CN102346379B - Method for optimizing photoetching configuration parameters based on steepest descent method - Google Patents

Method for optimizing photoetching configuration parameters based on steepest descent method Download PDF

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CN102346379B
CN102346379B CN 201110351292 CN201110351292A CN102346379B CN 102346379 B CN102346379 B CN 102346379B CN 201110351292 CN201110351292 CN 201110351292 CN 201110351292 A CN201110351292 A CN 201110351292A CN 102346379 B CN102346379 B CN 102346379B
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photoetching
descent
configuration
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CN102346379A (en )
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李艳秋
郭学佳
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北京理工大学
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Abstract

本发明提供一种基于最速下降法光刻配置参数的优化方法,具体步骤为:确定欲优化的n种光刻配置参数,确定用于评价光刻性能的m种光刻性能评价指标yj,获取最速下降方向,针对光刻配置参数{xi}k,在其所对应的变化范围{[ui,vi]}k内,沿其对应的最速下降方向{di}k进行一维搜索,得到该方向最小的F值,记为Fmin,获取Fmin对应的光刻配置参数{xi}k,并将{xi}k作为下一次循环的光刻配置参数,当循环次数是否达最大或满足搜索精度时,结束优化。 The present invention provides a method of steepest descent-based optimization lithography configuration parameters, specific steps of: determining n types of configuration parameters to be optimized photolithography, yj m kinds of evaluation index for evaluating a lithographic lithographic performance properties, obtaining steepest descent direction, the configuration parameters {xi} k for photolithography, in the range which it corresponds {[ui, vi]} within k, which corresponds to the steepest descent direction {di} k one-dimensional search, to give the direction smallest F value, denoted Fmin, photolithography obtain Fmin corresponding to the configuration parameters {xi} k, {xi} k and configuration parameters as photolithography next cycle, when the number of cycles up to a maximum or if the search accuracy to meet, end of the optimization. 本发明统筹考虑各种光刻评价指标,通过构造具有多种光刻性能评价指标的评价函数,实现对优化结果进行评价,因此使得优化后的光刻配置参数具有很好的光刻性能。 The present invention and consider a variety of lithographic evaluation, by structuring the plurality of evaluation function lithographic performance evaluation index, to achieve optimal results for the evaluation, so that the optimized configuration parameter photolithography having a good lithographic performance.

Description

—种基于最速下降法光刻配置参数的优化方法 - kind of steepest descent optimization based lithography configuration parameters

技术领域 FIELD

[0001] 本发明涉及一种基于最速下降法光刻配置参数的优化方法,属于光刻配置参数协同优化设计领域。 [0001] The present invention relates to a method of steepest descent method to optimize the lithography configuration parameters based on the configuration parameters belonging collaborative optimization of the lithography art.

背景技术 Background technique

[0002] 光学光刻是光刻机用光学投影曝光的方法将掩模板上的电路器件结构图形刻蚀到硅片上的过程。 [0002] Optical lithography is a circuit pattern device configuration method for optical projection lithography exposure mask plate etching process to the silicon wafer. 光刻机主要由光源、照明系统、掩模台、投影物镜以及硅片工件台五部分组成。 Lithography light source is mainly composed of five parts, an illumination system, a mask table, a projection lens and a workpiece wafer stage components. 为了实现良好的光刻性能,达到较大的光刻焦深,需要合理配置光刻机各部分参数,如投影物镜数值孔径NA的大小、照明相干因子Sigma的值、偏振光类型、光刻胶厚度以及掩模Bias大小等。 To achieve good lithographic performance, achieve greater depth of focus of photolithography, a logical configuration of each part of lithography parameters, such as the size of the numerical aperture NA of the projection objective, the illumination coherence factor value of Sigma, polarized type photoresist Bias size and thickness of the mask.

[0003] 评价光刻性能的指标主要有:图形对比度Contrast、归一化对数斜率NILS以及光刻焦深DOF等。 Specification [0003] Evaluation of lithographic performance are: Graphics contrast Contrast, normalized logarithmic slope NILS lithographic depth of focus DOF ​​and the like. 光刻焦深是评价光刻系统性能的主要参数之一,光刻焦深定义为:在一定的曝光剂量变化范围EL内,光刻胶图形在一定的尺寸误差、侧壁角、光刻胶损失的约束条件下,所能实现的最大离焦量。 Lithographic depth of focus is the main parameter for evaluating performance of a lithographic, photolithographic depth of focus is defined as: within a certain range of the EL exposure dose variation, resist pattern a certain dimensional error, sidewall angle, the photoresist under the constraint loss, the maximum amount of defocus can be achieved. 光刻焦深越大,光刻性能越好。 Lithography depth of focus, the better the lithographic performance.

[0004] 光刻配置参数优化是合理的配置光刻系统中器件结构参数、曝光工艺参数、分辨率增强技术(离轴照明、相移掩模、光学临近效应校正)、工艺叠层参数等多个系统参数,统筹考虑不同因素在其不同限定条件下的约束,以实现最优的光刻性能。 [0004] The lithography configuration parameter optimization is reasonable configuration lithography system structure parameters, exposure parameters, the resolution enhancement technology (off-axis illumination, phase shifting masks, optical proximity effect correction), and other process parameters laminate system parameters, and consider different factors in their different constraints defined conditions, to achieve optimal lithographic performance.

[0005] 当前,已有很多优化光刻配置参数的方法(李艳秋等,光学参数配置对ArF光刻性能影响研究[J].电子工业专用设备,2004,33 (4):36-39.)。 [0005] Currently, many prior method of optimizing lithographic configuration parameters (Li Yan Qiu et al., Effect of the optical lithographic performance parameters for ArF [J] Electronic equipment, 2004,33 (4): 36-39.) . 但是,当前的光刻配置参数优化方法仅限于对一个或两个光刻配置参数的优化,要使光刻机的性能达到最优,光刻机中每个参数均应合理配置;同时,当前的研究主要应用遍历仿真的方法确定光刻配置参数,计算量非常大,且精度低,难以找出最优的光刻配置参数。 However, the current configuration parameter optimization photolithography method is limited to optimize a lithography or two configuration parameters, to make the optimal performance of the lithographic machine, the lithography machine configuration for each parameter should be reasonable; the same time, the current the main application of research methods to traverse the lithography simulation to determine the configuration parameters, the calculation is very large, and low precision, lithography is difficult to find the optimal configuration parameters.

