CN102211096B - Supercritical water jet cleaning equipment - Google Patents
Supercritical water jet cleaning equipment Download PDFInfo
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- CN102211096B CN102211096B CN 201010145225 CN201010145225A CN102211096B CN 102211096 B CN102211096 B CN 102211096B CN 201010145225 CN201010145225 CN 201010145225 CN 201010145225 A CN201010145225 A CN 201010145225A CN 102211096 B CN102211096 B CN 102211096B
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Abstract
The invention discloses supercritical water jet cleaning equipment used for carrying out lossless cleaning on a silicon wafer. The equipment comprises a supercritical water jet generating device, a cleaning chamber and a cleaning product recycling device. In the invention, the supercritical water reaches the silicon wafer in a jet form, a supercritical water constant-temperature constant-pressure micro environment is formed on the surface of the silicon wafer, and the physical and chemical properties of the supercritical water are utilized to carry out lossless cleaning on the surface of the silicon wafer. By utilizing the equipment disclosed by the invention, fine structures on the surface of the silicon surface can be effectively cleaned, and the application of a high-pressure cleaning cavity can be avoided.
Description
Technical field
The present invention relates to the Wafer Cleaning technical field in the semiconductor fabrication, relate in particular to a kind of supercritical water jet cleaning equipment, utilize the physicochemical property realization of supercritical water to effective cleaning of semi-conductor silicon chip.
Background technology
Along with semiconductor technology constantly extends to less technology node, the Wafer Cleaning technology is constantly challenged.In whole manufacture of semiconductor, cleaning has accounted for more than 1/3rd.The conventional clean technology not only consumes pure water and chemical reagent in a large number, and cleaning strength also more and more can't satisfy the requirement of new technology.
Overcritical cleaning take supercritical carbon dioxide, supercritical water as representative, remove photoresist, the aspect such as metal-stripping, particle removal, all demonstrate its application prospect fabulous in semi-conductor industry.But high-tension apparatus is often followed in the application of supercritical fluid technique, and the hidden danger aspect security can not be ignored.
By make local supercritical environment at silicon chip surface, then can be in the physicochemical property of utilizing the supercritical fluid brilliance, the safety problem of avoiding high-tension apparatus to bring.
Summary of the invention
The technical problem that (one) will solve
In view of this, main purpose of the present invention is to provide a kind of supercritical water jet cleaning equipment, overcoming the difficulty of conventional clean, and solves the security hidden trouble that the medium-and-large-sized high-pressure chamber of conventional overcritical cleaning equipment brings.
(2) technical scheme
For achieving the above object, the invention provides a kind of supercritical water jet cleaning equipment, this equipment comprises supercritical water jet generating apparatus 1, purge chamber 2 and wash products recycling and processing device 3, wherein, supercritical water in the supercritical water jet generating apparatus 1 is with the silicon chip in the pattern arrival purge chamber 2, and in silicon chip surface formation supercritical water constant temperature and pressure microenvironment, utilize physics and the chemical property of supercritical water, silicon chip surface is implemented harmless the cleaning, the liquid that discharge the self-cleaning chamber is collected by wash products recycling and processing device 3, and this liquid is carried out removal of impurities and purified treatment.
In the such scheme, described supercritical water jet generating apparatus comprises constant current constant speed pump 101, intensification pipeline 102, heater 103, heating controller 104, temperature sensor probe 105 and nozzle 106, wherein:
Constant current constant speed pump 101 is compressed to deionized water more than the critical pressure, and keeps constant flow rate to inject intensification pipeline 102;
The deionized water of the critical pressure state of 103 pairs of rotating discs of heater in its outside intensification pipeline 102 heats, and its power is regulated by heating controller 104;
In the such scheme, described intensification pipeline 102 and the nozzle 106 inner high temperature resistance to oxidation materials that adopt are made.
In the such scheme, described high temperature resistance to oxidation material is modification resistance to oxidation titanium alloy.
