CN102403322A - Image detecting element - Google Patents

Image detecting element Download PDF

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Publication number
CN102403322A
CN102403322A CN2010102741931A CN201010274193A CN102403322A CN 102403322 A CN102403322 A CN 102403322A CN 2010102741931 A CN2010102741931 A CN 2010102741931A CN 201010274193 A CN201010274193 A CN 201010274193A CN 102403322 A CN102403322 A CN 102403322A
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anti
reflection film
plurality
reflection
image
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CN2010102741931A
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Chinese (zh)
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陈晖暄
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原相科技股份有限公司
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Publication of CN102403322A publication Critical patent/CN102403322A/en

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Abstract

The invention discloses an image detecting element, which comprises a substrate, a colorful filter layer, a plurality of micro lenses and antireflection units; the substrate is provided with a plurality of detecting units, while the colorful filter layer covers the detecting units. The micro lenses are configured on the colorful filter layer, and the micro lenses are corresponding to the detecting units respectively. In addition, the antireflection units are configured on the micro lenses. Each antireflection unit comprises a plurality of antireflection films overlapped on the corresponding micro lenses; and the refractive indexes of the adjacent two antireflection films are different. The image detecting element is featured with good image detecting quality.

Description

影像检测元件 Image detecting element

技术领域 FIELD

[0001] 本发明有关于一种影像检测元件,且特别是有关于一种具有抗反射膜的影像检测元件。 Invention relates to an image detecting element [0001] This, and more particularly relates to an image detecting element having the antireflection film.

背景技术 Background technique

[0002] 影像检测元件已被广泛地应用在多种电子产品中,如数码相机、行动电话、摄影机、扫描器等。 [0002] image sensing element has been widely used in a variety of electronic products such as digital cameras, mobile phones, cameras, scanners and so on. 常见的影像检测元件包括电荷耦合元件(charge coupled device, (XD)与金属氧化物半导体(complementary metal oxide semiconductor, CMOS)影像检测元件。 这些影像检测元件通常包括一基底(substrate),且基底上形成有呈阵列排列的多个检测单元,而这些检测单元用以检测光线。 Common image detecting element includes a charge-coupled device (charge coupled device, (XD) with a metal oxide semiconductor (complementary metal oxide semiconductor, CMOS) image detection element. These image detecting element typically includes a substrate (substrate), and is formed on a substrate a plurality of detection units arranged in an array, and these detection means for detecting light.

[0003] 承上述,为了让影像检测元件所检测到的影像为彩色影像,基底上通常形成有一彩色滤光层(color filter layer)。 [0003] Bearing the above in order for the image sensing element to the detected image is a color image is generally formed on a substrate with a color filter layer (color filter layer). 此外,为了提高每一检测单元的检测范围,在彩色滤光层上会形成多个微透镜,而这些微透镜分别对应这些检测单元。 In order to improve the detection range of each detection unit, in the color filter layer formed on the plurality of microlenses, the microlenses respectively corresponding to these detection units.

[0004] 虽然微透镜可提高每一检测单元的检测范围,但因微透镜的入光效率不佳,导致光线入射微透镜时容易产生杂散光。 [0004] Although easy to produce stray light may increase the detection range of the microlenses of each detection means, but the poor light efficiency of the microlens, the microlenses cause incident light. 如此,每一检测单元容易检测到从邻近的微透镜散射而来的杂散光,导致影像检测元件所检测到的影像品质不佳。 Thus, each detection unit is easy to detect stray light from the adjacent microlenses come scattering, resulting in poor image detection elements of the detected image quality.

发明内容 SUMMARY

[0005] 本发明的目的在于,提供一种影像检测元件,以提升影像检测品质。 Objective [0005] The present invention is to provide an image detection element, to improve the quality of image detection.

[0006] 为达上述优点,本发明提出一种影像检测元件,其包括一基底、一彩色滤光层、多个微透镜以及多个抗反射单元。 [0006] To achieve the above advantages, the present invention provides an image detecting element which includes a substrate, a color filter layer, a plurality of micro lenses and a plurality of anti-reflection means. 基底具有多个检测单元,而彩色滤光层覆盖这些检测单元。 A substrate having a plurality of detecting means, and the color filter layer covering the detection unit. 这些微透镜配置于彩色滤光层上,且这些微透镜分别对应这些检测单元。 These micro lenses arranged on the color filter layer, and microlenses respectively corresponding to these detection units. 此外,这些抗反射单元分别配置于这些微透镜上。 In addition, these units are disposed on the antireflection microlenses. 每一抗反射单元包括堆叠于对应的微透镜上的多个抗反射膜,且相邻的二抗反射膜的折射率不同。 Each unit comprises a stacked plurality of anti-reflection anti-reflection film on the corresponding microlens, two different refractive indices and adjacent antireflective film.

