CN103602959B - An atomic layer deposition precursors output means - Google Patents

An atomic layer deposition precursors output means Download PDF

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CN103602959B
CN103602959B CN201310585179.7A CN201310585179A CN103602959B CN 103602959 B CN103602959 B CN 103602959B CN 201310585179 A CN201310585179 A CN 201310585179A CN 103602959 B CN103602959 B CN 103602959B
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output
chamber
precursor
cylinder
buffer chamber
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CN103602959A (en
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陈蓉
邓章
曹坤
单斌
文艳伟
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华中科技大学
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Abstract

本发明公开了一种原子层沉积前驱体输出装置,该输出装置由装载前驱体的钢瓶(101),缓存腔(103),连接所述钢瓶(101)与缓存腔(103)的第一开关阀(102),位于所述缓存腔腔体内且与所述缓存腔腔体气密性良好的运动活塞(104),以及控制输出主管路的第二开关阀(105)构成。 The present invention discloses an atomic layer deposition precursors output device, the output device by a cylinder (101), the buffer chamber (103) loaded precursor, connecting the cylinder (101) and the buffer chamber (103) of the first switch valve (102) located between the buffer cavity and the cavity buffer chamber cavity good airtightness movement of the piston (104), and a second switch control output of the main line valve (105) configuration. 本发明通过固定空间的气体体积变化,每次稳定的排出等量前驱体,保证定量输出前驱体,能够更好的适应于前驱体用量优化分析及在线监测系统分析。 The present invention is fixed by the volume change of the gas space, discharging the same amount each time a stable precursor, the precursor to ensure quantitative output, better able to adapt and optimize the analysis online monitoring system to analyze the amount of the precursor.

Description

一种原子层沉积前驱体输出装置 An atomic layer deposition precursors output means

技术领域 FIELD

[0001] 本发明涉及一种用于气相沉积的前驱体输出装置,更具体地说,用于原子层沉积的稳定定量输出并适用于广泛环境的前驱体输出装置。 [0001] The present invention relates to a precursor for vapor deposition output apparatus and, more particularly, for stabilizing the output of the quantitative atomic layer deposition precursors and the output device for a wide range of environments.

背景技术 Background technique

[0002] 近十几年来,随着半导体集成电路的不断发展,特别是芯片尺寸不断缩小、性能不断提升,原子层沉积技术得到的长足的进步和成熟的发展,日益满足了工业上高精度、纳米级厚度等特性薄膜的要求。 [0002] Over the last years, with the development of the semiconductor integrated circuit, particularly shrinking chip size, and improve performance, ALD obtained great progress and development of mature, increasing the industry to meet the high precision, characteristics of nanoscale thickness films such requirements. 如今薄膜技术如化学气相沉积、原子层沉积等技术均已在工业应用中成熟使用,相关设备装置亦应用于工业生产,而在薄膜技术的研究领域,大量相关设备被研制和开发。 Today, thin film techniques such as chemical vapor deposition, atomic layer deposition and other techniques have been used in industrial applications mature, the relevant equipment is also used in industrial production means, and in the field of thin film technology, a large number of research and development related equipment are. 原子层沉积技术具有薄膜厚度纳米可控,均匀性好等特点,广泛应用于微纳米电子器件,太阳能电池等领域,其原理是将前驱体通入真空腔体中与基底表面(一般为硅基底)发生化学吸附,伴随惰性气体清洗腔体之后,另一前驱体通入腔体与上阶段生成物发生化学反应。 ALD film having a thickness of the nano controllable, good homogeneity characteristics, is widely used in the field of micro and nano electronics and solar cells, the principle is the precursor into a vacuum chamber and the substrate surface (typically a silicon substrate ) chemical adsorption, then accompanied by an inert gas purge chamber, a further chemical reaction of the precursor into the chamber with the upper product phase. 这两个阶段组成一个原子层沉积反应循环也即一层单层薄膜生长,通过控制循环的次数来确定薄膜的厚度。 The two phases cycle atomic layer deposition reactor i.e. a single layer of film growth, the film thickness is determined by the number of control cycle. 原子层沉积的前驱体消耗量是关键影响因素,特别是昂贵的有机金属源的优化高效利用,是工业应用中优化的重点,特别是在应用领域广泛后需要适用更广泛的沉积环境。 Atomic layer deposition precursor consumption is a critical factor, particularly expensive to optimize efficient use of the organic metal source, is focused on optimizing industrial applications, especially in the need for the wide range of applications wider depositional environment. 而在薄膜技术研究领域,定量检测分析与在线监测也日益成为科学研究的热点和重点。 In the field of thin-film technology research, quantitative analysis and online monitoring is also increasingly become the focus and the focus of scientific research. 传统前驱体输送系统在满足针对最新原子层沉积技术的需求上有诸多缺点。 Traditional precursor delivery system has many shortcomings to meet the demand for the latest atomic layer deposition technology.

