CN102398113A - Laser beam processing device - Google Patents
Laser beam processing device Download PDFInfo
- Publication number
- CN102398113A CN102398113A CN2011102681460A CN201110268146A CN102398113A CN 102398113 A CN102398113 A CN 102398113A CN 2011102681460 A CN2011102681460 A CN 2011102681460A CN 201110268146 A CN201110268146 A CN 201110268146A CN 102398113 A CN102398113 A CN 102398113A
- Authority
- CN
- China
- Prior art keywords
- laser beam
- laser
- workpiece
- air injection
- solar cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K37/00—Auxiliary devices or processes, not specially adapted for a procedure covered by only one of the other main groups of this subclass
- B23K37/04—Auxiliary devices or processes, not specially adapted for a procedure covered by only one of the other main groups of this subclass for holding or positioning work
- B23K37/0408—Auxiliary devices or processes, not specially adapted for a procedure covered by only one of the other main groups of this subclass for holding or positioning work for planar work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B23K26/702—Auxiliary equipment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
- H10F77/169—Thin semiconductor films on metallic or insulating substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/206—Electrodes for devices having potential barriers
- H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Laser Beam Processing (AREA)
- Photovoltaic Devices (AREA)
Abstract
本发明提供一种激光加工装置,能够高效地从透明基板除去形成于透明基板的功能层的预定加工部分。该激光加工装置具备:非接触地支承太阳电池基板(8)的喷气板(2),该太阳电池基板(8)具有层叠于玻璃基板(81)的功能层(82);激光束照射构件(5);振荡出激光束的激光振荡器(53);以及物镜(51),物镜(51)使振荡出的激光束以聚光点从透明基板(81)侧对准透明基板(81)与功能层(82)的交界面的方式聚光,该激光加工装置使太阳电池基板(8)相对于激光束照射构件(5)相对地进行加工进给。
The present invention provides a laser processing device capable of efficiently removing a portion to be processed of a functional layer formed on a transparent substrate from a transparent substrate. This laser processing device is provided with: a jet plate (2) non-contactly supporting a solar cell substrate (8) having a functional layer (82) laminated on a glass substrate (81); a laser beam irradiation member ( 5); the laser oscillator (53) that oscillates the laser beam; and the objective lens (51), the objective lens (51) makes the oscillating laser beam align the transparent substrate (81) with the focus point from the transparent substrate (81) side to the transparent substrate (81) and The laser beam is focused on the interface of the functional layer (82), and the laser processing device processes and feeds the solar cell substrate (8) relative to the laser beam irradiation member (5).
Description
技术领域 technical field
本发明涉及激光加工装置,更为详细地来说,涉及利用激光来加工在透明基板上成膜的功能层的激光加工装置。The present invention relates to a laser processing device, and more specifically, to a laser processing device for processing a functional layer formed on a transparent substrate with a laser.
背景技术 Background technique
例如,太阳电池基板在玻璃基板等透明基板上具有透明电极层、太阳电池层、以及背面电极层等依次层叠起来的功能层。在这样的太阳电池基板的制造工序中,出于绝缘处理的目的,需要在功能层形成多条分离槽(加工线)。For example, a solar cell substrate has functional layers in which a transparent electrode layer, a solar cell layer, and a back electrode layer are sequentially laminated on a transparent substrate such as a glass substrate. In the manufacturing process of such a solar cell substrate, it is necessary to form a plurality of separation grooves (processing lines) in the functional layer for the purpose of insulation treatment.
作为这样的太阳电池基板的加工技术,已知用于以使相邻的加工线彼此不交叉的方式精度良好地形成各加工线的方法(例如参照专利文献1)。在这样的太阳电池基板的制造工序中,用于除去功能层的激光加工装置构成为对功能层直接照射激光束。As a processing technique for such a solar cell substrate, a method for forming each processing line with high precision so that adjacent processing lines do not intersect each other is known (for example, refer to Patent Document 1). In the manufacturing process of such a solar cell substrate, the laser processing apparatus for removing the functional layer is configured to directly irradiate the functional layer with a laser beam.
