CN101979959A - Photoelectric type micro-displacement measuring device - Google Patents
Photoelectric type micro-displacement measuring device Download PDFInfo
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- CN101979959A CN101979959A CN 201010528023 CN201010528023A CN101979959A CN 101979959 A CN101979959 A CN 101979959A CN 201010528023 CN201010528023 CN 201010528023 CN 201010528023 A CN201010528023 A CN 201010528023A CN 101979959 A CN101979959 A CN 101979959A
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Abstract
The invention relates to a photoelectric type micro-displacement measuring device, which relates to the technical field of photoelectric measurement, in particular to a micro-displacement measuring device in the photoelectric measurement technology. The invention aims to solve the problems that the conventional micro-displacement measuring device has a large volume, low measurement accuracy and low stability, and is easily interfered by electrical appliance noise, and the like. The device comprises a shell, a main grating fixing frame, a main shaft, a guide shaft, a main grating, a light-emitting assembly, an indication grating, an indication grating fixing frame, a photoelectric receiving assembly, a signal processing element and a contact probe, wherein the main grating fixing frame is fixed on the main shaft; the main grating is fixed on the main grating fixing frame; the indication grating is fixed on the indication grating fixing frame; the indication grating fixing frame is fixed on the shell opposite to the main grating fixing frame; the photoelectric receiving assembly and the signal processing element are fixed on the shell outside the indication grating fixing frame respectively; the light-emitting assembly and the guide shaft are fixed on the shell outside the main grating fixing frame respectively; and the contact probe is arranged at the bottom of the main shaft. The photoelectric type micro-displacement measuring device is suitable for the field of micro-displacement measurement.
Description
Technical field
The present invention relates to the photoelectric measurement technical field, be specifically related to measure in the photoelectric measurement technology device of micrometric displacement.
Background technology
The grating chi is present widely used representative Displacement Measurement sensor, because the influence that is subjected to code-disc portrayal, temperature and debugs factors such as technology, makes measurement mechanism volume and Measurement Resolution and precision become the problem that occurrences in human life in the industry extremely are concerned about.
Device to microdisplacement measurement mainly was by Hall element under circlet border, space in the past, analog devices such as linear potentiometer, and they are subject to electro instrument noise and disturb, and resolution is lower, characteristics such as poor stability.
Summary of the invention
The present invention is big for the volume that solves existing micro-displacement measuring device, and measuring accuracy is low and stable poor, is subject to problems such as electro instrument noise interference, and a kind of photo-electric micro-displacement measuring device is provided.
The photo-electric micro-displacement measuring device comprises housing, key light grid fixed mount, main shaft, the axis of guide, key light grid, luminescence component, indication grating, indication grating fixed mount, photoelectricity receiving unit, Signal Processing Element and contact sonde; Key light grid fixed mount is fixed on the main shaft, and the key light grid are fixed on the key light grid fixed mount, and indication grating is fixed on the indication grating fixed mount, and described indication grating fixed mount is fixed on the housing with key light grid fixed mount relative position; Described photoelectricity receiving unit and Signal Processing Element are separately fixed on the housing in the indication grating fixed mount outside, and the luminescence component and the axis of guide are separately fixed on the housing in the key light grid fixed mount outside; Contact sonde is arranged on the bottom of main shaft.
Principle of work of the present invention: the metering system of photo-electric micro-displacement measuring device of the present invention adopts contact type measurement, send the infrared light supply collimated illumination on the key light grid by luminescence component, when the contact sonde of this device drives key light grid fixed mount and equipment under test generation micro-displacement with main shaft, described key light grid and be fixed on and produce relative motion between the indication grating of indication grating fixed mount and the staggered Moire fringe that changes of light and shade occurs, and the photoelectricity receiving unit that is positioned at the indication grating back is transformed into electric signal with the light signal that receives, thereby form clocklike sinusoidal signal and zero signal, these electric signal have comprised the equipment under test displacement information.The key light grid whenever move a pitch, and sinusoidal period of photosignal conversion by Subdividing Processing in the circuit signal processing module and signal output module, is passed to apparatus control system and data presentation system with high-precision displacement information.