发明内容 SUMMARY

[0006] 本发明的目的是提供一种基于最速下降法光刻配置参数的优化方法;该方法同时对多种光刻配置参数进行优化配置,可使优化后的光刻机达到良好的光刻性能,且优化效率高。 [0006] The object of the present invention is to provide a method for optimizing a lithographic based configuration parameters steepest descent method; lithography method while the various configuration parameters to optimize the lithography configuration, the optimization can achieve good lithographic high performance, and optimize efficiency.

[0007] 实现本发明的技术方案如下: [0007] The technical solution of the present invention to achieve the following:

[0008] 一种基于最速下降法光刻配置参数的优化方法,具体步骤为: [0008] A method of steepest descent-based optimization lithography configuration parameters, the specific steps:

[0009] 步骤101、确定欲优化的η种光刻配置参数,针对每一种光刻配置参数选定一初始值构成IXn维矩阵UJ1 = {χ1; χ2, L, xj I, i = {1,2, L, η};确定每种光刻配置参数的变化范围Ui e [ai,bJ = [a2,b2]L,[an,bn]},确定每种光刻配置参数用于求解差商的差值(Axi e [ai; bj,其中I Axi I << Xi ;给定优化精度允许误差ε > O,最大一维搜索次数k_,并令循环次数k = I ; [0009] Step 101, it is determined to be an optimized configuration parameters η species photolithography, lithographic selected for each configuration parameter to an initial value IXn dimensional matrix configuration UJ1 = {χ1; χ2, L, xj I, i = {1 , 2, L, η}; lithography configuration parameters determined for each range Ui e [ai, bJ = [a2, b2] L, [an, bn]}, determined for each configuration parameter for solving differential lithography 's difference (Axi e [ai; bj, where I Axi I << Xi; optimize accuracy given tolerance ε> O, the maximum number of one-dimensional search k_, and so the number of cycles k = I;

[0010] 步骤102、确定用于评价光刻性能的m种光刻性能评价指标y」,j = {l,2,L,m},并m [0010] Step 102, determining the lithographic performance evaluation of m types of lithographic performance evaluation index y ', j = {l, 2, L, m}, and m

构造光刻性能综合评价函数 Construction lithographic performance evaluation function

Figure CN102346379BD00051

,其中L为针对各光刻性能评价指标设定的比 Wherein L is set for each ratio of lithographic performance evaluation

;=1 ; = 1

重值; A weight value;

[0011] 步骤103、对循环次数k进行判断,若k ( kmax,则进入步骤104,若k > kmax,则进入步骤108 ; [0011] Step 103, the determination of the number of cycles k, if k (Kmax, the process proceeds to step 104, if k> kmax, the process proceeds to step 108;

[0012] 步骤104、针对光刻配置参数IxJk计算其差商,获取最速下降方向{屯},, [0012] Step 104, for calculating the difference quotient lithography configuration parameters IxJk, acquiring the steepest descent direction Tun {} ,,

Figure CN102346379BD00052

k 为^ 维矩阵; k is a matrix of dimension ^;

、 Jk , Jk

[0013] 步骤105、对II {dJkl I进行判断,当判定II {dJkl I ( ε,进入步骤106,否则进入步骤108,其中Illl为取模运算; [0013] Step 105, a judgment II {dJkl I, when it is determined II {dJkl I (ε, proceeds to step 106, otherwise proceeds to step 108, wherein a modulo operation is Illl;

[0014] 步骤106、针对光刻配置参数IxJk,根据其对应的最速下降方向WJk更新其所对应的一维搜索变化范围为(Xi e [Ui, vj}k,且; [0014] Step 106, the configuration parameters for the lithography IxJk, WJk update one-dimensional search range of its corresponding (Xi e [Ui, vj} k The corresponding direction of steepest descent, and;

[0015] 步骤107、针对光刻配置参数IxJk,在其所对应的变化范围{[Ui,ViJIk内,沿其对应的最速下降方向{dj k进行一维搜索,得到该方向最小的F值,记为Fmin,获取Fmin对应的光刻配置参数{xjk,并将{xjk作为下一次循环的光刻配置参数,令k = k+Ι,返回步骤103 ; [0015] Step 107, the configuration parameters for the lithography IxJk, corresponds to the range {[Ui, the ViJIk, along the direction corresponding to the steepest descent {dj k one-dimensional search, obtain the minimum value of the F direction, denoted Fmin, photolithography obtain Fmin corresponding to {xjk configuration parameters, and configuration parameters as {xjk photolithography next cycle, so that k = k + Ι, returns to step 103;

[0016] 步骤108、输出最优光刻配置参数{Xi}k,以及{xjk所对应的F值。 [0016] Step 108, the output of the optimum configuration parameters photolithography {Xi} F value k, and the corresponding {xjk.

[0017] 有益效果 [0017] beneficial effects

[0018] 本发明统筹考虑各种光刻评价指标,通过构造具有多种光刻性能评价指标的评价函数,实现对优化结果进行评价,因此使得优化后的光刻配置参数具有很好的光刻性能。 [0018] The present invention and consider a variety of lithographic evaluation, by structuring the plurality of evaluation function lithographic performance evaluation index, to achieve optimal results for the evaluation, so that the configuration parameters optimized lithography has good lithography performance.