[0003] 传统装置中,原子层沉积所需的气相沉积分子由前驱体钢瓶中饱和蒸汽压扩散至主流管路,再由惰性气体传输至反应腔。 [0003] In the conventional apparatus, an atomic layer deposition vapor deposition molecules required by the saturated vapor pressure of the precursor diffusion in the cylinder to the main line, and then an inert gas is transmitted to the reaction chamber. 输出动力来自于钢瓶中前驱体的饱和蒸汽压与管路中的压力差,因此需要反应腔体和管路保持真空状态,而当两者压力差变化时亦无法保证前驱体扩散输出量稳定。 Output from the power line and the saturated vapor pressure in the cylinder difference in the precursor, it is necessary to maintain the reaction chamber and the vacuum conduit, when the pressure differential changes in both the precursor diffusion can not guarantee stable output. 针对低饱和蒸汽压的前驱体分子,此类输出装置非常低效。 Precursor molecule for low saturated vapor pressure, such output device is very inefficient. 而前驱体稳定的定量输出既有利于工业应用的剂量优化,同时对定量分析和在线监测有重要作用。 Quantitative output and stable precursor is conducive to optimizing the dose industrial applications, while an important role in quantitative analysis and online monitoring. 因此传统的前驱体输出装置在工业应用及定量研究方面存在较大瓶颈。 Thus the conventional output apparatus precursors there is a large bottleneck in industrial application and quantitative research.

发明内容 SUMMARY

[0004] 综上,为满足原子层沉积技术应用和研究领域最新需求,需要设计一种新型的前驱体输送装置,其能够稳定输出定量,同时能够适用于更广泛的外界压力环境。 [0004] In summary, the latest technology to meet the needs of research and atomic layer deposition is necessary to design a new type of precursor delivery apparatus, which can stably output a quantitative, while applicable to a wider range of ambient pressure environment.

[0005] 本发明拟提供的高效前驱体输出装置,通过固定体积的活动塞每个循环推进排出定量前驱体分子,动力来自于外部的机械力,且每次排出量为固定空间体积。 [0005] Efficient precursors output apparatus of the present invention to be provided, to promote the discharge of each plug quantitative precursor molecules circulated through a fixed volume of active power from external mechanical forces, and the discharge amount per a fixed volume of space. 当机械活塞将气体分析完全排除空间时,前驱体被输出至主流管路,随之进入腔体,因此不受腔体或气路中压力限制。 When the mechanical piston space completely exclude gas analysis, the precursor is output to the main line, along into the chamber, and therefore not subject to the cavity or airway pressure limit. 这种主动式输出方式使前驱体输出可不受外界压力条件限制,无论真空条件或常压/高压氛围均可有效输出,使原子层沉积技术不受传统真空工艺限制,而广泛应用于诸多领域。 Such an active output may be output from the precursor ambient pressure conditions, whether atmospheric or vacuum / high pressure atmosphere can be effectively output the ALD process limitations from conventional vacuum, widely used in many fields.

[0006] 为实现上述目的,本发明提供了一种原子层沉积前驱体高效输出装置,所述输出装置由装载前驱体的钢瓶,缓存腔,连接所述钢瓶与缓存腔的第一开关阀,位于所述缓存腔腔体内且与所述缓存腔腔体气密性良好的运动活塞,控制输出主管路的第二开关阀构成。 [0006] To achieve the above object, the present invention provides an efficient atomic layer deposition precursors output means, said output means by the loading cylinder precursor, buffer chamber, said first switching valve is connected with the buffer cylinder chamber, in said buffer chamber and said cavity and buffer chamber cavity good air tightness of movement of the piston, a second control output of the main line switching valve.

