CN103407225B - Golden low radiation film coating glass and manufacture method thereof - Google Patents

Golden low radiation film coating glass and manufacture method thereof Download PDF

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CN103407225B
CN103407225B CN201310278315.8A CN201310278315A CN103407225B CN 103407225 B CN103407225 B CN 103407225B CN 201310278315 A CN201310278315 A CN 201310278315A CN 103407225 B CN103407225 B CN 103407225B
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glass
thickness
film
coating chamber
zno
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CN103407225A (en
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贾绍辉
葛言凯
张淮凌
孙徐兴
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威海中玻镀膜玻璃股份有限公司
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Abstract

The present invention relates to glass working arts field, a kind of film layer structure is simple specifically, be easy to large-scale production, well painted, the significant golden low radiation film coating glass of energy-saving effect and manufacture method thereof, it is characterized in that depositing following film successively at glass baseplate surface: silicon nitride buffer layer thin film, nichrome inducing layer film, gold functional layer film, nichrome inducing layer film, ZnO:Al protective layer film, the golden low radiation film coating glass that the present invention proposes has higher reflectivity at mid and far infrared wave band, at visible light wave range, there is good shading performance, its reflected colour is at the existing blond shades of wider angular field of view endosome simultaneously, compared with prior art, there is radiance low, sunshade, attractive in appearance, the significant advantage such as pure color.

Description

Golden low radiation film coating glass and manufacture method thereof

Technical field

The present invention relates to glass working arts field, specifically a kind of film layer structure simple, be easy to large-scale production, painted good, the significant golden low radiation film coating glass of energy-saving effect and manufacture method thereof.

Background technology

The energy-conservation coated glass of Low emissivity is a kind of energy-conservation coated glass be widely used, it is by improving the reflectivity of centering far infrared radiation, obtain less glass transition coefficient, minimizing room heater in winter to outdoor heat loss through radiation, and then reaches the object reducing heating energy consumption.

The energy-conservation coated glass of tradition Low emissivity mainly comprises based on transparent conductive oxide material SnO 2: the on-line coating glass of F and the off-line coated glass based on metal A g, in the market based on the outward appearance of the low-emission coated product of this two classes material based on water white transparency, in order to obtain color beautifying functions, the color glass substrate of mass coloration can be adopted in process, or on substrate, carry out multiple film layer processing carry out film system coupling, wherein the former needs repeatedly to convert glass substrate according to product final color, manufacturing procedure is complicated, the latter is due to the restriction of Coating Materials itself, product cannot obtain pure colden visual appearance (mostly for khaki or cannot obtain blond shades within the scope of human viewable), especially in this glass radiance≤0.03, thin film system is the glass in Ag and SnO2:F material to be difficult to realize.

Chinese patent ZL2008100656547 and ZL2012104512688 individually discloses a kind of golden low radiation film coating glass and preparation method thereof, the former have employed composition metal rete to realize the colden visual appearance of glass surface, need to carry out repeatedly coating operation to glass substrate in manufacturing process, and the copper plate mainly come from due to the appearance color of product in composition metal rete, appearance color is not pure gold, in addition the visible ray face reflectivity of its product is less than 55%, in simplification manufacture craft, improve the pure degree of appearance luster and energy-saving effect aspect all Shortcomings, the latter have employed Ag film as functional layer, still appearance colour present with the reflectivity of visible ray face etc. in Shortcomings.

Summary of the invention

The present invention is directed to the shortcoming and defect existed in prior art, propose a kind of film layer structure simple, be easy to large-scale production, painted and appearance colour presents well, the significant golden low radiation film coating glass of energy-saving effect and manufacture method thereof.

The present invention can be reached by following measures:

A kind of golden low radiation film coating glass, is characterized in that depositing following film successively at glass baseplate surface:

Silicon nitride buffer layer thin film,

Nichrome inducing layer film,

Gold functional layer film,

Nichrome inducing layer film,

ZnO:Al protective layer film.

The thickness of the cushion of silicon nitride described in the present invention is 18nm-25nm, and the thickness of nichrome inducing layer is 1nm-5nm, and the thickness of golden functional layer is 35nm-50nm, ZnO:Al protective layer film thickness is 8nm-15nm.

Glass substrate described in the present invention can be float glass.

