CN102540736B - Uniformity compensation device applied to large field-of-view montage illumination - Google Patents

Uniformity compensation device applied to large field-of-view montage illumination Download PDF

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CN102540736B
CN102540736B CN 201010582214 CN201010582214A CN102540736B CN 102540736 B CN102540736 B CN 102540736B CN 201010582214 CN201010582214 CN 201010582214 CN 201010582214 A CN201010582214 A CN 201010582214A CN 102540736 B CN102540736 B CN 102540736B
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compensation
illumination
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CN102540736A (en )
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张祥翔
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上海微电子装备有限公司
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Abstract

本发明提供一种用于大视场拼接照明的均匀性补偿装置,沿光线传播的方向,依次包括:光源、出光口至少为两路的分光结构及与所述光纤出光口数目一致的中继透镜,其特征在于:所述均匀性补偿装置还包括匀光光学元件及反馈控制器;所述光源发出的光线经匀光光学元件、分光结构及中继透镜后,在基板上获得均匀照明视场;所述反馈控制器根据基板均匀性信号调节汞灯的位置和/或角度。 The present invention provides a compensation device having a large uniform field illumination for splicing, along the direction of light propagation, in turn comprising: a light source, an optical interface of at least two of the spectral structure of the optical fiber and the light port number of the same relay lens, wherein: said compensating means further comprises a uniformity uniform illumination optical element and a feedback controller; light emitted from said light source after homogenization optical element, and the spectral structure of the relay lens, uniform illumination is obtained depending on the substrate field; the feedback controller according to the uniformity of the signal conditioning board mercury lamp position and / or angle.

Description

用于大视场拼接照明的均匀性补偿装置 Means for compensating the uniformity of a large illumination field splicing

技术领域 FIELD

[0001] 本发明涉及大规模集成电路制造技术领域,尤其一种用于大视场拼接照明的均匀性补偿装置。 [0001] The present invention relates to a large scale integrated circuit manufacturing technology, in particular, a homogeneous wide-field compensating apparatus for splicing illumination.

背景技术 Background technique

[0002] TFT是Thin Film Transistor (薄膜场效应晶体管)的简称,是一种采用新材料和新工艺的大规模半导体全集成电路制造技术。 [0002] TFT is a Thin Film Transistor (thin film transistor) for short, is a semiconductor large-scale use of new materials and processes of the whole integrated circuit fabrication techniques. TFT是在玻璃或塑料基板等非单晶片上(当然也可以在晶片上)通过溅射、化学沉积工艺形成制造电路必需的各种膜,通过对膜的加工制作大规模半导体集成电路(LSIC)。 TFT is a non-single crystal on a glass or plastic substrate and the like (of course, also be performed on the wafer) manufacturing a circuit necessary for various films formed by sputtering, chemical deposition process, the film is produced by processing of large scale semiconductor integrated circuit (the LSIC) . 随着相关电子消费类产品的发展,对TFT的尺寸要求越来越大,集成的单元越来越多,单一的照明系统很难满足TFT光刻的需求。 With the development of electronic consumer products, the TFT size requirements increasing, more and more integrated unit, a single lighting system is difficult to meet the lithography requirements TFT. 通常使用在集成电路制造、封装等步进光刻设备的最大的照明视场一般为8英寸,扫描光刻也只是在扫描方向有更大的视场,一般也不超过10英寸。 Commonly used in the illumination field largest integrated circuit manufacturing, packaging, etc. stepper apparatus typically 8 inches, there are only scanning lithography larger field of view in the scanning direction, generally not more than 10 inches. 但是现在五代以上的TFT曝光视场都在17 英寸以上,所以单一镜头的照明视场远远不能满足大视场光刻的要求。 But now more than five generation TFT exposure field of view are more than 17 inches, so the illumination field single lens can not meet the requirements of large field of lithography.

[0003] 采用多个照明系统拼接扫描是实现大视场TFT光刻的解决方案之一。 [0003] The illumination system uses a plurality of scan stitching lithography is one of the solutions to achieve a large field of view TFT. 在TFT光刻的现有技术中,美国专利US6480262采用7个镜头拼接的方式实现了大视场曝光,该拼接方法的难点之一在于如何将汞灯光源出射的光平均有效的分到各个单元照明视场。 In the prior art TFT in lithography, U.S. Patent US6480262 with 7 lenses mosaic manner large field exposure, the stitching method is one of the difficulties is how to mercury light source light emitted assigned to the respective units of the average effective lighting field of view. 为了解决该问题,该专利中提供了两种技术方案。 To solve this problem, the patent offers two technical solutions. 第一种技术方案如附图la和附图lb所示,采用了光纤分光方式实现多拼接镜头的均匀性要求,一个灯室对多个照明或多个灯室对应多个照明。 As a first aspect of figures la and lb shown in the drawings, uses a fiber optic splitter embodiment achieve homogeneity in claim splicing multiple lens, a lamp chamber of a plurality of lighting lamps or a plurality of chambers corresponding to the plurality of illumination. 第一种技术方案如附图2a和附图2b所示,采用分光镜分光的方式。 As a first aspect of figures 2a and 2b shown in the drawings, using the spectral dichroic mirror manner. 上述两种技术方案虽然都能一定程度上解决多拼接镜头的均匀照明问题,但是它们的共同缺点是每一路照明系统中没有照明均匀性调节机构。 Although the above-described two technical solutions to solve the problem of uniform illumination lens plurality splicing can to a certain extent, but their common disadvantage is that each path of the illumination system is no uniformity of illumination adjustment mechanism.

