CN103286693A - Grinding fluid distribution arm - Google Patents

Grinding fluid distribution arm Download PDF

Info

Publication number
CN103286693A
CN103286693A CN 201310211055 CN201310211055A CN103286693A CN 103286693 A CN103286693 A CN 103286693A CN 201310211055 CN201310211055 CN 201310211055 CN 201310211055 A CN201310211055 A CN 201310211055A CN 103286693 A CN103286693 A CN 103286693A
Authority
CN
Grant status
Application
Patent type
Prior art keywords
arm
polishing liquid
end
polishing
robot arm
Prior art date
Application number
CN 201310211055
Other languages
Chinese (zh)
Inventor
戴文俊
Original Assignee
上海集成电路研发中心有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Abstract

The invention discloses a grinding fluid distribution arm and belongs to the technical field of semiconductors. The grinding fluid distribution arm is positioned right above a grinding platen and can comprise a first mechanical arm, a second mechanical arm and a control module, the first mechanical arm is connected with one end of the second mechanical arm, a grinding fluid output port is formed at the other end of the second mechanical arm, and the control module controls swing of the first mechanical arm and the second mechanical arm so as to achieve control of grinding fluid spraying directions of the grinding fluid output port. By using the control module for controlling swing of the first mechanical arm and the second mechanical arm, the grinding fluid distribution arm can not only achieve flow control but also adjust opposite positions of the grinding fluid output port and the grinding platen, so that control of the grinding fluid spraying directions of the grinding fluid output port is achieved, and linear and distributive control is achieved finally.

Description

研磨液分配臂 Polishing liquid dispensing arm

技术领域 FIELD

[0001] 本发明属于半导体技术领域,具体地说,涉及一种研磨液分配臂。 [0001] The present invention belongs to the technical field of semiconductors, and more particularly, relates to a polishing liquid dispensing arm.

背景技术 Background technique

[0002] 随着300mm化学机械研磨的广泛应用和450mm制造工艺的开发,需要进行对基材先后进行铜的化学电镀(ECP)和铜的化学机械研磨(CU-CMP)的应用越来越广泛。 [0002] With the widespread use of chemical mechanical polishing of 300mm 450mm and the development of manufacturing processes, the need for chemical plating (ECP) has the substrate for chemical mechanical polishing of copper and copper (CU-CMP) is widely applied . 但是,在生产能力(throughput)上,⑶-CMP的生产相比前一站铜的化学电镀(ECP)来说比较慢,因此,总体来说,CU-CMP成为制约后道铜工艺产能的一个大的瓶颈。 However, in the production capacity (throughput), ⑶-CMP production is relatively slow compared to the previous stop electroless plating copper (ECP) is, therefore, Overall, CU-CMP becomes a constraint, after copper process capacity big bottleneck.

[0003] 目前,已有众多CMP设备厂商为提高⑶-CMP的throughput而开发新设备。 [0003] Currently, there are a number of CMP equipment manufacturers to increase throughput ⑶-CMP and the development of new equipment. 但是这些CU-CMP的型设备共同的解决方案为:扩大研磨台面(platen)的面积、增加研磨头(head)的数量。 But these CU-CMP equipment common type of solutions: the expansion of the grinding table (platen) of the area, increasing the number of grinding head (head) of. 随之而来的是研磨台面(platen)越来越大,可以在platen上研磨的研磨头(head)也随之越来越来越多。 Followed by polishing table (platen) increases, the platen can be ground in the grinding head (head) also will be more and more and more. 而使得相应的作为重要耗材的研磨液(slurry)使用量也越来越大。 Such that the respective consumables important as a polishing solution (slurry) used is also growing.