[0007] 在本发明的一实施例中,上述的每一抗反射单元包括一第一抗反射膜与一第二抗反射膜。 [0007] In an embodiment of the present invention, each of the above anti-reflection means comprises a first anti-reflection film and a second anti-reflection film. 第一抗反射膜配置于对应的微透镜上,而第二抗反射膜配置于第一抗反射膜上,且第一抗反射膜的折射率低于第二抗反射膜的折射率。 The first anti-reflection film disposed on the corresponding microlens, and a second antireflective film disposed on the first antireflection film having a refractive index lower than the refractive index of the first anti-reflection film of the second anti-reflection film.

[0008] 在本发明的一实施例中,上述的每一抗反射单元包括多个第一抗反射膜与多个第二抗反射膜。 [0008] In an embodiment of the present invention, each of the above plurality of a first anti-reflective means comprises a plurality of anti-reflection film and the second anti-reflection film. 第一抗反射膜与第二抗反射膜交替堆叠于对应的微透镜上,这些第一抗反射膜其中的一接触对应的微透镜,且第一抗反射膜的折射率低于第二抗反射膜的折射率。 The first anti-reflection film and the second anti-reflection film are alternately stacked on the corresponding microlens, the first anti-reflection film in contact with a corresponding one of the microlenses, and the refractive index of the first anti-reflection film is less than a second antireflection refractive index film.

[0009] 在本发明的一实施例中,上述的第一抗反射膜的折射率为Ni,第二抗反射膜的折射率为N2,且N2大于或等于附。 [0009] In an embodiment of the present invention, the refractive index of the first anti-reflection film is Ni, the refractive index of the second anti-reflection film is N2, and N2 is greater than or equal to attachment.

[0010] 在本发明的一实施例中,上述的影像检测元件更包括一保护层,配置于基底与彩色滤光层之间。 [0010] In an embodiment of the present invention, the above-described image detecting element further comprises a protective layer disposed between the substrate and the color filter layer.

[0011] 在本发明的一实施例中,上述的抗反射膜的材质包括二氧化钛(TiO2)、氟化镁(MgF2)或氟化锌(ZnF2)。 [0011] In an embodiment of the present invention, the material of the antireflection film include titanium dioxide (TiO2), magnesium fluoride (MgF2) or zinc fluoride (ZnF2). [0012] 在本发明的影像检测元件中,由于每一微透镜上设有抗反射单元,所以可增加微透镜的入光效率并减少杂散光的产生,进而降低检测单元检测到杂散光的机率。 [0012] In the image detection device of the present invention, since the anti-reflection means is provided on each of the microlenses, the microlenses can increase the chance of light efficiency and reduce the generation of stray light, thereby reducing stray light detection unit detects the . 因此,本发明的影像检测元件具有较佳的影像检测品质。 Accordingly, the image detecting element of the present invention has better image quality is detected.

[0013] 为让本发明的上述和其他目的、特征和优点能更明显易懂,下文特举较佳实施例, 并配合附图,作详细说明如下。 [0013] In order to make the above and other objects, features and advantages of the present invention can be more fully understood by reading the following preferred embodiments accompanied with figures are described in detail below.

附图说明 BRIEF DESCRIPTION

[0014] 图1是本发明一实施例的一种影像检测元件的示意图。 [0014] FIG. 1 is a schematic view of an image sensing element according to an embodiment of the present invention.

[0015] 图2是本发明另一实施例的一种影像检测元件的示意图。 [0015] FIG. 2 is a schematic view of an image sensing element according to another embodiment of the present invention.

[0016] 主要元件符号说明:[0017] 100、100' :影像检测元件 110:基底 [0016] Description of Symbols main components: [0017] 100, 100 ': the image detecting element 110: a substrate

[0018] 112:检测单元 120:彩色滤光层 [0018] 112: detection unit 120: color filter layer

[0019] 122、124、126 :彩色滤光图案 1¾ :平坦层 [0019] 124, 126: Color filter patterns 1¾: planarization layer

[0020] 130:微透镜1 40、140,:抗反射膜 [0020] 130: 1 40,140 microlens antireflection film ,:

[0021] 142:第一抗反射膜 144:第二抗反射膜 [0021] 142: a first anti-reflection film 144: a second anti-reflection film

