CN103163671B - Display panel, forming method thereof and liquid crystal display device - Google Patents
Display panel, forming method thereof and liquid crystal display device Download PDFInfo
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- CN103163671B CN103163671B CN201110418836.XA CN201110418836A CN103163671B CN 103163671 B CN103163671 B CN 103163671B CN 201110418836 A CN201110418836 A CN 201110418836A CN 103163671 B CN103163671 B CN 103163671B
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- 230000006698 induction Effects 0.000 claims description 71
- 238000002161 passivation Methods 0.000 claims description 71
- 239000000463 material Substances 0.000 claims description 36
- 239000004020 conductor Substances 0.000 claims description 22
- 238000000059 patterning Methods 0.000 claims description 15
- 239000011810 insulating material Substances 0.000 claims description 11
- 239000002184 metal Substances 0.000 description 36
- 229910052751 metal Inorganic materials 0.000 description 36
- 230000005684 electric field Effects 0.000 description 19
- 238000010586 diagram Methods 0.000 description 8
- 239000011521 glass Substances 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 239000012780 transparent material Substances 0.000 description 5
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
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Classifications
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/13338—Input devices, e.g. touch panels
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
- G02F1/134363—Electrodes characterised by their geometrical arrangement for applying an electric field parallel to the substrate, i.e. in-plane switching [IPS]
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Human Computer Interaction (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Mathematical Physics (AREA)
- Geometry (AREA)
- Liquid Crystal (AREA)
Abstract
A display panel, a forming method thereof and a liquid crystal display device are provided, wherein the display panel comprises: a transparent substrate; the capacitive touch structure, the first insulating layer, the shielding electrode layer and the second insulating layer are sequentially formed on the transparent substrate; and a display structure of an IPS/FFS display mode on the second insulating layer. According to the display panel in the technical scheme, the touch structure and the display structure of the IPS/FFS display mode are located on the same transparent substrate and are of an embedded touch structure, and one transparent substrate is omitted compared with an externally hung touch panel, so that the thickness of a final LCD finished product is reduced, and the weight of a terminal product is reduced.
Description
Technical Field
The invention relates to the field of displays, in particular to a display panel, a forming method thereof and a liquid crystal display device.
Background
A liquid crystal display is a display using a liquid crystal material. Liquid crystals are organic compounds that are intermediate between solid and liquid states. It becomes a transparent liquid when heated and becomes a crystalline turbid solid when cooled. Under the action of an electric field, liquid crystal molecules change in arrangement, thereby influencing the change of light passing through the liquid crystal molecules, and the change of light can be expressed as light and shade change through the action of a polaroid. The brightness change of the light is controlled by controlling the electric field, thereby achieving the purpose of displaying images. According to the arrangement of liquid crystal molecules, common liquid crystal displays are divided into: TN-LCD, STN-LCD, DSTN-LCD of narrow visual angle; wide viewing angle IPS, VA, etc.
In-plane switching (IPS) lcds have attracted much attention due to their wide viewing angle characteristics in applications, and Touch Panel (TP) touch technology, which is the latest human-computer interaction technology, is considered to be important for making human-computer interaction more straightforward, whether resistive or capacitive or other touch methods. The IPS-TP structure, which is formed by combining the IPS technology and the TP technology, will be a necessary trend for its application in LCDs. The current IPS-TP structure is mainly an external hanging (TP-On-Cell) mode and mainly comprises two independent modules: the first is a TP module, and the second is an LCD module of an IPS display mode. Attaching a TP module to the front side of an LCD module using IPS mode display, namely one side of a color film transparent substrate to form an externally-hung (TP-On-Cell) touch mode display panel, and then attaching a backlight source to the back side of the TFT transparent substrate.
The current IPS display mode display panel (IPS-TP) with an external touch mode is formed by combining an individual IPS display mode LCD module and an individual TP module, and thus, the process is complex, the cost is high, and the final LCD product has a large thickness, which may increase the weight of the terminal product, and is not desired by the user.
Disclosure of Invention
The invention solves the problems that the display panel of the IPS display mode of the externally hung touch mode in the prior art has complex process and high cost, and the final finished product LCD has large thickness and can increase the weight of a terminal product.
To solve the above problems, the present invention provides a method of forming a display panel, comprising:
providing a transparent substrate;
sequentially forming a capacitive touch structure, a first insulating layer, a shielding electrode layer and a second insulating layer on the transparent substrate;
and forming a display structure of an IPS/FFS display mode on the second insulating layer.
Optionally, the shielding electrode layer is made of a transparent conductive material, and the first insulating layer and the second insulating layer are made of transparent insulating materials.
Optionally, the forming a capacitive touch structure on the transparent substrate includes:
forming a plurality of induction electrodes which are arranged in parallel on the transparent substrate;
forming a dielectric layer to cover the induction electrode and the transparent substrate;
and forming a plurality of driving electrodes on the dielectric layer, wherein the induction electrodes and the driving electrodes are arranged in a mutually crossed manner.
Optionally, the forming a capacitive touch structure on the transparent substrate includes:
forming a plurality of induction electrodes arranged in parallel and a plurality of driving electrodes arranged in parallel and crossed with the induction electrodes on the transparent substrate, wherein each driving electrode is divided into a plurality of sections by the induction electrodes;
forming a dielectric layer, and covering the induction electrode, the driving electrode and the transparent substrate;
patterning the dielectric layer, forming via holes in the dielectric layer, and exposing all sections of the driving electrodes at the bottoms of the via holes;
forming a conducting layer, covering the dielectric layer and filling the via hole;
patterning the conductive layer to form interconnect lines electrically connecting together segments of each of the drive electrodes separated by the plurality of sense electrodes.
Optionally, the forming a display structure of an IPS/FFS display mode on the second insulating layer includes:
forming a TFT switch, a scan line and a data line on the second insulating layer;
forming a passivation layer covering the TFT switch, the data line and the scanning line;
and forming pixel electrodes and a common electrode which are arranged at intervals on the passivation layer, wherein a gap is formed between the pixel electrodes and the common electrode.
Optionally, the forming a display structure of an IPS/FFS display mode on the second insulating layer includes:
forming a TFT switch, a scan line and a data line on the second insulating layer;
forming a passivation layer covering the TFT switch, the data line and the scanning line;
forming a common electrode on the passivation layer;
forming a third insulating layer covering the common electrode and the passivation layer;
forming a pixel electrode on the third insulating layer, the pixel electrode being a stripe electrode;
or,
forming a TFT switch, a scan line and a data line on the second insulating layer;
forming a passivation layer covering the TFT switch, the data line and the scanning line;
forming a pixel electrode on the passivation layer;
forming a third insulating layer covering the pixel electrode and the passivation layer;
and forming a common electrode on the third insulating layer, wherein the common electrode is a strip electrode.
Optionally, the method further includes: providing a transparent substrate;
the front surface of the transparent substrate with the touch structure and the display structure is oppositely attached to the transparent substrate;
forming a first linear polarizer on the back of the transparent substrate;
and forming a second linear polarizer on the back of the transparent substrate.
Optionally, before attaching the transparent substrate and the transparent substrate, the method further includes:
forming color resistors and a black matrix on the transparent substrate, wherein the black matrix is positioned between the adjacent color resistors;
or forming color resistors on the transparent substrate, forming a black matrix on the transparent substrate before forming the capacitive touch structure, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate;
or forming color resistors on the transparent substrate, forming a black matrix on the capacitive touch structure after forming the capacitive touch structure and before forming the first insulating layer, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate;
or forming color resistors on the transparent substrate, forming a black matrix on the shielding electrode layer after forming the shielding electrode layer and before forming the second insulating layer, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate;
or forming color resistors on the transparent substrate, forming a black matrix on the second insulating layer after forming the second insulating layer and before forming the display structure, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate.
Optionally, the method further includes: providing a transparent substrate;
the front surface of the transparent substrate with the touch structure and the display structure is oppositely attached to the transparent substrate;
forming a first circular polarizer on the back surface of the transparent substrate;
and forming a second circular polarizer on the back of the transparent substrate.
Optionally, before attaching the transparent substrate and the transparent substrate, the method further includes: and forming color resistors and a black matrix on the transparent substrate, wherein the black matrix is positioned between the adjacent color resistors.
The present invention also provides another method of forming a display panel, comprising:
providing a transparent substrate;
sequentially forming a capacitive touch structure and a first insulating layer on the transparent substrate;
forming a display structure of an IPS/FFS display mode on the first insulating layer;
the display structure forming the IPS/FFS display mode comprises:
forming a common electrode on the first insulating layer;
forming a second insulating layer on the common electrode;
forming a TFT switch, a scan line and a data line on the second insulating layer;
forming a passivation layer covering the TFT switch, the data line and the scanning line;
and forming a pixel electrode on the passivation layer, wherein the pixel electrode is a strip electrode.
Optionally, the common electrode is made of a transparent conductive material, and the first insulating layer and the second insulating layer are made of transparent insulating materials.
Optionally, the common electrode is tiled with the passivation layer, or the common electrode has a slit opposite to the slit between the pixel electrodes.
Optionally, the forming a capacitive touch structure on the transparent substrate includes:
forming a plurality of induction electrodes which are arranged in parallel on the transparent substrate;
forming a dielectric layer to cover the induction electrode and the transparent substrate;
and forming a plurality of driving electrodes on the dielectric layer, wherein the induction electrodes and the driving electrodes are arranged in a mutually crossed manner.
Optionally, the forming a capacitive touch structure on the transparent substrate includes:
forming a plurality of induction electrodes arranged in parallel and a plurality of driving electrodes arranged in parallel and crossed with the induction electrodes on the transparent substrate, wherein each driving electrode is divided into a plurality of sections by the induction electrodes;
forming a dielectric layer, and covering the induction electrode, the driving electrode and the transparent substrate;
patterning the dielectric layer, forming via holes in the dielectric layer, and exposing all sections of the driving electrodes at the bottoms of the via holes;
forming a conducting layer, covering the dielectric layer and filling the via hole;
patterning the conductive layer to form interconnect lines electrically connecting together segments of each of the drive electrodes separated by the plurality of sense electrodes.
Optionally, the method further includes: providing a transparent substrate;
the front surface of the transparent substrate with the touch structure and the display structure is oppositely attached to the transparent substrate;
forming a first linear polarizer on the back of the transparent substrate;
and forming a second linear polarizer on the back of the transparent substrate.
Optionally, before attaching the transparent substrate and the transparent substrate, the method further includes:
forming color resistors and a black matrix on the transparent substrate, wherein the black matrix is positioned between the adjacent color resistors;
or forming color resistors on the transparent substrate, forming a black matrix on the transparent substrate before forming the capacitive touch structure, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate;
or forming color resistors on the transparent substrate, forming a black matrix on the capacitive touch structure after forming the capacitive touch structure and before forming the first insulating layer, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate;
or forming color resistors on the transparent substrate, forming a black matrix on the common electrode after forming the common electrode and before forming the second insulating layer, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate;
or forming color resistors on the transparent substrate, forming a black matrix on the second insulating layer after forming the second insulating layer and before forming the TFT switches, the scanning lines and the data lines, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate.
Optionally, the method further includes: providing a transparent substrate;
the front surface of the transparent substrate with the touch structure and the display structure is oppositely attached to the transparent substrate;
forming a first circular polarizer on the back surface of the transparent substrate;
and forming a second circular polarizer on the back of the transparent substrate.
Optionally, before attaching the transparent substrate and the transparent substrate, the method further includes: and forming color resistors and a black matrix on the transparent substrate, wherein the black matrix is positioned between the adjacent color resistors.
The present invention also provides a display panel including:
a transparent substrate;
the capacitive touch structure, the first insulating layer, the shielding electrode layer and the second insulating layer are sequentially formed on the transparent substrate;
and a display structure of an IPS/FFS display mode on the second insulating layer.
Optionally, the shielding electrode layer is made of a transparent conductive material, and the first insulating layer and the second insulating layer are made of transparent insulating materials.
Optionally, the capacitive touch structure includes:
a plurality of induction electrodes which are arranged in parallel and are positioned on the transparent substrate;
a dielectric layer covering the sensing electrode and the transparent substrate;
the induction electrodes and the driving electrodes are arranged in a cross mode;
alternatively, the capacitive touch structure includes:
a plurality of driving electrodes arranged in parallel on the transparent substrate;
a dielectric layer covering the driving electrode and the transparent substrate;
and the induction electrodes and the driving electrodes are arranged in a mutually crossed manner.
Optionally, the capacitive touch structure includes:
a plurality of induction electrodes which are arranged in parallel and are positioned on the transparent substrate, and a plurality of driving electrodes which are arranged in parallel and are crossed with the induction electrodes, wherein each driving electrode is divided into a plurality of sections by the induction electrodes;
the dielectric layer covers the induction electrode, the driving electrode and the transparent substrate and is provided with a through hole;
an interconnect on the dielectric layer, the interconnect electrically connecting together a plurality of segments of each of the drive electrodes spaced apart by the plurality of sense electrodes;
alternatively, the capacitive touch structure includes:
a plurality of driving electrodes arranged in parallel and positioned on the transparent substrate, and a plurality of sensing electrodes arranged in parallel and crossed with the driving electrodes, wherein each sensing electrode is divided into a plurality of sections by the plurality of driving electrodes;
the dielectric layer covers the induction electrode, the driving electrode and the transparent substrate and is provided with a through hole;
and the interconnecting wire is positioned on the dielectric layer and electrically connects the sections of the sensing electrodes which are separated by the driving electrodes together.
