CN103177923B - A kind of gas distributed system and verification method that is applied to plasma treatment appts - Google Patents

A kind of gas distributed system and verification method that is applied to plasma treatment appts Download PDF

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Publication number
CN103177923B
CN103177923B CN201110431014.5A CN201110431014A CN103177923B CN 103177923 B CN103177923 B CN 103177923B CN 201110431014 A CN201110431014 A CN 201110431014A CN 103177923 B CN103177923 B CN 103177923B
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gas
flow
reaction chamber
bypass channel
valve
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CN103177923A (en
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周旭升
周军
孙海辉
范宝光
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Medium and Micro Semiconductor Equipment (Shanghai) Co., Ltd.
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Advanced Micro Fabrication Equipment Inc Shanghai
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Abstract

The invention provides a kind of gas distributed system for plasma-reaction-chamber and verification method thereof, wherein, the present invention just can be by measuring reaction chamber air pressure added a bypass channel on one of at least two gas passages after, converse the actual flow of the gas passage not being bypassed, the theoretical measured value after actual measured value and shunting relatively just can be judged to the working condition of gas distribution adjuster. Wherein test value can be repeatedly to measure and obtain high accuracy data on same paths, also can be after a passage is measured again the output gas flow to gas supply source or another gas passage again measure, measured value again and measured value are for the first time compared to offset the impact causing as variablees such as temperature.

