CN102177460A - 驱动微反射镜的方法和装置 - Google Patents

驱动微反射镜的方法和装置 Download PDF

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Publication number
CN102177460A
CN102177460A CN2009801398210A CN200980139821A CN102177460A CN 102177460 A CN102177460 A CN 102177460A CN 2009801398210 A CN2009801398210 A CN 2009801398210A CN 200980139821 A CN200980139821 A CN 200980139821A CN 102177460 A CN102177460 A CN 102177460A
Authority
CN
China
Prior art keywords
tilt
control
micromirror
assigned
micromirrors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2009801398210A
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English (en)
Chinese (zh)
Inventor
简.霍恩
克里斯琴.肯普特
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to CN201410453043.5A priority Critical patent/CN104267495B/zh
Publication of CN102177460A publication Critical patent/CN102177460A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Micromachines (AREA)
CN2009801398210A 2008-10-08 2009-10-06 驱动微反射镜的方法和装置 Pending CN102177460A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410453043.5A CN104267495B (zh) 2008-10-08 2009-10-06 驱动微反射镜的方法和装置

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10369108P 2008-10-08 2008-10-08
DE102008050446.7 2008-10-08
US61/103,691 2008-10-08
DE102008050446A DE102008050446B4 (de) 2008-10-08 2008-10-08 Verfahren und Vorrichtungen zur Ansteuerung von Mikrospiegeln
PCT/EP2009/007175 WO2010040506A1 (en) 2008-10-08 2009-10-06 Methods and devices for driving micromirrors

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201410453043.5A Division CN104267495B (zh) 2008-10-08 2009-10-06 驱动微反射镜的方法和装置

Publications (1)

Publication Number Publication Date
CN102177460A true CN102177460A (zh) 2011-09-07

Family

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Family Applications (2)

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CN2009801398210A Pending CN102177460A (zh) 2008-10-08 2009-10-06 驱动微反射镜的方法和装置
CN201410453043.5A Active CN104267495B (zh) 2008-10-08 2009-10-06 驱动微反射镜的方法和装置

Family Applications After (1)

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Country Status (8)

Country Link
US (2) US8345224B2 (https=)
EP (2) EP3193203B1 (https=)
JP (1) JP5325301B2 (https=)
KR (1) KR101233900B1 (https=)
CN (2) CN102177460A (https=)
DE (1) DE102008050446B4 (https=)
TW (1) TWI502282B (https=)
WO (1) WO2010040506A1 (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
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CN104111592A (zh) * 2014-08-06 2014-10-22 中国科学院光电技术研究所 一种基于微反射镜阵列实现可变自由照明光瞳的方法
CN105573061A (zh) * 2014-10-16 2016-05-11 中芯国际集成电路制造(上海)有限公司 Euv光源和曝光装置
CN110954142A (zh) * 2019-12-10 2020-04-03 京东方科技集团股份有限公司 一种光学微电机传感器、基板及电子设备

