CN103692331B - Surface polishing machine table - Google Patents

Surface polishing machine table Download PDF

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Publication number
CN103692331B
CN103692331B CN201310734829.XA CN201310734829A CN103692331B CN 103692331 B CN103692331 B CN 103692331B CN 201310734829 A CN201310734829 A CN 201310734829A CN 103692331 B CN103692331 B CN 103692331B
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provided
polishing
chain
platform
work platform
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CN201310734829.XA
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CN103692331A (en
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杨佳葳
刘先交
徐翊华
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湖南宇晶机器股份有限公司
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Abstract

本发明公开了一种可水平移动的曲面抛光机的工作台,它包括机架,其特征是机架上设有导轨,工作平台通过与导轨配合的滑块安装在导轨上,使工作平台可在导轨上滑动,工作平台上设有链条安装座,机架上设有水平移动驱动电机、从动链轮、由水平移动驱动电机带动的主动链轮,链条绕在主动链轮和从动链轮上,两端分别与链条安装座连接,本发明结构简单,操作维护简单方便、故障率低、设备使用寿命长,滑块与轨道嵌入配合,移动平稳,且传动为柔性连接,具备良好的抗冲击能力;同时,克服了现有抛光存在的缺陷,大大提高了生产效率并为实现流水线生产打下了基础。 The present invention discloses a horizontally movable table surface A polishing machine, comprising a frame, wherein the frame is provided with guide rail, the guide rail by fitting work platform mounted on slider rails, the working platform slides on the guide rail, is provided on the chain mount the work platform, the horizontal movement is provided on the rack drive motor, a driven sprocket, driven by the motor drives the horizontal movement of the drive sprocket, the chain around the chain drive sprocket and the driven wheel, the chain ends are connected to the mount, the present invention is simple in structure, easy operation and maintenance, and low failure rate and long service life, with the slider and the rail is embedded, smooth movement, and the transmission is connected to a flexible, have good impact resistance; at the same time overcome the disadvantages of the prior existence of polishing, greatly improving production efficiency and to streamline the production of the foundation.

Description

曲面抛光机的工作台 Surface polishing machine table

技术领域 FIELD

[0001] 本发明涉及一种曲面抛光机,具体地说是一种超薄、易脆性工件用曲面抛光机的工作台,特别是涉及一种如玻璃、蓝宝石、压电水晶、单晶硅片等工件用曲面抛光机的工作台。 [0001] The present invention relates to a surface polishing machine, in particular an ultra-thin, surface friability of the workpiece table with a polishing machine, more particularly to a glass, sapphire, piezoelectric crystal, single crystal silicon wafer etc. with the workpiece surface polishing machine table.

背景技术 Background technique

[0002] 为了使超薄、易脆性工件如玻璃、蓝宝石、压电水晶、单晶硅片等工件的表面变得光滑、透明,并具有光泽,通常对其表面需进行抛光。 [0002] In order to make thin, the surface friability of the workpiece, such as glass, sapphire, piezoelectric crystal, single crystal silicon wafer and the like of the workpiece becomes smooth, transparent, and has a gloss, the surface to be polished is usually thereof. 目前,现所使用曲面抛光机的基本结构为上盘(抛光盘)、下盘结构,抛光盘进行旋转运动,放置有工件的工作平台即下盘可以相对抛光盘反向旋转,一是增大磨削速度,二是使工件抛光均匀。 At present, the basic structure of the surface is now used polishing machine rotational movement of the disc (polishing), the disc structure, polishing, the workpiece is placed under the work platform that is relatively polishing disc may be rotated reversely, one increases grinding speed, and second, the workpiece polishing uniformity. 同时,在整个运动过程中,因抛光盘与工作平台的接触面积保持不变,所以在加压抛光工作时,气缸可以通过抛光盘给工作平台上的工件施加恒定的压力,以保证抛光盘与工件之间保持恒定的压强。 At the same time, the entire movement, due to the contact area of ​​the polishing disc and the working platform remains unchanged, while pressing the polishing work, the cylinder can apply a constant pressure to the workpiece by the polishing work platform, and to ensure that the polishing disc maintaining a constant pressure between the workpieces. 但是,因抛光盘、工作平台均进行旋转运动,抛光盘、工作平台的外圈与内圈在线速度上存在差异,这样导致工作平台上工件的抛光均匀度差,在工件上留下暇疵,如抛光纹等,影响抛光效果与效率。 However, since the polishing work platforms rotational movement, polishing, there is a difference on the inner and outer races linear velocity of working platforms, which results in polishing uniformity of a workpiece on the working platform of the difference, leaving flaws on the workpiece, the polishing lines, etc., affect the polishing effectiveness and efficiency.