Optionally, the display structure of the IPS/FFS display mode includes:
a TFT switch, a scan line and a data line on the second insulating layer;
a passivation layer covering the TFT switch, the data line and the scan line;
the pixel electrodes and the common electrodes are arranged on the passivation layer at intervals, and gaps are formed between the pixel electrodes and the common electrodes.
Optionally, the display structure of the IPS/FFS display mode includes:
a TFT switch, a scan line and a data line on the second insulating layer;
a passivation layer covering the TFT switch, the data line and the scan line;
a common electrode on the passivation layer;
a third insulating layer covering the common electrode and the passivation layer;
the pixel electrode is positioned on the third insulating layer and is a strip electrode;
or,
the display structure of the IPS/FFS display mode comprises:
a TFT switch, a scan line and a data line on the second insulating layer;
a passivation layer covering the TFT switch, the data line and the scan line;
a pixel electrode on the passivation layer;
a third insulating layer covering the pixel electrode and the passivation layer;
and the common electrode is positioned on the third insulating layer and is a strip-shaped electrode.
Optionally, the method further includes: a transparent substrate opposite to the transparent base;
a liquid crystal layer between the transparent substrate and the transparent substrate;
a first linear polarizer located on the back of the transparent substrate;
a second linear polarizer on the back of the transparent substrate.
Optionally, the transparent substrate is a color film substrate with color resistance;
further comprising: the black matrix is positioned on the transparent substrate and positioned between the adjacent color resistors; or the black matrix is positioned between the transparent substrate and the touch structure and positioned between the adjacent color resistors in the direction parallel to the transparent substrate; or the black matrix is positioned between the first insulating layer and the touch structure and positioned between the adjacent color resistors in the direction parallel to the transparent substrate; or the black matrix is positioned between the shielding electrode layer and the second insulating layer and positioned between the adjacent color resistors in the direction parallel to the transparent substrate; or the black matrix is positioned between the second insulating layer and the display structure and positioned between the adjacent color resistors in the direction parallel to the transparent substrate.
Optionally, the method further includes: a transparent substrate opposite the transparent base;
a liquid crystal layer between the transparent substrate and the transparent substrate;
a first circular polarizer on the back of the transparent substrate;
a second circular polarizer on the back of the transparent substrate.
Optionally, the transparent substrate is a color film substrate with a color resistor and a black matrix; the transparent substrate is also provided with a black matrix which is positioned between the adjacent color resistors.
The present invention also provides another display panel, including:
a transparent substrate;
the display structure comprises a capacitive touch structure, a first insulating layer and an IPS/FFS display mode, wherein the capacitive touch structure, the first insulating layer and the display structure are sequentially formed on the transparent substrate;
wherein the display structure of the IPS/FFS display mode comprises: a common electrode and a second insulating layer sequentially formed on the first insulating layer; a TFT switch, a scan line and a data line on the second insulating layer; a passivation layer covering the TFT switch, the data line and the scan line; and the pixel electrode is positioned on the passivation layer and is a strip electrode.
Optionally, the common electrode is made of a transparent conductive material, and the first insulating layer and the second insulating layer are made of transparent insulating materials.
Optionally, the common electrode is tiled with the passivation layer, or the common electrode has a slit opposite to the slit between the pixel electrodes.
Optionally, the capacitive touch structure includes:
a plurality of induction electrodes which are arranged in parallel and are positioned on the transparent substrate;
a dielectric layer covering the sensing electrode and the transparent substrate;
the plurality of driving electrodes are positioned on the dielectric layer, and the induction electrodes and the driving electrodes are arranged in a mutually crossed manner;
alternatively, the capacitive touch structure includes:
a plurality of driving electrodes arranged in parallel on the transparent substrate;
a dielectric layer covering the driving electrode and the transparent substrate;
and the induction electrodes and the driving electrodes are arranged in a mutually crossed manner.
Optionally, the capacitive touch structure includes:
a plurality of induction electrodes which are arranged in parallel and are positioned on the transparent substrate, and a plurality of driving electrodes which are arranged in parallel and are crossed with the induction electrodes, wherein each driving electrode is divided into a plurality of sections by the induction electrodes;
the dielectric layer covers the induction electrode, the driving electrode and the transparent substrate and is provided with a through hole;
an interconnect on the dielectric layer, the interconnect electrically connecting together a plurality of segments of each of the drive electrodes spaced apart by the plurality of sense electrodes;
alternatively, the capacitive touch structure includes:
a plurality of driving electrodes arranged in parallel and positioned on the transparent substrate, and a plurality of sensing electrodes arranged in parallel and crossed with the driving electrodes, wherein each sensing electrode is divided into a plurality of sections by the plurality of driving electrodes;
the dielectric layer covers the induction electrode, the driving electrode and the transparent substrate and is provided with a through hole;
and the interconnecting wire is positioned on the dielectric layer and electrically connects the sections of the sensing electrodes which are separated by the driving electrodes together.
Optionally, the method further includes: a transparent substrate opposite to the transparent base;
a liquid crystal layer between the transparent substrate and the transparent substrate;
a first linear polarizer located on the back of the transparent substrate;
a second linear polarizer on the back of the transparent substrate.
Optionally, the transparent substrate is a color film substrate with color resistance;
further comprising: the black matrix is positioned on the color film transparent substrate and positioned between the adjacent color resistors; or the black matrix is positioned between the transparent substrate and the touch structure and positioned between the adjacent color resistors in the direction parallel to the transparent substrate; or the black matrix is positioned between the first insulating layer and the touch structure and positioned between the adjacent color resistors in the direction parallel to the transparent substrate; or the black matrix is positioned between the common electrode and the second insulating layer and positioned between the adjacent color resistors in the direction parallel to the transparent substrate; or the black matrix is positioned between the second insulating layer and the TFT switch, the data line and the scanning line and positioned between adjacent color resistors in the direction parallel to the transparent substrate.
Optionally, the method further includes: a transparent substrate opposite the transparent base;
a liquid crystal layer between the transparent substrate and the transparent substrate;
a first circular polarizer on the back of the transparent substrate;
a second circular polarizer on the back of the transparent substrate.
Optionally, the transparent substrate is a color film substrate with a color resistor and a black matrix; the transparent substrate is also provided with a black matrix which is positioned between the adjacent color resistors.
The present invention also provides a liquid crystal display device comprising:
the display panel;
and the backlight source is positioned on one side of the transparent substrate.
Compared with the prior art, the invention has the following advantages:
according to the display panel, the touch structure is formed on the transparent substrate, the display structure of the IPS/FFS display mode is formed above the touch structure, the shielding electrode layer is formed between the touch structure and the display structure of the IPS/FFS display mode or the common electrode serves as the shielding electrode layer, and the shielding electrode layer can avoid the problem of mutual interference between the electric field of the display structure of the IPS/FFS display mode and the electric field of the touch structure. Moreover, because the touch structure and the display structure of the IPS/FFS display mode are positioned on the same transparent substrate, the touch structure is an in-cell touch structure (InCellTP), and a transparent substrate is omitted compared with an out-cell display panel, the thickness of a final LCD finished product is thinned, and the weight of a terminal product is reduced.
In addition, the forming method of the display panel in the technical scheme is simple in preparation process and low in cost.
Drawings
FIG. 1 is a schematic flow chart illustrating a method for forming a display panel according to a first embodiment of the present invention;
FIG. 2 is a schematic plan view of a touch structure in accordance with an embodiment of the invention;
FIG. 3 is a schematic plan view of a pixel structure of an IPS/FFS display mode according to a first embodiment of the present invention;
FIGS. 4-7 are schematic cross-sectional views illustrating a method for forming a display panel according to a first embodiment of the invention;
FIGS. 8-10 are schematic cross-sectional views illustrating a method for forming a display panel according to a second embodiment of the invention;
FIG. 11 is a schematic plan view of a pixel structure of an IPS/FFS display mode according to a third embodiment of the present invention;
FIG. 12 to FIG. 13 are schematic cross-sectional views illustrating a method for forming a display panel according to a third embodiment of the present invention;
FIGS. 14-16 are schematic cross-sectional views illustrating a method for forming a display panel according to a fourth embodiment of the invention;
FIG. 17 is a schematic cross-sectional view of a display panel according to a fifth embodiment of the present invention;
FIG. 18 is a schematic cross-sectional view of a display panel according to a sixth embodiment of the present invention;
FIG. 19 is a schematic cross-sectional view of a display panel according to a seventh embodiment of the present invention;
FIG. 20 is a schematic cross-sectional view of a display panel according to an eighth embodiment of the present invention;
FIG. 21 is a schematic cross-sectional view of a display panel according to a ninth embodiment of the invention;
fig. 22 is a schematic cross-sectional view of a display panel according to a tenth embodiment of the invention.
Fig. 23 is a schematic flow chart of a display panel forming method according to an eleventh embodiment of the invention;
FIGS. 24-25 are schematic cross-sectional views illustrating a method for forming a display panel according to an eleventh embodiment of the invention;
FIG. 26 is a schematic cross-sectional view of a display panel according to a twelfth embodiment of the present invention;
fig. 27 is a schematic cross-sectional view of a display panel according to a thirteenth embodiment of the invention;
FIG. 28 is a schematic cross-sectional view of a display panel according to a fourteenth embodiment of the invention;
fig. 29 is a schematic cross-sectional view of a display panel according to a fifteenth embodiment of the invention;
fig. 30 is a schematic cross-sectional view of a display panel according to a sixteenth embodiment of the invention;
FIG. 31 is a schematic cross-sectional view of a display panel according to a seventeenth embodiment of the present invention;
fig. 32 is a schematic cross-sectional view of a display panel according to an eighteenth embodiment of the invention.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below.
In the following description, specific details are set forth in order to provide a thorough understanding of the present invention. The invention can be implemented in a number of ways different from those described herein and similar generalizations can be made by those skilled in the art without departing from the spirit of the invention. Therefore, the present invention is not limited to the specific embodiments disclosed below.
Embodiments of display Panel Forming methods
First embodiment
Fig. 1 is a schematic flow chart of a display panel forming method according to a first embodiment of the present invention, and referring to fig. 1, the display panel forming method according to the first embodiment of the present invention includes:
step S11, providing a transparent substrate;
step S12, sequentially forming a capacitive touch structure, a first insulating layer, a shielding electrode layer, and a second insulating layer on the transparent substrate;
step S13, forming a display structure of an IPS/FFS display mode on the second insulating layer.
Fig. 2 is a schematic plan view of a touch structure according to an embodiment of the present invention, showing a touch grid 100 of a touch screen, which is formed by alternately arranging driving electrodes and sensing electrodes.
Fig. 3 is a schematic plan view of a pixel structure of an IPS/FFS display mode according to a first embodiment of the present invention, and referring to fig. 3, the IPS/FFS (inplane switching, IPS for short) display structure of the first embodiment includes: a TFT switch including a gate 411a, a source 441a, and a drain 442 a; a scan line 412a electrically connected to the gate 411 a; a data line 443a electrically connected to the source 441 a; a common electrode 413a, and a pixel electrode 46a opposite to the common electrode 413a, wherein in each pixel region, a plurality of pixel electrodes 46a are arranged at intervals, gaps are formed between the pixel electrodes 46a, and the pixel electrode 46a is formed above the common electrode 413a and opposite to the common electrode 413 a.
The display panel of the first embodiment of the present invention forms the capacitive touch structure and the IPS/FFS display structure in the IPS display mode on the same transparent substrate.
Fig. 4 to 7 are schematic cross-sectional views of a method for forming a display panel according to a first embodiment of the present invention along a-a direction shown in fig. 2 and b-b direction shown in fig. 3, and the method for forming a display panel according to a first embodiment of the present invention will be described in detail with reference to fig. 1, 3 and 4 to 7.
Referring to fig. 1, 3 and 4 in combination, step S11 is performed to provide the transparent substrate 10. In the first embodiment, the transparent substrate 10 is a glass transparent substrate, but the transparent substrate 10 in the present invention is not limited to a glass transparent substrate, and may be other transparent substrates known to those skilled in the art, such as a transparent plastic transparent substrate.
With combined reference to fig. 1, fig. 3, fig. 5 and fig. 6, step S12 is performed, and the capacitive touch structure 20a, the first insulating layer 31, the shielding electrode layer 32 and the second insulating layer 33 are sequentially formed on the transparent substrate 10. The method specifically comprises the following steps: the capacitive touch structure 20a is formed on the transparent substrate 10, the first insulating layer 31 is formed on the capacitive touch structure 20a, the shielding electrode layer 32 is formed on the first insulating layer 31, and the second insulating layer 33 is formed on the shielding electrode layer 32. The shielding electrode layer 32 is made of a transparent conductive material, and the first insulating layer 31 and the second insulating layer 33 are made of transparent insulating materials.