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DE102008050446B4 (de) 2008-10-08 2011-07-28 Carl Zeiss SMT GmbH, 73447 Verfahren und Vorrichtungen zur Ansteuerung von Mikrospiegeln
JP5587917B2 (ja) 2009-03-13 2014-09-10 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置
DE102010062720B4 (de) 2010-12-09 2012-07-12 Carl Zeiss Smt Gmbh EUV-Lithographiesystem
US9599905B2 (en) 2011-06-07 2017-03-21 Nikon Corporation Illumination optical system, exposure apparatus, device production method, and light polarization unit
TWI557432B (zh) 2011-06-13 2016-11-11 尼康股份有限公司 照明方法、曝光方法、元件製造方法、照明光學系統、以及曝光裝置
CN107390477B (zh) 2011-10-24 2020-02-14 株式会社尼康 照明系统、曝光装置及制造、图像形成、照明与曝光方法
US9732934B2 (en) 2011-10-28 2017-08-15 Nikon Corporation Illumination device for optimizing polarization in an illumination pupil
WO2013071940A1 (en) 2011-11-15 2013-05-23 Carl Zeiss Smt Gmbh Light modulator and illumination system of a microlithographic projection exposure apparatus
DE102013201506A1 (de) 2012-02-17 2013-08-22 Carl Zeiss Smt Gmbh Optisches Bauelement
DE102013201509A1 (de) 2012-02-17 2013-08-22 Carl Zeiss Smt Gmbh Optisches Bauelement
KR102170864B1 (ko) 2012-05-02 2020-10-28 가부시키가이샤 니콘 동공 휘도 분포의 평가 방법 및 개선 방법, 조명 광학계 및 그 조정 방법, 노광 장치, 노광 방법, 및 디바이스 제조 방법
DE102012011202A1 (de) * 2012-06-06 2013-09-12 Carl Zeiss Smt Gmbh Projektor und Verfahren zum Erzeugen eines Bildes
WO2014187599A1 (en) * 2013-05-22 2014-11-27 Carl Zeiss Smt Gmbh Optical component comprising an optical device and means for reducing radiation-induced influences on said optical device
DE102013212613B4 (de) * 2013-06-28 2015-07-23 Carl Zeiss Sms Gmbh Beleuchtungsoptik für ein Metrologiesystem sowie Metrologiesystem mit einer derartigen Beleuchtungsoptik
JP6273109B2 (ja) * 2013-08-28 2018-01-31 株式会社ミツトヨ 光干渉測定装置
DE102014203188A1 (de) 2014-02-21 2015-08-27 Carl Zeiss Smt Gmbh Verfahren zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage
DE102017217164B4 (de) 2017-09-27 2020-10-15 Continental Automotive Gmbh Projektionsvorrichtung zum Erzeugen eines pixelbasierten Beleuchtungsmusters
DE102018202421B3 (de) 2018-02-16 2019-07-11 Carl Zeiss Microscopy Gmbh Vielstrahl-Teilchenstrahlsystem
DE102018216344A1 (de) * 2018-09-25 2020-03-26 Carl Zeiss Smt Gmbh Abstützung eines optischen elements
CN110347082B (zh) * 2019-07-12 2021-07-27 中国科学院上海微系统与信息技术研究所 一种驱动电路、驱动方法及微反射镜阵列
CN114660880A (zh) * 2022-04-11 2022-06-24 长沙沃默科技有限公司 一种反射式投影成像装置及其设计方法
CN116698367A (zh) * 2023-05-23 2023-09-05 上海镭望光学科技有限公司 微反射镜阵列反射光光斑位置标定方法、装置及标定设备
DE102023207368A1 (de) * 2023-08-01 2025-02-06 Carl Zeiss Smt Gmbh Ansteuervorrichtung, optisches system und lithographieanlage

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104111592A (zh) * 2014-08-06 2014-10-22 中国科学院光电技术研究所 一种基于微反射镜阵列实现可变自由照明光瞳的方法
CN104111592B (zh) * 2014-08-06 2016-06-08 中国科学院光电技术研究所 一种基于微反射镜阵列实现可变自由照明光瞳的方法
CN105573061A (zh) * 2014-10-16 2016-05-11 中芯国际集成电路制造(上海)有限公司 Euv光源和曝光装置
CN110954142A (zh) * 2019-12-10 2020-04-03 京东方科技集团股份有限公司 一种光学微电机传感器、基板及电子设备

Also Published As

Publication number Publication date
KR101233900B1 (ko) 2013-02-15
TW201019051A (en) 2010-05-16
CN104267495B (zh) 2016-12-07
EP3193203B1 (en) 2018-08-29
US20130088698A1 (en) 2013-04-11
DE102008050446A1 (de) 2010-04-15
JP2012505533A (ja) 2012-03-01
US10061202B2 (en) 2018-08-28
CN104267495A (zh) 2015-01-07
JP5325301B2 (ja) 2013-10-23
DE102008050446B4 (de) 2011-07-28
US8345224B2 (en) 2013-01-01
US20110188017A1 (en) 2011-08-04
EP2340456B1 (en) 2017-04-05
EP3193203A1 (en) 2017-07-19
WO2010040506A1 (en) 2010-04-15
TWI502282B (zh) 2015-10-01
KR20110067156A (ko) 2011-06-21
EP2340456A1 (en) 2011-07-06

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Application publication date: 20110907