CN102102008A - Water-based glass grinding fluid and using method thereof - Google Patents
Water-based glass grinding fluid and using method thereof Download PDFInfo
- Publication number
- CN102102008A CN102102008A CN2009102013804A CN200910201380A CN102102008A CN 102102008 A CN102102008 A CN 102102008A CN 2009102013804 A CN2009102013804 A CN 2009102013804A CN 200910201380 A CN200910201380 A CN 200910201380A CN 102102008 A CN102102008 A CN 102102008A
- Authority
- CN
- China
- Prior art keywords
- grinding fluid
- grinding
- bromide
- water
- ammonium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
The invention discloses water-based glass grinding fluid, which comprises a quaternary ammonium salt surfactant, organic alcohol, corrosion inhibitor and water and does not contain grinding particles. The water-based glass grinding fluid has high cooling, lubricating, washing and anticorrosion performance, has remarkable chemical resharpening effect on diamond grinders, and can obviously improve grinding precision and the service life of the grinders and effectively prevent the grinder from greasy blockage; and the water-based glass grinding fluid has high glass grinding efficiency and high chemical stability, is safe for health, environmentally-friendly, low in cost, simple and convenient in use and can be widely used for grinding and cleaning process of different kinds of glass.
Description
Technical field
The present invention relates to a kind of grinding fluid in the glass grinding technology, relate to a kind of water base glass grinding liquid and using method thereof particularly.
Background technology
In common glass grinding technology, often adopt diamond super hard abrasive, diamond lap pad or diamond lap dish to carry out quick grinding, precise finiss and the operation such as precise polished of glass.Diamond is the process that diamond abrasive tool cuts at glass surface to the grinding process of glass.Can produce a large amount of glass powders and heat during glass grinding, continue to carry out and guarantee grinding accuracy for what guarantee the glass grinding process, must use suitable grinding fluid to remove the glass powder that produces in the glass grinding process, and the heat that produces in the absorption grinding process, glass and diamond abrasive tool are cooled off.In order to improve the smooth finish of glass surface after the grinding, the frictional force when selected grinding fluid must effectively reduce glass grinding between diamond abrasive tool and glass, thereby require grinding fluid to have certain lubricity.
In glass grinding technology, use by formulated oiliness or emulsifying property grinding fluids such as mineral oil, yellow soda ash, Sodium Nitrites for a long time always.Along with the development of glass grinding technology, the requirement that improves grinding accuracy and grinding tool work-ing life is more and more higher, and oiliness or emulsifying property grinding fluid can not satisfy processing requirement.Secondly, oiliness or emulsifying property grinding fluid rot easily, and corrode equipment for grinding easily; The nitrite that contains is harmful, and easy polluted water; The oleaginousness height is unfavorable for environment protection.The water base glass grinding liquid of some synthetic has appearred in recent years, formulated by multiple water-soluble additive, have stable performance, life cycle length and low cost and other advantages, but the grinding efficiency when most water base glass grinding liquid can not obviously improve glass grinding, perhaps oilness and/or non-corrosibility deficiency.
Water base glass grinding liquid mainly is made up of tensio-active agent, lubricant and water etc., adds additives such as antiseptic-germicide, inhibiter, acid-base modifier and organic solvent sometimes.
Tensio-active agent such as polyoxyethylene glycol, Soxylat A 25-7 and polyacrylate etc., can reduce the surface tension of water base glass grinding liquid, improve the wetting ability of water base glass grinding liquid, help improving the cleansing power of water base glass grinding liquid glass powder to glass surface; Reduction diamond abrasive tool that simultaneously can be to a certain extent and the frictional force between glass.Some special tensio-active agent shows the chemical dressing effect good to the Buddha's warrior attendant stone mill.
The effect of lubricant is on the surface that is adsorbed on diamond abrasive tool and glass, is forming lubricant film between diamond abrasive tool and glass and between diamond abrasive tool and the abrasive dust, reduces these frictional force at the interface, makes glass surface smooth finish improve.Lubricant commonly used generally is the long-chain organic compound that has hydroxyl, carboxyl and amide group, as high fatty alcohol, higher fatty acid, polyacrylamide etc.
The heat and the glass chip that produce in the grinding process are taken away in the effect that water in the water base glass grinding liquid mainly plays cooling and cleans.
Proposed among the JP2001303027 to be used for the abrading glass base material by containing silicon grain, containing the fluorochemicals of hydroxyl and the water base glass grinding liquid that water is formed.Its water base glass grinding liquid contains silicon grain, and chemical stability is relatively poor; And the grinding speed to glass baseplate is lower.
Propose the water base glass grinding liquid formed by abrasive mixt, amino acid, at least a aminated compounds that is selected from trimeric cyanamide, hydrazine or its salt, quadrol and the thanomin of oxidation-containing cerium among JP10183104 and the JP3856513, be used for the abrading glass base material.Its glass grinding speed is very fast, and the smooth finish of glass surface is better after the grinding, but its chemical stability is relatively poor, and insalubrity, is unfavorable for environment protection.
Proposed by colloidal silica among the US2008006057, contained the water base glass grinding liquid that sulfonic group compound, pH regulator agent and water are formed, be used for abrading glass base material and alumina silicate glass etc.Its water base glass grinding liquid contains colloidal silica particle, and chemical stability is relatively poor; And the grinding speed to glass baseplate is lower.
Summary of the invention
The objective of the invention is in order to overcome the grinding efficiency deficiency of existing glass grinding liquid glass, can't improve the work-ing life of grinding accuracy and grinding tool, perhaps can't satisfy the quick grinding and the technological operation requirement such as precise polished of glass simultaneously, provide a kind of and have excellent chemical stability, have good glass grinding efficient, can obviously improve the work-ing life of grinding accuracy and grinding tool and can satisfy the quick grinding, precise finiss of glass simultaneously and the water base glass grinding liquid that technological operation such as precise polished requires.