A manufacture method for golden low radiation film coating glass described above, is characterized in that comprising the following steps:

Step 1: substrate pretreatment, adopt to glass substrate, pure water carries out that high pressure sprays in advance successively, disc brush grinding, high-pressure spraying, air knife cuts water segregation, pure water spray, round brush, water segregation cut by air knife, disc brush is ground, after round brush, air knife oven dry is carried out to glass substrate, wherein pure water >=10M Ω, bake out temperature is about 60 DEG C, and air knife dries flow-control at 4T/h, blast 0.5Mpa, the speed of service is 5m/min

Step 2: prepare silicon nitride cushion, vacuumized by coating chamber, makes its vacuum≤10 -4after pa, be filled with nitrogen and argon gas, the volume ratio that is filled with of nitrogen and argon gas is 4:5, makes pressure stability in coating chamber at 0.3Pa, open shielding power supply, uses Si target, by Si 3n 4thin film deposition is to glass baseplate surface, and thickness is 18nm-25nm,

Step 3: prepare the first nichrome inducing layer, coating chamber is vacuumized, make its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use the Ni-Cr target that Ni:Cr is 4:1, chrome-nickel alloy thin film is deposited to glass baseplate surface, and thickness is 1nm-5nm,

Step 4: prepare golden functional layer, vacuumized by coating chamber, makes its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use Au target, by Au thin film deposition to glass baseplate surface, thickness is 35nm-50nm,

Step 5: prepare the second nichrome inducing layer, coating chamber is vacuumized, make its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use Ni-Cr target, Ni:Cr=4:1 in Ni-Cr target, deposits to glass baseplate surface by chrome-nickel alloy thin film, and thickness is 1nm-5nm,

Step 6: make ZnO:Al protective layer, coating chamber is vacuumized, makes its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use ZnO:Al target, ZnO:Al in ZnO:Al target 2o 3=98:2 is by the thin film deposition of ZnO:Al protective layer to glass baseplate surface, and thickness is 8nm-15nm, obtains product.

The golden low radiation film coating glass that the present invention proposes has higher reflectivity at mid and far infrared wave band, at visible light wave range, there is excellent shading performance, its reflected colour all can show blond shades by endosome within the scope of human viewable simultaneously, compared with prior art, there is the significant advantages such as radiance is low, pure, the golden reflection ray visual range of good energy-conserving effect, appearance luster is wide.

accompanying drawing illustrates:

Accompanying drawing 1 is structural representation of the present invention.

Accompanying drawing 2 is SEM sectional drawings of golden low radiation film coating glass in the present invention.

Accompanying drawing 3 is that in the present invention, golden low radiation film coating glass is the FTIR reflectance spectrum of 2500nm-25000nm in wave-length coverage.

Accompanying drawing 4 is that in the present invention, golden low radiation film coating glass is the reflectance spectrum of the visible light wave range of 250nm-2500nm in wave-length coverage.

Reference numeral: glass substrate 1, silicon nitride buffer layer thin film 2, nichrome inducing layer film 3, golden functional layer film 4, ZnO:Al protective layer film 5.

detailed description of the invention:

Below in conjunction with drawings and Examples, the present invention is further illustrated.

As shown in Figure 1, a kind of golden low radiation film coating glass that the present invention proposes, is characterized in that depositing following film successively at glass baseplate surface:

Silicon nitride buffer layer thin film, nichrome inducing layer film, golden functional layer film, nichrome inducing layer film, ZnO:Al protective layer film.

The thickness of the cushion of silicon nitride described in the present invention is 18nm-25nm; be preferably 19.5nm-24.5nm; the thickness of nichrome inducing layer is 1nm-5nm; be preferably 2nm-4nm; the thickness of gold functional layer is 35nm-50nm, and being preferably 38nm-47nm, ZnO:Al protective layer film thickness is 8nm-15nm; be preferably 9nm-14nm, described glass substrate is float glass.