发明内容 SUMMARY

[0003] 本发明的目的是提供一种可水平移动的曲面抛光机的工作台,即在抛光盘进行旋转运动的同时,放置有工件的工作平台即下盘进行水平移动。 [0003] The object of the present invention is to provide a horizontal movement of the polishing machine surface table, i.e., while the polishing rotational movement, the working platform placed at the workpiece, i.e. horizontal movement plate.

[0004] 本发明是采用如下技术方案实现其发明目的的,一种曲面抛光机的工作台,它包括机架,机架上设有导轨,工作平台通过与导轨配合的滑块安装在导轨上,使工作平台可在导轨上滑动,工作平台上设有链条安装座,机架上设有水平移动驱动电机、从动链轮、由水平移动驱动电机带动的主动链轮,链条绕在主动链轮和从动链轮上,两端分别与链条安装座连接。 [0004] The present invention adopts the following technical solution to achieve an object of the invention, a surface polishing machine table, which includes a frame, provided with guides, by the guide rail fitting work platform mounted on slider rails to the rack , the working platform can slide on the rail, it is provided on the chain mount the work platform, is provided with a horizontal movement of the rack drive motor, a driven sprocket, driven by the motor drives the horizontal movement of the drive sprocket, the chain around the driving chain and the driven sprocket wheel, the chain ends are connected to the mount.

[0005] 本发明所述的工作平台为方形。 [0005] The working platform according to the present invention is a square.

[0006] 为使工件具有稳定良好的抛光效果,本发明所述的工作平台上设有对工作平台进行冷却的冷却机构和安装工件的吸附机构。 [0006] For polishing a workpiece having a good stabilizing effect, provided with suction means for cooling mechanism for cooling the working platform and the workpiece is mounted on the work platform of the present invention.

[0007] 本发明所述的冷却机构包括设在工作平台内的蛇形水道,与蛇形水道连通的进水接头、出水接头,进水管、出水管安装在拖链上并分别与进水接头、出水接头连接,拖链一端固定在机架上,另一端固定在工作平台上;所述的吸附机构包括设在工作平台内的真空气路、安装在工作平台上与真空气路连通的真空吸盘。 [0007] The cooling mechanism of the present invention comprises a work platform provided in the serpentine waterways, watercourses serpentine communication with the inlet connector, the outlet connector, inlet pipe, outlet pipe mounted on the inlet connector, respectively towline and , outlet header, towline one end fixed to the frame, and the other end is fixed on the work platform; said suction means comprises a vacuum air passage provided in the working platform is mounted on the working platform and the vacuum in the air passage communicating the true sucker.

[0008] 本发明所述的工作平台上分别开有水槽和气槽,并通过封板封闭,从而形成蛇形水道与真空气路;与真空气路的对应处设有基板,基板上安装有真空吸盘。 [0008] are opened on the working platform of the present invention, the water tank gas tank, and closed by a closure plate, thereby forming a serpentine passage waterways and true air; and the corresponding real air passage is provided at the vacuum is mounted on a substrate, the substrate sucker.

[0009] 由于采用上述技术方案,本发明较好的实现了发明目的,其结构简单,操作维护简单方便、故障率低、设备使用寿命长,滑块与轨道嵌入配合,移动平稳,且传动为柔性连接, 具备良好的抗冲击能力;同时,克服了现有抛光存在的缺陷,大大提高了生产效率并为实现流水线生产打下了基础。 [0009] Since the above technical solution, the present invention is to achieve the object of the invention is preferably simple in structure, easy operation and maintenance, and low failure rate and long service life, with the slider and the rail is embedded, smooth movement, and the transmission of a flexible connection, with good impact resistance; the same time, overcomes the drawbacks of the conventional polishing presence, greatly improving productivity and production lines for the realization of the foundation.

