CN102230982B - Optical diaphragm structure and soft lithography seal master pattern which is used to manufacture optical diaphragm structure - Google Patents

Optical diaphragm structure and soft lithography seal master pattern which is used to manufacture optical diaphragm structure Download PDF

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Publication number
CN102230982B
CN102230982B CN 201110163930 CN201110163930A CN102230982B CN 102230982 B CN102230982 B CN 102230982B CN 201110163930 CN201110163930 CN 201110163930 CN 201110163930 A CN201110163930 A CN 201110163930A CN 102230982 B CN102230982 B CN 102230982B
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CN
China
Prior art keywords
substrate
optically focused
optical diaphragm
microstructure unit
hexagonal pyramid
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CN 201110163930
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Chinese (zh)
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CN102230982A (en
Inventor
刘立林
王钢
杨建福
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中山大学
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Priority to CN 201110163930 priority Critical patent/CN102230982B/en
Publication of CN102230982A publication Critical patent/CN102230982A/en
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Publication of CN102230982B publication Critical patent/CN102230982B/en

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Abstract

The invention discloses an optical diaphragm structure and a soft lithography seal master pattern which is used to manufacture the optical diaphragm structure. The optical diaphragm structure comprises a substrate and a spotlighting layer. The spotlighting layer is arranged in a surface of the substrate and is formed one body with the substrate or is independently arranged on the substrate surface. The spotlighting layer includes a plurality of spotlighting microstructure units. The spotlighting microstructure units are in hexagonal pyramid shape and randomly arranged on the substrate surface, wherein a hexagonal pyramid bottom is sticked to the substrate surface. The soft lithography seal master pattern, which is prepared by an electroplating technology, comprises pulse-electroplating metal thick films under a high peak current density. The metal thick films possess strong surface outer {111} texture, wherein a texture degree is greater than 85%. The metal thick films comprise twin crystal grains. An included angle between a coherent twin crystal boundary of the twin crystals and the metal thick film surface is 0-45 degree. The metal thick film surfaces are a plurality of the spotlighting microstructure units which are in hexagonal pyramid shapes. In the invention, because the spotlighting microstructure units which are in hexagonal pyramid shapes are randomly arranged, smooth fluctuating structures are formed so as to effectively eliminate a Moire phenomenon.

Description

A kind of optical diaphragm structure and manufacturing soft lithographic seal master mold thereof

Technical field

The present invention relates to blooming piece, relate in particular to a kind of optical diaphragm structure and manufacturing soft lithographic seal master mold thereof.

Background technology

The topmost function of brightness enhancement film is by the uniform light after diffusion barrier, controls the travel angle of light in the mode of reflection and refraction, and light is concentrated in the scope of user perspective.The reason of wanting at the beginning to develop brightness enhancement film is that the light source utilization factor in liquid crystal display is extremely low, because light source, is delivered in user's eye and approximately only is left 5% from backlight module light out through after consuming layer by layer; Worse, 95% light source that is not used has most can be converted to heat energy, causes local temperature rising in display, accelerates the deteriorated of display itself.Therefore, brightness enhancement film is necessary.

At present, the most frequently used brightness enhancement film is take the rhombus lens of 3M company as main, these brightness enhancement film, it is the refraction of using prism inside because of its optically focused principle, in optically focused brightness, peak value can appear in special angle, can occur invalid high angle light leak on optical application and cause the brightness excessive situation that descends during in visual angle change, and when the backlight module practice, need thereon surface and lower surface respectively to place a diffusion sheet and make equalizing light rays.In addition, certain axially therefore all have certain optically focused direction because prismatic lens has, actual product divides horizontal optically focused and vertical angle optically focused, but can't possess simultaneously level and vertical light-focusing function.Therefore, in the use, if the level of requirement and vertical angle simultaneously during optically focused, must use the light-gathering sheet of prism of a horizontal optically focused and a vertical optically focused.Moreover, because the structure of light-gathering sheet of prism has very high systematicness, this is also the general character of regular texture, meeting when collocation is used is because the light of the light of direct refraction and birefringence produces interference and cause so-called " Reflective Moire ", the method for avoiding can add that diffusion sheet is to reduce the generation of Moire.The generation of " Pixel Moire " is because the pixel on prismatic lens and panel is all the arrangement of systematicness, can visually produce so-called moire phenomenon after overlapping, pixel moire can't eliminate completely, normally utilizes upper diffusion sheet to make pixel moire less obvious.