[0004] 美国专利US5579147可以调节每一路之间的均匀性,如图3所示。 [0004] U.S. Patent No. US5579147 uniformity can be adjusted between each channel, as shown in FIG. 这种调节的前提是每一路本身的均匀性已经达到要求。 This adjustment is provided in each channel uniformity itself has to meet the requirements. 即便是分光之后有石英棒和微透镜阵列进行匀光, 根据实际装调经验,也不能保证所有的单元照明视场均匀性同时达到要求。 Even if there is the quartz rod and the microlens array dodging, based on actual experience of assembly and adjustment, we can not guarantee that all units of the illumination field after uniformity while achieving spectral requirements. 因此,提供一种可以实现每一路单独的均匀性调节机构是大视场拼接照明均匀性补偿技术中迫切需要解决的技术问题。 Accordingly, a single channel can be realized in each of the adjustment mechanism is a uniform large field splicing illumination uniformity compensation technique urgent technical problems.

发明内容 SUMMARY

[0005] 为解决上述技术问题,本发明提供一种大视场拼接照明的均匀性补偿装置,使每一个照明单元的视场都具有较好的照明均匀性。 [0005] To solve the above problems, the present invention provides an apparatus for compensating the uniformity of a large illumination field splicing, a field of view of each lighting unit have good uniformity of illumination.

[0006] 本发明提供一种用于大视场拼接照明的均匀性补偿装置,沿光线传播的方向,依次包括:光源、出光口至少为两路的分光结构及与所述分光结构出光口数目一致的中继透镜,其特征在于:所述均匀性补偿装置还包括匀光光学元件,及反馈控制器;所述光源发出的光线经匀光光学元件、分光结构及中继透镜后,在基板上获得均匀照明视场;所述反馈控制器根据基板均匀性信号调节汞灯的位置和/或角度。 [0006] The present invention provides a means for compensating the uniformity of a large illumination field splicing, along the direction of propagation of light, in turn comprising: a light source, an optical interface of at least two of the light splitter and the light beam splitter configuration port number consistent relay lens, wherein: said compensating means further comprises a uniform homogeneous optical element, and a feedback controller; light after emitted from the light source uniform optical element, and the spectral structure of the relay lens, the substrate on obtaining a uniform illumination field; the feedback controller according to the uniformity of the signal conditioning board mercury lamp position and / or angle.

[0007] 更进一步地,所述匀光光学元件包括微透镜阵列和石英棒,所述微透镜阵列和石英棒依次位于所述光源和分光结构之间。 [0007] Still further, the light homogenizing optical element comprises a quartz rod and a microlens array, the microlens array and the quartz rod are sequentially positioned between the light source and the beam structure.

[0008] 更进一步地,所述均匀性补偿装置还包括调节档片阵列。 [0008] Still further, the uniformity of the compensation means further comprising adjusting the baffle plate array.

[0009] 更进一步地,所述调节档片阵列位于所述石英棒与所述分光结构之间。 [0009] Furthermore, the adjustment gear sheet positioned between the quartz rod array and the spectral structure.

[0010] 更进一步地,所述反馈控制器根据基板均匀性信号调节所述调节档片阵列的位置和/或角度。 [0010] Furthermore, the feedback controller adjusts the position of the stop plate array and / or angular uniformity of the substrate according to the signal conditioning.

[0011] 更进一步地,所述均匀性补偿装置还包括与所述分光结构出光口数目一致的均匀单元,所述均匀单元位于所述分光结构的出光口,所述均匀单元的出光口设置有所述调节档片阵列。 [0011] Still further, the uniformity of the compensation means further comprises a light splitter unit consistent uniform number of optical interfaces, the uniformity of the light exit means located in the spectral structure, the homogeneous unit is provided with a light outlet the regulating rail pad array.

[0012] 更进一步地,所述匀光光学元件为均匀单元和调节档片阵列,所述均匀单元和调节档片阵列的数目分别与所述分光结构出光口数目一致。 [0012] Still further, the light homogenizing optical element unit and a uniform array of adjustable stop plate, and the number of regulating rail pad array, respectively showing the uniform cell structure and the same number of spectral optical port.

[0013] 更进一步地,所述均匀性补偿装置还包括椭球反射镜,所述光源放置在所述椭球反射镜的内焦点处。 [0013] Still further, the uniformity of the compensating means further comprises an ellipsoidal reflector, the light source is placed at the focal point of the ellipsoidal mirror.

[0014] 更进一步地,所述中继透镜包括8片透镜。 [0014] Furthermore, the relay lens 8 comprises lens. 所述中继透镜包括前组透镜、光阑和后组透镜。 The relay lens group comprises a front lens, a stop and a rear lens group.

