CN103111441B - Device and method for cleaning partial pollutant on surfaces of clean materials - Google Patents
Device and method for cleaning partial pollutant on surfaces of clean materials Download PDFInfo
- Publication number
- CN103111441B CN103111441B CN201310049043.4A CN201310049043A CN103111441B CN 103111441 B CN103111441 B CN 103111441B CN 201310049043 A CN201310049043 A CN 201310049043A CN 103111441 B CN103111441 B CN 103111441B
- Authority
- CN
- China
- Prior art keywords
- laser
- pollutant
- gas
- purity material
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Abstract
The invention discloses a device for cleaning partial pollutant on surfaces of clean materials and a method for cleaning the partial pollutant on the surfaces of the clean materials. The device comprises a vacuum cavity (5), clean materials (9) which are placed inside the vacuum cavity (5), a moving platform (4) which is at a certain distance of the clean materials (9), an optical fiber probe (1), an optical microprobe (2), a gas blowing head (3), a vacuum machine unit (6), and a laser light source (7). One face, opposite to the clean materials (9), of the moving platform (4) is provided with the optical fiber probe (1) which is used for transmitting lasers, the optical microprobe (2) which is used for observing the surfaces of the materials, and the gas blowing head (3). The vacuum machine unit (6) and the laser light source (7) are placed outside the vacuum cavity (5), the vacuum machine unit (6) is used for vacuumizing the vacuum cavity (5), and the laser light source (7) is transmitted to the optical fiber probe (1) through optical fibers. The device and method can be used for quickly finding and cleaning the partial pollutant on the surfaces of the clean materials, and simple in system structure and easy to operate.
Description
Technical field
The present invention relates to a kind of material surface adsorbate high to purity requirements, apparatus and method that pollutant is cleared up, be specially adapted to the cleaning of particulate pollutant of optical element, vacuum cavity local surfaces deposition, belong to optics, technical field of vacuum.
Background technology
In the exposure system of high power strong laser and application system, semiconductor technology; for the transmission of light and the optical element of convergence; generally be placed on vacuum system or fill in the vacuum system of protective gas; after working long hours; optical element surface, system inner surface can adsorb or the pollutant of deposited particles shape; these pollutants make the cleanliness factor of material surface be damaged, and will affect transmitance and the beam quality of optical element, produce harmful effect to optical element.
Therefore, after the particulate pollutant existed when purity material surface acquires a certain degree, it is very important for carrying out cleaning to pollutant.Therefore how to find pollutant and quick it removed extraordinary application prospect from system.
The mode such as systemic contamination thing removing of the pollutant cleaning utilized under action of plasma, mode of washing is had in prior art, need element is removed from system or likely damages optical element surface, process operation difficulty is large, is not suitable for on-the-spot cleaning demand fast.
Summary of the invention
Technical problem: the object of this invention is to provide a kind of optical microphotograph probe that adopts and find purity material surface contaminant, adopt Optical Fiber Transmission laser, and pollutant is discharged from purity material surface excitation under laser action, adopt gas purging mode, jointly pollutant and purge gas is extracted out vacuum cavity by vacuum system, adopt the purge gas such as hydrogen simultaneously, can make to be deposited on the optical surface carbon pollutant large to performance impact and change the gas componants such as methane into and exclude system.The method and device possess the feature of carrying out the removing of material surface pollutant fast, and system architecture is simple to operation.