[0019] 同时,本发明通过最速下降优化算法确定每一光刻配置参数的最速下降方向,并沿最速下降方向对光刻性能进行优化,获取具有最优光刻性能的光刻配置参数,因此本发明可以快速有效地优化得出最优的光刻配置参数,并有较高的精度。 [0019] Meanwhile, the present invention is by a steepest descent optimization algorithm determines the steepest descent direction of each of the lithography configuration parameters, and to optimize the lithographic performance in the direction of steepest descent, photolithography obtain optimal lithographic performance with configuration parameters, and therefore the present invention can be obtained quickly and efficiently optimize the optimum configuration parameters of the lithography, and has a high accuracy.

附图说明 BRIEF DESCRIPTION

[0020] 图1为基于最速下降法光刻配置参数的优化方法流程图。 [0020] FIG. 1 is a flowchart of a method of steepest descent method to optimize the lithography configuration parameters.

[0021] 图2为搜索范围与最速下降方向、迭代光刻配置参数点关系图。 [0021] FIG. 2 is a search range with the steepest descent direction, photolithography iterative configuration parameter diagram.

[0022] 图3为一维搜索的流程图。 [0022] FIG. 3 is a flowchart of one-dimensional search.

[0023] 图4为第一次确定一维搜索范围示意图。 [0023] FIG. 4 is a first schematic view of determining a one-dimensional search range.

[0024] 图5为优化过程中光刻性能综合评价函数的下降曲线。 [0024] FIG. 5 is a graph optimization process decreased the total evaluation function lithographic performance.

[0025] 图6为优化过程中光刻焦深的变化曲线 [0025] FIG. 6 is a lithographic optimization process focus depth curve

具体实施方式 detailed description

[0026] 下面结合附图进一步对本发明进行详细说明。 The invention will be further described in detail [0026] below in conjunction.

[0027] 图1为本发明基于最速下降法光刻配置参数的优化方法流程图,其具体步骤为: [0027] Figure 1 is a flowchart of a method based on the steepest descent method to optimize the lithography configuration parameters to the invention, including the following steps:

[0028] 步骤101、确定欲优化的η种光刻配置参数,针对每一种光刻配置参数选定一初始值构成IXn维矩阵UJ1 = (X1, X2» L, XnI1, i = {1,2, L, η};确定每种光刻配置参数的变化范围(Xi e [ai; bj = Ha^h1, [a2,b2]L, [an, bn]},确定每种光刻配置参数的用于求解差商的差值(Axi e Iiai, bj},其中I Axi I << Xi ;给定优化精度允许误差ε >0,最大一维搜索次数k_,并令循环次数k = I。 [0028] Step 101, it is determined to be an optimized configuration parameters η species photolithography, the initial value of a selected one of the configuration parameters configured for each IXn dimensional matrix UJ1 a lithographic = (X1, X2 »L, XnI1, i = {1, 2, L, η}; determining the variation range of each parameter of the lithography configuration (Xi e [ai; bj = Ha ^ h1, [a2, b2] L, [an, bn]}, determining configuration parameters for each lithography value difference for solving's (Axi e Iiai, bj}, wherein I Axi I << Xi; optimize accuracy given tolerance ε> 0, the maximum number of one-dimensional search k_, and so the number of cycles k = I.

[0029] 在优化光刻配置参数的过程中需要统筹考虑对光刻性能存在影响的参数,因此本发明所述欲优化的光刻参数包括投影物镜数值孔径NA的大小、照明相干因子Sigma的值、偏振光类型、光刻胶厚度以及掩模Bias大小等。 [0029] The need exists into consideration the influence parameters on the lithographic performance of a lithographic process optimization in the configuration parameters, and thus the present invention is optimized to be the value of the size parameter includes a lithographic projection objective numerical aperture NA, the coherence factor of the illumination of the Sigma polarization type, and the thickness of the photoresist mask Bias size. 针对某一光刻技术节点下的图形结构,其每一光刻配置参数的大概可变化范围是确定的,因此本发明根据选定光刻技术节点以及图形结构类型,确定其对应的每一光刻配置参数的可变化范围。 For the graph structure in a lithography technology nodes, each of which may be photolithography approximate range change configuration parameters are determined, thus the present invention is selected in accordance with a photolithography technique, and the graph structure type node, each determined corresponding light engraved configuration parameters changeable range. 本发明精度允许误差ε可以根据实际的需要进行选取,例如当优化的光刻机需要有较高的光学性能要求时,则可将ε选取为小于0.01的数。 The present invention allows the accuracy of error ε can be selected according to actual needs, for example, when the lithography machine optimization requires a high optical performance requirements, may be selected ε is a number less than 0.01.

[0030] 步骤102、确定用于评价光刻性能的m种光刻性能评价指标y」,j = {I, 2, L,m},并 [0030] Step 102, determining the lithographic performance evaluation of m types of lithographic performance evaluation index y ', j = {I, 2, L, m}, and

m m

构造光刻性能综合评价函数,其中L为针对各光刻性能评价指标设定的比 Lithographic performance evaluation function construction, where L is set for each lithographic performance evaluation index ratio

;=1重值。 ; Weight value = 1.

[0031] 本发明光刻性能的评价指标包括图形对比度Contrast、归一化对数斜率NILS以及光刻焦深DOF等,其中比重值是根据每种评价指标对光刻性能的重要程度进行设定,当重要程度高时,则比重值可设置较大,当重要程度低,则比重值可设置较小,通过综合考虑各种评价指标构造综合评价函数,可以很好地实现对优化光刻配置参数的光刻机的光刻性能进行评价。 [0031] Evaluation of the performance of the present invention comprises a lithographic pattern contrast Contrast, normalized logarithmic slope NILS lithographic depth of focus DOF ​​and the like, wherein the specific gravity is important to set the degree of lithographic performance evaluation according to each when the high degree of importance, the specific gravity values ​​can be set larger when the degree of importance is low, the proportion of smaller values ​​can be set by considering the total evaluation function evaluation of various configurations, the configuration can realize the optimization of the lithography lithography lithographic performance parameters are evaluated.

