CN102540306B - 光栅片、液晶显示装置及光栅片、液晶面板的制造方法 - Google Patents
光栅片、液晶显示装置及光栅片、液晶面板的制造方法 Download PDFInfo
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Abstract
本发明实施例公开一种光栅片、液晶显示装置及光栅片、液晶面板的制造方法,涉及液晶显示领域,解决了现有技术中由背光源照射出来的一部分光线会被黑矩阵区域吸收导致光线白白浪费掉,使用率较差的问题。本发明实施例提供的光栅片,包括多个平行设置的三原色光栅,所述三原色光栅包括红色R子光栅、绿色G子光栅和蓝色B子光栅,所述红色R子光栅、绿色G子光栅和蓝色B子光栅之间平行设置,每个子光栅包括开口区和反光区,所述反光区设置在所述开口区的四周,所述子光栅对应于阵列基板上的像素单元。本发明实施例提供的光栅片、液晶显示装置及光栅片、液晶面板的制造方法应用在带有液晶显示的系统中。
Description
技术领域
本发明涉及液晶显示领域,尤其涉及一种光栅片、液晶显示装置及光栅片、液晶面板的制造方法。
背景技术
目前,如图1所示,液晶显示装置包括背光源11和液晶盒12,液晶盒12包括下偏振片121、薄膜晶体管阵列基板122、液晶层123、彩膜基板124和上偏振片125,其中,由薄膜晶体管阵列基板122、液晶层123、彩膜基板124形成液晶面板。背光源11提供白色光源,由背光源11照射出来的光线传导途径为:先通过下偏振片121得到偏振光,再通过阵列基板122、液晶层123和彩膜基板124,利用彩膜基板124上的R(红)、G(绿)、B(黑)子像素得到R、G、B三原色光,最后通过下偏振片125射出。在光线传导途中通过对液晶层123中液晶分子扭转角度的控制可以实现画面的显示。
传统的液晶显示装置是利用彩膜基板上的R、G、B子像素得到R、G、B三原色光,如图2所示,彩膜基板由多个平行设置的R、G、B子像素构成。R、G、B子像素开口区四周设置有黑矩阵区域,其作用为挡光,当光线入射到黑矩阵区域,光线被全部吸收掉,因此由背光源照射出来的一部分光线会被白白浪费掉,使得光线的使用率较差。
发明内容
本发明提供的光栅片、液晶显示装置及光栅片、液晶面板的制造方法,用于解决现有技术中由背光源照射出来的一部分光线会被黑矩阵区域吸收导致光线白白浪费掉,使用率较差的问题。
为达到上述目的,本发明实施例采用如下技术方案:
一种光栅片,包括多个平行设置的三原色光栅,所述三原色光栅包括红色R子光栅、绿色G子光栅和蓝色B子光栅,所述红色R子光栅、绿色G子光栅和蓝色B子光栅之间平行设置,每个子光栅包括开口区,所述开口区设有用于衍射的金属层,所述开口区的四周设有反光区,所述子光栅对应于阵列基板上的像素单元。
具体的,所述反光区为镜面式反光区。
为了使得从反光区反射出的光线强度均一,所述反光区为棱镜式反光区。
具体的,所述用于衍射的金属层为铝金属层。
具体的,所述R子光栅包括:l=0.813umm,Φ=20%,t=80nm,d=20nm;所述G子光栅包括:l=0.813um,Φ=36%,t=60nm,d=40nm;所述B子光栅包括:l=0.813um,Φ=47%,t=40nm,d=60nm;其中1为子光栅的周期长度,Φ为占空比,Φ=w/l,w为子光栅开口区的开口宽度,t为子光栅上用于衍射的金属层的厚度,d为开口区与反光区之间的层间距。
一种液晶显示装置,包括上述的光栅片,所述光栅片位于背光源的出光侧。
具体的,所述光栅片位于所述背光源与下偏振片之间;或者
所述光栅片位于所述下偏振片与液晶面板之间;或者
所述光栅片位于所述液晶面板的阵列基板与液晶层之间;或者
