CN101853101A - Manufacturing method of touch device - Google Patents
Manufacturing method of touch device Download PDFInfo
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- CN101853101A CN101853101A CN 201010184174 CN201010184174A CN101853101A CN 101853101 A CN101853101 A CN 101853101A CN 201010184174 CN201010184174 CN 201010184174 CN 201010184174 A CN201010184174 A CN 201010184174A CN 101853101 A CN101853101 A CN 101853101A
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Abstract
The invention provides a manufacturing method of a touch device, which can enhance the light transmission and the conductivity of a sensing electrode in the touch device to reduce steps of a manufacturing process. In an embodiment, the method comprises the following steps of: forming a first patterned transparent conductive layer on a substrate; carrying out a first tempering manufacturing process on the first patterned transparent conductive layer; sequentially forming an insulating layer and a patterned half-tone light resistor on the substrate and the first patterned transparent conductive layer; and etching the insulating layer by using the patterned half-toning light resistor as an etching shade, thereby forming a patterned insulating layer.
Description
Technical field
The invention relates to a kind of manufacture method of contactor control device.
Background technology
Along with the fast development of science and technology, the function of information products is more and more diversified, and its application surface has also touched people's daily life every field.Early stage information products are the input media with keyboard, mouse and so on mostly, as the interface of man-machine communication; But for the user is provided more convenient and more humane use experience, many information products gradually adopt contactor control device as main input media.
Present contactor control device normally utilize outer add to or in be built in contact panel in the display panel, to reach the purpose of touch-control input information and/or operation.Contact panel is according to the difference of its touch-control sensing principle, and it is dissimilar to be divided into condenser type, resistance-type, optical profile type and acoustic wave etc. at least.
Fig. 1 has illustrated a kind of vertical view of a part of known contact panel.As shown in Figure 1, known contact panel 160 comprise substrate 100, a plurality of first conduction region, 105 insulation courses 130 and with a plurality of second conduction regions 115.Above-mentioned first conduction region 105 and second conduction region 115 all are disposed on the substrate 100, and wherein these a plurality of first conduction regions 105 see through first lead 110 each other and electrically connect; These a plurality of second conduction regions 115 then are to electrically connect through second lead 120 each other.Insulation course 130 is arranged between first lead 110 and second lead 120.
According to known techniques, there is good electrical conductivity in order to make between first conduction region 105, first lead 110 adopts metal material made.Yet because the screening optical activity of metal material is stronger, the user tends to perceive the existence of these plain conductors, and has influenced comfort level and satisfaction that the user watches screen widely when review screen.
Therefore, how to reduce the observability of plain conductor in the contactor control device, to promote the display quality of contactor control device, real problem for demanding urgently overcoming on the current contactor control device production technology.
Summary of the invention
Summary of the invention aims to provide the simplification summary of this disclosure, so that the reader possesses basic understanding to this disclosure.This summary of the invention is not the complete overview of this disclosure, and its purpose is not at the key/critical element of pointing out the embodiment of the invention or defines scope of the present invention.
An aspect of the present invention relates to a kind of manufacture method of contactor control device, and this method can effectively reduce the observability of plain conductor in the contactor control device, so that better display quality to be provided.
According to one embodiment of the invention, above-mentioned manufacture method comprises following steps.Form first patterned transparent conductive layer on substrate; Above-mentioned first patterned transparent conductive layer can be in order to form first lead and liner, and wherein first patterned transparent conductive layer comprises armorphous transparent conductive material.Above-mentioned first patterned transparent conductive layer is carried out first tempering manufacturing process, should armorphous transparent conductive material upgrading being the multi-crystal transparent conductive material.Form insulation course and patterning half mode (halftone) photoresistance in regular turn on this substrate and this first patterned transparent conductive layer, wherein this patterning half mode photoresistance is positioned at this first lead top.Come etching isolation layer with above-mentioned patterning half mode photoresistance as an etching shade, to form patterned insulation layer.Carry out electricity slurry ashing processing procedure, remove this patterning half mode photoresistance and expose the part of this patterned insulation layer with part.Form transparency conducting layer on this first patterned transparent conductive layer, this patterning half mode photoresistance and this patterned insulation layer.Remove this patterning half mode photoresistance with and on transparency conducting layer, so that this transparency conducting layer forms second patterned transparent conductive layer, this second patterned transparent conductive layer is in order to form a plurality of first conduction regions, a plurality of second conduction region and one second lead, and wherein these a plurality of first conduction regions electrically connect with this second lead each other with this first lead electric connection and these a plurality of second conduction regions each other.