Beneficial effect of the present invention: device volume of the present invention is little; The physical dimension of its device is 30 millimeters * 30 millimeters * 30 millimeters, and device of the present invention can be measured the micrometric displacement variation automatically rapidly and accurately and export with digital form.This device has high reliability, high-frequency response and system's repetition stability simultaneously.This device is easy to use, directly exports the numerical data of distance when the slight distance change in displacement takes place.Host computer is gathered easily, need not conversion Calculation again, has shortened operation time widely, has improved system works efficient.
Description of drawings
Fig. 1 is the contour structures synoptic diagram of photo-electric micro-displacement measuring device of the present invention;
Fig. 2 is the inner connecting structure synoptic diagram of photo-electric micro-displacement measuring device of the present invention;
Fig. 3 is the analog signal processing circuit figure of Signal Processing Element in the photo-electric micro-displacement measuring device of the present invention;
Fig. 4 is the software flow pattern of the CPU processor of Signal Processing Element in the photo-electric micro-displacement measuring device of the present invention.
Among the figure: 1, housing, 2, key light grid fixed mount, 3, main shaft, 4, the axis of guide, 5, the key light grid, 6, luminescence component, 7, indication grating, 8, the indication grating fixed mount, 9, the photoelectricity receiving unit, 10, Signal Processing Element, 11, contact sonde.
Embodiment
Embodiment one, present embodiment is described in conjunction with Fig. 1 to Fig. 4, the photo-electric micro-displacement measuring device comprises housing 1, key light grid fixed mount 2, main shaft 3, the axis of guide 4, key light grid 5, luminescence component 6, indication grating 7, indication grating fixed mount 8, photoelectricity receiving unit 9, Signal Processing Element 10 and contact sonde 11; Key light grid fixed mount 2 is fixed on the main shaft 3, and key light grid 5 are fixed on the key light grid fixed mount 2, and indication grating 7 is fixed on the indication grating fixed mount 8, and described indication grating fixed mount 8 is fixed on the housing 1 with key light grid fixed mount 2 relative positions; Described photoelectricity receiving unit 9 and Signal Processing Element 10 are separately fixed on the housing 1 in indication grating fixed mount 8 outsides, and the luminescence component 6 and the axis of guide 4 are separately fixed on the housing 1 in key light grid fixed mount 2 outsides; Contact sonde 11 is arranged on the bottom of main shaft 3.
The described axis of guide 4 of present embodiment is used for limiting the rotation of main shaft.
The function of the described Signal Processing Element 10 of present embodiment comprises signal amplification and shaping, CPU processor, signal output, power module and computer software programs; The principle of work of Signal Processing Element:
Describe in conjunction with Fig. 3 and Fig. 4, described grating chi is exported the simulating signal of four tunnel phase phasic differences, 90 degree and is amplified and the comparer shaping through resistance, and the square wave that becomes phase phasic difference 90 degree is counted computing by CPU.The simulating signal of four tunnel phase phasic differences, 90 degree is transformed into numerical information by the integrated AD acquisition interface of CPU, zoom into the digital signal that two-way phase phasic difference 90 is spent by the software difference, being subdivided into resolution through software again is 0.015 micron data and the measurement mechanism of exporting with the serial ports form.
The model of the described CPU processor of present embodiment is C8051F020; CPU processor adopting KeiluVision3 programming.
Circuit board in the Signal Processing Element of the present invention is of a size of 27 millimeters * 24 millimeters.Owing to adopt high integrated monolithic machine process chip to reduce volume greatly, become the simulated photoelectric signal transition digital signal to improve the reliability of device, adopt the software segmentation to improve the resolution and the repeatability of device.
