CN103676479A - 感射线性组合物、显示元件用固化膜的形成方法、显示元件用固化膜以及显示元件 - Google Patents

感射线性组合物、显示元件用固化膜的形成方法、显示元件用固化膜以及显示元件 Download PDF

Info

Publication number
CN103676479A
CN103676479A CN201310381387.5A CN201310381387A CN103676479A CN 103676479 A CN103676479 A CN 103676479A CN 201310381387 A CN201310381387 A CN 201310381387A CN 103676479 A CN103676479 A CN 103676479A
Authority
CN
China
Prior art keywords
radiation
sensitive linear
linear composition
display element
methyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201310381387.5A
Other languages
English (en)
Chinese (zh)
Inventor
中川刚志
西川耕二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JSR Corp filed Critical JSR Corp
Publication of CN103676479A publication Critical patent/CN103676479A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
CN201310381387.5A 2012-08-30 2013-08-28 感射线性组合物、显示元件用固化膜的形成方法、显示元件用固化膜以及显示元件 Pending CN103676479A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012190690A JP2014048428A (ja) 2012-08-30 2012-08-30 感放射線性組成物、表示素子用硬化膜の形成方法、表示素子用硬化膜及び表示素子
JP2012-190690 2012-08-30

Publications (1)

Publication Number Publication Date
CN103676479A true CN103676479A (zh) 2014-03-26

Family

ID=50314480

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201310381387.5A Pending CN103676479A (zh) 2012-08-30 2013-08-28 感射线性组合物、显示元件用固化膜的形成方法、显示元件用固化膜以及显示元件

Country Status (4)

Country Link
JP (1) JP2014048428A (ja)
KR (1) KR20140029225A (ja)
CN (1) CN103676479A (ja)
TW (1) TW201418885A (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107109131A (zh) * 2015-02-26 2017-08-29 富士胶片株式会社 触摸面板电极保护膜形成用组合物、转印薄膜、透明层叠体、触摸面板用电极的保护膜及其形成方法、静电电容型输入装置及图像显示装置
CN107229186A (zh) * 2016-03-24 2017-10-03 东友精细化工有限公司 着色感光性树脂组合物、包含其的滤色器和显示装置
CN108700734A (zh) * 2016-03-31 2018-10-23 东友精细化工有限公司 柔性滤色器
CN109324479A (zh) * 2017-08-01 2019-02-12 北京英力科技发展有限公司 一种光刻胶组合物
CN110520796A (zh) * 2017-06-20 2019-11-29 株式会社艾迪科 聚合性组合物、黑色矩阵用感光性组合物及黑色柱状间隔物用感光性组合物

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015133162A1 (ja) 2014-03-04 2015-09-11 Jsr株式会社 表示素子、感光性組成物およびエレクトロウェッティングディスプレイ
WO2016017191A1 (ja) 2014-07-31 2016-02-04 Jsr株式会社 表示素子、感光性組成物およびエレクトロウェッティングディスプレイ
US9625706B2 (en) 2014-07-31 2017-04-18 Jsr Corporation Display element, photosensitive composition and electrowetting display
JP6592835B2 (ja) * 2014-12-10 2019-10-23 互応化学工業株式会社 ソルダーレジスト組成物及び被覆プリント配線板
JP6447298B2 (ja) * 2015-03-26 2019-01-09 Jsr株式会社 表示素子用の硬化膜形成用組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法、表示素子及び表示素子の製造方法
JP2017088667A (ja) * 2015-11-04 2017-05-25 Jsr株式会社 着色硬化膜形成用組成物、着色硬化膜、着色硬化膜の形成方法、表示素子の製造方法
JPWO2017130427A1 (ja) * 2016-01-28 2018-12-20 日立化成株式会社 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びタッチパネルの製造方法
KR102548098B1 (ko) * 2016-02-24 2023-06-27 도레이 카부시키가이샤 착색 수지 조성물

