CN102294329A - Precleaning device for silicon wafer of solar cell - Google Patents
Precleaning device for silicon wafer of solar cell Download PDFInfo
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- CN102294329A CN102294329A CN2011101927232A CN201110192723A CN102294329A CN 102294329 A CN102294329 A CN 102294329A CN 2011101927232 A CN2011101927232 A CN 2011101927232A CN 201110192723 A CN201110192723 A CN 201110192723A CN 102294329 A CN102294329 A CN 102294329A
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- solar cell
- frock
- silicon wafer
- silicon chip
- installing rack
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Abstract
The invention discloses a precleaning device for a silicon wafer of a solar cell, comprising a spraying rinse tank, wherein the spraying rinse tank is internally provided with a tool, the tool comprises a tool support and a mounting frame, the tool support is fixed on the mounting frame, spraying pipes are respectively arranged at the two sides of the tool support in the spraying rinse tank, are respectively arranged at the two ends of the mounting frame and outside the spraying rinse tank, the thrustors respectively comprises a cylinder, the cylinder is provided with a connecting rod, the connecting rod is provided with a top cap, the top cap is movably connected with an inclined board and the inclined board is fixedly connected with the mounting frame. The precleaning device for the silicon wafer of the solar cell in the invention has the beneficial effects: the tool is inclined at a certain angle during cleaning the silicon wafer, so that water flows wash onto the whole silicon wafer of the solar cell, thus the silicon wafer of the solar cell can be rinsed off in one step and the water is greatly saved.
Description
Technical field
The present invention relates to the cleaning device of silicon chip of solar cell, relate in particular to the precleaning unit of silicon chip of solar cell.
Background technology
Silicon chip of solar cell is impurity such as the residual a large amount of cutting liquid of surface meeting, silica flour, silica and other metal ion in cutting process, carry out water prewashing earlier to remove its lip-deep impurity so silicon chip of solar cell need be sent into cleaning device.As shown in Figure 1, traditional precleaning unit mainly comprises spray Cleaning for High Capacity groove 1, be placed with frock 2 in the spray Cleaning for High Capacity groove 1, the effect of frock 2 is to be used for fixing the silicon chip of solar cell 4 that placement need be cleaned, the structure of frock 2 mainly comprises frock support 21 and installing rack 22, frock support 21 is fixed on the installing rack 22, the silicon chip of solar cell 4 that fixed placement need be cleaned in the frock support 21, frock support 21 is equidistantly to be welded by many steel pipes, in spray Cleaning for High Capacity groove 1 and the both sides that are positioned at frock support 21 be respectively arranged with shower 3, in the shower 3 ejection water clean a day sun to the frock support 21 can a cell silicon chip.The water that is arranged in shower 3 ejections of frock support 21 both sides is sprayed onto on the silicon chip of solar cell 4 with certain radian, the meniscate dead angle that does not clean to appears in the middle and upper part of silicon chip of solar cell 4 easily, the water yield that this just need carry out silicon chip of solar cell 4 secondary cleaning or prolong the time of spray or strengthen spray, above-mentioned cleaning way such as need are rinsed then silicon chip of solar cell 4 well not only time-consuming but also water wasting.
Summary of the invention
The technical problem of solution required for the present invention is: will provide a kind of once flushing just the full wafer silicon chip of solar cell can be rinsed well, and the precleaning unit of water-saving silicon chip of solar cell.
For addressing the above problem, the technical solution used in the present invention is: the precleaning unit of silicon chip of solar cell, comprise the spray Cleaning for High Capacity groove, be provided with frock in the spray Cleaning for High Capacity groove, described frock comprises frock support and installing rack, the frock support is fixed on the installing rack, in the spray Cleaning for High Capacity groove and the both sides that are positioned at the frock support be respectively arranged with shower, the two ends of installing rack are separately installed with thrustor outside the spray Cleaning for High Capacity groove, the structure of described thrustor comprises: cylinder, and cylinder is provided with connecting rod, and connecting rod is provided with the top cap, be connected with hang plate on the cap of top, described hang plate is fixedlyed connected with installing rack.
