CN101430394B - 衍射光学元件 - Google Patents
衍射光学元件 Download PDFInfo
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- CN101430394B CN101430394B CN2007102023794A CN200710202379A CN101430394B CN 101430394 B CN101430394 B CN 101430394B CN 2007102023794 A CN2007102023794 A CN 2007102023794A CN 200710202379 A CN200710202379 A CN 200710202379A CN 101430394 B CN101430394 B CN 101430394B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49616—Structural member making
- Y10T29/4962—Grille making
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/4998—Combined manufacture including applying or shaping of fluent material
- Y10T29/49982—Coating
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49995—Shaping one-piece blank by removing material
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- Manufacturing & Machinery (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
技术领域
本发明涉及一种光学元件,尤其是一种衍射光学元件。
背景技术
近年来,衍射光栅在工业生产和科学技术的发展中起着越来越大的作用。首先,作为色散元件广泛用于光谱分析,是分析物质成分、探索宇宙奥秘、开发大自然的必需仪器。其次,衍射光栅大量用于激光器,对激光器输出光谱进行选择、调谐和扩束,促使激光技术的发展。在集成光学和光通讯方面,衍射光栅是合适的光耦合元件。由于衍射光栅的重要作用推动可自身的发展。
目前。衍射光栅的制造方法主要可以分为两种:
1)利用光栅刻划机在光栅基底刻划出具有周期结构的刻槽,这种光栅称为机械刻划式光栅;
2)利用激光干涉技术,将涂覆在基底上的光致刻蚀剂曝光并显影,在光栅基底上形成具有周期结构的刻槽,或者进而利用离子束轰击刻槽使之成为闪耀光栅,增强光栅的衍射效率,这种光栅称为全息光栅(参见formation ofholographic diffraction gratings in photoresist,apply physicist,1981,A26,P143~149)或者全息离子刻蚀光栅。
采用上述方法得的光栅一般为单面结构,经过该光栅的光束不能有空间低频变换成空间高频。
但是,由于机械加工精度、装调精度、控制精度等因素的限制,机械刻划式光栅仍存在一些残余误差,在光栅的谱面上还可以产生强度可观的各种鬼线,影响光栅在高精度光谱仪器中的应用,而且光栅刻划机的制造成本高、光栅刻划周期长、对周围环境的要求苛刻,正是由于这些因素限制了机械刻划式光栅的应用范围。
激光干涉技术制造光栅时,需要光栅基底的表面上涂胶。均匀的光刻胶涂层是得到高质量光栅必不可少的条件之一。不同的光栅基底需要采用不同的方法涂胶:尺寸和重量较小的光栅基底,可以采用高速离心机利用立新法将光刻胶均匀涂在光栅基底表面上;尺寸和重量较大的光栅基底采用浸入法将光刻胶涂在光栅基底表面上,将光栅基底浸入盛满光刻胶溶液的容器中,然后缓慢地、匀速地将其拉出。
采用离心法和浸入法涂布光刻胶时,不可避免地使得光刻胶涂层存在缺陷、污染及光刻胶溶液不均匀等问题,从而影响光栅刻槽的质量。
发明内容
有鉴于此,提供一种可以将空间低频变换为空间高频的衍射光学元件实为必要。
一种衍射光学元件,其包括一个基片,所述基片一面具有第一光栅结构,所述第一光栅结构具有第一周期的第一刻槽,所述基片的另一面具有第二光栅结构,所述第二光栅结构具有第二周期的第二刻槽,所述第一光栅结构和第二光栅结构用于将空间低频光线调制为空间高频光线,所述第一光栅结构的槽轮廓的结构函数为.f1(x),所述第二光栅结构的槽轮廓的结构函数为f2(x),其中,d1为所述第一光栅结构的周期,λ1为入射光波长,α1为两相干光束夹角的一半,n1为折射率,d2为所述第二光栅结构的周期,λ2为入射光波长,n2为折射率,α2为两相干光束夹角的一半。
与现有技术相比,光束通过所述衍射光学元件的第一光栅结构、第二光栅结构时分别被调制,可由空间低频调制成空间高频。
附图说明
图1是本发明实施例衍射光学元件结构示意图。
具体实施方式
如图1所示,本实施例衍射光学元件10包括基片12、第一光栅结构14和第二光栅结构16。
第一光栅结构14的周期为d1,其包括若干第一刻槽140。第二光栅结构16的周期为d2,其包括若干第二刻槽160。第一刻槽140的宽度记为w1、第二刻槽160的宽度记为w2,二者关系为:w1=w2、w1<w2、或者w1>w2。
周期d1与d2的关系为:d1=d2、d1<d2、或者d1>d2。