专利文献1:日本特开2004-170455号公报Patent Document 1: Japanese Patent Laid-Open No. 2004-170455
然而,在上述的激光加工装置中,对功能层直接照射激光束,为了使预定加工部分的功能层的从表面到与玻璃基板的界面为止的全部部分在高温下蒸发,需要很高的能量,存在使玻璃基板破损的可能性。由此,必须对激光加工装置的激光束的强度等进行微调,存在着无法高效地从玻璃基板除去功能层的预定加工部分的问题。However, in the above-mentioned laser processing apparatus, the functional layer is directly irradiated with a laser beam. In order to evaporate all the parts from the surface of the functional layer to the interface with the glass substrate at a high temperature, very high energy is required. There is a possibility of breaking a glass substrate. Therefore, it is necessary to finely adjust the intensity of the laser beam of the laser processing apparatus, etc., and there is a problem that the portion to be processed of the functional layer cannot be efficiently removed from the glass substrate.
发明内容 Contents of the invention
本发明正是鉴于上述而完成的,其目的在于提供一种激光加工装置,能够高效地从透明基板除去形成于透明基板的功能层的预定加工部分。The present invention has been made in view of the above, and an object of the present invention is to provide a laser processing apparatus capable of efficiently removing from a transparent substrate a portion to be processed of a functional layer formed on a transparent substrate.
根据本发明,提供一种激光加工装置,其具备:非接触支承构件,所述非接触支承构件非接触地支承工件,该工件由透明基板和层叠于该透明基板上的功能膜构成;激光束照射构件,所述激光束照射构件向支承于所述非接触支承构件的工件照射激光束,所述激光束照射构件具有激光振荡器和物镜,所述激光振荡器振荡出激光束,所述物镜使从所述激光振荡器振荡出的激光束聚光,使聚光点从所述透明基板侧对准所述透明基板与所述功能膜的交界面;加工进给构件,所述加工进给构件使工件相对于所述激光束照射构件相对地进行加工进给;以及加工屑吸引构件,所述加工屑吸引构件对通过来自所述激光束照射构件的激光束的照射而加热所述功能膜时产生的加工屑进行吸引,该加工屑吸引构件与所述物镜对置地配设于所述工件的所述功能膜侧。According to the present invention, there is provided a laser processing apparatus comprising: a non-contact support member for non-contact support of a workpiece composed of a transparent substrate and a functional film laminated on the transparent substrate; an irradiating member that irradiates a laser beam to a workpiece supported by the non-contact supporting member, the laser beam irradiating member having a laser oscillator that oscillates a laser beam, and an objective lens condensing the laser beam oscillated from the laser oscillator so that the condensed point is aligned with the interface between the transparent substrate and the functional film from the side of the transparent substrate; processing feed member, the processing feed means for processing and feeding a workpiece relative to the laser beam irradiating means; and a processing waste attracting means for heating the functional film by irradiation of the laser beam from the laser beam irradiating means The chip suction member is arranged on the side of the functional film of the workpiece so as to face the objective lens.
根据本发明,能够从透明基板高效地除去形成于透明基板的功能层的预定加工部分。According to the present invention, the part to be processed of the functional layer formed on the transparent substrate can be efficiently removed from the transparent substrate.
附图说明 Description of drawings
图1是示出本发明第一实施方式涉及的激光加工装置的立体图。FIG. 1 is a perspective view showing a laser processing apparatus according to a first embodiment of the present invention.
图2是图1的II-II剖视图。Fig. 2 is a sectional view taken along line II-II of Fig. 1 .
图3是示出本第一实施方式涉及的激光加工装置的架台上表面的主要部分俯视图。3 is a plan view of main parts showing the upper surface of the stand of the laser processing apparatus according to the first embodiment.