[0032] 步骤103、对循环次数k进行判断,若k ( kmax,则进入步骤104,若k > kmax,则进入步骤108。 [0032] Step 103, the determination of the number of cycles k, if k (Kmax, the process proceeds to step 104, if k> kmax, the process proceeds to step 108.

[0033] 步骤104、针对光刻配置参数IxJk计算其差商,获取最速下降方向{屯},, [0033] Step 104, for calculating the difference quotient lithography configuration parameters IxJk, acquiring the steepest descent direction Tun {} ,,

Figure CN102346379BD00061

,其中⑷j1Xn维矩阵。 Which ⑷j1Xn dimensional matrix.

[0034] 步骤105、对II {dJkl I进行判断,当判定II {dJkl I ( ε,进入步骤106,否则进入步骤108,其中1111为取模运算。 [0034] Step 105, a judgment II {dJkl I, when it is determined II {dJkl I (ε, proceeds to step 106, otherwise proceeds to step 108, where 1111 is the modulo operation.

[0035] 步骤106、针对光刻配置参数IxJk,根据其对应的最速下降方向{djk更新其所对应的一维搜索变化范围为(Xi e [Ui, Vi]}k,且; [0035] Step 106, the configuration parameters for the lithography IxJk, according to the steepest descent direction of the corresponding one-dimensional {djk update its corresponding search range is (Xi e [Ui, Vi]} k, and;

[0036] 步骤107、针对光刻配置参数{xjk,在其所对应的变化范围{[Ui,ViJIk内,沿其对应的最速下降方向{dj k进行一维搜索,得到该方向最小的F值,记为Fmin,获取Fmin对应的光刻配置参数{xjk,并将{xjk作为下一次循环的光刻配置参数,令k = k+Ι,返回步骤103 ; [0036] Step 107, the configuration parameters for the lithography {xjk, {[Ui, the ViJIk, which corresponds to the steepest descent direction {dj k in the one-dimensional search for its corresponding range of variation, to obtain the minimum value of the direction F , referred to as Fmin, Fmin corresponding to obtain configuration parameters {xjk photolithography, and {xjk configured as photolithography next cycle parameters, so that k = k + Ι, returns to step 103;

[0037] 步骤108、输出最优光刻配置参数{Xi}k,以及{xjk所对应的F值。 [0037] Step 108, the output of the optimum configuration parameters photolithography {Xi} F value k, and the corresponding {xjk.

[0038] 由于一维搜索的范围(或端点)需根据最速下降方向、迭代光刻配置参数点IxJk以及光刻配置参数的变化范围共同确定。 [0038] Since the scope of the common one-dimensional search is determined (or endpoint) to be based on the steepest descent direction, the iterative configuration parameter IxJk lithography and photolithography range configuration parameters. 如图2所示,例如图2(1)中的搜索的维数为2,其对应的范围分别为(a1; bj和(a2,b2),其最速下降方向为^方向,迭代光刻配置参数点为(X1, X2),根据上述条件所更新的搜索范围为(UpV1)和(u2,v2)。以下对对如何更新搜索范围进行具体的说明,其步骤如下: As shown, for example, the dimension of FIG. 2 (a) the search is 22, which corresponds to the ranges of (a1; bj and (a2, b2), which direction is the steepest descent direction ^, lithography configuration iteration parameter points (X1, X2), based on the conditions of the updated search range (UpV1) and (u2, v2) hereinafter, how to update the search range will be specifically described, comprises the following steps:

[0039]定义中间变量{HL ,w„^Pjv1,v2,L ,vn}k ; [0039] The definition of intermediate variables {HL, w "^ Pjv1, v2, L, vn} k;

[0040] 步骤201、针对第P种光刻配置参数(Xp)k,其中变量P e {l,2,L,n},判断(dp)k的正负:[0041]当(dp)k > O时,则令中间变量(七)t= (aj,中间变量(I)jt = (I), [0040] Step 201, for the first kind of lithography configuration parameters P (Xp) k, where the variable P e {l, 2, L, n}, is determined (dp) k is positive or negative: [0041] if (dp) k > when O, so that the intermediate variables (g) t = (aj, an intermediate variable (I) jt = (I),

[0042]当(dp) k < O时,则令中间变量(七)t = [bp),中间变量(I)t = (\), [0042] When (dp) k <O, then make the intermediate variables (VII) t = [bp), the intermediate variable (I) t = (\),

[0043]当(dp)k = O时,则令中间变量(七)t= (xj,中间变量(I)jfc = (Xi)jt ; [0043] When (dp) k = O, then make the intermediate variables (VII) t = (xj, intermediate variable (I) jfc = (Xi) jt;

[0044] 步骤202、判断变量P是否取遍I至η上的所有正整数,若是则进入步骤203,否则返回步骤201 ; [0044] Step 202, it is determined whether or not the variable P I to take over all positive integers η, if the process proceeds to step 203, otherwise the process returns to step 201;

[0045] 步骤203、针对第P种光刻配置参数(Xp)k,判断(dp)k是否为O: [0045] Step 203, for the first kind of lithography configuration parameters P (Xp) k, is determined (dp) k whether O:

[0046]当(dp)k = O 时,则令,(v,\ = (v,\ ; [0046] When (dp) k = O, then let, (v, \ = (v, \;

[0047]当(dp)k 关O 时'则(Up)k = (Xp)k+gk.(dp)k, (Vp)k = (xp)k+hk.(dp)k ; [0047] When (dp) k off when O 'if (Up) k = (Xp) k + gk (dp) k, (Vp) k = (xp) k + hk (dp) k.;

[0048]其中gk为nn中绝对值最小的一个,&为m)]中绝对值最小的一个; [0048] wherein nn is the absolute value gk a minimum, a minimum of m &)] in absolute value;

[0049] 步骤204、判断变量P是否取遍I至η上的所有正整数,若是则结束,否则返回步骤203。 [0049] Step 204, it is determined whether or not the variable P to take over all positive integers I [eta] on, if it ends, otherwise returns to step 203.

