CN1022092C - 水溶性钡盐在水溶性偶氮化合物还原中的应用 - Google Patents

水溶性钡盐在水溶性偶氮化合物还原中的应用 Download PDF

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CN1022092C
CN1022092C CN 88101817 CN88101817A CN1022092C CN 1022092 C CN1022092 C CN 1022092C CN 88101817 CN88101817 CN 88101817 CN 88101817 A CN88101817 A CN 88101817A CN 1022092 C CN1022092 C CN 1022092C
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water soluble
compound
barium salt
azo
application
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CN1036145A (zh
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丁德涛
刘炳文
苏少臣
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No3 Chemical Plant Jilin City
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No3 Chemical Plant Jilin City
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Abstract

水溶性钡盐在水溶性偶氮染料或化合物还原中的应用是水溶性钡盐在水溶性偶氮染料或化合物还原过程中利用生成硫代硫酸钡沉淀的方法,除去硫代酸根,本发明可广泛适用于偶氮染料或化合物的合成过程中,缩短了生产周期,简化了生产装置,消灭了因酸化过程造成的污染及其对设备的腐蚀作用,降低了能源消耗,尤为突出的是可增加产率30%以上。

Description

本发明是一种关于在合成偶氮化合物过程中的水溶性偶氮化合物还原中,水溶性钡盐与硫代硫酸盐生成硫代硫酸钡沉淀后,使不溶于水的硫代硫酸钡与水溶性氨基偶氮化合物分离的发明,属于一种制备多硫化物沉淀后达到和原溶液分离目的的发明。
现有的在生产偶氮化合物中除去有害的硫代硫酸盐的方法都采用酸化法,如在合成直接耐晒黑G中,硫化碱还原后,将生成的硫代硫酸钠利用盐酸将其分解以达到分离的目的,其化学反应式如下:
在此反应中生成的二氧化硫,在酸性介质中于60~70℃下从还原溶液中逸出,生成的单质硫用过滤的方法除掉,该方法在生产中弊端甚多,造成的问题也十分严重,如生成的二氧化硫在60~70℃下,对于偶氮基的还原破坏作用是不可避免的,进而导致染料收率降低,生成的二氧化硫对设备的腐蚀和环境的污染是比较严重的,对于生成的二氧化硫进行回收处理,使生产装置和生产过程更为复杂化。
本发明利用水溶性钡盐在一定的条件下与硫代硫酸盐生成硫代硫酸钡沉淀,从而经过滤,除去有害的硫代硫酸盐,其离子反应式如下
这样既消灭了二氧化硫对产品偶氮基的破坏作用增加了产率,又消除了二氧化硫对设备的腐蚀和环境的污染,从而延长了设备的使用寿命,同时又使生产装置和生产过程简单化。本发明过滤后的硫代硫酸钡可以用酸解的方法重新制备出可重复利用的水溶性钡盐,从而降低了生产成本。使用本发明后以直接耐晒黑G为例经内部试验可使产品产量增加30%以上,具有极好的经济效益。

Claims (2)

1、水溶性钡盐在水溶性偶氮化合物还原中的应用,合成偶氮化合物过程包括重氮化、一次或多次偶合、还原、再重氮化以及再偶合,本发明的特征是在合成偶氮化合物过程中,在水溶性偶氮化合物还原中利用水溶性钡盐与硫代硫酸盐生成硫代硫酸钡沉淀的原理,使硫代硫酸盐与水溶性偶氮化合物分离,其离子反应方程式如下:
2、根据权利要求1所说的水溶性钡盐在水溶性偶氮化合物还原中的应用,其特征在于不溶性钡盐经酸化处理后可重复使用。
CN 88101817 1988-03-29 1988-03-29 水溶性钡盐在水溶性偶氮化合物还原中的应用 Expired - Fee Related CN1022092C (zh)

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CN 88101817 CN1022092C (zh) 1988-03-29 1988-03-29 水溶性钡盐在水溶性偶氮化合物还原中的应用

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CN 88101817 CN1022092C (zh) 1988-03-29 1988-03-29 水溶性钡盐在水溶性偶氮化合物还原中的应用

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CN1036145A CN1036145A (zh) 1989-10-11
CN1022092C true CN1022092C (zh) 1993-09-15

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C15 Extension of patent right duration from 15 to 20 years for appl. with date before 31.12.1992 and still valid on 11.12.2001 (patent law change 1993)
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