CN103681182B - Plasma heating means and processing equipment - Google Patents

Plasma heating means and processing equipment Download PDF

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Publication number
CN103681182B
CN103681182B CN 201210325724 CN201210325724A CN103681182B CN 103681182 B CN103681182 B CN 103681182B CN 201210325724 CN201210325724 CN 201210325724 CN 201210325724 A CN201210325724 A CN 201210325724A CN 103681182 B CN103681182 B CN 103681182B
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support
heating
base
support base
plate
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CN 201210325724
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Chinese (zh)
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CN103681182A (en )
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张阳
赵梦欣
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北京北方微电子基地设备工艺研究中心有限责任公司
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Abstract

一种加热装置及等离子体加工设备,加热装置包括升降装置、支撑底座、支撑柱和加热单元,其中,加热单元设置在支撑底座的上方;支撑柱与支撑底座固定连接,并且支撑柱的顶端高于加热单元的顶端;升降装置与支撑底座连接,用以驱动支撑底座上升或下降;当所述托盘位于加热单元上方时,所述升降装置驱动所述支撑底座上升,以使所述支撑底座带动所述支撑柱同步上升,由所述支撑柱将所述托盘顶起,以使所述托盘置于所述支撑柱的顶端,由加热单元以热辐射方式加热托盘,从而间接加热所述被加工工件。 A heating apparatus and a plasma processing apparatus, the heating means comprises a lifting device, the support base, the support column and a heating unit, wherein the heating unit is disposed above the support base; top supporting column is fixedly connected to the support base, and the support column high to the top of the heating means; and the support base connected to the lifting means for driving the support base up or down; when the tray is located above the heating means, the lifting means for driving said support base rises, so that the support base drive the support post rising, by the support post to the tray from the top, so that the tray placed on top of the support column, thermal radiation manner trays heated by the heating means, thereby indirectly heating the workpiece workpiece. 该加热装置不仅简化了被加工工件的装载过程,从而可以提高装载效率;而且结构简单,制造成本低。 The heating means not only simplifies the process of loading the workpieces, which can improve loading efficiency; simple structure, low manufacturing cost.

Description

加热装置及等离子体加工设备 Plasma heating means and processing equipment

技术领域 FIELD

[0001]本发明涉及半导体设备制造技术领域,具体地,涉及一种加热装置及等离子体加工设备。 [0001] The present invention relates to a technical field of semiconductor devices, particularly, to a heating apparatus and a plasma processing apparatus.

背景技术 Background technique

[0002]在采用半导体设备进行工艺的过程中,具有很多需要对被加工工件进行加热的工艺,而且不同的工艺对加热的温度、均匀性、升温速率等指标的要求也不尽相同,因而相应的加热装置的结构也千变万化。 [0002] During the process for a semiconductor device having many processes require heating the workpiece to be machined, and different process requirements of the heating temperature index, uniformity, and heating rate are not the same, and thus the corresponding the structure of the heating means is also changing.

[0003]目前,加热装置普遍为电阻丝加热器,但其制造成本较高,而且,由于电阻丝加热器需要通过与承载被加工工件的托盘相接触才能将产生的热量传导至托盘,再由托盘加热被加工工件,因而就需要增设PIN提升装置,以在装卸被加工工件的过程中,与机械手配合将载有被加工工件的托盘传递至电阻丝加热器的上表面或自电阻丝加热器的上表面移开。 Heat [0003] Currently, common heating means is a resistive wire heater, but its high manufacturing cost, and, since the resistance wire heater needs to be in contact with the carrying tray through the machining of a workpiece can be conducted to produce the tray, and then by heating the workpiece pallet, and therefore requires an additional PIN lifting means to be in the process of loading and unloading the workpiece, the robot is transferred with the tray carrying the workpiece to the upper surface of the heater resistance wire or resistance wire heater from on the surface is removed.

[0004]图1为现有的等离子体加工设备的结构示意图。 [0004] FIG. 1 is a schematic structural diagram of a conventional plasma processing apparatus. 请参阅图1,等离子体加工设备包括反应腔室10、升降装置、用于承载被加工工件的托盘12以及用于传输托盘12的机械手(图中未示出)。 Please refer to FIG. 1, a plasma processing apparatus includes a reaction chamber 10, the lifting means for carrying the tray 12 and a workpiece transfer robot for tray 12 (not shown). 其中,底座112设置于反应腔室10内的底部,用以在实施工艺时承载托盘12。 Wherein, at the bottom of base 112 is provided in the reaction chamber 10, for carrying the tray 12 in the implementation of the process. 在底座112内且靠近其上表面的位置处设置有加热丝111,用以加热放置于底座112上表面的托盘12,从而间接地加热被加工工件。 At the position of the surface is provided with a heating wire 111 within the base 112 and adjacent thereto for heating the base 112 is placed on the surface of the tray 12, thereby indirectly heating the workpiece to be machined. 升降装置包括波纹管11,其与底座112连接,用以驱动底座112上升或下降。 Lifting means includes a bellows 11, which is connected to the base 112, the base 112 for driving up or down. 为了实现被加工工件的装卸,需要在底座112的下方设置单独的PIN提升装置13,用以与机械手配合将托盘12传递至底座112的上表面,或将托盘12自底座112的上表面移开。 In order to load and unload the workpieces, arranged below the base 112 requires a separate PIN lifting apparatus 13 for the robot with the tray 12 to the upper surface of the base 112 or the upper surface of the tray 12 is moved away from the base 112 . PIN提升装置13包括顶针131以及用于驱动顶针131的升降驱动电机132,在升降驱动电机132的驱动下,顶针131的顶端可高出或低于底座112的上表面。 PIN lifting device 13 comprises a lift pin 131 and ejector 131 for driving the driving motor 132, the vertical motion drive motor 132, the top of thimble 131 may be above or below the upper surface of the base 112.

[0005]上述等离子体加工设备装载被加工工件的过程为:机械手将载有被加工工件的托盘12传输至反应腔室10内且位于底座112的上方;升降驱动电机132驱动顶针131上升,直至顶针131将托盘12顶起;空载的机械手移出反应腔室10;升降驱动电机132驱动载有托盘12的顶针131下降,直至托盘12被放置于底座112的上表面,从而完成被加工工件的装载。 [0005] The plasma processing apparatus loaded workpiece to be machined process: the robot would contain above the base 112 of the tray 12 transfer the workpiece to the reaction chamber 10 and; lift driving motor 132 drives the ejector pins 131 rises, until thimble 131 to the tray 12 from the top; load robot out of the reaction chamber 10; lift driving motor 132 drives the carrier thimble tray 12 131 lowered until the tray 12 is placed on the upper surface of the base 112, thereby completing the workpiece load.

[0006]由上可知,现有的等离子体加工设备需要借助单独的PIN提升装置13才能将载有被加工工件的托盘12放置在底座112上,其装卸过程复杂,从而降低了等离子体加工设备的加工效率。 [0006] From the above, the conventional plasma processing apparatus need to use separate lifting means 13 PIN to be laden tray workpiece 12 placed on the base 112, which loading and unloading process is complicated, thereby reducing the plasma processing apparatus the processing efficiency. 并且,PIN提升装置13不仅增加了等离子体加工设备的结构复杂性,而且提高了等离子体加工设备的制造成本。 And, PIN lifting device 13 not only increases the complexity of the structure of a plasma processing equipment, but also increases the manufacturing cost of the plasma processing apparatus.