[0004] 但是,无论是现有的CMP工艺还是改进的CMP工艺,其在CMP工艺过程中,为了实现对基材的研磨,调整的对象却没有较大区别。 [0004] However, both the conventional CMP process is improved CMP process, in which CMP process, the polishing of the substrate in order to achieve, but no adjustment is quite different from the object. 比如,通常的调整对象主要包括: For example, the usual adjustment objects include:

[0005] (I)调整head的压力、转速; [0005] (I) of the head pressure adjustment speed;

[0006] (2)调整platen 的转速; [0006] (2) adjusting the rotational speed of the platen;

[0007] (3)调整slurry 的流量。 [0007] (3) Adjust the flow of slurry.

[0008] 但是,现有技术中通过head和platen的转速调整,对wafer的profile和Non-uniformity的控制是非线性的,仅靠转速的调整很难达到需要的平坦度。 [0008] However, the prior art through the head and the platen rotational speed adjustment, and control of wafer Profile of Non-uniformity is non-linear, it is difficult to adjust the speed alone to achieve the desired flatness. 另外,与slurry相关的调整仅限于流量,而不是分布式的。 In addition, related to the slurry to adjust the flow rate limited to, rather than distributed.

发明内容 SUMMARY

[0009] 本发明所要解决的技术问题是提供一种研磨液分配臂,用以实现线性和分布式控制。 [0009] The present invention solves the technical problem is to provide a polishing liquid dispensing arm, to achieve linear and distributed control.

[0010] 为解决上述技术问题,本发明提供了一种研磨液分配臂,位于研磨台面正上方,其包括:第一机械臂、第二机械臂和控制模块,第一机械臂与第二机械臂的一端连接,第二机械臂的另外一端设置有研磨液输出口,所述控制模块通过控制所述第一机械臂摆动、所述第二机械臂摆动,以实现研磨液输出口研磨液喷洒方向的控制。 [0010] In order to solve the above technical problem, the present invention provides a polishing liquid dispensing arm, located directly above the polishing table, comprising: a first mechanical arm, second arm and a control module, the first and second mechanical manipulator end of the arm is connected to the other end of the second arm is provided with a polishing liquid outlet, the control module controls the first robot arm swing, swinging the second arm, the polishing liquid to achieve a polishing liquid spray outlet control direction.

[0011] 优选地,在本发明的一实施例中,所述第一机械臂和第二机械臂内部设有贯通的研磨液管道,通过所述研磨液管道将研磨液输送到所述研磨液输出口。 [0011] Preferably, in one embodiment of the present invention, the first robot arm and the robot arm is provided with a second inner conduit through the polishing by the polishing liquid conduit to deliver the polishing liquid to the polishing solution output port.

[0012] 优选地,在本发明的一实施例中,第一机械臂一端设置有第一轴承,另外一端通过第二轴承与第二机械臂的一端连接,第二机械臂的另外一端设置有研磨液输出口。 [0012] Preferably, in one embodiment of the present invention, the first robot arm provided with a first bearing at one end, the other end connected to one end of the second bearing and the second arm, the other end of the second arm is provided with polishing liquid outlet.

[0013] 优选地,在本发明的一实施例中,所述控制模块通过控制所述第一机械臂围绕所述第一轴承摆动、所述第二机械臂围绕所述第二轴承摆动,以实现研磨液喷洒方向的控制。 [0013] Preferably, in one embodiment of the present invention, the control module controls the first robot arm about the first pivot bearing, said second arm about said second pivot bearing, to to achieve control of the polishing liquid spraying direction.

[0014] 优选地,在本发明的一实施例中,所述控制模块包括伺服单元和传动单元。 [0014] Preferably, in one embodiment of the present invention, the servo unit comprising a control module and a transmission unit.

[0015] 优选地,在本发明的一实施例中,所述伺服单元包括分别针对所述第一机械臂和所述第二机械臂的两个独立伺服单元,传动单元包括使所述第二机械臂随所述第一机械臂从动的传动单元。 [0015] Preferably, in one embodiment of the present invention, for each said servo means comprises two independent servo unit, the drive unit of the first robot arm and said second arm comprises the second the first robot arm robot arm with the driven gear unit.

