CN101497704A - High temperature resistant, ultra-hydrophile polystyrene porous membrane material and preparation thereof - Google Patents
High temperature resistant, ultra-hydrophile polystyrene porous membrane material and preparation thereof Download PDFInfo
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Abstract
The invention relates to a polystyrene porous membrane material with high temperature resistance and super hydrophilicity and the preparation method thereof, in particular to a polymer membranes material. The preparation method has the following steps: at least one layer of spherical or semiglobular hollow structure is evenly distributed at the surface at one side of the polystyrene membrane of which the chemical composition is purified polystyrene or block polymer containing polystyrene chain segment; water is added in a container to enable the water vapor pressure in the container to be saturated, and the container is full of saturated vapor; the polystyrene or the block polymer containing polystyrene is dissolved in carbon bisulfide solution or chloroformic solution, the prepared solution is added on to a uropatagia which is put in the container full of vapor and is sealed, and a porous membrane is obtained after the solution is completely volatilized; and the porous membrane is put in ultraviolet light for radiation, thus the polystyrene porous membrane material with high temperature resistance and super hydrophilicity is obtained.
Description
Technical field
The present invention relates to a kind of high-polymer membrane material, especially relate to a kind of high temperature resistant, ultra-hydrophile polystyrene porous membrane material and preparation method thereof.
Background technology
The type of porous-film contains extensively, because highly ordered porous polymer film is separating [1.R.E.Kersting, Syntheticpolymer membrane, Wiley, New York, 1985], organizational project [2.V.P.Shastri, I.Martin and R.Langer, Proc.Natl.Acad.Sci.U.S.A., 2000,97,1970; 3.T.Nishikawa, J.Nishida, R.Ookura, S.I.Nishimura, S.Wada, T.Karino and M.Shimomura, Mater.Sci.Eng., C, Biomim.Mater., Sens.Syst., 1999,8-9,495], photonic crystal [4.M.Imada, S.Noda, A.Chutinan, T.Tokuda, M.Murata, G.Sasaki, Appl.Phys.Lett., 1999,75,316], microelectronics [5.M.Imada, S.Noda, A.Chutinan, T.Tokuda, M.Murata and G.Sasaki, Appl.Phys.Lett., 1999,75,316], catalysis [6.A.Boker, Y.Lin, K.Chiapperini, R.Horowitz, M.Thompson, V.Carreon, T.Xu, C.Abetz, H.Skaff, A.D.Dinsmore, T.Emrick, T.P.Russell, Nat.Mater., 2004,3,302] and photomask [7.J.E.G.J.Wijnhoven and W.L.Vos, Science, 1998, the potential application in field such as 281,802] has caused the concern of height.A lot of methods that prepare the high-sequential structural membrane are disclosed, and comprise etching [8.P.T.Tanev, M.Chibwe and T.J.Pinnavaia, Nature, 1994,368,321] or soft etching [9.J.C.McDonald, D.C.Duffy, J.R.Anderson, D.T.Chiu, H.Wu, O.J.A.Schueller and G.M.Whitesides, Electrophoresis, 2000,21,27; 10.J.A.Rogers, K.E.Paul, R.J.Jackmann and G.M.Whitesides, Appl.Phys.Lett., 1997,70,2658; 11.T.W.Odom, J.C.Love, D.B.Wolfe, K.E.Pauland G.M.Whitesides, Langmuir, 2000,18,5314], gluey crystal [12.B.T.Holland, C.F.Blanford andA.Stein, Science, 1985,281,538; 13.K.M.Kulinowski, P.Jiang, H.Vaswani and V.L.Colvin, Adv.Mater., 2000,12,833; 14.S.H.Park and Y.Xia, Chem.Mater., 1998,10,1745], emulsion [15.A.Imhof and D.J.Pine, Nature, 1997,389,94], self-assembly multipolymer [16.S.A.Jenekhe and X.Chen, Science, 1999,283,372; 17.M.Lee, M.H.Park, N.K.Oh, W.C.Zin, H.T.Jung and D.K.Yoon, Angew.Chem.Int.Ed., 2004,43,6466] and microphase-separated segmented copolymer [18.T.Thurn～Albrecht, R.Steiner, J.DeRouchey, C.M.Stafford, E.Huang, M.Bal, M.Tuominen, C.J.Hawker and T.P.Russell, Adv.Mater., 2000,12,787; 19.M.Templin, A.Frank, C.A.Du, A.Leist, A.Zhang, R.Ulrich, V.Schalder and U.Wiesner, Science, 1997,278,1795; 20.A.S.Zalusky, R.Olayo～Valles, J.H.Wolf and M.A.Hillmyer, J.Am.Chem.Soc., 2002,124,12761] etc.Recently, people such as Francois [21.G.Widawski, M.Rawieso and B.Francois, Nature, 1994,369,397] have been developed a kind of simple method for preparing ordered porous membrane, promptly so-called spirogram method.In this technology, hydrophobic high polymeric solution volatilizees on matrix.Under the environment of high humidity, the gasification cooling promotes that drop condenses upon on the gas/liquid interface.These drops are absorbed in solution surface, and are stabilized.Under the effect of surperficial convection current and hot capillary force, the drop of condensation is being dispersed in the high polymeric solution by self-assembly before the cohesion each other in order.Along with solvent evaporates, superpolymer be enclosed in drop around.At last, after solvent and water are evaporated completely, honeycomb structure will be stayed on the high-polymer membrane.