发明内容 SUMMARY

[0007]本发明旨在至少解决现有技术中存在的技术问题之一,提出了一种加热装置及等离子体加工设备,其不仅装载被加工工件的过程简单,而且简化了等离子体加工设备的结构。 [0007] The present invention is to solve at least one of the prior art technical problems, proposed a heating apparatus and a plasma processing apparatus, the loading process is not only simple machining a workpiece, and simplified plasma processing apparatus structure.

[0008]为实现本发明的目的而提供一种加热装置,用于加热承载有被加工工件的托盘,其包括:升降装置、支撑底座、支撑柱和加热单元,其中:所述加热单元设置在所述支撑底座的上方;所述支撑柱与所述支撑底座固定连接,并且所述支撑柱的顶端高于所述加热单元的顶端;所述升降装置与所述支撑底座连接,用以驱动所述支撑底座上升或下降;当所述托盘位于加热单元上方时,所述升降装置驱动所述支撑底座上升,以使所述支撑底座带动所述支撑柱同步上升,由所述支撑柱将所述托盘顶起,以使所述托盘置于所述支撑柱的顶端,由所述加热单元以热辐射方式加热所述托盘,从而间接加热所述被加工工件。 [0008] In order to achieve the object of the present invention to provide a heating means for heating the tray carrying a workpiece, comprising: a lifting device, the support base, the support column and a heating unit, wherein: the heating unit is provided above the base of the support; the support column is fixedly connected to the support base, and the top end of the support column above the top of the heating unit; the lifting means is connected to said supporting base, for driving the said support base up or down; when the tray is located above the heating means, the lifting means for driving said support base rises, so that the support base to drive the support column rising, by the said support column tray from the top, so that the tray placed on top of the support column, the unit is heated by radiation heat by the heating of the tray, thereby indirectly heating the workpiece to be machined.

[0009]其中,所述支撑柱采用绝缘材料制作,所述绝缘材料为陶瓷或石英。 [0009] wherein the support column using an insulating material, the insulating material is a ceramic or quartz.

[0010]其中,所述支撑柱包括采用绝缘材料制作的绝缘部和采用金属材料制作的固定部,所述固定部的底部与所述支撑底座连接,所述固定部的顶部与所述绝缘部连接,所述托盘置于所述绝缘部的顶端。 [0010] wherein the support column comprises an insulated portion of the insulating material and the metal material with a fixed portion of the bottom portion of the fixing portion of the support base is connected to the top of the fixing portion and the insulating portion connection, the tray placed on top of the insulating portion.

[0011]其中,所述绝缘材料为陶瓷或石英;所述金属材料为不锈钢或普通钢。 [0011] wherein the insulating material is a ceramic or quartz; the metal material is stainless steel or ordinary steel.

[0012]其中,所述支撑柱的数量为三个以上,且沿所述支撑底座的周向均匀分布。 Quantity [0012] wherein the support column is three or more, and said support base along a circumferential direction uniformly distributed.

[0013]其中,所述加热单元包括:发热元件、导电部件、真空电极以及电源,其中,所述真空电极固定在所述支撑底座上,且所述真空电极的顶端高于所述支撑底座的上表面,所述真空电极的底端低于所述支撑底座的下表面;所述发热元件通过所述导电部件与所述真空电极的顶端电连接,其用于朝向所述托盘辐射热量;所述电源与所述真空电极的底端电连接,其用于向所述发热元件提供电能。 [0013] wherein, said heating unit comprising: a heating element, the conductive member, and a power supply electrode vacuum, wherein the vacuum electrode is secured to the support base, and the top electrode is higher than the vacuum of the support base an upper surface, a bottom end of the electrode is lower than the vacuum support the lower surface of the base; said heat generating element by electrically connecting the conductive member to the top of the vacuum electrode for radiating heat toward said tray; the said bottom end of said vacuum power electrode electrically connected for providing electrical energy to said heat generating element.

[0014]其中,所述发热元件为红外辐射灯或电阻丝。 [0014] wherein said heating element is a resistance wire or infrared light radiation.

[0015]其中,所述加热单元还包括导电部件保护罩,所述导电部件保护罩将所述导电部件包覆起来;所述导电部件保护罩采用陶瓷或石英制作。 [0015] wherein, the heating unit further comprising a protective cap conductive member, the conductive protective cover member covering the conductive member together; the guard conductive member made of quartz or ceramic.

[0016]其中,所述真空电极包括导电铜棒和陶瓷焊接部件,所述导电铜棒与所述支撑底座连接,并且所述导电铜棒的顶端高于所述支撑底座的上表面,所述导电铜棒的底端低于所述支撑底座的下表面;所述发热元件与所述导电铜棒的顶端电连接,所述电源与所述导电铜棒的底端电连接;所述陶瓷焊接部件套设于所述导电铜棒的外侧且位于所述支撑底座的上方。 [0016] wherein the vacuum electrode comprises a conductive copper member and the ceramic welding, the copper conductive connection with the support base, and the top conductive surface of copper is higher than the upper base of the support, the conductivity copper bottom is below the lower surface of the base support; the top of the heating element and the electrically conductive copper bars connected to the power source and the bottom end is connected electrically conductive copper bars; the ceramic welding the sleeve member disposed on the outside of the conductive copper rod and positioned above the support base.

[0017]其中,所述加热单元还包括电极保护罩,用以防止所述陶瓷焊接部件过热;所述电极保护罩包括保护罩底板和保护罩侧板,所述保护罩侧板为筒状,所述保护罩侧板与所述保护罩底板固定连接,且所述保护罩底板和所述保护罩侧板形成一保护空间,所述真空电极位于所述保护罩底板上方的部分置于所述保护空间内;所述保护罩底板固定在所述支撑底座的上表面,在所述保护罩底板上设有贯穿其厚度的通孔,所述真空电极的底端穿过所述通孔后与所述电源电连接。 [0017] wherein said heating unit further comprises a guard electrode, to prevent overheating of the ceramic welding member; said protective cover comprises a protective shield electrode plate and a guard plate, the guard plate into a cylindrical shape, the protective cover is fixedly connected to the bottom plate and the protective cover, the protective cover and the protective cover plate and base plate forming a protective space, the vacuum portion of the cover electrode is located above said base plate interposed between the protective after the protective cover plate secured to the upper surface of the support base, a through hole penetrating in the thickness of the protective cover on the bottom plate, the bottom electrode of the vacuum through said holes; protected space the power source is connected.

[0018]其中,所述保护罩底板和所述保护罩侧板的外表面设有反射膜,用以将所述发热元件辐射的热量朝向所述托盘方向反射。 [0018] wherein the protective cover plate and the protective cover plate is provided with an outer surface of the reflection film for the heat generating element to the heat radiated toward the direction of the reflector tray.