[0007] 本发明还提供一种原子层沉积前驱体输出装置,所述输出装置由装载前驱体的钢瓶,位于所述钢瓶内的缓存腔,与所述缓存腔腔体气密性良好的运动活塞,所述钢瓶外连通所述缓存腔的第一开关阀,控制输出主管路的第二开关阀构成。 [0007] The present invention further provides an atomic layer deposition precursors output means, said output means from the loading cylinder precursor, the buffer chamber positioned within the cylinder, the buffer chamber cavity good airtightness movement the outer piston, said cylinder chamber communicating said first cache switching valve, a second control output of the main line switching valve.

[0008] 本发明还提供一种原子层沉积前驱体输出装置,所述输出装置包括装载前驱体的钢瓶,位于所述钢瓶内的缓存腔,与所述缓存腔腔体气密性良好的运动活塞,所述钢瓶外与所述缓存腔连通的第一开关阀,与主流管路连接的输出腔,连接所述钢瓶与所述输出腔的第二开关阀,与所述输出腔连接的真空栗。 [0008] The present invention further provides an atomic layer deposition precursors output means, said output means comprises a loading cylinder precursor, the buffer chamber positioned within the cylinder, the buffer chamber cavity good airtightness movement piston, said first switching valve outer cylinder chamber in communication with the buffer, and an output line connected to the main chamber, a second switching valve is connected with the output of said cylinder chamber, the vacuum chamber is connected to the output chestnut.

[0009] 本发明的工作原理是:前驱体输出过程中,先将所有缓存腔或输出腔体积排空,由机械活塞构建固定体积的空间并致前驱体气体分子自由扩散入其中,开启缓存腔与外界的连接阀并由活塞将空间内气体全部排出而实现定量输出。 [0009] The working principle of the present invention is: precursors output process, first of all evacuated buffer chambers or the volume of the outlet chamber, a fixed volume of the space constructed by the mechanical actuation of the piston and the precursor gas molecules diffuse freely into which open buffer chamber connected with the outside of the valve piston to discharge all gas in the space is achieved by quantitative output. 由于主动力来自于活塞的机械力,确保前驱体分子输出入主流管路而不受管路中压力条件约束。 Since the active force from the mechanical force of the piston, to ensure that the precursor molecules into the output line from the main line pressure conditions and constraints.

[0010] 通过本发明与现有技术相比,具有以下的有益效果: [0010] Compared with the prior art the present invention has the following advantages:

[0011 ] 1、通过固定空间的气体体积变化,每次稳定的排除等量前驱体,保证定量输出前驱体,更好的适应于前驱体用量优化分析及在线监测系统分析。 [0011] 1, the gas volume change by a fixed space, equal amounts of each negative stable precursor, the precursor to ensure quantitative output, better adapt and optimize the analysis online monitoring system to analyze the amount of the precursor.

[0012] 2、通过机械力将气体分子从缓存腔排入气路,可不受外部环境约束,从真空到常压或高压等不同压力环境均可使用。 [0012] 2, by mechanical force gas molecules into the gas passage from the buffer chamber from the external environment can be bound, and the like from vacuum to atmospheric pressure or elevated pressure in different environments can be used.

附图说明 BRIEF DESCRIPTION

[0013]图1是本发明的第一种实施方式的结构示意图。 [0013] FIG. 1 is a schematic structural diagram of a first embodiment of the present invention.

[0014] 图2是本发明的第二种实施方式的结构示意图。 [0014] FIG. 2 is a schematic structural diagram of a second embodiment of the present invention.

[0015] 图3是本发明的第三种实施方式的结构示意图。 [0015] FIG. 3 is a schematic structural diagram of a third embodiment of the present invention.

具体实施方式 Detailed ways

[0016] 为了使本发明的目的、技术方案及优点更加清楚明白,以下结合附图及实施例,对本发明进行进一步详细说明。 [0016] To make the objectives, technical solutions and advantages of the present invention will become more apparent hereinafter in conjunction with the accompanying drawings and embodiments of the present invention will be further described in detail. 应当理解,此处所描述的具体实施例仅仅用以解释本发明,并不用于限定本发明。 It should be understood that the specific embodiments described herein are only intended to illustrate the present invention and are not intended to limit the present invention.