当d1≠d2,二者的差值小于等于5微米(μm)。
当d1=d2,第一刻槽140与第二刻槽160可以间隔分布,即第一刻槽140的起点与第二刻槽160的起点不同。
当然,第一刻槽140与第二刻槽160也可以对齐分布,即第一刻槽140的起点与第二刻槽160的起点相同。
由于两束记录光在干涉场中所形成干涉条纹的光强近似正弦分布,显影后的光栅如不经特殊处理,光栅的刻槽形状也为近似正弦形状,因此,第一光栅结构14的槽轮廓可用周期为d1的函数f1(x)来描写:
y=f1(x)=tgθ·x
f1(x)为奇函数,可展开为傅里叶正弦级数:
因此,f1(x)可写成:
由式(1)可知,如果能取更多的级数项,那么合成的曲线越接近函数f1(x),也就是合成精度越高。但是,从制造角度来看,则希望取较少的项数来满足一定合成精度的要求。为寻求最优的解,可适当修正式(1)的振幅或者相位。本实施例中f1(x)取级数中的前三项且振幅不变:
同理,第二光栅结构16的槽轮廓可用f2(x)表示:
本实施例中f2(x)取级数中的前三项且振幅不变:
如果在空气中,n1=1,则
当一束空间频率为f的光线照射至衍射光学元件10上时,假由有第一光栅结构14入射至第二光栅结构16,其首先被第一光栅结构14调制而具有f+f1的频率,然后,被调制以后的光线被第二光栅结构16调制从而具有f+f1+f2的频率,由此可见,空间低频的光线经过衍射光学元件10后被调制为具有空间高频的光线。
在制造衍射光学元件10时,采用快速刀具伺服系统(fast tool servosystem,简称FTS系统)加工第一光栅结构14和第二光栅结构16。
将f1(x)输入FTS系统中,刀具在f1(x)的控制下在基片10的一面加工出第一光栅结构14;然后,将f2(x)输入FTS系统中,刀具在f2(x)的控制下在基片10的另一面加工出第二光栅结构16。
如果,第一光栅结构14与第二光栅结构16的凹槽相互错开,则在加工第二光栅结构16时,首先使FTS系统的刀具发生一定偏移量,然后在f2(x)的控制下加工第二光栅结构16。
FTS系统可采用压电陶瓷驱动刀具的运动。
当然,也可以在基片10的相对两面涂布镍合金薄膜后,再行加工第一光栅结构14和第二光栅结构16。
可以理解的是,对于本领域的普通技术人员来说,可以根据本发明的技术方案和技术构思做出其他各种相应的改变和变形,而所有这些改变和变形都应属于本发明权利要求的保护范围。
Claims (7)
2.如权利要求1所述的衍射光学元件,其特征在于:所述第一周期等于第二周期。
3.如权利要求2所述的衍射光学元件,其特征在于:所述第一刻槽与第二刻槽交错排布。
4.如权利要求2所述的衍射光学元件,其特征在于:所述第一刻槽与第二刻槽对齐排布。
5.如权利要求1所述的衍射光学元件,其特征在于:所述第一周期大于或者小于第二周期。
6.如权利要求5所述的衍射光学元件,其特征在于:所述第一周期与第二周期之差小于等于5微米。
7.如权利要求2或5所述的衍射光学元件,其特征在于:所述第一刻槽的宽度等于、大于或小于所述第二刻槽的宽度。
Priority Applications (3)
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CN2007102023794A CN101430394B (zh) | 2007-11-05 | 2007-11-05 | 衍射光学元件 |
US12/192,031 US8254028B2 (en) | 2007-11-05 | 2008-08-14 | Diffraction grating structure and method for manufacturing same |
US13/537,067 US8804244B2 (en) | 2007-11-05 | 2012-06-29 | Method for manufacturing diffraction grating |
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CN2007102023794A CN101430394B (zh) | 2007-11-05 | 2007-11-05 | 衍射光学元件 |
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CN101430394B true CN101430394B (zh) | 2011-03-23 |
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Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102305953B (zh) * | 2011-09-08 | 2013-04-17 | 苏州大学 | 一种低频光栅及其制备方法 |
US20130312811A1 (en) * | 2012-05-02 | 2013-11-28 | Prism Solar Technologies Incorporated | Non-latitude and vertically mounted solar energy concentrators |
FI125270B (en) * | 2012-09-20 | 2015-08-14 | Teknologian Tutkimuskeskus Vtt Oy | Optical device with diffractive grating |