Golden low radiation film coating glass described above adopts following steps to make:

Step 1: substrate pretreatment, adopt to glass substrate, pure water carries out that high pressure sprays in advance successively, disc brush grinding, high-pressure spraying, air knife cuts water segregation, pure water spray, round brush, water segregation cut by air knife, disc brush is ground, after round brush, air knife oven dry is carried out to glass substrate, wherein pure water >=10M Ω, bake out temperature is about 60 DEG C, and air knife dries flow-control at 4T/h, blast 0.5Mpa, the speed of service is 5m/min

Step 2: prepare silicon nitride cushion, vacuumized by coating chamber, makes its vacuum≤10 -4after pa, be filled with nitrogen and argon gas, the volume ratio that is filled with of nitrogen and argon gas is 4:5, makes pressure stability in coating chamber at 0.3Pa, open shielding power supply, uses Si target, by Si 3n 4thin film deposition is to glass baseplate surface, and thickness is 18nm-25nm,

Step 3: prepare the first nichrome inducing layer, coating chamber is vacuumized, make its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use the Ni-Cr target that Ni:Cr is 4:1, chrome-nickel alloy thin film is deposited to glass baseplate surface, and thickness is 1nm-5nm,

Step 4: prepare golden functional layer, vacuumized by coating chamber, makes its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use Au target, by Au thin film deposition to glass baseplate surface, thickness is 35nm-50nm,

Step 5: prepare the second nichrome inducing layer, coating chamber is vacuumized, make its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use Ni-Cr target, Ni:Cr=4:1 in Ni-Cr target, deposits to glass baseplate surface by chrome-nickel alloy thin film, and thickness is 1nm-5nm,

Step 6: make ZnO:Al protective layer, coating chamber is vacuumized, makes its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use ZnO:Al target, ZnO:Al in ZnO:Al target 2o 3=98:2 is by the thin film deposition of ZnO:Al protective layer to glass baseplate surface, and thickness is 8nm-15nm, obtains product.

As shown in the SEM sectional drawing of accompanying drawing 2 product, the golden low radiation film coating glass product film structure adopting above-mentioned method for making to produce is stablized, can overcome traditional handicraft in this glass radiance≤0.03, thin film system based on the glass in Ag and SnO2:F material is difficult to realize shortcoming;

The product obtained in the present invention wavelength be FTIR reflectance spectrum within the scope of 2500nm-25000nm as shown in Figure 3, in the present invention golden low radiation film coating glass in wave-length coverage be the reflectance spectrum of the visible light wave range of 250nm-2500nm as shown in Figure 4, it can thus be appreciated that, the golden low radiation film coating glass that the present invention proposes has higher reflectivity at mid and far infrared wave band, at visible light wave range, there is excellent shading performance, compared with prior art, there is the significant advantages such as radiance is low, good energy-conserving effect.

embodiment 1:

A kind of golden low radiation film coating glass, it deposits following film successively at glass baseplate surface: silicon nitride buffer layer thin film, nichrome inducing layer film, gold functional layer film, nichrome inducing layer film, ZnO:Al protective layer, wherein by deposition sequencing, the thickness of each film structure is respectively: the thickness of silicon nitride cushion is 21nm, the thickness of nichrome inducing layer is 3nm, the thickness of gold functional layer is 40nm, the thickness of the second nichrome inducing layer is 3nm, ZnO:Al protective layer thickness is 12nm, described glass substrate adopts float glass.

A manufacture method for golden low radiation film coating glass described above, is characterized in that comprising the following steps:

Step 1: substrate pretreatment, adopt to glass substrate, pure water carries out that high pressure sprays in advance successively, disc brush grinding, high-pressure spraying, air knife cuts water segregation, pure water spray, round brush, water segregation cut by air knife, disc brush is ground, after round brush, air knife oven dry is carried out to glass substrate, wherein pure water >=10M Ω, bake out temperature is about 60 DEG C, and air knife dries flow-control at 4T/h, blast 0.5Mpa, the speed of service is 5m/min

Step 2: prepare silicon nitride cushion, vacuumized by coating chamber, makes its vacuum≤10 -4after pa, be filled with nitrogen and argon gas, the volume ratio that is filled with of nitrogen and argon gas is 4:5, makes pressure stability in coating chamber at 0.3Pa, open shielding power supply, uses Si target, by Si 3n 4thin film deposition is to glass baseplate surface, and thickness is 21nm,

Step 3: prepare the first nichrome inducing layer, coating chamber is vacuumized, make its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use the Ni-Cr target that Ni:Cr is 4:1, chrome-nickel alloy thin film is deposited to glass baseplate surface, and thickness is 3nm,

Step 4: prepare golden functional layer, vacuumized by coating chamber, makes its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use Au target, by Au thin film deposition to glass baseplate surface, thickness is 40nm,

Step 5: prepare the second nichrome inducing layer, coating chamber is vacuumized, make its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use Ni-Cr target, Ni:Cr=4:1 in Ni-Cr target, deposits to glass baseplate surface by chrome-nickel alloy thin film, and thickness is 3nm,

Step 6: make ZnO:Al protective layer, coating chamber is vacuumized, makes its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use ZnO:Al target, ZnO:Al in ZnO:Al target 2o 3=98:2 is by the thin film deposition of ZnO:Al protective layer to glass baseplate surface, and thickness is 12nm, obtains product.