Description

A kind of gas distributed system and verification method that is applied to plasma treatment appts
Technical field
The present invention relates to field of semiconductor manufacture, relate in particular to a kind of multichannel gas for plasma reaction chamberBody compartment system.
Background technology
Semiconductor equipment is processed and need to be used plasma processing equipment wafer, and plasma apparatus comprisesRadio frequency supply system and gas supply system, along with wafer size has generally reached 12 inches now, veryExtremely larger size is also in research and development. In order to obtain processing uniformly in large-area plasma reaction chamberEffect, need to, to the gas of reaction chamber zones of different supply different flow, make to offset other hardware parameterThe processing effect difference becoming. Multiple reacting gas is by the flow controller (MFC) of connecting on every kind of gasAccurately control flow, be mixed into reacting gas finally by crossing mixing chamber. After having mixed, pass through again mutuallyPipeline or the chamber of isolation are distributed to different gas supply areas, and the reacting gas after separation has settingRatio. Now industrial quarters is carried out multiple through conventional same plasma processing equipment as plasma etching machineWith the processing of technique, to obtain best processing effect man-hour and will make to flow to wafer carrying out different addingOn processing gas there is different flow proportionals. But the mixed gas flow in front is through MFC essenceReally control, the gas flow ratio that flows to differential responses district is not but accurately measured or checking after setting,Can cause corresponding processing effect synchronously can produce deviation if there is the skew after deviation or long-term use.So prior art needs a system or method can measure accurately the shunting precision of current divider.
Summary of the invention
For the problems referred to above in background technology, the present invention proposes a kind of gas for plasma reaction chamberBody compartment system and verification method thereof.
The present invention has disclosed a kind of gas distributed system that is applied to plasma treatment appts, described plasmaTreating apparatus comprises a reaction chamber and gas distributor, and described gas distributor comprises at least two independencesDistribution of gas district to the reaction chamber zones of different activity body of regulating the flow of vital energy, air extractor and reaction chamber are connectedLogical, discharge the processing gas in reaction chamber; The processing gas of a gas supply source supply flow-controllable;A gas distribution adjuster is by being connected to the air supply channel reception & disposal gas of described gas supply source;Described gas distribution adjuster is shunted described processing gas and is fed to institute by the first and second gas passagesState two separate gas distributed areas of gas distributor; The first gas passage also comprises first switch valveDoor is communicated to described reaction chamber, and described in a bypass channel is communicated to by the first by-pass switch valveAir extractor.
The second gas passage comprises that a second switch valve is communicated to described reaction chamber, and a bypassPassage is communicated to described air extractor by the second by-pass switch valve.
The present invention also can be fed at least San Ge district of reaction chamber for reacting gas air-flow being divided into three tunnelsEmbodiment, the real gas flow that now just need at least test more than two-way could obtain accurate air-flowAllotment ratio, so at least wherein two gas passages will comprise a bypass channel. Such as the first via is straightLogical reaction chamber air feed, the second road and Third Road respectively comprise one can switch bypass channel be communicated to the dress of bleedingPut. Setting after gas flow allotment ratio, the first gas of bypass the second Third Road, according to aforementioned sideMethod is measured the once flow measured value to twice reaction pressure acquisition first via gas passage; Secondly bypass theThree gas passages, again measure and obtain the first and second paths and open the flow measured value under situation. TwoPerson subtracts each other the flow value that just can obtain alternate path. Deduct recording of the first and second flows by total flow valueValue just can obtain the flow value of three-way. More the subregion of multichannel air-flow also can be after the same method for otherObtain checking, each gas passage of certain 2 roads or gas distribution delivery outlets more than 3 tunnels all connectsA bypass channel is preferred version, and testing sequence and method can have more more options.
Brief description of the drawings
Fig. 1 is embodiment of the present invention system construction drawing
Detailed description of the invention
Below in conjunction with accompanying drawing, the specific embodiment of the present invention is described.
Fig. 1 is that the present invention is for plasma processing apparatus gas distributed system structural representation. A gasBody source of supply 10 provides the gas of one or more flow-controllables and mixing ratio. The interior bag of gas supply source 10Draw together multiple gas flow controllers and can control accurately and regulate gas with various flow. Gas supply source 10The reacting gas of output flows to the gas distribution adjuster 20 in downstream, by output-response gas be divided intoFew two-way output is fed to the zones of different in downstream reaction chamber 100. Be fed to the anti-of reaction chamber first areaAnswer gas to be communicated to an output of gas distribution adjuster by the first gas pipeline. Be fed to reactionIt is defeated that the reacting gas of chamber second area is communicated to another of gas distribution adjuster by the second gas pipelineGo out end. Can adapt to not by the output gas flow of gas ratio of controlling two outputs of gas distribution adjusterWith processing technology, reacting gas is needed in the interior different distribution of reaction chamber 100. At first, second gasOn pipeline, also respectively comprise the valve 210,220 that can control folding. At the front end of valve inflow gas alsoRespectively comprise a bypass gas pipeline, respectively by the bypass valve 211,221 that can control foldingBe connected to air extractor. In addition gas distribution adjuster upstream also comprises the valve 11 that can control foldingBe connected to this air extractor.
In the time that the present invention moves for the gas distributed system of plasma treatment appts, comprise two kinds of patterns:The gentle flow verification pattern of plasma treatment pattern. Under plasma treatment pattern, disconnect above-mentioned valve 11,211,221, closure valve 210 and 220 makes whole reaction chamber come according to gas distribution adjuster simultaneouslyExport as required the gas of certain ratio to the zones of different of reaction chamber 100, flow through the first gas pipelineWith the gas of the second gas pipeline can be 50%:50%, can be also 40%:60%, any ratio all canWith. Under air-flow Validation Mode in order to verify that whether gas distribution adjuster shunted instead by the ratio of settingAnswer gas, need to will between the gas bypassing of at least one road, flow into air extractor with checking. Flow through the with checkingThe flow of one gas pipeline is example, in the time that upstream gas flow is output as 2000sccm, if gas distributionThe ratio that adjuster is set is 1:1, and the flow that flows through accurately the first gas pipeline should be1000sccm. At this moment can open valve 210, disconnect valve 211 and make the reaction in the first gas pipelineGas flows into reaction chamber, disconnects 220 simultaneously and opens valve 221 and make the reacting gas in the second gas pipelineDo not flow into reaction chamber and flow directly into air extractor. Like this gas distribution adjuster 20 and plasma are addedUnder work pattern, there is identical duty, and two-way gas can not interact, interference measurement results.