附图说明 BRIEF DESCRIPTION

[0010] 图1是本发明的结构示意图; [0010] FIG. 1 is a structural diagram of the present invention;

[0011] 图2是本发明的电气控制原理示意图; [0011] FIG. 2 is a schematic view of the principle of the present invention, an electrical control;

[0012] 图3是本发明抛光盘的工作面与工件的近似接触面积S的计算示意图(工作平台移动距离Η小于等于抛光盘的半径R); [0012] FIG. 3 is an approximate calculation of the contact area S of the workpiece schematic face polishing of the present invention (working platform moves less distance Η R & lt polishing disc radius);

[0013] 图4是本发明抛光盘的工作面与工件的近似接触面积S的计算示意图(工作平台移动距离Η大于抛光盘的半径R); [0013] FIG. 4 is an approximate calculation of the contact area S of the workpiece schematic face polishing of the present invention (working platform moving distance Η greater than the radius R & lt polishing);

[0014] 图5是本发明的加工压力曲线图。 [0014] FIG. 5 is a graph showing a pressure process of the present invention.

具体实施方式 Detailed ways

[0015] 下面结合附图及实施例对本发明作进一步说明。 [0015] The following embodiments in conjunction with the accompanying drawings and embodiments of the present invention will be further described.

[0016] 由图1、图2可知,一种曲面抛光机的工作台,它包括机架1,机架1上设有导轨10,工作平台8通过与导轨10配合的滑块9安装在导轨10上,使工作平台8可在导轨10上滑动,工作平台8上设有链条安装座21,机架1上设有水平移动驱动电机12、从动链轮15、由水平移动驱动电机12带动的主动链轮13,链条14绕在主动链轮13和从动链轮15上,两端分别与链条安装座21连接。 [0016], FIG. 1 seen from FIG. 2, stage a bend surface polishing machine, which comprises a frame 1, the guide rail 10 provided on the frame 1, the working platform 8 by cooperating with the guide rail 10 of the slider 9 is mounted on the rail 10, the working platform 8 is slidable on the guide rail 10, the mount is provided with a horizontal movement of the chain drive motor 21, the frame 112, a driven sprocket 15, driven by a horizontal drive motor 12 to move the work platform 8 the drive sprocket 13, a chain 14 wound around the drive sprocket 13 and the driven sprocket 15, the seat 21 is connected at both ends of the chain are mounted. 为控制简单,本发明所述工作平台8的移动为水平匀速直线运动。 To control a simple movement of the work platform of the present invention 8 is a horizontal uniform linear motion.

[0017] 本发明所述的工作平台8为方形。 Working platform according to the invention [0017] This 8 square.

[0018] 为使工件17具有稳定良好的抛光效果,本发明所述的工作平台8上设有对工作平台8进行冷却的冷却机构和安装工件17的吸附机构。 [0018] The workpiece 17 has a good stable polishing effect, according to the present invention on the working platform 8 is provided on the work platform cooling mechanism for cooling the workpiece and the adsorbing mechanism 17 of the mounting 8.

[0019] 本发明所述的冷却机构包括设在工作平台8内的蛇形水道19,与蛇形水道19连通的进水接头、出水接头,进水管、出水管安装在拖链上并分别与进水接头、出水接头连接,拖链一端固定在机架1上,另一端固定在工作平台8上;所述的吸附机构包括设在工作平台8内的真空气路20、安装在工作平台8上与真空气路20连通的真空吸盘。 [0019] The cooling mechanism of the present invention comprises a work platform 8 provided in the serpentine waterways 19 in communication with the inlet connector 19 serpentine waterways, water fittings, inlet pipe, outlet pipe and mounted respectively on the towline the inlet connector, the outlet connector connected to one end of the towline fixed to the frame 1, and the other end is fixed on the working platform 8; said suction means comprises a vacuum air passage is provided in the working platform 20 8, mounted on work platform 8 upper passage 20 communicating with the vacuum air vacuum chuck.

[0020] 本发明所述的工作平台8上分别开有水槽和气槽,并通过封板11封闭,从而形成蛇形水道19与真空气路20;与真空气路20的对应处设有基板18,基板18上安装有真空吸盘。 [0020] The present invention work platform 8 are opened and gas tank groove, and is closed by sealing plates 11, 19 to form a serpentine waterways and true air passage 20; the corresponding real air passage 20 is provided with a substrate 18 mounted on the vacuum chuck, the substrate 18.

[0021] 为使抛光盘16在自转的同时公转,本发明所述的抛光盘16安装在安装盘7上,抛光盘16由安装在升降机架5上的抛光电机3驱动,所述安装盘7由安装在升降机架5上的公转电机6驱动。 [0021] For polishing disc 16 revolves in the rotation, according to the present invention, the polishing platen 16 is mounted on the mounting plate 7, the polishing by the polishing disc drive motor 16 mounted on the lift frame 3, 5, 7 of the mounting plate driven by a motor mounted on the revolving frame 5 of the elevator 6. 所述抛光盘16为2~8个,本实施例的抛光盘16为3个,抛光盘16的驱动轴通过齿轮组与抛光电机3的主轴联接。 The polishing platen 16 is 2 to 8, polishing disc 16 of the present embodiment is three, polishing shaft 16 through a gear set coupled to the spindle of the polishing machine 3.