In the such scheme, described purge chamber comprises purge chamber's cage 201, purge chamber's form 202, vacuum cup 203, purge chamber's blast pipe 204, purge chamber's collecting tank 205, purge chamber's discharging tube 206, electric rotating machine 207, bull stick 208 and vavuum pump 209, wherein:
Have form 202 on purge chamber's cage 201, it is live to be convenient to observe cleaning;
Purge chamber's blast pipe 204 is used for discharging the gaseous products that cleaning process produces;
Purge chamber's collecting tank 205 is positioned at the bottom of purge chamber 2, is used for collecting the liquid product that cleaning process produces;
Purge chamber's discharging tube 206 be used for discharging enrichment in purge chamber's collecting tank liquid product.
In the such scheme, described wash products recycling and processing device 3 comprises the cleaning fluid accumulator tank, is used for collecting the liquid that discharge self-cleaning chamber 2, and described liquid liquid is carried out removal of impurities and purified treatment.
(3) beneficial effect
As can be seen from the above technical solutions, the present invention has following beneficial effect
1, supercritical water jet cleaning equipment provided by the invention, employing is implemented to clean to the mode of silicon chip spray supercritical water, utilize the strong oxidizing property of supercritical water and good solvability and mass transfer characteristic, photoresist, metal, the particle of silicon chip surface had good cleaning performance.
2, supercritical water jet cleaning equipment provided by the invention makes High-Pressure Water in the intensification pipeline, instantaneous enter dark above-critical state after, from the nozzle ejection, arrive silicon chip with pattern, form local supercritical environment at silicon chip surface, avoided the use of Large-scale High-Pressure cavity, security performance is higher.
3, supercritical water jet cleaning equipment provided by the invention, silicon chip rotates at vacuum cup, but uniformity in the Effective Raise cleaning sheet.
4, supercritical water jet cleaning equipment provided by the invention by temperature and flow-control, makes the local supercritical environment of silicon chip surface relatively stable, has improved uniformity between cleaning repeatability and sheet.
Description of drawings
Fig. 1 is supercritical water jet cleaning equipment structural representation provided by the invention;
Among the figure, supercritical water jet generating apparatus 1, cleaning chambers 2, wash products recycling and processing device 3, constant current constant speed pump 101, intensification pipeline 102, heater 103, heating controller 104, temperature sensor probe 105, nozzle 106, purge chamber's cage 201, purge chamber's form 202, vacuum cup 203, purge chamber's blast pipe 204, purge chamber's collecting tank 205, purge chamber's discharging tube 206, electric rotating machine 207, bull stick 208, vavuum pump 209, silicon chip 210.
The specific embodiment
For making the purpose, technical solutions and advantages of the present invention clearer, removing below in conjunction with the photoresist of silicon chip surface is instantiation, and with reference to accompanying drawing, the present invention is described in more detail.
As shown in Figure 1, Fig. 1 is supercritical water jet cleaning equipment structural representation provided by the invention, this equipment comprises supercritical water jet generating apparatus 1, purge chamber 2 and wash products recycling and processing device 3, wherein, supercritical water in the supercritical water jet generating apparatus 1 is with the silicon chip in the pattern arrival purge chamber 2, and in silicon chip surface formation supercritical water constant temperature and pressure microenvironment, utilize physics and the chemical property of supercritical water, silicon chip surface is implemented harmless the cleaning, the liquid that discharge the self-cleaning chamber is collected by wash products recycling and processing device 3, and this liquid is carried out removal of impurities and purified treatment.
