CN102082222A - 发光二极管芯片及其制造方法 - Google Patents

发光二极管芯片及其制造方法 Download PDF

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CN102082222A
CN102082222A CN200910310725XA CN200910310725A CN102082222A CN 102082222 A CN102082222 A CN 102082222A CN 200910310725X A CN200910310725X A CN 200910310725XA CN 200910310725 A CN200910310725 A CN 200910310725A CN 102082222 A CN102082222 A CN 102082222A
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substrate
emitting diode
diode chip
light
semiconductor layer
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林大为
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Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
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Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
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Priority to CN200910310725XA priority Critical patent/CN102082222A/zh
Priority to US12/649,549 priority patent/US8076675B2/en
Publication of CN102082222A publication Critical patent/CN102082222A/zh
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/64Heat extraction or cooling elements
    • H01L33/642Heat extraction or cooling elements characterized by the shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0008Processes
    • H01L2933/0033Processes relating to semiconductor body packages
    • H01L2933/0075Processes relating to semiconductor body packages relating to heat extraction or cooling elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/20Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Led Devices (AREA)
  • Led Device Packages (AREA)

Abstract

一种发光二极管芯片,包括基板及具有p-n结的半导体发光结构,基板包括相对设置的第一表面及第二表面,该具有p-n结的半导体发光结构形成于该基板的第一表面上,基板的第二表面形成若干盲孔,每一盲孔内填充导热材料以形成导热柱。与现有技术相比,本发明的基板上形成导热柱,提高基板的热传导系数,增强基板的导热性能。本发明还公开一种发光二极管芯片的制造方法。

Description

发光二极管芯片及其制造方法
技术领域
本发明涉及一种半导体发光元件,尤其涉及一种发光二极管芯片及其制造方法。
背景技术
随着发光二极管器件逐步应用于大功率照明,发光二极管器件产生越来越多的热量,如果不能有效散发发光二极管器件所产生的热量,将降低发光二极管的使用寿命。然,发光二极管的基板通常采用蓝宝石,蓝宝石的热传导系数相对较低,其导热性能并不能完全满足大功率发光二极管器件的散热需要。
发明内容
有鉴于此,有必要提供一种散热性能较佳的发光二极管芯片及其制造方法。
一种发光二极管芯片,包括基板及具有p-n结的半导体发光结构,基板包括相对设置的第一表面及第二表面,该具有p-n结的半导体发光结构形成于该基板的第一表面上,基板的第二表面形成若干盲孔,每一盲孔内填充导热材料以形成导热柱。
一种发光二极管芯片的制造方法,包括:提供一基板,该基板包括相对设置的第一表面及第二表面,该基板的第一表面上形成具有p-n结的半导体发光结构;该基板的第二表面形成若干盲孔;每一盲孔内填充导热材料形成导热柱。
与现有技术相比,本发明的基板上形成导热柱,提高基板的热传导系数,增强基板的导热性能。
附图说明
图1为本发明发光二极管芯片一较佳实施例的剖面示意图。
图2为本发明发光二极管芯片制造方法的流程图。
主要元件符号说明
Figure G200910310725X20091201D000011
具体实施方式
请参阅图1,发光二极管芯片1包括基板10及具有p-n结的半导体发光结构15。基板10为蓝宝石基板,基板10包括相对设置的第一表面103及第二表面104,该具有p-n结的半导体发光结构15形成于该基板10的第一表面103上。
在本实施方式中,该具有p-n结的半导体发光结构15为氮化镓系III-V族化合物半导体,该具有p-n结的半导体发光结构15包括n型半导体层11、活性层12、p型半导体层13、第一电极141及第二电极142,n型半导体层11、活性层12及p型半导体层13依次堆叠于基板10的第一表面103上,第一电极141与n型半导体层11连接,第二电极142与p型半导体层13连接。n型半导体层11形成于基板10的第一表面103之上,活性层12形成于n型半导体层11之上,p型半导体层13形成于活性层12之上,将p型半导体层13、活性层12及n型半导体层11的表面于一侧腐蚀去除一部分,露出部分n型半导体层11的表面,第一电极141形成于露出的n型半导体层110的表面上,第二电极142形成于p型半导体层13之上。基板10的第二表面104形成若干盲孔101,每一盲孔101内填充导热材料以形成导热柱102。导热柱102优选铜作为材料。发光二极管芯片1工作时产生的热量可以通过导热柱102传导至下方,增加蓝宝石基板10的传热效率。
如图2所示,上述发光二极管芯片1的制造方法包括以下步骤:首先,提供一基板10,该基板10包括相对设置的第一表面103及第二表面104,该基板10的第一表面103上形成具有p-n结的半导体发光结构15;其次,在该基板10的第二表面104蚀刻形成若干盲孔101;最后,在每一盲孔101内填充导热材料以形成导热柱102。在本实施方式中,采用在每一盲孔101内电镀铜等高导热金属材料以形成导热柱102。
另,本领域技术人员还可于本发明精神内做其它变化,只要其不偏离本发明的技术效果均可。这些依据本发明精神所做的变化,都应包含在本发明所要求保护的范围之内。