[0022] 为保持抛光盘16对工件17施加设定的压强,机架1上设有实现抛光盘16对工件17 施加设定压强的动态加压装置,所述动态加压装置在工作平台8的水平直线移动过程中,通过安装在升降机架5上的抛光盘16对工件17保持施加设定的压强,从而实现对工件17的抛光。 1 is provided with [0022] applied to maintain the set optical disk 16 polishing pressure on the workpiece 17, the rack 17 is applied to achieve a dynamic pressure of the pressurizing means to set the optical disk 16 polishing a workpiece, said pressing means dynamic working platform 8 the horizontal linear movement by polishing holder 5 mounted on the elevator 16 of the workpiece 17 to maintain a set pressure is applied, thereby realizing the polishing of the workpiece 17. 本发明所述的动态加压装置包括安装在机架1上由PLC控制的升降气缸2、检测工作平台8位移的位移传感器,升降气缸2的气缸座安装在机架1上,升降气缸2的活塞杆与升降机架5 连接;PLC根据工作平台8的位移量计算抛光盘16与工件17的接触面积,通过比例换向阀确定对升降气缸2的升、降控制,实现抛光盘16对工件17施加设定的压强。 Dynamic pressure device according to the present invention comprises a lifting cylinder mounted on the frame 1 is controlled by the PLC 2, work platform 8 detects the displacement of the displacement sensor, the lifting cylinder of the cylinder block 2 is mounted on the frame 1, the lifting cylinder 2 a piston rod connected with the lift frame 5; the PLC 16 calculates the polishing platen and the workpiece based on the displacement amount of the work platform 8 in a contact area 17 of the lifting cylinder 2 liters determined by the proportional valve, lowering control, polishing the workpiece 17 to 16 pressure is applied to the set.

[0023] 由图3、图4可知,为计算简单,本发明所述抛光盘16对工件17施加设定的压强为Ρ =(FG)/ S,F为抛光盘16施加给工件的压力,G为升降机架5的重量,S为抛光盘16的工作面与工件17的接触面积;所述抛光盘16的工作面与工件17的接触面积近似计算为: [0023] apparent from FIG. 3, FIG. 4, is a simple calculation, the present invention is the polishing pressure applied to the optical disk 16 set to the workpiece 17 Ρ = (FG) / S, F is the pressure applied to the polishing of the workpiece 16, G is the weight of the lift frame 5, S is the workpiece and the polishing face 16 of the contact area 17; working surface of the polishing disc 16 with the workpiece contact area 17 is approximately calculated as:

[0024] [0024]

Figure CN103692331BD00051

[0025] 式中S表示抛光盘16与工件17的近似接触面积,R表示抛光盘16的半径,Η表示工作平台8的相对位移量,R2H,cosa=(RH)/R;或者 [0025] wherein S indicates the approximate area of ​​contact with the polishing disc 16 in the workpiece 17, R represents the radius of the polishing disc 16, Η represents the relative displacement amount of the work platform 8, R2H, cosa = (RH) / R; or

[0026] [0026]

Figure CN103692331BD00052

[0027] 式中S表示抛光盘16与工件17的近似接触面积,R表示抛光盘16的半径,Η表示工作平台8的相对位移量,H>R,cosa=(H_R)/R。 [0027] wherein S indicates the approximate area of ​​contact with the polishing disc 16 in the workpiece 17, R represents the radius of the polishing disc 16, Η represents the relative displacement amount of the work platform 8, H> R, cosa = (H_R) / R.

[0028] 本实施例在机架1上设有升降气缸2,升降气缸2的活塞杆与升降机架5连接,本实施例的抛光盘16为6个,分别通过安装盘7安装在升降机架5上,并由抛光电机3驱动,抛光盘16上的中心孔分别与抛光液分流装置4连接;所述安装盘7由安装在升降机架5上的公转电机6驱动。 [0028] The present embodiment has a lifting cylinder 2, a piston rod connected to the lifting cylinder 2 and the lift frame 5 on the frame 1, the polishing platen 16 of the present embodiment six, respectively, through the mounting plate 7 is mounted in the lift frame 5 , the polishing by the drive motor 3, the central hole 16 on the polishing disc 4 respectively connected to the shunt means a polishing liquid; the mounting plate 7 is driven by a motor mounted on the revolving frame 5 of the elevator 6.