所述光栅片位于所述液晶面板的彩膜基板与液晶层之间;或者
所述光栅片位于所述液晶面板与上偏振片之间;或者
所述光栅片位于所述上偏振片的出光侧。
进一步,为了使得从反光区反射出来的光线能够被高效的再次利用,所述背光源的保护膜与棱镜膜之间设有反射膜;或者,优选的,为了节约成本,所述背光源的保护膜的出光侧表面为镜面式表面。
所述液晶面板的彩膜基板上设有透明导电层。
一种光栅片的制造方法,包括:在基板上依次沉积氮化硅薄膜,通过构图工艺形成红色R子线栅、绿色G子线栅和蓝色B子线栅并在所述基板上镀一层金属薄膜以形成相互平行的红色R子光栅、绿色G子光栅和蓝色B子光栅;在所述基板上沉积一层反光薄膜,通过构图工艺形成反光区,所述反光区位于每个子光栅的开口区的四周。
具体的,在所述基板上沉积一层反光薄膜,通过构图工艺形成反光区,所述反光区位于每个子光栅的开口区的四周,包括:在所述基板上沉积一层反光薄膜;在所述反光薄膜上旋涂一层光刻胶薄膜;所述基板经过曝光、显影和刻蚀工序暴露出每个子光栅的开口区并剥离基板上残余的光刻胶。
进一步的,为了使得从反光区反射出的光线强度均一,所述在所述反光薄膜上旋涂一层光刻胶薄膜之前,还包括:用带有棱镜图案的模具压合反光薄膜以形成棱镜式反光薄膜。
具体的,所述在基板上依次沉积氮化硅薄膜中,所述基板为玻璃基板或者彩膜基板或者阵列基板;
所述彩膜基板上仅沉积透明导电薄膜;
在所述基板为阵列基板时,在所述在基板上依次沉积氮化硅薄膜之前,还包括:在所述阵列基板上沉积透明导电薄膜。
具体的,所述R子光栅包括:l=0.813umm,Φ=20%,t=80nm,d=20nm;所述G子光栅包括:l=0.813um,Φ=36%,t=60nm,d=40nm;所述B子光栅包括:l=0.813um,Φ=47%,t=40nm,d=60nm;其中1为子光栅的周期长度,Φ为占空比,Φ=w/l,w为子光栅开口区的开口宽度,t为子光栅上用于衍射的金属层的厚度,d为开口区与反光区之间的层间距。
一种液晶面板的制造方法,包括:形成彩膜基板,所述彩膜基板上仅沉积透明导电薄膜;形成阵列基板,所述阵列基板上形成有横纵交叉的数据线和栅线,所述数据线和所述栅线围设形成像素单元;形成上述的光栅片,所述光栅片形成在玻璃基板、阵列基板或者彩膜基板上;在所述光栅片形成在玻璃基板上时,对盒所述阵列基板与所述光栅片或者对盒所述彩膜基板与光栅片;在所述光栅片形成在所述阵列基板或所述彩膜基板上时,对盒阵列基板与彩膜基板。
本发明实施例提供的光栅片、液晶显示装置及光栅片、液晶面板的制造方法,由于光栅片由多个平行设置的三原色光栅组成,三原色光线栅包括红色R子光栅、绿色G子光栅和蓝色B子光栅,每个子光栅包括开口区和反光区,所述反光区设置在所述开口区的四周,所述子光栅对应于阵列基板上的像素单元,从而使得光栅片实现了对R、G、B色彩的显示,并且由于每个子光栅还包括反光区,使得从背光源射出的未能从光栅片透过的光线从反光区反射到背光源上,由背光源再次反射给光栅片,实现了未透过光线的再次利用,解决了现有技术中由背光源照射出来的一部分光线会被黑矩阵区域吸收导致光线白白浪费掉,使用率较差的问题。
附图说明
图1为现有技术中液晶显示装置的结构示意图;
图2为图1所示的液晶显示装置中彩膜基板的俯视图;
图3为本发明提供的光栅片的结构示意图;
图4(a)为图3所示的光栅片的A-A剖视图一;
图4(b)为图3所示的光栅片的A-A剖视图二;
图5(a)为本发明提供的一实施例液晶显示装置的结构示意图;
图5(b)为本发明提供的另一实施例液晶显示装置的结构示意图;
图5(c)为本发明提供的另一实施例液晶显示装置的结构示意图;
图5(d)为本发明提供的另一实施例液晶显示装置的结构示意图;
图5(e)为本发明提供的另一实施例液晶显示装置的结构示意图;