[0016] 优选地,在本发明的一实施例中,所述传动单元为皮带,所述伺服单元为马达。 [0016] Preferably, in one embodiment of the present invention, the belt drive unit, the servo unit is a motor.

[0017] 优选地,在本发明的一实施例中,在所述第一机械臂的同一端上下不同的端面上分别设置一伺服单元。 [0017] Preferably, in one embodiment of the present invention, at the same end of the vertical robot arm different from the first end face are respectively provided with a servo unit.

[0018] 本发明中,通过所述控制模块控制所述第一机械臂摆动、所述第二机械臂摆动,不但可以实现流量的控制,还可以调整研磨液输出口与研磨台相对位置,从而实现研磨液输出口研磨液喷洒方向的控制,最终实现了线性和分布式控制。 [0018] the present invention, the control module controls the first robot arm swing, swinging the second robot arm, can not only flow control can also adjust the polishing liquid and the polishing table output relative position, whereby polishing liquid spraying direction to achieve control of the polishing liquid outlet, linear and ultimately distributed control.

附图说明 BRIEF DESCRIPTION

[0019] 图1为本发明实施例的研磨液分配臂俯视结构示意图; Polishing liquid dispensing arm [0019] Figure 1 is a top view of an embodiment of the invention structural diagram;

[0020] 图2为本发明实施例中第一机械臂结构示意图; [0020] FIG. 2 is a schematic structure of the robot arm a first embodiment of the present invention;

[0021]图3为本发明实施例中第一机械臂与第二机械臂的连接示意图。 [0021] FIG. 3 a schematic diagram of a first robot arm is connected with the second arm of the embodiment of the present invention.

具体实施方式 Detailed ways

[0022] 以下将配合图式及实施例来详细说明本发明的实施方式,藉此对本发明如何应用技术手段来解决技术问题并达成技术功效的实现过程能充分理解并据以实施。 [0022] with the following drawings and will be described in detail in Example embodiments of the present invention, thereby fully understand how the present invention is applied to the technical means to solve the technical problem and achieve the technical effects of the implementation process and accordingly embodiment.

[0023] 本发明下述实施例中,通过所述控制模块控制所述第一机械臂摆动、所述第二机械臂摆动,不但可以实现流量的控制,还可以调整研磨液输出口与研磨台相对位置,从而实现研磨液输出口研磨液喷洒方向的控制,最终实现了线性和分布式控制。 [0023] The following embodiments of the present invention, the first robot arm is swung by the control module, the second arm swing, can not only flow control can also adjust the polishing liquid and the polishing table output relative position, thus controlling the output polishing liquid polishing liquid spraying direction, ultimately linear and distributed control.

[0024] 如图1所示,为本发明实施例的研磨液分配臂俯视结构示意图,位于研磨台100面正上方,其包括:第一机械臂101、第二机械臂102和控制模块(图中未不出),所述控制模块包括伺服单元和传动单元。 [0024] FIG. 1, a schematic diagram of the structure of the polishing liquid dispensing arm plan view of the embodiment of the invention, is positioned above the surface of the polishing table 100, comprising: a first robot arm 101, second arm 102 and a control module (FIG. not not), the servo unit comprising a control module and a transmission unit. 所述伺服单元包括分别针对所述第一机械臂101和所述第二机械臂101的两个独立伺服单元,传动单元包括使所述第二机械臂102随所述第一机械臂101从动的传动单元105。 Said servo means comprises a robot arm 101, respectively for the first and the second arm two independent servo unit, the drive unit 101 includes a second arm 102 with the manipulator 101 of the first driven the drive unit 105. 如此,从而可以通过第一机械臂101摆动和/或第二机械臂102的摆动,实现对研磨液喷洒方向的控制。 Thus, the wobble and can be swung / or the second arm 102 by a first robot arm 101, to achieve control of the polishing liquid spraying direction. 本实施例中,所述传动单元可以为皮带,所述伺服单元可以为马达。 In this embodiment, the transmission unit may be a belt, the motor may be a servo unit. 详细参加下述内容。 Details participate in the following.

