CN102479836A - Solar cell with high photoelectric conversion efficiency and high-low temperature intrinsic amorphous silicon layers - Google Patents
Solar cell with high photoelectric conversion efficiency and high-low temperature intrinsic amorphous silicon layers Download PDFInfo
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- CN102479836A CN102479836A CN2010105629115A CN201010562911A CN102479836A CN 102479836 A CN102479836 A CN 102479836A CN 2010105629115 A CN2010105629115 A CN 2010105629115A CN 201010562911 A CN201010562911 A CN 201010562911A CN 102479836 A CN102479836 A CN 102479836A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
Abstract
The invention relates to a solar cell with high photoelectric conversion efficiency and high-low temperature intrinsic amorphous silicon layers. The solar cell comprises a transparent substrate, a first electrode, a second electrode, an infrared light conversion layer, a first n-type semiconductor layer, the high temperature intrinsic amorphous silicon layer, a first p-type semiconductor layer, a second n-type semiconductor layer, the low temperature intrinsic amorphous silicon layer and a second p-type semiconductor layer, wherein the first n-type semiconductor layer is positioned between the high temperature intrinsic amorphous silicon layer and the second electrode, and the infrared light conversion layer is arranged between the first n-type semiconductor layer and the second electrode or between the second p-type semiconductor layer and the first electrode and used for converting infrared light into visible light.
Description
Technical field
The present invention relates to a kind of solar cell, particularly relate to a kind of high-photoelectric transformation efficiency (photoelectric conversion efficiency, PCE) solar cell with high and low temperature amorphous silicon intrinsic layer.
Background technology
Solar energy is a kind of clean pollution-free and inexhaustible energy, when solution pollution that present fossil energy faced and problem of shortage, is the focus that attracts most attention always.Because solar cell can be an electric energy with solar energy converting directly, therefore become present considerable research topic.
Silica-based solar cell is the common a kind of solar cell of industry.The principle of silica-based solar cell is that the p N-type semiconductor N is engaged with the n N-type semiconductor N, connects face to form p-n.When solar irradiation was mapped to the semiconductor with this p-n junction structure, the energy that photon provided can come out the electron excitation in the semiconductor and to produce electronics electricity hole right.Electronics and electric hole all can receive the influence of built in potential, make the direction of the past electric field in electric hole move, and electronics then moves toward opposite direction.If this solar cell and load (load) are coupled together with lead, then can form a loop (loop), and can make electric current flow through load, this is the principle of solar cell power generation.
Along with environmental consciousness comes back, the notion of carbon reduction is paid attention to by everybody gradually, and the development and utilization of the renewable energy resources becomes the emphasis that development is actively dropped in countries in the world.At present, the key issue of solar cell is the lifting of its photoelectric conversion efficiency, and the photoelectric conversion efficiency that can promote solar cell promptly means the lifting of product competitiveness.
Summary of the invention
Because above-mentioned existing in prior technology defective; The objective of the invention is to; A kind of high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer is provided; Make it can be by the visible light that solar cell utilized, to improve photoelectric conversion efficiency with being converted into by the infrared light that solar cell utilized.
To achieve these goals; According to a kind of high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer that the present invention proposes, it comprises transparency carrier, first electrode, second electrode, a n type semiconductor layer, a p type semiconductor layer, high-temperature amorphous silicon intrinsic layer (intrinsiclaycr), the 2nd n type semiconductor layer, the 2nd p type semiconductor layer, low temperature amorphous silicon intrinsic layer and infrared light conversion layer (infrared light conversion layer); This first electrode is disposed on the transparency carrier; This second electrode is disposed between first electrode and the transparency carrier; The one n type semiconductor layer, high-temperature amorphous silicon intrinsic layer, a p type semiconductor layer, the 2nd n type semiconductor layer, low temperature amorphous silicon intrinsic layer and the 2nd p type semiconductor layer are disposed between first electrode and second electrode in regular turn, and a n type semiconductor layer is between the high-temperature amorphous silicon intrinsic layer and second electrode; This infrared light conversion layer is disposed between a n type semiconductor layer and second electrode or between the 2nd p type semiconductor layer and first electrode, in order to convert infrared light into visible light.
The present invention also can adopt following technical measures further to realize.