The invention discloses a kind of water base glass grinding liquid.This water base glass grinding liquid comprises the quaternary surfactant of (a) 0.1～20wt%, (b) organic alcohol of 0.1～30wt%, (c) inhibiter of 0.01～20wt%, (d) water of 30～99.5wt%; Do not comprise abrasive grains.This water base glass grinding liquid can further comprise one or more in polar organic solvent, organic amine, inorganic salt, defoamer and other tensio-active agent.This water base glass grinding liquid has performances such as excellent cooling, lubricated, washing, protection against corrosion, diamond abrasive tool there is good chemical dressing effect, can obviously improve the work-ing life of grinding accuracy and grinding tool, and prevent that effectively grinding tool from " greasy plug " phenomenon taking place; Have good glass grinding efficient, excellent chemical stability is harmless to the health, free from environmental pollution, and cost is low, and is easy to use, can be widely used in the ground finish and the cleaning of various glass.
Among the present invention, described quaternary surfactant has good chemical dressing effect to diamond abrasive tool, can obviously improve the work-ing life of grinding accuracy and grinding tool, prevent that effectively grinding tool from " greasy plug " phenomenon taking place, and the grinding efficiency when obviously improving glass grinding.Described quaternary surfactant has excellent antibacterial ability, can prevent to produce bacterium in the water base glass grinding liquid, improves the storage and the work-ing life of water base glass grinding liquid; Need not to add in addition other antiseptic-germicide.Described quaternary surfactant is preferable is selected from alkyl quaternary ammonium salts, ester based quaternary ammonium salt, the acid amides quaternary ammonium salt, in polyoxyethylene quaternary ammonium salt and the imidazoline quaternary ammonium salt one or more, the better phenyl trimethylammonium bromide that is selected from, benzyltrimethylammonium bromide, Trimethyllaurylammonium bromide, dodecyl trimethyl ammonium acetate, dodecyl trimethylammonium ammonium sulfate, dodecyl trimethylammonium ammonium sulphonate, dodecyl dimethyl benzyl ammonium bromide, dodecyl dimethyl benzyl ammonium acetate, tetradecyl trimethyl ammonium chloride, Tetradecyl Trimethyl Ammonium Bromide, tetradecyl trimethylammonium ammonium sulfate, tetradecyl dimethyl benzyl ammonium, tetradecyl dimethyl benzyl ammonium acetate, palmityl trimethyl ammonium chloride, cetyl trimethylammonium bromide, the cetyl trimethyl ammonium acetate, the octadecyl trimethylammonium bromide, didodecyldimethylammbromide bromide, trioctylphosphine methyl brometo de amonio, the rosinyl Tetradecyl Trimethyl Ammonium Bromide, hexadecyl glucosides Trimethyllaurylammonium bromide, two octyl glucosides two (Trimethyllaurylammonium bromide), two dodecyl glucosides three (cetyl trimethylammonium bromide), 3,3 '-hexanedioyl oxygen base-2,2 '-dihydroxyl-dipropyl-two (dodecyl dimethyl brometo de amonio), myristamide dodecyl dimethyl brometo de amonio, polyoxyethylene dodecyl dimethyl brometo de amonio (number-average molecular weight is 5000), polyoxyethylene hexadecyldimethyl benzyl ammonium ammonium chloride (number-average molecular weight is 20000), polyoxyethylene hexadecyldimethyl benzyl ammonium brometo de amonio (number-average molecular weight is 10000), in two (2-11 (17) alkyl-1-methane amide ethyl imidazol(e) quinoline) hexanediamine trimethylammonium bromide and two (2-undecyl imidazole quinoline) butanediamine trimethylammonium bromide one or more, the best benzyltrimethylammonium bromide that is selected from, Trimethyllaurylammonium bromide, dodecyl dimethyl benzyl ammonium bromide, Tetradecyl Trimethyl Ammonium Bromide, tetradecyl dimethyl benzyl ammonium, cetyl trimethylammonium bromide, didodecyldimethylammbromide bromide, myristamide dodecyl dimethyl brometo de amonio, in polyoxyethylene dodecyl dimethyl brometo de amonio (number-average molecular weight is 5000) and two (2-undecyl imidazole quinoline) butanediamine trimethylammonium bromide one or more.That its content is preferable is 0.1～20wt%, and that better is 0.5～10wt%.
Among the present invention, the frictional force when described organic alcohol can obviously reduce glass grinding between diamond abrasive tool and glass is improved the smooth finish of glass surface after the grinding; Diamond abrasive tool there is good chemical dressing effect, the grinding efficiency when improving glass grinding.Described organic alcohol is preferable is selected from ethylene glycol, Diethylene Glycol, triethylene glycol, glycol ether, three diglycol ethylenes, six diglycol ethylenes, Triethylene glycol, propylene glycol, dipropylene glycol, dipropylene glycol, three contract in dipropylene glycol, the glycerol one or more of dipropylene glycol, six that contract, better three diglycol ethylenes, six diglycol ethylenes, dipropylene glycol, three contract in dipropylene glycol, the glycerol one or more of dipropylene glycol, six that contract that are selected from.That its content is preferable is 0.1～30wt%, and that better is 0.5～20wt%.