Technical scheme: for solving the problems of the technologies described above, the invention discloses a kind of device cleared up purity material surface local pollution thing, this device comprises
Vacuum cavity, be positioned over the purity material in vacuum cavity, with purity material mobile platform in a distance;
The one side that mobile platform is relative with purity material is provided with the fibre-optical probe for transmitting laser, optical microphotograph probe, the gas purging head for material surface observation;
Be placed on vacuum pump set and the LASER Light Source of vacuum cavity outside, wherein, vacuum pump set be used for vacuum cavity is vacuumized, LASER Light Source by Optical Fiber Transmission to fibre-optical probe;
The to be cleaned pollutant of mobile platform for being attached on purity material with discovery at purity material surface moving fiber probe, optical microphotograph probe, gas purging head, and make fibre-optical probe aim at pollutant, start LASER Light Source and make laser to fibre-optical probe by Optical Fiber Transmission pollutant be volatilized under laser action, evaporate; Pass into purge gas in sweeping head, laser action region is purged, make evaporation, the pollutant of volatilization blows off Polluted area, and extracted out vacuum cavity by vacuum pump set under airflow function.
Preferably, the purge gas inorganic gas of sweeping head blowout, organic volatile gas or their mixture.
Preferably, inorganic gas comprises inert gas, hydrogen, nitrogen; Organic volatile gas is or alcohol, acetone.
Preferably, when purge gas is the flammable explosive gas such as hydrogen, alcohol, be provided with explosion-protection equipment at the exhaust outlet of vacuum pump set.
Preferably, LASER Light Source, comprise any one in gas laser, solid state laser, semiconductor laser, dye laser, when acting on purity material surface after the laser that it sends is by optical fiber, deposition pollutant is on these surfaces discharged from surface.
Preferably, the laser that LASER Light Source sends is by acting on purity material surface after optical fiber time, deposition pollutant is on these surfaces discharged from surface, and ionizes, reacting to produce with purge gas forms new gas componant and is extracted out vacuum cavity by vacuum pump set.
Present invention also offers a kind of device that purity material surface local pollution thing is cleared up, installation fibre-optical probe on a mobile platform, optical microphotograph probe, gas purging head are placed on the inner purity material near surface for clearance of vacuum cavity, are evacuated to operating pressure with vacuum pump set to vacuum cavity; Adopt mobile platform at purity material surface moving fiber probe, optical microphotograph probe, gas purging head, and find the local pollution thing on purity material surface with optics microprobe after, fibre-optical probe is aimed at the pollutant that will remove, while starting LASER Light Source, purge gas is blown out in sweeping head, the laser sent during LASER Light Source work is by the material surface of Optical Fiber Transmission to the cleaning of needs local, pollutant is evaporated, volatilize, ionize, and purity material surface of being blown off under the effect of purge gas, and extracted out vacuum cavity by vacuum pump set.
Beneficial effect: compared with prior art, tool of the present invention has the following advantages: possess carry out purity material surface local pollution thing fast discovery, removing, system architecture is simple to operation.
Accompanying drawing explanation
Fig. 1 is the device schematic diagram cleared up purity material surface local pollution thing.
Wherein have: fibre-optical probe 1, optical microphotograph probe 2, gas purging head 3, mobile platform 4, vacuum cavity 5, vacuum pump set 6, LASER Light Source 7, optical fiber 8, purity material 9, pollutant 10, purge gas 11.
Detailed description of the invention
Below in conjunction with accompanying drawing, the present invention will be further described.
See Fig. 1, the device that purity material surface local pollution thing is cleared up provided by the invention, this device comprises:
Vacuum cavity 5, be positioned over the purity material 9 in vacuum cavity 5, with purity material 9 mobile platform 4 in a distance;
The optical microphotograph that the one side that mobile platform 4 is relative with purity material 9 is provided with fibre-optical probe 1 for transmitting laser, observe for material surface pops one's head in 2, gas purging head 3;
Be placed on vacuum pump set 6 and the LASER Light Source 7 of vacuum cavity 5 outside, wherein, vacuum pump set 6 is for vacuumizing vacuum cavity 5, and LASER Light Source 7 is transferred to fibre-optical probe 1 by optical fiber 8;
The to be cleaned pollutant 10 of mobile platform 4 for being attached on purity material 9 with discovery at purity material 9 surperficial moving fiber probe 1, optical microphotograph probe 2, gas purging head 3, and make fibre-optical probe 1 aim at pollutant 10, start LASER Light Source 7 and make laser be transferred to fibre-optical probe 1 by optical fiber 8 pollutant 10 to be volatilized under laser action, evaporates; Pass into purge gas 11 in sweeping head 3, laser action region is purged, make evaporation, the pollutant of volatilization blows off Polluted area, and extracted out vacuum cavity by vacuum pump set under airflow function.