In actual applications, film requires to have chemistry and thermostability.With chemical method [22.H.Yabu, M.Tanaka, K.Ijiroand M.Shimomura, Langmuir, 2003,19,6297; 23.A.S.Karikari, S.R.Williams, C.L.Heisey, A.M.Rawlett and T.E.Long, Langmuir, 2006,22,9687; 24.O.Karthaus, Y.Hashimoto, K.Kon andY.Tsuriga, Macromol.Rapid Commun., 2007,28,962] or photochemical method [25.Erdogan, L.L.Song, J.N.Wilson, J.O.Park, M.Srinivasarao and U.H.F.Bunz, J.Am.Chem.Soc., 2004,126,3678; 26.H.Yabu, M.Kojima, M.Tsubouchi, S.Onoue, M.Sugitani and M.Shimomura, Colloids Surf.A, 2006,254,284] and to carry out crosslinked to polymeric film be the means of using always with the chemistry and the thermostability that improve film.
People such as Shimomura [22] have reported by crosslinked polyimide and have prepared the polynuclear plane film, and annealing under being presented at 300 ℃, and film still keeps polynuclear plane.People such as Karthaus [24] propose, and contain the cellular porous film of poly-styracin, behind the uv-radiation photochemical crosslinking, demonstrate good stability.Recently, they [24] have reported that again high temperature through 350 ℃ of the cellular porous film abilities of the copolymer-maleic anhydride of chemically crosslinked is in the method that all are mentioned to, special crosslinkable chemical structure is indispensable. contain polymkeric substance more complicated in preparation of Photocrosslinkable functional group, the price height.
Polystyrene is a kind of cheap general-purpose plastics, bibliographical information once there was the seventies in 20th century under the irradiation of strong UV-light, in cross-linking, all right carbonylate makes the surface become hydrophilic [27.B.Ranby and J.F.Rabek, Photodegradation, Photo～Oxidation and Photostabilization of Polymers, Wiley, New York, 1975].Because polystyrene is polar functionalities not, can only form random coil in solution, be difficult to be equipped with porous-film with the spirogram legal system.At present unique one piece is that usefulness chloroform such as Han Yanchun and toluene are solvent about the report for preparing porous-film with polystyrene, relative humidity is 40%～86% o'clock, in fluidizing air, can be that 220,000 polystyrene obtains porous-film [28.J.Peng with molecular weight, Y.Hanand B.Li, Polymer, 2004,45,447].
Summary of the invention
The object of the present invention is to provide a kind of high temperature resistant, ultra-hydrophile polystyrene porous membrane material and preparation method thereof.
High temperature resistant, ultra-hydrophile polystyrene porous membrane material of the present invention is:
Side surface at polystyrene film is uniform-distribution with the spherical or hemispheric hollow structure of one deck at least.The mean diameter of described polystyrene film mesopore is 1.5～8 μ m, and porosity is 15%～80%, and hole density is 75～220/mm
2, the thickness of described polystyrene film is less than 10 μ m, and the chemical ingredients of polystyrene film is pure polystyrene or the block polymer that contains the polystyrene segment.