The transparent substrate 10 has opposite sides, wherein the side for forming the touch structure and the display structure of the subsequent IPS/FFS display mode is defined as a front side in the present invention, and the side opposite to the front side is defined as a rear side.
In the present invention, the capacitive touch structure is formed on the front surface of the transparent substrate 10. Referring to fig. 5, in particular, forming the capacitive touch structure 20a on the transparent substrate 10 includes: forming a plurality of sensing electrodes 21a arranged in parallel on the transparent substrate 10, specifically, depositing a conductive layer on the transparent substrate 10, and patterning the conductive layer to form a plurality of sensing electrodes 21a arranged in parallel, wherein the sensing electrodes 21a are made of metal or transparent conductive material, such as MoNb metal, ITO transparent material; when the material of the sensing electrode 21a is a transparent conductive material such as ITO, the sensing electrode 21a does not affect the aperture ratio of the pixel; when the sensing electrodes 21a are made of metal, since the metal is opaque, in order to avoid the reduction of the pixel aperture ratio, each sensing electrode 21a is divided into a plurality of regions according to the pixel arrangement, and each region is hollowed out in the pixel region, so as to avoid affecting the pixel aperture ratio. Then, a dielectric layer 23a is formed to cover the sensing electrode 21a and the transparent substrate 10, and the material of the dielectric layer 23a is a transparent insulating material known to those skilled in the art, such as silicon oxide, silicon nitride, and the like. Then, forming a plurality of driving electrodes 22a on the dielectric layer 23a, wherein the sensing electrodes 21a and the driving electrodes 22a are arranged in a mutually crossed manner; the method for forming the driving electrode 22a specifically includes depositing a conductive layer on the dielectric layer 23a, and then patterning the conductive layer to form a plurality of driving electrodes 22a arranged in parallel, where the driving electrodes 22a are made of metal or transparent conductive material, such as MoNb metal or ITO transparent material; when the material of the driving electrode 22a is a transparent conductive material such as ITO, the driving electrode 22a does not affect the aperture ratio of the pixel; when the driving electrodes 22a are made of metal, since the metal is opaque, in order to avoid the reduction of the pixel aperture ratio, each driving electrode 22a is divided into a plurality of regions according to the pixel arrangement, and each region is hollowed out in the pixel region, so as to avoid affecting the pixel aperture ratio. In the first embodiment, the sensing electrodes 21a are arranged in parallel at intervals, the driving electrodes 22a are arranged in parallel at intervals, and the sensing electrodes 21a and the driving electrodes 22a are perpendicular to each other. The plurality of driving electrodes 22a are electrically connected to each other, and the plurality of driving electrodes 22a are electrically connected to each other through a peripheral circuit.
Referring to fig. 6, in the first embodiment, the materials of the first insulating layer 31 and the second insulating layer 33 may be transparent organic materials, or transparent materials known to those skilled in the art, such as silicon nitride or silicon oxide, and the method for forming the first insulating layer 31 and the second insulating layer 33 needs to be adjusted according to the materials. The material of shielding electrode layer 32 is a transparent conductive material, such as an ITO transparent material. Among them, the shielding electrode layer 32 plays a role of preventing electric fields of the touch structure and the display structure from interfering with each other.
Referring to fig. 1, 3 and 7 in combination, step S13 is performed to form a display structure 40a of an IPS/FFS display mode on the second insulating layer 33. In this first embodiment, specifically, forming the IPS-FFS display structure on the second insulating layer 33 includes: forming a TFT switch, a scan line 412a, and a data line 443a on the second insulating layer 33; then, a passivation layer 45a is formed to cover the TFT switches, the data line 443a and the scan line 412 a; next, a common electrode 413a is formed on the passivation layer 45 a; forming a third insulating layer 47a covering the common electrode 413a and the passivation layer 45 a; next, a pixel electrode 46a is formed on the third insulating layer 47a, the pixel electrode 46a is a stripe-shaped electrode, and a plurality of stripe-shaped pixel electrodes 46a are arranged at intervals in one pixel, and a gap (not numbered) is formed between the pixel electrodes 46a in the same pixel region. In the first embodiment, the common electrode 413a is laid over the passivation layer 45a, but the common electrode 413a may have a slit opposite to the slit between the pixel electrodes 46a in the present invention. An electric field is formed between the pixel electrode 46a and the common electrode 413a, and the electric field at the gap of the pixel electrode 46a is parallel to the surface of the transparent substrate 10, which can ensure that the liquid crystal rotates in a plane parallel to the transparent substrate.
In addition, in this embodiment, the positional relationship between the common electrode 413a and the pixel electrode 46a may be interchanged, specifically: forming a TFT switch, a scan line and a data line on the second insulating layer; forming a passivation layer covering the TFT switch, the data line and the scanning line; forming a pixel electrode on the passivation layer; forming a third insulating layer covering the pixel electrode and the passivation layer; and forming a common electrode on the third insulating layer, wherein the common electrode is a strip-shaped electrode, a plurality of strip-shaped common electrodes arranged at intervals are arranged in one pixel, and gaps are formed among the common electrodes in the same pixel region. An electric field is formed between the pixel electrode and the common electrode, and the electric field at the gap of the common electrode is parallel to the surface of the transparent substrate, so that the liquid crystal can be ensured to rotate in a plane parallel to the transparent substrate.
Specifically, forming the TFT switches, the scan lines, and the data lines on the second insulating layer 33 includes: a gate electrode 411a of the TFT switch and a scanning line 412a electrically connected to the gate electrode 411a are formed on the second insulating layer 33, and the gate electrode 411a and the scanning line 412a are not shown in the cut positions in fig. 7; the specific forming method comprises the following steps: forming a conductive layer over the second insulating layer 33, and patterning the conductive layer to form a gate electrode 411 and a scan line 412 a; the material of the gate 411a and the scan line 412a is MoNd or AlNd. Then, a gate dielectric layer 42a is formed to cover the gate 411a, the scan line 412a and the second insulating layer 33, the gate dielectric layer 42a is made of a material known to those skilled in the art, such as silicon oxide or silicon nitride, and the forming method is chemical vapor deposition. Next, an active region is formed on the gate dielectric layer 42a, and in the figure, the material of the active region may be amorphous silicon; then, a source electrode 441a, a drain electrode 442a of the TFT switch, and a data line 443a electrically connected to the source electrode 441a are formed; the specific forming method comprises the following steps: forming a conductive layer to cover the active region and the gate dielectric layer 42a, and patterning the conductive layer to form a source electrode 441a, a drain electrode 442a (not shown in the cut-away position of fig. 7), and a data line 443a electrically connected to the source electrode 441 a; the source and drain electrodes 441a and 442a and the data line 443a electrically connected to the source electrode 441a are made of MoNd or AlNd.
In the first embodiment, the forming method of the touch structure is as follows: the sensing electrode is formed on the transparent substrate 10, then the dielectric layer is formed, and then the driving electrode is formed on the dielectric layer. However, in the first embodiment, the forming method of the touch structure may also be: the driving electrode is formed on the transparent substrate 10, then the dielectric layer is formed, and then the sensing electrode is formed on the dielectric layer, that is, the order of forming the driving electrode and the sensing electrode is interchanged.
Second embodiment
Fig. 8 to 10 are schematic cross-sectional views of a method for forming a display panel according to a second embodiment of the present invention along a-a direction shown in fig. 2 and b-b direction shown in fig. 3, and the method for forming a display panel according to a second embodiment of the present invention will be described in detail with reference to fig. 1, 3 and 8 to 10.
Referring to fig. 1, 8, and 9, step S11 and step S12 are performed, where step S11 is the same as that of the first embodiment and is not repeated herein. Step S12, forming a capacitive touch structure 20b on the front surface of the transparent substrate 10 includes: forming a plurality of sensing electrodes 21b arranged in parallel and a plurality of driving electrodes 22b arranged in parallel and crossed with the sensing electrodes 21b on the transparent substrate 10, wherein each driving electrode 22b is divided into a plurality of sections by the plurality of sensing electrodes 21b, and the specific forming method is as follows: a conductive layer is deposited on the transparent substrate 10, and the conductive layer is patterned to form a plurality of sensing electrodes 21b arranged in parallel and a plurality of driving electrodes 22b arranged in parallel. Then, a dielectric layer 23b is formed to cover the sensing electrode 21b, the driving electrode 22b and the transparent substrate 10, and the material and the forming method of the dielectric layer 23b are the same as those of the dielectric layer 23 of the first embodiment, which is not described herein again. Then, patterning the dielectric layer 23, and forming a via hole 24b in the dielectric layer 23, wherein the bottom of the via hole 24b exposes each section of the driving electrode 22 b; then, forming a conductive layer to cover the dielectric layer 23 and fill the via hole 24 b; patterning the conductive layers forms interconnect lines 25b electrically connecting together segments of each of the drive electrodes 22b separated by the plurality of sense electrodes. The conductive layer is made of metal or transparent conductive material, such as ITO.
The materials of the sensing electrode 21b and the driving electrode 22b are metals or transparent conductive materials, such as MoNb metal, ITO transparent material; when the sensing electrode 21b and the driving electrode 22b are made of transparent conductive materials such as ITO, the sensing electrode 21b and the driving electrode 22b do not affect the aperture ratio of the pixel; when the sensing electrode 21b and the driving electrode 22b are made of metal, the metal is opaque, so that the aperture ratio of the pixel is not reduced, the sensing electrode 21b and the driving electrode 22b are divided into a plurality of areas according to pixel arrangement, and each area is hollowed out in the pixel area, so that the aperture ratio of the pixel is not affected.
After the capacitive touch structure 20b is formed, a first insulating layer 31, a shielding electrode layer 32 and a second insulating layer 33 are sequentially formed on the capacitive touch structure 20b, which is the same as the first embodiment and is not described herein again.
Referring to fig. 1 and 10 together, step S13 is performed to form a display structure 40b of an IPS/FFS display mode on the second insulating layer 33. In the second embodiment, the display structure 40b is the same as the display structure 40a, and the forming method is the same as the first embodiment, which is not repeated herein.
Third embodiment
The display panel according to the third embodiment of the present invention forms the capacitive touch structure and the IPS display mode display structure on the same transparent substrate.
Fig. 11 is a schematic plan view of a pixel structure of an IPS display mode according to a third embodiment of the present invention, and referring to fig. 11, the display structure of the IPS/FFS display mode according to the third embodiment is an IPS display structure, including: a TFT switch including a gate 411c, a source 441c, and a drain 442 c; a scan line 412c electrically connected to the gate 411 c; a data line 443c electrically connected to the source 441 c; and a common electrode 47c, a pixel electrode 46c on the same layer as the common electrode, wherein in a pixel region, the pixel electrode 46c and the common electrode 47c are arranged at intervals with a gap therebetween, and the common electrode 47c and the pixel electrode 46c are both located on a passivation layer covering the TFT switch.
Fig. 12 to 13 are schematic cross-sectional views illustrating a method of forming a display panel according to a third embodiment of the present invention, and the method of forming a display panel according to the third embodiment of the present invention is described in detail with reference to fig. 1, 11, and 12 to 13.
Referring to fig. 1, 11 and 12 in combination, steps S11 and S12 are performed to provide a transparent substrate 10, and a touch structure 20c, a first insulating layer 31, a shielding electrode layer 32 and a second insulating layer 33 are sequentially formed on the transparent substrate 10. In the third embodiment, the touch structure 20c is the same as the touch structure 20a in the first embodiment, and the steps S11 and S12 are the same as the first embodiment, which are not repeated herein.
Referring to fig. 1, 11 and 13 in combination, step S13 is performed to form a display structure 40c of an IPS/FFS display mode on the second insulating layer 33. In the third embodiment of the present invention, the display structure 40c for forming the IPS/FFS display mode on the second insulating layer 33 includes: forming a TFT switch, a scan line 412c and a data line 443c on the second insulating layer 33, the scan line not being shown in the cross-sectional position of fig. 13; forming a passivation layer 45c covering the TFT switches, the data lines 443c and the scan lines 412 c; pixel electrodes 46c and common electrodes 47c are formed on the passivation layer 45c at intervals. In this third embodiment, the material of the pixel electrode 46c and the common electrode 47c is a transparent conductive material, such as an ITO material; the method for forming the pixel electrode and the common electrode comprises the following steps: a transparent conductive material layer is deposited on the passivation layer 45c, and then the pixel electrode 46c and the common electrode 47c are formed by patterning the transparent conductive material layer using a photolithography and etching process. In the third embodiment, the pixel electrodes 46c connected together are comb-shaped as a whole, the common electrodes 47c connected together are also comb-shaped as a whole, and the pixel electrodes are electrically connected with the drain electrodes of the TFT switches through via holes. The pixel electrode 46c and the common electrode 47c form a parallel field parallel to the surface of the transparent substrate 10, which enables the liquid crystal to rotate in a plane parallel to the transparent substrate.