[0029]本发明工作时,机械手将工件17移至真空吸盘,在PLC的控制下,工作平台8由水平移动驱动电机12带动水平匀速直线移动,根据设定的压强,PLC根据工作平台8的位移量近似计算抛光盘16与工件17的接触面积S,通过比例换向阀确定对升降气缸2的升、降控制,抛光盘16在自转的同时通过安装盘7公转,对工件17进行抛光,图5所示为本发明的加工压力曲线图。 [0029] In operation of the present invention, the robot 17 moves the vacuum chuck the workpiece, under the control of the PLC, the working platform 8 is driven by a horizontal drive motor 12 moves horizontally uniform linear movement according to the set pressure, according to the working platform 8 PLC approximate displacement amount calculating polishing disc 16 and the contact area S of the workpiece 17, the lifting cylinder is determined to 2 liters by the proportional valve, down control, while rotation of the polishing disc 16 by the disc 7 is mounted revolving on the workpiece 17 is polished, FIG processing pressure curve shown in FIG. 5 of the present invention.

[0030] 由于抛光盘16以1000转/分钟左右的速度高速旋转(现有抛光速度为300转/分钟左右),产生大量的热量,因此,乳状抛光液经抛光液分流装置4分别进入抛光盘16的中心孔并流出对工件17进行冷却,同时,冷却水也对工作平台8进行冷却,以保持抛光作业时的最佳工作环境处于25 ±5 °C之间。 [0030] Since the polishing of about 16 to 1000 revolutions / min with high-speed rotation (prior polishing speed of 300 revolutions / min or so), a lot of heat, and therefore, a polishing liquid emulsion polishing liquid through the shunt into the polishing apparatus 4 respectively central bore 16 and out of the workpiece 17 is cooled, while the cooling water also cools the work platform 8, in order to maintain the polishing operation when the optimum operating environment is between 25 ± 5 ° C.

[0031] 本发明所述抛光液分流装置4包括进液管、分流主室,分流主室与抛光电机3的主轴联接,分流主室通过分流管与抛光盘16的中心孔联接;进液管与分流主室、分流管与抛光盘16的中心孔之间由密封件密封,以保证抛光盘16在自转与公转时乳状抛光液不漏出。 [0031] The polishing liquid of the present invention comprises a split inlet pipe means 4, the main chamber shunt, the shunt main shaft coupled with the polishing chamber of the motor 3, the shunt and the main chamber through the shunt tubes polishing disc center hole 16 of the coupling; inlet tube shunt main chamber, a shunt between the tubes and the polishing disc center hole 16 is sealed by seal 16 to ensure that the polishing does not leak when the rotation and revolution of the polishing liquid emulsion.

[0032] 本发明在抛光盘16进行旋转运动的同时,放置有工件17的工作平台8进行水平直线移动,同时,抛光盘16在自转的同时通过安装盘7公转。 [0032] Also the present invention rotational movement of the polishing platen 16, the workpiece 17 is placed in the working platform 8 is linearly moved horizontally, while, at the same time the rotation of the polishing platen 16 by the revolving mounting plate 7. 这样,一是由于工件17的抛光为间歇性作业,冷却时间较长,可以有效的防止热量过度集中造成的工件17破碎,所以抛光盘16 可以以一个较高速度进行旋转,从而实现高速抛光作业;二是由于工作平台8的水平直线移动,避免了工件17长时间磨削的线速度差异,从而提高了产品成品率;三是由于工件17的形状以方形居多,工作平台8可设置成方形,使得工作平台8的空间利用率高,降低了对摆片的要求;四是工作平台8上的工件始终只有部分处于抛光盘16下,当"炒机"现象发生时,只有抛光盘16下的工件17会受到破坏,从而降低了"炒机"给加工带来的损失;同时,本发明大大提高了生产效率并为实现流水线生产打下了基础,抛光装置布局合理紧凑、操作维护简单方便、故障率低、设备使用寿命长。 Thus, first, because of the polishing of the workpiece 17 intermittent operations, longer cooling time, can effectively prevent the workpiece 17 caused by excessive heat concentration broken, the polishing disc 16 can be rotated at a higher speed, thereby achieving high-speed polishing operations ; Second, because the horizontal linear movement of the work platform 8, the linear velocity difference is avoided prolonged grinding of a workpiece 17, thereby increasing the production yield; third is due to the square shape of the workpiece 17 is mostly working platform 8 may be disposed in a square , so that the working platform 8 of space utilization, reducing the requirements for the air pump; Fourth workpiece 8 on the work platform is always only a part of the lower polishing plate 16, when the "fry machine" phenomenon, only polishing 16 the workpiece 17 can be damaged, thereby reducing the loss "of speculation" to bring the process; the same time, the present invention greatly improves the production efficiency and to streamline the production of the foundation, compact and reasonable layout of the polishing apparatus, easy operation and maintenance, low failure rate, long service life of equipment.