Among the present invention, described inhibiter can effectively suppress corrosion or the damage of glass grinding liquid to equipment for grinding.Described inhibiter is preferable is selected from boric acid, borate, boric acid ester, citric acid, Citrate trianion, citrate, azole, in phosphonic acid based and the polyacrylic inhibiter one or more, the better boric acid that is selected from, phenylo boric acid, 2-carboxyl phenylo boric acid, 2-methylol phenylo boric acid, the tetramethyl-ammonium borate, the tetraethyl-ammonium borate, boric acid-ethanolamine salt, triethanolamine borate salt, boric acid glycol ether amine salt, boric acid-thanomin ester, the triethanolamine borate ester, boric acid diglycolamine ester, boric acid Yi Bingchunan ester, boric acid Mono Methyl Ethanol Amine ester, boric acid methyldiethanolamine ester, duplex pyrocatechol boric acid ester, citric acid, the 2-Hydroxycitric acid, citric acid bay alcohol ester, citric acid-thanomin ester, the citric acid triethanolamine ester, citric acid diglycolamine ester, the citric acid tetramethyl-ammonium, the citric acid tetraethyl ammonium, citric acid-ethanolamine salt, the citric acid triethanolamine salt, citric acid glycol ether amine salt, benzotriazole, methyl benzotriazazole, the benzotriazole diethanolamine salt, 2-mercaptobenzimidazole, 2-mercaptobenzothiazole, the 2-mercaptobenzoxazole, 3-amino-1,2, the 4-triazole, 4-amino-1,2, the 4-triazole, 3-amino-5-sulfydryl-1,2, the 4-triazole, 5-amino-tetrazole, 1-hydroxy ethylene-1, the 1-di 2 ethylhexyl phosphonic acid, Amino Trimethylene Phosphonic Acid, 2-phosphonic acids butane-1,2, the 4-tricarboxylic acid, ethylenediamine tetramethylene phosphonic acid, in the polyacrylic acid Monoethanolamine MEA BASF salt (number-average molecular weight is 40000) of polymethyl acrylic acid of polyoxyethylene modification (number-average molecular weight is 10000) and polyoxyethylene modification one or more.That the content of described inhibiter is preferable is 0.01～20wt%, and that better is 0.1～10wt%.
Among the present invention, described water is preferable is selected from tap water, deionized water, distilled water and the ultrapure water one or more.That the content of described water is preferable is 30～99.5wt%, and that better is 50～99wt%.
Water base glass grinding liquid among the present invention does not contain abrasive grains.
Among the present invention, described water base glass grinding liquid can also further comprise one or more in polar organic solvent, organic amine, inorganic salt, defoamer and other tensio-active agent.What the content of described polar organic solvent was preferable is≤10wt%; What the content of described organic amine was preferable is≤10wt%; What the content of described inorganic salt was preferable is≤10wt%; What the content of described defoamer was preferable is≤2wt%; What the content of described other tensio-active agent was preferable is≤10wt%.
Among the present invention, described polar organic solvent can improve the wetting ability of water base glass grinding liquid to glass surface and glass chip, and improves the cleansing power of water base glass grinding liquid to glass chip.Described polar organic solvent is preferable is selected from sulfoxide, sulfone, imidazolidone and the alkylene glycol monoalkyl ether one or more, better dimethyl sulfoxide (DMSO), diethyl sulfoxide, the first and second basic sulfoxides, methyl sulfone, ethyl sulfone, tetramethylene sulfone, the 2-imidazolidone, 1 of being selected from, 3-dimethyl-2-imidazolidone, 1, one or more in 3-diethyl-2-imidazolidone, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monobutyl ether, dipropylene glycol monomethyl ether, dipropylene glycol list ether and the dipropylene glycol monobutyl ether.
Among the present invention, described organic amine can improve the infiltration and the wetting ability of water base glass grinding liquid, thereby improves the cleansing power of water base glass grinding liquid to glass chip; And it has good chemical dressing effect, the grinding efficiency in the time of can improving glass grinding to diamond abrasive tool.Described organic amine is preferable is selected from hydroxyethylethylene diamine, hexanediamine, cyclohexanediamine, Monoethanolamine MEA BASF, trolamine, diglycolamine, Yi Bingchunan, Mono Methyl Ethanol Amine, methyldiethanolamine, dimethylethanolamine, piperazine and N, one or more in the N-diethyl piperazine.
Among the present invention, described inorganic salt have good chemical dressing effect, the grinding efficiency in the time of can improving glass grinding to diamond abrasive tool; Some inorganic salt shows good corrosion-resisting function to equipment for grinding simultaneously.Described inorganic salt are preferable is selected from sodium-chlor, Repone K, SODIUMNITRATE, saltpetre, Sodium Bromide, Potassium Bromide, brometo de amonio, potassium bromate, yellow soda ash, sodium bicarbonate, salt of wormwood, silicate, saleratus, Sodium orthomolybdate, potassium molybdate, sodium wolframate and the potassium wolframate one or more.
Among the present invention, described defoamer is preferable is selected from modification Soxylat A 25-7, modification polyethenoxy ether and the modified polyorganosiloxane one or more, one or more in the better polysiloxane (number-average molecular weight is 8000) that is selected from polyoxyethylene glycerol ether (number-average molecular weight is 10000), polyoxypropylene glycerol ether (number-average molecular weight is 5000), polyoxyethylene polyoxypropylene tetramethylolmethane ether (number-average molecular weight is 20000), polyoxyethylene modification, the dimethione (number-average molecular weight is 10000) of polyoxyethylene modification.
Among the present invention, described other tensio-active agent can improve the infiltration and the wetting ability of water base glass grinding liquid, improves the cleansing power of water base glass grinding liquid to glass chip; Frictional force in the time of can reducing glass grinding between diamond abrasive tool and glass is improved the smooth finish of glass surface after the grinding.Described other tensio-active agent is preferable is selected from polyoxyethylene glycol, polyvinylpyrrolidone and the Soxylat A 25-7 one or more, better polyoxyethylene glycol and/or the Soxylat A 25-7 of being selected from.What the number-average molecular weight of described tensio-active agent was preferable is 500～100000, and better is 1000～50000.
Agents useful for same of the present invention and raw material are all commercially available to be got.
Water base glass grinding liquid of the present invention can be made by the simple mixing of top described component.
The using method of water base glass grinding liquid of the present invention can be with reference to following steps: glass grinding amount size is as required determined water base glass grinding liquid stoste is diluted with water to certain proportion (1%～50%), with the diluent of water base glass grinding liquid with the flow velocity stream of 50～300ml/min on the diamond lap pad or diamond lap dish of rotation, by apply suitable pressure at glass surface glass is carried out grinding.
Positive progressive effect of the present invention is:
1. water base glass grinding liquid of the present invention has performances such as excellent cooling, lubricated, washing, protection against corrosion.
