky mixture.But when other side considers, such as from technique with become present aspect, Housing 210 itself is that the embodiment of containment member also has advantage, and therefore, the present invention is not excluded for this reality Execute example.
For crystal layer, it includes the multiple scintillation crystals arranged in a matrix fashion.Scintillation crystal is permissible For the one in activity thallium sodium iodide crystal, bismuth-germanium-oxide crystal, lutecium silicate crystal, silicic acid lutetium-yttrium crystal. In a preferred embodiment, scintillation crystal can be inserted into transverse wall and the net of longitudinal wall formation respectively In cell, as shown in figs. 4 a-4b.In the case, transverse wall 210 and 220 height of longitudinal wall Height not less than scintillation crystal 410.As above, the size of grid groove can be equal to or omit Size less than scintillation crystal.During installation, first grid mould can be slightly moderately heated to grid mould When being slightly larger in dimension than the size of scintillation crystal, by the grid groove of scintillation crystal interpenetration network mould one by one Among.Then stop heating, after grid mould cooling meat, scintillation crystal is fixed.Will flicker Crystal is inserted into grid groove and can make to be directly entered photoconduction liquid from scintillation crystal visible ray subgroup out In Ceng, it is to avoid crystal decoding is produced by the intermediate layer (including the medium such as adhesive and/or gas) of intervention Impact.
As described in Fig. 4 A-4B, at the diapire of housing 210 and sidewall towards the table within housing 210 Reflection layer can be provided with on the side of face and multiple transverse wall 220 and multiple longitudinal wall 230 Embodiment in, scintillation crystal is directly inserted into grid groove.At grid mould, not there is light anti- Penetrate in the embodiment of layer, can wrap up respectively instead in other face in addition to top surface of scintillation crystal It is inserted in grid groove after luminescent material.Furthermore it is also possible to by having sticking reflectorized material, make many Bottom surface and the side of individual scintillation crystal are connected to grid mould by reflectorized material.
It is inserted directly in the embodiment to grid groove at scintillation crystal, transverse wall 220 and longitudinal wall 230 Bottom play the effect of fixing scintillation crystal, and the top of transverse wall 220 and longitudinal wall 230 is played The effect of the grooving in existing glass light conducting shell.It is therefore preferred that at the horizontal stroke of corresponding slot portion On wall 220 and longitudinal side of wall 230 and the medial surface of housing, reflection layer can be set.This The reflection layer of part is mainly used to guide the distribution in photosensor layer of the visible ray subgroup, to reach Optimal crystal decoding effect.
In another embodiment, as shown in Figure 6, crystal matrix in traditional detector module is used 600 (being similar to the crystal matrix 110 shown in Fig. 1).Specifically, with reflective between scintillation crystal Material (such as ESR reflecting piece) is bonded together, and by the scintillation crystal after bonding in addition to bottom surface Five faces all use reflectorized material (such as TEFLON adhesive tape) to be bundled together, to form crystal matrix 600.Then crystal matrix 600 is bonded by adhesive or other any suitable mode is fixed to net The lower surface of grid mold.In a preferred embodiment, can be provided in the lower end of housing 210 The slot of fixing crystal matrix 600, so can avoid using adhesive.This setup has Advantages below: (a) can utilize the technique that the scintillation crystal bonding of maturation forms crystal matrix;(b) Relatively low, because sheet thickness will not in this embodiment to the thickness requirement of the thin slice constituting grid mould Affect the filling rate of crystal.But, compared to the embodiment by scintillation crystal interpenetration network groove, inciting somebody to action For grid mould and the crystal matrix close alignment of light splitting, and the aspect that do not interspaces, may have one Determine difficulty.
In use, may produce bubble in photoconduction liquid, this bubble passes in visible ray subgroup May result in their refraction during defeated, and then affect crystal decoding.Therefore, the present invention's In preferred embodiment, this grid mould also includes exhaust apparatus.
In the embodiment shown in fig. 5, exhaust apparatus 500 can be arranged on the sidewall of housing 210. This exhaust apparatus 500 also acts as the device for casting of photoconduction liquid.This device for casting and/or exhaust apparatus 500 can include that the opening being arranged on the sidewall of housing 210 and plug can seal this in opening and open The connector of mouth.It should be noted that device for casting and/or the quantity of exhaust apparatus 500 and position are not subject to Illustrate the restriction of embodiment, and the structure of device for casting and/or exhaust apparatus 500 may also be distinct from that Diagram embodiment, as long as being capable of above-mentioned functions.