Purge gas 11 inorganic gas that sweeping head 3 blows out, organic volatile gas or their mixture.
Inorganic gas comprises inert gas, hydrogen, nitrogen; Organic volatile gas is or alcohol, acetone.
When purge gas 11 is the flammable explosive gas such as hydrogen, alcohol, be provided with explosion-protection equipment at the exhaust outlet of vacuum pump set 6.
LASER Light Source 7, comprise any one in gas laser, solid state laser, semiconductor laser, dye laser, when acting on purity material surface after the laser that it sends is by optical fiber, deposition pollutant 10 is on these surfaces discharged from surface.
The laser that LASER Light Source 7 sends is by acting on purity material surface after optical fiber time, deposition pollutant 10 is on these surfaces discharged from surface, and ionize, reacting to produce with purge gas 11 forms new gas componant and is extracted out vacuum cavity 5 by vacuum pump set 6.
Pass into purge gas 11 in sweeping head 3, laser action region is purged, make evaporation, the pollutant of volatilization blows off Polluted area, and extracted out vacuum cavity by vacuum pump set under airflow function.
In order to protect optical element; and avoid the chemical reaction be harmful to occur; the gas 11 that gas purging head purges; the inorganic gas such as inert gas, hydrogen, nitrogen or organic volatile gas such as alcohol, acetone or their mixture; particularly adopt hydrogen; affect serious carbon pollutant to optical element surface, biochemical reaction will be issued in high light effect, generate the gas componants such as methane and also extracted out vacuum cavity by vacuum pump set.The material such as alcohol, acetone does not produce pollution to system, easily removes from vacuum system, is also conventional cleaning solvent simultaneously, therefore also can be used as purge gas.
But owing to can produce blast when hydrogen and the organic gas such as alcohol, acetone reach finite concentration in atmosphere, the content of therefore tackling corresponding composition at vacuum pump set exhaust outlet controls, and carries out technological processing for explosion protection feature simultaneously.
Adopt inert gas to be because inert gas does not produce chemical reaction to internal system material and brings new pollution, under laser action, likely form weakly ionized effects on surface simultaneously and clear up.
Present invention also offers a kind of device that purity material surface local pollution thing is cleared up, be arranged on the fibre-optical probe 1 on mobile platform 4, optical microphotograph probe 2, gas purging head 3 is placed on the inner purity material near surface for clearance of vacuum cavity 5, is evacuated to operating pressure with vacuum pump set 6 pairs of vacuum cavities 5, adopt mobile platform 4 at purity material surface moving fiber probe 1, optical microphotograph probe 2, gas purging head 3, and find the local pollution thing on purity material surface with optics microprobe 2 after, fibre-optical probe 1 is aimed at the pollutant 10 that will remove, while starting LASER Light Source 7, purge gas 11 is blown out in sweeping head 3, the laser that LASER Light Source 7 sends when working is by the material surface of Optical Fiber Transmission to the cleaning of needs local, pollutant 10 is evaporated, volatilization, ionization, and purity material 9 surface of being blown off under the effect of purge gas 11, and extracted out vacuum cavity 5 by vacuum pump set.
The foregoing is only better embodiment of the present invention; protection scope of the present invention is not limited with above-mentioned embodiment; in every case those of ordinary skill in the art modify or change according to the equivalence that disclosed content is done, and all should include in the protection domain recorded in claims.