Summary of the invention

Problem for above-mentioned prior art existence, one object of the present invention is, a kind of optical diaphragm structure with optical microstructures unit is provided, the optical microstructures unit has the no regularity on statistical significance, can effectively eliminate the Moire line, and make it have simultaneously the multi-angle light-focusing function, need not two concentration pieces.

To achieve these goals, technical scheme of the present invention is: a kind of optical diaphragm structure, comprise a substrate and a light collecting layer, and it is characterized in that, it is surperficial interior one-body molded with substrate that light collecting layer is located at substrate one, perhaps independently is located on substrate surface; Described light collecting layer includes a plurality of optically focused microstructure units, and described optically focused microstructure unit is that hexagonal pyramid is random to be arranged on substrate surface, and hexagonal pyramid bottom surface and substrate surface are fitted.The Moire phenomenon can be effectively eliminated in the random distribution of optically focused microstructure unit.

As a kind of preferred version, the shape of the optically focused microstructure unit of described a plurality of hexagonal pyramid shapes, orientation difference, the described angle that is oriented to hexagonal pyramid axis and substrate normal; The axis of each optically focused microstructure unit does not overlap and arranges, and described optically focused microstructure unit axis can cross arrangement.

As further a kind of preferred version, the angle of described optically focused microstructure unit axis and substrate normal is the 0-45 degree.

As further a kind of preferred version, arranging of described optically focused microstructure unit has randomness, and the size of optically focused microstructure unit and spacing all have principal maximum distribution probability value and the secondary maximum distribution probability value on statistical significance; The described hexagon that is of a size of optically focused microstructure unit bottom surface is at a distance of the distance between two points farthest, and spacing is the distance between the intersection point that refers to each optically focused microstructure unit axis and substrate surface.

As further a kind of preferred version, the principal maximum distribution probability value of described size and secondary maximum distribution probability value are in 200nm-50 μ m scope.

As further a kind of preferred version, the principal maximum distribution probability value of described spacing and secondary maximum distribution probability value are in 200nm-50 μ m scope.

Another object of the present invention is, a kind of soft lithographic seal master mold of making optical diaphragm structure is provided, by the electroplating technology preparation, is included in the pulse plating metal thick film under high peak current density, described metal thick film have strong face outer 111} texture, the texture degree is greater than 85%; Described metal thick film includes twin crystal grain, and the coherence twin-plane boundary of twin and the angle of metal thick film surface are the 0-45 degree, the optically focused microstructure unit that described metal thick film surface is described a plurality of hexagonal pyramid shapes.

As a kind of preferred version, described high peak current density is at least 100ASD, and the plating pulsewidth is 0.1ms-1ms, and dutycycle is 2:1-1:2.

As further preferred version, the soft lithographic seal adopts the method preparation of hot pressing or cast or electroforming, is minus mould or positive mould.

As further preferred version, described soft lithographic seal is by the amorphous of nickel or nickel alloy or nanocrystallinely consist of; Perhaps, the soft lithographic seal is rigid polymer.

Compared with prior art, the present invention has the following advantages: the present invention forms the level and smooth structure that rises and falls by the random stochastic distribution of optically focused microstructure unit of hexagonal pyramid shape, can effectively eliminate the Moire phenomenon.

Description of drawings

Fig. 1 is optical diaphragm structure schematic diagram of the present invention;

Fig. 2 is the vertical view of the optically focused microstructure unit of optical diaphragm structure of the present invention;

Fig. 3 is the metal thick film x-ray diffraction experiment diffraction spectra of soft lithographic seal master mold of the present invention;

Fig. 4 is the size of optically focused microstructure unit of optical diaphragm structure of the present invention and the distribution probability schematic diagram on the spacing statistical significance.