When flow in the first gas pipeline is flow through in measurement, can utilize the formula of PV=nRT to obtain. ItsMiddle P represents the air pressure in reaction chamber, and V represents that container volume is reaction chamber inner space in the present invention,It is the fixed value that can measure. N represents namely flow and the product of time of gas flow, along with timeBetween change with the variation of flow. R is a constant, has embodied the proportionate relationship between different parameters. TRefer to reaction chamber temperature, the air pressure of gas can raise along with the rising of reaction cavity temperature.
In the time that the flow of the first gas pipeline is flow through in measurement with above-mentioned 1000sccm to reaction chamber air feed, processCertain hour just obtains theoretical gas flow afterwards as 10 seconds or 30 seconds, then measures the temperature in reaction chamberThe numerical value theoretical air pressure P value in the reaction chamber in formula PV=nRT is known, is just having with reaction chamber itselfBarometer obtain actual measurement air pressure compare and just can know gas distribution adjuster with theoretical atmospheric pressure value PWhether 20 assignment of traffic on the first gas pipeline are accurate. Total due to inflow gas parallel regulatorSo the known flow Xsccm recording that alleviates of flow, the flow that flows through the second gas pipeline is (2000-X)sccm。
Because the air-flow of front end gas supply source also may have error slightly, such as setting value is2000sccm, actual numerical value may be skew between 1950~2050, in order to offset this with errorThe theoretical value problem of bringing of comparing with the actual flow value recording, can be simultaneously to gas supply source 10Output gas carry out flow measurement. In the time measuring, can open valve 210,220 simultaneously, or turn-offOne of them, ensure to disconnect valve 211,221 and make all gas all flow into reaction chamber, with above-mentioned survey gasThe method of pressing obtains the flow of actual measurement, then compares with the measured value after gas distribution, if split into50% of total air flow, both numerical value should be also 1:50%, otherwise just illustrate that gas distribution adjuster existsError.
Temperature numerical T is unstable in some cases, during such as just start and after the operation a very long timeCavity temperature can great changes will take place in reaction, and this can cause the actual air pressure skew recording to cause erroneous judgement. ForOffset this error, can complete the shunting ratio of adjustments of gas parallel regulator after one-shot measurement,Such as changing 40%:60% into from 50%:50%, again measure. So because twice Measuring Time is separated by very shortTemperature can become hardly, so the theoretical air pressure P measuring for the first time1=n1RT/V and the theory of measuring for the second timeAir pressure P2=n2Both ratio P of RT/V1:P2=n1:n2So, in the situation that the gas flow angle of incidence is known,The air pressure of twice measurement is than the flow-rate ratio of namely twice measurement. If the air pressure namely recording for twice ratioRate is that the 50%:40% interval scale gas distribution adjuster of theoretical ratio is working properly.
Process and test beyond twice under different flow ratio by the first gas pipeline, also can be secondThe working condition of gas pipeline measurement gas parallel regulator. The first gas pipeline is the same with measuring, at thisIn the situation of kind, need Shuttoff Valve 210, open valve 211 and make the first pipeline gas flow directly into the dress of bleedingPut. Open valve 220, Shuttoff Valve 221 flows directly into anti-the gas in the second gas pipeline simultaneouslyAnswer chamber. Then adopt the method identical with test the first gas pipeline to change according to the size of reaction chamber air pressureCalculate and obtain the actual flow recording, more finally judge whether that with the theoretical value of setting gas distribution regulatesDevice is normally worked.
The present invention just can be by surveying added a bypass channel on one of at least two gas passages afterThe gas that quantitative response chamber air pressure goes out not to be bypassed according to the reaction chamber pressure reduction recording in public PV=nRT is logicalThe actual flow in road, relatively just can judge gas by the theoretical measured value after actual measured value and shuntingThe working condition of parallel regulator. Wherein test value can be repeatedly to measure and obtain on same pathsHigh accuracy data can be also the output gas to gas supply source 10 again after a passage is measuredStream or another gas passage carry out one-shot measurement, will be again measured value compare with measured value for the first timeOffset the impact causing as variablees such as temperature.
The present invention also can be fed at least San Ge district of reaction chamber for reacting gas air-flow being divided into three tunnelsEmbodiment, the real gas flow that now just need at least test more than two-way could obtain accurate air-flowAllotment ratio, so at least wherein two gas passages will comprise a bypass channel. Such as the first via is straightLogical reaction chamber air feed, the second road and Third Road respectively comprise one can switch bypass channel be communicated to the dress of bleedingPut. Setting after gas flow allotment ratio, the first gas of bypass the second Third Road, according to aforementioned sideMethod is measured the once flow measured value to twice reaction pressure acquisition first via gas passage; Secondly bypass theThree gas passages, again measure and obtain the first and second paths and open the flow measured value under situation. TwoPerson subtracts each other the flow value that just can obtain alternate path. Deduct recording of the first and second flows by total flow valueValue just can obtain the flow value of three-way. More the subregion of multichannel air-flow also can be after the same method for otherObtain checking, each gas passage of certain 2 roads or gas distribution delivery outlets more than 3 tunnels all connectsA bypass channel is preferred version, and testing sequence and method can have more more options.
Although content of the present invention has been done detailed introduction by above preferred embodiment, should be familiar withShould not be considered to limitation of the present invention to above-mentioned description. Read above-mentioned those skilled in the artAfter content, for multiple amendment of the present invention and substitute will be all apparent. Therefore, of the present inventionProtection domain should be limited to the appended claims.