[0025] 本实施例中,如图2所示,为本发明实施例中第一机械臂结构示意图,所述第一机械臂101内部设有研磨液管道103,第一机械臂101 —端IOla设置有第一轴承111,在所述第一机械臂的设置所述第一轴承111的一端,在该第一轴承上下不同的端面,即底部和顶部各设置一伺服单元,即第一伺服单元121、第二伺服单元131,第二伺服单元131上设置有传动单元141。 [0025] In this embodiment, as shown in FIG. 2, a schematic diagram of a first embodiment of the invention the robot arm configuration embodiment, the inside of the first robot arm 101 is provided with the polishing liquid conduit 103, the first robot arm 101 - terminal IOla is provided with a first bearing 111, disposed at an end of the first robot arm 111 of the first bearing, the first bearing is different in vertical end surfaces, i.e., provided with a bottom and top of each servo unit, i.e., a first servo unit 121, a second servo unit 131, the drive unit 141 is provided with a second servo unit 131. 如此,可以控制第一机械臂101围绕第一轴承111做圆心摆动。 So, you can control the first robotic arm 101 around the first bearing 111 to make the center swing.

[0026] 如图3所示,为本发明实施例中第一机械臂与第二机械臂的连接示意图,第二机械臂102内部设有研磨液管道103,通过所述研磨液管道103将研磨液输送到所述研磨液输出口104。 [0026] FIG. 3, a schematic diagram of the present embodiment, the first robot arm is connected with a second embodiment of the invention the robot arm, the robot arm 102 is provided inside the second fluid conduit 103 polishing, polishing by the polishing liquid conduit 103 polishing slurry was supplied to the output port 104. 需要说明的是,第二机械臂102内部的研磨液管道103与第一机械臂101内部的研磨液管道103是贯通的。 Incidentally, the second arm 102 inside the polishing liquid conduit 103 with the interior of the first robot arm 101 is a polishing liquid conduit 103 therethrough. 具体地,第二机械臂102的一端102a与第一机械臂101的另外一端101b,第二机械臂102的另外一端102b设置有研磨液输出口104。 Specifically, the second arm 102 is one end 102a of the first robot arm 101 the other end 101b, the other end of the second arm 102b is provided with a polishing liquid 102 output port 104. 第一机械臂101的另外一端IOlb通过第二轴承121与第二机械臂101的一端102a连接,第二机械臂102的另外一端102b设置有研磨液输出口104。 The first manipulator 101 is iolB other end connected to one end 102a of the second bearing 121 and the second arm 101, the other end of the second arm 102b is provided with a polishing liquid 102 output port 104. [0027] 本实施例中,所述控制模块(图中未示出)通过控制所述第一机械臂101摆动、所述第二机械臂102摆动,以实现研磨液输出口104研磨液喷洒方向的控制。 [0027] In this embodiment, the control module (not shown) by controlling the swing of the first robot arm 101, the second arm 102 to swing in order to achieve the output port 104 polishing polishing solution was sprayed direction control. 具体地,控制第一机械臂101围绕第一轴承111做圆心摆动,控制第二机械臂102围绕第二轴承121做圆心摆动,或者,控制第一机械臂101围绕第一轴承111做圆心摆动,从而通过传动单元105带动第二机械臂102围绕第二轴承121做圆心摆动。 Specifically, the control of the first robot arm 101 about a pivot center do the first bearing 111, the control center to make the second arm 102 about the second pivot bearing 121, or 101 controls the first manipulator to do about the first center pivot bearing 111, 105 thereby driving the second arm 102 about the pivot center do the second bearing 121 by the transmission unit. 从而实现研磨液喷洒方向的控制。 Thereby achieving the control polishing liquid spraying direction.