Claims (2)
1., to the device that purity material surface local pollution thing is cleared up, it is characterized in that: this device comprises
Vacuum cavity (5), be positioned over the purity material (9) in vacuum cavity (5), with purity material (9) mobile platform in a distance (4);
The optical microphotograph that the one side that mobile platform (4) is relative with purity material (9) is provided with fibre-optical probe (1) for transmitting laser, observe for material surface is popped one's head in (2), gas purging head (3);
Be placed on the outside vacuum pump set (6) of vacuum cavity (5) and LASER Light Source (7), wherein, vacuum pump set (6) is for vacuumizing vacuum cavity (5), and the laser that LASER Light Source (7) sends is transferred to fibre-optical probe (1) by optical fiber (8);
Mobile platform (4) at purity material (9) surperficial moving fiber probe (1), optical microphotograph probe (2), gas purging head (3) to be to find the pollutant to be cleaned (10) be attached on purity material (9), and make fibre-optical probe (1) aim at pollutant (10), start LASER Light Source (7) and make laser be transferred to fibre-optical probe (1) by optical fiber (8) pollutant (10) to be volatilized under laser action, evaporates; Pass into purge gas (11) in sweeping head (3), laser action region is purged, make evaporation, the pollutant of volatilization blows off Polluted area, and extracted out vacuum cavity by vacuum pump set under airflow function;
The purge gas (11) that sweeping head (3) blows out is inorganic gas, organic volatile gas or their mixture;
When purge gas (11) is hydrogen, be provided with explosion-protection equipment at the exhaust outlet of vacuum pump set (6);
LASER Light Source (7), comprise any one in gas laser, solid state laser, semiconductor laser, dye laser, when acting on purity material surface after the laser that it sends is by optical fiber, deposition pollutant on these surfaces (10) is discharged from surface.
2. the device that purity material surface local pollution thing is cleared up according to claim 1, it is characterized in that: the laser that LASER Light Source (7) sends is by acting on purity material surface after optical fiber time, deposition pollutant on these surfaces (10) is discharged from surface, and ionize, reacting to produce with purge gas (11) forms new gas componant and is extracted out vacuum cavity (5) by vacuum pump set (6).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310049043.4A CN103111441B (en) | 2013-02-07 | 2013-02-07 | Device and method for cleaning partial pollutant on surfaces of clean materials |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310049043.4A CN103111441B (en) | 2013-02-07 | 2013-02-07 | Device and method for cleaning partial pollutant on surfaces of clean materials |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103111441A CN103111441A (en) | 2013-05-22 |
CN103111441B true CN103111441B (en) | 2015-01-28 |
Family
ID=48409854
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201310049043.4A Expired - Fee Related CN103111441B (en) | 2013-02-07 | 2013-02-07 | Device and method for cleaning partial pollutant on surfaces of clean materials |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN103111441B (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104375237B (en) * | 2014-10-31 | 2017-06-16 | 中国建筑材料科学研究总院 | The method and its device of a kind of secondary multifilament surface cleaning of optical fiber |
CN105689331A (en) * | 2016-04-15 | 2016-06-22 | 南京国轩电池有限公司 | Cleaning method for residual liquid around injection holes of lithium batteries |
CN106984596B (en) * | 2017-04-25 | 2023-06-06 | 重庆金樾光电科技有限公司 | Laser cleaning machine and control method thereof |
CN108080791A (en) * | 2017-12-13 | 2018-05-29 | 安徽宝泰特种材料有限公司 | A kind of novel environment-friendly laser burns the processing method that the method for washing goes rare precious metal oxide skin |
CN109261647A (en) * | 2018-08-31 | 2019-01-25 | 融铨半导体(苏州)有限公司 | A kind of laser cleaning method of carborundum graphite load plate |