Claims (8)

1.一种发光二极管芯片,包括基板及具有p-n结的半导体发光结构,基板包括相对设置的第一表面及第二表面,该具有p-n结的半导体发光结构形成于该基板的第一表面上,其特征在于:基板的第二表面形成若干盲孔,每一盲孔内填充导热材料以形成导热柱。
2.如权利要求1所述的发光二极管芯片,其特征在于:该导热材料为铜。
3.如权利要求1所述的发光二极管芯片,其特征在于:该基板为蓝宝石基板。
4.如权利要求1所述的发光二极管芯片,其特征在于:该具有p-n结的半导体发光结构包括n型半导体层、p型半导体层、第一电极及第二电极,n型半导体层及p型半导体层堆叠于基板的第一表面上,第一电极与n型半导体层连接,第二电极与p型半导体层连接。
5.如权利要求4所述的发光二极管芯片,其特征在于:该n型半导体层及p型半导体层之间具有活性层。
6.一种发光二极管芯片的制造方法,包括:
提供一基板,该基板包括相对设置的第一表面及第二表面,该基板的第一表面上形成具有p-n结的半导体发光结构;
该基板的第二表面形成若干盲孔;
每一盲孔内填充导热材料形成导热柱。
7.如权利要求6所述的发光二极管芯片的制造方法,其特征在于:采用蚀刻方式在该基板的第二表面形成该若干盲孔。
8.如权利要求6所述的发光二极管芯片的制造方法,其特征在于:该导热柱是在每一盲孔内镀铜形成。
CN200910310725XA 2009-12-01 2009-12-01 发光二极管芯片及其制造方法 Pending CN102082222A (zh)

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US12/649,549 US8076675B2 (en) 2009-12-01 2009-12-30 Light-emitting diode chip and method of manufacturing the same

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109560457A (zh) * 2018-09-30 2019-04-02 厦门市三安集成电路有限公司 一种面射型激光器芯片的散热结构及其制作方法
CN111033748A (zh) * 2019-11-26 2020-04-17 重庆康佳光电技术研究院有限公司 一种发光二极体组件及其制备方法、显示器的制备方法
CN112382665A (zh) * 2020-11-03 2021-02-19 广东省科学院半导体研究所 一种氧化镓基mosfet器件及其制作方法

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US6015979A (en) * 1997-08-29 2000-01-18 Kabushiki Kaisha Toshiba Nitride-based semiconductor element and method for manufacturing the same
JP2000331947A (ja) * 1999-03-17 2000-11-30 Mitsubishi Cable Ind Ltd 半導体基材及びその作製方法
CN1707820A (zh) * 2005-04-29 2005-12-14 清华大学 GaN基发光器件制作方法及其器件结构

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Publication number Priority date Publication date Assignee Title
US20020017653A1 (en) * 1999-08-26 2002-02-14 Feng-Ju Chuang Blue light emitting diode with sapphire substrate and method for making the same
US7029951B2 (en) * 2003-09-12 2006-04-18 International Business Machines Corporation Cooling system for a semiconductor device and method of fabricating same
KR100716790B1 (ko) * 2005-09-26 2007-05-14 삼성전기주식회사 질화갈륨계 반도체 발광소자 및 그 제조방법

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Publication number Priority date Publication date Assignee Title
US6015979A (en) * 1997-08-29 2000-01-18 Kabushiki Kaisha Toshiba Nitride-based semiconductor element and method for manufacturing the same
JP2000331947A (ja) * 1999-03-17 2000-11-30 Mitsubishi Cable Ind Ltd 半導体基材及びその作製方法
CN1707820A (zh) * 2005-04-29 2005-12-14 清华大学 GaN基发光器件制作方法及其器件结构

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109560457A (zh) * 2018-09-30 2019-04-02 厦门市三安集成电路有限公司 一种面射型激光器芯片的散热结构及其制作方法
CN111033748A (zh) * 2019-11-26 2020-04-17 重庆康佳光电技术研究院有限公司 一种发光二极体组件及其制备方法、显示器的制备方法
CN112382665A (zh) * 2020-11-03 2021-02-19 广东省科学院半导体研究所 一种氧化镓基mosfet器件及其制作方法

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Application publication date: 20110601