[0017] 如图1所示为本发明的第一种实施方式的结构,由装载前驱体(固态/液态/气态)的钢瓶101,连接钢瓶与缓存腔的开关阀102,带有机械运动活塞的缓存腔103,与腔体气密性良好的运动活塞104,控制输出主管路的开关阀105五部分整体构成前驱体输出装置。 [0017] The first structure of the present embodiment of the invention shown in FIG. 1, a loading cylinder precursor (solid / liquid / gas) 101 is connected to the cylinder chamber cache switching valve 102, with a mechanical movement of the piston the buffer chamber 103, and the body cavity good airtightness movement of the piston 104, the switch control output of the main line valve 105 constituting part of the overall precursor five output device. 最初由开关阀102开,钢瓶101中前驱体分子自由扩散至缓存腔103中并维持固定空间的体积,关闭102阀并开启105阀,活塞104运动将缓存腔内气体分子经由105阀推进主流管路。 Initially opening the switch valve 102, the cylinder 101 consisting of precursor molecules diffuse into the buffer chamber 103 and to maintain a fixed volume of space, the valve 102 is closed and valve 105 open, the movement of the piston 104 buffer gas in the chamber 105 via the mainstream pipe propulsion molecules valve road.

[0018] 图2所示为同原理结构的第二实施方式,其中,装载前驱体(固态/液态/气态)的钢瓶201,钢瓶内的缓存腔202,与腔体气密性良好的运动活塞203,钢瓶外连通缓存腔的开关阀204,控制输出主管路的开关阀205,五部分整体构成前驱体输出装置。 As shown in the second embodiment with the principles of the structure, wherein the precursor is loaded (solid / liquid / gas) in the cylinder 201, the buffer chamber 202 in the cylinder, with the body cavity good airtightness motion [0018] FIG piston 2 203, outer cylinder communicating buffer chamber switch valve 204, the switch control output of the main line valve 205, composed of five parts overall output device precursor. 输出原理和输出方法均与图1相似,首先由204阀开启,前驱体扩散入缓存腔202,关闭204阀开启205阀,由活塞203运动将缓存腔202排入主流管路。 Principle output and output method are similar to FIG. 1, the valve 204 is first opened by the precursor diffuses into the buffer chamber 202, the valve 205 to close the valve opening 204, the piston 203 by the motion of the buffer chamber 202 into the main conduit.

[0019] 如图3所示为同原理结构的第三种实施方式,其中,装载前驱体(固态/液态/气态)的钢瓶301,钢瓶内的缓存腔302,与腔体气密性良好的运动活塞303,钢瓶外连通缓存腔的开关阀304,连接钢瓶与输出腔的开关阀305,直接连接主流管路的输出腔306,连接输出腔的真空栗307,七部分整体构成前驱体输出装置。 [0019] The cylinder shown as a third embodiment with the principle of the structure, wherein the load 3 precursor (solid / liquid / gas) 301, the buffer chamber 302 in the cylinder, with the body cavity good airtightness 303 motion, the switching valve precursors output means communicating buffer chamber outer cylinder 304, the cylinder is connected to the output of the switch valve chamber 305, directly connected to the main line of the outlet chamber 306, a vacuum chamber 307 connected to the output Li, seven overall configuration of the piston portion . 与前述不同,先关闭输出腔306连接的除栗外所有阀305并开启机械栗307保持输出腔内真空,再按前述前驱体输出方式排入输出腔后,开启主流管路的阀并将前驱体分子带走。 After the aforementioned different, turn off the external cavity output 306 connected to all except Li and open valve 305 to maintain the output 307 Li mechanical vacuum chamber, the precursor then output into the output chamber, and a valve opening the main precursor line molecules away.

[0020] 上述方案中涉及的活塞部分在真空领域已属成熟结构,可有效保证运动过程中腔内与外界的气体泄漏,因此可行性较强。 Ripe piston portion already in vacuo and Field [0020] The above-described embodiment involved, can effectively guarantee gas leakage during movement chamber and the outside world, and therefore a strong feasibility.