图4-1是示出从太阳电池基板的玻璃基板侧开始激光束的照射的状态的剖视说明图。4-1 is an explanatory cross-sectional view showing a state where laser beam irradiation is started from the glass substrate side of the solar cell substrate.
图4-2是示出太阳电池基板的功能层在预定加工部分处被除去的状态的剖视说明图。4-2 is an explanatory cross-sectional view showing a state where a functional layer of a solar cell substrate is removed at a portion to be processed.
图5是示出本发明的第二实施方式涉及的激光加工装置的立体图。5 is a perspective view showing a laser processing apparatus according to a second embodiment of the present invention.
图6是图5的VI-VI剖视图。FIG. 6 is a VI-VI sectional view of FIG. 5 .
标号说明Label description
1:架台;1: stand;
2:喷气板;2: jet board;
5:激光束照射构件;5: The laser beam irradiates the component;
6:加工屑吸引构件;6: machining chips attracting member;
7:加工进给构件;7: Processing feed components;
8:太阳电池基板;8: Solar cell substrate;
51:物镜;51: objective lens;
53:激光振荡器。53: Laser oscillator.
具体实施方式 Detailed ways
下面,参照附图说明本发明的各实施方式涉及的激光加工装置。不过要注意的是,附图仅是示意性的,部件和基板的厚度以及其它尺寸的比例等与实际的情况是不同的。此外,附图彼此之间也包括彼此的尺寸的关系和比例不同的部分。Next, laser processing apparatuses according to embodiments of the present invention will be described with reference to the drawings. However, it should be noted that the drawings are only schematic, and the thickness of the components and the substrate and the ratio of other dimensions are different from the actual situation. In addition, the relationship and the ratio of the mutual dimension also contain the part which differs among drawings.
(第一实施方式)(first embodiment)
图1~图3示出了本发明的第一实施方式涉及的激光加工装置100的结构。本实施方式采用太阳电池基板8作为工件。太阳电池基板8在作为透明基板的玻璃基板81上形成有功能层82。对将本实施方式的激光加工装置100应用于沿太阳电池基板8的预定加工线除去功能层82来形成分离槽的情况进行说明,然而工件并不限定为太阳电池基板。1 to 3 show the configuration of a laser processing apparatus 100 according to the first embodiment of the present invention. In this embodiment, a
如图1所示,本实施方式的激光加工装置100大致由以下部分构成:工作台状的架台1;作为支承构件的喷气板2,所述喷气板2配置于该架台1上,并通过喷气来非接触地支承太阳电池基板8;加工屑吸引构件安装框架4;激光束照射构件5;加工屑吸引构件6;以及加工进给构件7,所述加工进给构件7用于在x方向搬送在喷气板2上通过喷气而浮起的太阳电池基板8。As shown in FIG. 1 , the laser processing device 100 of the present embodiment is roughly composed of the following parts: a table-shaped stand 1; an