[0028] 本发明上述实施例提供的喷洒液机械臂工作状态如下: [0028] spraying a liquid state above the robot working embodiment of the present invention are as follows:

[0029] 通过控制模块中的第一伺服单元121驱动所述第一机械臂101进行圆心摆动,此时,第二伺服单元131不对所述第二机械臂102驱动,由于传动单元105两端各自在第一机械臂101的一端和第二机械臂102 —端,因此可保证第二机械臂102只要随着第一机械臂101的摆动进行摆动,从而带动研磨液输送口104喷洒方向的改变; [0029] The first robot arm 101 by driving the first servo unit control module 121 performs the swing center, at this time, the second servo unit 131 does not drive the second robot arm 102, since the respective drive unit ends 105 in the end of the first robot arm 101 and second arm 102 - terminal, thus guaranteeing long as the first robot arm 101 is swung to swing, so as to drive the slurry delivery port 104 to change the spray direction of the second arm 102;

[0030] 通过控制模块中的第二伺服单元131对所述第二机械臂102驱动,使第二机械臂102围绕第二轴承121做圆心摆动,从而带动研磨液输送口104喷洒方向的改变;此时,第一伺服单元121不对所述第一机械臂101驱动。 [0030] driven by a second servo control unit 131 of module 102 to the second arm, the second robot arm 102 about the pivot center do the second bearing 121, so as to drive the slurry delivery port 104 to change the direction of the spray; In this case, the first servo unit 121 of the first robot arm 101 does not drive.

[0031] 通过控制模块中的第一伺服单元121、第二伺服单元131分别对第一机械臂101和第二机械臂102同时进行驱动,即可实现使第二机械臂102围绕第二轴承121做圆心摆动,也可实现第二机械臂102随着第一机械臂101的摆动进行摆动,从而增大研磨液输送口104喷洒方向的大范围改变。 [0031] The second servo unit 131 respectively of the first robot arm 101 and second arm 102 for simultaneously driving the first servo unit 121 by the control module, the second robot arm 102 can be realized around the second bearing 121 do swing center, the second arm 102 is swung with the swing of the first robot arm 101, thereby increasing the large range of slurry delivery port 104 to change the spray direction can be achieved.

[0032] 上述说明示出并描述了本发明的若干优选实施例,但如前所述,应当理解本发明并非局限于本文所披露的形式,不应看作是对其他实施例的排除,而可用于各种其他组合、修改和环境,并能够在本文所述发明构想范围内,通过上述教导或相关领域的技术或知识进行改动。 [0032] The above description of the embodiments shown and described several preferred embodiments of the present invention, as previously discussed, it should be understood that the invention is not limited to the form disclosed herein should not be considered as excluding other embodiments, the It may be used in various other combinations, modifications, and environments, and can be contemplated within the scope of the invention described herein, or make changes to the above teachings in skill or knowledge of the relevant art. 而本领域人员所进行的改动和变化不脱离本发明的精神和范围,则都应在本发明所附权利要求的保护范围内。 The modifications and variations carried out by the skilled person without departing from the spirit and scope of the invention shall fall within the scope of the appended claims of the invention.

Claims (8)