In the third embodiment, the passivation layer 45c is made of silicon oxide, silicon nitride or other materials known to those skilled in the art, and the formation method is chemical vapor deposition.
In the third embodiment, forming the TFT switches, the scan lines, and the data lines on the second insulating layer 33 includes: forming a gate electrode 411c of the TFT switch and a scan line 412c electrically connected to the gate electrode 411c on the second insulating layer 33, where the gate electrode and the scan line electrically connected to the gate electrode are not shown in the cut-away position of fig. 13; forming a gate dielectric layer 42c covering the gate 411c, the scan line 412c and the second insulating layer 33; forming an active region (not shown) on the gate dielectric layer 42 c; a source electrode, a drain electrode of the TFT switch, and a data line 43c electrically connected to the drain electrode are formed. In the third embodiment, the method of forming the TFT switches, the data lines, and the scan lines is the same as the first embodiment, and the first embodiment can be referred to in detail.
Fourth embodiment
Fig. 14 to 16 are schematic cross-sectional views illustrating a method for forming a display panel according to a fourth embodiment of the present invention, and the method for forming a display panel according to the fourth embodiment of the present invention is described in detail with reference to fig. 1, fig. 11, and fig. 14 to 16.
With combined reference to fig. 1, 11, 14 and 15, step S11 is performed to provide a transparent substrate 10; in step S12, a touch structure 20d, a first insulating layer 31, a shielding electrode layer 32, and a second insulating layer 33 are sequentially formed on the transparent substrate 10. The touch structure 20d is the same as the touch structure 20b in the second embodiment, and the steps S11 and S12 are the same as those in the second embodiment, which are not repeated herein.
Referring to fig. 1, 11 and 16 in combination, step S13 is performed to form a display structure 40d of an IPS/FFS display mode on the second insulating layer 33. In the fourth embodiment, the display structure 40d of the IPS/FFS display mode is the same as the display structure 40c of the third embodiment, and the forming method is also the same, which is not described herein again.
Fifth embodiment
Fig. 17 is a schematic cross-sectional view illustrating a display panel according to a fifth embodiment of the invention, and referring to fig. 17, a method for forming the display panel includes: providing a transparent substrate 10, and forming a touch structure 20 on the transparent substrate 10, where the touch structure 20 may be one of the touch structures 20a, 20b, 20c, and 20d of the first, second, third, and fourth embodiments described above; the first insulating layer 31, the shielding electrode layer 32, and the second insulating layer 33 of the first, second, third, and fourth embodiments described above are formed on the touch structure 20, and the display structure 40 of the IPS/FFS display mode is formed on the second insulating layer 33, where the display structure 40 of the IPS/FFS display mode is one of the display structures 40a, 40b, 40c, and 40d of the first, second, third, and fourth embodiments described above.
The method of forming a display panel of the fifth embodiment further includes:
providing a transparent substrate 50; the front surface of the transparent substrate 10 with the touch structure and the display structure formed thereon is oppositely attached to the transparent substrate 50; forming a first linear polarizer 51 on the back surface of the transparent substrate 10; a second linear polarizer 52 is formed on the back surface of the transparent substrate 50. Before the transparent substrate and the transparent substrate are attached, the method further comprises the following steps: color resistors 54 and a black matrix 53 are formed on the transparent substrate 50, and the black matrix 53 is located between the adjacent color resistors 54. The specific forming method may be to form the color resistor 54 on the transparent substrate 50 and then form the black matrix 53; alternatively, the black matrix 53 may be formed on the transparent substrate 50, and then the color resist 54 may be formed. The transparent substrate 50 is a glass transparent substrate, but is not limited to a glass transparent substrate, and may be other materials known to those skilled in the art, such as a transparent plastic transparent substrate. The color resistors can be three color resistors of red, green and blue or four color resistors 54 of red, green, blue and white and a black matrix 53 between adjacent color resistors; a first linear polarizer 51 is formed on the back surface of the transparent substrate 10.
The surface of the transparent substrate 50 facing the transparent base 10 is a front surface, and the surface facing the front surface is a rear surface.
When no color resistance is formed, black and white display or field sequential color display is possible.
Further comprising: the liquid crystal layer 70 is formed between the transparent substrate 50 and the transparent substrate 10, and the liquid crystal layer may be formed by dropping liquid crystal on the front surface of the transparent substrate and then bonding the transparent substrate and the transparent substrate. After the transparent substrate and the transparent substrate are bonded, polarizing plates are respectively bonded to the back surfaces thereof. Of course, the polarizer may be attached first and then attached. The major and minor axes of the liquid crystals in the liquid crystal layer 70 are parallel to the front surface of the transparent substrate 10. When the electric field between the pixel electrode and the common electrode rotates the liquid crystal, the liquid crystal always rotates in parallel with the surface of the transparent substrate 10.
The transparent substrate 50 side forms a backlight 60. Since the backlight is disposed at one side of the transparent substrate and the operation interface is at the back of the transparent substrate 10, a touch LCD device of an in-cell touch structure combined with an in-plane rotation mode (IPS-FFS) can be implemented.
Sixth embodiment
Fig. 18 is a schematic cross-sectional structure view of a display panel according to a sixth embodiment of the present invention, and referring to fig. 18, in the sixth embodiment, a first circularly polarizing plate 51a is formed on the back surface of the transparent substrate 10, and a second circularly polarizing plate 52a is formed on the back surface of the transparent substrate 50. The transparent substrate 50 side forms a backlight 60. The others are the same as the fifth embodiment.
In this embodiment, the operation interface is on the back of the transparent substrate 10, since the metal electrodes on the transparent substrate 10, such as the gate, the source, the drain, the data line, the scan line, etc., reflect light, so that external light is reflected by the metal electrodes, the reflected light enters human eyes, and a barrier is created in the viewing display interface, in order to block and absorb the reflected light reflected from the metal electrodes on the transparent substrate 10 back to the operation interface, the type of the polarizer is changed, and the first circular polarizer 51a and the second circular polarizer 52a are respectively attached to the back of the transparent substrate 10 and the back of the transparent substrate 50, and the circular polarizer can absorb the reflected light, so that the reflected light reflected by the metal electrodes after the external environment light passes through the first circular polarizer 51a is absorbed by the first circular polarizer 51 a.
Seventh embodiment
Fig. 19 is a schematic cross-sectional structure view of a display panel according to a seventh embodiment of the present invention, referring to fig. 19, in the seventh embodiment, a color resistor 54 is formed on the transparent substrate 50, a black matrix 53 is formed on the transparent substrate 20 before the capacitive touch structure 20 is formed on the transparent substrate 10, and the black matrix is located between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate. The others are the same as the fifth embodiment.
In the seventh embodiment, in order to block and absorb the reflected light reflected from the metal electrodes on the transparent substrate 10 back to the operation interface, a black matrix (BlackMatrix) is fabricated on the transparent substrate 10, and then the touch structure and the display structure are fabricated, and the reflected ambient light is absorbed by the black matrix.
Eighth embodiment
Fig. 20 is a schematic cross-sectional structure diagram of a display panel according to an eighth embodiment of the present invention, referring to fig. 20, in the eighth embodiment, after forming a color resistor 54 on the transparent substrate 50, and after forming the capacitive touch structure 20, before forming the first insulating layer 31, a black matrix 53 is formed on the capacitive touch structure 20, and the black matrix is located between adjacent color resistors formed on the transparent substrate 50 in a direction parallel to the transparent substrate. The others are the same as the fifth embodiment.
In the eighth embodiment, in order to block and absorb the reflected light reflected from the metal electrode on the transparent substrate 10 back to the operation interface, a black matrix (BlackMatrix) is fabricated on the touch structure 20, and then the first insulating layer 31, the shielding electrode layer 32, the second insulating layer 33, and the display structure 40 are fabricated, and the reflected ambient light is absorbed by the black matrix. BM is fabricated above the touch structure and below the display structure, so that the black matrix is closer to the metal electrodes in the display structure than the black matrix in the seventh embodiment, which can better absorb the reflected ambient light and reduce the corresponding amount of reflected light.
Ninth embodiment
Fig. 21 is a schematic cross-sectional structure diagram of a display panel according to a ninth embodiment of the invention, and referring to fig. 21, in the ninth embodiment, after forming a color resistor 54 on the transparent substrate 50, forming a shielding electrode layer 32, and before forming a second insulating layer 33, a black matrix 53 is formed on the shielding electrode layer 32, and the black matrix is located between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate. The others are the same as the fifth embodiment.
In this ninth embodiment, in order to block and absorb reflected light reflected from the metal electrode on the transparent substrate 10 back to the operation interface, a black matrix (BlackMatrix) is formed on the shielding electrode layer 32, and then a second insulating layer and a display structure are formed, and the reflected ambient light is absorbed by the black matrix. BM is formed on the shielding electrode layer and under the display structure, so that the black matrix is closer to the metal electrode in the display structure than the black matrix in the eighth embodiment, which can better absorb the reflected ambient light and reduce the corresponding amount of reflected light.
Tenth embodiment
Fig. 22 is a schematic cross-sectional structure diagram of a method for forming a display panel according to a tenth embodiment of the present invention, referring to fig. 22, in the tenth embodiment, before forming a display structure by forming color resists 54 on a transparent substrate 50, a black matrix 53 is formed on a second insulating layer 33, and the black matrix 53 is located between adjacent color resists 54 formed on the transparent substrate in a direction parallel to the transparent substrate 50. The others are the same as the fifth embodiment.
In this tenth embodiment, in order to block and absorb the reflected light reflected from the metal electrodes on the transparent substrate 10 back to the operation interface, a black matrix (BlackMatrix) is fabricated on the upper second insulating layer 33, and the reflected ambient light is absorbed by the black matrix under the display structure. BM is formed on the second insulating layer 33 under the display structure, so that the black matrix is closer to the metal electrode in the display structure than the black matrix in the ninth embodiment, which can better absorb the reflected ambient light and reduce the amount of reflected light.
Eleventh embodiment
Fig. 23 is a flowchart of a method of forming a display panel of the eleventh embodiment, and referring to fig. 23, the method of forming a display panel of the eleventh embodiment includes:
step S21, providing a transparent substrate;
step S22, sequentially forming a capacitive touch structure and a first insulating layer on the transparent substrate;
a step S23 of forming a display structure of an IPS/FFS display mode on the first insulating layer; the display structure forming the IPS/FFS display mode comprises: forming a common electrode on the first insulating layer; forming a second insulating layer on the common electrode; forming a TFT switch, a scan line and a data line on the second insulating layer; forming a passivation layer covering the TFT switch, the data line and the scanning line; and forming a pixel electrode on the passivation layer, wherein the pixel electrode is a strip electrode.
Fig. 24 to 25 are schematic cross-sectional structural diagrams illustrating a method for forming a display panel according to an eleventh embodiment, and referring to fig. 23 and 24, in the method for forming a display panel according to the eleventh embodiment, step S21 is the same as step S11 of the first embodiment, and step S22 is to form a capacitive touch structure 20e on a transparent substrate 10, where the capacitive touch structure 20e is the same as the capacitive touch structure 20a of the first embodiment, and the forming method is also the same. After that, the first insulating layer 31 is formed on the capacitive touch structure 20 e.
Next, referring to fig. 23, 25 and 3 in combination, step S23 is performed to form a display structure 40e of an IPS/FFS display mode on the first insulating layer 31; the display structure forming the IPS/FFS display mode comprises: forming a common electrode 413a on the first insulating layer 31, forming a second insulating layer 33 on the common electrode 413a, and forming a TFT switch, a scan line 412a, and a data line 443a on the second insulating layer 33; forming a passivation layer 45a covering the TFT switch, the data line 443a and the scan line 412 a; pixel electrodes 46a are formed on the passivation layer 45a, and the pixel electrodes 46a are stripe-shaped electrodes. In the same pixel region, a plurality of pixel electrodes 46a are arranged at intervals, and a gap (not numbered in the figure) is provided between each pixel electrode 46 a. In the fifth embodiment, the common electrode 413a serves as a shielding electrode layer for shielding an electric field between the display structure and the touch structure, and preferably, the common electrode 413a is laid throughout the first insulating layer 31, but the common electrode 413a may have a slit opposite to the slit between the pixel electrodes 46a in the present invention. The electric field formed between the pixel electrode 46a and the common electrode 413a at the gap of the pixel electrode 46a is parallel to the surface of the transparent substrate 10, which ensures that the liquid crystal rotates in a plane parallel to the transparent substrate.
The rest is the same as the first embodiment, and is not described herein.
Twelfth embodiment
Fig. 26 is a schematic cross-sectional structure diagram of a display panel of a twelfth embodiment, and steps S21 to S23 are performed with reference to fig. 26 and 24, where step S21 is the same as step S12 of the second embodiment, step S22 is the same as step S12 of the second embodiment, and step S22 is the same as step S12 of the first embodiment, and step S40 f of forming an IPS/FFS display mode on the first insulating layer 31 is the same as step S40 e of forming an IPS/FFS display mode of the eleventh embodiment.