[0022] 150 :保护层 [0022] 150: protective layer

具体实施方式 Detailed ways

[0023] 图1是本发明一实施例的一种影像检测元件的示意图。 [0023] FIG. 1 is a schematic view of an image sensing element according to an embodiment of the present invention. 请参照图1,本实施例的影像检测元件100可为电荷耦合元件与金属氧化物半导体影像检测元件,但不以此为限。 Referring to FIG 1, an image detecting element according to the present embodiment may be a charge coupled element 100 and the metal oxide semiconductor image sensing element, but is not limited thereto. 此影像检测元件100包括一基底110、一彩色滤光层120、多个微透镜130以及多个抗反射单元140。 This video detector device 100 includes a substrate 110, a color filter layer 120, a plurality of micro lenses 130 and a plurality of anti-reflection units 140. 基底110具有多个检测单元112,而彩色滤光层120覆盖这些检测单元112。 A substrate 110 having a plurality of detection units 112, and the color filter layer 120 covers the detection unit 112. 这些微透镜130配置于彩色滤光层120上,且这些微透镜130分别对应这些检测单元112。 The microlens 130 is disposed on the color filter layer 120, and microlenses 130 corresponding to the detecting unit 112 respectively. 此外,这些抗反射单元140分别配置于这些微透镜130上。 Further, these antireflective units 140 are respectively disposed on the microlenses 130.

[0024] 上述的基底110例如为硅基底。 [0024] The substrate 110 is a silicon substrate. 形成于基底110的检测单元112例如是呈阵列排列,且这些检测单元112用以检测光线。 Formed on the substrate 110, for example, a detection unit 112 arranged in an array, and the detection unit 112 for detecting light. 此外,彩色滤光层120包括多个彩色滤光图案, 如彩色滤光图案122、124、126,而这些彩色滤光图案122、124、126的材质例如为彩色光阻(color resist)。 Further, the color filter layer 120 includes a plurality of color filter patterns, such as the color filter patterns 122, 124, 122, 124, these color filter patterns, for example, a color resist material (color resist). 彩色滤光图案122、彩色滤光图案124与彩色滤光图案126的颜色不同。 The color filter pattern 122, the color filter patterns 124 and the color of the color filter patterns 126 are different. 举例来说,彩色滤光图案122的颜色例如为红色,彩色滤光图案124的颜色例如为绿色,而彩色滤光图案126的颜色例如为蓝色。 For example, the color of the color filter pattern 122, for example, the color red, the color filter patterns 124, for example green, while the color filter pattern 126, for example, a blue color. 另外,彩色滤光层120可更包括一平坦层128,其用以覆盖这些彩色滤光图案122、124、126。 Further, the color filter layer 120 may further comprise a planarization layer 128, which is to cover the color filter patterns 122, 124. 平坦层1¾的材质为透明材质,如透明的高分子聚合而成的材质,但不以此为限。 1¾ planarization layer material is a transparent material, such as a transparent high polymer material obtained by, but not limited thereto.

[0025] 上述的影像检测元件100可更包括一保护层150,其配置于基底110与彩色滤光层120之间。 [0025] The image detection device 100 may further include a protection layer 150, 120 disposed between the substrate 110 and the color filter layer. 也就是说,保护层150形成于基底110上,以保护检测单元112,而彩色滤光层120则形成于保护层150上。 That is, the protective layer 150 is formed on the substrate 110, to protect the detecting unit 112, and the color filter layer 120 is formed on the protective layer 150. 此外,保护层150的材质可为氧化硅、氮化硅或其他合适的材质。 Further, the material of the protective layer 150 may be silicon oxide, silicon nitride, or other suitable materials.

[0026] 上述的微透镜130用以提高检测单元112的检测范围,而微透镜130的材质可选用高透光性的光阻材质。 [0026] The micro-lens 130 to improve the detection range of the detection unit 112, and the material of the microlenses 130 may be selected high transmittance resist material. 此外,配置于微透镜130上的抗反射单元140用以提高微透镜130 的入光效率,进而减少杂散光的产生。 Further, the microlens 130 is disposed on the anti-reflection unit 140 to improve the light incident efficiency of the microlens 130, thereby reducing the generation of stray light. 每一抗反射单元140包括堆叠于对应的微透镜130上的多个抗反射膜,且相邻的二抗反射膜的折射率不同。 Each unit 140 comprises a stack of anti-reflection anti-reflection film on a plurality of microlenses corresponding to 130, two different refractive indices and adjacent antireflective film. 此外,抗反射膜的材质可选用二氧化钛、氟化镁、氟化锌或其他合适的材质。 Further, the materials should be selected antireflective film of titanium dioxide, magnesium fluoride, zinc fluoride, or other suitable materials.