[0015] 更进一步地,所述分光结构为光纤。 [0015] Furthermore, the optical fiber light splitter. 所述分光光纤有若干纤芯组成,所述分光光纤的入光口径为20mm,所述分光光纤的出光口径为5-10mm,所述每根纤芯直径为0. 02-0. 07mm。 The spectral composition of the fiber core has a plurality of, said spectral light into the optical fiber diameter is 20mm, the diameter of the light beam splitter optical fiber is 5-10mm, the diameter of each core 0. 02-0. 07mm.

[0016] 本发明提供一种在汞灯照明的扫描式大视场拼接曝光系统中,对照明视场中的每一个单元拼接视场的均匀性进行调节的装置,该装置可以使每一个照明单元的视场都具有较好的照明均匀性。 [0016] The present invention provides a lighting mercury wide field of view scanning exposure splicing system, the illumination field of view of the apparatus for adjusting the uniformity of each splicing unit field of view, which allows each lighting device field units have good uniformity of illumination. 与现有技术相比较,本发明所提供的装置可以使大视场扫描拼接的照明视场具有更好的照明均匀性,可以通过简单有效的调节方式在光源稳定性、镀膜不均匀性、光学装调等因素使每一个单元照明视场的照明均匀性下降的情况下,还能在掩膜板上得到较高的照明均匀性。 Compared with the prior art, the present invention provides the illumination field can scan wide field of view of the splice better uniformity of illumination, it can be adjusted by a simple and effective manner in the light stability, coating unevenness, optical in the case mounted decreased uniformity of illumination adjustment factors that each unit of the illumination field, but also to obtain a high uniformity of illumination on the mask plate.

附图说明 BRIEF DESCRIPTION

[0017] 关于本发明的优点与精神可以通过以下的发明详述及所附图式得到进一步的了解。 [0017] The advantage and spirit of the appended drawings the present invention may be further understood by the following detailed description of the invention and.

[0018] 图la至图lb是现有技术中实现大视场均匀曝光的方法之一; [0018] FIGS. La to lb is one method of the prior art to achieve a uniform exposure of the large field of view;

[0019] 图2a至图2b是现有技术中实现大视场均匀曝光的方法之二; [0019] Figures 2a-2b is a method of the prior art to achieve a uniform exposure of the two large field of view;

[0020] 图3是现有技术中实现大视场均匀曝光的方法之三; [0020] FIG. 3 is a third method in the prior art to achieve a uniform exposure of a large field of view;

[0021] 图4是本发明所提供的大视场拼接照明的均匀性补偿装置的第一实施方式; [0021] FIG. 4 is a first embodiment of the present invention provides a wide field of view illumination uniformity compensation splicing device;

[0022] 图5是本发明所提供的大视场拼接照明的均匀性补偿装置的第二实施方式; [0022] FIG. 5 is a second embodiment of the present invention provides a wide field of view illumination uniformity compensation splicing device;

[0023] 图6是本发明所涉及的调节挡片的结构示意图; [0023] FIG. 6 is a schematic view of the regulating flap of the present invention;

[0024] 图7是本发明所提供的大视场拼接照明的均匀性补偿装置的第三实施方式; [0024] FIG. 7 is a third embodiment splicing wide field of view of the present invention provides an illumination uniformity compensation means;

[0025] 图8是本发明所提供的大视场拼接照明的均匀性补偿装置的第四实施方式; [0025] FIG 8 is a fourth embodiment of the present invention provides a wide field of view illumination uniformity compensation splicing device;

[0026] 图9是本发明所涉及的中继透镜的结构示意图。 [0026] FIG. 9 is a schematic structural diagram of a relay lens of the present invention.

具体实施方式 detailed description

[0027] 下面结合附图详细说明本发明的具体实施例。 [0027] The following detailed description of specific embodiments of the present invention in conjunction with the accompanying drawings.

[0028] 本发明提供一种大视场拼接照明的均匀性补偿装置,使每一个照明单元的视场都具有较好的照明均匀性。 [0028] The present invention provides a wide field of view illumination uniformity compensation splicing device, so that the field of view of each lighting unit have good uniformity of illumination. 为了使每一个照明视场都具有较好的照明均匀性,本发明所提供的技术方案米用在分光之前勻光的方法,即在光源和分光光纤之间进行勻光,也就是在光线进入分光光纤之前就用积分棒或微透镜进行匀光。 In order to make each of the illumination field has good uniformity of illumination, the technical solutions of the present invention provides a meter for use in spectroscopic method before absorbed light, the light that is absorbed between the light source and the beam splitter optical fiber, i.e. light rays entering proceeds uniform light rod integrator prior to spectrophotometric or optical fiber microlens. 具体地,先调节汞灯或冷光镜使分光光纤入口处照明均匀性达到要求,通过光纤分光后,每一路照明视场的照明均匀性也能达到要求。 In particular, a mercury lamp or a cold mirror to adjust the optical spectroscopic requirements to achieve uniformity of illumination at the entrance, through the fiber optic splitter, the illumination uniformity of the illumination field of view of each channel can meet the requirements.