Claims (4)

1. be applied to a gas distributed system for plasma treatment appts,
Described plasma treatment appts comprises a reaction chamber and gas distributor, described gas distributor bagDraw together at least two independently distribution of gas district to the reaction chamber zones of different activity body of regulating the flow of vital energy, the dress of bleedingPut with reaction chamber and be connected, discharge the processing gas in reaction chamber;
The processing gas of a gas supply source supply flow-controllable;
A gas distribution adjuster is by being connected to the air supply channel reception & disposal of described gas supply sourceGas;
Described gas distribution adjuster is shunted described processing gas and is passed through the first gas passage and the second gasBody passage is fed to two separate gas distributed areas of described gas distributor;
It is characterized in that: on described the first gas passage, the first controlled valve is set, described the first switch valveBetween door and described gas distribution adjuster, the first bypass channel is set, on described the first bypass channel, arrangesThe first by-pass switch valve, the output of described the first bypass channel is communicated to described air extractor;
Between described gas supply source and described gas distribution adjuster, the second bypass channel is set, describedThe output of two bypass channels is communicated to described air extractor, and on described the second bypass channel, arranging one canControl the valve of folding.
2. the gas distributed system that is applied to plasma treatment appts according to claim 1, its spyLevy and be, the output of described gas distribution adjuster also comprises that the 3rd gas passage is by reacting gasBe transported to reaction chamber, the 3rd controlled valve, described the 3rd switch are set on described the 3rd gas passageBetween valve and described gas distribution adjuster, the 3rd bypass channel is set, on described the 3rd bypass channel, establishesPut the 3rd by-pass switch valve, the output of described the 3rd bypass channel is communicated to described air extractor.
3. the gas distributed system that is applied to plasma treatment appts according to claim 1, its spyLevy and be, on described the second gas passage, second switch valve is set, described second switch valve and described inThe 4th bypass channel is set between gas distribution adjuster, on described the 4th bypass channel, the 4th bypass is setControlled valve, the output of described the 4th bypass channel is communicated to described air extractor.
4. be applied to a verification method for plasma treatment appts gas distributed system,
Described plasma treatment appts comprises a reaction chamber and gas distributor, described gas distributor bagIndependently distribution of gas district is to the reaction chamber zones of different activity body of regulating the flow of vital energy to draw together at least two, and a gas dividesThrottle regulator supplies at least Liang Ge distribution of gas district of described gas distributor by least two gas passagesGas, air extractor and reaction chamber are connected, and discharge the processing gas in reaction chamber; It is characterized in that:Paths is on one side set in described gas distribution adjuster upstream, and the output of described bypass channel is communicated toDescribed air extractor, arranges the valve that can control folding on described bypass channel;
Utilize described gas distribution adjuster that described processing gas is divided into Part I and Part II placeThe body of regulating the flow of vital energy, makes wherein Part I process gas and flows into described reaction chamber, and wherein Part II is processed gasFlow directly into described air extractor;
Measure the Part I gas atmosphere of described inflow reaction chamber, and calculate Part I and process gas flowAmount;
The Part I of gas distribution adjuster output and Part II gas are flowed into reaction chamber, measure anti-Answer chamber air pressure and calculate and obtain overall air flow rate;
Overall gas flow, as air-flow reference value, with the Part I gas flow value comparison of measuring gained, is sentencedThe body parallel regulator point stream mode of dying.
CN201110431014.5A 2011-12-20 2011-12-20 A kind of gas distributed system and verification method that is applied to plasma treatment appts Active CN103177923B (en)

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CN201110431014.5A CN103177923B (en) 2011-12-20 2011-12-20 A kind of gas distributed system and verification method that is applied to plasma treatment appts
TW101143573A TW201334022A (en) 2011-12-20 2012-11-21 Gas distribution system and authentication method applied to plasma processing apparatus

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CN104916517B (en) * 2014-03-11 2017-06-09 上海华虹宏力半导体制造有限公司 The isolating device and its control method of reaction chamber and quartz ampoule
CN105590825A (en) * 2014-11-03 2016-05-18 中微半导体设备(上海)有限公司 Gas conveying apparatus and plasma processing apparatus
CN112563105B (en) * 2019-09-10 2023-11-03 中微半导体设备(上海)股份有限公司 System and method for implementing gas flow verification in plasma processing apparatus
TWI742453B (en) * 2019-10-23 2021-10-11 樂華科技股份有限公司 Gas detection device

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JP4195837B2 (en) * 2003-06-20 2008-12-17 東京エレクトロン株式会社 Gas diversion supply apparatus and gas diversion supply method
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Address after: 201201 No. 188 Taihua Road, Jinqiao Export Processing Zone, Pudong New Area, Shanghai

Patentee after: Medium and Micro Semiconductor Equipment (Shanghai) Co., Ltd.

Address before: 201201 No. 188 Taihua Road, Jinqiao Export Processing Zone, Pudong New Area, Shanghai

Patentee before: Advanced Micro-Fabrication Equipment (Shanghai) Inc.