[0019]其中,所述加热单元还包括至少一层隔热板,所述隔热板设置于所述支撑底座与所述发热元件之间,用以防止所述支撑底座因受到所述发热元件的辐射而过热;所述至少一层隔热板在垂直于所述支撑底座上表面的方向上间隔设置。 [0019] wherein, the heating unit further comprising at least one insulating plate, the insulating plate disposed between the base and the heat generating element to the support, the support base for preventing the heat generating element due to being radiation from overheating; said at least one thermal shield spaced in a direction perpendicular to the base surface of said support.

[0020]其中,所述加热单元还包括反射板,所述反射板设置于所述发热元件的下方,用以将所述发热元件辐射的热量朝向所述托盘方向反射。 [0020] wherein said heating unit further includes a reflection plate, a reflection plate disposed below said heat generating element, the heat generating element to the heat radiated toward the direction of the reflector tray.

[0021]其中,所述加热单元还包括侧反射板,所述侧反射板设置于所述支撑底座的外周缘,用以减少热量自所述支撑底座的外周缘损失。 [0021] wherein said heating means further comprises a side reflection plate, a reflection plate provided on the outer side of the peripheral edge of the support base to reduce the heat loss from the outer periphery of the support base.

[0022]其中,所述升降装置包括基座、升降驱动源、密封件以及冷却水管路,其中,所述基座与所述支撑底座连接,所述升降驱动源与所述基座连接,在所述升降驱动源的驱动下,所述基座带动所述支撑底座上升或下降;所述密封件设置于所述基座与支撑底座之间,用以将所述基座与支撑底座之间的缝隙密封;在所述基座的上表面且紧靠所述密封件的内侧或外侧设置有凹槽,或者,在所述支撑底座的下表面且紧靠所述密封件的内侧或外侧设置有凹槽,所述冷却水管路设置于所述凹槽内部,在所述冷却水管路内通入冷却水以冷却所述密封件。 [0022] wherein said lifting means comprises a base, a lift driving source, and a cooling water conduit sealing member, wherein the base and the support base is connected to the elevating drive source is connected to the base, in under the lifting drive source is driven to drive the base of the support base up or down; the seal member disposed between the support base and to the base, between the base and to the support base the gap seal; on the surface of the base and against the inner or outer seal is provided with grooves or the lower surface of the support base and disposed against the inside or outside of the seal a recess, the cooling pipes disposed in said inner recess within the cooling water passage to cool the cooling water through the seal.

[0023]本发明还提供一种等离子体加工设备,其包括反应腔室,在所述反应腔室内的底部设置有加热装置,所述加热装置采用了本发明提供的上述加热装置。 [0023] The present invention further provides a plasma processing apparatus which includes a reaction chamber, the bottom of the reaction chamber is provided with heating means, said heating means said heating means employed by the present invention.

[0024]本发明具有以下有益效果: [0024] The present invention has the following advantages:

[0025]本发明提供的加热装置,其通过支撑柱来支撑承载被加工工件的托盘,而且采用热辐射的方式加热被加工工件,机械手无需借助单独的PIN提升装置,只需通过升降装置的上升或下降带动加热装置整体上升或下降,即可将托盘放置在支撑柱的顶端或自支撑柱的顶端移开,从而完成被加工工件的装卸。 [0025] The heating apparatus of the present invention provides, by a support column to support the carrier by the tray workpiece, and thermal radiation way heating the workpiece, the robot without the aid of a separate PIN lifting device simply by raising the pull means or lowering the entire heating means driven up or down, the tray can be placed on top of the support column or removed from the distal end of the support column, thereby completing the loading of the workpiece. 这不仅可以简化被加工工件的装卸过程,从而提高等离子体加工设备的加工效率,而且还可以简化等离子体加工设备的结构,降低等离子体加工设备的制造成本。 This not only simplifies the process of loading and unloading the workpiece, thus improving the processing efficiency of the plasma processing equipment, but also simplify the structure of the plasma processing equipment, to reduce the manufacturing cost of the plasma processing equipment.

[0026]本发明提供的等离子体加工设备,其通过采用上述加热装置,可以无需借助单独的PIN提升装置而完成被加工工件的装卸,从而不仅可以简化被加工工件的装卸过程,进而提高等离子体加工设备的加工效率,而且还可以简化等离子体加工设备的结构,进而降低等离子体加工设备的制造成本。 [0026] The plasma processing apparatus according to the present invention provides, by using the above heating means, can be accomplished without handling the workpieces by means of a separate lifting device PIN to be not only simplifies the process of loading and unloading the workpiece, thus improving plasma processing efficiency of the apparatus, but also to simplify the structure of the plasma processing apparatus, thereby reducing the manufacturing cost of the plasma processing apparatus.

附图说明 BRIEF DESCRIPTION

[0027]图1为现有的等离子体加工设备的结构示意图; [0027] FIG. 1 is a schematic structural diagram of a conventional plasma processing device;

[0028]图2为本发明第一实施例提供的加热装置的结构示意图; [0028] FIG. 2 is a schematic structure of the heating apparatus according to a first embodiment of the present invention;

[0029]图3a为本发明第二实施例提供的加热装置的剖面图; [0029] Figure 3a is a sectional view of a heating apparatus according to a second embodiment of the invention provided;

[0030]图3b为图3a中沿AA线的剖面图;以及 [0030] Figure 3b is a cross-sectional view taken along line AA of FIG. 3a; and

[0031]图3c为图3a所示加热装置的俯视图。 [0031] Figure 3c is a top view of the heating apparatus shown in FIG. 3a.

具体实施方式 Detailed ways

[0032]为使本领域的技术人员更好地理解本发明的技术方案,下面结合附图来对本发明提供的加热装置及等离子体加工设备进行详细描述。 [0032] to enable those skilled in the art better understand the technical solution of the present invention, described in detail below in conjunction with a heating device and a plasma processing apparatus of the present invention to provide the accompanying drawings.

[0033]图2为本发明第一实施例提供的加热装置的结构示意图。 [0033] FIG. 2 is a schematic structure of the heating apparatus according to a first embodiment of the present invention. 请参阅图2,加热装置包括:用于承载被加工工件的托盘65、升降装置80、支撑底座25、支撑柱40和加热单元70。 Please refer to FIG. 2, the heating device comprising: a tray for carrying the workpiece 65, the lifting device 80, the support base 25, a support column 40 and the heating unit 70. 其中,加热单元70设置于支撑底座25的上方;支撑柱40与支撑底座25固定连接,并且支撑柱40的顶端高于加热单元70的顶端。 Wherein the heating unit 70 disposed above the support base 25; support column 40 is fixedly connected to the support base 25, and the top of the support column 40 is higher than the top 70 of the heating unit. 当托盘65位于加热单元70上方时,升降装置80驱动支撑底座25上升,以使其带动支撑柱40同步上升,直至支撑柱40的顶端将托盘65顶起,从而使托盘65置于支撑柱40的顶端。 When the tray 65 is located above the heating unit 70, the lifting device 80 drives the support base 25 moves upward, so as to drive the support column 40 rising, until the top of the support column 40 from the tray 65, the tray 65 is placed so that the support posts 40 top. 在实施工艺的过程中,加热单元70采用热辐射的方式加热托盘65,从而间接加热被加工工件。 In the process embodiment of the process, the heating unit 70 is heated using thermal radiation way tray 65, thereby indirectly heating the workpiece to be machined.