Aforesaid high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer, the material of wherein said infrared light conversion layer for example are rare earth (rare earth) element.
Aforesaid high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer, wherein said rare earth element for example are lanthanum (La) series elements.
Aforesaid high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer, wherein said visible light for example are green glow or bluish-green mixed light.
Aforesaid high-photoelectric transformation efficiency solar cell, the material of wherein said first electrode and second electrode with high and low temperature amorphous silicon intrinsic layer for example be transparent conductive oxide (transparentconductive oxide, TCO).
Aforesaid high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer, the material of a wherein said p type semiconductor layer, the 2nd p type semiconductor layer, a n type semiconductor layer and the 2nd n type semiconductor layer for example is amorphous silicon or microcrystal silicon.
Aforesaid high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer, the material of wherein said transparency carrier for example are glass.
Aforesaid high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer; Wherein when infrared light conversion layer is between the first n type semiconductor layer and second electrode, can also between first electrode and the 2nd p type semiconductor layer, dispose semi-transparent metal layer.
Aforesaid high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer; Wherein when infrared light conversion layer is between the second p type semiconductor layer and first electrode, can also between second electrode and a n type semiconductor layer, dispose semi-transparent metal layer.
Aforesaid high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer, the material of wherein said semi-transparent metal layer for example are aluminium or transition metal (transition metal).
The present invention compared with prior art has tangible advantage and beneficial effect.By technique scheme, the high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer of the present invention has advantage at least:
One, the high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer of the present invention; When sunlight when second electrode side gets into solar cell; The present invention disposes the infrared light conversion layer and converts infrared light into intrinsic layer absorbable visible light between a n type semiconductor layer and second electrode; Perhaps when sunlight when first electrode side gets into solar cell; The present invention disposes the infrared light conversion layer and converts infrared light into intrinsic layer absorbable visible light between the 2nd p type semiconductor layer and first electrode, therefore can promote the photoelectric conversion efficiency of solar cell significantly.
Two, the high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer of the present invention; Owing to the infrared light in the sunlight that exposes to solar cell is converted into visible light; The heat history effect that therefore can reduce infrared light significantly and caused, and then improve the usefulness of solar cell.
Three, the high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer of the present invention; Infrared light as if in the sunlight that exposes to solar cell is converted into green glow or bluish-green mixed light; Solar cell then of the present invention need can be applied to the agricultural or the industry of flowers and plants of more green glow or bluish-green mixed light, cultivates to help crops and flowers.
For letting the above-mentioned feature and advantage of the present invention can be more obviously understandable, hereinafter is special lifts embodiment, and cooperates appended graphic elaborating as follows.
Description of drawings
Fig. 1 is the cross-sectional schematic of the high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer of one embodiment of the invention.
Fig. 2 is the cross-sectional schematic of the high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer of another embodiment of the present invention.
Fig. 3 is the cross-sectional schematic of the high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer of yet another embodiment of the invention.
Fig. 4 is the cross-sectional schematic of the high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer of further embodiment of this invention.
10,20,30,40: solar cell 100: transparency carrier
102,104: electrode 106,112:n type semiconductor layer
108: high-temperature amorphous silicon intrinsic layer 110,116:p type semiconductor layer
114: low temperature amorphous silicon intrinsic layer 118: infrared light conversion layer
120: sunlight 122: semi-transparent metal layer
Embodiment
Reach technological means and the effect that predetermined goal of the invention is taked for further setting forth the present invention; Below in conjunction with accompanying drawing and preferred embodiment, its embodiment of high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer, step, structure, characteristic and the effect thereof that proposes according to the present invention specified.
See also shown in Figure 1ly, be the cross-sectional schematic of the high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer of one embodiment of the invention.In this article, " high-temperature amorphous silicon intrinsic layer " be expression with the formed amorphous silicon of high temperature process intrinsic layer, and " low temperature amorphous silicon intrinsic layer " is that expression is with the formed amorphous silicon of low temperature process intrinsic layer.
Please with reference to Fig. 1, solar cell 10 comprises transparency carrier 100, electrode 102, electrode 104, n type semiconductor layer 106, high-temperature amorphous silicon intrinsic layer 108, p type semiconductor layer 110, n type semiconductor layer 112, low temperature amorphous silicon intrinsic layer 114, p type semiconductor layer 116 and infrared light conversion layer 118.