[0029] 该均匀性补偿装置,沿光线传播的方向,依次包括:光源、出光口至少为2路的分光结构及与所述光纤出光口数目一致的中继透镜,在本发明中,所述光源采用汞灯,所述分光结构为分光光纤,其特征在于:所述均匀性补偿装置还包括匀光光学元件及反馈控制器; 所述汞灯光源发出的紫外光经匀光光学元件、光纤及中继透镜后,在基板上获得均匀照明视场;所述反馈控制器根据基板均匀性信号调节汞灯的位置和/或角度。 [0029] The uniformity of the compensating means, along the direction of propagation of light, in turn comprising: a light source, at least the light exit passage splitter 2 and the relay lens opening consistent with the number of optical fibers, in the present invention, the using a mercury lamp light source, the optical fiber light splitter is a beam splitter, characterized in that: said compensation means further comprises a uniform homogeneous optical element and a feedback controller; the ultraviolet light emitted by mercury absorbed optical element, an optical fiber and the relay lens, the uniformity of the illumination field is obtained on a substrate; feedback controller according to the uniformity of the signal conditioning board mercury lamp position and / or angle.

[0030] 如图4所示,是本发明所提供的大视场拼接照明的均匀性补偿装置的第一实施方式,利用石英棒或微透镜阵列在光线进入分光光纤之前就进行匀光。 [0030] As shown in FIG 4, the first embodiment is the large field splicing embodiment of the present invention provides an illumination uniformity compensation device using a microlens array or a quartz rod to be homogenized before the light beam enters into dichroic fibers. 在本实施中,汞灯光源1所发出的紫外光线依次经过椭球反射镜2聚光,微透镜阵列3及石英棒4后被均匀调制。 In the present embodiment, the ultraviolet rays emitted from a mercury lamp light source sequentially passes through the condensing ellipsoidal mirror 2, the microlens array 3 and the quartz rod 4 after uniformly modulated. 经均匀调制后的紫外光线进入分光光纤5被至少分为2路。 By the ultraviolet light enters uniformly modulated spectroscopic optical fiber 5 is divided into at least 2 channels. 在中继透镜7的出光口处放置一探测器(图中未示出)用以获得基板照明均匀性信号,该信号传输至反馈控制器6,并根据该信号调节汞灯的位置。 Placed in the optical port at the relay lens 7 a detector (not shown) to obtain a uniform illumination of the substrate signal, the feedback signal is transmitted to the controller 6, and the position signal based on the adjustment of mercury.

[0031] 该均匀性补偿装置沿光线传输的方向依次包括:汞灯光源1、椭球反射镜2,微透镜阵列3、石英棒4、分光光纤5、中继透镜7。 [0031] The uniformity of the compensating device in the direction of light transmission, comprises: a mercury lamp light source, an ellipsoidal mirror 2, the microlens array 3, the quartz rod 4, the spectroscopic optical fiber 5, a relay lens 7. 汞灯光源1发出的光谱主要集中在g、h、i三线,一般TFT光刻用的光谱为i线或ghi三线,需要后续用滤波片滤出所需波长,滤波片的选用属于本领域技术人员之熟知技艺,因此此处省略。 Spectrum of a mercury lamp emitted a light source mainly in g, h, i three lines, generally TFT lithography or i-line spectrum is ghi three lines, requires the desired wavelength selection filter within the skill in the art subsequent filtration with filter well known to persons of skill, and therefore omitted here. 椭球反射镜2采用金属材料支撑,可承受大功率汞灯光源1发出的光和热,椭球碗内表面镀有紫外介质反射膜,可以将大部分的ghi三线波长的光反射到照明系统中。 Ellipsoidal reflecting mirror support 2 is made of metal, can withstand high power mercury lamp light and heat emitted from the light source 1, the ellipsoid surface coated with an ultraviolet bowl dielectric reflecting film reflects most of the light wavelength ghi three lines to the lighting system may be in. 汞灯光源1放在椭球反射镜2的内焦点处,石英棒4放在椭球碗的外焦点处。 Mercury light source 1 is placed within the ellipsoidal reflecting mirror 2 at the focal point of a quartz rod 4 is placed at the focus of the ellipsoid outer bowl. 紧贴石英棒4入口端放置微透镜阵列3,可在石英棒出口端得到具有一定视场、一定数值孔径的照明像面。 Quartz rod 4 close to the inlet end of the microlens array 3 is placed, the image plane can be obtained having certain the illumination field, in a certain numerical aperture of the outlet end of the quartz rod. 分光光纤5紧贴石英棒出口,或者通过光纤耦合器耦合进光纤内。 5 against the fiber optic spectroscopic quartz rod outlet, or by a fiber coupler coupled into the optical fiber. 分光光纤5是石英光纤,可以保证紫外光在其中传播具有高透过率,石英光纤的入光口径可设计为20mm,每根纤芯直径为0· 02-0. 07mm,较细的石英纤芯可以保证高填充率。 5 is a spectroscopic optical quartz fiber, which can ensure that UV light propagation having a high transmittance, the diameter quartz optical fiber can be designed to 20mm, each core diameter of 0 · 02-0. 07mm, fine quartz fiber core ensures high fill rate. 石英光纤出光口可以分为2路、3路……,设计口径可为5-10mm,在保证光纤弯曲半径的情况下分别导入到后续的光学系统中。 Quartz fiber light outlet passage can be divided into 2, 3 ...... way, may be designed diameter 5-10mm, in ensuring the fiber bend radius are introduced into the subsequent optical system. 石英光纤要固定连接,光纤移动将造成光纤内传输光能量的变化,导致照明不稳定。 Fixedly connected to the quartz fiber, fiber movement will cause changes in optical transmission of light energy, resulting in unstable illumination. 反馈控制器6接受基板照明均匀性信号,根据此信号调节汞灯的位置和/或角度,从而在基板上得到均匀照明视场。 The feedback controller 6 receives signals substrate illumination uniformity, a mercury lamp in accordance with the signal adjusts the position and / or angle to obtain a uniform illumination field on the substrate. 中继透镜7放置于分光光纤5的出光口及基板之间,分光光纤5的出射光经过中继透镜7后,可以有效的在掩膜面上形成需要尺寸的视场。 A relay lens 7 is placed between the beam of the optical fiber 5 and the light exit substrate, the spectroscopic optical fiber 5 after the outgoing light relay lens 7, the field of view can be efficiently formed on the mask surface of the desired size.