Described polystyrene or the block polymer that contains the polystyrene segment can be polystyrene-poly butadiene-styrene ternary block polymer, polystyrene-poly isoprene block polymkeric substance, polystyrene-poly dimethyl siloxane block polymer etc., the molecular weight of these polymkeric substance is 15,000～260,000.
Described high temperature resistant, ultra-hydrophile polystyrene porous membrane material energy organic solvent-resistant, organic solvent comprises the organic solvent of the raw material that can dissolve this polystyrene film of preparation (polystyrene or contain the block polymer of polystyrene), as chloroform, dithiocarbonic anhydride, tetrahydrofuran (THF), methylene dichloride, acetone etc.This polystyrene film not only can not dissolve in above-mentioned organic solvent, and the vesicular structure in the polystyrene film can not be damaged (as rupture, cave in, distortion etc.).This polystyrene film does not still melt mobile when being heated to 300 ℃, and the raw material (polystyrene or contain the block polymer of polystyrene) for preparing this polystyrene film just can melt below 130 ℃ fully.Moreover, the vesicular structure of this polystyrene film when being heated to 300 ℃, can not be damaged (as rupture, cave in, distortion etc.).The raw material (polystyrene or contain the block polymer of polystyrene) for preparing this polystyrene film is hydrophobic substance, and prepared this polystyrene film shows tangible water-wet behavior, and water contact angle is less than 30 °.What water contact angle characterized is the characteristic of material surface hydrophilic/hydrophobic, and contact angle is hydrophobic greater than 90 °, and contact angle is hydrophilic less than 90 °, and feeler is super hydrophilic less than 30 °.
Preparation method high temperature resistant, ultra-hydrophile polystyrene porous membrane material of the present invention may further comprise the steps:
1) in sealable container, add entry the interior water vapor pressure of container is reached capacity, must be full of the container of saturated steam;
2) polystyrene or the block polymer that contains polystyrene are dissolved in dithiocarbonic anhydride or the chloroformic solution, the solution for preparing is added on the substrate, then this substrate is placed in the step 1) in the ready container that is full of saturated steam, with this container sealing, after treating that solvent volatilizees fully, get apertured polymeric film;
3) the pore polymer film with preparation in the step 2 places under the UV-light and shines, high temperature resistant, ultra-hydrophile polystyrene porous membrane material.
In step 1), the amount that adds entry is as the criterion with the vapour pressure that can reach capacity.In step 2) in, the described solution for preparing is by mass ratio, and concentration is preferably 6～130mg/mL; Described substrate is sheet glass, silicon chip or aluminium flake etc.Described ultraviolet light wavelength is preferably 200～400nm, and the time of irradiation is preferably 2～16h, and envrionment temperature is preferably 20～32 ℃.
Film properties high temperature resistant, ultra-hydrophile polystyrene porous membrane material can detect by the following method.
With the later porous surface structure of sem observation polymers soln film forming, detect polymeric film in water contact angle (CA) and hydrophilic variation with the contact angle instrument through the UV-irradiation rear surface, temperature rise rate with 10 ℃/min in air will be heated to 300 ℃ (this method is designated hereinafter simply as thermal treatment) through the film of UV-irradiation, use the variation of its configuration of surface of sem observation then, check the thermostability of cross-linked polymer film in this way.
Description of drawings
Fig. 1 is the formed hole, dithiocarbonic anhydride solution film forming on glass substrate later polystyrene film surface of polystyrene 6mg/mL.
Fig. 2 for polystyrene porous membrane through the surface topography after UV-irradiation and the thermal treatment.
Fig. 3 is 125 ° (corresponding PS film character is hydrophobic) for the water contact angle of (a) undressed PS film; (b) contact angle through treatment with ultraviolet light 2h caudacoria is 30 ° (corresponding PS film character is super hydrophilic).
Fig. 4 is the formed hole, dithiocarbonic anhydride solution film forming on glass substrate later polystyrene film surface of polystyrene 12mg/mL.
Fig. 5 for polystyrene porous membrane through the surface topography after UV-irradiation and the thermal treatment.
Fig. 6 is 28 ° (corresponding PS film character is hydrophilic) through the water contact angle of UV-irradiation 2h caudacoria.
Fig. 7 is the formed hole, dithiocarbonic anhydride solution film forming on glass substrate later polystyrene film surface of polystyrene 38mg/mL.