Claims (3)

1. 一种超薄、易脆性工件用曲面抛光机的工作台,它包括机架,其特征是机架上设有导轨,工作平台通过与导轨配合的滑块安装在导轨上,使工作平台可在导轨上滑动,工作平台上设有链条安装座,机架上设有水平移动驱动电机、从动链轮、由水平移动驱动电机带动的主动链轮,链条绕在主动链轮和从动链轮上,两端分别与链条安装座连接;所述的工作平台上设有对工作平台进行冷却的冷却机构和安装工件的吸附机构;所述的冷却机构包括设在工作平台内的蛇形水道,与蛇形水道连通的进水接头、出水接头,进水管、出水管安装在拖链上并分别与进水接头、出水接头连接,拖链一端固定在机架上,另一端固定在工作平台上;所述的吸附机构包括设在工作平台内的真空气路、安装在工作平台上与真空气路连通的真空吸盘。 A thin, surface friability of the workpiece table with a polishing machine which comprises a machine frame, characterized in that the rack rail is provided, the guide rail by fitting work platform mounted on slider rails, that the working platform can slide on the rail, is provided on the chain mount the work platform, the horizontal movement is provided on the rack drive motor, a driven sprocket, driven by the motor drives the horizontal movement of the drive sprocket, the chain around the drive sprocket and the driven upper sprocket, the chain ends are connected to the mount; provided on the working platform and the cooling mechanism for cooling the adsorbing mechanism mounting a workpiece on said work platform; said cooling means comprises a work platform provided in the serpentine waterways, watercourses serpentine communication with the inlet connector, the outlet connector, inlet pipe, outlet pipe mounted on the drag chain and are connected to the inlet connector, the outlet connector, towline end fixed to the frame, fixed on the other end platform; said suction means comprises a vacuum air passage provided in the working platform is mounted on the working platform vacuum chuck vacuum air passage communicating with the.
2. 根据权利要求1所述超薄、易脆性工件用曲面抛光机的工作台,其特征是所述的工作平台为方形。 2. The method of claim 1 thin, surface friability of the workpiece table with a polishing machine, characterized in that the working platform is square.
3. 根据权利要求1或2所述超薄、易脆性工件用曲面抛光机的工作台,其特征是所述的工作平台上分别开有水槽和气槽,并通过封板封闭,从而形成蛇形水道与真空气路;与真空气路的对应处设有基板,基板上安装有真空吸盘。 According to claim 1 or 2 thin, surface friability of the workpiece table with a polishing machine, characterized in that the grooves are opened on the gas tank of the work platform, and closed by a closure plate to form a serpentine waterways and true air passage; and the corresponding real air passage is provided at the substrate, the substrate is mounted on the vacuum chuck.
CN201310734829.XA 2013-12-27 2013-12-27 Surface polishing machine table CN103692331B (en)

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CN104551935A (en) * 2014-12-26 2015-04-29 张现柱 Automatic polisher for arc panel
CN106181681A (en) * 2016-08-31 2016-12-07 天通银厦新材料有限公司 Accurate grinding device for sapphire processing

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CN203680007U (en) * 2013-12-27 2014-07-02 湖南宇晶机器股份有限公司 Working platform of cambered polishing machine

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US6193588B1 (en) * 1998-09-02 2001-02-27 Micron Technology, Inc. Method and apparatus for planarizing and cleaning microelectronic substrates
CN201070735Y (en) * 2007-08-07 2008-06-11 霍秀荣 Polishing machine
CN101244539A (en) * 2007-12-29 2008-08-20 浙江工业大学 Polisher for free curve flexibility of mold
CN101407040A (en) * 2008-11-11 2009-04-15 广东工业大学 Face lapping mill with abrasive disk cooling mechanism
CN201664877U (en) * 2010-04-07 2010-12-08 吴航武 Full-automatic iron plate polishing machine
CN203680007U (en) * 2013-12-27 2014-07-02 湖南宇晶机器股份有限公司 Working platform of cambered polishing machine

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