Thirteenth embodiment
Fig. 27 is a schematic cross-sectional view illustrating a display panel according to a thirteenth embodiment of the invention, and referring to fig. 27, in the thirteenth embodiment, a method for forming the display panel includes: providing a transparent substrate 10, and forming a touch structure 20 on the transparent substrate 10, where the touch structure 20 may be one of the touch structures 20e and 20f of the eleventh and twelfth embodiments; the first insulating layer 31 described above is formed on the touch structure 20, and the display structure 40 of the IPS/FFS display mode is formed on the first insulating layer 31, where the display structure 40 of the IPS/FFS display mode is one of the display structures 40e and 40f of the eleventh and twelfth embodiments described above.
The method of forming a display panel of the thirteenth embodiment further includes:
providing a transparent substrate 50; the front surface of the transparent substrate 10 with the touch structure and the display structure formed thereon is oppositely attached to the transparent substrate 50; forming a first linear polarizer 51 on the back surface of the transparent substrate 10; a second linear polarizer 52 is formed on the back surface of the transparent substrate 50. Before the transparent substrate and the transparent substrate are attached, the method further comprises the following steps: color resistors 54 and a black matrix 53 are formed on the transparent substrate 50, and the black matrix 53 is located between the adjacent color resistors 54. The specific forming method may be to form the color resistor 54 on the transparent substrate 50 and then form the black matrix 53; alternatively, the black matrix 53 may be formed on the transparent substrate 50, and then the color resist 54 may be formed. The transparent substrate 50 is a glass transparent substrate, but is not limited to a glass transparent substrate, and may be other materials known to those skilled in the art, such as a transparent plastic transparent substrate. The color resistors can be three color resistors of red, green and blue or four color resistors 54 of red, green, blue and white and a black matrix 53 between adjacent color resistors; a first linear polarizer 51 is formed on the back surface of the transparent substrate 10.
The surface of the transparent substrate 50 facing the transparent base 10 is a front surface, and the surface facing the front surface is a rear surface.
When no color resistance is formed, black and white display or field sequential color display is possible.
Further comprising: the liquid crystal layer 70 is formed between the transparent substrate 50 and the transparent substrate 10, and the liquid crystal layer may be formed by dropping liquid crystal on the front surface of the transparent substrate and then bonding the transparent substrate and the transparent substrate. After the transparent substrate and the transparent substrate are bonded, polarizing plates are respectively bonded to the back surfaces thereof. Of course, the polarizing film may be attached first and then attached. The major and minor axes of the liquid crystals in the liquid crystal layer 70 are parallel to the front surface of the transparent substrate 10. When the electric field between the pixel electrode and the common electrode rotates the liquid crystal, the liquid crystal always rotates in parallel with the surface of the transparent substrate 10.
The transparent substrate 50 side forms a backlight 60. Since the backlight is disposed at one side of the transparent substrate and the operation interface is at the back of the transparent substrate 10, a touch LCD device of an in-cell touch structure combined with an in-plane rotation mode (IPS-FFS) can be implemented.
Fourteenth embodiment
Fig. 28 is a schematic cross-sectional structure view of a display panel according to a fourteenth embodiment of the present invention, and referring to fig. 28, in the fourteenth embodiment, a first circularly polarizing plate 51a is formed on the back surface of the transparent substrate 10, and a second circularly polarizing plate 52a is formed on the back surface of the transparent substrate 50. The others are the same as those in the thirteenth embodiment.
In this embodiment, the operation interface is on the back of the transparent substrate 10, since the metal electrodes on the transparent substrate 10, such as the gate, the source, the drain, the data line, the scan line, etc., reflect light, so that external light is reflected by the metal electrodes, the reflected light enters human eyes, and a barrier is created in the viewing display interface, in order to block and absorb the reflected light reflected from the metal electrodes on the transparent substrate 10 back to the operation interface, the type of the polarizer is changed, and the first circular polarizer 51a and the second circular polarizer 52a are respectively attached to the back of the transparent substrate 10 and the back of the transparent substrate 50, and such circular polarizers can absorb the reflected light, so that the reflected light reflected by the metal electrodes after the external ambient light passes through the first circular polarizer 51a is absorbed by the first circular polarizer 51 a.
Fifteenth embodiment
Fig. 29 is a schematic cross-sectional structure view of a display panel according to a fifteenth embodiment of the invention, referring to fig. 29, in the fifteenth embodiment, color resistors 54 are formed on the transparent substrate 50, a black matrix 53 is formed on the transparent substrate 10 before the capacitive touch structure 20 is formed on the transparent substrate 10, and the black matrix is located between adjacent color resistors 54 formed on the transparent substrate 50 in a direction parallel to the transparent substrate 50. The others are the same as those in the thirteenth embodiment.
In the fifteenth embodiment, in order to block and absorb the reflected light reflected from the metal electrodes on the transparent substrate 10 back to the operation interface, a black matrix (BlackMatrix) is fabricated on the transparent substrate 10, and then the touch structure and the display structure are fabricated, and the reflected ambient light is absorbed by the black matrix.
Sixteenth embodiment
Fig. 30 is a schematic cross-sectional structure view of a display panel according to a sixteenth embodiment of the present invention, referring to fig. 30, in the sixteenth embodiment, after forming color resistors 54 on the transparent substrate 50, and after forming the capacitive touch structure 20, and before forming the first insulating layer 31, a black matrix 53 is formed on the capacitive touch structure 20, and the black matrix 53 is located between adjacent color resistors 54 formed on the transparent substrate 50 in a direction parallel to the transparent substrate 50. The others are the same as those in the thirteenth embodiment.
In the sixteenth embodiment, in order to block and absorb the reflected light reflected from the metal electrode on the transparent substrate 10 back to the operation interface, a black matrix (BlackMatrix) is fabricated on the touch structure 20, and then the first insulating layer 31 and the display structure 40 are fabricated, and the reflected ambient light is absorbed by the black matrix. BM is fabricated above the touch structure and below the display structure, so that the black matrix is closer to the metal electrodes in the display structure than the black matrix in the fifteenth embodiment, which can better absorb the reflected ambient light and reduce the corresponding amount of reflected light.
Seventeenth embodiment
Fig. 31 is a schematic cross-sectional view illustrating a display panel according to a seventeenth embodiment of the present invention, referring to fig. 31, in the seventeenth embodiment, after forming color resists 54 on the transparent substrate 50, forming a common electrode 413a, and before forming a second insulating layer 33, forming a black matrix 53 on the common electrode 413a, wherein the black matrix 53 is located between adjacent color resists 54 formed on the transparent substrate 50 in a direction parallel to the transparent substrate 50. The others are the same as those in the thirteenth embodiment.
In the seventeenth embodiment, in order to block and absorb the reflected light reflected from the metal electrode on the transparent substrate 10 back to the operation interface, a black matrix (BlackMatrix) is formed on the common electrode 413a, and then the second insulating layer 33 and other structures are formed, and the reflected ambient light is absorbed by the black matrix 53. By forming the BM on the common electrode 413a so that the black matrix is closer to the metal electrode in the display structure than the black matrix in the sixteenth embodiment, the reflected ambient light can be better absorbed and the amount of reflected light can be reduced accordingly.
Eighteenth embodiment
Fig. 32 is a schematic cross-sectional structure view of a display panel according to an eighteenth embodiment of the present invention, referring to fig. 32, in the eighteenth embodiment, a color resistor 54 is formed on the transparent substrate 50, after the second insulating layer 33 is formed, a black matrix 53 is formed on the second insulating layer 33 before TFT switches, scan lines, and data lines are formed, and the black matrix is located between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate 50. The others are the same as those in the thirteenth embodiment.
In this eighteenth embodiment, in order to block and absorb reflected light reflected from the metal electrodes on the transparent substrate 10 back to the operation interface, a black matrix (BlackMatrix) is formed on the upper second insulating layer 33, and the reflected ambient light is absorbed by the black matrix. By forming the BM on the second insulating layer 33, the black matrix is closer to the metal electrode in the display structure than the black matrix in the seventeenth embodiment, so that the reflected ambient light can be better absorbed and the amount of reflected light can be reduced accordingly.
Embodiments of display Panel
Based on the method for forming the display panel, the invention also provides a display panel, which comprises the following steps: the touch screen comprises a transparent substrate, a touch structure, a first insulating layer, a shielding electrode layer and a second insulating layer, wherein the touch structure, the first insulating layer, the shielding electrode layer and the second insulating layer are positioned on the transparent substrate; and a display structure of an IPS/FFS display mode on the second insulating layer.
First embodiment
Fig. 7 is a schematic cross-sectional structure diagram of a display panel according to a first embodiment of the present invention, and referring to fig. 7, in the first embodiment, a capacitive touch structure 20a includes: a plurality of sensing electrodes 21a arranged in parallel on the transparent substrate 10; a dielectric layer 23a covering the sensing electrode 21a and the transparent substrate 10; and the plurality of driving electrodes 22a are positioned on the dielectric layer 23a, and the sensing electrodes 21a and the driving electrodes 22a are arranged in a mutually crossed manner.
Referring to fig. 3 in combination with fig. 7, in the first embodiment, the display structure of the IPS/FFS display mode includes: a TFT switch, a scan line 412a, and a data line 443a on the second insulating layer 33; a passivation layer 45a covering the TFT switch, the data line 443a and the scan line 412 a; a common electrode 413a on the passivation layer 45 a; a third insulating layer 47a covering the common electrode 413a and the passivation layer 45 a; and a pixel electrode 46a on the third insulating layer 47a, wherein the pixel electrode 46a is a stripe electrode. And a plurality of strip-shaped pixel electrodes 46a arranged at intervals are arranged in one pixel, and gaps (not numbered in the figure) are arranged between the pixel electrodes 46a in the same pixel area. In the first embodiment, the common electrode 413a is laid over the passivation layer 45a, but the common electrode 413a may have a slit opposite to the slit between the pixel electrodes 46a in the present invention. An electric field is formed between the pixel electrode 46a and the common electrode 413a, and the electric field at the gap of the pixel electrode 46a is parallel to the surface of the transparent substrate 10, which can ensure that the liquid crystal rotates in a plane parallel to the transparent substrate.
In addition, in this embodiment, the positional relationship between the common electrode and the pixel electrode may be interchanged, specifically: the display structure of the IPS/FFS display mode comprises: a TFT switch, a scan line and a data line on the second insulating layer; a passivation layer covering the TFT switch, the data line and the scan line; a pixel electrode on the passivation layer; a third insulating layer covering the pixel electrode and the passivation layer; and the common electrode is positioned on the third insulating layer and is a strip-shaped electrode.
In this embodiment, the position relationship between the sensing electrode and the driving electrode may also be interchanged, specifically: the capacitive touch structure includes: a plurality of driving electrodes arranged in parallel on the transparent substrate; a dielectric layer covering the driving electrode and the transparent substrate; and the driving electrodes and the induction electrodes are arranged in a mutually crossed manner.
The TFT switch includes: a gate 411a on the second insulating layer 33, a gate dielectric layer 42a covering the gate 411a, an active region on the gate dielectric layer 42a, a source 441a and a drain 442a on the active region and on two sides of the active region, respectively; the scan line 412a and the gate 411a are located at the same layer; the data line 443a is located at the same layer as the source and drain electrodes 441a and 442 a.
The contents of the display panel structure and the materials in the method for forming the display panel in the first embodiment can be cited in relation to the display panel in the first embodiment, which are not repeated herein.
Second embodiment
Fig. 10 is a schematic cross-sectional structure diagram of a display panel according to a second embodiment of the present invention, and referring to fig. 3 and fig. 10 in combination, in the second embodiment, a touch structure 20b includes: a plurality of induction electrodes 21b arranged in parallel on the transparent substrate 10, and a plurality of driving electrodes 22b arranged in parallel and intersecting with the induction electrodes 21b, wherein each driving electrode is divided into a plurality of sections by the plurality of induction electrodes; a dielectric layer 23b covering the sensing electrode 21b, the driving electrode 22b and the transparent substrate 10, wherein the dielectric layer 23b is provided with a via hole 24 b; and an interconnect 25b on the dielectric layer 23b, the interconnect electrically connecting together a plurality of segments of each of the drive electrodes separated by the plurality of sense electrodes. The material in the through hole and the material of the interconnection line are metal or transparent conductive materials.
In addition, in this embodiment, the position relationship between the sensing electrode and the driving electrode may be interchanged, specifically: the capacitive touch structure includes: a plurality of driving electrodes arranged in parallel and positioned on the transparent substrate, and a plurality of induction electrodes arranged in parallel and crossed with the driving electrodes, wherein each induction electrode is divided into a plurality of sections by the plurality of driving electrodes; the dielectric layer covers the driving electrode, the induction electrode and the transparent substrate and is provided with a through hole; and the interconnecting wire is positioned on the dielectric layer and electrically connects the sections of the sensing electrodes which are separated by the driving electrodes together.