[0034]借助支撑柱40来支撑承载被加工工件的托盘65,以及借助加热单元70采用热辐射的方式来加热被加工工件,可以使机械手无需借助单独的PIN提升装置,只需通过升降装置80的上升或下降,即可将托盘65放置在支撑柱40的顶端或自支撑柱40的顶端移开,从而完成被加工工件的装卸。 [0034] by means of support posts 40 to support the carrier by the tray 65 workpiece, and by way of thermal radiation heating element 70 to heat the workpiece to be machined, you can make the robot without the aid of a separate PIN lifting device simply by the lifting device 80 up or down, the tray 65 can be placed on top of the support column 40, or from the top of the support column 40 is removed, thereby completing the loading and unloading workpieces. 这不仅可以简化被加工工件的装卸过程,从而提高等离子体加工设备的加工效率,而且还可以简化等离子体加工设备的结构,降低等离子体加工设备的制造成本。 This not only simplifies the process of loading and unloading the workpiece, thus improving the processing efficiency of the plasma processing equipment, but also simplify the structure of the plasma processing equipment, to reduce the manufacturing cost of the plasma processing equipment.

[0035]图3a为本发明第二实施例提供的加热装置的剖面图。 [0035] Figure 3a is a sectional view of a heating apparatus of a second embodiment of the present invention provides. 图3b为图3a中沿AA线的剖面图。 Figure 3b is a sectional view along line AA in FIG. 3a. 图3c为图3a所示加热装置的俯视图。 Figure 3c is a top view of the heating device shown in Figure 3a. 请一并参阅图3a、图3b和图3c,本实施例提供的加热装置包括托盘65、升降装置80、支撑底座25、支撑柱40和加热单元70。 Referring to Figures 3a, 3b and to Figure 3c, the present embodiment comprises a heating means provided in the tray 65, the lifting device 80, the support base 25, a support column 40 and the heating unit 70. 其中,加热单元70设置于支撑底座25的上方,用以采用热辐射的方式加热托盘65,从而间接加热被加工工件;支撑柱40与支撑底座25固定连接,并且支撑柱40的顶端高于加热单元70的顶端,托盘65能够置于支撑柱40的顶端。 Wherein the heating unit 70 disposed above the support base 25, the thermal radiation for heating manner tray 65, thereby indirectly heating the workpiece to be machined; support column 40 is fixedly connected to the support base 25, and the support column 40 is higher than the top heating the top unit 70, the tray 65 can be placed on top of the support column 40. 升降装置80与支撑底座25连接,用以驱动支撑底座25上升或下降,以使支撑底座25能够带动支撑柱40上升或下降。 Lifting device 25 is connected to the support base 80, for driving the support base 25 up or down, so that the support base 25 can drive the support column 40 is raised or lowered.

[0036]在本实施例中,支撑柱40的数量为三个,且沿支撑底座25的周向均匀分布,并且支撑柱40固定在支撑底座25上且紧靠支撑底座25的外周缘设置。 [0036] In the present embodiment, the number of support posts 40 is three, circumferentially evenly distributed and the support base 25 and the support column 40 is fixed to the support base and the support base 25 abuts against the outer peripheral edge 25 is set. 支撑柱40包括绝缘部41和固定部42,固定部42的底部与支撑底座25连接,固定部42的顶部与绝缘部41连接,托盘65置于绝缘部41的顶端。 Support column 40 includes an insulating portion 41 and the fixing portion 42, and a bottom portion 42 of the fixed support base 25 is connected to the top of the insulating portion 41 is connected to the fixed portion 42, the tray 65 is placed on top of the insulating portion 41. 并且,绝缘部41采用陶瓷或石英等绝缘材料制作,用以使托盘65的电位悬浮;固定部42采用不锈钢或普通钢等金属材料制作,用以提高支撑柱40的强度,从而提高加热装置结构的可靠性。 Further, the insulating portion 41 using a ceramic insulating material or the like quartz, the potential for the suspended tray 65; fixing portion 42 is made of metal like stainless steel or ordinary steel production, to improve the strength of the support column 40, thereby improving the heating device structure reliability.

[0037]在本实施例中,加热单元70包括发热元件、导电部件8、真空电极19以及电源(图中未示出)。 [0037] In the present embodiment, the heating unit includes a heating element 70, the conductive member 8, and a power supply electrode 19 vacuum (not shown). 其中,发热元件为两个相互平行的条形红外辐射灯7,其设置于支撑底座25的上方,用以采用热辐射的方式加热位于其上方的托盘65,托盘65再将吸收的热量传导至被加工工件,即红外辐射灯7间接地加热被加工工件。 Wherein the heating element is a two mutually parallel strip-shaped infrared radiation lamp 7, which is disposed above the support base 25 for heating the thermal radiation mode 65 located above the tray, the tray 65 and then the heat is conducted to the absorption workpiece to be machined, i.e. infrared radiation lamp 7 is heated indirectly workpiece. 而且,红外辐射灯7通过导电部件8与导电铜棒20的顶端电连接;电源与导电铜棒20的底端电连接,用以向红外辐射灯7提供电能。 Moreover, the infrared radiation lamps 78 are connected by the conductive member 20 and the top of the electrically conductive copper; bottom power conductivity copper with an electrical connector 20 for providing electrical power to an infrared radiation lamp 7.

[0038]真空电极19固定在支撑底座25上且位于支撑底座25的中部,真空电极19包括导电铜棒20和陶瓷焊接部件21,导电铜棒20穿过支撑底座25,导电铜棒20的顶端高于支撑底座25的上表面,导电铜棒20的底端低于支撑底座25的下表面;陶瓷焊接部件21套设于导电铜棒20的外侧且位于支撑底座25的上方,用以保证导电铜棒20位于支撑底座25上方的部分与外界电绝缘。 [0038] The vacuum electrode 19 fixed to the support base 25 and the central electrode is located in vacuo support 19 comprises a base 25 of a conductive copper member 20 and the ceramic welding 21, 20 through the conductive copper support base 20 to the top 25 of the conductive copper higher than the upper surface of the support base 25, the bottom end 20 is lower than the conductivity copper rod or support the lower surface of the base 25; ceramic welding sleeve member 21 disposed on the outer side 20 and a conductive copper positioned above the support base 25 to ensure the conductive copper portion 20 is located outside the electrically insulating support above the base 25.