Fig. 8 for polystyrene porous membrane through the surface topography after UV-irradiation and the thermal treatment.
Fig. 9 is 25 ° (corresponding PS film character is hydrophilic) through the water contact angle of UV-irradiation 2h caudacoria.
Figure 10 is the formed hole, dithiocarbonic anhydride solution film forming on glass substrate later polystyrene film surface of polystyrene 63mg/mL.
Figure 11 for polystyrene porous membrane through the surface topography after UV-irradiation and the thermal treatment.
Figure 12 is 20 ° (corresponding PS film character is hydrophilic) through the contact angle of UV-irradiation 2h caudacoria.
Figure 13 is the formed hole, dithiocarbonic anhydride solution film forming on glass substrate later polystyrene film surface of polystyrene 126mg/mL.
Figure 14 be the dithiocarbonic anhydride solution of polystyrene 38mg/mL under 4 ℃ after film forming on the glass substrate formed hole, polystyrene film surface.
Figure 15 is the formed hole, dithiocarbonic anhydride solution film forming on glass substrate later polystyrene film surface of polystyrene 13mg/mL.
Figure 16 for polystyrene porous membrane through the surface topography after UV-irradiation and the thermal treatment.
Figure 17 is 28 ° (corresponding PS film character is hydrophilic) through the contact angle of UV-irradiation 2h caudacoria.
Figure 18 is the formed hole, chloroformic solution film forming on glass substrate later polystyrene film surface of polystyrene 120mg/mL.
Figure 19 is the formed hole, chloroformic solution film forming on glass substrate later polystyrene film surface of polystyrene 60mg/mL.
Figure 20 is the formed hole, chloroformic solution film forming on glass substrate later polystyrene film surface of polystyrene 15mg/mL.
Figure 21 is the formed hole, chloroformic solution film forming on glass substrate later polystyrene film surface of SBS15mg/mL.
Figure 22 for polystyrene porous membrane through the surface topography after UV-irradiation and the thermal treatment.
Figure 23 is the formed hole, chloroformic solution film forming on glass substrate later polystyrene film surface of PSPI15mg/mL.
Figure 24 is the formed hole, chloroformic solution film forming on glass substrate later polystyrene film surface of PSPDMS45mg/mL.
Embodiment
Following examples will the present invention is further illustrated in conjunction with the accompanying drawings.
1) polystyrene homopolymer:
A) commodity polystyrene (company of Japanese Asahi Chemical Industry), number-average molecular weight is 137,000; Weight-average molecular weight is 260,000; Molecular weight distribution is that 1.88. is made into 0.5% dithiocarbonic anhydride (CS
2) solution, on sheet glass, drip film with microsyringe, treat in saturated relative humidity under the room temperature that solvent volatilizees fully after, promptly obtain vesicular structure.
Formed hole is referring to Fig. 1 after the dithiocarbonic anhydride solution film forming of polystyrene 0.5%.
After carrying out irradiation 2h with the UV-light p-poly-phenyl ethene porous-film of 254 nanometers, carry out anneal on hot platform, condition is warming up to 300 ℃ for the temperature rise rate with 10 ℃/min from room temperature, and the pattern of sample is observed with scanning electron microscope.
Surface topography after polystyrene porous membrane process ultraviolet light cross-linking and the thermal treatment is referring to Fig. 2.
Through after the treatment with ultraviolet light, the film surface of polymkeric substance becomes hydrophilicly by hydrophobic, and contact angle characterizes with contact angle measurement.
The contact angle that Fig. 3 (a) provides undressed PS film is 125 ° (hydrophobic), and the contact angle that Fig. 3 (b) provides through treatment with ultraviolet light 2h caudacoria is 30 ° (hydrophilic).
B) number-average molecular weight is 137,000, and weight-average molecular weight is 260,000, and molecular weight distribution is 1.88, is made into 1% dithiocarbonic anhydride (CS
2) solution, on sheet glass, drip film with microsyringe, treat in saturated relative humidity under the room temperature that solvent volatilizees fully after, promptly obtain vesicular structure.Formed hole is referring to Fig. 4 after the dithiocarbonic anhydride solution film forming of polystyrene 1%.