2. the quaternary surfactant that contains in the water base glass grinding liquid of the present invention has good chemical dressing effect to diamond abrasive tool, can obviously improve the work-ing life of grinding accuracy and grinding tool, and prevents that effectively grinding tool from " greasy plug " phenomenon taking place.
3. the grinding efficiency the when quaternary surfactant that contains in the water base glass grinding liquid of the present invention can obviously improve glass grinding.
4. the quaternary surfactant that contains in the water base glass grinding liquid of the present invention has excellent antibacterial ability, can prevent to produce bacterium in the water base glass grinding liquid, improves the storage and the work-ing life of water base glass grinding liquid; Need not to add in addition other antiseptic-germicide.
5. the frictional force when the organic alcohol that contains in the water base glass grinding liquid of the present invention can obviously reduce glass grinding between diamond abrasive tool and glass is improved the smooth finish of glass surface after the grinding; Diamond abrasive tool there is good chemical dressing effect, the grinding efficiency when improving glass grinding.
6. the inhibiter that contains in the water base glass grinding liquid of the present invention can effectively suppress corrosion or the damage of glass grinding liquid to equipment for grinding.
7. do not contain abrasive grains in the water base glass grinding liquid of the present invention, have excellent chemical stability.
8. the organic amine that can contain in the water base glass grinding liquid of the present invention can improve the infiltration and the wetting ability of water base glass grinding liquid, thereby improves the cleansing power of water base glass grinding liquid to glass chip.
9. organic amine that can contain in the water base glass grinding liquid of the present invention and/or inorganic salt have good chemical dressing effect, the grinding efficiency when further improving glass grinding to diamond abrasive tool.
10. water base glass grinding liquid of the present invention is harmless to the health, free from environmental pollution.
11. water base glass grinding liquid cost of the present invention is low and easy to use, can on-the-spot prepare, and also can make earlier and use after concentrated solution is diluted with water to 1%～50% diluent then.
12. water base glass grinding liquid of the present invention has the technological operation window of broad, can use under different grinding pressure, can satisfy quick grinding, precise finiss and the technological operation requirement such as precise polished of glass simultaneously.
Embodiment
Further specify beneficial effect of the present invention below by the preferred effect embodiment of the present invention, but therefore do not limit the present invention among the described scope of embodiments.Among the following embodiment, per-cent is mass percent.
Effect embodiment contrasts water base glass grinding liquid 1 '～3 ' and water base glass grinding liquid 1～10 of the present invention
Table 1 has provided the prescription of water base glass grinding liquid 1 '～3 ' of contrast and cleansing composition 1～10 of the present invention, presses listed component and content thereof in the table 1, simply mixes, and promptly makes each water base glass grinding liquid.
The component and the content of water base glass grinding liquid 1 '～3 ' of table 1 contrast and water base glass grinding liquid 1～23 of the present invention
Among the present invention, utilize the method for water base glass grinding liquid grinding glasswork as follows: the water diluting soln of the water base glass grinding liquid 1 '～3 ' of the contrast in the table 1 and the water diluting soln of water base glass grinding liquid 1～10 of the present invention to be used for the grinding simple glass, to test its grinding speed and grinding rear surface smooth finish situation.
Testing method and condition: at first with 3M
TMTrizact 661XA (the diamond particle diameter is 9 μ m) diamond lap pad (diameter is 180mm) is fixed on the rotatable grinding flat plate, then 4 * 4cm simple glass is fixed on movably on the disk, disk is placed upside down in glass is clipped between disk and the diamond lap pad, the flow velocity of controlling the water diluting soln of water base glass grinding liquid is 200ml/min, adjusting is 1～7psi through the pressure that disk is added in glass surface, and the rotating speed of regulating the diamond lap pad is 30～70rpm, simple glass was ground 1～5 minute, then through the water washing after drying, utilize thickness tester to measure the grinding speed that variation in thickness before and after the simple glass grinding calculates glass, and with the surface smoothness after the microscopic examination glass grinding.The result is as shown in table 2.
The water diluting soln of the water base glass grinding liquid 1 '～3 ' of table 2 contrast and the water diluting soln of water base glass grinding liquid of the present invention are to the grinding speed of glass and the glass surface smooth finish after the grinding
| Embodiment | Dilution ratio (liquid: water, w/w) | Pressure (psi) | Rotating speed (rpm) | The grinding speed of glass (μ m/min) | Glass surface smooth finish |
| 1’ | 1∶4 | 7 | 70 | 33 | × |
| 2’ | 1∶9 | 5 | 50 | 14 | △ |
| 3’ | 1∶19 | 2 | 30 | 5 | ○ |
| 1 | 1∶4 | 7 | 70 | 56 | △ |
| 2 | 1∶9 | 5 | 50 | 34 | ○ |
| 3 | 1∶19 | 2 | 30 | 11 | ◎ |
| 4 | 1∶5 | 6 | 70 | 50 | ○ |
| 5 | 1∶11 | 4 | 60 | 30 | ◎ |
| 6 | 1∶14 | 3 | 70 | 26 | ◎ |
| 7 | 1∶15 | 5 | 45 | 31 | ◎ |
| 8 | 1∶19 | 5 | 70 | 44 | ◎ |
| 9 | 1∶14 | 5 | 70 | 38 | ◎ |
| 10 | 1∶19 | 7 | 60 | 46 | ◎ |
Surface smoothness: ◎ does not have obvious polishing scratch;
Zero polishing scratch slightly;
△ has tangible polishing scratch;
* serious polishing scratch arranged.
As can be seen from Table 2, compare with the water diluting soln of water base glass grinding liquid 1 '～3 ', the water diluting soln of water base glass grinding liquid of the present invention shows higher glass grinding speed and good glass surface smooth finish, the technological operation window of broad, can under different grinding pressure, use, can satisfy quick grinding, precise finiss and the technological operation requirement such as precise polished of glass simultaneously.
Claims (26)
1. water base glass grinding liquid, it comprises: quaternary surfactant, organic alcohol, inhibiter and water.