Embodiment

Below in conjunction with accompanying drawing, the present invention is described in further detail:

As shown in Figure 1, a kind of optical diaphragm structure, comprise a substrate 11 and a light collecting layer 14, light collecting layer 14 is arranged at the upper surface 12a of substrate 11, light collecting layer 14 can also be independent one deck with substrate 11 one, this light collecting layer 14 has a plurality of optically focused microstructure units 15, and each optically focused microstructure unit 15 has the architectural feature of hexagonal pyramid; The lower surface 12b of substrate 11 is provided with antistatic layer 13.

Wherein, size, orientation and the spacing of hexagonal pyramid shape optically focused microstructure unit 15 have randomness, size is optically focused microstructure unit 15 at the hexagon on substrate 11 surfaces at a distance of the distance between two points farthest, orientation is optically focused microstructure unit 15 and the angle of substrate normal, and spacing i.e. distance between the intersection point of two optically focused microstructure unit 15 size axis and substrate surface; Size and spacing all have principal maximum distribution probability value and the secondary maximum distribution probability value on statistical significance, the principal maximum distribution probability value of size and secondary maximum distribution probability value are in 200nm to 50 μ m scope, the principal maximum distribution probability value of spacing and secondary maximum distribution probability value are in 200nm to 50 μ m scope, the angular range 0-45 degree of orientation.

A plurality of hexagonal pyramids, size, orientation can be different, arrange its axis is non-coincidence, and axis can intersect, and these hexagonal pyramids are mutually overlapping, obtain the variant of hexagonal pyramid, are random level and smooth relief fabric between hexagonal pyramid or its variant.

A kind of master mold of making the soft lithographic seal of above-mentioned optical diaphragm structure, by the electroplating technology preparation, manufacture method specifically comprises the following steps:

1, select a horizontal base plate, as silicon chip, glass or cold rolling thick copper coin, if select cold rolling thick copper coin as substrate, after surface clean, oil removing, as electroplating cathode; If select silicon chip or glass as substrate, also need after surface clean, oil removing in its surperficial evaporation Cr/Au Seed Layer with as electroplating cathode;

2, be placed in the electroplate liquid that contains the Ag ion, add the complex solution that contains Se or W element, as electroplating additive, regulate electroplate liquid pH value to 8.0-10.0 with ammoniacal liquor, temperature is controlled at 40-60 degree centigrade, adopts Pt as anode, current density 160-240ASD, pulse duty factor 2:3;

3, electroplate the thick film 100-500 μ m that obtains Ag, outside the strong face of XRD diffraction spectra demonstration of this thick film<111〉texture, the texture degree is greater than 95%, as shown in Figure 3;

4, regulate electroplating technology, can make the hexagonal pyramid size with maximum distribution probable value be in 5-10 μ m, the hexagonal pyramid spacing with maximum distribution probable value is in about 10 μ m;

5, electroplate the hexagonal pyramid microstructure of gained thick film surface, its size and spacing all have the distribution characteristics on statistical significance shown in Figure 4.

As shown in Figure 2, the simple, straight-forward style of writing figure of the scanning electron microscope top view of thick film surface is the hexagonal pyramid microstructure of stochastic distribution.Tem study shows, thick film is comprised of twin crystal grain, and the coherence twin-plane boundary is basically parallel to substrate or thick film surface.Take the microstructure of above-mentioned thick film surface as master mold, effects on surface carries out the demoulding to be processed, and as fluorination treatment, waters the mixed solution of aggressiveness before polymer injection, monomer, hardening agent etc., solidifies, and then the demoulding obtains the soft lithographic seal.Perhaps, be re-used as mould with the polymkeric substance seal of gained, adopt electroforming process, electroplating nano or amorphous Ni alloy thick film are as the soft lithographic seal.