如图1和图2所示,架台1是具有顶板1A的长方体形状的大致箱状体,在顶板1A的上表面的y方向的两侧,各有一对导轨11彼此平行地沿x方向延伸。在各个成对的导轨11、11之间,分别沿x方向配置有滚珠丝杠31。在滚珠丝杠31的x方向的一侧端部,在上表面1A设有驱动该滚珠丝杠31旋转的电动机3。此外,滚珠丝杠31的x方向的另一侧端部由旋转轴承32支承成能够自如旋转。另外,旋转轴承32将滚珠丝杠31支承成在x方向不移位。As shown in FIGS. 1 and 2 , the platform 1 is a substantially box-shaped body having a cuboid shape with a
如图2所示,在滚珠丝杠31螺合有移动块72,该移动块72随着滚珠丝杠31的旋转而移动。该移动块72被固定于支承臂71。该支承臂71形成为对非接触地支承于喷气板2上的太阳电池基板8的y方向的两侧部进行支承。在支承臂71的x方向的两端部形成有向y方向内侧突出的前后支承部73。As shown in FIG. 2 , a moving
如图3所示,在架台1的顶板1A的中央,以遍及y方向的大致整个宽度范围的方式形成有狭缝1B,具备物镜51的激光束照射构件5配置于该狭缝1B内。As shown in FIG. 3 , a slit 1B is formed at the center of the
此外,如图1和图2所示,配置于架台1的顶板1A上的喷气板2具有与被非接触地支承的太阳电池基板8的y方向的宽度尺寸相同程度的宽度尺寸。此外,喷气板2的x方向的长度在本实施方式中被设定为太阳电池基板8的x方向的长度的两倍左右的长度。如图1和图3所示,在该喷气板2的x方向的中央部形成有长度在y方向遍及大致整个宽度范围的狭缝22。该狭缝22以与形成于架台1的顶板1A的狭缝1B大致重叠的方式配置。因此,激光束照射构件5配置于使形成于架台1的顶板1A的狭缝1B和喷气板2的狭缝22连通的狭缝空间中。In addition, as shown in FIGS. 1 and 2 ,
如图1和图2所示,喷气板2内部为中空结构,在上板2A大致均匀地配置有大量的喷气孔21。并且,从未图示的空气供给装置向喷气板2的内部空间以预定的压力供给空气,以便从各个喷气孔21以预定的压力喷出空气。As shown in FIGS. 1 and 2 , the interior of the
如图2所示,激光束照射构件5被设定为:在由喷气板2非接触地将太阳电池基板8以玻璃基板81朝下的方式进行支承时,通过物镜51结成的图中单点划线所示的激光束的聚光点位于玻璃基板81与功能层82的交界面附近。另外,如图2所示,各激光束照射构件5经由光纤52与激光振荡器53连接。As shown in FIG. 2 , the laser
并且,激光束照射构件5形成为通过未图示的滑动驱动机构能够在上述狭缝1B和狭缝22的连通狭缝空间内沿y方向移动。另外,在本第一实施方式中,如图1和图3所示,构成为具备两个激光束照射构件5。另外,所述两个激光束照射构件5可以构成为各自由单独的未图示的滑动驱动机构分别驱动,也可以构成为对两个激光束照射构件5在保持预定的间隔的状态下一体地进行驱动。In addition, the laser
如图1所示,加工屑吸引构件安装框架4由以下部件构成:一对支柱部41,所述支柱部41在形成于架台1的顶板1A的狭缝1B的侧方从架台1的侧部竖立设置;以及第一梁部42和第二梁部43,所述第一梁部42和第二梁部43跨越所述支柱部41的上部之间地架设。在所述第一梁部42和第二梁部43之间设有未图示的吸引构件滑动驱动机构。As shown in FIG. 1 , the chip suction
如图1和图2所示,加工屑吸引构件6具备:罩部61,所述罩部61向下开口以从下部开口进行吸引;以及安装部62,所述安装部62与该罩部61的上部连通地与罩部61设置成一体,安装部62由设于第一梁部42和第二梁部43之间的未图示的吸引构件滑动驱动机构在y方向进行滑动驱动。另外,安装部62以连通的方式与未图示的吸引装置连结。另外,作为使安装部62与未图示的吸引装置连通的方式,可以采用具有挠性的管等。另外,未图示的吸引构件滑动驱动机构被设定为:使加工屑吸引构件6的滑动动作与激光束照射构件5的滑动驱动同步地进行。As shown in FIGS. 1 and 2 , the machining
接着,对上述结构的第一实施方式涉及的激光加工装置100的作用、动作进行说明。Next, the function and operation of the laser processing apparatus 100 according to the first embodiment configured as above will be described.