[0039]加热单元70还包括采用陶瓷或石英制作的导电部件保护罩,其将导电部件8包覆起来,用以使导电部件8与外界电绝缘,从而防止导电部件8发生真空打火。 [0039] The heating unit 70 further includes a quartz or ceramic protective cover made of a conductive member, the conductive member 8 which will be covered up to the conductive member 8 is electrically insulated from the outside, the conductive member 8 so as to prevent the occurrence of ignition in vacuo. 在本实施例中,导电部件保护罩包括中部保护罩13和端部保护罩12。 In the present embodiment, the conductive member comprises a central protective cover 13 the protective cover 12 and the end portion of the protective cover. 其中,中部保护罩13与支撑底座25连接且位于支撑底座25的中部,并且中部保护罩13由左、右两个结构对称的子保护罩组成,分别为左子保护罩和右子保护罩。 Wherein, the protective cover 13 is connected to the central support base 25 and in the middle of the support base 25, the protective cover 13 and the center of the left and right two symmetrical sub protective cover, namely the protective cover the protective cover to the left of the child and the right child. 通过将二者相互对接,可以将导电部件8位于支撑底座25中部的部分以及导电部件8与真空电极19的顶端电连接的部分包覆起来,从而实现所包覆的部分与外界电绝缘。 By the two mutually abutting, can be located on the conductive member 8 and the conductive member support portion 25 of the central portion of the base 8 and the cover up to the top electrode 19 is electrically connected to a vacuum in order to achieve coated with an electrically insulating portion with the outside world.

[0040]端部保护罩12固定在支撑底座25上,且分别位于红外辐射灯7的两个端部,并且端部保护罩12由上、下两个结构对称的子保护罩组成。 [0040] The end portion 12 is fixed to the protective cover on the support base 25, and two end portions located infrared radiation lamp 7, and the upper end portion 12 of the protective cover, the two sub-symmetrical protective cover composition. 通过将上、下两个子保护罩相互对接,可以将导电部件8位于红外辐射灯7的两个端部的部分以及导电部件8与红外辐射灯7的端部电连接的部分包覆起来,从而实现所包覆的部分与外界电绝缘。 By the upper and lower sub butted protective cover, the conductive member 8 may be in the infrared portion of the light radiation of the two ends of the conductive member 7 and the cover 8 together with the connecting portion 7 of the infrared radiation lamp ends electrically, whereby achieve coated with an electrically insulating portions of the outside world. 此外,端部保护罩12还可以用于支撑红外辐射灯7,以将其固定在支撑底座25的上方,这可以省去固定红外辐射灯7的固定件,从而简化了设备的结构。 Further, the end portion of the protective cover 12 may also be used to support an infrared radiation lamp 7, so as to be fixed above the support base 25, which is fixed omitted infrared radiation lamp fixing member 7, thereby simplifying the structure of the apparatus.

[0041]加热单元70还包括电极保护罩64,用以避免陶瓷焊接部件21过热而导致真空电极19损坏。 [0041] The heating unit 70 further comprises an electrode protective cover 64 to avoid overheating of the ceramic member 21 and the lead 19 welded vacuo electrode damage. 在本实施例中,电极保护罩64包括保护罩侧板66和保护罩底板67,保护罩侧板66为筒状,其与保护罩底板67固定连接,并且保护罩侧板66与保护罩底板67形成一保护空间,真空电极19位于保护罩底板67上方的部分(S卩,陶瓷焊接部件21以及真空电极19的顶端)置于该保护空间内;保护罩底板67固定在支撑底座25的上表面且位于支撑底座25的中部,并且在保护罩底板67和支撑底座25的中心位置分别设有位置相对的通孔,真空电极19的底端穿过该通孔后与电源电连接。 In the present embodiment, the electrode protection cover 64 comprises a protective cover plate 66 and bottom plate 67 the protective cover, the protective cover 66 is a cylindrical plate, which is fixedly connected to the protective cover 67 and the bottom plate, the side plate 66 and the protective cover and the protective cover plate forming a protective space 67, the protective cover 19 is positioned above the bottom plate 67 of the electrode portion of the vacuum (S Jie, the ceramic member 21 and the welding tip electrode 19 vacuum) disposed in the protective space; protective cover on the bottom plate 67 fixed to the support base 25 the supporting surface and the center of the base 25, the base plate and the protective cover 67 and the center position of the support base 25 are provided with a position opposing the through hole, the bottom end of the vacuum electrode 19 through the through holes connected to the power source. 此外,在保护罩底板67和保护罩侧板66的外表面还设置有反射膜,用以将发热元件辐射的热量朝向托盘65的方向反射,这不仅可以防止陶瓷焊接部件21因直接受到红外辐射灯7的辐射而过热,又可以降低热量损耗,从而提高发热元件的加热效率。 Further, the protective cover 67 and the outer surface of the bottom plate 66 of the protective cover is also provided with a reflection film, a heat generating element for heat radiated toward the reflection direction of the tray 65, which can not only prevent the ceramic member 21 by welding directly subjected to infrared radiation 7 overheated lamp radiation, but also reduce the heat loss, thereby improving the heating efficiency of the heating element.

[0042]加热单元70还包括设置于支撑底座25与红外辐射灯7之间的两层隔热板36,两层隔热板36在垂直于支撑底座25上表面的方向上间隔设置,用以防止支撑底座25因受到红外辐射灯7的辐射而过热。 [0042] The heating unit 70 further includes a spacer disposed in the direction of the support base 25 is provided with two insulation panel 7 between the infrared radiation lamps 36, two layers of insulation on the surface of plate 36 perpendicular to the support base 25 to prevent the support base 25 due to radiation in the infrared radiation by the lamp 7 from overheating. 容易理解,当在支撑底座25上设置有隔热板36时,上述保护罩底板67和/或导电部件保护罩可以固定在位于最上层的隔热板36上,还可以穿过隔热板36而与支撑底座25固定连接。 Be readily appreciated, when the support base 36 is provided on the heat insulating plate 25, the protective cover plate 67 and / or the protective cover can be fixed to the conductive member on the uppermost insulating plate 36, passing through the insulation panel 36 may also be 25 is fixedly connected to the support base. 并且,在隔热板36的中心位置分别设置有通孔,该通孔与设置在保护罩底板67和支撑底座25上的通孔相对设置,真空电极19的底端依次穿过保护罩底板67、隔热板36和支撑底座25上的通孔后与电源电连接;此外,真空电极19的顶端应高于位于最上层的隔热板36的上表面,以使其能够与导电部件8电连接。 Further, in the central position of each insulation plate 36 is provided with a through hole, the through hole 67 provided in the through hole 25 and a support base disposed opposite the protective cover plate, a bottom end 19 of the vacuum electrode plate 67 passes through the protective cover , insulating support base plate 36 and the rear through hole 25 is connected with a power source; in addition, the vacuum tip electrode 19 should be higher than the upper surface of the uppermost insulating plate 36 so as to be capable of electrically conductive member 8 connection.