The material of transparency carrier 100 for example is a glass.Electrode 102 is disposed on the transparency carrier 100.The material of electrode 102 for example is a transparent conductive oxide.Above-mentioned transparent conductive oxide can be indium tin oxide (indium tin oxide, IT0), aluminum zinc oxide (Al doped ZnO, AZ0), indium-zinc oxide (indium zinc oxide, IZO) or other transparent conductive materials.Electrode 104 is disposed between electrode 102 and the transparency carrier 100.The material of electrode 104 for example is transparent conductive oxide (for example indium tin oxide, aluminum zinc oxide, indium-zinc oxide or other transparent conductive material).
N type semiconductor layer 106, high-temperature amorphous silicon intrinsic layer 108, p type semiconductor layer 110, n type semiconductor layer 112, low temperature amorphous silicon intrinsic layer 114 and p type semiconductor layer 116 are disposed between electrode 102 and the electrode 104 in regular turn, and n type semiconductor layer 106 is between high-temperature amorphous silicon intrinsic layer 108 and electrode 104.The material of n type semiconductor layer 106,112 is amorphous silicon or microcrystal silicon for example, and the material that is mixed in the n type semiconductor layer 106,112 for example is the group that is selected from VA family element in the periodic table of elements, and it can be phosphorus (P), arsenic (As), antimony (Sb) or bismuth (Bi).The material of p type semiconductor layer 110,116 for example is amorphous silicon or microcrystal silicon; And the material that is mixed in the p type semiconductor layer 110,116 for example is the group that is selected from IIIA family element in the periodic table of elements, and it can be boron (B), aluminium (Al), gallium (Ga), indium (In) or thallium (Tl).High-temperature amorphous silicon intrinsic layer 108 for example is to utilize high temeperature chemistry gas phase Shen to amass the formed amorphous silicon material layer of processing procedure.Low temperature amorphous silicon intrinsic layer 114 utilizes cryochemistry gas phase Shen to amass the formed amorphous silicon material layer of processing procedure.High-temperature amorphous silicon intrinsic layer 108 and low temperature amorphous silicon intrinsic layer 114 be visible light absorbing all; And high-temperature amorphous silicon intrinsic layer 108 has preferable absorptivity (green glow is had best absorptivity) for green glow and bluish-green mixed light, and low temperature amorphous silicon intrinsic layer 114 has preferable absorptivity for gold-tinted and orange light.High-temperature amorphous silicon intrinsic layer 108 and low temperature amorphous silicon intrinsic layer 114 produce electronics-right main region in electric hole as light.
Infrared light conversion layer 118 is disposed between n type semiconductor layer 106 and the electrode 104, in order to convert infrared light into visible light.The material of infrared light conversion layer 118 for example is rare earth element, for example lanthanide series.At length say; For general solar cell; When solar irradiation is incident upon solar cell; Because the intrinsic layer that with the amorphous silicon is material can't absorb the infrared light (it accounts for 50% in sunlight) in the sunlight, so infrared light can directly pass solar cell and can't be utilized, and makes the photoelectric conversion efficiency of solar cell to promote significantly.Yet; In the present embodiment; When sunlight 120 passed transparency carrier 100 and exposes to infrared light conversion layer 118, infrared light conversion layer 118 can be by the visible light that solar cell utilized with being converted into by the infrared light that solar cell utilized in the sunlight 120.
In the present embodiment, after the infrared light in the sunlight 120 was converted into visible light by infrared light conversion layer 118, most visible light can be earlier absorbed by high-temperature amorphous silicon intrinsic layer 108.In addition, the visible light that is not absorbed by high-temperature amorphous silicon intrinsic layer 108 can be absorbed by low temperature amorphous silicon intrinsic layer 114 subsequently.That is to say, change and after the visible light that forms getting into solar cell 10, almost can fully be absorbed with low temperature amorphous silicon intrinsic layer 114 by high-temperature amorphous silicon intrinsic layer 108 through infrared light conversion layer 118.Compare with general solar cell; Since in sunlight 120, can't be converted into by the infrared light that solar cell utilized can be by the visible light that solar cell utilized after; Increased the amount of the visible light that exposes to high-temperature amorphous silicon intrinsic layer 108 and low temperature amorphous silicon intrinsic layer 114; And visible light is almost entirely absorbed by high-temperature amorphous silicon intrinsic layer 108 and low temperature amorphous silicon intrinsic layer 114, so solar cell 10 can have higher photoelectric conversion efficiency.