2. grinding fluid according to claim 1, it is characterized in that, the quality percentage composition of described quaternary surfactant is 0.1～20wt%, the quality percentage composition of described organic alcohol is 0.1～30wt%, the quality percentage composition of described inhibiter is 0.01～20wt%, and the quality percentage composition of described water is 30～99.5wt%.
3. grinding fluid according to claim 1 is characterized in that described quaternary surfactant is selected from one or more in alkyl quaternary ammonium salts, ester based quaternary ammonium salt, acid amides quaternary ammonium salt, polyoxyethylene quaternary ammonium salt and the imidazoline quaternary ammonium salt.
4. as grinding fluid as described in the claim 3, it is characterized in that, described quaternary surfactant is selected from the phenyl trimethylammonium bromide, benzyltrimethylammonium bromide, Trimethyllaurylammonium bromide, dodecyl trimethyl ammonium acetate, dodecyl trimethylammonium ammonium sulfate, dodecyl trimethylammonium ammonium sulphonate, dodecyl dimethyl benzyl ammonium bromide, dodecyl dimethyl benzyl ammonium acetate, tetradecyl trimethyl ammonium chloride, Tetradecyl Trimethyl Ammonium Bromide, tetradecyl trimethylammonium ammonium sulfate, tetradecyl dimethyl benzyl ammonium, tetradecyl dimethyl benzyl ammonium acetate, palmityl trimethyl ammonium chloride, cetyl trimethylammonium bromide, the cetyl trimethyl ammonium acetate, the octadecyl trimethylammonium bromide, didodecyldimethylammbromide bromide, trioctylphosphine methyl brometo de amonio, the rosinyl Tetradecyl Trimethyl Ammonium Bromide, hexadecyl glucosides Trimethyllaurylammonium bromide, two octyl glucosides two (Trimethyllaurylammonium bromide), two dodecyl glucosides three (cetyl trimethylammonium bromide), 3,3 '-hexanedioyl oxygen base-2,2 '-dihydroxyl-dipropyl-two (dodecyl dimethyl brometo de amonios), myristamide dodecyl dimethyl brometo de amonio, polyoxyethylene dodecyl dimethyl brometo de amonio (number-average molecular weight is 5000), polyoxyethylene hexadecyldimethyl benzyl ammonium ammonium chloride (number-average molecular weight is 20000), polyoxyethylene hexadecyldimethyl benzyl ammonium brometo de amonio (number-average molecular weight is 10000), in two (2-11 (17) alkyl-1-methane amide ethyl imidazol(e) quinoline) hexanediamine trimethylammonium bromide and two (2-undecyl imidazole quinoline) butanediamine trimethylammonium bromide one or more.
5. as grinding fluid as described in the claim 4, it is characterized in that described quaternary surfactant is selected from one or more in benzyltrimethylammonium bromide, Trimethyllaurylammonium bromide, dodecyl dimethyl benzyl ammonium bromide, Tetradecyl Trimethyl Ammonium Bromide, tetradecyl dimethyl benzyl ammonium, cetyl trimethylammonium bromide, didodecyldimethylammbromide bromide, myristamide dodecyl dimethyl brometo de amonio, polyoxyethylene dodecyl dimethyl brometo de amonio and two (2-undecyl imidazole quinoline) the butanediamine trimethylammonium bromide.
6. as grinding fluid as described in the claim 2, it is characterized in that the quality percentage composition of described quaternary surfactant is 0.5～10wt%.
7. grinding fluid according to claim 1, it is characterized in that described organic alcohol is selected from ethylene glycol, Diethylene Glycol, triethylene glycol, glycol ether, three diglycol ethylenes, six diglycol ethylenes, Triethylene glycol, propylene glycol, dipropylene glycol, dipropylene glycol, three contract in the dipropylene glycol one or more of dipropylene glycol and six that contract.
8. as grinding fluid as described in the claim 7, it is characterized in that described organic alcohol is selected from three diglycol ethylenes, six diglycol ethylenes, dipropylene glycol, three contract in dipropylene glycol and the glycerol one or more of dipropylene glycol, six that contract.
9. as grinding fluid as described in the claim 2, it is characterized in that the quality percentage composition of described organic alcohol is 0.5～20wt%.
10. grinding fluid according to claim 1 is characterized in that described inhibiter is selected from one or more in boric acid, borate, boric acid ester, citric acid, Citrate trianion, citrate, azole, phosphonic acid based and the polyacrylic inhibiter.
11. as grinding fluid as described in the claim 10, it is characterized in that, described inhibiter is selected from boric acid, phenylo boric acid, 2-carboxyl phenylo boric acid, 2-methylol phenylo boric acid, the tetramethyl-ammonium borate, the tetraethyl-ammonium borate, boric acid-ethanolamine salt, triethanolamine borate salt, boric acid glycol ether amine salt, boric acid-thanomin ester, the triethanolamine borate ester, boric acid diglycolamine ester, boric acid Yi Bingchunan ester, boric acid Mono Methyl Ethanol Amine ester, boric acid methyldiethanolamine ester, duplex pyrocatechol boric acid ester, citric acid, the 2-Hydroxycitric acid, citric acid bay alcohol ester, citric acid-thanomin ester, the citric acid triethanolamine ester, citric acid diglycolamine ester, the citric acid tetramethyl-ammonium, the citric acid tetraethyl ammonium, citric acid-ethanolamine salt, the citric acid triethanolamine salt, citric acid glycol ether amine salt, benzotriazole, methyl benzotriazazole, the benzotriazole diethanolamine salt, 2-mercaptobenzimidazole, 2-mercaptobenzothiazole, the 2-mercaptobenzoxazole, 3-amino-1,2, the 4-triazole, 4-amino-1,2, the 4-triazole, 3-amino-5-sulfydryl-1,2, the 4-triazole, 5-amino-tetrazole, 1-hydroxy ethylene-1, the 1-di 2 ethylhexyl phosphonic acid, Amino Trimethylene Phosphonic Acid, 2-phosphonic acids butane-1,2, the 4-tricarboxylic acid, ethylenediamine tetramethylene phosphonic acid, in the polyacrylic acid Monoethanolamine MEA BASF salt of the polymethyl acrylic acid of polyoxyethylene modification and polyoxyethylene modification one or more.