Claims (1)
1. the photo-electric micro-displacement measuring device comprises housing (1), key light grid fixed mount (2), main shaft (3), the axis of guide (4), key light grid (5), luminescence component (6), indication grating (7), indication grating fixed mount (8), photoelectricity receiving unit (9), Signal Processing Element (10) and contact sonde (11); It is characterized in that, key light grid fixed mount (2) is fixed on the main shaft (3), key light grid (5) are fixed on the key light grid fixed mount (2), indication grating (7) is fixed on the indication grating fixed mount (8), and described indication grating fixed mount (8) is fixed on the housing (1) with key light grid fixed mount (2) relative position; Described photoelectricity receiving unit (9) and Signal Processing Element (10) are separately fixed on the housing (1) in indication grating fixed mount (8) outside, and the luminescence component (6) and the axis of guide (4) are separately fixed on the housing (1) in key light grid fixed mount (2) outside; Contact sonde (11) is arranged on the bottom of main shaft (3).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010528023 CN101979959A (en) | 2010-11-02 | 2010-11-02 | Photoelectric type micro-displacement measuring device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010528023 CN101979959A (en) | 2010-11-02 | 2010-11-02 | Photoelectric type micro-displacement measuring device |
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| CN101979959A true CN101979959A (en) | 2011-02-23 |
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| CN 201010528023 Pending CN101979959A (en) | 2010-11-02 | 2010-11-02 | Photoelectric type micro-displacement measuring device |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102607419A (en) * | 2012-03-30 | 2012-07-25 | 中国科学院长春光学精密机械与物理研究所 | Positioning and splicing device of indicating grating |
| CN103697924A (en) * | 2013-12-16 | 2014-04-02 | 中国科学院长春光学精密机械与物理研究所 | Positioning device of absolute type grating ruler photoelectric receiving device |
| CN105937880A (en) * | 2016-07-04 | 2016-09-14 | 武汉卓海青晨科技有限公司 | Optical grating infinitesimal displacement detection device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5386291A (en) * | 1992-11-25 | 1995-01-31 | Mitutoyo Corporation | Displacement sensor including a heat insulating member partitioning the moving scale and the semiconductor laser |
| EP1901041A2 (en) * | 2006-09-12 | 2008-03-19 | Dr. Johannes Heidenhain GmbH | Position measuring device |
| CN201138193Y (en) * | 2008-01-07 | 2008-10-22 | 成都远恒精密测控技术有限公司 | Optical grating micro-displacement pickup |
| CN201149482Y (en) * | 2008-01-11 | 2008-11-12 | 陈民生 | Portable grating digital display amesdial |
-
2010
- 2010-11-02 CN CN 201010528023 patent/CN101979959A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5386291A (en) * | 1992-11-25 | 1995-01-31 | Mitutoyo Corporation | Displacement sensor including a heat insulating member partitioning the moving scale and the semiconductor laser |
| EP1901041A2 (en) * | 2006-09-12 | 2008-03-19 | Dr. Johannes Heidenhain GmbH | Position measuring device |
| CN201138193Y (en) * | 2008-01-07 | 2008-10-22 | 成都远恒精密测控技术有限公司 | Optical grating micro-displacement pickup |
| CN201149482Y (en) * | 2008-01-11 | 2008-11-12 | 陈民生 | Portable grating digital display amesdial |
Non-Patent Citations (1)
| Title |
|---|
| 《光学精密工程》 19960430 倪学，韩雪冰 一种新型结构光栅测微传感器 87-89 第4卷, 第2期 2 * |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102607419A (en) * | 2012-03-30 | 2012-07-25 | 中国科学院长春光学精密机械与物理研究所 | Positioning and splicing device of indicating grating |
| CN102607419B (en) * | 2012-03-30 | 2014-03-12 | 中国科学院长春光学精密机械与物理研究所 | Positioning and splicing device of indicating grating |
| CN103697924A (en) * | 2013-12-16 | 2014-04-02 | 中国科学院长春光学精密机械与物理研究所 | Positioning device of absolute type grating ruler photoelectric receiving device |
| CN103697924B (en) * | 2013-12-16 | 2016-01-13 | 中国科学院长春光学精密机械与物理研究所 | A kind of locating device of absolute grating scale photoelectric receiving device |
| CN105937880A (en) * | 2016-07-04 | 2016-09-14 | 武汉卓海青晨科技有限公司 | Optical grating infinitesimal displacement detection device |
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Open date: 20110223 |