首先,向喷气板2内供给预定压力的空气,从各个喷气孔21喷出预定压力的空气。接着,如图1所示,以玻璃基板81位于下侧的方式将太阳电池基板8配置于设在y方向的两侧的一对加工进给构件7的支承臂71彼此之间。其结果是,太阳电池基板8借助空气的压力而浮起至预定的高度。在此,在太阳电池基板8的下方均匀地配置有大量的喷气孔21,因此能够防止太阳电池基板8挠曲或者倾斜。First, air at a predetermined pressure is supplied into the
此时,移动的支承臂71的前后支承部73、73与太阳电池基板8的两侧的前后方向(x方向)的端部抵接。因此,在通过驱动电动机3旋转使支承臂71与移动块72一起在x方向移动的时候,太阳电池基板8在与支承臂71之间不会发生晃动。另外,将太阳电池基板8配置到支承臂71彼此之间或者取出时,例如可以采用机器人或传送带方式等的搬送构件。At this time, the front and
并且,在加工太阳电池基板8的沿y方向的预定加工部分(预定加工线)S的时候,利用加工进给构件7进行位置控制,以使太阳电池基板8的预定加工部分S位于喷气板2的狭缝22的上方。接着,使激光束照射构件5和加工屑吸引构件6在工作的状态下同步地沿y方向移动。在加工沿y方向的其他预定加工部分S的时候,控制加工进给构件7以使接下来加工的预定加工部分S位于狭缝22的上方即可。And, when processing the scheduled processing portion (scheduled processing line) S of the
此外,在加工太阳电池基板8的沿x方向的预定加工部分S的时候,首先,调整激光束照射构件5和加工屑吸引构件6的位置至沿x方向的预定加工部分S的位置。然后,通过使加工进给构件7以预定的速度在x方向移动,从而能够进行沿x方向的预定加工部分S的加工。通过这样进行x方向和y方向的加工,完成太阳电池基板8的功能层82的分离加工。Further, when processing the planned processing portion S of the
在激光加工装置10的加工结束后,以与搬入、配置太阳电池基板8时相反的动作将太阳电池基板8搬出。另外,太阳电池基板8的配置位置和搬出位置可以是相同部位,也可以是不同部位。After the processing by the laser processing apparatus 10 is completed, the
在本实施方式中,从玻璃基板81侧照射激光束(以单点划线示出),并使得激光束在玻璃基板81与功能层82的交界面附近聚光,因此,首先如图4-1所示,预定加工部分S的功能层82的与玻璃基板81相接触的部分急剧地膨胀气化,瞬时形成压力较高的空洞部82A。另外,在太阳电池基板8中形成的功能层82的厚度例如是2~3μm左右。In this embodiment, the laser beam is irradiated from the side of the glass substrate 81 (shown by a single dotted line), and the laser beam is focused near the interface between the
接着,不必以激光束将功能层82的预定加工部分S整体加热,如图4-2所示,很快空洞就破裂,加工屑82B向上方飞溅,形成分离槽。此时,由于以加工屑吸引构件6吸引加工屑82B,因此加工屑82B不会飞溅,能够高效地推进预定加工部分S的加工。这样,在本实施方式中,也可以不用激光束来加热功能层82的预定加工部分S整体,因此能够进行节省能量的加工,加热量较少,所以不必担心会损伤到玻璃基板81。此外,由于不必使预定加工部分S的功能层82全部蒸发,因此能够进行速度快的加工。进而,根据本实施方式,也可以采用输出低的激光。Next, it is not necessary to heat the entire portion S of the
以上,对本实施方式涉及的激光加工装置100进行了说明,在本实施方式中,能够将太阳电池基板8的功能层82的一部分(预定加工部分S)高效地从玻璃基板81除去。特别是在本实施方式中,由于设有两对激光束照射构件5和加工屑吸引构件6所组成的对,因此能够加快对一枚太阳电池基板8的加工处理速度。The laser processing apparatus 100 according to the present embodiment has been described above. In the present embodiment, a part of the functional layer 82 (part to be processed S) of the
此外,在本实施方式中,通过从均匀地形成于喷气板2的大量的喷气孔21喷气来非接触地支承太阳电池基板8,因此能够防止太阳电池基板8发生挠曲和倾斜。因此,激光束光点的照射位置更准确,能够进行精度高的加工。In addition, in this embodiment, since the
(第二实施方式)(second embodiment)
接下来,采用图5和图6说明本发明的第二实施方式涉及的激光加工装置100A。Next, 100 A of laser processing apparatuses concerning 2nd Embodiment of this invention are demonstrated using FIG.5 and FIG.6.