After testing, indices is as follows for the product that the present embodiment obtains:

(1) transmittance of glass visible ray is 0.102, for reflecting the transmission case of glass (wavelength 380 ~ 780nm) solar radiation in visible-range;

(2) the glass surface reflectivity of visible ray is 0.495, for reflecting the non-coated surface reflection case of glass (wavelength 380 ~ 780nm) solar radiation in visible-range;

(3) the face reflectivity of visible ray is 0.601, for reflecting the coated surface reflection case of glass (wavelength 380 ~ 780nm) solar radiation in visible-range;

(4) glass radiance is 0.03, to release energy in the form of radiation relatively strong and weak ability for weighing body surface; The radiance of object equals the energy of object radiation at a certain temperature and the ratio of black body radiation energy under same temperature.The radiance of black matrix equals 1, and the radiance of other objects is between 0 and 1;

(5) thermal conductivity factor (U value) is 1.32, and for representing object capacity of heat transmission, inside and outside the Calculation Basis hypothesis glass of U value, the temperature difference of both sides is 15 DEG C, and mean temperature is 10 DEG C, can calculate: 1/U=l/h by following method e+ l/h t+ l/h ih in formula eand h ibe respectively the heat transfer coefficient of outside and indoor.H tfor the heat transfer coefficient of glass assembly.This numerical value is less, and energy-saving effect is better.

(6) exclusive blond shades: the color of glass surface is a*=14, b*=37

The color of coated surface is a*=12, b*=24

(adopt CIELAB colour space define color, a* represents red/value of green, and b* represents Huang/blue value.)

(7) product all can obtain colden visual appearance in human viewable's gamut;

(8) outermost layer of product is provided with ZnO:Al protective layer, and product is not easily oxidized and have wearability, can place preservation more than 12 months.

embodiment 2:

A kind of golden low radiation film coating glass, it deposits following film successively at glass baseplate surface: silicon nitride buffer layer thin film, nichrome inducing layer film, gold functional layer film, nichrome inducing layer film, ZnO:Al protective layer, wherein by deposition sequencing, the thickness of each film structure is respectively: the thickness of silicon nitride cushion is 22nm, the thickness of nichrome inducing layer is 3.5nm, the thickness of gold functional layer is 45nm, the thickness of the second nichrome inducing layer is 3.5nm, ZnO:Al protective layer thickness is 13nm, described glass substrate adopts float glass.

A manufacture method for golden low radiation film coating glass described above, is characterized in that comprising the following steps:

Step 1: substrate pretreatment, adopt to glass substrate, pure water carries out that high pressure sprays in advance successively, disc brush grinding, high-pressure spraying, air knife cuts water segregation, pure water spray, round brush, water segregation cut by air knife, disc brush is ground, after round brush, air knife oven dry is carried out to glass substrate, wherein pure water >=10M Ω, bake out temperature is about 60 DEG C, and air knife dries flow-control at 4T/h, blast 0.5Mpa, the speed of service is 5m/min

Step 2: prepare silicon nitride cushion, vacuumized by coating chamber, makes its vacuum≤10 -4after pa, be filled with nitrogen and argon gas, the volume ratio that is filled with of nitrogen and argon gas is 4:5, makes pressure stability in coating chamber at 0.3Pa, open shielding power supply, uses Si target, by Si 3n 4thin film deposition is to glass baseplate surface, and thickness is 22nm,

Step 3: prepare the first nichrome inducing layer, coating chamber is vacuumized, make its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use the Ni-Cr target that Ni:Cr is 4:1, chrome-nickel alloy thin film is deposited to glass baseplate surface, and thickness is 3.5nm,

