CN101675348A - 用于补偿mosfet集成电路中工艺诱生性能变化的方法 - Google Patents
用于补偿mosfet集成电路中工艺诱生性能变化的方法 Download PDFInfo
- Publication number
- CN101675348A CN101675348A CN200880014239A CN200880014239A CN101675348A CN 101675348 A CN101675348 A CN 101675348A CN 200880014239 A CN200880014239 A CN 200880014239A CN 200880014239 A CN200880014239 A CN 200880014239A CN 101675348 A CN101675348 A CN 101675348A
- Authority
- CN
- China
- Prior art keywords
- transistors
- array
- variations
- threshold voltage
- drive current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
- G06F30/30—Circuit design
- G06F30/39—Circuit design at the physical level
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
- G06F30/30—Circuit design
- G06F30/36—Circuit design at the analogue level
- G06F30/367—Design verification, e.g. using simulation, simulation program with integrated circuit emphasis [SPICE], direct methods or relaxation methods
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/36—Unipolar devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P10/00—Bonding of wafers, substrates or parts of devices
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Evolutionary Computation (AREA)
- Geometry (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/757,338 US7949985B2 (en) | 2007-06-01 | 2007-06-01 | Method for compensation of process-induced performance variation in a MOSFET integrated circuit |
| US11/757,338 | 2007-06-01 | ||
| PCT/US2008/051355 WO2008150555A1 (en) | 2007-06-01 | 2008-01-17 | Method for compensation of process-induced performance variation in a mosfet integrated circuit |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101675348A true CN101675348A (zh) | 2010-03-17 |
Family
ID=40087455
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200880014239A Pending CN101675348A (zh) | 2007-06-01 | 2008-01-17 | 用于补偿mosfet集成电路中工艺诱生性能变化的方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US7949985B2 (https=) |
| EP (1) | EP2153239A4 (https=) |
| JP (1) | JP5261479B2 (https=) |
| KR (1) | KR101159305B1 (https=) |
| CN (1) | CN101675348A (https=) |
| TW (1) | TWI392028B (https=) |
| WO (1) | WO2008150555A1 (https=) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104750904A (zh) * | 2013-12-31 | 2015-07-01 | 德州仪器公司 | 用以改进晶体管匹配的方法 |
| CN105740572A (zh) * | 2016-02-26 | 2016-07-06 | 联想(北京)有限公司 | 一种电子设备 |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7949985B2 (en) * | 2007-06-01 | 2011-05-24 | Synopsys, Inc. | Method for compensation of process-induced performance variation in a MOSFET integrated circuit |
| US8176444B2 (en) * | 2009-04-20 | 2012-05-08 | International Business Machines Corporation | Analyzing multiple induced systematic and statistical layout dependent effects on circuit performance |
| US20120042292A1 (en) * | 2010-08-10 | 2012-02-16 | Stmicroelectronics S.A. | Method of synthesis of an electronic circuit |
| US8776005B1 (en) | 2013-01-18 | 2014-07-08 | Synopsys, Inc. | Modeling mechanical behavior with layout-dependent material properties |
| US8832619B2 (en) * | 2013-01-28 | 2014-09-09 | Taiwan Semiconductor Manufacturing Co., Ltd. | Analytical model for predicting current mismatch in metal oxide semiconductor arrays |
| EP3760196B1 (en) * | 2018-02-28 | 2024-12-18 | Petroeuroasia Co., Ltd. | Reduced coenzyme q10-containing composition and method for producing same |
| CN119997585B (zh) * | 2025-04-14 | 2025-07-22 | 合肥晶合集成电路股份有限公司 | 一种半导体器件的制作方法 |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3882391A (en) * | 1973-06-25 | 1975-05-06 | Ibm | Testing the stability of MOSFET devices |
| US4138666A (en) * | 1977-11-17 | 1979-02-06 | General Electric Company | Charge transfer circuit with threshold voltage compensating means |
| US5412263A (en) * | 1992-09-30 | 1995-05-02 | At&T Corp. | Multiple control voltage generation for MOSFET resistors |
| KR970001564U (ko) * | 1995-06-21 | 1997-01-21 | 자동차용 후부차체의 보강구조 | |
| US5748534A (en) * | 1996-03-26 | 1998-05-05 | Invox Technology | Feedback loop for reading threshold voltage |
| JPH1074843A (ja) * | 1996-06-28 | 1998-03-17 | Toshiba Corp | 多電源集積回路および多電源集積回路システム |
| EP0919121A4 (en) * | 1996-07-08 | 2000-11-22 | Dnavec Research Inc | IN VIVO ELECTROPORATION METHOD FOR ANIMAL EARLY EMBRYONS |
| US6287926B1 (en) * | 1999-02-19 | 2001-09-11 | Taiwan Semiconductor Manufacturing Company | Self aligned channel implant, elevated S/D process by gate electrode damascene |
| JP3324588B2 (ja) * | 1999-12-22 | 2002-09-17 | 日本電気株式会社 | 半導体装置及びその製造方法 |
| US6598214B2 (en) * | 2000-12-21 | 2003-07-22 | Texas Instruments Incorporated | Design method and system for providing transistors with varying active region lengths |