本实施方式涉及的激光加工装置100A的特征在于,在喷气板2的上方具备与喷气板2相比在x方向上较短的矩形形状的上侧喷气板9。另外,本实施方式涉及的激光加工装置100A的其他结构与上述第一实施方式涉及的激光加工装置100大致相同,对相同部分标以相同标号并省略其结构的说明。The
如图6所示,上侧喷气板9与配置于下侧的喷气板2的结构大致相同,在上侧喷气板9的下板9A形成有喷气孔91。此外,上侧喷气板9被设定为与喷气板2相比在x方向上较短,如图5所示,上侧喷气板9在x方向的一侧端部对齐配置。并且,如图5所示,在本实施方式中,激光加工装置100A的搬入太阳电池基板8的位置配置成靠近x方向的另一侧端部,在加工进给构件7配置于该配置位置的状态下,进行太阳电池基板8的搬入和搬出。As shown in FIG. 6 , the upper
另外,如图6所示,该上侧喷气板9以与配置于下侧的喷气板2保持预定的间隔(插入太阳电池基板8的空间尺寸)地平行的方式安装在激光加工装置100A的主体侧。如图5所示,在如此配置上侧喷气板9的状态下,在上侧喷气板9的、与配置于喷气板2侧的激光束照射构件5对应的位置处,形成有狭缝92。另外,上侧喷气板9被设定为夹着狭缝92的x方向两侧的矩形部分具有大致相同的大小。并且,上侧喷气板9的夹着狭缝92的两侧的各个矩形部分被设定为俯视观察完全覆盖太阳电池基板8的大小。在本实施方式中,由于需要将加工屑吸引构件6A插入配置到上侧喷气板9的狭缝92,因此罩部61A的直径尺寸被设定为比较细。In addition, as shown in FIG. 6 , the upper
根据本实施方式涉及的激光加工装置100A,在上述第一实施方式的效果的基础上,即使浮在喷气板2上的太阳电池基板8原本存在翘曲,也能够通过从上方利用上侧喷气板9以均匀的压力的空气进行推压,来在矫正了太阳电池基板8的翘曲的状态下进行加工。由此,能够使照向太阳电池基板8的激光束的聚光点正确地位于玻璃基板81与功能层82的交界面,能够切实地进行加工。According to the
(其他实施方式)(Other implementations)
以上,对本发明的实施方式进行了说明,然而并不通过对上述实施方式的公开的一部分的论述和附图来限定本发明。根据该公开,对本领域技术人员来说,各种代替实施方式、实施例和应用技术是显而易见的。As mentioned above, although embodiment of this invention was described, this invention is not limited by the description and drawing of a part of disclosure of the said embodiment. Various alternative embodiments, examples, and applied techniques will be apparent to those skilled in the art from this disclosure.