Overcritical jet generation system 1 comprises constant current constant speed pump 101, intensification pipeline 102, heater 103, heating controller 104, temperature sensor probe 105 and nozzle 106.Wherein: constant current constant speed pump 101 is compressed to deionized water more than the critical pressure, and keeps constant flow rate to inject intensification pipeline 102; Intensification pipeline 102 rotating discs are around high-power heater 103 outsides, and lining embedding heat-conducting insulation material between intensification pipeline and the heater; The deionized water of the critical pressure state of 103 pairs of rotating discs of heater in its outside intensification pipeline 102 heats, and its power is regulated by heating controller 104; Heating controller 104 is regulated the heating power of heater 103 by the feedback signal of sample temperature sensor probe 105; Temperature sensor probe 105 is used for the temperature of the overcritical microenvironment between gaging nozzle 106 and the silicon chip surface, and with signal feedback to heating controller 104.Described intensification pipeline 102 and nozzle 106 be inner to adopt high temperature resistance to oxidation materials (such as modification resistance to oxidation titanium alloy etc.) to be made.
Wash products recycling and processing device 3 comprises the cleaning fluid accumulator tank, is used for collecting the liquid that discharge self-cleaning chamber 2, and described liquid liquid is carried out removal of impurities and purified treatment.
After utilizing constant current constant speed pump 101 with deionized water (DIW) pressurization, pump into intensification pipeline 102, this pipeline rotating disc is around high-power heater 103 outsides.Water under high pressure enters dark critical condition in pipeline 102 interior rapid intensifications, via nozzle 106, arrives band glue silicon chip 210 surfaces with pattern, forms local supercritical environment at silicon chip surface., the jet temperature that heating controller 104 sample temperature sensor probes 105 detect, the heating power of adjusting heater 103, the temperature of overcritical jet is relatively stable.
The photoresist on silicon chip 210 surfaces is under supercritical water environment, and rapidly oxidation generates the simple gaseous compound such as CO2, NO2, H2O.The gaseous products of purge chamber's 2 interior generations is got rid of by purge chamber's blast pipe 204, and liquid product is the collecting tank 205 interior enrichments bottom the purge chamber then, and discharges by discharging tube 206.The liquid product that generates in the purge chamber is after the harmless treatment of recovery and processing system 3, and row is from this equipment.
Supercritical water in this equipment has extremely strong corrosivity to common material, so intensification pipeline 102 and nozzle 106 use modification erosion resistant titanium alloy or corrosion-resistant nickel-base alloy to make, to improve the service life of pipeline and nozzle.
Above-described implementation example has carried out further detailed explanation to purpose of the present invention, technical scheme and beneficial effect.Institute it should be understood that the above only for implementation example of the present invention, is not limited to the present invention.All any modifications of making within the spirit and principles in the present invention, be equal to and replace or improvement etc., all should be included within protection scope of the present invention.
Claims (5)
1. supercritical water jet cleaning equipment, it is characterized in that, this equipment comprises supercritical water jet generating apparatus (1), purge chamber (2) and wash products recycling and processing device (3), wherein, supercritical water in the supercritical water jet generating apparatus (1) arrives silicon chip in the purge chamber (2) with pattern, and in silicon chip surface formation supercritical water constant temperature and pressure microenvironment, utilize physics and the chemical property of supercritical water, silicon chip surface is implemented harmless the cleaning, the liquid that discharge the self-cleaning chamber is collected by wash products recycling and processing device (3), and this liquid is carried out removal of impurities and purified treatment;
Wherein, described supercritical water jet generating apparatus comprises constant current constant speed pump (101), intensification pipeline (102), heater (103), heating controller (104), temperature sensor probe (105) and nozzle (106), wherein:
Constant current constant speed pump (101) is compressed to deionized water more than the critical pressure, and keeps constant flow rate to inject intensification pipeline (102);
Intensification pipeline (102) rotating disc is around high-power heater (103) outside, and lining embedding heat-conducting insulation material between intensification pipeline and the heater;
Heater (103) heats the deionized water of rotating disc around the interior critical pressure state of its outside intensification pipeline (102), and its power is regulated by heating controller (104);
Heating controller (104) is regulated the heating power of heater (103) by the feedback signal of sample temperature sensor probe (105);
Temperature sensor probe (105) is used for the temperature of the overcritical microenvironment between gaging nozzle (106) and the silicon chip surface, and with signal feedback to heating controller (104).
