CN102854597A - High-precision supporting structure of optical element in photo-etching objective lens - Google Patents

High-precision supporting structure of optical element in photo-etching objective lens Download PDF

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Publication number
CN102854597A
CN102854597A CN 201210312922 CN201210312922A CN102854597A CN 102854597 A CN102854597 A CN 102854597A CN 201210312922 CN201210312922 CN 201210312922 CN 201210312922 A CN201210312922 A CN 201210312922A CN 102854597 A CN102854597 A CN 102854597A
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Prior art keywords
optical element
tan
sheet
precision
elastic sheets
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CN 201210312922
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Chinese (zh)
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赵磊
巩岩
于新峰
彭海峰
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中国科学院长春光学精密机械与物理研究所
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Abstract

The invention discloses a high-precision supporting structure of an optical element in a photo-etching objective lens, belonging to the field of structure design and aberration compensation of a deep ultraviolet projection lithography objective lens. In order to solve a high-precision supporting problem of the optical element in the photo-etching objective lens, the high-precision supporting structure comprises a lens frame and integrated elastic sheets, wherein the integrated elastic sheets are fixed with the lens frame through multiple screws; the three radial flexible elastic sheets are uniformly distributed in a circumferential direction on an inner ring of the lens frame and form an integrated structure together with the lens frame; the integrated elastic sheets are provided with multiple integrated elastic sheet supporting pieces; the three radial flexible elastic sheets and the multiple elastic sheet supporting pieces are uniformly distributed in the circumferential direction on the lens frame; and supporting parts of the three radial flexible elastic sheets are matched with a lower surface of the optical element in shape. When the optical element is expanded due to a heat load and the like, the lens frame can be adaptively stretched in the presence of the radial flexible elastic sheets, and the supporting parts of the three radial flexible elastic sheets are matched with a contact part of the lower surface of the optical element in shape, so that the optical elements in the photo-etching objective lens can be supported with high precision.

Description

光刻物镜中光学元件高精度支撑结构 Lithography objective optical element with high accuracy supporting structure

技术领域 FIELD

[0001] 本发明属于深紫外投影光刻物镜结构设计与像差补偿领域,具体涉及光刻物镜中光学元件高精度支撑结构。 [0001] The present invention belongs to purple art design and the aberration compensation lens outer projection lithography, particularly relates to a support structure with high accuracy in a lithography objective optical element.

背景技术 Background technique

[0002] 投影光刻装备是大規模集成电路制造エ艺中的关键设备,近年来随着集成电路线宽精细程度的不断提高,投影光学装备的分辨率亦逐渐提高,目前波长193. 368nm的ArF准分子激光器投影光刻装备已成为90nm、65nm和45nm节点集成电路制造的主流装备。 [0002] projection lithography equipment, large-scale integrated circuit manufacturing Ester Arts and the key equipment in recent years, with the continuous improvement of the integrated circuit line width of the fine degree of resolution of the projection optical equipment also gradually raise the current 193. 368nm wavelength of ArF excimer laser projection lithography equipment has become the 90nm, 65nm and 45nm nodes mainstream integrated circuit manufacturing equipment. [0003] 投影光刻物镜装调及使用过程中,为满足良好的光学系统性能,要求其内部光学元件面形RMS值大都在f 2nm范围内,同时要求其工作过程中受高能激光照射时引起的光学元件热面形RMS控制在I〜2nm范围内。 [0003] The lithography projection objective assembly and adjustment and use of the process, when satisfied cause good optical performance, the optical element surface requires that its internal shape RMS value f 2nm mostly within the range, while its required work process by high energy laser irradiation the RMS surface shape of the optical element thermally controlled within the range I~2nm.

发明内容 SUMMARY

[0004] 本发明为解决光刻物镜中光学元件高精度支撑问题,提出一种三点径向挠性主支撑、多点弹片辅助支撑的光刻物镜中光学元件高精度支撑结构。 [0004] The present invention solves the support problem of high precision optical elements in a lithography objective, proposed a three radial flexible main support, the support structure of the optical element with high precision lithography objective multipoint auxiliary support of shrapnel.

[0005] 光刻物镜中光学元件高精度支撑结构,包括镜框和整体弾片,所述整体弾片与镜框之间通过若干螺钉固定。 [0005] In the lithography objective optical element with high accuracy supporting structure, comprising a frame and integral Tan sheet, between the sheet and the frame integrally secured by Dan plurality of screws.