例如,在上述第一实施方式和第二实施方式中,应用太阳电池基板8作为工件来进行了说明,然而例如也可以对在有机EL显示面板、无机EL显示面板、等离子显示器、场致发光显示面板等透明基板的表面形成有功能层的各种工件进行激光加工。For example, in the above-mentioned first embodiment and second embodiment, the
在上述第一实施方式和第二实施方式中,采用了大致箱状的架台1,然而不限定于此,只要是能够配置非接触地支承太阳电池基板8的支承结构的构造即可。In the above-mentioned first and second embodiments, the substantially box-shaped stand 1 is used, but it is not limited to this, and any structure can be arranged as long as a support structure for supporting the
在上述第一实施方式和第二实施方式中,采用了喷气板2,然而并不限定于此,只要是能够对太阳电池基板8均匀地喷出空气的结构即可。In the above-mentioned first and second embodiments, the
在上述第一实施方式和第二实施方式中,采用了光纤52,然而当然也可以是通过反射镜将激光束传递至物镜51的结构。In the above-mentioned first and second embodiments, the
在上述第一实施方式和第二实施方式中,将加工屑吸引构件6设于加工屑吸引构件安装框架4,然而只要是使加工屑吸引构件6沿y方向移动的结构,当然也可以是未设置加工屑吸引构件安装框架4的结构。In the above-mentioned first and second embodiments, the
在上述第一实施方式和第二实施方式中,采用了两对激光束照射构件5和加工屑吸引构件6所组成的对,然而也可以是一对,也可以是三队以上。In the above-mentioned first and second embodiments, two pairs of laser
在上述第一实施方式和第二实施方式中,将激光束照射构件5配置在下侧,将加工屑吸引构件6配置在上侧,然而与此相反地,将激光束照射构件5配置在上侧并将加工屑吸引构件6配置在下侧也是本发明的应用范围。另外,在该情况下,将太阳电池基板8以功能层82朝向下方的方式配置来实施加工即可。In the above-mentioned first and second embodiments, the laser
在上述第一实施方式和第二实施方式中,对于支承臂71,举出了构成为支承太阳电池基板的y方向的两侧部的前后支承部73的例子,然而也可以形成为使用销等夹持太阳电池基板8的结构。In the above-mentioned first and second embodiments, the
产业上的可利用性Industrial availability
如上所述,本发明涉及的激光加工装置在具有透明基板的工件的加工领域是有用的,特别适于太阳电池基板的加工领域。As described above, the laser processing apparatus according to the present invention is useful in the field of processing workpieces having transparent substrates, and is particularly suitable for the field of processing solar cell substrates.
Claims (3)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010-204952 | 2010-09-13 | ||
| JP2010204952A JP2012055966A (en) | 2010-09-13 | 2010-09-13 | Laser beam machining device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102398113A true CN102398113A (en) | 2012-04-04 |
Family
ID=45756269
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011102681460A Pending CN102398113A (en) | 2010-09-13 | 2011-09-09 | Laser beam processing device |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2012055966A (en) |
| CN (1) | CN102398113A (en) |
| DE (1) | DE102011082427A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111408840A (en) * | 2020-04-07 | 2020-07-14 | 哈尔滨工业大学(威海) | Device for assisting underwater laser deposition or material increase through induction heating and use method |
| CN113305446A (en) * | 2020-02-27 | 2021-08-27 | 本田技研工业株式会社 | Laser processing apparatus |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016161007A (en) * | 2015-02-27 | 2016-09-05 | 株式会社日本製鋼所 | Gas flotation workpiece support device and non-contact workpiece support method |
| JP6778080B2 (en) * | 2016-10-20 | 2020-10-28 | 株式会社日本製鋼所 | Laser machining equipment and laser machining method |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53114347A (en) * | 1977-12-07 | 1978-10-05 | Toshiba Corp | Working method for semiconductor device |
| JP2002280321A (en) * | 2001-03-21 | 2002-09-27 | Ishikawajima Harima Heavy Ind Co Ltd | Laser annealing equipment |
| US20070228630A1 (en) * | 2004-06-03 | 2007-10-04 | Richard Grundmuller | Table for Receiving a Workpiece and Method for Processing a Workpiece on Such Table |
| CN101412472A (en) * | 2002-04-18 | 2009-04-22 | 奥林巴斯株式会社 | Substrate conveying device |