According to the optional embodiment of the present invention one, said method also comprise form the patterning protective seam on this substrate to expose this liner.
According to the another optional embodiment of the present invention, said method also comprises this second patterned transparent conductive layer is carried out second tempering manufacturing process.
According to the embodiment of the invention, first patterned transparent conductive layer that is adopted in the said method or second patterned transparent conductive layer comprise an armorphous transparent conductive material respectively, and this transparent conductive material can be indium tin oxide, indium-zinc oxide, indium tin zinc oxide, hafnia, aluminium tin-oxide, aluminium zinc oxide, cadmium tin-oxide or cadmium zinc oxide.
According to the embodiment of the invention, in the said method in order to remove patterning half mode photoresistance with and on the step of transparency conducting layer be to utilize to peel off (lift-off) processing procedure or grind processing procedure.
Another aspect of the present invention relates to a kind of manufacture method of contactor control device, and this method can effectively reduce the observability of plain conductor in the contactor control device, so that better display quality to be provided.
According to one embodiment of the invention, above-mentioned manufacture method comprises following steps.Form first patterned transparent conductive layer on substrate; Above-mentioned first patterned transparent conductive layer is in order to form one first lead and a liner, and wherein first patterned transparent conductive layer comprises an armorphous transparent conductive material.This first patterned transparent conductive layer is carried out first tempering manufacturing process, should armorphous transparent conductive material upgrading being the multi-crystal transparent conductive material.Form insulation course and patterning photoresistance in regular turn on this substrate and this first patterning electrically conducting transparent, wherein this patterning photoresistance is positioned at this first lead top.Come this insulation course of etching with this patterning photoresistance as the etching shade, to form patterned insulation layer.Remove this patterning photoresistance to expose this patterned insulation layer.Form second patterned transparent conductive layer on this first patterned transparent conductive layer of part and this patterned insulation layer of part, this second patterned transparent conductive layer is in order to form a plurality of first conduction regions, a plurality of second conduction region and one second lead, and wherein these a plurality of first conduction regions electrically connect with this second lead each other with this first lead electric connection and these a plurality of second conduction regions each other.
According to the optional embodiment of the present invention one, said method also comprise form the patterning protective seam on this substrate to expose this liner.
According to the another optional embodiment of the present invention, said method also comprises this second patterned transparent conductive layer is carried out second tempering manufacturing process.
According to the embodiment of the invention, first patterned transparent conductive layer that is adopted in the said method or second patterned transparent conductive layer comprise an armorphous transparent conductive material respectively, and this transparent conductive material can be indium tin oxide, indium-zinc oxide, indium tin zinc oxide, hafnia, aluminium tin-oxide, aluminium zinc oxide, cadmium tin-oxide or cadmium zinc oxide.
Hence one can see that, utilizes technical scheme proposed by the invention to make contactor control device, has following beneficial effect at least.
At first, the technical scheme of Ti Chuing utilizes transparent conductive material to form first lead herein, thereby can avoid prior art to adopt plain conductor and perceive the disappearance that plain conductor exists when causing the user to watch.
In addition, above technical scheme is the multi-crystal transparent conductive material with armorphous transparent conductive material upgrading originally, with the electric conductivity and the light transmission of further lifting first lead at having carried out tempering manufacturing process in order to the transparent conductive material that forms first lead.In sum, the technical scheme of Ti Chuing is being improved outside the display quality herein, has more taken into account the touch-control sensitivity of touch control component.
In addition, when using patterning half mode photoresistance in the processing procedure, it can be used as the deposition shade of second transparency conducting layer, and this technical scheme has more been saved light shield one compared to known techniques, not only reduce the complicacy of processing procedure, more can reduce the manufacturing cost of contactor control device.
After consulting hereinafter embodiment, the ordinary technical staff in the technical field of the invention be when can understanding essence spirit of the present invention and other goal of the invention easily, and the technology used in the present invention means with implement aspect.
Description of drawings
For above-mentioned and other purpose of the present invention, feature, advantage and embodiment can be become apparent, appended the description of the drawings is as follows:
Fig. 1 is a kind of vertical view of a part of known contact panel;
Fig. 2 has illustrated the vertical view of the prepared contactor control device of method that one aspect proposes according to the present invention;
Fig. 3 A to 3I is the processing procedure synoptic diagram, and the structure shown in it is along A-A profile line gained shown in Figure 2;
Fig. 3 J illustrates along the structure of B-B profile line gained shown in Figure 2;
Fig. 4 has illustrated the vertical view of the prepared contactor control device of method that another aspect proposes according to the present invention;
Fig. 5 A to 5H is the processing procedure synoptic diagram, and the structure shown in it is along A-A profile line gained shown in Figure 4; And
Fig. 5 I illustrates along the structure of B-B profile line gained shown in Figure 4.