In a preferred embodiment, as illustrated in figures 7 a-b, exhaust apparatus is umbrella, this exhaust apparatus Including the guide plate 700 of umbrella, there is at the top center of guide plate 700 steam vent 710.Work as grid When mould is installed to photosensor layer 421, exhaust apparatus can be arranged on the gap between optical sensor Place.As example, guide plate 700 can be connected to the sidewall of optical sensor at this gap location, or The sidewall on the top of housing 210 it is connected to by the connecting elements of such as linking arm.Although at figure 7A-7B is only provided with at the center clearance of optical sensor this exhaust apparatus, but the present invention is not It is intended to be defined in this embodiment.But, as required, exhaust apparatus can be arranged on any adjacent Gap location between optical sensor.In other embodiments unshowned, this grid mould can include Multiple exhaust apparatus, multiple gap locations that multiple exhaust apparatus are separately positioned between optical sensor.Will Exhaust apparatus is arranged on the gap location between optical sensor, and guide plate 700 can be avoided optical photon The transmission of group produces impact.Preferably, the gap location between optical sensor can also arrange lock air cavity Room, to avoid bubble to return easily in photoconduction liquid.As example, this lock gas chamber can serve as reasons The cavity of the relative closure that the component of guide plate, the sidewall of optical sensor and/or other necessity is formed Room.Such as, lock gas chamber can be arranged on the top of the guide plate 700 shown in Fig. 7 B.Lock air cavity Room connects with steam vent 710.When needs are exhausted bubble process to photoconduction liquid, can will detect Device is upright as shown in Fig. 7 and 6 to be placed, and owing to bubble is relatively light, bubble can be to floating and along leading Move to plate 700, and enter lock gas chamber from steam vent 10.In order to accelerate to be vented bubble process, permissible Detector is placed on centrifugal device, so that bubble is discharged from the steam vent 710 of exhaust apparatus.
When sensor layer 420 is connected to grid mould by the connecting portion above housing 210, exhaust Device can be directed at the gap between multiple optical sensor 421, as shown in Figure 7 A.Lock gas chamber can To be arranged in this gap, and then bubble can be locked in this lock gas chamber.Due to this optical sensor Gap between 421 does not carry out photon collection, and therefore the bubble of this exhaust apparatus and discharge will not be to crystalline substance Body decoding produces impact.
Grid mould according to the present invention is by transverse wall exactly and the height of longitudinal wall, it is possible to accurately Ground controls high-energy photon and buries in oblivion the projective distribution producing visible ray subgroup, and then can reach optimal crystalline substance Body decoding effect.This grid mould can be assembled made by transverse wall and longitudinal wall (such as thin slice), can Realize accurately controlling to its surface property and appearance and size, significantly improve detector performance.Such as, root Light reflection can also be laid easily according to needing on the housing of grid mould and transverse wall and longitudinal wall Layer.
Additionally, the present invention also provides for a kind of detector for launching imaging device, foregoing, This detector includes crystal layer, foregoing any one grid mould and photosensor layer.For Crystal layer, grid mould and photosensor layer are referred to corresponding description above, for sake of simplicity, this Literary composition no longer describes in detail.
Further, the present invention also provides for a kind of launching imaging device, this transmitting imaging device include as Upper any one described detector.
The present invention is illustrated by above-described embodiment, but it is to be understood that, above-mentioned enforcement Example is only intended to citing and descriptive purpose, and is not intended to limit the invention to described embodiment In the range of.In addition it will be appreciated by persons skilled in the art that and the invention is not limited in above-mentioned enforcement Example, can also make more kinds of variants and modifications according to the teachings of the present invention, these variants and modifications Within all falling within scope of the present invention.Protection scope of the present invention is wanted by attached right Book and equivalent scope thereof is asked to be defined.

Claims (15)

1. the grid mould being used for launching the detector of imaging device, it is characterised in that including:
Housing, is used for filling photoconduction liquid;
Multiple transverse walls, it is positioned at described housing and laterally prolonging along described housing in parallel to each other Stretch;And
Multiple longitudinal walls, its be positioned at described housing and in parallel to each other longitudinal direction along described housing prolong Stretch,
Lower space in described housing is divided by wherein said multiple transverse wall and the plurality of longitudinal wall It is divided into the multiple grid groove arranged in a matrix fashion, and the plurality of transverse wall and the plurality of longitudinal wall Along the center from the outer thoughtful described housing of described housing, there is the height being gradually reduced.
2. grid mould as claimed in claim 1, it is characterised in that the plurality of transverse wall divides Do not formed by multiple transverse slice, and the plurality of longitudinal wall formed by multiple longitudinal thin slices respectively,
It is respectively arranged with in wherein said multiple transverse slice and the plurality of longitudinal thin slice and can make it The grooving that is mutually inserted, the plurality of transverse slice and the plurality of longitudinal thin slice are at described grooving Grafting is to form the plurality of grid groove.