[0043]加热单元70还包括反射板37,其设置于红外辐射灯7的下方,用以将红外辐射灯7辐射的热量朝向托盘65方向反射。 [0043] The heating unit 70 further includes a reflection plate 37, which is disposed below the lamp 7 of the infrared radiation to the infrared radiation towards the heat lamp 7 radiation reflection direction of the tray 65. 在本实施例中,反射板37固定在位于最上层的隔热板36上且在垂直于支撑底座25上表面的方向上与隔热板36间隔设置。 In the present embodiment, the reflecting plate 37 and fixed on the uppermost insulating plate 36 perpendicular to the support base 25 and the insulating spacer plate 36 is provided on the direction of the surface. 与上述隔热板36相类似的,当在位于最上层的隔热板36上设置反射板37时,上述保护罩底板67和/或导电部件保护罩可以固定在反射板37上,还可以穿过反射板37而固定在隔热板36上,或者依次穿过反射板37和隔热板36而与支撑底座25固定连接。 And the heat shielding plate 36 Similarly, when the uppermost insulating plate 37 disposed on the reflecting plate 36, the protective cover plate 67 and / or the protective cap conductive member may be fixed on the reflection plate 37 can also wear through the reflecting plate 37 is fixed to the insulating plate 36, or passes through the reflecting plate 37 and the insulation panel 36 and 25 is fixedly connected to the support base. 并且,在反射板37的中心位置同样设置有通孔,且与设置在保护罩底板67和支撑底座25上的通孔相对设置,真空电极19的底端依次穿过保护罩底板67、反射板37、隔热板36和支撑底座25上的通孔后与电源电连接;此外,真空电极19的顶端应高于反射板37的上表面,以使其能够与导电部件8电连接。 Further, in the central position of the reflecting plate 37 is also provided with a through hole, and is provided in the protective cover through hole 67 and the support base plate 25 disposed opposite the bottom end of the vacuum electrode 19 passes through the protective cover plate 67, a reflection plate 37, insulating plate 36 and the support base after the through hole 25 is connected with a power source; in addition, the vacuum tip electrode 19 should be higher than the upper surface of the reflective plate 37, so that it can be electrically connected to the conductive member 8.

[0044]加热单元70还包括侧反射板32,侧反射板32设置于支撑底座25的外周缘,用以减少热量自支撑底座25的外周缘损失,从而提高红外辐射灯7的加热效率。 [0044] The heating unit 70 further includes a side reflection plate 32, the side reflection plate 32 provided in the support an outer peripheral edge of the base 25, to reduce heat from supporting the outer circumferential edge of loss of the base 25, thereby improving the heating efficiency of the infrared radiation lamp 7.

[0045]升降装置与支撑底座25连接,用以驱动支撑底座25上升或下降,以使支撑底座25带动支撑柱40上升或下降。 [0045] The lifting device 25 is connected to the support base, the support base 25 for driving up or down, so that the support base 25 to drive the support column 40 up or down. 在本实施例中,升降装置包括基座4、升降驱动源(图中未示出)、密封件61以及冷却水管路44。 In the present embodiment, the lifting device comprising a base 4, lifting drive source (not shown), the seal member 61 and a cooling water line 44. 其中,基座4与支撑底座25连接;升降驱动源与基座4连接,在升降驱动源的驱动下,基座4带动支撑底座25上升或下降。 Wherein, the base 4 is connected to the support base 25; 4 lift driving source is connected with the base, in the lift driving source is driven, the support base 25 of the base 4 to drive up or down. 并且,升降驱动源包括气缸、电机或液压装置。 Further, the elevation driving source includes a cylinder, a motor or hydraulic means. 在装载被加工工件的过程中,传输托盘65的机械手将托盘65传输至支撑底座25的上方;升降驱动源驱动支撑底座25上升,直至支撑柱40将托盘65顶起;机械手自支撑底座25的上方移开,即完成被加工工件的装载。 In the process of loading the workpiece, the transport pallet manipulator 65 of the tray 65 is transmitted to the support above the base 25; lift driving source driving the support base 25 rises until supporting column from 40 to tray 65; robot self-supporting base 25 removing the top, i.e., completion of loading the workpiece to be machined. 由此可知,机械手无需借助单独的PIN提升装置,而只需通过升降装置的上升或下降,即可将托盘65放置在支撑柱40的顶端或自支撑柱40的顶端移开,从而完成被加工工件的装卸。 It can be seen, without the aid of separate robot PIN lifting device, but only up or down by the lifting device, the tray 65 can be placed on top of the support column 40 or from the distal end of the support column 40 is removed, thereby completing the processing loading and unloading the workpiece.

[0046] 密封件61设置于基座4与支撑底座25之间,用以将基座4与支撑底座25之间的缝隙密封。 [0046] The seal member 61 disposed on the base 4 and the support base 25 to the gap between the base 4 and the support base 25 sealed. 在本实施例中,在支撑底座25的下表面且紧靠密封件61的内侧设置有凹槽,冷却水管路44设置于该凹槽内部,并且在冷却水管路44内通入冷却水,以对密封件61进行冷却。 In the present embodiment, the lower surface of the support base 25 and seal against the inner member is provided with a recess 61, cooling pipes 44 arranged inside the groove, and opens into the cooling water in the cooling water line 44, to sealing member 61 is cooled. 在实际应用中,凹槽也可以设置在基座4的上表面,并且其不仅可以紧靠密封件61的内侧设置,还可以紧靠密封件61的外侧设置,只要设置于凹槽内的冷却水管路44能够起到冷却密封件61的作用即可。 In practice, the groove may be provided on the surface of the base 4, and which can not only against inner sealing member 61, may be provided against the outer seal member 61, as long as the cooling is provided in the grooves water conduit 44 can function as a seal member 61 can be cooled.

[0047]需要说明的是,虽然在本实施例中支撑柱40的数量为三个,但是本发明并不局限于此,在实际应用中,支撑柱40的数量也可以为四个以上,且沿支撑底座25的周向均匀分布。 [0047] Incidentally, although in the present embodiment, the number of support posts 40 is three, but the present invention is not limited to this, in practical applications, the number of support posts 40 may be four or more, and along the circumference of the support base 25 to a uniform distribution. 而且,支撑柱40也并不局限于紧靠支撑底座25的外周缘设置,其还可以固定在支撑底座25上的任意位置,只要支撑柱40能够支撑托盘65即可。 Further, the support column 40 is not limited to the outer peripheral edge against the support base 25 is provided, which may also be fixed to an arbitrary position on the support base 25, as long as the support column 40 can be capable of supporting the tray 65.

[0048]此外,支撑柱40也可以只采用绝缘材料来制作,在这种情况下,支撑柱40可以为由绝缘部41和固定部42组成的分体结构,并且绝缘部41和固定部42均采用绝缘材料制作;或者,支撑柱40还可以为采用绝缘材料制作的整体结构,并且其底端与支撑底座25连接,托盘65置于支撑柱40的顶端。 [0048] Further, only the support post 40 may be employed to produce an insulating material, in this case, by the support column 40 can be separate structures of the insulating portion 41 and the fixing portion 42, and the insulating portion 41 and the fixing portion 42 They are made of an insulating material; Alternatively, insulating material 40 may also be made of the overall support column structure, and its lower end connected to the support base 25, the tray 65 is placed on top of the support column 40. 无论支撑柱40是采用分体结构还是采用整体结构,只要其既能够保证托盘65的电位悬浮,又能够稳定地支撑托盘65即可。 Whether the support column 40 is a separate structure is adopted with the overall structure, as long as it can ensure not only the potential of the tray 65 is suspended, but also to support the tray 65 can stably.