[0050] 为了快速准确地获取具有最小光刻性能综合评价函数值F的I Xn维矩阵{Xi}k+1,本发明利用Hopf inger黄金分割法,逐步缩小光刻配置参数的范围进行一维搜索,直至获取具有最小光刻性能综合评价函数值F的IXn维矩阵{Xi}k+1为止,如图3所示,由于步骤107中针对每一光刻配置参数,其进行一维搜索的方法相同,针对第q种光刻配置参数,一维搜索的具体步骤为: [0050] In order to obtain fast and accurate dimensional matrix I Xn {Xi} k + 1 has a comprehensive evaluation function value F is a minimum lithographic performance, the present invention utilizes Hopf inger golden section method, photolithography gradually narrow range one-dimensional configuration parameters searching until obtaining lithographic performance with a minimum value of the total evaluation function F IXn dimensional matrix of {Xi} k + 1 up, shown in Figure 3, in step 107 since the configuration parameters for each photolithography, which is one-dimensional search same method as for the first configuration parameter q photolithography species, particularly one-dimensional search step of:

[0051]设定变量{V pU' 2,L,u/ Jplv' 2,L,v' n}t、{X' P λ ' 2,L, λ ' Jt 以及{μ ' P μ ' 2,L,μ ' Jt ; [0051] The variable set {V pU '2, L, u / Jplv' 2, L, v 'n} t, {X' P λ '2, L, λ' Jt and {μ 'P μ' 2, L, μ 'Jt;

[0052]步骤 301、令{V Jt=IuiD' Jt = IvJk, i = {1,2, L, η},并设定一维搜索精度因子S。 [0052] Step 301, so that {V Jt = IuiD 'Jt = IvJk, i = {1,2, L, η}, and the search accuracy set a dimensional factor S.

[0053] 步骤302、根据黄金分割法计算搜索分割点光刻配置参数值{λ ' Jt和{μ' Jt,令循环次数t = I,{ λ ' Jt=Iu' 1+0.382(^ Jt-{u/ Jt), { μ ; Jt=Iu' Jt+0.618({V 丄-1V丄),获得搜索区间端点光刻配置参数值{V丄和{V丄,以及搜索区间分割点光刻配置参数值U '丄和{>'丄,其中{V丄、{V Jt, {λ ^ Jt和{μ' Jt这四个集合中的每一个对应一种光刻配置方式;仿真计算IV Jt、{V Jt,{λ '丄和{μ '丄分别对应的m种光刻性能评价指标{yj}u, ,t、{yj)v ,t、{yjh,,,和{yj [0053] Step 302 is calculated according to the Golden Section search photolithography split point configuration parameter values ​​{λ 'Jt and {μ' Jt, so cycle times t = I, {λ 'Jt = Iu' 1 + 0.382 (^ Jt- {u / Jt), {μ; Jt = Iu 'Jt + 0.618 ({V Shang Shang -1V), obtained search space lithographic endpoint configuration parameter values ​​{V {V and Shang Shang, and search space division points arranged lithography parameter value U 'and Shang {>' Shang, wherein {V Shang, {V Jt, {λ ^ Jt these four sets and {[mu] Jt 'corresponding to each of a lithographic arrangement; Jt simulation IV, {V Jt, {λ 'and Shang {μ' m kinds of lithographic performance evaluation Shang respectively corresponding to {yj} u,, t, {yj) v, t, {yjh ,,, {yj and

m m

λ- ,t;将光刻性能评价指标{yj)v ,t、IyjIv- ,t、{yjh, ,t和{yjr ,t代入公式F = , λ-, t; A lithographic performance evaluation {yj) v, t, IyjIv-, t, {yjh,, t and {yjr, t into the formula F =,

;=1 ; = 1

得到IV ih、{V丄、U'丄和{μ'丄对应的光刻性能综合评价函数值,分别记为Fu,,t、Fv,,t、FA, ,t以及Fli, ,t。 To give IV ih, {V Shang, U 'and Shang {μ' corresponding to the lithographic performance Shang comprehensive evaluation function value, respectively denoted Fu ,, t, Fv ,, t, FA,, t and Fli,, t. 本发明针对一确定的光刻系统,获取其对应的光刻性能评价指标为现有技术,因此在此不对获取性能评价指标的过程作具体的描述。 The present invention is directed to a lithography system is determined, obtaining lithographic performance evaluation index corresponding to the prior art, so this procedure does not obtain Performance Evaluation specifically described here.

[0054] 步骤303、比较搜索区间端点与分割点光刻配置参数值所对应的光刻性能综合评价函数值Fu,,t、Fv,,t、FA, ,t 以及Fli, ,t 的大小,令Fmin = min{Fu, ,t,Fv, ,t,FA, ,t,F,, ,J ; [0054] Step 303, the comparison search section arranged end to division point lithographic lithographic performance Comprehensive evaluation function value corresponding to the parameter value Fu ,, t, Fv ,, t, FA,, t and Fli,, t size, so Fmin = min {Fu,, t, Fv,, t, FA,, t, F ,,, J;

[0055]步骤 304、若Fu, , t = Fmin 或Fa , , t = Fmin,则进入步骤305 ;若Fli, , t = Fmin 或Fv,,t = Fmin,则进入步骤306。 [0055] Step 304, if Fu,, t = Fmin or Fa,, t = Fmin, the process proceeds to step 305; if Fli,, t = Fmin or Fv ,, t = Fmin, the process proceeds to step 306. [0056]步骤 305、令{V Jt+1 = {u; Jt, {v; J t+1 = {μ ; Jt ,{μ' Jt+1 = { λ ; ilt,{λ, Jw=Iu' Jt+1+0.382 ({¥; Jt+1-{u/ i}t+1),仿真计算出{ λ ' i}t+1 对应的光刻性能评价指标{yj λ丨,t+1,根据性能评价指标{&} λ , , t+1获取{ λ ' J t+1对应的光刻性能综合评价函数值Fa, ,t+1,并进入步骤307。 [0056] Step 305, so that {V Jt + 1 = {u; Jt, {v; J t + 1 = {μ; Jt, {μ 'Jt + 1 = {λ; ilt, {λ, Jw = Iu' Jt + 1 + 0.382 ({¥; Jt + 1- {u / i} t + 1), the simulation {λ 'i} t + 1 corresponding to the lithographic performance evaluation index {yj λ Shu, t + 1, the performance evaluation {&} λ,, t + 1 Get {λ 'J t + 1 corresponding to the lithographic performance of comprehensive evaluation function value Fa,, t + 1, and proceeds to step 307.