图5(f)为本发明提供的另一实施例液晶显示装置的结构示意图;
图6为图5(a)-图5(f)所示的液晶显示装置中一实施例背光源的结构示意图;
图7为图5(a)-图5(f)所示的液晶显示装置中另一实施例背光源的结构示意图;
图8为本发明提供的光栅片的制造方法的流程图;
图9(a)-9(e2)为本发明又一实施例提供的光栅片的工艺流程构造图;
图10为本发明提供的液晶面板的制造方法的流程图。
具体实施方式
下面将结合本发明中的附图,对本发明中的技术方案进行清楚、完整地描述,显然,所描述的仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
为了解决现有技术中由背光源照射出来的一部分光线会被黑矩阵区域吸收导致光线白白浪费掉,使用率较差的问题,本发明提供一种光栅片、液晶显示装置及光栅片、液晶面板的制造方法。
如图3所示,本发明提供的光栅片,包括多个平行设置的三原色光栅31,所述三原色光栅31包括红色R子光栅311、绿色G子光栅312和蓝色B子光栅313,所述红色R子光栅311、绿色G子光栅312和蓝色B子光栅313之间平行设置,如图4所示,每个子光栅41包括开口区411,所述开口区411设有用于衍射的金属层,所述开口区411的四周设有反光区412,所述子光栅对应于阵列基板上的像素单元。
在本实施例中,所述反光区可以是如图4(a)所示的镜面式反光区,也可以是如图4(b)所示的棱镜式反光区,优选的,为了使得从反光区反射出的光线强度均一,所述反光区为棱镜式反光区。
具体的,根据光学原理,不同宽度及间隔设计的光栅可实现对不同波长光线的选择,即特定波长的光线可透过。利用此原理,通过调整光栅片的设计参数,可以获得液晶显示所需的R、G、B三原色光。在本实施例中,可以采用子光栅周期长度相同,开口区宽度不同的方式实现选择性透过R、G、B三原色光,以形成R子光栅、G子光栅和B子光栅。优选的,用于衍射的金属层为铝金属层,光栅片的设计参数为:
R子光栅-l=0.813um,Φ=20%,t=80nm,d=20nm
G子光栅-l=0.813um,Φ=36%,t=60nm,d=40nm
B子光栅-l=0.813um,Φ=47%,t=40nm,d=60nm
其中1为子光栅的周期长度,Φ为占空比,Φ=w/l,w为子光栅开口区的开口宽度,t为子光栅上用于衍射的金属层的厚度,d为开口区与反光区之间的层间距。
值得说明的是,R、G、B子光栅的设计不仅限于上述的一种,还可以是子光栅周期长度相同,占空比相同,采用的金属层材质不同以实现R、G、B子光栅,此处不一一赘述。
本发明实施例提供的光栅片,由于光栅片由多个平行设置的三原色光栅组成,三原色光线栅包括红色R子光栅、绿色G子光栅和蓝色B子光栅,每个子光栅包括开口区和反光区,所述反光区设置在所述开口区的四周,所述子光栅对应于阵列基板上的像素单元,从而使得光栅片实现了对R、G、B色彩的显示,并且由于每个子光栅还包括反光区,使得从背光源射出的未能从光栅片透过的光线从反光区反射到背光源上,由背光源再次反射给光栅片,实现了未透过光线的再次利用,解决了现有技术中由背光源照射出来的一部分光线会被黑矩阵区域吸收导致光线白白浪费掉,使用率较差的问题。
如图5(a)-5(f)所示,本发明实施例提供的液晶显示装置,包括背光源51和液晶盒52,液晶盒52包括下偏振片521、薄膜晶体管阵列基板522、液晶层523、彩膜基板524和上偏振片525,其中,由薄膜晶体管阵列基板522、液晶层523、彩膜基板524形成液晶面板。所述液晶显示装置还包括上述实施例提供的光栅片53,所述光栅片53位于背光源51的出光侧。