[0049]还需要说明的是,在本实施例中,发热元件70为两个相互平行的条形红外辐射灯7,但是本发明并不局限于此,在实际应用中,发热元件也可以采用诸如螺旋状、环状等任意结构的红外辐射灯,还可以采用红外辐射灯泡。 [0049] It is further noted that, in the present embodiment, the heat generating element 70 is a two mutually parallel strip-shaped infrared radiation lamp 7, but the present invention is not limited to this, in practical application, the heating element may be used such as a spiral, like a cyclic structure of any infrared radiation lamp, the lamp may be employed also infrared radiation. 此外,发热元件还可以为任意结构的电阻丝,电阻丝同样可以产生热量,并以热辐射的方式对托盘65进行加热。 In addition, a resistance wire heating element may also be of any structure, resistance wire can also generate heat, and thermal radiation way pallet 65 is heated.

[0050]进一步需要说明的是,虽然在本实施例中隔热板36的层数为两层,但是本发明并不局限于此,在实际应用中,隔热板36的层数还可以为一层,或者三层以上。 [0050] Note further that, although the number of layers in the insulation panel embodiment 36 of the present embodiment is two layers, but the present invention is not limited to this, in practical applications, the number of layers of the insulating plate 36 may also be one, or three or more.

[0051]综上所述,本发明提供的加热装置,其通过支撑柱来支撑承载被加工工件的托盘,而且采用热辐射的方式加热被加工工件,机械手无需借助单独的PIN提升装置,只需通过升降装置的上升或下降带动加热装置整体上升或下降,即可将托盘放置在支撑柱的顶端或自支撑柱的顶端移开,从而完成被加工工件的装卸。 [0051] In summary, the present invention provides a heating apparatus, which carries the workpiece is supported by the tray support posts, and the use of thermal radiation heating the workpiece manner, without the aid of separate robot PIN lifting means only by rising or lowering the lifting device driven up or down the entire heating device can be placed on top of the tray support columns or support posts away from the distal end, thereby completing the loading and unloading workpieces. 这不仅可以简化被加工工件的装卸过程,从而提高等离子体加工设备的加工效率,而且还可以简化等离子体加工设备的结构,降低等离子体加工设备的制造成本。 This not only simplifies the process of loading and unloading the workpiece, thus improving the processing efficiency of the plasma processing equipment, but also simplify the structure of the plasma processing equipment, to reduce the manufacturing cost of the plasma processing equipment.

[0052]本发明还提供一种等离子体加工设备,其包括反应腔室,并且在反应腔室内的底部设置有加热装置,该加热装置采用本实施例提供的上述加热装置。 [0052] The present invention further provides a plasma processing apparatus which includes a reaction chamber and heating means disposed at the bottom of the reaction chamber, the heating means using the said heating means is provided in this embodiment.

[0053]本实施例提供的上述等离子体加工设备,其通过采用本实施例提供的上述加热装置,可以无需借助单独的PIN提升装置而完成被加工工件的装卸,从而不仅可以简化被加工工件的装载过程,进而提高等离子体加工设备的加工效率,而且还可以简化等离子体加工设备的结构,进而降低等离子体加工设备的制造成本。 [0053] The plasma processing apparatus of the present embodiment provided, by which the heating apparatus according to the present embodiment is provided, can be accomplished without handling of the workpiece to be machined by means of a separate lifting device PIN, so that not only can simplify the workpiece to be machined loading process, and further improve the processing efficiency of the plasma processing equipment, but also simplify the structure of the plasma processing apparatus, thereby reducing the manufacturing cost of the plasma processing apparatus.

[0054]可以理解的是,以上实施方式仅仅是为了说明本发明的原理而采用的示例性实施方式,然而本发明并不局限于此。 [0054] It will be appreciated that the above embodiments are merely illustrative of the principles of the present invention is employed in an exemplary embodiment, but the present invention is not limited thereto. 对于本领域内的普通技术人员而言,在不脱离本发明的精神和实质的情况下,可以做出各种变型和改进,这些变型和改进也视为本发明的保护范围。 For those of ordinary skill in the art, without departing from the spirit and substance of the invention can be made various modifications and improvements, these modifications and improvements into the protection scope of the invention.

Claims (16)