[0027] 具体而言,本实施例的每一抗反射单元140包括第一抗反射膜142与第二抗反射膜144。 [0027] Specifically, each of the anti-reflection unit 140 of this embodiment includes a first anti-reflection film 142 and the second anti-reflection film 144. 第一抗反射膜142配置于对应的微透镜130上,而第二抗反射膜144配置于第一抗反射膜142上,且第一抗反射膜142的折射率附低于第二抗反射膜144的折射率N2。 The first anti-reflection film 142 disposed on the corresponding microlens 130, and the second anti-reflection film 144 disposed on the first anti-reflection film 142, and the first anti-reflection film 142 is lower than the refractive index of the second anti-reflection film is attached 144 refractive index N2. 此外,为了使抗反射单元130能提供较佳的抗反射功能,可限定N2大于或等于m。 Further, in order to make the anti-reflection unit 130 provides better antireflection function may be defined equal to or greater than N2 m.

[0028] 在本实施例中,由于配置在微透镜130上的抗反射单元140可减少杂散光的产生, 所以可降低检测单元112检测到杂散光的机率,如此可提升本实施例的影像检测元件100 的影像检测品质。 [0028] In the present embodiment, since the micro-lens 130 is disposed on the anti-reflection unit 140 may reduce the generation of stray light, it is possible to reduce the probability of the detected stray light detecting unit 112, thus improving the image can be detected according to the present embodiment quality image detection element 100.

[0029] 图2是本发明另一实施例的影像检测元件的示意图。 [0029] FIG. 2 is a schematic view of an image sensing element according to another embodiment of the present invention. 请参照图2,本实施例的影像检测元件100'与图1的影像检测元件100相似,差别处在于抗反射单元。 Referring to FIG 2, an image similar to the image detection device 100 detecting element 100 'of FIG. 1 according to the present embodiment, the difference is that the anti-reflection means. 具体而言,本实施例的影像检测元件100'的每一抗反射单元140'包括二个第一抗反射膜142与二个第二抗反射膜144。 Specifically, the present embodiment the image sensing element 100 'of each of the anti-reflective means 140' comprises a first two anti-reflection film 142 and the two second anti-reflection film 144. 这些第一抗反射膜142与第二抗反射膜144交替堆叠于对应的微透镜130 上,且其中一个第一抗反射膜142接触对应的微透镜130。 The first anti-reflection film 142 and the second antireflection film 144 are alternately stacked on the corresponding micro lenses 130, and wherein the first anti-reflection film 142 is in contact with a corresponding microlens 130. 此外,第一抗反射膜142的折射率W低于第二抗反射膜144的折射率N2。 Further, the first antireflection film 142 W refractive index lower than the second antireflection film 144 is N2.

[0030] 相较于图1的影像检测元件100的抗反射单元140,本实施例的影像检测元件100'的抗反射单元140'包括更多的抗反射膜,所以可进一步减少杂散光的产生。 'Antireflective unit 140' [0030] Compared to the image detecting element unit 100 of FIG. 1 of the antireflective 140, image sensing element 100 according to the present embodiment further includes an antireflection film, it is possible to further reduce the generation of stray light . 如此,可进一步降低检测单元112检测到杂散光的机率,以使本实施例的影像检测元件100'具有更好的影像检测品质。 Thus, the probability of detection can be further reduced stray light detecting unit 112 to the image detecting element of the present embodiment 100 'has a better image quality is detected.

[0031] 需注意的是,本发明的每一抗反射单元的抗反射膜的数量可为二个以上,并不限于二个或四个。 [0031] It should be noted that the number of the antireflection film of each anti-reflective unit of the invention may be two or more, is not limited to two or four. 此外,每一抗反射单元的抗反射膜的折射率可有二种以上,并不限于二种。 Further, the refractive index of the antireflection film of each anti-reflective means may have two or more, is not limited to two kinds.

[0032] 综上所述,由于本发明的影像检测元件的每一微透镜上设有抗反射单元,所以可增加微透镜的入光效率并减少杂散光的产生。 [0032] In summary, the anti-reflection means is provided on each of the microlenses of the image detecting element of the present invention, the light entering the microlens increase efficiency and reduce stray light is generated. 如此,可降低检测单元检测到杂散光的机率, 进而使本发明的影像检测元件具有较佳的影像检测品质。 Thus, reduces the potential detection unit detects the stray light, thereby enabling the image detecting element of the present invention has better image quality is detected.