Embodiment
For the narration that makes this disclosure more detailed and complete, hereinafter at enforcement aspect of the present invention and specific embodiment illustrative description has been proposed; But this is not unique form of implementing or using the specific embodiment of the invention.Contained in the embodiment a plurality of specific embodiments feature and in order to the method step of construction and these specific embodiments of operation with its in proper order.Yet, also can utilize other specific embodiment to reach identical or impartial function and sequence of steps.
Fig. 2 illustrates the vertical view of the prepared contactor control device 260 of method that one aspect proposes according to the present invention.As shown in Figure 2, contactor control device 260 comprises substrate 200 at least, is arranged at a plurality of first conduction regions 244 and a plurality of second conduction regions 246 on the substrate 200, and insulation course 220 '.These a plurality of first conduction regions 244 see through first lead (first lead 202 ' shown in Fig. 3 B) to each other and electrically connect, and these a plurality of second conduction regions 246 see through 242 electric connections of second lead to each other.Insulation course 220 ' is located on the substrate 200 and between first lead and second lead 242.
It should be noted that,, the invention is not restricted to this though among Fig. 2 first conduction region 244 and second conduction region 246 all are depicted as rhombus.The ordinary technical staff in the technical field of the invention works as visual situation above-mentioned conduction region 244 and 246 is designed to other shape, as circle, triangle, quadrilateral, polygonal or any other shape.In addition, the number of first conduction region 244 and second conduction region 246 and Rankine-Hugoniot relations also are not limited only to number shown in Fig. 2 and mode.
Then, please refer to the processing procedure synoptic diagram of Fig. 3 A to 3I, this series of figures has been illustrated according to one embodiment of the invention in order to make the method for contactor control device shown in Figure 2 260, and wherein Fig. 3 A to 3I is the sectional view along the A-A line segment gained of Fig. 2.
In Fig. 3 A, form first patterned transparent conductive layer 210 in substrate 200, above-mentioned first patterned transparent conductive layer 210 has comprised first wire pattern 202 and pattern of pads 204.More specifically, can on a surface of substrate 200, form transparency conducting layer, then again by suitable method (as, lithography (photolithography-etching) processing procedure) with this transparency conducting layer patterning.
In general, the substrate 200 of contactor control device 260 is transparency carriers, the embodiment of this kind transparency carrier includes but not limited to: glass substrate, quartz base plate, polycarbonate (polycarbonate, PC) substrate, polyethylene terephthalate (polyethylene terephthalate, PET) substrate, polymethylmethacrylate (polymethyl methacrylate, PMMA) substrate and cellulosic triacetate (cellulosetriacetate, TCA) substrate.
According to principle of the present invention and spirit, can utilize armorphous transparent conductive material (amorphoustransparent conductive material) to form above-mentioned first patterned transparent conductive layer 210.Transparent conductive material is one of research and development emphasis of present association area, the very various and continuous increase of its kind, the embodiment of existing transparent conductive material includes but not limited to: indium tin oxide (indium tin oxide, ITO), indium-zinc oxide (indium zinc oxide, IZO), indium tin zinc oxide (indium-tin-zinc oxide, ITZO), hafnia (hafnium oxide, HfO), aluminium tin-oxide (aluminum-doped tin oxide, ATO), aluminium zinc oxide (aluminum-doped zinc oxide, AZO), cadmium tin-oxide (cadmiumtin oxide, and also can comprise the combination of above-mentioned material CTO) and cadmium zinc oxide (cadmium zinc oxide).
Afterwards, first patterned transparent conductive layer 210 is carried out first tempering manufacturing process, can obtain first patterned transparent conductive layer 210 ', shown in Fig. 3 B through upgrading.Thus, can make first wire pattern 202 shown in Fig. 3 A and pattern of pads 204 form first lead 202 ' and liner 204 ' of contactor control device (contactor control device 260 as shown in Figure 2) respectively.
More specifically, first tempering manufacturing process can be multi-crystal transparent conductive material (poly transparent conductive material with the armorphous transparent conductive material upgrading in first patterned transparent conductive layer 210; Poly-ITO).The actual parameter of first tempering manufacturing process (as heat treatment temperature, processing time and other treatment conditions) can be along with used armorphous transparent conductive material and formed thickness and different.