  1. 1.一种研磨液分配臂,位于研磨台面正上方,其特征在于,包括:第一机械臂、第二机械臂和控制模块,第一机械臂与第二机械臂的一端连接,第二机械臂的另外一端设置有研磨液输出口,所述控制模块通过控制所述第一机械臂摆动、所述第二机械臂摆动,以实现研磨液输出口研磨液喷洒方向的控制。 A polishing liquid dispensing arm, located directly above the polishing table, wherein, comprising: a first mechanical arm, second arm and a control module, the first manipulator and the second arm connected to one end, a second machine the other end of the arm is provided with a polishing liquid outlet, the control module controls the first robot arm by swinging the second arm swing, in order to achieve control of the spray direction of the polishing liquid polishing liquid outlet.
  2. 2.根据权利要求1所述的研磨液分配臂,其特征在于,所述第一机械臂和第二机械臂内部设有贯通的研磨液管道,通过所述研磨液管道将研磨液输送到所述研磨液输出口。 The polishing liquid dispensing arm according to claim 1, wherein said first and second robot arm manipulator provided with an internal conduit through the polishing liquid, the polishing liquid through the slurry delivery conduit to the said polishing liquid outlet.
  3. 3.根据权利要求1所述的研磨液分配臂,其特征在于,第一机械臂一端设置有第一轴承,另外一端通过第二轴承与第二机械臂的一端连接,第二机械臂的另外一端设置有研磨液输出口。 The polishing liquid dispensing arm according to claim 1, characterized in that the first robot arm provided with a first bearing at one end, the other end connected to one end of the second bearing and the second arm, the second arm further one end with a polishing liquid outlet.
  4. 4.根据权利要求3所述的研磨液分配臂,其特征在于,所述控制模块通过控制所述第一机械臂围绕所述第一轴承摆动、所述第二机械臂围绕所述第二轴承摆动,以实现研磨液喷洒方向的控制。 The polishing liquid dispensing arm according to claim 3, wherein said control module controlling said first bearing by a second robot arm about the first pivot bearing, said second arm about the swing, to implement a control polishing liquid spraying direction.
  5. 5.根据权利要求1所述的研磨液分配臂,其特征在于,所述控制模块包括伺服单元和传动单元。 Dispensing arm 5. The polishing liquid according to claim 1, wherein said servo unit comprises a control module and a transmission unit.
  6. 6.根据权利要求5所述的研磨液分配臂,其特征在于,所述伺服单元包括分别针对所述第一机械臂和所述第二机械臂的两个独立伺服单元,传动单元包括使所述第二机械臂随所述第一机械臂从动的传动单元。 The dispensing arm polishing solution according to claim 5, wherein said servo means comprises two separate servo for each unit of the first drive unit and said robot arm so that the second arm comprises said second arm of the first robot arm with a driven gear unit.
  7. 7.根据权利要求5或6所述的研磨液分配臂,其特征在于,所述传动单元为皮带,所述伺服单元为马达。 The polishing liquid dispensing arm 5 or claim 6, characterized in that the belt drive unit, the servo unit is a motor.
  8. 8.根据权利要求6所述的研磨液分配臂,其特征在于,在所述第一机械臂的同一端上下不同的端面上分别设置一伺服单元。 8. The polishing liquid dispensing arm according to claim 6, characterized in that, at the same end of the vertical robot arm different from the first end face are respectively provided with a servo unit.
CN 201310211055 2013-05-31 2013-05-31 Grinding fluid distribution arm CN103286693A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 201310211055 CN103286693A (en) 2013-05-31 2013-05-31 Grinding fluid distribution arm

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 201310211055 CN103286693A (en) 2013-05-31 2013-05-31 Grinding fluid distribution arm

Publications (1)

Publication Number Publication Date
CN103286693A true true CN103286693A (en) 2013-09-11

Family

ID=49088497

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 201310211055 CN103286693A (en) 2013-05-31 2013-05-31 Grinding fluid distribution arm

Country Status (1)

Country Link
CN (1) CN103286693A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103551959A (en) * 2013-10-31 2014-02-05 桂林福冈新材料有限公司 Grinding fluid distribution arm

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040229549A1 (en) * 2003-05-02 2004-11-18 Applied Materials, Inc. Slurry delivery arm
CN1672876A (en) * 2004-03-25 2005-09-28 株式会社东芝 Polishing apparatus and method of polishing a subject
CN101121239A (en) * 2006-08-07 2008-02-13 上海华虹Nec电子有限公司 Chemical and mechanical grinding bench chemical liquid supplying device
CN101147232A (en) * 2005-05-26 2008-03-19 应用材料股份有限公司 Smart conditioner rinse station
CN101623849A (en) * 2009-07-31 2010-01-13 清华大学 Trimmer for trimming polishing pad
CN201544127U (en) * 2009-09-03 2010-08-11 闽南理工学院 Fluid supply device for grinding and polishing machine
US20100210189A1 (en) * 2009-02-13 2010-08-19 Taiwan Semiconductor Manufacturing Co., Ltd. Slurry dispenser for chemical mechanical polishing (cmp) apparatus and method
CN102124545A (en) * 2008-08-14 2011-07-13 应用材料公司 Chemical mechanical polisher having movable slurry dispensers and method
CN102203918A (en) * 2008-10-31 2011-09-28 应用材料公司 Self cleaning and adjustable slurry delivery arm
CN102335869A (en) * 2010-07-21 2012-02-01 中芯国际集成电路制造(上海)有限公司 Chemical mechanical polishing device and method