[0006] 所述镜框内环周向均匀分布三处径向挠性弾片,所述三处径向挠性弾片和镜框为一体式结构。 [0006] The inner circumferential distribution frame three radial flexible sheet uniformly Tan, Tan said flexible sheet at three radial frame and an integrated structure.

[0007] 所述整体弾片具有若干整体弾片支撑片,所述三处径向挠性弾片与若干整体弾片支撑片沿周向均匀分布。 The [0007] substrate having a plurality of integral whole Tan Tan sheet support sheet, at the three radial flexible sheet and a plurality of integrally Tan Tan sheet supporting plate circumferentially uniformly distributed.

[0008] 所述三处径向挠性弾片支撑处的形状与光学元件下表面相适应。 [0008] The shape of the optical element Tan flexible sheet is supported at the three radial surface adapted.

[0009] 本发明的有益效果是:所述镜框通过其内环上的周向均布的三处径向挠性弾片支撑光学元件,当光学元件由于热载荷等膨胀时,镜框由于径向挠性弾片的存在能够适应性地伸縮,所述三处径向挠性弾片支撑处的形状与光学元件下表面接触处形状相吻合,当光学元件接触面为平面吋,弾片接触面也为平面,当光学元件接触面为球面和非球面吋,弾片接触面也相应地为球面和非球面,两者之间为面接触,从而实现光刻物镜中光学元件高精度支撑。 [0009] Advantageous effects of the present invention is that: the frame by the inner periphery of the optical element to a supporting three radially equispaced flexible sheet Tan, when the optical element due to thermal expansion and other loads, due to the radial flexibility of the frame Tan present sheet can be adaptively stretching, the contact shape of the optical element at the lower radial support flexible sheet at the Tan three coincide the surface shape, when the optical element is a flat contact surface inches, Dan sheet contact surface is also plane, when the optical element is a spherical contact surface and aspherical inch, Dan sheet contact surface is also correspondingly spherical and aspherical, surface contact therebetween, thereby achieving high-precision lithography objective optical element is supported.

附图说明 BRIEF DESCRIPTION

[0010]图I为本发明光刻物镜中光学元件高精度支撑结构俯视图。 [0010] FIG I precision optical element support structure in a plan view of the lithography objective of the present invention.

[0011]图2为本发明光刻物镜中光学元件高精度支撑结构仰视图。 [0011] FIG. 2 High-supporting structure of the lithography objective optical element of the present invention in a bottom view.

[0012] 图3为本发明所述的镜框和整体弾片安装示意图。 [0012] FIG. 3 is an overall frame and the chip mounting Tan FIG.

[0013] 图4为本发明所述的镜框结构示意图。 [0013] FIG. 4 is a schematic frame structure according to the present invention.

[0014] 图5为本发明所述的整体弾片结构示意图。 [0014] FIG. 5 is a schematic overall structure of the sheet Tan present invention. 具体实施方式 detailed description

[0015] 下面结合附图对本发明进行详细说明。 DRAWINGS The invention is described in detail [0015] below in conjunction.

[0016] 如图I至图5所示,光刻物镜中光学元件高精度支撑结构,包括镜框2和整体弾片3。 [0016] FIG. 5 to FIG I, the lithography objective optical element with high accuracy supporting structure, comprising a frame 2 and a plate 3 integrally Dan. 光学元件I与镜框2之间通过胶粘的方式连接。 I and the optical element connected to the frame by way of adhesive between the two. 整体弾片3与镜框2之间通过多个螺钉4固定。 4 by a plurality of fixing screws between 2 and 3 whole frame plate Dan.