[0032] 本发明同时提供第二种实施方式,在该实施例中公开了在进入分光光纤之前匀光,还可以使用积分棒、微透镜加均匀性补偿装置的技术方案。 [0032] The present invention also provides a second embodiment, in this embodiment, is disclosed a uniform spectral light before entering the optical fiber, a rod integrator may be used, plus a uniform microlens aspect of the compensating device. 在通常情况下,实施例一中所提供的技术方案能够达到常规的均匀性要求。 Under normal circumstances, in the first embodiment provided in the conventional technical solution to achieve homogeneity requirements. 如果经汞灯或冷光镜调节后,进入分光光纤入口的照明均匀性仍然不能达到要求,可用均匀性补偿装置在扫描方向上对较强的积分路线上的照明光强进行遮挡,使积分光强在进入分光光纤后均匀性达到要求。 If a mercury lamp or a cold mirror adjustment by after entering the spectral uniformity of the illumination fiber entrance still not meet the requirements, can be used for illumination uniformity compensation device integrated on a stronger intensity for the route blocking in the scanning direction, so that the integrated light intensity after entering the spectroscopic optical uniformity to meet the requirements.

[0033] 如图5中所示,为了防止经过石英棒匀光后,在基板上仍然得不到均匀的照明视场,在石英棒出端的非扫描方向上放置一排调节挡片阵列8。 [0033] As shown, in order to prevent the absorbed light through a quartz rod, on the substrate still not a uniform illumination field, is placed a row of adjusting the quartz rod 5 in the non-scanning direction end flaps 8 array. 调节挡片阵列8的具体设置方式如图6中所示,如果石英棒在非扫描方向长33mm,调节挡片的尺寸可设计为2mm,这样在非扫描方向可布置17个调节挡片,可以对积分均匀性分成17个部分进行调节。 DETAILED arrangement regulating flaps array 8 shown in FIG. 6, if the quartz rod in a non-scanning direction length of 33mm, adjust the size of the flap may be designed to 2mm, so that in the non-scanning direction can be arranged adjustable stop plate 17, can be uniformity of integral regulator is divided into 17 parts. 调节档片Bl、B2、B3……Bi对应的调节区域为ΚΙ、K2、K3……Ki,当在扫描方向进行曝光时,照明视场的均匀性由积分均匀性Σ Ι1、Σ Ι2、Σ 13、……Σ Ii决定。 Adjusting the stop plate Bl, B2, B3 ...... Bi corresponding adjustment region ΚΙ, K2, K3 ...... Ki, when the exposure in a scanning direction, uniformity of illumination by the field of view of the uniformity of the integral Σ Ι1, Σ Ι2, Σ 13, ...... Σ Ii decision. 如果调节区域K m光强较大,可以把调节挡片Bm挡住一部分调节区域Km,使得积分光强Σ Im减小。 If the light intensity adjustment region K m is large, the flap may be adjusted to block a portion of the regulatory region Bm Km, so that the integrated light intensity decreases Σ Im. 在本实施中,汞灯光源1所发出的紫外光线依次经过椭球反射镜2聚光,微透镜阵列3、石英棒4及调节档片阵列8后被均匀调制。 In the present embodiment, the ultraviolet rays emitted from a mercury lamp light source sequentially passes through the condensing ellipsoidal mirror 2, the microlens array 3, and the quartz rod 4 after adjusting the baffle plate array 8 uniformly modulated. 经均匀调制后的紫外光线进入分光光纤5被至少分为2路。 By the ultraviolet light enters uniformly modulated spectroscopic optical fiber 5 is divided into at least 2 channels. 在中继透镜7的的出光口处放置一探测器(图中未示出)用以获得基板照明均匀性信号,该信号传输至反馈控制器6,并根据该信号调节汞灯和调节挡片阵列8的位置和/或角度。 Placing a detector (not shown) to obtain a uniform illumination of the substrate in the light signal at the outlet of the relay lens 7, a feedback signal is transmitted to the controller 6, and adjusted according to the signal conditioning flaps and mercury an array of position and / or angle of 8. [0034] 第三个实施例是根据实施例一和实施例二在照明系统的不同位置对单元照明视场进行勻光。 [0034] The third embodiment is an embodiment in accordance with the uniform illumination and at different positions according to the second embodiment of the illumination system illumination field unit. 在光源和分光光纤之间,在分光光纤和单个照明系统之间都对每一个单兀照明拼接视场进行匀光。 An optical fiber between the light source and the beam, between the beam and a single fiber optic lighting systems for uniform light illumination of the splice every single field Wu. 在光源和分光光纤之间用积分棒或微透镜阵列进行匀光,保证照明光强在进入石英棒之前就具有较好的均匀性。 Shimming rod light integrator or a micro lens array between the light source and the beam splitter optical fiber, to ensure illumination intensity has good uniformity prior to entering the quartz rod. 在分光光纤和单个照明系统之间用均匀性补偿装置进行匀光,也就是在单个照明拼接系统的匀光光路中,比如在单个照明拼接系统的积分棒出口或微透镜出口处,用均匀性补偿装置进行匀光,保证光强在分光之后照射到掩膜板之前具有较好的照明均匀性。 Shimming the uniformity of light compensation means between the beam and a single fiber optic illumination system, that is a single uniform illumination beam path splicing system, such as the integrator rod outlet or outlet microlenses single illumination splicing system, with homogeneity compensating means for dodging, to ensure good uniformity of illumination with light before the spectral intensity after the irradiation to the mask plate.