[0057]步骤 306、令{V Jt+1= {λ ; Jt, {v; Jt+1 = {v1 丄,{入'Jt+i = {Ii ;丄,{μ' Ju1=IV丄+1+0.eisGv' Jt+1-{u/丄+1),仿真计算出{μ '丄+1对应的光刻性能评价指标{yj μ, , t+1,根据性能评价指标{&} u, , t+1获取{ μ ' J t+1对应的光刻性能综合评价函数值Fli, ,t+1,并进入步骤307。 [0057] Step 306, so that {V Jt + 1 = {λ; Jt, {v; Jt + 1 = {v1 Shang, {into 'Jt + i = {Ii; Shang, {μ' Ju1 = IV + 1 Shang + 0.eisGv 'Jt + 1- {u / Shang + 1), the simulation {μ' Shang lithographic performance evaluation index corresponding to the +1 {yj μ,, t + 1, the performance evaluation {&} u ,, t + 1 Get {μ 'J t + 1 corresponding to the lithographic performance of comprehensive evaluation function values ​​Fli,, t + 1, and proceeds to step 307.

[0058] 步骤307、当判定II { μ ' Jt+1-{ λ ; Jt+11 < δ时,进入步骤308,否则,令t =t+Ι,返回步骤303。 [0058] Step 307, when it is determined II {μ 'Jt + 1- {λ; Jt + 11 <[delta] time, proceeds to step 308, otherwise, let t = t + Ι, returns to step 303.

[0059]步骤 308、令Fmin = min{Fu, ,t+1,Fv, ,t+1,FA, jt+1,F,, ,t+1},获取Fmin 对应的光刻配置参数{xjk,结束一维搜索。 [0059] Step 308, so Fmin = min {Fu,, t + 1, Fv,, t + 1, FA, jt + 1, F ,,, t + 1}, corresponding to obtain Fmin photolithography configuration parameters {xjk the end of the one-dimensional search.

[0060] 本发明实施实例: [0060] Example embodiments of the present invention:

[0061] 下面以优化45nm节点光刻配置参数为例说明本发明的优化过程。 [0061] Next, in order to optimize the lithographic 45nm node an example configuration parameters optimization process of the present invention.

[0062] 对45nm节点密集线条,采用浸没式光刻,浸没液体折射率为1.44,投影物镜数值孔径在[1,1.35]内可调,曝光波长为193nm,使用分辨率增强技术来提高其分辨率和增大光刻焦深,掩模类型选择衰减相移掩模,照明方式选择环形照明,在提高分辨率的同时为了保证产率,环形照明方式的环宽选择为0.15,也即外相干因子与内相干因子之间的差为0.15(Δ σ = Oout-Oin = 0.15) 0为了进一步增大光刻焦深,光刻仿真时使用了和线条方向相同的线偏振光。 [0062] of 45nm dense lines nodes using immersion lithography, the immersion liquid refractive index of 1.44, the numerical aperture of the projection objective [1,1.35] the adjustable exposure wavelength of 193 nm, using resolution enhancement techniques to improve the resolution and increasing the depth of focus of photolithography, mask types selected attenuated phase shift mask, an illumination mode selection annular illumination, while increasing the yield of the resolution in order to ensure, annular illumination mode select ring width is 0.15, i.e. an outer coherent a difference between the factor and the coherence factor of 0.15 (Δ σ = Oout-Oin = 0.15) 0 to further increase the focal depth of photolithography, and using the same line when the line direction of the polarized light lithography simulation.

[0063] 为简明起见,本发明仅以优化光刻机中数值孔径和相干因子为例,说明基于最速下降法光刻配置参数的优化方法。 [0063] For simplicity, only the optimization of the present invention lithography numerical aperture and coherence factor, for example, based on the steepest descent method described lithographic optimization parameter configuration. 针对上述光刻配置,给定数值孔径的初始值为1.15,变化范围为[1,1.35],差值为0.01 ;给定相干因子的初始值为0.915,变化范围为[0.64,0.9 9 ],差值为0.0I ;选择空气中像对比度y 1、光刻胶中归一化对数斜率y 2、光刻焦深Y3为光刻性能评价指标,分别给定0.2,0.2、5的比重值,则光刻性能综合评价函数为F=-(YI * Yi+ Y 2 * y2+ Y 3 * y3) = -(0.2.yi+0.2.y2+5.y3);给定优化精度允许误差ε = The photolithography configuration for, a given initial value of the numerical aperture of 1.15, the range of variation [1,1.35], a difference of 0.01; an initial value of a given coherence factor 0.915, the range of variation [0.64,0.9 9], difference is 0.0I; select image contrast air y 1, the photoresist normalized y 2, Y3 lithographic depth of focus of lithographic performance evaluation log slope, each value given proportion 0.2,0.2,5 , the lithographic performance comprehensive evaluation function F = - (YI * Yi + Y 2 * y2 + Y 3 * y3) = - (0.2.yi + 0.2.y2 + 5.y3); optimize accuracy given tolerance ε =

0.001,给定最大一维搜索次数为45次。 0.001, given a maximum of one-dimensional searches of 45 times. 下面通过本发明的方法来确定最佳的光刻配置参数(数值孔径与相干因子的配置),以得到最优光刻性能。 Below to determine the optimal lithography configuration parameters (with the numerical aperture is disposed coherence factor) by the method of the present invention, in order to obtain optimal lithographic performance.