In the second embodiment, the display structure 40b has the same structure as the display structure 40a in the first embodiment, and the description thereof is omitted.
The contents of the display panel structure and the materials in the method for forming the display panel of the second embodiment can be cited in the display panel of the second embodiment, which are not repeated herein.
Third embodiment
Fig. 13 is a schematic cross-sectional structure view of a display panel according to a third embodiment of the present invention, with reference to fig. 11 and 13, in the third embodiment, the display panel includes: a transparent substrate 10, a touch structure 20c on a front surface of the transparent substrate 10; a first insulating layer 31, a shielding electrode layer 32 and a second insulating layer 33 are sequentially formed on the touch structure 20 c; and a display structure 40c of an IPS/FFS display mode on the second insulating layer 33.
In the third embodiment, the touch structure 20c has the same structure as the touch structure 20a in the first embodiment, and details thereof are not repeated.
In the third embodiment, the display structure 40c is an IPS display structure including: a TFT switch, a scan line 412c, and a data line 443c on the second insulating layer 33; a passivation layer 45c covering the TFT switch, the data line 443c and the scan line 412 c; and pixel electrodes 46c and common electrodes 47c (both located on the same layer) arranged at intervals on the passivation layer 45c, wherein a gap is formed between the pixel electrodes 46c and the common electrodes 47 c.
The TFT switch includes: a gate 411c on the second insulating layer 33, a gate dielectric layer 42c on the gate 411c, an active region (not shown) on the gate dielectric layer 42c, a source 441c and a drain 442c on the active region and respectively on two sides of the active region; the scan line 412c and the gate 411c are located at the same layer; the data line 443c is located at the same layer as the source 441c and the drain 442 c.
The contents of the display panel structure and the materials in the method for forming the display panel of the third embodiment can be cited in relation to the display panel of the third embodiment, which are not repeated herein.
Fourth embodiment
Fig. 16 is a schematic cross-sectional structure view of a display panel according to a fourth embodiment of the present invention, and referring to fig. 11 and 16 in combination, the display panel according to the fourth embodiment includes: a transparent substrate 10, a touch structure 20d on a front surface of the transparent substrate 10; a first insulating layer 31, a shielding electrode layer 32 and a second insulating layer 33 are sequentially formed on the touch structure 20 d; and a display structure 40d of an IPS/FFS display mode on the second insulating layer.
In the fourth embodiment, the touch structure 20d has the same structure as the touch structure 20b in the second embodiment, and details are not repeated here.
In the fourth embodiment, the display structure 40d has the same structure as the display structure 40c in the third embodiment, and details thereof are not repeated.
Fifth embodiment
Fig. 17 is a schematic cross-sectional view of a display panel according to a fifth embodiment of the present invention, and referring to fig. 17, the display panel according to the fifth embodiment includes: a transparent substrate 10, a touch structure 20 located on the front surface of the transparent substrate 10; a first insulating layer 31, a shielding electrode layer 32 and a second insulating layer 33 are sequentially formed on the touch structure 20; and a display structure 40 of an IPS/FFS display mode on the second insulating layer. The touch structure 20 is one of the touch structures 20a, 20b, 20c, and 20d in the first, second, third, and fourth embodiments, and the display structure 40 is one of the display structures 40a, 40b, 40c, and 40d in the first, second, third, and fourth embodiments.
In a fifth embodiment, the display panel further includes: a transparent substrate 50 opposite to the transparent base 10; a liquid crystal layer 70 between the transparent substrate 50 and the transparent substrate 10; a first linear polarizer 51 on the back of the transparent substrate 10; a second linear polarizer 52 on the back of the transparent substrate 50. In this embodiment, the transparent substrate 50 is a color film substrate having a color resistor 25, and the color resistor may be a red, green, and blue color resistor or a red, green, blue, and white color resistor; further comprising: and the black matrix 53 is positioned on the color film transparent substrate and positioned between the adjacent color resistors 54.
Further comprising: a backlight 60 positioned on one side of the transparent substrate 50.
In the method for forming a display panel according to the fifth embodiment, the contents of the display panel structure, the materials, the display mode, the advantages, and the like can be cited herein.
Sixth embodiment
Fig. 18 is a schematic cross-sectional view of a display panel according to a sixth embodiment of the present invention, and referring to fig. 18, in the sixth embodiment, the polarizer on the back surface of the transparent substrate 10 is a first circular polarizer 51 a; the polarizing plate positioned on the back surface of the transparent substrate 50 is a second circularly polarizing plate 52 a; the rest of the display panel is the same as that of the display panel of the fifth embodiment, and is not described herein. In the method for forming a display panel according to the sixth embodiment, the contents of the display panel structure, the materials, the display mode, the advantages, and the like can be cited herein.
Seventh embodiment
Fig. 19 is a schematic cross-sectional view of a display panel according to a seventh embodiment of the present invention, referring to fig. 19, in the seventh embodiment, a black matrix 53 is located between the transparent substrate 10 and the touch structure 20, and is located between adjacent color resists 54 in a direction parallel to the transparent substrate 50. Otherwise, as in the fifth embodiment, the contents of the display panel structure, the materials, the display mode and the advantages of the display panel in the method for forming the display panel of the seventh embodiment can be cited.
Eighth embodiment
Fig. 20 is a schematic cross-sectional view of a display panel according to an eighth embodiment of the present invention, referring to fig. 20, in the eighth embodiment, the black matrix 53 is located between the first insulating layer 31 and the touch structure 20, and is located between adjacent color resists 54 in a direction parallel to the transparent substrate 50. The others are the same as those of the display panel of the fifth embodiment. In the method for forming a display panel according to the eighth embodiment, the contents of the structure, material, display mode, advantages, and the like of the display panel can be cited herein.
Ninth embodiment
Fig. 21 is a schematic cross-sectional view of a display panel according to a ninth embodiment of the invention, and referring to fig. 21, in the ninth embodiment, the black matrix 53 is located between the shielding electrode layer 32 and the second insulating layer 33, and is located between adjacent color resists 54 in a direction parallel to the transparent substrate 50. The others are the same as those of the display panel of the fifth embodiment. In the method for forming a display panel according to the ninth embodiment, the contents of the structure, material, display mode, advantages, and the like of the display panel can be cited.
Tenth embodiment
Fig. 22 is a schematic cross-sectional view of a display panel according to a tenth embodiment of the invention, and referring to fig. 22, in the tenth embodiment, the black matrix 53 is located between the second insulating layer 33 and the display structure 20 and between adjacent color resists 54 in a direction parallel to the transparent substrate 50. The others are the same as those of the display panel of the fifth embodiment. In the method for forming a display panel according to the tenth embodiment, the contents of the structure, material, display mode, advantages, and the like of the display panel are cited herein.
Eleventh embodiment
Fig. 25 is a schematic cross-sectional structure diagram of a display panel according to an eleventh embodiment of the present invention, and referring to fig. 3 and fig. 25 in combination, the display panel according to the eleventh embodiment includes: a transparent substrate 10; a capacitive touch structure 20e, a first insulating layer 31, and a display structure 40e of an IPS/FFS display mode sequentially formed on the transparent substrate 10; wherein the capacitive touch structure 20e is the same as the capacitive touch structure 20a of the first embodiment; the display structure 40e of the IPS/FFS display mode includes: a common electrode 413a and a second insulating layer 33 sequentially formed on the first insulating layer 31; a TFT switch, a scan line 412a, and a data line 443a on the second insulating layer 33; a passivation layer 45a covering the TFT switches, the data lines, and the scan lines; and the pixel electrode 46a is positioned on the passivation layer 45a, and the pixel electrode 46a is a strip electrode. The common electrode layer 413a is made of a transparent conductive material, and the first insulating layer 31 and the second insulating layer 33 are made of transparent insulating materials.
In the same pixel region, a plurality of pixel electrodes 46a are arranged at intervals, and a gap (not numbered in the figure) is provided between each pixel electrode 46 a. In the fifth embodiment, the common electrode 413a serves as a shielding electrode layer for shielding an electric field between the display structure and the touch structure, and preferably, the common electrode 413a is laid throughout the first insulating layer 31, but the common electrode 413a may have a slit opposite to the slit between the pixel electrodes 46aa in the present invention. The electric field formed between the pixel electrode 46a and the common electrode 413a at the gap of the pixel electrode 46a is parallel to the surface of the transparent substrate 10, which ensures that the liquid crystal rotates in a plane parallel to the transparent substrate.
The rest is the same as the first embodiment, and is not described herein.
Twelfth embodiment
Fig. 26 is a schematic cross-sectional view of a display panel according to a twelfth embodiment of the present invention, and referring to fig. 26, in the display panel according to the twelfth embodiment, a capacitive touch structure 20f on a transparent substrate 10 is the same as the capacitive touch structure 20b according to the second embodiment, and a display structure 40f formed on a first insulating layer 31 is the same as the display structure 40e according to the eleventh embodiment.
Thirteenth embodiment
Fig. 27 is a schematic cross-sectional view of a display panel according to a thirteenth embodiment of the invention, and referring to fig. 27, the display panel according to the thirteenth embodiment includes: the touch screen comprises a transparent substrate 10, a touch structure 20 and a first insulating layer 31, wherein the touch structure and the first insulating layer 31 are sequentially arranged on the transparent substrate 10; and a display structure 40 of an IPS/FFS display mode on the first insulating layer. The touch structure 20 is one of the touch structures 20e and 20f in the eleventh embodiment and the twelfth embodiment, and the display structure 40 is one of the display structures 40e and 40f in the eleventh embodiment and the twelfth embodiment.
In a thirteenth embodiment, the display panel further includes: a transparent substrate 50 opposite to the transparent base 10; a liquid crystal layer 70 between the transparent substrate 50 and the transparent substrate 10; a first linear polarizer 51 on the back of the transparent substrate 10; a second linear polarizer 52 on the back of the transparent substrate 50. In this embodiment, the transparent substrate 50 is a color film transparent substrate having a color resistor 25, and the color resistor may be a red, green, and blue color resistor or a red, green, blue, and white color resistor; further comprising: and the black matrix 53 is positioned on the color film transparent substrate and positioned between the adjacent color resistors 54.
A backlight 60 positioned on one side of the transparent substrate 50.
In the method for forming a display panel according to the thirteenth embodiment, the contents of the display panel structure, materials, display modes, advantages, and the like can be cited herein.
Fourteenth embodiment
Fig. 28 is a schematic cross-sectional structure view of a display panel according to a fourteenth embodiment of the present invention, and referring to fig. 28, in the fourteenth embodiment, a polarizer on the back surface of the transparent substrate 10 is a first circular polarizer 51 a; the polarizing plate positioned on the back surface of the transparent substrate 50 is a second circularly polarizing plate 52 a; the rest of the display panel is the same as that of the thirteenth embodiment, and is not described herein. In the method for forming a display panel according to the fourteenth embodiment, the contents of the display panel structure, the materials, the display mode, the advantages, and the like can be cited herein.
Fifteenth embodiment
Fig. 29 is a schematic cross-sectional structure view of a display panel according to a fifteenth embodiment of the invention, referring to fig. 29, in the fifteenth embodiment, a black matrix 53 is located between the transparent substrate 10 and the touch structure 20, and is located between adjacent color resists 54 in a direction parallel to the transparent substrate 50. Otherwise, as in the thirteenth embodiment, the contents of the display panel structure, the materials, the display mode and the advantages of the method for forming the display panel in the fifteenth embodiment are incorporated herein.
Sixteenth embodiment
Fig. 30 is a schematic cross-sectional view illustrating a display panel according to a sixteenth embodiment of the present invention, referring to fig. 30, in the sixteenth embodiment, the black matrix 53 is located between the first insulating layer 31 and the touch structure 20, and is located between adjacent color resists 54 in a direction parallel to the transparent substrate 50. The others are the same as those of the display panel of the thirteenth embodiment. In the method for forming a display panel according to the sixteenth embodiment, the contents of the structure, material, display mode, advantages, and the like of the display panel can be cited herein.
Seventeenth embodiment
Fig. 31 is a schematic cross-sectional view of a display panel according to a seventeenth embodiment of the invention, referring to fig. 31, in the seventeenth embodiment, the black matrix 53 is located between the common electrode 413a and the second insulating layer 33, and is located between adjacent color resists 54 in a direction parallel to the transparent substrate 50. The others are the same as those of the display panel of the thirteenth embodiment. In the method of forming a display panel according to the seventeenth embodiment, the contents of the structure, material, display mode, advantages, and the like of the display panel are cited herein.
Eighteenth embodiment
Fig. 32 is a schematic cross-sectional view of a display panel according to an eighteenth embodiment of the invention, referring to fig. 32, in the eighteenth embodiment, the black matrix 53 is located between the second insulating layer 33 and the TFT switches, data lines, and scan lines, and is located between adjacent color resists 54 in a direction parallel to the transparent substrate 50. The others are the same as those of the display panel of the thirteenth embodiment. In the method for forming a display panel according to the eighteenth embodiment, the contents regarding the structure, material, display mode, advantages, and the like of the display panel can be cited herein.