Above embodiment only is used for technical scheme of the present invention is described, is not intended to limit; Although with reference to preferred embodiment, the present invention is had been described in detail; those of ordinary skill in the field are to be understood that; still can modify or the part technical characterictic is equal to replacement the specific embodiment of the present invention; and not breaking away from the spirit of technical solution of the present invention, it all should be encompassed in the middle of the technical scheme scope that the present invention asks for protection.

Claims (7)

1. an optical diaphragm structure, comprise a substrate and a light collecting layer, it is characterized in that, it is surperficial interior one-body molded with substrate that light collecting layer is located at substrate one, perhaps independently is located on substrate surface; Described light collecting layer includes a plurality of optically focused microstructure units, and described optically focused microstructure unit is that hexagonal pyramid is random to be arranged on substrate surface, and hexagonal pyramid bottom surface and substrate surface are fitted;
The shape of the optically focused microstructure unit of described a plurality of hexagonal pyramid shapes, orientation difference, the described angle that is oriented to hexagonal pyramid axis and substrate normal; The axis of each optically focused microstructure unit does not overlap and arranges, described optically focused microstructure unit axis energy cross arrangement;
Arranging of described optically focused microstructure unit has randomness, and the size of optically focused microstructure unit and spacing all have principal maximum distribution probability value and the secondary maximum distribution probability value on statistical significance; The described hexagon that is of a size of optically focused microstructure unit bottom surface is at a distance of the distance between two points farthest, and spacing is the distance between the intersection point that refers to each optically focused microstructure unit axis and substrate surface.
2. optical diaphragm structure according to claim 1, is characterized in that, the angle of described optically focused microstructure unit axis and substrate normal is the 0-45 degree.
3. optical diaphragm structure according to claim 1, is characterized in that, the principal maximum distribution probability value of described size and secondary maximum distribution probability value are in 200nm-50 μ m scope.
4. optical diaphragm structure according to claim 1, is characterized in that, the principal maximum distribution probability value of described spacing and secondary maximum distribution probability value are in 200nm-50 μ m scope.
5. soft lithographic seal master mold of making claim 3 or 4 described optical diaphragm structures, by the electroplating technology preparation, it is characterized in that the pulse plating metal thick film under high peak current density, described metal thick film have strong face outer 111} texture, the texture degree is greater than 85%; Described metal thick film includes twin crystal grain, and the coherence twin-plane boundary of twin and the angle of metal thick film surface are the 0-45 degree, the optically focused microstructure unit that described metal thick film surface is described a plurality of hexagonal pyramid shapes;
Described high peak current density is at least 100ASD, and the plating pulsewidth is 0.1ms-1ms, and dutycycle is 2:1-1:2.
6. soft lithographic seal master mold according to claim 5, is characterized in that, the soft lithographic seal adopts the method preparation of hot pressing or cast or electroforming, is minus mould or positive mould.
7. soft lithographic seal master mold according to claim 6, is characterized in that, described soft lithographic seal is by the amorphous of nickel or nickel alloy or nanocrystallinely consist of;
Perhaps, the soft lithographic seal is rigid polymer.
CN 201110163930 2011-06-17 2011-06-17 Optical diaphragm structure and soft lithography seal master pattern which is used to manufacture optical diaphragm structure CN102230982B (en)

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CN108732863A (en) * 2018-05-24 2018-11-02 南方科技大学 A kind of flexible nano impression block and preparation method thereof

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CN101183190A (en) * 2006-11-13 2008-05-21 嘉威光电股份有限公司 optical film diaphragm of side light type backlight module
CN101620325A (en) * 2008-07-04 2010-01-06 鸿富锦精密工业(深圳)有限公司 Display

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WO2008069162A1 (en) * 2006-12-05 2008-06-12 Semiconductor Energy Laboratory Co., Ltd. Anti-reflection film and display device

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US7068433B2 (en) * 2003-11-17 2006-06-27 Olympus Corporation Focusing screen master and manufacturing method thereof
CN101183190A (en) * 2006-11-13 2008-05-21 嘉威光电股份有限公司 optical film diaphragm of side light type backlight module
CN101620325A (en) * 2008-07-04 2010-01-06 鸿富锦精密工业(深圳)有限公司 Display

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