[0064]在给定初始点(X1J1 = {x1? X2I1 = {χΝΑ» xSigmal I = {1.15,0.915} i 处求最速下降方向,最速下降方向为初始点处的负梯度方向,则最速下降方向为: [0064] steepest descent direction given initial point (X1J1 = {x1? X2I1 = {χΝΑ »xSigmal I = {1.15,0.915} i at the request, the steepest descent direction of the negative gradient direction at the initial point, the steepest descent direction for:

Figure CN102346379BD00081

[0069]根据初始点(X1, X2I1 = {1.15,0.915:^ 和最速下降方向{(11; (IJ1 = {3.5986,0.0046} i,并在参数变化范围La1, IdJ1 = [1,1.35]和[a2,= [0.64,0.99]内,确定一维搜索的范围,如图4所示。具体的过程为: [0069] According to the initial point (X1, X2I1 = {1.15,0.915: ^ steepest descent direction and {(11; (IJ1 = {3.5986,0.0046} i, and the parameter range La1, IdJ1 = [1,1.35] and [a2, = [0.64,0.99] within a determined range of one-dimensional search, the specific procedure shown in Figure 4 as follows:

[0070]首先、由于 [0070] First, since the

Figure CN102346379BD00091

则令A =¾ ? ^2 = ^2,艮P Then let A = ¾? ^ 2 = ^ 2, Gen P

Figure CN102346379BD00092

[0071]其次、由于 [0071] Second, since the

Figure CN102346379BD00093

[0072] 其中g为j^^j,i = 1,2中绝对值最小的一个: [0072] wherein g is the j ^^ j, i = 1, 2, the absolute value of a minimum:

Figure CN102346379BD00094

[0075]则 g = -0.0417 ; [0075] if g = -0.0417;

[0076] h为|.^^|,i = 1,2中绝对值最小的一个: [0076] h is | ^^ |, i = 1, a minimum absolute value:

Figure CN102346379BD00095

[0080]可得[ [0080] available [

Figure CN102346379BD00096

[0081] 接下来在一维搜索范围{[Ui, ViII1内进行一维搜索,搜得在{x1; X2I2 = {1.15, [0081] Next, in a one-dimensional search range {[Ui, the one-dimensional search ViII1, have found in {x1; X2I2 = {1.15,

0.915}2 处综合评价函数值 0.915} Comprehensive evaluation function value at 2

Figure CN102346379BD00097

最小,结束第一轮循环。 Minimum, the end of the first cycle.

[0082] 图5为光刻性能综合评价函数的下降曲线,图6为光刻焦深的变化曲线,从图5和图6中可看出,经过一次一维搜索即可将光刻性能综合评价函数下降到最优值附近,极大地提高了光刻性能。 [0082] FIG 5 is a total evaluation function decline curve lithographic performance, FIG. 6 is a depth of focus of the lithographic curve, can be seen in FIGS. 5 and 6, and after a one-dimensional search can be integrated lithographic performance evaluation function falls to near optimal value, greatly improved lithographic performance. 在初始点处,光刻性能综合评价函数值为-0.0817,光刻焦深为0,经过第一次一维搜索,光刻性能综合评价函数值为迅速降为-3.0859,光刻焦深变为0.5291微米,经过不断的一维搜索后,光刻性能也在不断地变优,最终在数值孔径为1.283,相干因子为0.915时,光刻性能综合评价函数值为-3.0966,光刻焦深为0.5312微米。 At the initial point, the lithographic performance of comprehensive evaluation function value -0.0817 lithographic depth of focus is 0, after the first one-dimensional search, the lithographic performance of comprehensive evaluation function value -3.0859 rapidly reduced, the lithographic depth of focus becomes to 0.5291 microns, after continuous one-dimensional search, the lithographic performance are constantly becomes excellent, the final numerical aperture of 1.283, a coherent factor is 0.915, the lithographic performance of comprehensive evaluation function value -3.0966 lithographic depth of focus to 0.5312 microns.

[0083] 虽然结合附图描述了本发明的具体实施方式,但是对于本技术领域的技术人员来说,在不脱离本发明的前提下,还可以做若干变形、替换和改进,这些也视为属于本发明的保护范围。 [0083] Although the drawings illustrate specific embodiments of the present invention in conjunction with, but for a person skilled in the art, without departing from the present invention, further can be done a number of variations, substitutions and modifications, which are also considered It falls within the scope of the present invention.

Claims (2)