具体的,如图5(a)所示本发明提供的一实施例,所述光栅片53位于所述背光源51与下偏振片521之间;背光源51提供白色光源,由背光源51照射出来的光线传导途径为:先通过光栅片53得到R、G、B三原色光并将未透过光栅片53的光线反射给背光源11,背光源11中的棱镜膜将由光栅片53反射回来的光线再次反射给光栅片53,透过光栅片53得到的R、G、B三原色光再通过下偏振片521得到偏振光,然后通过阵列基板522、液晶层523和彩膜基板524,彩膜基板524上仅设有透明导电层,最后通过上偏振片525射出。在光线传导途中通过对液晶层523中液晶分子扭转角度的控制可以实现画面的显示。
或者如图5(b)所示本发明的另一实施例,所述光栅片53位于所述下偏振片521与液晶面板之间;背光源51提供白色光源,由背光源51照射出来的光线传导途径为:先通过下偏振片521得到偏振光,再通过光栅片53得到R、G、B三原色光并将未透过光栅片53的光线反射给背光源11,背光源11中的棱镜膜将由光栅片53反射回来的光线再次反射给光栅片53,透过光栅片53得到的R、G、B三原色光通过阵列基板522、液晶层523和彩膜基板524,彩膜基板524上仅设有透明导电层,最后通过上偏振片525射出。在光线传导途中通过对液晶层523中液晶分子扭转角度的控制可以实现画面的显示。
或者如图5(c)所示本发明的另一实施例,所述光栅片53位于所述液晶面板的阵列基板522与液晶层523之间;背光源51提供白色光源,由背光源51照射出来的光线的传导途径为:先通过下偏振片521得到偏振光,再通过阵列基板522、光栅片53、液晶层523和彩膜基板524,利用光栅片53得到R、G、B三原色光并将未透过光栅片53的光线反射给背光源11,背光源11中的棱镜膜将由光栅片53反射回来的光线再次反射给光栅片53,最后通过上偏振片525射出。在光线传导途中通过对液晶层523中液晶分子扭转角度的控制可以实现画面的显示。
或者如图5(d)所示本发明的另一实施例,所述光栅片53位于所述液晶面板的彩膜基板524与液晶层523之间;背光源51提供白色光源,由背光源51照射出来的光线的传导途径为:先通过下偏振片521得到偏振光,再通过阵列基板522、液晶层523、偏振片53和彩膜基板524,利用光栅片53得到R、G、B三原色光并将未透过光栅片53的光线反射给背光源11,背光源11中的棱镜膜将由光栅片53反射回来的光线再次反射给光栅片53,最后通过上偏振片525射出。在光线传导途中通过对液晶层523中液晶分子扭转角度的控制可以实现画面的显示。
或者如图5(e)所示本发明的另一实施例,所述光栅片53位于所述液晶面板与上偏振片524之间;背光源51提供白色光源,由背光源51照射出来的光线传导途径为:先通过下偏振片521得到偏振光,然后通过阵列基板522、液晶层523和彩膜基板524,彩膜基板524上仅设有透明导电层,再通过光栅片53得到R、G、B三原色光并将未透过光栅片53的光线反射给背光源11,背光源11中的棱镜膜将由光栅片53反射回来的光线再次反射给光栅片53,透过光栅片53得到的R、G、B三原色光最后通过上偏振片525射出。在光线传导途中通过对液晶层523中液晶分子扭转角度的控制可以实现画面的显示。
或者如图5(f)所示本发明的另一实施例,所述光栅片53位于所述上偏振片524的出光侧。背光源51提供白色光源,由背光源51照射出来的光线传导途径为:先通过下偏振片521得到偏振光,然后通过阵列基板522、液晶层523和彩膜基板524,彩膜基板524上仅设有透明导电层,再通过上偏振片525射出,最后再通过光栅片53得到R、G、B三原色光并将未透过光栅片53的光线反射给背光源11,背光源11中的棱镜膜将由光栅片53反射回来的光线再次反射给光栅片53。在光线传导途中通过对液晶层523中液晶分子扭转角度的控制可以实现画面的显示。