[0035] 如图7中所示,该均匀性补偿装置沿光线传输的方向依次包括:汞灯光源1、椭球反射镜2,微透镜阵列3、石英棒4、分光光纤5、单元照明视场均匀单元9、单元照明视场调节档片阵列803及中继透镜7。 [0035] As shown in FIG. 7, the uniformity of the compensating device in the direction of light transmission, comprises: a mercury lamp light source, an ellipsoidal mirror 2, the microlens array 3, the quartz rod 4, the spectroscopic optical fiber 5, depending on the lighting unit field uniformity unit 9, the illumination field unit regulating rail 803 and the relay lens array sheet 7. 反馈控制器6接受基板照明均匀性信号,根据此信号调节汞灯的位置,从而在基板上得到均匀照明视场。 The feedback controller 6 receives the substrate illumination uniformity signal, this signal is adjusted in accordance with the position of a mercury lamp, to thereby obtain a uniform illumination field on the substrate. 中继透镜7放置于单元照明视场调节档片阵列803的调节区域处,可以有效的在掩膜面上形成需要尺寸的视场。 7 is placed in the relay lens unit adjusting the illumination field stop plate adjusted at the array region 803, the field of view can be efficiently formed on the mask surface of the desired size. 实施例三在分光后用均匀性补偿装置在每一个单元照明视场的光路中调节积分均匀性。 Third Embodiment with uniformity compensation means adjusting each of a uniformity in the optical path of the integral unit of the illumination field of view after spectrophotometry. 这个方法可以更好的保证每一个单元视场的积分均匀性。 This method can better ensure uniformity of integral units each field of view.

[0036] 第四个实施例也是根据实施例一和二在照明系统的不同位置对单元照明视场进行匀光。 [0036] A fourth embodiment is an embodiment of the illumination field and two pairs of units at different locations in the illumination system according to uniform light. 在分光光纤和单个照明系统之间对每一个照明单元视场进行匀光。 Uniformizing the light for each lighting unit in the field between the beam and the single optical fiber lighting system. 在单元照明视场的匀光光路中,比如在单个照明拼接系统的积分棒出口或微透镜出口处,用均匀性补偿装置进行匀光,保证光强在分光之后照射到掩膜板之前具有较好的照明均匀性。 In an uniform illumination beam path unit field of view, such as the integrator rod outlet or outlet microlenses single illumination splicing system, for uniform light uniformity compensation device, before the light intensity is irradiated to the mask plate after having guaranteed more spectroscopic good uniformity of illumination. 第四实施例为了克服实施三的成本增加的缺点,在本实施方式中省略了微透镜阵列3和石英棒4,仅在分光后的每一路照明系统中用均匀性补偿装置调节积分均匀性,在分光之前不再用石英棒或微透镜阵列匀光。 Fourth Example Embodiment To overcome the disadvantages of increased cost III, the microlens array is omitted in the present embodiment, quartz rod 3 and 4, only after the passage of each spectral uniformity of the illumination system by adjusting the uniformity of integral compensation means, a quartz rod light is no longer absorbed, or prior to the microlens array spectrophotometry. 这种方法可以减少照明系统的尺寸,降低系统成本。 This method can reduce the size of the illumination system, reducing system cost.

[0037] 附图9是本发明所涉及的中继透镜的结构示意图。 [0037] Figure 9 is a schematic structural diagram of a relay lens of the present invention. 其中该图中示意性地给出了一个中继透镜的结构,但是在实际应用过程中,可根据不用应用场合选择不同种类的中继透镜。 Wherein the figure schematically shows the structure of a relay lens, but in practical application process can be selected according to different types of the relay lens without application. 如图9所示该,该中继透镜具有8片镜片式结构,其中分为前组透镜和后组透镜。 As shown in the FIG. 9, the relay lens 8 having a lens structure, which is divided into a front group and a rear lens group of the lens. 沿光线传输的方向,依次是前组透镜901、光阑902及后组透镜903。 The direction of transmission of light, followed by the front group lens 901, a diaphragm 902 and a rear lens group 903.