[0021] 此上三种实施方式中,都是通过机械结构设计可有效控制活塞每次循环运动的间距,可有效控制每次缓存和排出的前驱体体积,即可保证定量输出。 Three embodiments [0021] In this last, are effective to control the spacing of the piston movement in each cycle by mechanical design, it can effectively control the volume of each buffer and the precursor discharged, can ensure quantitative output. 同时最后通过活塞的推进将前驱体分子从缓存腔排入主流管路,依靠的机械力而非传统装置依靠气体自主扩散,故不限于主流管路中的压力环境。 Finally, while the precursor molecules by advancing the piston into the main chamber from the cache line, rather than rely on mechanical force device relies on conventional gas diffusion independent, it is not limited to the pressure environment of the main line.

[0022] 以上所述,仅为本发明较佳的具体实施方式,但本发明保护的范围并不局限于此,任何熟悉本技术领域的技术人员在本发明揭露的技术范围内,可轻易想到的变化或替换,都应涵盖在本发明的保护范围之内。 [0022] The above are only preferred specific embodiment of the present invention embodiment, but the scope of the present invention is not limited thereto, any skilled in the art in the art within the scope of the invention disclosed can be easily thought variations or replacements shall fall within the protection scope of the present invention.

Claims (2)

1.一种原子层沉积前驱体输出装置,其特征在于:所述输出装置仅由装载前驱体的钢瓶(201),位于所述钢瓶内的缓存腔(202),与所述缓存腔腔体气密性良好的运动活塞(203),所述钢瓶外连通所述缓存腔的第一开关阀(204),控制输出主管路的第二开关阀(205)构成;输出时,第一开关阀(204)开启,前驱体扩散入缓存腔(202),关闭第一开关阀(204)并开启第二开关阀(205),由运动活塞(203)运动将缓存腔(202)中的前驱体排入主流管路。 An atomic layer deposition precursors output device, wherein: said output means only by the cylinder (201) precursor loading, the chamber is in the cache (202) within the cylinder, the buffer chamber cavity and good airtightness movement of the piston (203), said outer cylinder in communication with the buffer chamber first switching valve (204), a second control output of the main line switching valve (205) configured; output, the first switching valve (204) is turned on, the precursor diffuses into the buffer chamber (202), closing the first switching valve (204) and opens the second on-off valve (205) by movement of the piston (203) moving the precursor buffer chamber (202) into the mainstream line.
2.一种原子层沉积前驱体输出装置,其特征在于:所述输出装置仅由装载前驱体的钢瓶(301),位于所述钢瓶内的缓存腔(302),与所述缓存腔腔体气密性良好的运动活塞(303),所述钢瓶(301)外与所述缓存腔(302)连通的第一开关阀(304),与主流管路连接的输出腔(306),连接所述钢瓶与所述输出腔的第二开关阀(305),与所述输出腔连接的真空栗(307)构成; 输出时,先关闭输出腔(306)连接的除栗外所有阀,并开启真空栗(307),保持输出腔(306)内真空,之后第一开关阀(304)开启,前驱体扩散入缓存腔(302),关闭第一开关阀(304)并开启第二开关阀(305),由运动活塞(303)运动将缓存腔(302)中的前驱体排入输出腔(306),前驱体排入输出腔(306)后,开启主流管路的阀并将前驱体分子带走。 An atomic layer deposition precursors output device, wherein: said output means only by the cylinder (301) precursor loading, the chamber is in the cache (302) within the cylinder, the buffer chamber cavity and good airtightness movement of the piston (303), said cylinder (301) with the outer buffer chamber (302) communicating the first switching valve (304), an output chamber connected to the main conduit (306), connections a second switching valve (305) and the output of said cylinder chamber, connected to the output chestnut vacuum chamber (307) configured; output, turn off the output chamber (306) connected to all valve outer except Li and open vacuum Li (307), held within the output chamber (306) under vacuum, after the first switching valve (304) is turned on, the precursor diffuses into the buffer chamber (302), closing the first switching valve (304) and opens the second on-off valve ( 305), by the movement of the piston (303) moving the buffer chamber (302) in the discharge chamber into the precursor (306), the precursor into the outlet chamber (306), opening the valve and the main conduit precursor molecule take away.
CN201310585179.7A 2013-11-19 2013-11-19 An atomic layer deposition precursors output means CN103602959B (en)

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