12., it is characterized in that the quality percentage composition of described inhibiter is 0.1～10wt% as grinding fluid as described in the claim 2.
13. grinding fluid is characterized in that according to claim 1, described wet concentration one or more in tap water, deionized water, distilled water and ultrapure water.
14., it is characterized in that the quality percentage composition of described water is 50～99wt% as grinding fluid as described in the claim 2.
15. grinding fluid is characterized in that according to claim 1, described grinding fluid further comprises one or more in polar organic solvent, organic amine, inorganic salt, defoamer and other tensio-active agent.The content of described polar organic solvent is≤10wt%; The content of described organic amine is≤10wt%; The content of described inorganic salt is≤10wt%; The content of described defoamer is≤2wt%; The content of described other tensio-active agent is≤10wt%.
16., it is characterized in that described polar organic solvent is selected from one or more in sulfoxide, sulfone, imidazolidone and the alkylene glycol monoalkyl ether as grinding fluid as described in the claim 15.
17. as grinding fluid as described in the claim 16, it is characterized in that, described polar organic solvent is selected from dimethyl sulfoxide (DMSO), diethyl sulfoxide, the first and second basic sulfoxides, methyl sulfone, ethyl sulfone, tetramethylene sulfone, 2-imidazolidone, 1,3-dimethyl-2-imidazolidone, 1, one or more in 3-diethyl-2-imidazolidone, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monobutyl ether, dipropylene glycol monomethyl ether, dipropylene glycol list ether and the dipropylene glycol monobutyl ether.
18. as grinding fluid as described in the claim 15, it is characterized in that, described organic amine is selected from hydroxyethylethylene diamine, hexanediamine, cyclohexanediamine, Monoethanolamine MEA BASF, trolamine, diglycolamine, Yi Bingchunan, Mono Methyl Ethanol Amine, methyldiethanolamine, dimethylethanolamine, piperazine and N, one or more in the N-diethyl piperazine.
19. as grinding fluid as described in the claim 15, it is characterized in that described inorganic salt are selected from one or more in sodium-chlor, Repone K, SODIUMNITRATE, saltpetre, Sodium Bromide, Potassium Bromide, brometo de amonio, potassium bromate, yellow soda ash, sodium bicarbonate, salt of wormwood, saleratus, water glass, potassium silicate, Sodium orthomolybdate, potassium molybdate, sodium wolframate and the potassium wolframate.
20., it is characterized in that described defoamer is selected from one or more in modification Soxylat A 25-7, modification polyethenoxy ether and the modified polyorganosiloxane as grinding fluid as described in the claim 15.
21. as grinding fluid as described in the claim 20, it is characterized in that described defoamer is selected from one or more in the dimethione of polysiloxane, polyoxyethylene modification of polyoxyethylene glycerol ether, polyoxypropylene glycerol ether, polyoxyethylene polyoxypropylene tetramethylolmethane ether, polyoxyethylene modification.
22., it is characterized in that described tensio-active agent is selected from one or more in polyoxyethylene glycol, polyvinylpyrrolidone and the Soxylat A 25-7 as grinding fluid as described in the claim 15.
23., it is characterized in that described tensio-active agent is selected from polyoxyethylene glycol and/or Soxylat A 25-7 as grinding fluid as described in the claim 22.
24., it is characterized in that the number-average molecular weight of described tensio-active agent is 500～100000 as grinding fluid as described in the claim 15.
25., it is characterized in that the number-average molecular weight of described tensio-active agent is 1000～50000 as grinding fluid as described in the claim 24.
26. using method: determine water base glass grinding liquid stoste dilute with water according to required glass grinding amount size as claim 1～25 grinding fluid as described in each, with the diluent of water base glass grinding liquid with the flow velocity stream of 50～300ml/min on the diamond lap pad or diamond lap dish of rotation, by apply suitable pressure at glass surface glass is carried out grinding.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200910201380.4A CN102102008B (en) | 2009-12-18 | 2009-12-18 | Water-based glass grinding fluid and using method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200910201380.4A CN102102008B (en) | 2009-12-18 | 2009-12-18 | Water-based glass grinding fluid and using method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102102008A true CN102102008A (en) | 2011-06-22 |
| CN102102008B CN102102008B (en) | 2014-07-23 |
Family
ID=44155081
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200910201380.4A Expired - Fee Related CN102102008B (en) | 2009-12-18 | 2009-12-18 | Water-based glass grinding fluid and using method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102102008B (en) |
Cited By (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102433136A (en) * | 2011-08-10 | 2012-05-02 | 王长龙 | Enhanced environment-friendly type water-quenched coke strength reinforcing agent |
| CN102559354A (en) * | 2010-12-30 | 2012-07-11 | 安集微电子（上海）有限公司 | Water-based glass grinding fluid |