After carrying out irradiation 2h with the UV-light p-poly-phenyl ethene porous-film of 254 nanometers, carry out anneal on hot platform, condition is warming up to 300 ℃ for the temperature rise rate with 10 ℃/min from room temperature, and the pattern of sample is observed with scanning electron microscope.
Surface topography after polystyrene porous membrane process ultraviolet light cross-linking and the thermal treatment is referring to Fig. 5.
Through after the treatment with ultraviolet light, the surface of polystyrene porous membrane by hydrophobic become hydrophilic. contact angle characterizes with contact angle measurement.Fig. 6 provides 28 ° of the contact angles (hydrophilic) through treatment with ultraviolet light 2h caudacoria.
C) commodity polystyrene (company of Japanese Asahi Chemical Industry), number-average molecular weight is 137,000, and weight-average molecular weight is 260,000, and molecular weight distribution is 1.88, is made into 3% dithiocarbonic anhydride (CS
2) solution, on sheet glass, drip film with microsyringe, treat in saturated relative humidity under the room temperature that solvent volatilizees fully after, promptly obtain vesicular structure.
Formed hole is referring to Fig. 7 after the dithiocarbonic anhydride solution film forming of polystyrene 3%.
After carrying out irradiation 2h with the UV-light p-poly-phenyl ethene porous-film of 254 nanometers, carry out anneal on hot platform, condition is warming up to 300 ℃ for the temperature rise rate with 10 ℃/min from room temperature.The pattern of sample is observed with scanning electron microscope.
Surface topography after polystyrene porous membrane process ultraviolet light cross-linking and the thermal treatment is referring to Fig. 8.
Through after the treatment with ultraviolet light, the film surface of polymkeric substance becomes hydrophilicly by hydrophobic, and contact angle characterizes with contact angle measurement.
The contact angle that Fig. 9 provides through treatment with ultraviolet light 2h caudacoria is 25 ° (hydrophilic).
D) commodity polystyrene (company of Japanese Asahi Chemical Industry), number-average molecular weight is 137,000, and weight-average molecular weight is 260,000, and molecular weight distribution is 1.88, is made into 5% dithiocarbonic anhydride (CS
2) solution, on sheet glass, drip film with microsyringe, treat in saturated relative humidity under the room temperature that solvent volatilizees fully after, promptly obtain vesicular structure.
Formed hole is referring to Figure 10 after the dithiocarbonic anhydride solution film forming of polystyrene 5%.
After carrying out irradiation 2h with the UV-light p-poly-phenyl ethene porous-film of 254 nanometers, carry out anneal on hot platform, condition is warming up to 300 ℃ for the temperature rise rate with 10 ℃/min from room temperature. and the pattern of sample is observed with scanning electron microscope.
Surface topography after polystyrene porous membrane process ultraviolet light cross-linking and the thermal treatment is referring to Figure 11.
Through after the treatment with ultraviolet light, the film surface of polymkeric substance becomes hydrophilicly by hydrophobic, and contact angle characterizes with contact angle measurement.
The contact angle that Figure 12 provides through treatment with ultraviolet light 2h caudacoria is 20 ° (hydrophilic).
E) commodity polystyrene (company of Japanese Asahi Chemical Industry), number-average molecular weight is 137,000, and weight-average molecular weight is 260,000, and molecular weight distribution is 1.88, is made into 10% dithiocarbonic anhydride (CS
2) solution, on sheet glass, drip film with microsyringe, treat in saturated relative humidity under the room temperature that solvent volatilizees fully after, promptly obtain vesicular structure.
Formed hole is referring to Figure 13 after the dithiocarbonic anhydride solution film forming of polystyrene 10%.
F) commodity polystyrene (company of Japanese Asahi Chemical Industry), number-average molecular weight is 137,000, and weight-average molecular weight is 260,000, and molecular weight distribution is 1.88, is made into 3% dithiocarbonic anhydride (CS
2) solution, on sheet glass, drip film with microsyringe, treat that in saturated relative humidity solvent volatilizees fully under 4 ℃ after, promptly obtain vesicular structure.
The dithiocarbonic anhydride solution of polystyrene 3% after 4 ℃ of following film forming resulting hole referring to Figure 14.
G) commodity polystyrene (square Xinghua worker), number-average molecular weight is 114,000, and weight-average molecular weight is 215,000, and molecular weight distribution is 1.89, is made into 1% dithiocarbonic anhydride (CS
2) solution, on sheet glass, drip film with microsyringe, treat in saturated relative humidity under the room temperature that solvent volatilizees fully after, promptly obtain vesicular structure.