  1. 1.一种基于最速下降法光刻配置参数的优化方法,其特征在于,具体步骤为: 步骤101、确定欲优化的η种光刻配置参数,针对每一种光刻配置参数选定一初始值构成IXn维矩阵UJ1 = {χ1; χ2,..., xn}l, i = {1,2,..., η};确定每种光刻配置参数的变化范围(Xi e [ai; bj} = {a1; bj , [a2, b2..., [an, bn]},确定每种光刻配置参数用于求解差商的差值{Λ XiE Iiai, bj},其中I AxiIwIxiI ;给定优化精度允许误差ε > 0,最大一维搜索次数k_,并令循环次数k = I ; 步骤102、确定用于评价光刻性能的m种光刻性能评价指标、,.j = {1,2,…,m},并构造光刻性能综合评价函数 An optimization method based on the steepest descent lithography configuration parameters, wherein the specific steps: Step 101, it is determined to be an optimized configuration parameters η photolithography species, a selected one of the initial configuration parameters for each of the lithography value forms IXn dimensional matrix UJ1 = {χ1; χ2, ..., xn} l, i = {1,2, ..., η}; determining range (Xi e [ai lithographic each configuration parameter; bj} = {a1; bj, [a2, b2 ..., [an, bn]}, lithography configuration parameters determined for each difference quotient for solving the difference {Λ xiE Iiai, bj}, wherein I AxiIwIxiI; optimization of a given precision tolerance ε> 0, the maximum number of one-dimensional search K_, and so the number of cycles k = I;. step 102, it is determined for evaluating the lithographic performance of m types of lithographic performance evaluation ,, j = {1 , 2, ..., m}, and configured comprehensive lithographic performance evaluation function
    Figure CN102346379BC00021
    其中L为针对各光刻性能评价指标设定的比重值; 步骤103、对循环次数k进行判断,若k ( kmax,则进入步骤104,若k > kmax,则进入步骤108 ; 步骤104、针对光刻配置参数IxJk计算其差商,获取最速下降方向{屯},, Wherein L is the specific gravity values ​​of lithographic performance evaluation index set for; step 103, the determination of the number of cycles k, if k (Kmax, the process proceeds to step 104, if k> kmax, the process proceeds to step 108; step 104, for IxJk lithography configuration parameters calculated difference quotients, acquiring the steepest descent direction Tun {} ,,
    Figure CN102346379BC00022
    ,{dj k 为IX η 维矩阵;.J k 步骤105、对II {dJJ I进行判断,当判定11 {djk| I ( ε,进入步骤106,否则进入步骤18,其中1111为取模运算; 步骤106、针对光刻配置参数IxJk,根据其对应的最速下降方向{dJk更新其所对应的—维搜索变化范围为Ixi e [Ui,Vi]}k,且伽,.,视秦骑; 步骤107、针对光刻配置参数{xjk,在其所对应的变化范围{[Ui,ViIIk内,沿其对应的最速下降方向{dJk进行一维搜索,得到该方向最小的F值,记为Fmin,获取Fmin对应的光刻配置参数{xjk,并将{xjk作为下一次循环的光刻配置参数,令k = k+Ι,返回步骤103 ; 步骤108、输出最优光刻配置参数IxJ k,以及{xjk所对应的F值。 , {Dj k is IX η-dimensional matrix; .J k in step 105, a judgment II {dJJ I, when it is determined 11 {djk | I (ε, proceeds to step 106, otherwise proceeds to step 18, where 1111 is a modulo operation; step 106, the configuration parameters for the lithography IxJk, in accordance with the corresponding direction of steepest descent update its corresponding {dJk - dimensional search range of Ixi e [Ui, Vi]} k, and gamma, depending Qin ride; step 107, the configuration parameters for the lithography {xjk, it corresponds to the range {[Ui, the ViIIk, along the direction corresponding to the steepest descent {dJk a one-dimensional search, the direction F to obtain the minimum value, referred to as the Fmin, Fmin corresponding to obtain configuration parameters {xjk photolithography, and the next cycle {xjk as photolithography configuration parameters, so that k = k + Ι, returns to step 103; step 108, the output of the optimum configuration parameters photolithography IxJ k, and {xjk corresponding F values.
  2. 2.根据权利要求1所述基于最速下降法光刻配置参数的优化方法,其特征在于,所述步骤106中针对光刻配置参数IxJk,根据其对应的最速下降方向{djk更新其所对应的变化范围为Ixi e [Ui, ViJIk的具体过程如下: 定义中间变量丨ύ„丨Α和{AI,; 步骤201、针对第P种光刻配置参数(Xp)k,其中变量P e {1,2,…,n},判断(dp)k的正负: 当(dp)k > ο时,则令中间变量 2. The method of claim 1 lithography optimization method of steepest descent configuration parameters, characterized in that, in step 106 the parameters for the lithography configuration IxJk, in accordance with the corresponding direction of steepest descent update its corresponding {djk It ranged Ixi e [Ui, ViJIk specific process is as follows: the definition of intermediate variables Shu ύ "Shu Α and {AI ,; step 201, the configuration parameters (Xp) k P for kind of lithography, where the variable P e {1, 2, ..., n}, is determined (dp) k is positive or negative: if (dp) k> when ο, so that the intermediate variables
    Figure CN102346379BC00023
    中间变量.L=M, 当(dp)k < O时,贝U令中间变量d),: ,中间变量(d ^ iap) I 当(dp)k = O时,则令中间变量问ΚΊ ,中间变量〜; 步骤202、判断变量P是否取遍I至η上的所有正整数,若是则进入步骤203,否则返回步骤201 ; 步骤203、针对第P种光刻配置参数(Xp)k,判断(dp)k是否为O: 当((Jp)k = ο 时,则令卜,,);:m =IM;当(dp)k 关O 时,则(Up)k = (Xp) k+gk.(dp)k, (vp)k = (xp) k+hk.(dp)k ; 其中gk为 The intermediate variable .L = M, when (dp) k <O, U shell so that the intermediate variables d) ,:, intermediate variables (d ^ iap) I when (dp) k = O, so that the intermediate variables Q ΚΊ, ~ intermediate variable; in step 202, it is determined whether or not the variable P to take over all positive integers I [eta] on, if the process proceeds to step 203, otherwise the process returns to step 201; step 203, for the first kind of lithography configuration parameters P (Xp) k, is determined (dp) k O whether: if ((Jp) k = o when, then let Bu ,,) ;: m = IM; if (dp) k off O, then (Up) k = (Xp) k + . gk (dp) k, (vp) k = (xp) k + hk (dp) k;. wherein gk is
    Figure CN102346379BC00031
    中绝对值最小的一个,hk为 A minimum absolute value, hk is
    Figure CN102346379BC00032
    中绝对值最小的一个; 步骤204、判断变量P是否取遍I至η上的所有正整数,若是则结束,否则返回步骤203。 A minimum absolute value; step 204, it is determined whether or not the variable P to take over all positive integers I [eta] on, if it ends, otherwise returns to step 203.
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