As illustration and unrestricted, in an embodiment of the present invention, used armorphous indium tin oxide (Amorphous indium tin oxide; A-ITO) be example, transparent conductive material forms first patterned transparent conductive layer 210, then can adopt and under about 150-300 ℃, to carry out about 30 to 180 minutes temper, can obtain polycrystalline indium tin oxide (poly-ITO), form first patterned transparent conductive layer 210 ' through upgrading.The present invention is not exceeded with above-mentioned material, and other armorphous transparent conductive material also can be via above-mentioned first tempering manufacturing process to form the multi-crystal transparent conductive material.
Afterwards, shown in Fig. 3 C and Fig. 3 D, form insulation course 220 and patterning half mode photoresistance 230 in regular turn in substrate 200 and on first patterned transparent conductive layer 210 ' of upgrading.In more detail, insulation course 220 is covered in substrate 200 with on first patterned transparent conductive layer 210 ' (comprising first lead 202 ' and liner 204 ') of upgrading (shown in Fig. 3 C); And patterning half mode photoresistance 230 is positioned on the insulation course 220, and is positioned at first lead, 202 ' top.
Can utilize any suitable material to form insulation course 220; And unrestricted, the material of insulation course 220 can be the combination of monox, silicon nitride, silicon oxynitride, silit or above-mentioned material as illustration.
Can utilize special light shield design to form patterning half mode photoresistance 230.In more detail, can then utilize light shield with this photoresist layer patterning and half exposure (half-exposure) prior to forming a photoresist layer (not shown) on the insulation course 220.In half exposure process, can carry out half exposure at the photoresist layer (half exposure area 230a shown in Fig. 3 D) of part, and part removes the photoresist in this zone.Thus, the thickness of half exposure area 230a can obtain half mode photoresistance 230 of patterning less than the thickness of unexposed area 230b.In real the work, can utilize any suitable resin material to form patterning half mode photoresistance 230.
In Fig. 3 E, utilize patterning half mode photoresistance 230 to come etching isolation layer 220, to form patterned insulation layer 220 ' as an etching shade.
One optional embodiment according to the present invention, in this etching step, further the side that patterned insulation layer 220 ' exposes is carved in lateral erosion, so that the outline of patterned insulation layer 220 ' caves inward slightly.
Then, carry out electricity slurry ashing processing procedure, remove this patterning half mode photoresistance 230 and expose the part of this patterned insulation layer 220 ' with part, shown in Fig. 3 F.
Please be simultaneously with reference to Fig. 3 D and 3F, specifically, after through this electricity slurry ashing processing procedure, half exposure area 230a shown in Fig. 3 D is removed in fact, and the patterned insulation layer (being the 220a ' shown in Fig. 3 F) that is positioned at half exposure area 230a below is originally then exposed.In addition, the unexposed area 230b shown in Fig. 3 D then can partly be removed and be formed the remaining patterning half mode photoresistance 230 ' shown in Fig. 3 F.
According to the embodiment of the invention, visual practical situation is selected suitable electricity slurry ashing processing procedure and parameter for use.For instance, (atmospheric pressure plasma, APP) equipment carries out electricity slurry ashing processing procedure described herein can to utilize vacuum electricity slurry equipment or atmospheric pressure plasma.
According to an optional embodiment, can after above-mentioned electricity slurry ashing processing procedure, carry out a wet etching processing procedure, carve the side that patterned insulation layer 220 ' exposes with further lateral erosion, so that the outline of patterned insulation layer 220 ' caves inward slightly.In real the work, wet etching processing procedure described herein with carve step above with reference to the described lateral erosion of Fig. 3 E and can select one and carry out.
As Fig. 3 G shown in, form transparency conducting layer 240 in first patterned transparent conductive layer 210 ', remaining patterning half mode photoresistance 230 ' and patterned insulation layer 220 ' on thereafter.
Embodiment in order to the material that forms first patterned transparent conductive layer 210 mentioned above also can be in order to forming transparency conducting layer 240, and both used transparent conductive materials can be identical or different.
Then, remove remaining patterning half mode photoresistance 230 ' with and on transparency conducting layer, to form second patterned transparent conductive layer 240 '.Shown in Fig. 3 H, second patterned transparent conductive layer 240 ' can be in order to form a plurality of first conduction regions 244, a plurality of second conduction region (shown in Fig. 2 or Fig. 3 J 246) and one second lead 242, wherein these a plurality of first conduction regions 244 electrically connect with first lead 202 ' each other, and these a plurality of second conduction regions (as, 246) electrically connect with second lead 242 each other.