| JP2010075995A (en) * | 2008-03-24 | 2010-04-08 | Marubun Corp | Beam processing apparatus, beam processing method, and beam processing substrate |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004170455A (en) | 2002-11-15 | 2004-06-17 | Mitsubishi Heavy Ind Ltd | Laser processing apparatus, laser processing system and solar cell |
-
2010
- 2010-09-13 JP JP2010204952A patent/JP2012055966A/en active Pending
-
2011
- 2011-09-09 CN CN2011102681460A patent/CN102398113A/en active Pending
- 2011-09-09 DE DE102011082427A patent/DE102011082427A1/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53114347A (en) * | 1977-12-07 | 1978-10-05 | Toshiba Corp | Working method for semiconductor device |
| JP2002280321A (en) * | 2001-03-21 | 2002-09-27 | Ishikawajima Harima Heavy Ind Co Ltd | Laser annealing equipment |
| CN101412472A (en) * | 2002-04-18 | 2009-04-22 | 奥林巴斯株式会社 | Substrate conveying device |
| US20070228630A1 (en) * | 2004-06-03 | 2007-10-04 | Richard Grundmuller | Table for Receiving a Workpiece and Method for Processing a Workpiece on Such Table |
| JP2010075995A (en) * | 2008-03-24 | 2010-04-08 | Marubun Corp | Beam processing apparatus, beam processing method, and beam processing substrate |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113305446A (en) * | 2020-02-27 | 2021-08-27 | 本田技研工业株式会社 | Laser processing apparatus |
| CN111408840A (en) * | 2020-04-07 | 2020-07-14 | 哈尔滨工业大学(威海) | Device for assisting underwater laser deposition or material increase through induction heating and use method |
| CN111408840B (en) * | 2020-04-07 | 2021-10-19 | 哈尔滨工业大学(威海) | A device and using method for induction heating assisted underwater laser cladding or additive material |
Also Published As
| Publication number | Publication date |
|---|---|
| DE102011082427A1 (en) | 2012-03-15 |
| JP2012055966A (en) | 2012-03-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN100573929C (en) | Equipment for forming solar modules into structures | |
| JP5604186B2 (en) | Processing equipment | |
| KR102468635B1 (en) | Laser machining apparatus | |
| JP6764552B2 (en) | Work separation device and work separation method | |
| TWI388390B (en) | Laser processing device | |
| JP5398332B2 (en) | Method and apparatus for manufacturing semiconductor wafer | |
| JP2011156582A (en) | Dividing method by co2 laser | |
| CN108352347B (en) | Object to be processed transfer apparatus, semiconductor manufacturing apparatus, and object to be processed transfer method | |
| KR102353196B1 (en) | Method of using electrostatic chuck table | |
| KR102704517B1 (en) | Tape extension apparatus | |
| TW201801839A (en) | Electrostatic working clamping table, laser processing device and processing method of processed object | |
| CN102398113A (en) | Laser beam processing device | |
| TW201918315A (en) | Laser processing apparatus | |
| KR102357807B1 (en) | Frame unit and laser machining method of workpiece | |
| JP2010184331A (en) | Holding table and machining device | |
| CN102639282B (en) | Laser processing device and laser processing method | |
| JP7612427B2 (en) | Electrode welding method and electrode welding device | |
| JP5731779B2 (en) | Laser processing equipment | |
| CN110277332B (en) | Laser processing apparatus | |
| KR20080047614A (en) | Device and method for separating electronic components | |
| KR20190036238A (en) | Substrate cutting apparatus | |
| KR100811111B1 (en) | Exhaust Hole Processing Equipment for Display Panel | |
| JP2005167040A (en) | Electronic component mounting device | |
| WO2018220733A1 (en) | Work machine, and calculation method | |
| JP2007316561A (en) | Exposure apparatus and exposure method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20120404 |