[0033] 虽然本发明已以较佳实施例揭露如上,然其并非用以限定本发明,本发明所属技术领域中具有通常知识者,在不脱离本发明的精神和范围内,当可作些许的更动与润饰,因此本发明的保护范围当视后附的申请专利范围所界定者为准。 [0033] While the present invention has been disclosed above by the preferred embodiments, they are not intended to limit the invention, skilled in the art the present invention has ordinary knowledge in the present invention without departing from the spirit and scope, it is intended that modifications and variations, so as to define the scope of the appended claims which are invention when the range of their equivalents.

Claims (5)

1. 一种影像检测元件,其特征在于包括:一个基底,具有多个检测单元;一个彩色滤光层,覆盖各该检测单元;多个微透镜,配置于该彩色滤光层上,且各该微透镜分别对应各该检测单元;以及多个抗反射单元,分别配置于各该微透镜上,每一抗反射单元包括堆叠于对应的该微透镜上的多个抗反射膜,且相邻的两个抗反射膜的折射率不同。 An image detecting device, comprising: a substrate having a plurality of detecting means; a color filter layer covering each of the detection means; a plurality of microlenses, disposed on the color filter layer, and each the microlens corresponding to each of the detecting means respectively; and a plurality of anti-reflection units respectively disposed on each of the microlenses, each unit comprises a plurality of anti-reflection anti-reflection film on the corresponding micro lenses stacked, and adjacent two different refractive index anti-reflection film.
2.如权利要求1所述的影像检测元件,其特征在于,每一抗反射单元包括:一个第一抗反射膜,配置于对应的该微透镜上;以及一个第二抗反射膜,配置于该第一抗反射膜上,且该第一抗反射膜的折射率低于该第二抗反射膜的折射率。 2. The image detection device according to claim 1, wherein each of the anti-reflection means comprises: a first anti-reflection film is disposed on the corresponding microlens; and a second anti-reflection film is disposed on the the first anti-reflection film, and the refractive index of the first anti-reflection film is lower than the refractive index of the second anti-reflection film.
3.如权利要求1所述的影像检测元件,其特征在于,每一抗反射单元包括多个第一抗反射膜与多个第二抗反射膜,各该第一抗反射膜与各该第二抗反射膜交替堆叠于对应的该微透镜上,各该第一抗反射膜其中之一接触对应的该微透镜,且各该第一抗反射膜的折射率低于各该第二抗反射膜的折射率。 Image detecting element as claimed in claim 1, each of the first anti-reflection film and each of the second claim, wherein each of the first anti-reflective means comprises a plurality of anti-reflection film and the second plurality of anti-reflection film, two anti-reflection film are alternately stacked on the microlens corresponding to each of the first anti-reflection film in contact with a corresponding one of the microlenses, and each of the first anti-reflection film is lower than the refractive index of each of the second antireflective refractive index film.
4.如权利要求1所述的影像检测元件,其特征在于,各该抗反射膜的材质为二氧化钛、 氟化镁或氟化锌。 4. The image detection device according to claim 1, wherein each of the anti-reflection film is made of titanium oxide, magnesium fluoride or zinc fluoride.
5.如权利要求1所述的影像检测元件,其特征在于,更包括一个保护层,配置于该基底与该彩色滤光层之间。 5. The image detection device according to claim 1, characterized in that, further comprising a protective layer disposed between the substrate and the color filter layer.
CN2010102741931A 2010-09-07 2010-09-07 Image detecting element CN102403322A (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04223371A (en) * 1990-12-25 1992-08-13 Sony Corp Solid-state image sensing device
CN1914538A (en) * 2004-02-03 2007-02-14 Idc公司 Spatial light modulator with integrated optical structure
CN101179089A (en) * 2006-11-09 2008-05-14 联华电子股份有限公司 Image sensor and manufacturing method therefor
US20080259305A1 (en) * 2007-04-20 2008-10-23 Canon Kabushiki Kaisha Exposure apparatus and device fabrication method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04223371A (en) * 1990-12-25 1992-08-13 Sony Corp Solid-state image sensing device
CN1914538A (en) * 2004-02-03 2007-02-14 Idc公司 Spatial light modulator with integrated optical structure
CN101179089A (en) * 2006-11-09 2008-05-14 联华电子股份有限公司 Image sensor and manufacturing method therefor
US20080259305A1 (en) * 2007-04-20 2008-10-23 Canon Kabushiki Kaisha Exposure apparatus and device fabrication method

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