Should be specifically noted that known techniques normally utilizes micro image etching procedure to form second patterned transparent conductive layer 240 ', therefore must expend one light shield.In comparison, present embodiment utilizes remaining patterning half mode photoresistance 230 ' as the deposition shade, therefore can obtain second patterned transparent conductive layer 240 ' under the situation that does not need extra light shield and etching step.Thus, not only saved one light shield, reduced the processing procedure number, also can reduce production costs; This also is the method for this aspect another advantage compared to known techniques.
According to the embodiment that the present invention chooses wantonly, can utilize peel off processing procedure or grind processing procedure remove remaining patterning half mode photoresistance 230 ' with and on transparency conducting layer.
In brief, when desiring to peel off processing procedure, substrate 200 can be impregnated in the appropriate solvent together with formed structure on it, because the material of patterning half mode photoresistance 230 ' dissolves in this solvent, therefore can divest remaining patterning half mode photoresistance 230 ' easily, and remove position transparency conducting layer thereon on the way.
Grinding processing procedure is the surface treatment process of a kind of mechanical type (physics formula), for instance, can remove by the mode of grinding remaining patterning half mode photoresistance 230 ' with and on transparency conducting layer.
The embodiment that chooses wantonly according to the present invention can carry out second tempering manufacturing process to it having formed second patterned transparent conductive layer 240 ' afterwards, with the electrical conductivity of further lifting first conduction region 244, second conduction region 246 and second lead 242.Similarly, the visual practical situation of the ordinary technical staff in the technical field of the invention determines the suitable parameter of second tempering manufacturing process.
In addition; the embodiment that chooses wantonly according to the present invention; after having formed the structure shown in Fig. 3 H; can form protective seam on substrate 200 and coverage diagram 3H shown in each structure; then can its patterning be obtained the patterning protective seam 250 shown in Fig. 3 I, to expose the some of liner 204 ' by a light shield.
Can utilize suitable inorganic material or organic material to form above-mentioned protective seam.The embodiment of inorganic material includes but not limited to: monox, silicon nitride, silicon oxynitride, silit, hafnia and aluminium oxide; The embodiment of organic material includes but not limited to: resene (as: acryl resin) compound, polyimide compounds, contain benzocyclobutene (benzocyclobutene, BCB) polymkeric substance or tetrem oxosilane (tetraethoxysilane, polymkeric substance TEOS) etc.
In summary, one optional embodiment of this aspect according to the present invention in the fabrication steps shown in Fig. 3 A to 3I, has used three road light shields to form first patterned transparent conductive layer 210 ', patterning half mode photoresistance 230 and patterning protective seam 250 respectively altogether.
The sectional view of Fig. 3 J then presents the structure of Fig. 3 I from another angle (along B-B line segment shown in Figure 2).Shown in Fig. 3 J, a plurality of second conduction regions 246 can see through second lead 242 each other and electrically connect.
Fig. 4 illustrates the vertical view of the prepared contactor control device 360 of method that another aspect proposes according to the present invention.As shown in Figure 4, contactor control device 360 comprises substrate 300 at least, is arranged at a plurality of first conduction regions 344 and a plurality of second conduction regions 346 on the substrate 300, and insulation course 320 '.These a plurality of first conduction regions 344 see through first lead 302 ' to each other and electrically connect, and these a plurality of second conduction regions 346 see through 342 electric connections of second lead to each other.Insulation course 320 ' is located on the substrate 300 and between first lead 302 ' and second lead 342.
It should be noted that,, the invention is not restricted to this though among Fig. 4 first conduction region 344 and second conduction region 346 all are depicted as rhombus.The ordinary technical staff in the technical field of the invention works as visual situation above-mentioned conduction region 344 and 346 is designed to other shape, as circle, triangle, quadrilateral, polygonal or any other shape.In addition, the number of first conduction region 344 and second conduction region 346 and Rankine-Hugoniot relations also are not limited only to number shown in Fig. 4 and mode.
Then, please refer to the processing procedure synoptic diagram of Fig. 5 A to 5H, this series of figures has been illustrated according to one embodiment of the invention in order to make the method for contactor control device shown in Figure 4 360, and wherein Fig. 5 A to 5H is the sectional view along the A-A line segment gained of Fig. 4.