| CN102925274A (en) * | 2012-11-09 | 2013-02-13 | 上海应用技术学院 | Optical glass grinding fluid and preparation method thereof |
| CN103275803A (en) * | 2013-06-09 | 2013-09-04 | 河南师范大学 | Glass grinding fluid and preparation method thereof |
| CN103525528A (en) * | 2013-02-14 | 2014-01-22 | 郑州新安华砂轮有限公司 | Cutting fluid as well as preparation method thereof |
| CN104152107A (en) * | 2013-05-13 | 2014-11-19 | 深圳清华大学研究院 | Ceramic material use abrasive |
| CN104450038A (en) * | 2014-11-05 | 2015-03-25 | 无锡贺邦金属制品有限公司 | Iron processing oil |
| CN104479555A (en) * | 2014-11-12 | 2015-04-01 | 诺轩化学科技（上海）有限公司 | Rare earth polishing liquid and preparation method thereof |
| CN105950269A (en) * | 2016-05-10 | 2016-09-21 | 合肥工业大学 | Grinding fluid for superhard material and preparation method of grinding fluid |
| CN106350166A (en) * | 2016-08-24 | 2017-01-25 | 安徽正田能源科技有限公司 | Preparation method of easily-decomposed cutting fluid for cutting silicon wafer |
| CN106701020A (en) * | 2016-12-30 | 2017-05-24 | 东莞市淦宏信息科技有限公司 | Resin lens grinding fluid |
| CN106833859A (en) * | 2017-02-16 | 2017-06-13 | 衢州福创工业设计有限公司 | A kind of glass grinding fluid and preparation method thereof |
| WO2017127698A1 (en) * | 2016-01-22 | 2017-07-27 | Lindland Larry | High molecular weight polyoxyalkylene glycol coolant for grinding glass |
| CN107523983A (en) * | 2017-08-07 | 2017-12-29 | 合肥市聚丰制丝有限责任公司 | A kind of preparation method of anti bacteria natural silk |
| CN107699139A (en) * | 2017-11-03 | 2018-02-16 | 辽宁宝瑞科技有限公司 | A kind of super lapping liquid composition of water base environment-friendly antirust type and preparation and application |
| CN110499102A (en) * | 2018-05-20 | 2019-11-26 | 深圳市得益达电子科技有限公司 | A kind of cerium oxide liquid suspension polishing liquid for glass polishing |
| CN113227310A (en) * | 2019-02-14 | 2021-08-06 | 霓达杜邦股份有限公司 | Polishing composition |
Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN86102438A (en) * | 1986-04-12 | 1987-12-09 | 北京第一机床厂 | A kind of water-base nondrip cutting liquid |
| JPH11181468A (en) * | 1997-12-18 | 1999-07-06 | Neos Co Ltd | Water soluble processing oil agent |
| CN1362502A (en) * | 2001-01-05 | 2002-08-07 | 中国石油化工股份有限公司 | Two-purpose grinding-antirust oil composition |
| US20020147114A1 (en) * | 1997-12-19 | 2002-10-10 | Dobson Randy Ezell | Acid thickeners and uses thereof |
| CN1548497A (en) * | 2003-05-24 | 2004-11-24 | 启东尤希路化学工业有限公司 | Optical product grinding fluid |
| CN1639847A (en) * | 2002-03-04 | 2005-07-13 | 福吉米株式会社 | Polishing composition and method for forming wiring structure using the same |
| CN1746281A (en) * | 2004-09-06 | 2006-03-15 | 大连广汇化学有限公司 | Environmental-protective water-base synthesized cutting fluid |
| CN1746282A (en) * | 2004-09-06 | 2006-03-15 | 大连广汇化学有限公司 | Environmental-protective grinding fluid |
| JP3856513B2 (en) * | 1996-12-26 | 2006-12-13 | 昭和電工株式会社 | Abrasive composition for glass polishing |
| US20080006057A1 (en) * | 2006-07-05 | 2008-01-10 | Kao Corporation | Polishing composition for glass substrate |
| WO2008046305A1 (en) * | 2006-10-13 | 2008-04-24 | Anji, Microelectronics (Shanghai) Co., Ltd. | A low etched photoresist cleaning agent and cleaning method of using same |
| JP2009087521A (en) * | 2007-09-14 | 2009-04-23 | Kao Corp | Aqueous cleaning agent composition for substrate for perpendicular magnetic recording hard disk |
| CN101519622A (en) * | 2009-03-20 | 2009-09-02 | 天津市澳路浦润滑油有限公司 | Water-based response type multifunctional metal machining liquid and preparation method thereof |
-
2009
- 2009-12-18 CN CN200910201380.4A patent/CN102102008B/en not_active Expired - Fee Related
Patent Citations (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN86102438A (en) * | 1986-04-12 | 1987-12-09 | 北京第一机床厂 | A kind of water-base nondrip cutting liquid |
| JP3856513B2 (en) * | 1996-12-26 | 2006-12-13 | 昭和電工株式会社 | Abrasive composition for glass polishing |
| JPH11181468A (en) * | 1997-12-18 | 1999-07-06 | Neos Co Ltd | Water soluble processing oil agent |
| JP3920976B2 (en) * | 1997-12-18 | 2007-05-30 | 株式会社ネオス | Water-soluble processing oil |
| US20020147114A1 (en) * | 1997-12-19 | 2002-10-10 | Dobson Randy Ezell | Acid thickeners and uses thereof |
| CN1362502A (en) * | 2001-01-05 | 2002-08-07 | 中国石油化工股份有限公司 | Two-purpose grinding-antirust oil composition |
| CN1639847A (en) * | 2002-03-04 | 2005-07-13 | 福吉米株式会社 | Polishing composition and method for forming wiring structure using the same |
| CN1548497A (en) * | 2003-05-24 | 2004-11-24 | 启东尤希路化学工业有限公司 | Optical product grinding fluid |
| CN1746281A (en) * | 2004-09-06 | 2006-03-15 | 大连广汇化学有限公司 | Environmental-protective water-base synthesized cutting fluid |
| CN1746282A (en) * | 2004-09-06 | 2006-03-15 | 大连广汇化学有限公司 | Environmental-protective grinding fluid |
| US20080006057A1 (en) * | 2006-07-05 | 2008-01-10 | Kao Corporation | Polishing composition for glass substrate |
| WO2008046305A1 (en) * | 2006-10-13 | 2008-04-24 | Anji, Microelectronics (Shanghai) Co., Ltd. | A low etched photoresist cleaning agent and cleaning method of using same |
| JP2009087521A (en) * | 2007-09-14 | 2009-04-23 | Kao Corp | Aqueous cleaning agent composition for substrate for perpendicular magnetic recording hard disk |
| CN101519622A (en) * | 2009-03-20 | 2009-09-02 | 天津市澳路浦润滑油有限公司 | Water-based response type multifunctional metal machining liquid and preparation method thereof |