  1. 1.一种加热装置,用于加热承载有被加工工件的托盘,其特征在于,包括:升降装置、支撑底座、支撑柱和加热单元,其中: 所述加热单元设置在所述支撑底座的上方; 所述支撑柱与所述支撑底座固定连接,并且所述支撑柱的顶端高于所述加热单元的顶端; 所述升降装置与所述支撑底座连接,用以驱动所述支撑底座、所述支撑柱以及所述加热单元上升或下降; 当所述托盘位于加热单元上方时,所述升降装置驱动所述支撑底座上升,以使所述支撑底座带动所述支撑柱同步上升,由所述支撑柱将所述托盘顶起,以使所述托盘置于所述支撑柱的顶端,由所述加热单元以热辐射方式加热所述托盘,从而间接加热所述被加工工件。 1. A heating device for heating the tray carrying the workpiece, characterized by comprising: lifting means support base, the support column and a heating unit, wherein: the heating unit is disposed above the support base ; said support column is fixedly connected to the support base, and the top of the support column above the top of the heating unit; the lifting means is connected to said supporting base, for driving the support base, the said heating unit and a support pillar rising or falling; when the tray is located above the heating means, the lifting means for driving said support base rises, so that the support base to drive the support column rising, by the support the column tray from the top, so that the tray placed on top of the support column, the unit is heated by radiation heat by the heating of the tray, thereby indirectly heating the workpiece to be machined.
  2. 2.根据权利要求1所述的加热装置,其特征在于,所述支撑柱采用绝缘材料制作,所述绝缘材料为陶瓷或石英。 2. The heating apparatus according to claim 1, wherein said support column using an insulating material, the insulating material is a ceramic or quartz.
  3. 3.根据权利要求1所述的加热装置,其特征在于,所述支撑柱包括采用绝缘材料制作的绝缘部和采用金属材料制作的固定部,所述固定部的底部与所述支撑底座连接,所述固定部的顶部与所述绝缘部连接,所述托盘置于所述绝缘部的顶端。 3. The heating apparatus according to claim 1, characterized in that the support column comprises an insulated portion and a fixed portion of the metal material of the insulating material, the bottom of the fixed portion connected to the support base, top of the fixing portion connected to the insulating portion, the tray placed on top of the insulating portion.
  4. 4.根据权利要求3所述的加热装置,其特征在于,所述绝缘材料为陶瓷或石英;所述金属材料为普通钢。 4. The heating apparatus according to claim 3, wherein said insulating material is a ceramic or quartz; the metal material is common steel.
  5. 5.根据权利要求1所述的加热装置,其特征在于,所述支撑柱的数量为三个以上,且沿所述支撑底座的周向均匀分布。 The heating apparatus according to claim 1, characterized in that the support column is the number of three or more, and the support base uniformly distributed along the circumferential direction.
  6. 6.根据权利要求1所述的加热装置,其特征在于,所述加热单元包括:发热元件、导电部件、真空电极以及电源,其中所述真空电极固定在所述支撑底座上,且所述真空电极的顶端高于所述支撑底座的上表面,所述真空电极的底端低于所述支撑底座的下表面; 所述发热元件通过所述导电部件与所述真空电极的顶端电连接,其用于朝向所述托盘福射热量; 所述电源与所述真空电极的底端电连接,其用于向所述发热元件提供电能。 6. The heating apparatus according to claim 1, wherein said heating unit comprising: a heating element, the conductive member, and a power supply electrode vacuum, wherein the vacuum electrode is secured to the support base, and the vacuum tip electrode above an upper surface of the base of the support, the bottom end of the electrode is lower than the vacuum support the lower surface of the base; said heat generating element is electrically connected to the top electrode of the vacuum through the conductive member, which Four toward the exit tray for heat; bottom end of the power supply and the electrode is electrically connected to the vacuum, for supplying power to the heat generating element.
  7. 7.根据权利要求6所述的加热装置,其特征在于,所述发热元件为红外辐射灯或电阻丝。 7. The heating apparatus according to claim 6, wherein said heating element is a resistance wire or infrared light radiation.
  8. 8.根据权利要求6所述的加热装置,其特征在于,所述加热单元还包括导电部件保护罩,所述导电部件保护罩将所述导电部件包覆起来; 所述导电部件保护罩采用陶瓷或石英制作。 8. The heating apparatus according to claim 6, wherein said heating means comprises a conductive member further protective cover, the protective cap conductive member covering the conductive member together; said electrically conductive ceramic component boots or quartz production.
  9. 9.根据权利要求6所述的加热装置,其特征在于,所述真空电极包括导电铜棒和陶瓷焊接部件, 所述导电铜棒与所述支撑底座连接,并且所述导电铜棒的顶端高于所述支撑底座的上表面,所述导电铜棒的底端低于所述支撑底座的下表面;所述发热元件与所述导电铜棒的顶端电连接,所述电源与所述导电铜棒的底端电连接; 所述陶瓷焊接部件套设于所述导电铜棒的外侧且位于所述支撑底座的上方。 9. The heating apparatus according to claim 6, wherein the vacuum electrode comprises a conductive copper member and the ceramic welding, the copper conductive connection with the support base, and the top of the high conductivity copper upper surface of the support base, the bottom end of the conductive copper surface is below the lower support base; the top of the heating element and the electrically conductive copper bars connected to the power source and the conductive copper electrically connecting the bottom end of the rod; ceramic welding the sleeve member disposed on the outer side of the conductive copper bars and located above the support base.
  10. 10.根据权利要求9所述的加热装置,其特征在于,所述加热单元还包括电极保护罩,用以防止所述陶瓷焊接部件过热; 所述电极保护罩包括保护罩底板和保护罩侧板,所述保护罩侧板为筒状,所述保护罩侧板与所述保护罩底板固定连接,且所述保护罩底板和所述保护罩侧板形成一保护空间,所述真空电极位于所述保护罩底板上方的部分置于所述保护空间内;所述保护罩底板固定在所述支撑底座的上表面,在所述保护罩底板上设有贯穿其厚度的通孔,所述真空电极的底端穿过所述通孔后与所述电源电连接。 10. The heating apparatus according to claim 9, wherein said heating unit further comprises a guard electrode, to prevent overheating of the ceramic welding member; said protective cover comprises a protective shield electrode plate and a guard plate the protective cover plate is tubular, the protective cover plate and the bottom plate is fixedly connected to the protective cover, the protective cover and the protective cover plate and base plate forming a protective space, the vacuum of the electrode is portion of said protective cover plate is placed above the protective space; upper surface of the cover plate is fixed to the support base of the protection, a through hole penetrating in the thickness of the protective cover on the bottom plate, the vacuum electrode connected to the power source through the bottom end of the through hole.
  11. 11.根据权利要求10所述的加热装置,其特征在于,所述保护罩底板和所述保护罩侧板的外表面设有反射膜,用以将所述发热元件辐射的热量朝向所述托盘方向反射。 11. The heating apparatus according to claim 10, characterized in that the protective cover plate and the reflective film side of the protective cover is provided with an outer surface, the heat generating element to the heat radiated toward the tray direction of the reflector.
  12. 12.根据权利要求6所述的加热装置,其特征在于,所述加热单元还包括至少一层隔热板,所述隔热板设置于所述支撑底座与所述发热元件之间,用以防止所述支撑底座因受到所述发热元件的辐射而过热;所述至少一层隔热板在垂直于所述支撑底座上表面的方向上间隔设置。 12. The heating apparatus according to claim 6, wherein said heating means further comprises at least one layer of insulation panels, said insulation plate is provided between the base and the support of the heat generating element for preventing said support base due to radiation of the heating element from overheating; the at least one heat shield to the support surface spaced in the direction perpendicular to the base.
  13. 13.根据权利要求6所述的加热装置,其特征在于,所述加热单元还包括反射板,所述反射板设置于所述发热元件的下方,用以将所述发热元件辐射的热量朝向所述托盘方向反射。 13. The heating apparatus according to claim 6, wherein said heating means further comprises a lower reflecting plate, a reflecting plate disposed on the heat generating element to the heat radiation toward the heat generating element said pallet direction of the reflector.
  14. 14.根据权利要求6所述的加热装置,其特征在于,所述加热单元还包括侧反射板,所述侧反射板设置于所述支撑底座的外周缘,用以减少热量自所述支撑底座的外周缘损失。 14. A heating apparatus according to claim 6, wherein said heating means further comprises a side reflection plate, a reflection plate disposed on the side of the outer peripheral edge of the support base to reduce the heat from the support base outer peripheral edge loss.
  15. 15.根据权利要求1所述的加热装置,其特征在于,所述升降装置包括基座、升降驱动源、密封件以及冷却水管路,其中所述基座与所述支撑底座连接,所述升降驱动源与所述基座连接,在所述升降驱动源的驱动下,所述基座带动所述支撑底座上升或下降; 所述密封件设置于所述基座与支撑底座之间,用以将所述基座与支撑底座之间的缝隙密封; 在所述基座的上表面且紧靠所述密封件的内侧或外侧设置有凹槽,或者,在所述支撑底座的下表面且紧靠所述密封件的内侧或外侧设置有凹槽,所述冷却水管路设置于所述凹槽内部,在所述冷却水管路内通入冷却水以冷却所述密封件。 15. The heating apparatus according to claim 1, wherein said lifting means comprises a base, a lift driving source, and a cooling water conduit sealing member, wherein the base and the support base is connected to the elevating a drive source and the base is connected, by driving the elevating drive source, drives the base of the support base up or down; the seal member disposed between the base and the support base for the gap between the base and the support base seal; on the surface of the base and against the inner or outer seal is provided with grooves or the lower surface of the support base and immediately on the inside or outside seal member is provided with a groove, the cooling pipes disposed inside said recess in said cooling pipes to cool a cooling water through the seal.
  16. 16.一种等离子体加工设备,其包括反应腔室,在所述反应腔室内的底部设置有加热装置,其特征在于,所述加热装置采用权利要求1-15任意一项权利要求所述加热装置。 16. A plasma processing apparatus comprising a reaction chamber, the bottom of the reaction chamber is provided with heating means, characterized in that, in any one of claims said heating means using the heat of claims 1-15 device.
CN 201210325724 2012-09-05 2012-09-05 Plasma heating means and processing equipment CN103681182B (en)

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