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4582862A (en) * 1982-02-26 1986-04-15 Ciba-Geigy Corporation Ketone with morpholino and s-phenyl groups as photoinitiator in pigmented coating
JPH01315423A (ja) * 1988-06-16 1989-12-20 Idemitsu Petrochem Co Ltd 高硬度樹脂の製造方法
JPH04260052A (ja) * 1991-02-15 1992-09-16 Canon Inc 電子写真感光体
JPH10114736A (ja) * 1996-10-09 1998-05-06 Sumitomo Seika Chem Co Ltd ２−メチル−１−［４−（アルキルチオ）フェニル］−２−モルホリノ−１−プロパノンの製造方法
CN1940724A (zh) * 2005-09-26 2007-04-04 Jsr株式会社 光敏性树脂组合物、液晶显示面板的保护膜及分隔物、它们的形成方法及液晶显示面板
CN101266407A (zh) * 2007-03-12 2008-09-17 Jsr株式会社 用于形成着色层的放射线敏感性组合物
KR20110104662A (ko) * 2010-03-17 2011-09-23 동우 화인켐 주식회사 하드코팅 조성물, 이를 이용한 하드코팅 필름, 편광판 및 화상 표시 장치
CN102375337A (zh) * 2010-08-10 2012-03-14 住友化学株式会社 感光性树脂组合物

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8901167A (nl) * 1989-05-10 1990-12-03 Philips Nv Methode voor de vervaardiging van een polarisatiefilter, een aldus verkregen polarisatiefilter en een display dat voorzien is van het polarisatiefilter.
JPH1165291A (ja) * 1997-08-27 1999-03-05 Minolta Co Ltd 画像形成装置および画像形成用インク
JP3840484B2 (ja) * 2004-07-08 2006-11-01 積水化学工業株式会社 液晶表示素子用硬化性樹脂組成物、液晶表示素子用シール剤、上下導通用材料及び液晶表示素子
KR101384213B1 (ko) * 2007-03-30 2014-04-10 디아이씨 가부시끼가이샤 고분자 안정화 액정 조성물, 액정 표시 소자, 액정 표시 소자의 제조 방법
JP2014009174A (ja) * 2012-06-28 2014-01-20 Toray Fine Chemicals Co Ltd スルフィド化合物およびその製造方法
JP2014009173A (ja) * 2012-06-28 2014-01-20 Toray Fine Chemicals Co Ltd スルフィド化合物およびその製造方法

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4582862A (en) * 1982-02-26 1986-04-15 Ciba-Geigy Corporation Ketone with morpholino and s-phenyl groups as photoinitiator in pigmented coating
JPH01315423A (ja) * 1988-06-16 1989-12-20 Idemitsu Petrochem Co Ltd 高硬度樹脂の製造方法
JPH04260052A (ja) * 1991-02-15 1992-09-16 Canon Inc 電子写真感光体
JPH10114736A (ja) * 1996-10-09 1998-05-06 Sumitomo Seika Chem Co Ltd ２−メチル−１−［４−（アルキルチオ）フェニル］−２−モルホリノ−１−プロパノンの製造方法
CN1940724A (zh) * 2005-09-26 2007-04-04 Jsr株式会社 光敏性树脂组合物、液晶显示面板的保护膜及分隔物、它们的形成方法及液晶显示面板
CN101266407A (zh) * 2007-03-12 2008-09-17 Jsr株式会社 用于形成着色层的放射线敏感性组合物
KR20110104662A (ko) * 2010-03-17 2011-09-23 동우 화인켐 주식회사 하드코팅 조성물, 이를 이용한 하드코팅 필름, 편광판 및 화상 표시 장치
CN102375337A (zh) * 2010-08-10 2012-03-14 住友化学株式会社 感光性树脂组合物