| US20040038489A1 (en) | 2002-08-21 | 2004-02-26 | Clevenger Lawrence A. | Method to improve performance of microelectronic circuits |
| JP4408613B2 (ja) * | 2002-09-25 | 2010-02-03 | Necエレクトロニクス株式会社 | トランジスタの拡散層長依存性を組み込んだ回路シミュレーション装置およびトランジスタモデル作成方法 |
| US6928635B2 (en) * | 2002-09-25 | 2005-08-09 | Numerical Technologies, Inc. | Selectively applying resolution enhancement techniques to improve performance and manufacturing cost of integrated circuits |
| JP4202120B2 (ja) * | 2002-12-27 | 2008-12-24 | セイコーインスツル株式会社 | 集積回路の最適化設計装置 |
| US7487474B2 (en) * | 2003-01-02 | 2009-02-03 | Pdf Solutions, Inc. | Designing an integrated circuit to improve yield using a variant design element |
| JP2004241529A (ja) * | 2003-02-05 | 2004-08-26 | Matsushita Electric Ind Co Ltd | 半導体回路装置及びその回路シミュレーション方法 |
| US7263477B2 (en) * | 2003-06-09 | 2007-08-28 | Cadence Design Systems, Inc. | Method and apparatus for modeling devices having different geometries |
| JP2005166741A (ja) * | 2003-11-28 | 2005-06-23 | Sharp Corp | 半導体記憶素子の特性評価方法及びモデルパラメータ抽出方法 |
| US20050144576A1 (en) * | 2003-12-25 | 2005-06-30 | Nec Electronics Corporation | Design method for semiconductor circuit device, design method for semiconductor circuit, and semiconductor circuit device |
| US7174532B2 (en) * | 2004-11-18 | 2007-02-06 | Agere Systems, Inc. | Method of making a semiconductor device by balancing shallow trench isolation stress and optical proximity effects |
| JP4833544B2 (ja) * | 2004-12-17 | 2011-12-07 | パナソニック株式会社 | 半導体装置 |
| JP2006178907A (ja) * | 2004-12-24 | 2006-07-06 | Matsushita Electric Ind Co Ltd | 回路シミュレーション方法および装置 |
| US7441211B1 (en) * | 2005-05-06 | 2008-10-21 | Blaze Dfm, Inc. | Gate-length biasing for digital circuit optimization |
| JP2006329824A (ja) * | 2005-05-26 | 2006-12-07 | Matsushita Electric Ind Co Ltd | 回路シミュレーション方法 |
| US7337420B2 (en) * | 2005-07-29 | 2008-02-26 | International Business Machines Corporation | Methodology for layout-based modulation and optimization of nitride liner stress effect in compact models |
| KR100628247B1 (ko) * | 2005-09-13 | 2006-09-27 | 동부일렉트로닉스 주식회사 | 반도체 소자 |
| JP2007123442A (ja) * | 2005-10-26 | 2007-05-17 | Matsushita Electric Ind Co Ltd | 半導体回路装置、その製造方法及びそのシミュレーション方法 |
| US7716612B1 (en) * | 2005-12-29 | 2010-05-11 | Tela Innovations, Inc. | Method and system for integrated circuit optimization by using an optimized standard-cell library |
| JP4922623B2 (ja) * | 2006-02-22 | 2012-04-25 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
| US7321139B2 (en) * | 2006-05-26 | 2008-01-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Transistor layout for standard cell with optimized mechanical stress effect |
| US7761278B2 (en) * | 2007-02-12 | 2010-07-20 | International Business Machines Corporation | Semiconductor device stress modeling methodology |
| US7949985B2 (en) | 2007-06-01 | 2011-05-24 | Synopsys, Inc. | Method for compensation of process-induced performance variation in a MOSFET integrated circuit |
-
2007
- 2007-06-01 US US11/757,338 patent/US7949985B2/en not_active Expired - Fee Related
-
2008
- 2008-01-17 EP EP08713812A patent/EP2153239A4/en not_active Withdrawn
- 2008-01-17 KR KR1020097022852A patent/KR101159305B1/ko active Active
- 2008-01-17 WO PCT/US2008/051355 patent/WO2008150555A1/en not_active Ceased
- 2008-01-17 JP JP2010510379A patent/JP5261479B2/ja active Active
- 2008-01-17 CN CN200880014239A patent/CN101675348A/zh active Pending
- 2008-01-23 TW TW097102499A patent/TWI392028B/zh active
-
2011
- 2011-05-20 US US13/112,837 patent/US8219961B2/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104750904A (zh) * | 2013-12-31 | 2015-07-01 | 德州仪器公司 | 用以改进晶体管匹配的方法 |
| US10339251B2 (en) | 2013-12-31 | 2019-07-02 | Texas Instruments Incorporated | Method to improve transistor matching |
| CN104750904B (zh) * | 2013-12-31 | 2020-04-14 | 德州仪器公司 | 用以改进晶体管匹配的方法 |
| CN105740572A (zh) * | 2016-02-26 | 2016-07-06 | 联想(北京)有限公司 | 一种电子设备 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20080297237A1 (en) | 2008-12-04 |
| JP2010529649A (ja) | 2010-08-26 |
| JP5261479B2 (ja) | 2013-08-14 |
| EP2153239A4 (en) | 2011-08-17 |
| US8219961B2 (en) | 2012-07-10 |
| KR20090133129A (ko) | 2009-12-31 |
| EP2153239A1 (en) | 2010-02-17 |
| US7949985B2 (en) | 2011-05-24 |
| TWI392028B (zh) | 2013-04-01 |
| KR101159305B1 (ko) | 2012-06-25 |
| WO2008150555A1 (en) | 2008-12-11 |
| TW200849408A (en) | 2008-12-16 |
| US20110219351A1 (en) | 2011-09-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20100317 |