Step 4: prepare golden functional layer, vacuumized by coating chamber, makes its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use Au target, by Au thin film deposition to glass baseplate surface, thickness is 45nm,

Step 5: prepare the second nichrome inducing layer, coating chamber is vacuumized, make its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use Ni-Cr target, Ni:Cr=4:1 in Ni-Cr target, deposits to glass baseplate surface by chrome-nickel alloy thin film, and thickness is 3.5nm,

Step 6: make ZnO:Al protective layer, coating chamber is vacuumized, makes its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use ZnO:Al target, ZnO:Al in ZnO:Al target 2o 3=98:2 is by the thin film deposition of ZnO:Al protective layer to glass baseplate surface, and thickness is 13nm, obtains product.

After testing, indices is as follows for the product that the present embodiment obtains:

(1) transmittance of glass visible ray is 0.102, for reflecting the transmission case of glass (wavelength 380 ~ 780nm) solar radiation in visible-range;

(2) the glass surface reflectivity of visible ray is 0.495;

(3) the face reflectivity of visible ray is 0.601;

(4) glass radiance is 0.03;

(5) thermal conductivity factor (U value) is 1.32;

(6) exclusive blond shades: the color of glass surface is a*=14, b*=37

The color of coated surface is a*=12, b*=24

(adopt CIELAB colour space define color, a* represents red/value of green, and b* represents Huang/blue value.)

(7) product all can obtain colden visual appearance in human viewable's gamut;

(8) outermost layer of product is provided with ZnO:Al protective layer, product have wear-resisting, block water, antiseptic power, and compared with prior art, not easily oxidized, preservation more than 12 months can be placed.

embodiment 3:

A kind of golden low radiation film coating glass; it deposits following film successively at glass baseplate surface: silicon nitride buffer layer thin film; nichrome inducing layer film; gold functional layer film; nichrome inducing layer film; ZnO:Al protective layer; wherein by deposition sequencing; the thickness of each film structure is respectively: the thickness of silicon nitride cushion is 23nm; the thickness of nichrome inducing layer is 4nm, and the thickness of golden functional layer is 42nm, and the thickness of the second nichrome inducing layer is 4nm; ZnO:Al protective layer thickness is 14nm, and described glass substrate adopts float glass.

A manufacture method for golden low radiation film coating glass described above, is characterized in that comprising the following steps:

Step 1: substrate pretreatment, adopt to glass substrate, pure water carries out that high pressure sprays in advance successively, disc brush grinding, high-pressure spraying, air knife cuts water segregation, pure water spray, round brush, water segregation cut by air knife, disc brush is ground, after round brush, air knife oven dry is carried out to glass substrate, wherein pure water >=10M Ω, bake out temperature is about 60 DEG C, and air knife dries flow-control at 4T/h, blast 0.5Mpa, the speed of service is 5m/min

Step 2: prepare silicon nitride cushion, vacuumized by coating chamber, makes its vacuum≤10 -4after pa, be filled with nitrogen and argon gas, the volume ratio that is filled with of nitrogen and argon gas is 4:5, makes pressure stability in coating chamber at 0.3Pa, open shielding power supply, uses Si target, by Si 3n 4thin film deposition is to glass baseplate surface, and thickness is 23nm,

Step 3: prepare the first nichrome inducing layer, coating chamber is vacuumized, make its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use the Ni-Cr target that Ni:Cr is 4:1, chrome-nickel alloy thin film is deposited to glass baseplate surface, and thickness is 4nm,

Step 4: prepare golden functional layer, vacuumized by coating chamber, makes its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use Au target, by Au thin film deposition to glass baseplate surface, thickness is 42nm,

Step 5: prepare the second nichrome inducing layer, coating chamber is vacuumized, make its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use Ni-Cr target, Ni:Cr=4:1 in Ni-Cr target, deposits to glass baseplate surface by chrome-nickel alloy thin film, and thickness is 4nm,

Step 6: make ZnO:Al protective layer, coating chamber is vacuumized, makes its vacuum≤10 -4after pa, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use ZnO:Al target, ZnO:Al in ZnO:Al target 2o 3=98:2 is by the thin film deposition of ZnO:Al protective layer to glass baseplate surface, and thickness is 14nm, obtains product.