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107109131A (zh) * 2015-02-26 2017-08-29 富士胶片株式会社 触摸面板电极保护膜形成用组合物、转印薄膜、透明层叠体、触摸面板用电极的保护膜及其形成方法、静电电容型输入装置及图像显示装置
CN107109131B (zh) * 2015-02-26 2019-09-03 富士胶片株式会社 触摸面板电极保护膜形成用组合物及其应用
CN107229186A (zh) * 2016-03-24 2017-10-03 东友精细化工有限公司 着色感光性树脂组合物、包含其的滤色器和显示装置
CN107229186B (zh) * 2016-03-24 2021-06-29 东友精细化工有限公司 着色感光性树脂组合物、包含其的滤色器和显示装置
CN108700734A (zh) * 2016-03-31 2018-10-23 东友精细化工有限公司 柔性滤色器
CN108700734B (zh) * 2016-03-31 2021-09-28 东友精细化工有限公司 柔性滤色器
CN110520796A (zh) * 2017-06-20 2019-11-29 株式会社艾迪科 聚合性组合物、黑色矩阵用感光性组合物及黑色柱状间隔物用感光性组合物
CN109324479A (zh) * 2017-08-01 2019-02-12 北京英力科技发展有限公司 一种光刻胶组合物

Also Published As

Publication number Publication date
KR20140029225A (ko) 2014-03-10
TW201418885A (zh) 2014-05-16
JP2014048428A (ja) 2014-03-17

Similar Documents

Publication Publication Date Title
CN103676479A (zh) 感射线性组合物、显示元件用固化膜的形成方法、显示元件用固化膜以及显示元件
JP5772642B2 (ja) 硬化性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子
JP5929496B2 (ja) 感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子
TWI442176B (zh) 感放射線性樹脂組成物、液晶顯示元件的間隔物與保護膜及彼等的形成方法
JP5765059B2 (ja) 着色組成物、着色組成物の製造方法、着色パターン、カラーフィルタ、カラー表示素子及びカラーフィルタの製造方法
JP5476758B2 (ja) 感放射線性樹脂組成物、液晶表示素子の層間絶縁膜、保護膜及びスペーサーとその形成方法
CN102854743A (zh) 感放射线性树脂组成物、显示元件用硬化膜、显示元件用硬化膜的形成方法及显示元件
JP2014134763A (ja) 感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子
TWI615436B (zh) 活性能量線硬化型樹脂組成物、顯示元件用著色間隔件及黑矩陣
TWI598398B (zh) 活性能量線硬化型樹脂組成物及使用其的顯示元件用間隔件及／或彩色濾光片保護膜
CN102236259A (zh) 显示元件用放射线敏感性树脂组合物、层间绝缘膜、保护膜和隔片以及它们的形成方法
JP5343260B2 (ja) 着色感光性樹脂組成物、カラーフィルタ及びこれを備える液晶表示装置
JP5853806B2 (ja) 感放射線性樹脂組成物、硬化膜及び硬化膜の形成方法
CN101025567B (zh) 固化性树脂组合物、固化膜的形成方法以及固化膜
CN102269932A (zh) 放射线敏感性树脂组合物、固化膜、固化膜的形成方法以及显示元件
KR102111443B1 (ko) 활성 에너지선 경화형 수지 조성물, 그것을 이용한 표시 소자용 착색 스페이서 및 블랙 매트릭스
CN102364397B (zh) 放射线敏感性树脂组合物、固化膜、固化膜的形成方法和显示元件
JP5750953B2 (ja) 硬化膜の形成方法
JP5423352B2 (ja) 感放射線性樹脂組成物、液晶表示素子の層間絶縁膜、保護膜及びスペーサーならびにそれらの形成方法
CN102298264A (zh) 固化膜形成用放射线敏感性树脂组合物及其制造方法、固化膜及其形成方法及显示元件
CN102375338A (zh) 着色组合物、着色组合物的制造方法、着色图案、滤色器、彩色显示元件以及滤色器的制造方法
JP2019109317A (ja) 着色樹脂組成物、カラーフィルター基板および液晶表示装置
JP2008020662A (ja) 感放射線性ドライフィルム、それから形成される表示素子用レンズとその形成方法
JP6510427B2 (ja) 活性エネルギー線硬化型樹脂組成物、及びそれを用いた表示素子用スペーサー及び／またはカラーフィルター保護膜
JP6506175B2 (ja) 活性エネルギー線硬化型樹脂組成物、及びそれを用いた表示素子用スペーサー及び／またはカラーフィルター保護膜

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20140326

WD01 Invention patent application deemed withdrawn after publication