Beneficial effect of the present invention: the certain angle that during cleaning frock tilted, make current be flushed to the full wafer silicon chip of solar cell, so just can the silicon chip of solar cell once flushing is clean, saved water greatly.
Description of drawings
Fig. 1 is the schematic diagram of the precleaning unit of the silicon chip of solar cell described in the background technology of the present invention.
Fig. 2 is the schematic diagram of the precleaning unit of silicon chip of solar cell of the present invention.
Among Fig. 1: 1, spray Cleaning for High Capacity groove, 2, frock, 21, the frock support, 22, installing rack, 3, shower, 4, silicon chip of solar cell.
Among Fig. 2: 1, spray Cleaning for High Capacity groove, 2, frock, 21, the frock support, 22, installing rack, 3, shower, 4, first thrustor, 41, first cylinder, 42, head rod, 43, the first top cap, 44, first hang plate, 5, second thrustor, 51, second cylinder, 52, second connecting rod, 53, the second top cap, 54, second hang plate, 6, silicon chip of solar cell.
The specific embodiment
The present invention is described in further detail below in conjunction with the drawings and specific embodiments.
As shown in Figure 2, the precleaning unit of silicon chip of solar cell, comprise spray Cleaning for High Capacity groove 1, be provided with frock 2 in the spray Cleaning for High Capacity groove 1, frock 2 comprises frock support 21 and installing rack 22, frock support 21 is fixed on the installing rack 22, in spray Cleaning for High Capacity groove 1 and the both sides that are positioned at frock support 2 be respectively arranged with shower 3, the two ends of installing rack 22 are separately installed with first thrustor 4 and second thrustor 5 outside spray Cleaning for High Capacity groove 1, the structure of first thrustor 4 comprises: first cylinder 41, cylinder 41 is provided with head rod 42, head rod 42 is provided with the first top cap 43, hinged first hang plate 44 that is provided with on the first top cap 43, described first hang plate 44 is fixedlyed connected with the end of installing rack 22; The structure of second thrustor 5 comprises: second cylinder 51, second cylinder 51 is provided with second connecting rod 52, second connecting rod 52 is provided with the second top cap 53, hinged second hang plate 54 that is provided with on the second top cap 53, described second hang plate 54 is fixedlyed connected with the end of installing rack 22, during work, make second cylinder 51 in second thrustor 5 that the height of second connecting rod 52 is raise, the side that the second top cap 53 on second connecting rod 52 heads on the installing rack 22 of fixedlying connected with second hang plate 54 raises, the second hang plate inclination certain angle that is provided with on the second top cap 53, whole frock 2 is raised near a side of second thrustor 5 and is whole to first thrustor, 4 lopsidedness, the height of first thrustor 4 remains unchanged, silicon chip of solar cell 6 in the frock support 21 corresponding angle that also tilts, as shown in Figure 2.The band radian water flow jet of shower 3 ejections just can not form meniscate cleaning dead angle in the middle and upper part of silicon chip of solar cell 4 like this on the silicon chip of solar cell 6 that full wafer tilts, full wafer silicon chip of solar cell 4 just can clean up fully.Recited above is the process that frock 2 is tilted with second thrustor 5, and in the practical operation, also available first thrustor 4 is with frock 2 inclined in opposite directions.The quantity of the thrustor of frock 2 both sides can be determined according to the weight of frock 2, generally evenly arranges along frock 2 long side directions to get final product.
Beneficial effect of the present invention: with the frock certain angle that tilts, making current be flushed to the full wafer silicon chip of solar cell so just can be clean with the silicon chip of solar cell once flushing, has saved water greatly.