CN104459855A (zh) * | 2013-09-22 | 2015-03-25 | 清华大学 | 金属光栅的制备方法 |
KR102395781B1 (ko) * | 2017-03-24 | 2022-05-09 | 삼성전자주식회사 | 서브 파장 이중 격자를 포함하는 광학 필터 및 분광기 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4012843A (en) * | 1973-04-25 | 1977-03-22 | Hitachi, Ltd. | Concave diffraction grating and a manufacturing method thereof |
US5258871A (en) * | 1992-06-01 | 1993-11-02 | Eastman Kodak Company | Dual diffraction grating beam splitter |
EP0683404A1 (en) * | 1994-04-08 | 1995-11-22 | Enea Ente Per Le Nuove Tecnologie, L'energia E L'ambiente | Method and apparatus for producing diffraction gratings by machine forming in a fast operation cycle |
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US5029154A (en) * | 1988-11-21 | 1991-07-02 | Ricoh Company, Ltd. | Optical reproducing apparatus |
US6884961B1 (en) * | 2000-08-24 | 2005-04-26 | Uc Laser Ltd. | Intravolume diffractive optical elements |
JP2005174700A (ja) * | 2003-12-10 | 2005-06-30 | Toyota Industries Corp | 電界発光デバイス |
US7628100B2 (en) * | 2007-01-05 | 2009-12-08 | 3M Innovative Properties Company | Cutting tool using one or more machined tool tips with diffractive features in a continuous or interrupted cut fast tool servo |
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2007
- 2007-11-05 CN CN2007102023794A patent/CN101430394B/zh not_active Expired - Fee Related
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2008
- 2008-08-14 US US12/192,031 patent/US8254028B2/en not_active Expired - Fee Related
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2012
- 2012-06-29 US US13/537,067 patent/US8804244B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4012843A (en) * | 1973-04-25 | 1977-03-22 | Hitachi, Ltd. | Concave diffraction grating and a manufacturing method thereof |
US5258871A (en) * | 1992-06-01 | 1993-11-02 | Eastman Kodak Company | Dual diffraction grating beam splitter |
EP0683404A1 (en) * | 1994-04-08 | 1995-11-22 | Enea Ente Per Le Nuove Tecnologie, L'energia E L'ambiente | Method and apparatus for producing diffraction gratings by machine forming in a fast operation cycle |
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US8804244B2 (en) | 2014-08-12 |
CN101430394A (zh) | 2009-05-13 |
US8254028B2 (en) | 2012-08-28 |
US20120266448A1 (en) | 2012-10-25 |
US20090116110A1 (en) | 2009-05-07 |
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