In one embodiment; Because high-temperature amorphous silicon intrinsic layer 108 has preferable absorptivity (absorptivity that has the best for green glow) for green glow and bluish-green mixed light; Therefore can wait by kind, the proportion of composing of adjustment infrared light conversion layer 118 middle rare earth elements and convert the infrared light in the sunlight 120 into green glow or bluish-green mixed light, to promote the photoelectric conversion efficiency of solar cell 10 further.In addition; Because low temperature amorphous silicon intrinsic layer 114 has preferable absorptivity for gold-tinted and orange light; Therefore the gold-tinted that is not absorbed by high-temperature amorphous silicon intrinsic layer 108 can be absorbed by low temperature amorphous silicon intrinsic layer 114 with orange light, thereby reaches the effect of raising photoelectric conversion efficiency.
Special one what carry is that through after the solar cell 10, unabsorbed part can be utilized further through green glow that infrared light conversion layer 118 is converted to or bluish-green mixed light.For instance, form through infrared light conversion layer 118 conversion and unabsorbed green glow or bluish-green mixed light can mix with the unabsorbed visible light that originally passes solar cell 10 and produce the light of different colours.Therefore, if solar cell 10 is applied in the architectural design, then can looks actual demand and adjust and demonstrate the light that is different from white light.In addition, as if the agricultural or the industry of flowers and plants that solar cell 10 need to be applied to more green glow or bluish-green mixed light, then can help crops and flowers to cultivate.
Moreover; Owing to the infrared light in the sunlight 120 that exposes to solar cell 10 has been converted into visible light; The heat history effect that is produced when therefore infrared light exposes to solar cell can be reduced significantly, makes solar cell 10 after sunlight 120 irradiations, still can maintain the temperature identical with context.In addition,, therefore can further avoid causing the problem of photoelectric conversion efficiency reduction, and then reach the purpose of the usefulness that promotes solar cell because of the heat history effect because the heat history effect is reduced significantly.
See also shown in Figure 2ly, be the cross-sectional schematic of the high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer of another embodiment of the present invention.As shown in Figure 2, in another embodiment, can also between electrode 102 and p type semiconductor layer 116, dispose semi-transparent metal layer 122.The material of semi-transparent metal layer 122 for example is aluminium or transition metal.In the present embodiment, when the direction of sunlight 120 self-induced transparency substrates 100 exposed to solar cell 20, unabsorbed green glow or bluish-green mixed light and other unabsorbed visible lights can pass through semi-transparent metal layer 122 and pass solar cell 20.At this moment, can control the color and the amount of light of the light that passes solar cell 20 by the thickness of adjustment semi-transparent metal layer 122.
At length say; If the thinner thickness of semi-transparent metal layer 122, the light intensity that then passes solar cell 20 is bigger, and contains more green glow or bluish-green mixed light; Therefore need can be applied to the agricultural or the industry of flowers and plants of more green glow or bluish-green mixed light equally, cultivate to help crops and flowers; If the thickness of semi-transparent metal layer 122 is thicker, the light intensity that then passes solar cell 20 is less, and contains less green glow or bluish-green mixed light.
In addition, the visible light of part also can be got into high-temperature amorphous silicon intrinsic layer 108 and low temperature amorphous silicon intrinsic layer 114 by semi-transparent metal layer 122 reflections once more, and is absorbed by high-temperature amorphous silicon intrinsic layer 108 and low temperature amorphous silicon intrinsic layer 114.
In the above-described embodiments, sunlight 120 all is that the direction of self-induced transparency substrate 100 exposes to solar cell.In following examples, sunlight 120 also can be to expose to solar cell by opposite side.At this moment, infrared light conversion layer 118 must be disposed between electrode 102 and the p type semiconductor layer 116.