Fabrication steps shown in Fig. 5 A to 5C is with identical haply above with reference to the fabrication steps shown in Fig. 3 A to 3C, thereby is applicable to the manufacture method that this aspect proposes similarly above with reference to explanation and the illustration that Fig. 5 A to 5C is proposed; Hereinafter for the sake of clarity, will repeat no more.
In Fig. 5 A, on substrate 300, form first patterned transparent conductive layer 310, above-mentioned first patterned transparent conductive layer 310 has comprised first wire pattern 302 and pattern of pads 304.
Afterwards, first patterned transparent conductive layer 310 is carried out first tempering manufacturing process, can obtain first patterned transparent conductive layer 310 ', shown in Fig. 5 B through upgrading.Thus, can make first wire pattern 302 shown in Fig. 5 A and pattern of pads 304 form first lead 302 ' and liner 304 ' of contactor control device (contactor control device 360 as shown in Figure 4) respectively.
Afterwards, shown in Fig. 5 C, form insulation course 320 in substrate 300 and on first patterned transparent conductive layer 310 ' of upgrading.
Then, in Fig. 5 D, on insulation course 320 and in first lead, 302 ' top, form patterning photoresistance 330.In more detail, can then utilize light shield with this photoresist layer patterning prior to forming a photoresist layer (not shown) on the insulation course 320.In real the work, can utilize any suitable resin material to form patterning photoresistance 330.
In Fig. 5 E, utilize patterning photoresistance 330 to come etching isolation layer 320, to form patterned insulation layer 320 ' as an etching shade.
As Fig. 5 F shown in, remove patterning photoresistance 330 to expose this patterned insulation layer 320 ' thereafter.Can utilize any suitable method to remove patterning photoresistance 330; For instance, can utilize (stripping) method that divests.
The known method that divests includes but not limited to: the electricity slurry divests (plasma stripping), ozone divests (ozonestripping) and chemical stripping (chemical stripping).
In Fig. 5 G, forming second patterned transparent conductive layer 340 ' should be on first patterned transparent conductive layer 310 ' and this patterned insulation layer 320 ' of part of upgrading in part.More specifically, can on a surface of substrate 300, form transparency conducting layer, then by suitable method (as, micro image etching procedure) this transparency conducting layer patterning be obtained second patterned transparent conductive layer 340 ' again.
Second patterned transparent conductive layer 340 ' can be in order to form a plurality of first conduction regions 344, a plurality of second conduction region (shown in Fig. 4 or Fig. 5 I 346) and second lead 342, wherein these a plurality of first conduction regions 344 electrically connect with first lead 302 ' each other, and these a plurality of second conduction regions (as, 346) electrically connect with second lead 342 each other.
A plurality of first conduction regions, a plurality of second conduction region and one second lead, wherein these a plurality of first conduction regions electrically connect with this second lead each other with this first lead electric connection and these a plurality of second conduction regions each other.
Embodiment in order to the material that forms first patterned transparent conductive layer 210,310 mentioned above also can be in order to form second patterned transparent conductive layer 340 '.In addition, the material of first patterned transparent conductive layer 310 ' and second patterned transparent conductive layer 340 ' can be identical or different.
The embodiment that chooses wantonly according to the present invention can carry out second tempering manufacturing process to it having formed second patterned transparent conductive layer 340 ' afterwards, with the electrical conductivity of further lifting first conduction region 344, second conduction region 346 and second lead 342.Similarly, the visual practical situation of the ordinary technical staff in the technical field of the invention determines the suitable parameter of second tempering manufacturing process.
In addition; the embodiment that chooses wantonly according to the present invention; after having formed the structure shown in Fig. 5 G; can form protective seam on substrate 300 and coverage diagram 5G shown in each structure; then can its patterning be obtained the patterning protective seam 350 shown in Fig. 5 H, to expose the some of liner 304 ' by a light shield.Fabrication steps shown in Fig. 5 H is similar to Fig. 3 I, and therefore protective layer material mentioned above also is equally applicable to herein.
In summary; one optional embodiment of this aspect according to the present invention; in the fabrication steps shown in Fig. 5 A to 5H, used four road light shields to form first patterned transparent conductive layer 310 ', patterning photoresistance 330, second patterned transparent conductive layer 340 ' and patterning protective seam 350 respectively altogether.
The sectional view of Fig. 5 I then presents the structure of Fig. 5 H from another angle (along B-B line segment shown in Figure 4).Shown in Fig. 5 I, a plurality of second conduction regions 346 can see through second lead 342 each other and electrically connect.