Formed hole is referring to Figure 15 after the dithiocarbonic anhydride solution film forming of polystyrene 1%.
After carrying out irradiation 2h with the UV-light p-poly-phenyl ethene porous-film of 254 nanometers, carry out anneal on hot platform, condition is warming up to 320 ℃ for the temperature rise rate with 10 ℃/min from room temperature, and the pattern of sample is observed with scanning electron microscope.
Surface topography after polystyrene porous membrane process ultraviolet light cross-linking and the thermal treatment is referring to Figure 16.
Through after the treatment with ultraviolet light, the film surface of polymkeric substance becomes hydrophilicly by hydrophobic, and contact angle characterizes with contact angle measurement.
The contact angle that Figure 17 provides through treatment with ultraviolet light 2h caudacoria is 28 ° (hydrophilic).
H) polystyrene, number-average molecular weight are 10,400, and weight-average molecular weight is 15,000, and molecular weight distribution is 1.47, are made into 8% chloroform (CHCl
3) solution, on sheet glass, drip film with microsyringe, treat in saturated relative humidity under the room temperature that solvent volatilizees fully after, promptly obtain vesicular structure.Formed hole is referring to Figure 18 after the chloroformic solution film forming of polystyrene 8%.
I) polystyrene, number-average molecular weight are 26,439, and weight-average molecular weight is 40,620, and molecular weight distribution is 1.47, are made into 4% chloroform (CHCl
3) solution, on sheet glass, drip film with microsyringe, treat in saturated relative humidity under the room temperature that solvent volatilizees fully after, promptly obtain vesicular structure.Formed hole is referring to Figure 19 after the chloroformic solution film forming of polystyrene 4%.
J) polystyrene, number-average molecular weight are 122,813, and weight-average molecular weight is 225,476, and molecular weight distribution is 1.84, are made into 1% chloroform (CHCl
3) solution, on sheet glass, drip film with microsyringe, treat in saturated relative humidity under the room temperature that solvent volatilizees fully after, promptly obtain vesicular structure.Formed hole is referring to Figure 20 after the chloroformic solution film forming of polystyrene 1%.
2) contain the polystyrene block polymkeric substance:
A) SBS commodity polystyrene-poly butadiene-styrene ternary block polymer (company of Japanese Asahi Chemical Industry), trade mark H1053 is made into 1% chloroform (CHCl
3) solution, on sheet glass, drip film with microsyringe, treat in saturated relative humidity under the room temperature that solvent volatilizees fully after, promptly obtain vesicular structure.Formed hole is referring to Figure 21 after the chloroformic solution film forming of SBS1%.
After with the UV-light of 254 nanometers the SBS porous-film being carried out irradiation 2h, carry out anneal on hot platform, condition is warming up to 320 ℃ for the temperature rise rate with 10 ℃/min from room temperature, and the pattern of sample is observed with scanning electron microscope.
Surface topography after polystyrene porous membrane process ultraviolet light cross-linking and the thermal treatment is referring to Figure 22.
B) PSPI commodity polystyrene-poly isoprene block polymkeric substance (Aldrich company) is made into 1% chloroform (CHCl
3) solution, on sheet glass, drip film with microsyringe, treat in saturated relative humidity under the room temperature that solvent volatilizees fully after, promptly obtain vesicular structure.Formed hole is referring to Figure 23 after the chloroformic solution film forming of PSPI 1%.
C) PSPDMS commodity polystyrene-poly dimethyl siloxane block polymer (Polym.Sour. company) is made into 3% chloroform (CHCl
3) solution, on sheet glass, drip film with microsyringe, treat in saturated relative humidity under the room temperature that solvent volatilizees fully after, promptly obtain vesicular structure.Formed hole is referring to Figure 24 after the chloroformic solution film forming of PSPDMS 3%.
Conclusion: use the spirogram method, the polymer porous film that in static environment, can obtain different molecular weight PS and contain the PS block polymer, through behind the ultraviolet light cross-linking, not only the thermotolerance of polymeric film can be brought up to 320 ℃, and the film surface also by hydrophobic become hydrophilic.