3. grid mould as claimed in claim 1, it is characterised in that the diapire of described housing and The surface towards described enclosure interior of sidewall and the plurality of transverse wall and the plurality of longitudinal wall Side be provided with reflection layer.
4. grid mould as claimed in claim 1, it is characterised in that the shell of described grid mould The top of body is open, and is provided with connecting portion at described top, described connecting portion for The photosensor layer of described detector connects.
5. grid mould as claimed in claim 1, it is characterised in that the institute of described grid mould Stating housing is to seal, and the roof of described housing is made up of the transparent material of optical photon.
6. grid mould as claimed in claim 5, it is characterised in that the space in described housing It is filled with photoconduction liquid.
7. grid mould as claimed in claim 1, it is characterised in that the institute of described grid mould State the device for casting on the sidewall being provided with described housing on housing and/or exhaust apparatus.
8. grid mould as claimed in claim 1, it is characterised in that described grid mould also wraps Including exhaust apparatus, described exhaust apparatus includes the guide plate of one or more umbrella, leads described in each Steam vent it is formed with at the top center of plate.
9. the detector being used for launching imaging device, it is characterised in that described detector includes:
Crystal layer, described crystal layer includes the multiple scintillation crystals arranged in a matrix fashion;
Grid mould as according to any one of claim 1-7, described crystal layer is connected to described net The bottom of grid mold, and the plurality of scintillation crystal respectively with the plurality of grid of described grid mould Groove one_to_one corresponding, is filled with photoconduction liquid in described grid mould;And
Photosensor layer, described photosensor layer is connected to the top of described grid mould, and described light passes Sensor layer includes multiple optical sensor.
10. detector as claimed in claim 9, it is characterised in that the plurality of scintillation crystal divides It is not inserted in the plurality of grid groove, and the plurality of transverse wall and the height of the plurality of longitudinal wall Height not less than described scintillation crystal.
11. detectors as claimed in claim 10, it is characterised in that the plurality of scintillation crystal Bottom surface and side are connected to described grid mould by reflectorized material.
12. detectors as claimed in claim 9, it is characterised in that described crystal layer is at described net The bottom surface being externally attached to described grid mould of grid mold.
13. detectors as claimed in claim 9, it is characterised in that described grid mould also includes Exhaust apparatus, described exhaust apparatus includes the guide plate of one or more umbrella, in each described guiding Being formed with steam vent at the top center of plate, described guide plate is between the plurality of optical sensor In gap.
14. detectors as claimed in claim 13, it is characterised in that the plurality of optical sensor Between described gap be provided with the lock gas chamber connected with described steam vent.
15. 1 kinds of transmitting imaging devices, it is characterised in that described transmitting imaging device includes such as right Require the detector in any of the one of 9-14.
CN201410084432.5A 2014-03-10 2014-03-10 For launching the grid mould of imaging device, detector and transmitting imaging device Active CN103885081B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201410084432.5A CN103885081B (en) 2014-03-10 2014-03-10 For launching the grid mould of imaging device, detector and transmitting imaging device
PCT/CN2015/073813 WO2015135446A1 (en) 2014-03-10 2015-03-06 Grid mold for emission imaging device, detector and emission imaging device

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CN103885081B (en) * 2014-03-10 2016-08-31 许剑锋 For launching the grid mould of imaging device, detector and transmitting imaging device
CN104199079B (en) * 2014-07-17 2016-11-09 许剑锋 Launch the fixing device of the scintillation crystal of imaging device and detect equipment and method
CN104237924B (en) * 2014-08-20 2017-07-28 许剑锋 Grid mould includes the detector and transmitting imaging device of the grid mould
CN104597475B (en) * 2015-01-24 2017-11-14 东莞南方医大松山湖科技园有限公司 Detector and preparation method thereof and the transmitting imaging device with the detector
CN105277965B (en) * 2015-09-30 2017-12-12 华中科技大学 A kind of detector for being used to launch imaging device
CN105403907B (en) * 2015-12-02 2018-02-27 沈阳东软医疗系统有限公司 A kind of scintillation crystal block and preparation method thereof, scintillation crystal detectors
CN108107463A (en) * 2017-12-12 2018-06-01 宁波虔东科浩光电科技有限公司 A kind of scintillating ceramic array and preparation method thereof
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CN114161663A (en) * 2021-12-03 2022-03-11 湖南华曙高科技股份有限公司 Mold ventilation structure, mold and mold manufacturing process

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