优选的,所述光栅片53设置在液晶面板中液晶层的入光侧与背光源的出光侧之间,如图5(a)-5(c)所示,从而避免了背光源照射出来的光线需要两次通过液晶层才能被反射到背光源上,导致光线经过液晶层反转之后光线混乱的问题。
值得说明的是,上述实施例以液晶面板中阵列基板作为所述液晶面板的入光侧进行说明的,事实上,所述液晶面板中彩膜基板也可以作为液晶面板的入光侧来进行说明,其光线传导的途径与上述实施例类似,此处不再做赘述,但是,在所述彩膜基板先于光栅片接触由背光源照射的光线时,所述彩膜基板仅设有透明导电层。
如图6所示,所述背光源由下到上依次包括反射板61、导光板62、扩散板63、棱镜膜64和保护膜65,其中,导光板62上设有光源66。由光栅片反射回来的光线可以经由背光源的棱镜膜64再次反射给光栅片,然而棱镜膜63的反射率并不如平面镜的反射率高,进一步,为了使得从反光区反射出来的光线能够被高效的再次利用,如图7所示,所述背光源的保护膜65与棱镜膜64之间设有反射膜7;或者,优选的,为了节约成本,对图6中所述背光源的保护膜65的出光侧表面进行镜面处理,使得所述背光源的保护膜65的出光侧表面为镜面式表面。
本发明实施例提供的液晶显示装置,由于光栅片由多个平行设置的三原色光栅组成,三原色光线栅包括红色R子光栅、绿色G子光栅和蓝色B子光栅,每个子光栅包括开口区和反光区,所述反光区设置在所述开口区的四周,所述子光栅对应于阵列基板上的像素单元,从而使得光栅片实现了对R、G、B色彩的显示,并且由于每个子光栅还包括反光区,使得从背光源射出的未能从光栅片透过的光线从反光区反射到背光源上,由背光源再次反射给光栅片,实现了未透过光线的再次利用,解决了现有技术中由背光源照射出来的一部分光线会被黑矩阵区域吸收导致光线白白浪费掉,使用率较差的问题。
如图8所示,本发明实施例提供的光栅片的制造方法,包括:
步骤801,在基板上依次沉积氮化硅薄膜,通过构图工艺形成红色R子线栅、绿色G子线栅和蓝色B子线栅并在所述基板上镀一层金属薄膜以形成相互平行的红色R子光栅、绿色G子光栅和蓝色B子光栅。
在本实施例中,所述基板可以是清洗过的玻璃基板,也可以是仅沉积透明导电薄膜的彩膜基板,还可以是已制造完成的阵列基板。在本实施例中,用于衍射的金属薄膜为铝金属薄膜,其具有高消光比和高光通量,光栅片的设计参数为:
R子光栅-l=0.813um,Φ=20%,t=80nm,d=20nm
G子光栅-l=0.813um,Φ=36%,t=60nm,d=40nm
B子光栅-l=0.813um,Φ=47%,t=40nm,d=60nm
其中1为子光栅的周期长度,Φ为占空比,Φ=w/l,w为子光栅开口区的开口宽度,t为子光栅上用于衍射的金属层的厚度,d为开口区与反光区之间的层间距。
步骤802,在所述基板上沉积一层反光薄膜,通过构图工艺形成反光区,所述反光区位于每个子光栅的开口区的四周。
为了使本领域的技术人员更好的理解本发明实施例提供的光栅片的制造方法,本发明又一实施例提供的光栅片的制造方法,包括:
如图9(a)所示,首先,利用化学气相沉积法在基板9上沉积氮化硅薄膜901,在氮化硅薄膜上旋涂一层光刻胶902。
如图9(b)所示,接着通过曝光、显影及刻蚀工序形成红色R子线栅903,对残留的光刻胶902进行剥离。
如图9(c)所示,然后重复形成图9(a)和图9(b)的步骤在基板上依次形成G子线栅904、B子线栅905。
如图9(d)所示,再用磁控溅射设备在基板表面镀一层铝金属薄膜906,形成相互平行的R子光栅903、G子光栅904和B子光栅905。
如图9(e1)和9(e2)所示,最后,在所述基板上沉积一层反光薄膜,通过构图工艺形成反光区907,所述反光区907位于每个子光栅的开口区的四周。