CN109647801B (en) * | 2019-01-08 | 2021-08-24 | 常州英诺激光科技有限公司 | Cleaning device for cleaning fabric by laser and working method thereof |
CN109994295A (en) * | 2019-04-18 | 2019-07-09 | 深圳市杰普特光电股份有限公司 | The resistance trimming method and system of resistor body |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1430243A (en) * | 2002-01-03 | 2003-07-16 | 联华电子股份有限公司 | Cleaning device of on-line laser wafer bearing |
CN101219430A (en) * | 2008-01-25 | 2008-07-16 | 清华大学 | Watt level full solid state ultraviolet laser cleaning machine and laser cleaning method |
CN102218415A (en) * | 2011-03-10 | 2011-10-19 | 大连理工大学 | Method and device for cleaning tokamak first mirror by vacuum ultraviolet laser |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10216664A (en) * | 1997-02-10 | 1998-08-18 | Nikon Corp | Laser cleaning device |
US20010050091A1 (en) * | 1998-03-19 | 2001-12-13 | Seagate Technology Llc | Method apparatus of disc burnishing with a glide/burnish head |
JP2005040736A (en) * | 2003-07-24 | 2005-02-17 | Canon Inc | Washing method and apparatus of optical parts |
US20050279453A1 (en) * | 2004-06-17 | 2005-12-22 | Uvtech Systems, Inc. | System and methods for surface cleaning |
-
2013
- 2013-02-07 CN CN201310049043.4A patent/CN103111441B/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1430243A (en) * | 2002-01-03 | 2003-07-16 | 联华电子股份有限公司 | Cleaning device of on-line laser wafer bearing |
CN101219430A (en) * | 2008-01-25 | 2008-07-16 | 清华大学 | Watt level full solid state ultraviolet laser cleaning machine and laser cleaning method |
CN102218415A (en) * | 2011-03-10 | 2011-10-19 | 大连理工大学 | Method and device for cleaning tokamak first mirror by vacuum ultraviolet laser |
Also Published As
Publication number | Publication date |
---|---|
CN103111441A (en) | 2013-05-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN103111441B (en) | Device and method for cleaning partial pollutant on surfaces of clean materials | |
CN103100539B (en) | Device and method for decontaminating surface of optical element | |
EP1297891A1 (en) | Object processing apparatus and plasma facility comprising the same | |
WO2004062824A1 (en) | Method and apparatus for cleaning an analytical instrument while operating the analytical instrument | |
JP6832858B2 (en) | Non-thermal soft plasma cleaning | |
JP2003171757A (en) | Dry type surface cleaning apparatus using laser | |
JP2015029072A (en) | Electron beam-induced etching | |
CN1983515A (en) | Substrate processing apparatus and lid supporting apparatus for the substrate processing apparatus | |
Cheng et al. | Surface contaminant control technologies to improve laser damage resistance of optics | |
CN108176640A (en) | A kind of drying means for improving laser gyro cavity cleaning degree | |
CN1330727A (en) | Method for thermal coating of surface of interior space and device for carrying out said method | |
Wei et al. | ESEM study of size removal from ceramic fibers by plasma treatment | |
Pruette et al. | Evaluation of trifluoroacetic anhydride as an alternative plasma enhanced chemical vapor deposition chamber clean chemistry | |
KR100500430B1 (en) | Atmospheric pressure plasma processing apparatus and its process by gas suction method | |
JP2010093245A5 (en) | Exposure apparatus, maintenance method, and device manufacturing method | |
KR100937697B1 (en) | Waste Gas Processing | |
JP2020507461A (en) | Cleaning method | |
WO2012114611A1 (en) | Cleaning gas and remote plasma cleaning method using same | |
JP2004050116A (en) | Washing apparatus and method | |
JP4651405B2 (en) | Surface treatment method | |
JP2006013232A (en) | Method of reproducing laser chamber of ultraviolet gas laser device | |
KR101691608B1 (en) | Apparatus for collecting pollutant of chamber and chamber comprising the same | |
JPH08335449A (en) | Pretreatment method for sample for scanning electron microscope and its device | |
Mikheev et al. | Analyzing the contents of residual and plasma-supporting gases inside a vacuum deposition unit chamber | |
CN212770929U (en) | Ion sputtering instrument |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150128 Termination date: 20220207 |