[0038] 与现有技术相比较,本发明所提供的装置可以使大视场扫描拼接的照明视场具有更好的照明均匀性,可以通过简单有效的调节方式在光源稳定性、镀膜不均匀性、光学装调等因素使每一个单元照明视场的照明均匀性下降的情况下,还能在掩膜板上得到较高的照明均匀性。 [0038] Compared with the prior art, the present invention provides the illumination field can scan wide field of view of the splice better uniformity of illumination, it can be adjusted by a simple and effective manner in the light stability, uneven coating in the case of decreased uniformity of illumination, optical assembly and adjustment factors that each unit of the illumination field, but also to obtain a high uniformity of illumination on the mask plate.

[0039] 本说明书中所述的只是本发明的较佳具体实施例,以上实施例仅用以说明本发明的技术方案而非对本发明的限制。 [0039] in the present specification are only preferred embodiments of the present invention are described, for example, only the above embodiments describing the technical solutions of the present invention, not limitation of the invention. 凡本领域技术人员依本发明的构思通过逻辑分析、推理或者有限的实验可以得到的技术方案,皆应在本发明的范围之内。 Where skilled in the art under this inventive concept by logical analysis, reasoning or limited experiments aspect can be obtained, it is to be within the scope of the present invention.

Claims (9)

  1. 1. 一种用于大视场拼接照明的均匀性补偿装置,沿光线传播的方向,依次包括:光源、 出光口至少为两路的分光结构及与所述分光结构出光口数目一致的中继透镜,其特征在于:所述均匀性补偿装置还包括匀光光学元件,及反馈控制器;所述光源发出的光线经匀光光学元件、分光结构及中继透镜后,在基板上获得均匀照明视场;所述反馈控制器根据基板均匀性信号调节汞灯的位置和/或角度;所述匀光光学元件包括微透镜阵列和石英棒, 所述微透镜阵列和石英棒依次位于所述光源和分光结构之间;所述均匀性补偿装置还包括调节档片阵列;所述调节档片阵列位于所述石英棒与所述分光结构之间。 A large uniformity compensation apparatus for field splicing illumination, the direction of light propagation, in turn comprising: a light source, an optical interface of at least two of the light splitter and the light spectral structure consistent relay port number lens, wherein: said compensating means further comprises a uniform light homogenizing optical element, and a feedback controller; light after emitted from the light source uniform optical element, the light splitter and the relay lens to obtain a uniform illumination on the substrate field; said feedback control signal adjusts the position of the substrate uniformly mercury and / or angle according to; the light homogenizing optical element comprises a microlens array and the quartz rod, the microlens array and a light source located sequentially quartz rod and between the light splitter; the uniformity compensation means further comprises a regulating rail plate array; adjusting the baffle plate is positioned between the quartz rod array and the spectral structure.
  2. 2. -种用于大视场拼接照明的均匀性补偿装置,沿光线传播的方向,依次包括:光源、 出光口至少为两路的分光结构及与所述分光结构出光口数目一致的中继透镜,其特征在于:所述均匀性补偿装置还包括匀光光学元件,及反馈控制器;所述光源发出的光线经匀光光学元件、分光结构及中继透镜后,在基板上获得均匀照明视场;所述反馈控制器根据基板均匀性信号调节汞灯的位置和/或角度;所述匀光光学元件包括微透镜阵列和石英棒, 所述微透镜阵列和石英棒依次位于所述光源和分光结构之间;所述均匀性补偿装置还包括调节档片阵列;所述均匀性补偿装置还包括与所述分光结构出光口数目一致的均匀单元, 所述均匀单元位于所述分光结构的出光口,所述均匀单元的出光口设置所述调节档片阵列。 2. - Species uniformity compensation means for splicing a large field illumination, the direction of light propagation, in turn comprising: a light source, an optical interface of at least two of the light splitter and the light spectral structure consistent relay port number lens, wherein: said compensating means further comprises a uniform light homogenizing optical element, and a feedback controller; light after emitted from the light source uniform optical element, the light splitter and the relay lens to obtain a uniform illumination on the substrate field; said feedback control signal adjusts the position of the substrate uniformly mercury and / or angle according to; the light homogenizing optical element comprises a microlens array and the quartz rod, the microlens array and a light source located sequentially quartz rod between the beam and the structure; the uniformity compensation means further comprises a regulating rail plate array; uniformity of the compensation means further comprising a light splitter unit consistent uniform optical port number, the unit is in the spectral uniformity of the structure the light outlet, the light outlet means uniformly arranged array of the adjustment gear sheet.