具体的,图9(e1)所示的在所述基板上沉积一层反光薄膜,通过构图工艺形成反光区包括:在所述基板上沉积一层反光薄膜;在所述反光薄膜上旋涂一层光刻胶薄膜;所述基板经过曝光、显影和刻蚀工序暴露出每个子光栅的开口区并剥离基板上残余的光刻胶。
图9(e2)所示的在所述基板上沉积一层反光薄膜,通过构图工艺形成反光区,在上述基础上,在所述反光薄膜上旋涂一层光刻胶薄膜之前,还包括:用带有棱镜图案的模具压合反光薄膜以形成棱镜式反光薄膜。这样使得从反光区反射出的光线强度均一。
值得说明的是,所述基板可以是玻璃基板或者彩膜基板或者阵列基板;在所述基板为彩膜基板时,所述彩膜基板上仅沉积透明导电薄膜;在所述基板为阵列基板时,在所述在基板上依次沉积氮化硅薄膜之前,还包括:在所述阵列基板上沉积透明导电薄膜。
本发明实施例提供的光栅片、液晶显示装置及光栅片、液晶面板的制造方法,由于光栅片由多个平行设置的三原色光栅组成,三原色光线栅包括红色R子光栅、绿色G子光栅和蓝色B子光栅,每个子光栅包括开口区和反光区,所述反光区设置在所述开口区的四周,所述子光栅对应于阵列基板上的像素单元,从而使得光栅片实现了对R、G、B色彩的显示,并且由于每个子光栅还包括反光区,使得从背光源射出的未能从光栅片透过的光线从反光区反射到背光源上,由背光源再次反射给光栅片,实现了未透过光线的再次利用,解决了现有技术中由背光源照射出来的一部分光线会被黑矩阵区域吸收导致光线白白浪费掉,使用率较差的问题。
如图10所示,本发明实施例提供的液晶面板的制造方法,包括:
步骤1001,形成彩膜基板,所述彩膜基板上仅沉积透明导电薄膜。
步骤1002,形成阵列基板,所述阵列基板上形成有横纵交叉的数据线和栅线,所述数据线和所述栅线围设形成像素单元。
步骤1003,形成上述的光栅片,所述光栅片形成在玻璃基板、阵列基板或者彩膜基板上。
步骤1004,在所述光栅片形成在玻璃基板上时,对盒所述阵列基板与所述光栅片或者对盒所述彩膜基板与光栅片。
步骤1005,在所述光栅片形成在所述阵列基板或所述彩膜基板上时,对盒阵列基板与彩膜基板。
本发明实施例提供的液晶面板的制造方法,由于光栅片由多个平行设置的三原色光栅组成,三原色光线栅包括红色R子光栅、绿色G子光栅和蓝色B子光栅,每个子光栅包括开口区和反光区,所述反光区设置在所述开口区的四周,所述子光栅对应于阵列基板上的像素单元,从而使得光栅片实现了对R、G、B色彩的显示,并且由于每个子光栅还包括反光区,使得从背光源射出的未能从光栅片透过的光线从反光区反射到背光源上,由背光源再次反射给光栅片,实现了未透过光线的再次利用,解决了现有技术中由背光源照射出来的一部分光线会被黑矩阵区域吸收导致光线白白浪费掉,使用率较差的问题。
本发明实施例提供的光栅片、液晶显示装置及光栅片、液晶面板的制造方法应用在带有液晶显示的系统中。
以上所述,仅为本发明的具体实施方式,但本发明的保护范围并不局限于此,任何熟悉本技术领域的技术人员在本发明揭露的技术范围内,可轻易想到变化或替换,都应涵盖在本发明的保护范围之内。因此,本发明的保护范围应以所述权利要求的保护范围为准。
Claims (15)
1.一种光栅片,其特征在于,包括多个平行设置的三原色光栅,所述三原色光栅包括红色R子光栅、绿色G子光栅和蓝色B子光栅,所述红色R子光栅、绿色G子光栅和蓝色B子光栅之间平行设置,每个子光栅包括开口区,所述开口区设有用于衍射的金属层,所述开口区的四周设有反光区,所述子光栅对应于阵列基板上的像素单元。
2.根据权利要求1所述的光栅片,其特征在于,所述反光区为镜面式反光区。
3.根据权利要求1所述的光栅片,其特征在于,所述反光区为棱镜式反光区。
4.根据权利要求1所述的光栅片,其特征在于,所述用于衍射的金属层为铝金属层。