Claims (1)
1. the precleaning unit of silicon chip of solar cell, comprise the spray Cleaning for High Capacity groove, be provided with frock in the spray Cleaning for High Capacity groove, described frock comprises frock support and installing rack, the frock support is fixed on the installing rack, in the spray Cleaning for High Capacity groove and the both sides that are positioned at the frock support be respectively arranged with shower, it is characterized in that: outside the spray Cleaning for High Capacity groove, the two ends of installing rack are separately installed with thrustor, the structure of described thrustor comprises: cylinder, cylinder is provided with connecting rod, connecting rod is provided with the top cap, is connected with hang plate on the cap of top, and described hang plate is fixedlyed connected with installing rack.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011101927232A CN102294329A (en) | 2011-07-11 | 2011-07-11 | Precleaning device for silicon wafer of solar cell |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011101927232A CN102294329A (en) | 2011-07-11 | 2011-07-11 | Precleaning device for silicon wafer of solar cell |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102294329A true CN102294329A (en) | 2011-12-28 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011101927232A Pending CN102294329A (en) | 2011-07-11 | 2011-07-11 | Precleaning device for silicon wafer of solar cell |
Country Status (1)
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| CN (1) | CN102294329A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104070028A (en) * | 2013-03-27 | 2014-10-01 | 天威新能源控股有限公司 | Pre-cleaning device for top spraying silicon wafers |
| CN104485306A (en) * | 2014-12-26 | 2015-04-01 | 合肥彩虹蓝光科技有限公司 | LED cleaning basket spacer block |
| CN106098593A (en) * | 2016-06-22 | 2016-11-09 | 贵州雅光电子科技股份有限公司 | A kind of automatic cleaning control system of diode and control method |
| CN111463153A (en) * | 2020-04-29 | 2020-07-28 | 西安奕斯伟硅片技术有限公司 | Silicon wafer cleaning device and control method thereof |
| CN112522762A (en) * | 2020-10-26 | 2021-03-19 | 刘艺 | Surface oxidation treatment process for aluminum alloy plate |
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| CN201755565U (en) * | 2010-06-30 | 2011-03-09 | 张家港市超声电气有限公司 | Swinging spray system |
| CN202127034U (en) * | 2011-07-11 | 2012-01-25 | 苏州赤诚洗净科技有限公司 | Pre-cleaning device for silicon chip of solar battery |
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2011
- 2011-07-11 CN CN2011101927232A patent/CN102294329A/en active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6347934A (en) * | 1986-08-18 | 1988-02-29 | Nec Kyushu Ltd | Semiconductor substrate washing apparatus |
| JPH06260467A (en) * | 1993-03-05 | 1994-09-16 | Sony Corp | Wafer cleaning device |
| JPH0740214A (en) * | 1993-07-29 | 1995-02-10 | Shin Etsu Handotai Co Ltd | Polishing device of wafer outer peripheral part |
| JPH1015235A (en) * | 1996-07-09 | 1998-01-20 | Kikuo Baba | Cleaning method for pachinko game machine and cleaner therefor |
| CN101032721A (en) * | 2007-04-06 | 2007-09-12 | 大连理工大学 | Device for cleaning and drying huge bearing through composited swing and spraying |
| CN201023092Y (en) * | 2007-04-17 | 2008-02-20 | 深圳市科达超声自动化设备有限公司 | High pressure cleaning machine |
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| CN201755565U (en) * | 2010-06-30 | 2011-03-09 | 张家港市超声电气有限公司 | Swinging spray system |
| CN202127034U (en) * | 2011-07-11 | 2012-01-25 | 苏州赤诚洗净科技有限公司 | Pre-cleaning device for silicon chip of solar battery |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104070028A (en) * | 2013-03-27 | 2014-10-01 | 天威新能源控股有限公司 | Pre-cleaning device for top spraying silicon wafers |
| CN104070028B (en) * | 2013-03-27 | 2016-03-30 | 天威新能源控股有限公司 | Top spray silicon chip precleaning unit |
| CN104485306A (en) * | 2014-12-26 | 2015-04-01 | 合肥彩虹蓝光科技有限公司 | LED cleaning basket spacer block |
| CN106098593A (en) * | 2016-06-22 | 2016-11-09 | 贵州雅光电子科技股份有限公司 | A kind of automatic cleaning control system of diode and control method |
| CN111463153A (en) * | 2020-04-29 | 2020-07-28 | 西安奕斯伟硅片技术有限公司 | Silicon wafer cleaning device and control method thereof |
| CN111463153B (en) * | 2020-04-29 | 2023-03-14 | 西安奕斯伟材料科技有限公司 | Silicon wafer cleaning device and control method thereof |
| CN112522762A (en) * | 2020-10-26 | 2021-03-19 | 刘艺 | Surface oxidation treatment process for aluminum alloy plate |
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| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20111228 |