In practical application, the touch-control that herein proposes decorate 260 or 360 can with common display device (as: LCD, electroluminescent display or cold cathode ray tube) combination, to allow the user can directly in display frame, carry out touch control operation.
For instance, the display device that comprises above-mentioned contactor control device can electrically connect with an electronic component, and is combined into an electrooptical device.Electronic component described herein can be control element, executive component, treatment element, input element, memory element, driving element, light-emitting component, protecting component, sensing element, detecing element or other function element; Certainly also comprise the combination of said elements.
In addition, electrooptical device described herein can comprise any consumption electronic products (as: mobile phone, video camera, camera, desktop PC, flat computer, mobile computer, game machine, audio-visual broadcast or projection equipment, individual digital action assistant, map navigator etc.) and display device (as: panel in screen, TV, outdoor/indoor billboard, the projector etc.).
In sum, the present invention has following advantage and effect at least.
At first, utilize transparent conductive material to form first lead, thereby can avoid prior art to adopt plain conductor and perceive the disappearance that plain conductor exists when causing the user to watch.
Moreover, at having carried out tempering manufacturing process, be the multi-crystal transparent conductive material with armorphous transparent conductive material upgrading originally in order to the transparent conductive material that forms first lead, can further promote the electric conductivity of first lead.Therefore, the technical scheme that the present invention proposes is being improved outside the display quality, has more taken into account the touch-control sensitivity of touch control component.
In addition, adopted patterning half mode photoresistance in the present invention's one aspect and related embodiment, this technical scheme has more been saved light shield one compared to known techniques, has not only reduced the complicacy of processing procedure, more can reduce the manufacturing cost of contactor control device.
Though above disclosed specific embodiments of the invention in the embodiment; right its is not in order to limit the present invention; the ordinary technical staff in the technical field of the invention; under situation not departing from principle of the present invention and spirit; when can carrying out various changes and modification to it, so protection scope of the present invention is as the criterion when the scope that is defined with subsidiary claims.
Claims (9)
1. the manufacture method of a contactor control device is characterized in that, comprises following steps at least:
Form one first patterned transparent conductive layer on a substrate, this first patterned transparent conductive layer is in order to form one first lead and a liner, and wherein this first patterned transparent conductive layer comprises an armorphous transparent conductive material;
This first patterned transparent conductive layer is carried out one first tempering manufacturing process, should armorphous transparent conductive material upgrading being a multi-crystal transparent conductive material;
Form an insulation course and a patterning half mode photoresistance in regular turn on this substrate and this first patterned transparent conductive layer, wherein this patterning half mode photoresistance is positioned at this first lead top;
Come this insulation course of etching with this patterning half mode photoresistance as an etching shade, to form a patterned insulation layer;
Carry out an electricity slurry ashing processing procedure, remove this patterning half mode photoresistance and expose the part of this patterned insulation layer with part;
Form a transparency conducting layer on this first patterned transparent conductive layer, this patterning half mode photoresistance and this patterned insulation layer; And
Remove this patterning half mode photoresistance with and on transparency conducting layer, so that this transparency conducting layer forms one second patterned transparent conductive layer, this second patterned transparent conductive layer is in order to form a plurality of first conduction regions, a plurality of second conduction region and one second lead, and wherein these a plurality of first conduction regions electrically connect with this second lead each other with this first lead electric connection and these a plurality of second conduction regions each other.
2. the manufacture method of contactor control device according to claim 1 is characterized in that, also comprise form a patterning protective seam on this substrate to expose this liner.
3. the manufacture method of contactor control device according to claim 1 is characterized in that, also comprises this second patterned transparent conductive layer is carried out one second tempering manufacturing process.
4. the manufacture method of contactor control device according to claim 1, it is characterized in that this first patterned transparent conductive layer or this second patterned transparent conductive layer comprise a material respectively and be selected from a group that is made up of armorphous indium tin oxide, indium-zinc oxide, indium tin zinc oxide, hafnia, aluminium tin-oxide, aluminium zinc oxide, cadmium tin-oxide and cadmium zinc oxide.
5. the manufacture method of contactor control device according to claim 1 is characterized in that, remove this patterning half mode photoresistance with and on this step of transparency conducting layer be to utilize one to peel off processing procedure or grind processing procedure.