Based on the display panel, the invention also provides a liquid crystal display device, which comprises: the display panel of the first to eighteenth embodiments; a backlight 60 positioned on one side of the transparent substrate 50.
According to the display panel, the touch structure is formed on the transparent substrate, the display structure of the IPS/FFS display mode is formed above the touch structure, the shielding electrode layer is formed between the touch structure and the display structure of the IPS/FFS display mode or the common electrode serves as the shielding electrode layer, and the shielding electrode layer can avoid the problem of mutual interference between the electric field of the display structure of the IPS/FFS display mode and the electric field of the touch structure. Moreover, because the touch structure and the display structure of the IPS/FFS display mode are positioned on the same transparent substrate, the touch structure is an in-cell touch structure (InCellTP), and a transparent substrate is omitted compared with an out-cell display panel, the thickness of a final LCD finished product is thinned, and the weight of a terminal product is reduced.
In addition, the forming method of the display panel in the technical scheme is simple in preparation process and low in cost.
Although the present invention has been described with reference to the preferred embodiments, it is not intended to limit the present invention, and those skilled in the art can make variations and modifications of the present invention without departing from the spirit and scope of the present invention by using the methods and technical contents disclosed above.
Claims (37)
1. A method of forming a display panel, comprising:
providing a transparent substrate;
sequentially forming a capacitive touch structure, a first insulating layer, a shielding electrode layer and a second insulating layer on the transparent substrate;
forming a display structure of an IPS/FFS display mode on the second insulating layer;
wherein forming a display structure of an IPS/FFS display mode on the second insulating layer includes:
forming a TFT switch, a scan line and a data line on the second insulating layer;
forming a passivation layer covering the TFT switch, the data line and the scanning line;
and forming pixel electrodes and a common electrode which are arranged at intervals on the passivation layer, wherein a gap is formed between the pixel electrodes and the common electrode.
2. The method of forming a display panel according to claim 1, wherein the shielding electrode layer is a transparent conductive material, and the first insulating layer and the second insulating layer are both made of a transparent insulating material.
3. The method of forming a display panel of claim 1, wherein forming a capacitive touch structure on the transparent substrate comprises:
forming a plurality of induction electrodes which are arranged in parallel on the transparent substrate;
forming a dielectric layer to cover the induction electrode and the transparent substrate;
and forming a plurality of driving electrodes on the dielectric layer, wherein the induction electrodes and the driving electrodes are arranged in a mutually crossed manner.
4. The method of forming a display panel of claim 1, wherein forming a capacitive touch structure on the transparent substrate comprises:
forming a plurality of induction electrodes arranged in parallel and a plurality of driving electrodes arranged in parallel and crossed with the induction electrodes on the transparent substrate, wherein each driving electrode is divided into a plurality of sections by the plurality of induction electrodes arranged in parallel;
forming a dielectric layer, and covering the induction electrode, the driving electrode and the transparent substrate;
patterning the dielectric layer, forming via holes in the dielectric layer, and exposing all sections of the driving electrodes at the bottoms of the via holes;
forming a conducting layer, covering the dielectric layer and filling the via hole;
patterning the conductive layer to form interconnect lines electrically connecting together sections of each of the drive electrodes separated by the plurality of parallel arranged sense electrodes.
5. The method of forming a display panel of claim 1, wherein forming a display structure of an IPS/FFS display mode on the second insulating layer comprises:
forming a TFT switch, a scan line and a data line on the second insulating layer;
forming a passivation layer covering the TFT switch, the data line and the scanning line;
forming a common electrode on the passivation layer;
forming a third insulating layer covering the common electrode and the passivation layer;
forming a pixel electrode on the third insulating layer, the pixel electrode being a stripe electrode;
or,
forming a TFT switch, a scan line and a data line on the second insulating layer;
forming a passivation layer covering the TFT switch, the data line and the scanning line;
forming a pixel electrode on the passivation layer;
forming a third insulating layer covering the pixel electrode and the passivation layer;
and forming a common electrode on the third insulating layer, wherein the common electrode is a strip electrode.
6. The method of forming a display panel of claim 1, further comprising: providing a transparent substrate;
the transparent substrate is relatively attached to the transparent substrate;
on the transparent substrate, one surface facing the transparent substrate is the front surface of the transparent substrate, and the other surface back to the transparent substrate is the back surface of the transparent substrate;
on the transparent substrate, one surface facing the transparent substrate is the front surface of the transparent substrate, and the other surface back to the transparent substrate is the back surface of the transparent substrate;
the capacitive touch structure and the display structure of the IPS/FFS display mode are formed on the front surface of the transparent substrate;
forming a first linear polarizer on the back of the transparent substrate;
and forming a second linear polarizer on the back of the transparent substrate.
7. The method of forming a display panel according to claim 6, further comprising, before attaching the transparent base and the transparent substrate:
forming color resistors and a black matrix on the transparent substrate, wherein the black matrix is positioned between the adjacent color resistors;
or forming color resistors on the transparent substrate, forming a black matrix on the transparent substrate before forming the capacitive touch structure, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate;
or forming color resistors on the transparent substrate, forming a black matrix on the capacitive touch structure after forming the capacitive touch structure and before forming the first insulating layer, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate;
or forming color resistors on the transparent substrate, forming a black matrix on the shielding electrode layer after forming the shielding electrode layer and before forming the second insulating layer, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate;
or forming color resistors on the transparent substrate, and forming a black matrix on the second insulating layer after forming the second insulating layer and before forming the display structure of the IPS/FFS display mode, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate.
8. The method of forming a display panel of claim 1, further comprising: providing a transparent substrate;
the transparent substrate is relatively attached to the transparent substrate;
on the transparent substrate, one surface facing the transparent substrate is the front surface of the transparent substrate, and the other surface back to the transparent substrate is the back surface of the transparent substrate;
on the transparent substrate, one surface facing the transparent substrate is the front surface of the transparent substrate, and the other surface back to the transparent substrate is the back surface of the transparent substrate;
the capacitive touch structure and the display structure of the IPS/FFS display mode are formed on the front surface of the transparent substrate;
forming a first circular polarizer on the back surface of the transparent substrate;
and forming a second circular polarizer on the back of the transparent substrate.
9. The method of forming a display panel according to claim 8, further comprising, before attaching the transparent base and the transparent substrate: and forming color resistors and a black matrix on the transparent substrate, wherein the black matrix is positioned between the adjacent color resistors.
10. A method of forming a display panel, comprising:
providing a transparent substrate;
sequentially forming a capacitive touch structure and a first insulating layer on the transparent substrate;
forming a display structure of an IPS/FFS display mode on the first insulating layer;
the display structure forming the IPS/FFS display mode comprises:
forming a common electrode on the first insulating layer;
forming a second insulating layer on the common electrode;
forming a TFT switch, a scan line and a data line on the second insulating layer;
forming a passivation layer covering the TFT switch, the data line and the scanning line;
and forming a pixel electrode on the passivation layer, wherein the pixel electrode is a strip electrode.
11. The method of forming a display panel according to claim 10, wherein the common electrode is a transparent conductive material, and the material of the first insulating layer and the material of the second insulating layer are both transparent insulating materials.
12. The method of forming a display panel according to claim 10, wherein the common electrode is laid on the passivation layer, or the common electrode has a slit opposite to a slit between the pixel electrodes.
13. The method of forming a display panel of claim 10, wherein forming a capacitive touch structure on the transparent substrate comprises:
forming a plurality of induction electrodes which are arranged in parallel on the transparent substrate;
forming a dielectric layer to cover the induction electrode and the transparent substrate;
and forming a plurality of driving electrodes on the dielectric layer, wherein the induction electrodes and the driving electrodes are arranged in a mutually crossed manner.
14. The method of forming a display panel of claim 10, wherein forming a capacitive touch structure on the transparent substrate comprises:
forming a plurality of induction electrodes arranged in parallel and a plurality of driving electrodes arranged in parallel and crossed with the induction electrodes on the transparent substrate, wherein each driving electrode is divided into a plurality of sections by the plurality of induction electrodes arranged in parallel;
forming a dielectric layer, and covering the induction electrode, the driving electrode and the transparent substrate;
patterning the dielectric layer, forming via holes in the dielectric layer, and exposing all sections of the driving electrodes at the bottoms of the via holes;
forming a conducting layer, covering the dielectric layer and filling the via hole;
patterning the conductive layer to form interconnect lines electrically connecting together sections of each of the drive electrodes separated by the plurality of parallel arranged sense electrodes.
15. The method of forming a display panel of claim 10, further comprising: providing a transparent substrate;
the transparent substrate is relatively attached to the transparent substrate;
on the transparent substrate, one surface facing the transparent substrate is the front surface of the transparent substrate, and the other surface back to the transparent substrate is the back surface of the transparent substrate;
on the transparent substrate, one surface facing the transparent substrate is the front surface of the transparent substrate, and the other surface back to the transparent substrate is the back surface of the transparent substrate;
the capacitive touch structure and the display structure of the IPS/FFS display mode are formed on the front surface of the transparent substrate;
forming a first linear polarizer on the back of the transparent substrate;
and forming a second linear polarizer on the back of the transparent substrate.
16. The method of forming a display panel according to claim 15, further comprising, before attaching the transparent base and the transparent substrate:
forming color resistors and a black matrix on the transparent substrate, wherein the black matrix is positioned between the adjacent color resistors;
or forming color resistors on the transparent substrate, forming a black matrix on the transparent substrate before forming the capacitive touch structure, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate;
or forming color resistors on the transparent substrate, forming a black matrix on the capacitive touch structure after forming the capacitive touch structure and before forming the first insulating layer, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate;
or forming color resistors on the transparent substrate, forming a black matrix on the common electrode after forming the common electrode and before forming the second insulating layer, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate;
or forming color resistors on the transparent substrate, forming a black matrix on the second insulating layer after forming the second insulating layer and before forming the TFT switches, the scanning lines and the data lines, wherein the black matrix is positioned between adjacent color resistors formed on the transparent substrate in a direction parallel to the transparent substrate.
17. The method of forming a display panel of claim 10, further comprising: providing a transparent substrate;
the transparent substrate is relatively attached to the transparent substrate;
on the transparent substrate, one surface facing the transparent substrate is the front surface of the transparent substrate, and the other surface back to the transparent substrate is the back surface of the transparent substrate;
on the transparent substrate, one surface facing the transparent substrate is the front surface of the transparent substrate, and the other surface back to the transparent substrate is the back surface of the transparent substrate;
the capacitive touch structure and the display structure of the IPS/FFS display mode are formed on the front surface of the transparent substrate;
forming a first circular polarizer on the back surface of the transparent substrate;
and forming a second circular polarizer on the back of the transparent substrate.
18. The method of forming a display panel according to claim 17, further comprising, before attaching the transparent base and the transparent substrate: and forming color resistors and a black matrix on the transparent substrate, wherein the black matrix is positioned between the adjacent color resistors.
19. A display panel, comprising:
a transparent substrate;
the capacitive touch structure, the first insulating layer, the shielding electrode layer and the second insulating layer are sequentially formed on the transparent substrate;
a display structure of an IPS/FFS display mode on the second insulating layer;
wherein the display structure of the IPS/FFS display mode comprises:
a TFT switch, a scan line and a data line on the second insulating layer;
a passivation layer covering the TFT switch, the data line and the scan line;
the pixel electrodes and the common electrodes are arranged on the passivation layer at intervals, and gaps are formed between the pixel electrodes and the common electrodes.
20. The display panel according to claim 19, wherein the shielding electrode layer is a transparent conductive material, and the first insulating layer and the second insulating layer are both made of a transparent insulating material.
21. The display panel of claim 19,
the capacitive touch structure includes:
a plurality of induction electrodes which are arranged in parallel and are positioned on the transparent substrate;
a dielectric layer covering the sensing electrode and the transparent substrate;
the induction electrodes and the driving electrodes are arranged in a cross mode;
alternatively, the capacitive touch structure includes:
a plurality of driving electrodes arranged in parallel on the transparent substrate;
a dielectric layer covering the driving electrode and the transparent substrate;
and the induction electrodes and the driving electrodes are arranged in a mutually crossed manner.
22. The display panel of claim 19,
the capacitive touch structure includes:
a plurality of induction electrodes which are arranged in parallel and are positioned on the transparent substrate, and a plurality of driving electrodes which are arranged in parallel and are crossed with the induction electrodes, wherein each driving electrode is divided into a plurality of sections by the plurality of induction electrodes which are arranged in parallel;
the dielectric layer covers the induction electrode, the driving electrode and the transparent substrate and is provided with a through hole;
the interconnection line is positioned on the dielectric layer and electrically connects a plurality of sections of the driving electrodes which are separated by the plurality of parallel arranged sensing electrodes;
alternatively, the capacitive touch structure includes:
the array substrate comprises a plurality of driving electrodes arranged in parallel and positioned on the transparent substrate, and a plurality of induction electrodes arranged in parallel and crossed with the driving electrodes, wherein each induction electrode is divided into a plurality of sections by the plurality of driving electrodes arranged in parallel;
the dielectric layer covers the induction electrode, the driving electrode and the transparent substrate and is provided with a through hole;
and the interconnecting wire is positioned on the dielectric layer and electrically connects a plurality of sections of the sensing electrodes which are separated by the plurality of driving electrodes arranged in parallel together.