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040229549A1 (en) * 2003-05-02 2004-11-18 Applied Materials, Inc. Slurry delivery arm
CN1672876A (en) * 2004-03-25 2005-09-28 株式会社东芝 Polishing apparatus and method of polishing a subject
CN101147232A (en) * 2005-05-26 2008-03-19 应用材料股份有限公司 Smart conditioner rinse station
CN101121239A (en) * 2006-08-07 2008-02-13 上海华虹Nec电子有限公司 Chemical and mechanical grinding bench chemical liquid supplying device
CN102124545A (en) * 2008-08-14 2011-07-13 应用材料公司 Chemical mechanical polisher having movable slurry dispensers and method
CN102203918A (en) * 2008-10-31 2011-09-28 应用材料公司 Self cleaning and adjustable slurry delivery arm
US20100210189A1 (en) * 2009-02-13 2010-08-19 Taiwan Semiconductor Manufacturing Co., Ltd. Slurry dispenser for chemical mechanical polishing (cmp) apparatus and method
CN101623849A (en) * 2009-07-31 2010-01-13 清华大学 Trimmer for trimming polishing pad
CN201544127U (en) * 2009-09-03 2010-08-11 闽南理工学院 Fluid supply device for grinding and polishing machine
CN102335869A (en) * 2010-07-21 2012-02-01 中芯国际集成电路制造(上海)有限公司 Chemical mechanical polishing device and method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103551959A (en) * 2013-10-31 2014-02-05 桂林福冈新材料有限公司 Grinding fluid distribution arm

Similar Documents

Publication Publication Date Title
CN101020537A (en) Direction change device
CN101983838A (en) Milling, grinding and polishing device based on intelligent numerically-controlled platform
JP2007144297A (en) Thin film formation method
JP2010064196A (en) Substrate polishing device and substrate polishing method
CN204220373U (en) Spraying chamber and spraying system
CN202087937U (en) Disc dislocation welding machine
CN203991046U (en) Smart spray painting robot device
CN1727235A (en) Arm-and-hand system in use for car washer
US20060014478A1 (en) Apparatus and method for distributing a polishing fluid
US20050217793A1 (en) Substrate treating apparatus
JP2007021680A (en) Double-side lapping method for wafer
CN101954322A (en) Speed-variable supersonic flame spraying spherical device
US20040087257A1 (en) CMP equipment for use in planarizing a semiconductor wafer
CN204444072U (en) Cream automatic spraying device
KR101165557B1 (en) Dispensing apparatus for dispenser liquid coating
CN201417758Y (en) System using nano-mist chemical agent to dispose substrate
CN105562294A (en) Online full-automatic high-speed jet dispenser
CN203307379U (en) Half-shaft quenching machine tool and water spraying device thereof
CN203155910U (en) Cooling and lubricating device for upsetting press die
CN205415667U (en) Robot automated?control fixing device
CN203782236U (en) Double-slot groove etching machine
CN201483358U (en) Mechanical arm used for polishing pad adjusting device
CN205237320U (en) Tungsten needle grinds mechanism based on welding equipment of robot
CN203293190U (en) Four-shaft machine transmission device
CN202169534U (en) Improved upper polishing head of polishing machine

Legal Events

Date Code Title Description
C06 Publication
C10 Entry into substantive examination
WD01