See also shown in Figure 3ly, be the cross-sectional schematic of the high-photoelectric transformation efficiency solar cell that yet another embodiment of the invention illustrated with high and low temperature amorphous silicon intrinsic layer.Please with reference to Fig. 3, in the present embodiment, solar cell 30 is with the difference of solar cell 10: in solar cell 30, infrared light conversion layer 118 is disposed between electrode 102 and the p type semiconductor layer 116.When the direction of sunlight 120 self-electrodes 102 is shone solar cell 30; 118 meetings of infrared light conversion layer can be by the visible light that solar cell utilized with being converted into by the infrared light that solar cell utilized in the sunlight 120; The visible light of a part is absorbed by low temperature amorphous silicon intrinsic layer 114 earlier then; And the visible light that is not absorbed by low temperature amorphous silicon intrinsic layer 114 can be absorbed by high-temperature amorphous silicon intrinsic layer 108, therefore can reach the effect that improves photoelectric conversion efficiency equally.
Certainly, in another embodiment, can in solar cell 30, dispose semi-transparent metal layer 122 equally.As shown in Figure 4, in solar cell 40, semi-transparent metal layer 122 is disposed between electrode 104 and the n type semiconductor layer 106.Therefore, solar cell 40 also can have the effect identical with solar cell 20.
Though the present invention discloses as above with preferred embodiment, so be not the scope of implementing in order to qualification the present invention, the simple equivalent of doing according to claims of the present invention and description changes and modification, still belongs in the scope of technical scheme of the present invention.
Claims (10)
1. high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer is characterized in that comprising:
One transparency carrier;
One first electrode is disposed on this transparency carrier;
One second electrode is disposed between this first electrode and this transparency carrier;
One the one n type semiconductor layer, a high-temperature amorphous silicon intrinsic layer, one the one p type semiconductor layer, one the 2nd n type semiconductor layer, a low temperature amorphous silicon intrinsic layer and one the 2nd p type semiconductor layer; Be disposed in regular turn between this first electrode and this second electrode, and a n type semiconductor layer is between this high-temperature amorphous silicon intrinsic layer and this second electrode; And
One infrared light conversion layer is disposed between a n type semiconductor layer and this second electrode or between the 2nd p type semiconductor layer and this first electrode, in order to infrared light is converted into a visible light.
2. the high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer as claimed in claim 1, the material that it is characterized in that wherein said infrared light conversion layer is a rare earth element.
3. the high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer as claimed in claim 2 is characterized in that wherein said rare earth element is a lanthanide series.
4. the high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer as claimed in claim 1 is characterized in that wherein said visible light is green glow or bluish-green mixed light.
5. the high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer as claimed in claim 1, the material that it is characterized in that wherein said first electrode and this second electrode is a transparent conductive oxide.
6. the high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer as claimed in claim 1 is characterized in that the material of a wherein said p type semiconductor layer, the 2nd p type semiconductor layer, a n type semiconductor layer and the 2nd n type semiconductor layer is amorphous silicon or microcrystal silicon.
7. the high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer as claimed in claim 1, the material that it is characterized in that wherein said transparency carrier is a glass.
8. the high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer as claimed in claim 1; It is characterized in that wherein when infrared light conversion layer is between a n type semiconductor layer and this second electrode; Also comprise a semi-transparent metal layer, be disposed between this first electrode and the 2nd p type semiconductor layer.
9. the high-photoelectric transformation efficiency solar cell with high and low temperature amorphous silicon intrinsic layer as claimed in claim 1; It is characterized in that wherein when infrared light conversion layer is between the 2nd p type semiconductor layer and this first electrode; Also comprise a semi-transparent metal layer, be disposed between this second electrode and the n type semiconductor layer.
10. like claim 8 or 9 described high-photoelectric transformation efficiency solar cells with high and low temperature amorphous silicon intrinsic layer, the material that it is characterized in that wherein said semi-transparent metal layer is aluminium or transition metal.
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| CN2010105629115A CN102479836A (en) | 2010-11-24 | 2010-11-24 | Solar cell with high photoelectric conversion efficiency and high-low temperature intrinsic amorphous silicon layers |
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| CN2010105629115A CN102479836A (en) | 2010-11-24 | 2010-11-24 | Solar cell with high photoelectric conversion efficiency and high-low temperature intrinsic amorphous silicon layers |
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