6. the manufacture method of a contactor control device is characterized in that, comprises following steps at least:
Form one first patterned transparent conductive layer on a substrate, this first patterned transparent conductive layer is in order to form one first lead and a liner, and wherein this first patterned transparent conductive layer comprises an armorphous transparent conductive material;
This first patterned transparent conductive layer is carried out one first tempering manufacturing process, should armorphous transparent conductive material upgrading being a multi-crystal transparent conductive material;
Form an insulation course and a patterning photoresistance in regular turn on this substrate and this first patterned transparent conductive layer, wherein this patterning photoresistance is positioned at this first lead top;
Come this insulation course of etching with this patterning photoresistance as an etching shade, to form a patterned insulation layer;
Remove this patterning photoresistance to expose this patterned insulation layer; And
Form one second patterned transparent conductive layer on this first patterned transparent conductive layer of part and this patterned insulation layer of part, this second patterned transparent conductive layer is in order to form a plurality of first conduction regions, a plurality of second conduction region and one second lead, and wherein these a plurality of first conduction regions electrically connect with this second lead each other with this first lead electric connection and these a plurality of second conduction regions each other.
7. the manufacture method of contactor control device according to claim 6 is characterized in that, also comprise form a patterning protective seam on this substrate to expose this liner.
8. the manufacture method of contactor control device according to claim 6 is characterized in that, also comprises this second patterned transparent conductive layer is carried out one second tempering manufacturing process.
9. the manufacture method of contactor control device according to claim 6, it is characterized in that this first patterned transparent conductive layer or this second patterned transparent conductive layer comprise a material respectively and be selected from a group that is made up of armorphous indium tin oxide, indium-zinc oxide, indium tin zinc oxide, hafnia, aluminium tin-oxide, aluminium zinc oxide, cadmium tin-oxide and cadmium zinc oxide.
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|---|---|---|---|
| CN201010184174XA CN101853101B (en) | 2010-05-20 | 2010-05-20 | Manufacturing method of touch device |
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| WO2015117468A1 (en) * | 2014-09-16 | 2015-08-13 | 京东方科技集团股份有限公司 | Touch screen, manufacturing method therefor, and touch display device |
| CN109933239A (en) * | 2019-03-12 | 2019-06-25 | 合肥鑫晟光电科技有限公司 | Transparent conducting structures and preparation method thereof, display base plate, touch base plate |
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| CN101266970A (en) * | 2008-05-05 | 2008-09-17 | 友达光电股份有限公司 | Display device and its making method |
| CN101576793A (en) * | 2009-01-12 | 2009-11-11 | 深圳市中显微电子有限公司 | Capacitance touch screen and preparation method thereof |
| CN101598990A (en) * | 2009-06-11 | 2009-12-09 | 友达光电股份有限公司 | Contact panel and forming method thereof |
| CN101692193A (en) * | 2009-09-07 | 2010-04-07 | 苏州超联光电有限公司 | Capacitive touch screen and manufacturing method thereof |
| US20100120473A1 (en) * | 2008-11-12 | 2010-05-13 | Lg Electronics Inc. | Touch module, fabrication method thereof, and mobile terminal having the same |
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| CN101266970A (en) * | 2008-05-05 | 2008-09-17 | 友达光电股份有限公司 | Display device and its making method |
| US20100120473A1 (en) * | 2008-11-12 | 2010-05-13 | Lg Electronics Inc. | Touch module, fabrication method thereof, and mobile terminal having the same |
| CN101576793A (en) * | 2009-01-12 | 2009-11-11 | 深圳市中显微电子有限公司 | Capacitance touch screen and preparation method thereof |
| CN101598990A (en) * | 2009-06-11 | 2009-12-09 | 友达光电股份有限公司 | Contact panel and forming method thereof |
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| WO2015117468A1 (en) * | 2014-09-16 | 2015-08-13 | 京东方科技集团股份有限公司 | Touch screen, manufacturing method therefor, and touch display device |
| US9886148B2 (en) | 2014-09-16 | 2018-02-06 | Boe Technology Group Co., Ltd. | Touch screen, method for producing touch screen, touch display device |
| CN109933239A (en) * | 2019-03-12 | 2019-06-25 | 合肥鑫晟光电科技有限公司 | Transparent conducting structures and preparation method thereof, display base plate, touch base plate |
| US11347337B2 (en) | 2019-03-12 | 2022-05-31 | Hefei Xinsheng Optoelectronics Technology Co., Ltd. | Transparent conductive structure and preparation method thereof, display substrate and touch substrate |
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| CN101853101B (en) | 2012-05-23 |
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