  3. 3. -种用于大视场拼接照明的均匀性补偿装置,沿光线传播的方向,依次包括:光源、 出光口至少为两路的分光结构及与所述分光结构出光口数目一致的中继透镜,其特征在于:所述均匀性补偿装置还包括匀光光学元件,及反馈控制器;所述光源发出的光线经分光结构、匀光光学元件及中继透镜后,在基板上获得均匀照明视场;所述反馈控制器根据基板均匀性信号调节汞灯的位置和/或角度;所述匀光光学元件为均匀单元和调节档片阵列,所述均匀单元和调节档片阵列的数目分别与所述分光结构出光口数目一致,所述均匀单元位于所述分光结构的出光口,所述均匀单元的出光口设置所述调节档片阵列。 3 - Species uniformity compensation means for splicing a large field illumination, the direction of light propagation, in turn comprising: a light source, an optical interface of at least two spectral structure and the spectral structure of a number of identical relay optical port lens, wherein: said compensating means further comprises a uniform light homogenizing optical element, and a feedback controller; the light emitted by the light source in the spectral structure, after leveling and the relay lens optical element to obtain a uniform illumination on the substrate field; said feedback control signal adjusts the position of the substrate uniformly mercury and / or angle according to; the number of the light homogenizing optical element unit and a uniform array of adjustable stop plate, and the regulating rail unit uniformly pad array, respectively, the spectral structure consistent with the number of optical ports, the homogeneous unit is located at the light outlet of the spectral structure, the uniformity of the light outlet means of said adjustment gear sheet disposed array.
  4. 4. 如权利要求1、2或3所述的用于大视场拼接照明的均匀性补偿装置,其特征在于,所述反馈控制器根据基板均匀性信号调节所述调节档片阵列的位置和/或角度。 4. The apparatus claimed in claim uniformity compensation splicing large field illumination for 1, 2 or 3, wherein said position feedback control of the regulating rail pad array substrate according to the uniformity of the signal conditioning and / or angle.
  5. 5. 如权利要求1、2或3所述的用于大视场拼接照明的均匀性补偿装置,其特征在于,所述均匀性补偿装置还包括椭球反射镜,所述光源放置在所述椭球反射镜的内焦点处。 5. The apparatus claimed in claim uniformity compensation splicing large field illumination for 1, 2 or 3, wherein said compensating means further comprises a uniformity ellipsoidal reflector, the light source is placed in the the focal point of the ellipsoidal mirror.
  6. 6. 如权利要求1、2或3所述的用于大视场拼接照明的均匀性补偿装置,其特征在于,所述中继透镜包括8片透镜。 6. The apparatus claimed in claim uniformity compensation splicing large field illumination for 1, 2 or 3, wherein said lens comprises a relay lens 8.
  7. 7. 如权利要求1、2或3所述的用于大视场拼接照明的均匀性补偿装置,其特征在于,所述中继透镜包括前组透镜、光阑和后组透镜。 7. The apparatus for compensating the uniformity of the wide field of view illumination or the splicing of claims 1 to 3, wherein said relay lens comprises a front lens group, a stop and a rear lens group.
  8. 8. 如权利要求1、2或3所述的用于大视场拼接照明的均匀性补偿装置,其特征在于,所述分光结构为分光光纤。 8. The apparatus claimed in claim uniformity compensation splicing large field illumination for 1, 2 or 3, characterized in that said optical fiber light splitter is a beam splitter.
  9. 9. 如权利要求8所述的用于大视场拼接照明的均匀性补偿装置,其特征在于,所述分光光纤有若干纤芯组成,所述分光光纤的入光口径为20_,所述分光光纤的出光口径为5-10mm,每根纤芯直径为0. 02-0. 07mm。 9. The apparatus claimed in claim uniformity compensation large field illumination for splicing claim 8, wherein said plurality of spectroscopic optical fiber having a core composition, said spectral light into the fiber diameter of 20_, the spectroscopic the optical fiber is the diameter of 5-10mm, each core diameter of 0. 02-0. 07mm.
CN 201010582214 2010-12-10 2010-12-10 Uniformity compensation device applied to large field-of-view montage illumination CN102540736B (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5455144A (en) * 1990-03-20 1995-10-03 Hitachi, Ltd. Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process
US5579147A (en) * 1993-12-08 1996-11-26 Nikon Corporation Scanning light exposure apparatus
US6480262B1 (en) * 1993-06-30 2002-11-12 Nikon Corporation Illumination optical apparatus for illuminating a mask, method of manufacturing and using same, and field stop used therein
CN2634506Y (en) * 2003-09-02 2004-08-18 北京电影机械研究所 Lighting system for optical engine and space light modulator
CN101349871A (en) * 2008-09-05 2009-01-21 上海微电子装备有限公司 Photo-etching illuminating apparatus
CN201487677U (en) * 2009-08-21 2010-05-26 上海微电子装备有限公司 Illuminating system

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5455144A (en) * 1990-03-20 1995-10-03 Hitachi, Ltd. Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process
US6480262B1 (en) * 1993-06-30 2002-11-12 Nikon Corporation Illumination optical apparatus for illuminating a mask, method of manufacturing and using same, and field stop used therein
US5579147A (en) * 1993-12-08 1996-11-26 Nikon Corporation Scanning light exposure apparatus
CN2634506Y (en) * 2003-09-02 2004-08-18 北京电影机械研究所 Lighting system for optical engine and space light modulator
CN101349871A (en) * 2008-09-05 2009-01-21 上海微电子装备有限公司 Photo-etching illuminating apparatus
CN201487677U (en) * 2009-08-21 2010-05-26 上海微电子装备有限公司 Illuminating system

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