[0017] 镜框2通过其内环上的周向均布的三处径向挠性弾片2-1支撑光学元件I。 [0017] The optical element support frame 22-1 to three equispaced radial flexibility by Dan sheet on the inner periphery thereof I. 三处径向挠性弾片2-1与若干整体弾片支撑片3-1沿周向均匀分布。 Three radial flexible sheets 2-1 and Tan Tan plurality of sheet support plate integrally 3-1 evenly distributed circumferentially. 三处径向挠性弾片2-1和镜框2为一体式结构,可通过慢走丝线切割的方式进行加工。 Tan three radial flexible sheets 2-1 and frame structure 2 as a whole, can be processed by way of walking thread cutting. 当光学元件I由于热载荷等膨胀吋,由于镜框结构整体上在径向上存在一定的挠性,因此当光学元件2膨胀收缩时能够适应性地伸縮。 When the optical element due to the expansion I inch thermal loads, etc., on the frame of the overall configuration because there is a certain flexibility in a radial direction, so when expansion and contraction of the optical element 2 can be adaptively scaling. 三处径向挠性弾片2-1支撑处的形状依据光学元件I下表面接触处形状而定。 2-1 at the support form three radial flexible sheet Tan I may be based on the optical element of the surface shape of the contact. 当光学元件接触面为平面时,弾片接触面也为平面;当光学元件接触面为球面吋,弹片接触面也相应地为球面;当光学元件接触面为非球面时,弾片接触面也相应地为非球面,两者之间为面接触。 When the optical element is a flat contact surface, Dan sheet contact surface is also flat; when the optical element is a spherical contact surface inch, correspondingly the contact surface shrapnel is spherical; contact surface when the aspherical optical element, the contact surface sheet also Tan accordingly aspheric surface contact therebetween. [0018] 装调时,首先将光学元件I放置在镜框2上之后,然后对光学元件I进行调心,最后将光学元件I和镜框2胶粘固定。 After [0018] When the adjustment means, first optical element disposed on the frame I 2, then I for aligning optical element, the optical element I, and finally adhered and fixed frame 2.

Claims (4)

  1. 1.光刻物镜中光学元件高精度支撑结构,包括镜框(2)和整体弾片(3),其特征在干,所述整体弾片(3)与镜框(2)之间通过若干螺钉(4)固定。 Lithography objective 1. The optical element with high accuracy supporting structure, comprising a frame (2) and the sheet integrally Tan (3), characterized in that the dry, between the plurality of screws through integral Tan sheet (3) and the frame (2) ( 4) fixed.
  2. 2.根据权利要求I所述的光刻物镜中光学元件高精度支撑结构,其特征在于,所述镜框(2)内环周向均匀分布三处径向挠性弾片(2-1),所述三处径向挠性弾片(2-1)和镜框(2)为一体式结构。 The support structure as claimed in claim precision optical element in a lithography objective according to I, characterized in that the frame (2) are evenly distributed on the inner circumferential radial flexibility Tan three sheets (2-1), the three radial flexible Tan sheet (2-1) and the frame (2) is a unitary structure.
  3. 3.根据权利要求2所述的光刻物镜中光学元件高精度支撑结构,其特征在于,所述整体弾片(3)具有若干整体弾片支撑片(3-1),所述三处径向挠性弾片(2-1)与若干整体弾片支撑片(3-1)沿周向均匀分布。 The precision of the lithography objective optical element support structure according to claim 2, wherein the integral Tan sheet (3) having a plurality of sheet support plate integrally Tan (3-1), the three-path Tan integrally with a number of sheet support plate (3-1) are evenly distributed to the Dan flexible sheet (2-1) in the circumferential direction.
  4. 4.根据权利要求2所述的光刻物镜中光学元件高精度支撑结构,其特征在于,所述三处径向挠性弾片(2-1)支撑处的形状与光学元件(I)下表面相适应。 4. The precision of the lithography objective optical element support structure according to claim 2, wherein, in said sheet at three radial flexible Tan (2-1) the shape of the optical element (I) is supported at the surface to adapt.
CN 201210312922 2012-08-29 2012-08-29 High-precision supporting structure of optical element in photo-etching objective lens CN102854597A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104216089A (en) * 2014-08-26 2014-12-17 中国科学院长春光学精密机械与物理研究所 Supporting device with self-weight compensation function for lens in photoetching projection objective
CN105572043A (en) * 2015-12-21 2016-05-11 中国科学院长春光学精密机械与物理研究所 Flexible supporting device for testing optical uniformity

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4733945A (en) * 1986-01-15 1988-03-29 The Perkin-Elmer Corporation Precision lens mounting
CN102540386A (en) * 2012-02-07 2012-07-04 中国科学院光电技术研究所 Elastic supporting device for moving mirror

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4733945A (en) * 1986-01-15 1988-03-29 The Perkin-Elmer Corporation Precision lens mounting
CN102540386A (en) * 2012-02-07 2012-07-04 中国科学院光电技术研究所 Elastic supporting device for moving mirror

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104216089A (en) * 2014-08-26 2014-12-17 中国科学院长春光学精密机械与物理研究所 Supporting device with self-weight compensation function for lens in photoetching projection objective
CN105572043A (en) * 2015-12-21 2016-05-11 中国科学院长春光学精密机械与物理研究所 Flexible supporting device for testing optical uniformity

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