After testing, indices is as follows for the product that the present embodiment obtains:

(1) transmittance of glass visible ray is 0.102, for reflecting the transmission case of glass (wavelength 380 ~ 780nm) solar radiation in visible-range;

(2) the glass surface reflectivity of visible ray is 0.495;

(3) the face reflectivity of visible ray is 0.601;

(4) glass radiance is 0.03;

(5) thermal conductivity factor (U value) is 1.32;

(6) exclusive blond shades: the color of glass surface is a*=14, b*=37

The color of coated surface is a*=12, b*=24

(adopt CIELAB colour space define color, a* represents red/value of green, and b* represents Huang/blue value.)

(7) product all can obtain colden visual appearance in human viewable's gamut;

(8) outermost layer of product is provided with ZnO:Al protective layer, product have wear-resisting, block water, antiseptic power, and compared with prior art, not easily oxidized, preservation more than 12 months can be placed.

As mentioned above, the golden low radiation film coating glass that the present invention proposes has higher reflectivity at mid and far infrared wave band, at visible light wave range, there is good shading performance, its reflected colour is at the existing blond shades of wider angular field of view endosome simultaneously, compared with prior art, have that radiance is low, sunshade, the significant advantage such as attractive in appearance, pure color.

Claims (1)

1. the manufacture method of a golden low radiation film coating glass; following film is deposited successively: silicon nitride buffer layer thin film at glass baseplate surface; nichrome inducing layer film, golden functional layer film, nichrome inducing layer film; ZnO:Al protective layer film; the thickness of described silicon nitride cushion is 18nm-25nm, and the thickness of nichrome inducing layer is 1nm-5nm, and the thickness of golden functional layer is 35nm-50nm; ZnO:Al protective layer thickness is 8nm-15nm, it is characterized in that comprising the following steps:
Step 1: substrate pretreatment, adopt to glass substrate, pure water carries out that high pressure sprays in advance successively, disc brush grinding, high-pressure spraying, air knife cuts water segregation, pure water spray, round brush, water segregation cut by air knife, disc brush is ground, after round brush, air knife oven dry is carried out to glass substrate, wherein pure water >=10M Ω, bake out temperature is about 60 DEG C, and air knife dries flow-control at 4T/h, blast 0.5Mpa, the speed of service is 5m/min
Step 2: prepare silicon nitride cushion, coating chamber is vacuumized, make its vacuum≤ after, be filled with nitrogen and argon gas, the volume ratio that is filled with of nitrogen and argon gas is 4:5, and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use Si target, by Si3N4 thin film deposition to glass baseplate surface, thickness is 18nm-25nm,
Step 3: prepare the first nichrome inducing layer, coating chamber is vacuumized, make its vacuum≤ after, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use the Ni-Cr target that Ni:Cr is 4:1, chrome-nickel alloy thin film is deposited to glass baseplate surface, and thickness is 1nm-5nm,
Step 4: prepare golden functional layer, coating chamber is vacuumized, make its vacuum≤ after, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use Au target, by Au thin film deposition to glass baseplate surface, thickness is 35nm-50nm,
Step 5: prepare the second nichrome inducing layer, coating chamber is vacuumized, make its vacuum≤ after, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use Ni-Cr target, Ni:Cr=4:1 in Ni-Cr target, deposits to glass baseplate surface by chrome-nickel alloy thin film, and thickness is 1nm-5nm,
Step 6: make ZnO:Al protective layer, coating chamber is vacuumized, make its vacuum≤ after, be filled with argon gas and make pressure stability in coating chamber at 0.3Pa, open shielding power supply, use ZnO:Al target, in ZnO:Al target, ZnO:Al2O3=98:2 is by the thin film deposition of ZnO:Al protective layer to glass baseplate surface, and thickness is 8nm-15nm, obtains product.
CN201310278315.8A 2013-07-04 2013-07-04 Golden low radiation film coating glass and manufacture method thereof CN103407225B (en)

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CN104044313B (en) * 2014-07-01 2015-03-25 深圳市三鑫精美特玻璃有限公司 Anti-scratching extra-hard glass and preparation method thereof
CN106746730A (en) * 2017-01-19 2017-05-31 吴江南玻华东工程玻璃有限公司 A kind of method for strengthening the resistance to tempering performance of low radiation coated glass
CN108950478A (en) * 2018-07-29 2018-12-07 深圳万佳互动科技有限公司 Environmentally friendly low emissivity glass and preparation method thereof

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