5.根据权利要求1-4任一项所述的光栅片,其特征在于,
所述R子光栅包括:l=0.813um,Φ=20%,t=80nm,d=20nm;
所述G子光栅包括:l=0.813um,Φ=36%,t=60nm,d=40nm;
所述B子光栅包括:l=0.813um,Φ=47%,t=40nm,d=60nm;
其中l为子光栅的周期长度,Φ为占空比,Φ=w/l,w为子光栅开口区的开口宽度,t为子光栅上用于衍射的金属层的厚度,d为开口区与反光区之间的层间距。
6.一种液晶显示装置,其特征在于,包括如权利要求1-5任一项所述的光栅片,所述光栅片位于背光源的出光侧。
7.根据权利要求6所述的液晶显示装置,其特征在于,所述光栅片位于所述背光源与下偏振片之间;或者
所述光栅片位于所述下偏振片与液晶面板之间;或者
所述光栅片位于所述液晶面板的阵列基板与液晶层之间;或者
所述光栅片位于所述液晶面板的彩膜基板与液晶层之间;或者
所述光栅片位于所述液晶面板与上偏振片之间;或者
所述光栅片位于所述上偏振片的出光侧。
8.根据权利要求7所述的液晶显示装置,其特征在于,所述背光源的保护膜与棱镜膜之间设有反射膜;或者所述背光源的保护膜的出光侧表面为镜面式表面。
9.根据权利要求7或8所述的液晶显示装置,其特征在于,所述液晶面板的彩膜基板上设有透明导电层。
10.一种光栅片的制造方法,其特征在于,包括:
在基板上依次沉积氮化硅薄膜,通过构图工艺形成红色R子线栅、绿色G子线栅和蓝色B子线栅并在所述基板上镀一层金属薄膜以形成相互平行的红色R子光栅、绿色G子光栅和蓝色B子光栅;
在所述基板上沉积一层反光薄膜,通过构图工艺形成反光区,所述反光区位于每个子光栅的开口区的四周。
11.根据权利要求10所述的方法,其特征在于,在所述基板上沉积一层反光薄膜,通过构图工艺形成反光区,所述反光区位于每个子光栅的开口区的四周,包括:
在所述基板上沉积一层反光薄膜;
在所述反光薄膜上旋涂一层光刻胶薄膜;
所述基板经过曝光、显影和刻蚀工序暴露出每个子光栅的开口区并剥离基板上残余的光刻胶。
12.根据权利要求11所述的方法,其特征在于,所述在所述反光薄膜上旋涂一层光刻胶薄膜之前,还包括:
用带有棱镜图案的模具压合反光薄膜以形成棱镜式反光薄膜。
13.根据权利要求10-12任一项所述的方法,其特征在于,所述在基板上依次沉积氮化硅薄膜中,所述基板为玻璃基板或者仅沉积透明导电薄膜的彩膜基板或者阵列基板;
在所述基板为阵列基板时,在所述在基板上依次沉积氮化硅薄膜之前,还包括:在所述阵列基板上沉积透明导电薄膜。
14.根据权利要求10-12任一项所述的方法,其特征在于,
所述R子光栅包括:l=0.813um,Φ=20%,t=80nm,d=20nm;
所述G子光栅包括:l=0.813um,Φ=36%,t=60nm,d=40nm;
所述B子光栅包括:l=0.813um,Φ=47%,t=40nm,d=60nm;
其中l为子光栅的周期长度,Φ为占空比,Φ=w/l,w为子光栅开口区的开口宽度,t为子光栅上用于衍射的金属层的厚度,d为开口区与反光区之间的层间距。
15.一种液晶面板的制造方法,其特征在于,包括:
形成彩膜基板,所述彩膜基板上仅沉积透明导电薄膜;
形成阵列基板,所述阵列基板上形成有横纵交叉的数据线和栅线,所述数据线和所述栅线围设形成像素单元;
形成如权利要求1-5任一项所述的光栅片,所述光栅片形成在玻璃基板、阵列基板或者彩膜基板上;
在所述光栅片形成在玻璃基板上时,对盒所述阵列基板与所述光栅片或者对盒所述彩膜基板与光栅片;
在所述光栅片形成在所述阵列基板或所述彩膜基板上时,对盒阵列基板与彩膜基板。
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