23. The display panel of claim 19, wherein the display structure of the IPS/FFS display mode comprises:
a TFT switch, a scan line and a data line on the second insulating layer;
a passivation layer covering the TFT switch, the data line and the scan line;
a common electrode on the passivation layer;
a third insulating layer covering the common electrode and the passivation layer;
the pixel electrode is positioned on the third insulating layer and is a strip electrode;
or,
the display structure of the IPS/FFS display mode comprises:
a TFT switch, a scan line and a data line on the second insulating layer;
a passivation layer covering the TFT switch, the data line and the scan line;
a pixel electrode on the passivation layer;
a third insulating layer covering the pixel electrode and the passivation layer;
and the common electrode is positioned on the third insulating layer and is a strip-shaped electrode.
24. The display panel according to claim 19, further comprising: a transparent substrate opposite to the transparent base;
one surface of the transparent substrate, facing the transparent substrate, is the front surface of the transparent substrate, and the surface of the transparent substrate, back to the transparent substrate, is the back surface of the transparent substrate;
one surface of the transparent substrate, facing the transparent substrate, is the front surface of the transparent substrate, and the surface of the transparent substrate, back to the transparent substrate, is the back surface of the transparent substrate;
a liquid crystal layer between the transparent substrate and the transparent substrate;
a first linear polarizer located on the back of the transparent substrate;
a second linear polarizer located on the back of the transparent substrate.
25. The display panel according to claim 24, wherein the transparent substrate is a color film substrate having color resistance;
further comprising: the black matrix is positioned on the transparent substrate and positioned between the adjacent color resistors; or the black matrix is positioned between the transparent substrate and the capacitive touch structure and positioned between adjacent color resistors in the direction parallel to the transparent substrate; or the black matrix is positioned between the first insulating layer and the capacitive touch structure and positioned between adjacent color resistors in the direction parallel to the transparent substrate; or the black matrix is positioned between the shielding electrode layer and the second insulating layer and positioned between the adjacent color resistors in the direction parallel to the transparent substrate; or the black matrix is positioned between the second insulating layer and the display structure of the IPS/FFS display mode and positioned between adjacent color resistors in the direction parallel to the transparent substrate.
26. The display panel according to claim 19, further comprising: a transparent substrate opposite the transparent base;
one surface of the transparent substrate, facing the transparent substrate, is the front surface of the transparent substrate, and the surface of the transparent substrate, back to the transparent substrate, is the back surface of the transparent substrate;
one surface of the transparent substrate, facing the transparent substrate, is the front surface of the transparent substrate, and the surface of the transparent substrate, back to the transparent substrate, is the back surface of the transparent substrate;
a liquid crystal layer between the transparent substrate and the transparent substrate;
a first circular polarizer on the back of the transparent substrate;
and a second circular polarizer located on the back of the transparent substrate.
27. The display panel according to claim 26, wherein the transparent substrate is a color film substrate having a color resistance and a black matrix; the black matrix is located between adjacent color resists.
28. A display panel, comprising:
a transparent substrate;
the display structure comprises a capacitive touch structure, a first insulating layer and an IPS/FFS display mode, wherein the capacitive touch structure, the first insulating layer and the display structure are sequentially formed on the transparent substrate;
wherein the display structure of the IPS/FFS display mode comprises: a common electrode and a second insulating layer sequentially formed on the first insulating layer; a TFT switch, a scan line and a data line on the second insulating layer; a passivation layer covering the TFT switch, the data line and the scan line; and the pixel electrode is positioned on the passivation layer and is a strip electrode.
29. The display panel according to claim 28, wherein the common electrode is a transparent conductive material, and wherein the first insulating layer and the second insulating layer are both made of a transparent insulating material.
30. The display panel according to claim 28, wherein the common electrode is laid on the passivation layer or has a slit opposite to a slit between the pixel electrodes.
31. The display panel of claim 28,
the capacitive touch structure includes:
a plurality of induction electrodes which are arranged in parallel and are positioned on the transparent substrate;
a dielectric layer covering the sensing electrode and the transparent substrate;
the induction electrodes and the driving electrodes are arranged in a cross mode;
alternatively, the capacitive touch structure includes:
a plurality of driving electrodes arranged in parallel on the transparent substrate;
a dielectric layer covering the driving electrode and the transparent substrate;
and the induction electrodes and the driving electrodes are arranged in a mutually crossed manner.
32. The display panel of claim 28,
the capacitive touch structure includes:
a plurality of induction electrodes which are arranged in parallel and are positioned on the transparent substrate, and a plurality of driving electrodes which are arranged in parallel and are crossed with the induction electrodes, wherein each driving electrode is divided into a plurality of sections by the plurality of induction electrodes which are arranged in parallel;
the dielectric layer covers the induction electrode, the driving electrode and the transparent substrate and is provided with a through hole;
the interconnection line is positioned on the dielectric layer and electrically connects a plurality of sections of the driving electrodes which are separated by the plurality of parallel arranged sensing electrodes;
alternatively, the capacitive touch structure includes:
the array substrate comprises a plurality of driving electrodes arranged in parallel and positioned on the transparent substrate, and a plurality of induction electrodes arranged in parallel and crossed with the driving electrodes, wherein each induction electrode is divided into a plurality of sections by the plurality of driving electrodes arranged in parallel;
the dielectric layer covers the induction electrode, the driving electrode and the transparent substrate and is provided with a through hole;
and the interconnecting wire is positioned on the dielectric layer and electrically connects a plurality of sections of the sensing electrodes which are separated by the plurality of driving electrodes arranged in parallel together.
33. The display panel according to claim 28, further comprising: a transparent substrate opposite to the transparent base;
one surface of the transparent substrate, facing the transparent substrate, is the front surface of the transparent substrate, and the surface of the transparent substrate, back to the transparent substrate, is the back surface of the transparent substrate;
one surface of the transparent substrate, facing the transparent substrate, is the front surface of the transparent substrate, and the surface of the transparent substrate, back to the transparent substrate, is the back surface of the transparent substrate;
a liquid crystal layer between the transparent substrate and the transparent substrate;
a first linear polarizer located on the back of the transparent substrate;
a second linear polarizer located on the back of the transparent substrate.
34. The display panel according to claim 33, wherein the transparent substrate is a color film substrate having color resistance;
further comprising: the black matrix is positioned on the color film substrate and positioned between the adjacent color resistors; or the black matrix is positioned between the transparent substrate and the capacitive touch structure and positioned between adjacent color resistors in the direction parallel to the transparent substrate; or the black matrix is positioned between the first insulating layer and the capacitive touch structure and positioned between adjacent color resistors in the direction parallel to the transparent substrate; or the black matrix is positioned between the common electrode and the second insulating layer and positioned between the adjacent color resistors in the direction parallel to the transparent substrate; or the black matrix is positioned between the second insulating layer and the TFT switch, the data line and the scanning line and positioned between adjacent color resistors in the direction parallel to the transparent substrate.
35. The display panel according to claim 28, further comprising: a transparent substrate opposite the transparent base;
one surface of the transparent substrate, facing the transparent substrate, is the front surface of the transparent substrate, and the surface of the transparent substrate, back to the transparent substrate, is the back surface of the transparent substrate;
one surface of the transparent substrate, facing the transparent substrate, is the front surface of the transparent substrate, and the surface of the transparent substrate, back to the transparent substrate, is the back surface of the transparent substrate;
a liquid crystal layer between the transparent substrate and the transparent substrate;
a first circular polarizer on the back of the transparent substrate;
a second circular polarizer on the back of the transparent substrate.
36. The display panel according to claim 35, wherein the transparent substrate is a color film substrate having a color resistance and a black matrix; the black matrix is located between adjacent color resists.
37. A liquid crystal display device, comprising:
the display panel according to any one of claims 24 to 27 or 33 to 36;
and the backlight source is positioned on one side of the transparent substrate.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110418836.XA CN103163671B (en) | 2011-12-14 | 2011-12-14 | Display panel, forming method thereof and liquid crystal display device |
| PCT/CN2012/078210 WO2013086854A1 (en) | 2011-12-14 | 2012-07-05 | Display panel and forming method thereof, and liquid crystal display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201110418836.XA CN103163671B (en) | 2011-12-14 | 2011-12-14 | Display panel, forming method thereof and liquid crystal display device |
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| Publication Number | Publication Date |
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| CN103163671A CN103163671A (en) | 2013-06-19 |
| CN103163671B true CN103163671B (en) | 2016-04-20 |
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| CN201110418836.XA Active CN103163671B (en) | 2011-12-14 | 2011-12-14 | Display panel, forming method thereof and liquid crystal display device |
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| CN (1) | CN103163671B (en) |
| WO (1) | WO2013086854A1 (en) |
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| CN103309503B (en) * | 2013-05-17 | 2016-03-02 | 北京京东方光电科技有限公司 | A kind of touch-screen and display device |
| KR102033619B1 (en) | 2013-06-25 | 2019-10-18 | 엘지디스플레이 주식회사 | Display Device |
| CN103454817B (en) * | 2013-08-26 | 2017-08-25 | 京东方科技集团股份有限公司 | Array base palte and preparation method thereof, display device |
| CN103605241A (en) * | 2013-11-21 | 2014-02-26 | 深圳市华星光电技术有限公司 | Liquid crystal display panel |
| CN103926738B (en) * | 2013-12-26 | 2016-08-17 | 上海天马微电子有限公司 | Color filter substrate, embedded touch display panel and manufacturing method thereof |
| CN104330935B (en) * | 2014-10-10 | 2017-11-14 | 上海天马微电子有限公司 | Array substrate, display panel and display device |
| CN104281352B (en) * | 2014-10-13 | 2017-06-06 | 京东方科技集团股份有限公司 | A kind of In-cell touch panel and display device |
| JP6660000B2 (en) * | 2015-11-06 | 2020-03-04 | Jsr株式会社 | Liquid crystal display device and radiation-sensitive resin composition |
| CN106019679A (en) * | 2016-08-12 | 2016-10-12 | 京东方科技集团股份有限公司 | Array substrate, manufacturing method, display panel and display device |
| CN107799533B (en) * | 2016-08-31 | 2020-06-09 | 鸿富锦精密工业（深圳）有限公司 | TFT substrate and display panel using same |
| CN107966862B (en) * | 2017-12-21 | 2020-09-29 | 惠科股份有限公司 | Display, display panel thereof and manufacturing method of display |
| CN109782964B (en) * | 2019-01-24 | 2024-04-16 | 京东方科技集团股份有限公司 | Touch display device and preparation method thereof |
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| JP5051690B2 (en) * | 2007-01-30 | 2012-10-17 | 株式会社ジャパンディスプレイウェスト | Display device with input function |
| CN100472290C (en) * | 2007-08-30 | 2009-03-25 | 深圳和而泰智能控制股份有限公司 | Condenser type contact screen and its manufacture method |
| CN201097040Y (en) * | 2007-09-28 | 2008-08-06 | 比亚迪股份有限公司 | Super-thin touch screen LCD |
| CN101251666A (en) * | 2008-03-27 | 2008-08-27 | 友达光电股份有限公司 | Display apparatus with integration touch panel |
| KR101029287B1 (en) * | 2008-12-03 | 2011-04-18 | 하이디스 테크놀로지 주식회사 | Liquid crystal display having touch screen |
| JP5140018B2 (en) * | 2009-02-24 | 2013-02-06 | 株式会社ジャパンディスプレイイースト | LCD with input function |
| CN201489234U (en) * | 2009-07-28 | 2010-05-26 | 深圳莱宝高科技股份有限公司 | Touch display screen |
| CN201583930U (en) * | 2009-10-23 | 2010-09-15 | 比亚迪股份有限公司 | Integrative module of capacitive touch screen and display |
| TWI420197B (en) * | 2010-01-21 | 2013-12-21 | Tpk Touch Solutions Inc | Embedded touch sensitive display and a method of manufacturing the same |
| WO2011132346A1 (en) * | 2010-04-22 | 2011-10-27 | シャープ株式会社 | Display device |
| CN101852934A (en) * | 2010-05-31 | 2010-10-06 | 北京富纳特创新科技有限公司 | Touch liquid crystal display |
| US9348469B2 (en) * | 2010-12-28 | 2016-05-24 | Stmicroelectronics Asia Pacific Pte Ltd | Patterned conductive layers for sensor assembly and method of making the same |
| KR20120109191A (en) * | 2011-03-28 | 2012-10-08 | 하이디스 테크놀로지 주식회사 | Liquid crystal display apparatus with in touch sensor and maufacturing method thereof |
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| CN103163671A (en) | 2013-06-19 |
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