Claims (8)
1. high temperature resistant, ultra-hydrophile polystyrene porous membrane material, it is characterized in that for:
Side surface at polystyrene film is uniform-distribution with the spherical or hemispheric hollow structure of one deck at least, and the mean diameter of described polystyrene film mesopore is 1.5～8 μ m, and porosity is 15%～80%, and hole density is 75～220/mm
2, the thickness of described polystyrene film is less than 10 μ m, and the chemical ingredients of polystyrene film is pure polystyrene or the block polymer that contains the polystyrene segment.
2. a kind of high temperature resistant, ultra-hydrophile polystyrene porous membrane material as claimed in claim 1, the block polymer that it is characterized in that described polystyrene or contain the polystyrene segment is polystyrene-poly butadiene-styrene ternary block polymer, polystyrene-poly isoprene block polymkeric substance or polystyrene-poly dimethyl siloxane block polymer.
3. a kind of high temperature resistant, ultra-hydrophile polystyrene porous membrane material as claimed in claim 1, the molecular weight that it is characterized in that described polymkeric substance is 15,000～260,000.
4. the preparation method of a kind of high temperature resistant, ultra-hydrophile polystyrene porous membrane material as claimed in claim 1 is characterized in that may further comprise the steps:
1) in sealable container, add entry the interior water vapor pressure of container is reached capacity, must be full of the container of saturated steam;
2) polystyrene or the block polymer that contains polystyrene are dissolved in dithiocarbonic anhydride or the chloroformic solution, the solution for preparing is added on the substrate, then this substrate is placed in the step 1) in the ready container that is full of saturated steam, with this container sealing, after treating that solvent volatilizees fully, get apertured polymeric film;
3) the pore polymer film with preparation in the step 2 places under the UV-light and shines, high temperature resistant, ultra-hydrophile polystyrene porous membrane material.
5. the preparation method of a kind of high temperature resistant, ultra-hydrophile polystyrene porous membrane material as claimed in claim 4 is characterized in that in step 1) the amount that adds entry is as the criterion with the vapour pressure that reaches capacity.
6. the preparation method of a kind of high temperature resistant, ultra-hydrophile polystyrene porous membrane material as claimed in claim 4 is characterized in that in step 2) in, the described solution for preparing is by mass ratio, and concentration is 6～130mg/mL.
7. the preparation method of a kind of high temperature resistant, ultra-hydrophile polystyrene porous membrane material as claimed in claim 4 is characterized in that described substrate is sheet glass, silicon chip or aluminium flake.
8. the preparation method of a kind of high temperature resistant, ultra-hydrophile polystyrene porous membrane material as claimed in claim 4 is characterized in that described ultraviolet light wavelength is 200～400nm, and the time of irradiation is 2～16h, and envrionment temperature is 20～32 ℃.
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| CN103411951A (en) * | 2013-07-17 | 2013-11-27 | 浙江大学 | Preparation method of surface enhanced Raman scattering substrate based on spirogram ordered porous membrane |
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| CN103071398A (en) * | 2013-02-22 | 2013-05-01 | 厦门大学 | Porous polymer membrane with perforated structure and preparation method and application thereof |
| CN103411951A (en) * | 2013-07-17 | 2013-11-27 | 浙江大学 | Preparation method of surface enhanced Raman scattering substrate based on spirogram ordered porous membrane |
| CN107106995A (en) * | 2014-10-30 | 2017-08-29 | Nok株式会社 | Carbon film film stoste and the preparation method using its carbon hollow-fibre membrane |
| CN104630876A (en) * | 2015-02-13 | 2015-05-20 | 厦门大学 | Method for preparing anisotropic photonic crystal |
| CN107096390A (en) * | 2017-05-17 | 2017-08-29 | 四川理工学院 | A kind of preparation method of modified copolymer perforated membrane |
| CN107096390B (en) * | 2017-05-17 | 2019-12-06 | 四川理工学院 | preparation method of modified copolymer porous membrane |
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| CN112962222A (en) * | 2021-02-01 | 2021-06-15 | 山东恒鹏卫生用品有限公司 | High-temperature-resistant hydrophilic coated non-woven fabric and preparation method thereof |
| CN113363392A (en) * | 2021-05-31 | 2021-09-07 | 上海大学 | Preparation method of PDMS (polydimethylsiloxane) wrinkled seal and organic solar cell |
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