Non-Patent Citations (1)
| Title |
|---|
| 刘喜梅等: "水溶性缓蚀剂对微乳磨削液的影响", 《润滑与密封》 * |
Cited By (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102559354A (en) * | 2010-12-30 | 2012-07-11 | 安集微电子（上海）有限公司 | Water-based glass grinding fluid |
| CN102433136A (en) * | 2011-08-10 | 2012-05-02 | 王长龙 | Enhanced environment-friendly type water-quenched coke strength reinforcing agent |
| CN102925274A (en) * | 2012-11-09 | 2013-02-13 | 上海应用技术学院 | Optical glass grinding fluid and preparation method thereof |
| CN103525528A (en) * | 2013-02-14 | 2014-01-22 | 郑州新安华砂轮有限公司 | Cutting fluid as well as preparation method thereof |
| CN104152107B (en) * | 2013-05-13 | 2016-08-17 | 深圳清华大学研究院 | Ceramic material grinding agent |
| CN104152107A (en) * | 2013-05-13 | 2014-11-19 | 深圳清华大学研究院 | Ceramic material use abrasive |
| CN103275803A (en) * | 2013-06-09 | 2013-09-04 | 河南师范大学 | Glass grinding fluid and preparation method thereof |
| CN104450038A (en) * | 2014-11-05 | 2015-03-25 | 无锡贺邦金属制品有限公司 | Iron processing oil |
| CN104479555A (en) * | 2014-11-12 | 2015-04-01 | 诺轩化学科技（上海）有限公司 | Rare earth polishing liquid and preparation method thereof |
| WO2017127698A1 (en) * | 2016-01-22 | 2017-07-27 | Lindland Larry | High molecular weight polyoxyalkylene glycol coolant for grinding glass |
| US10155893B2 (en) | 2016-01-22 | 2018-12-18 | Larry Lindland | High molecular weight PAG coolant for grinding glass |
| CN105950269A (en) * | 2016-05-10 | 2016-09-21 | 合肥工业大学 | Grinding fluid for superhard material and preparation method of grinding fluid |
| CN105950269B (en) * | 2016-05-10 | 2019-04-05 | 合肥工业大学 | A kind of superhard material grinding fluid and preparation method thereof |
| CN106350166A (en) * | 2016-08-24 | 2017-01-25 | 安徽正田能源科技有限公司 | Preparation method of easily-decomposed cutting fluid for cutting silicon wafer |
| CN106701020A (en) * | 2016-12-30 | 2017-05-24 | 东莞市淦宏信息科技有限公司 | Resin lens grinding fluid |
| CN106833859A (en) * | 2017-02-16 | 2017-06-13 | 衢州福创工业设计有限公司 | A kind of glass grinding fluid and preparation method thereof |
| CN107523983A (en) * | 2017-08-07 | 2017-12-29 | 合肥市聚丰制丝有限责任公司 | A kind of preparation method of anti bacteria natural silk |
| CN107699139A (en) * | 2017-11-03 | 2018-02-16 | 辽宁宝瑞科技有限公司 | A kind of super lapping liquid composition of water base environment-friendly antirust type and preparation and application |
| CN110499102A (en) * | 2018-05-20 | 2019-11-26 | 深圳市得益达电子科技有限公司 | A kind of cerium oxide liquid suspension polishing liquid for glass polishing |
| CN113227310A (en) * | 2019-02-14 | 2021-08-06 | 霓达杜邦股份有限公司 | Polishing composition |
| CN113227310B (en) * | 2019-02-14 | 2022-10-28 | 霓达杜邦股份有限公司 | Polishing composition |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102102008B (en) | 2014-07-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102102008B (en) | Water-based glass grinding fluid and using method thereof | |
| CN102559354A (en) | Water-based glass grinding fluid | |
| CN102311718B (en) | Aqueous grinding fluid applied to super precision grinding of hard and brittle materials and application method thereof | |
| EP2900797B1 (en) | Process of cutting a hard, brittle material | |
| CN103013638B (en) | Water-soluble cooling liquid for fixed abrasive material line cutting, and preparation method thereof | |
| CN107699139B (en) | A kind of super lapping liquid composition of water base environment-friendly antirust type and preparation and application | |
| CN103184010A (en) | Polishing solution for precision polishing of LED sapphire substrate | |
| CN101671528A (en) | Polishing liquid for polishing monocrystalline silicon piece chemical machine | |
| KR101847266B1 (en) | Polishing composition, and polishing method using the same | |
| CN101550319A (en) | Chemical mechanical polishing solution | |
| WO2011024486A1 (en) | Water-soluble cutting fluid for slicing silicon ingots | |
| CN111254003B (en) | Cooling liquid used in cutting process and preparation method and application thereof | |
| CN113462458A (en) | Efficient diamond wire silicon wafer cutting fluid | |
| CN107164764A (en) | A kind of environment protection chemical mechanical polishing method of copper | |
| JP2007300070A (en) | Etchant composition for polishing semiconductor wafer, manufacturing method of polishing composition using same, and polishing method | |
| JP4474495B2 (en) | Water-soluble cutting liquid composition, water-soluble cutting liquid and cutting method using the water-soluble cutting liquid | |
| CN106590907A (en) | Graphene-containing metal cutting fluid and preparation method thereof | |
| JP6025662B2 (en) | Water-soluble grinding oil | |
| CN106398807A (en) | Cutting fluid of diamond wire for cutting silicon wafers | |
| JP2012201741A (en) | Detergent composition for precision component | |
| JP4675049B2 (en) | Lubricating liquid composition for texturing | |
| WO2019167540A1 (en) | Polishing composition, method for producing polishing composition, and polishing method | |
| KR20110104066A (en) | Composition for improving dryness during wire sawing | |
| JP5588786B2 (en) | Silicon wafer processing liquid and silicon wafer processing method | |
| CN104152107B (en) | Ceramic material grinding agent |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140723 Termination date: 20161218 |