2. supercritical water jet cleaning equipment according to claim 1 is characterized in that, the inner high temperature resistance to oxidation material that adopts of described intensification pipeline (102) and nozzle (106) is made.
3. supercritical water jet cleaning equipment according to claim 2 is characterized in that, described high temperature resistance to oxidation material is modification resistance to oxidation titanium alloy.
4. supercritical water jet cleaning equipment according to claim 1, it is characterized in that, described purge chamber comprises purge chamber's cage (201), purge chamber's form (202), vacuum cup (203), purge chamber's blast pipe (204), purge chamber's collecting tank (205), purge chamber's discharging tube (206), electric rotating machine (207), bull stick (208) and vavuum pump (209), wherein:
Have form (202) on purge chamber's cage (201), it is live to be convenient to observe cleaning;
Vacuum cup (203) can drive lower the rotation at electric rotating machine (207) by bull stick (208) transmission, and the vacuum pipe of vacuum cup (203) and vavuum pump (209) join;
Purge chamber's blast pipe (204) is used for discharging the gaseous products that cleaning process produces;
Purge chamber's collecting tank (205) is positioned at the bottom of purge chamber (2), is used for collecting the liquid product that cleaning process produces;
Purge chamber's discharging tube (206) be used for to discharge enrichment in purge chamber's collecting tank liquid product.
5. supercritical water jet cleaning equipment according to claim 1, it is characterized in that, described wash products recycling and processing device (3) comprises the cleaning fluid accumulator tank, is used for collecting the liquid that discharge self-cleaning chamber (2), and described liquid liquid is carried out removal of impurities and purified treatment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010145225 CN102211096B (en) | 2010-04-09 | 2010-04-09 | Supercritical water jet cleaning equipment |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010145225 CN102211096B (en) | 2010-04-09 | 2010-04-09 | Supercritical water jet cleaning equipment |
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| CN102211096A CN102211096A (en) | 2011-10-12 |
| CN102211096B true CN102211096B (en) | 2013-05-01 |
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Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103894937A (en) * | 2014-03-12 | 2014-07-02 | 哈尔滨工程大学 | Plasma subcritical/supercritical fluid generator and abrasive water jet cutting head comprising generator |
| CN104658947B (en) * | 2014-12-31 | 2018-01-12 | 上海新阳半导体材料股份有限公司 | Wafer cleaning device |
| KR20180006716A (en) * | 2016-07-11 | 2018-01-19 | 세메스 주식회사 | Apparatus and method fdr treating substrates |
| CN107470216A (en) * | 2017-07-31 | 2017-12-15 | 南京工程学院 | A kind of cleaning device and its application method for remanufacturing old parts |
| CN107497787B (en) * | 2017-08-24 | 2020-05-26 | 南京工程学院 | Device and method for cleaning shaft remanufacturing blank |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000334479A (en) * | 1999-06-01 | 2000-12-05 | Akiyoshi Suzuki | Detoxication treating device of waste water in finish washing |
| CN101544419A (en) * | 2008-03-27 | 2009-09-30 | 楼龙春 | Method and device for oxidizing and treating sewage or sludge containing organic substances by supercritical water |
| CN101624247A (en) * | 2009-07-30 | 2010-01-13 | 温州大学 | Technology for supercritical water oxidation processing of leather wastewater |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11347502A (en) * | 1998-06-03 | 1999-12-21 | Plasma System Corp | Substrate cleaning apparatus |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000334479A (en) * | 1999-06-01 | 2000-12-05 | Akiyoshi Suzuki | Detoxication treating device of waste water in finish washing |
| CN101544419A (en) * | 2008-03-27 | 2009-09-30 | 楼龙春 | Method and device for oxidizing and treating sewage or sludge containing organic substances by supercritical water |
| CN101624247A (en) * | 2009-07-30 | 2010-01-13 | 温州大学 | Technology for supercritical water oxidation processing of leather wastewater |
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| CN102211096A (en) | 2011-10-12 |
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