CN101395537B - 感光性有机膜用显影液组合物 - Google Patents

感光性有机膜用显影液组合物 Download PDF

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Publication number
CN101395537B
CN101395537B CN2007800071927A CN200780007192A CN101395537B CN 101395537 B CN101395537 B CN 101395537B CN 2007800071927 A CN2007800071927 A CN 2007800071927A CN 200780007192 A CN200780007192 A CN 200780007192A CN 101395537 B CN101395537 B CN 101395537B
Authority
CN
China
Prior art keywords
composition
organic film
weight
photosensitive organic
photoresist
Prior art date
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Active
Application number
CN2007800071927A
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English (en)
Chinese (zh)
Other versions
CN101395537A (zh
Inventor
安江秀国
西岛佳孝
城户秀作
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tianma Japan Ltd
Original Assignee
Nagase Chemtex Corp
NEC LCD Technologies Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nagase Chemtex Corp, NEC LCD Technologies Ltd filed Critical Nagase Chemtex Corp
Publication of CN101395537A publication Critical patent/CN101395537A/zh
Application granted granted Critical
Publication of CN101395537B publication Critical patent/CN101395537B/zh
Active legal-status Critical Current
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
CN2007800071927A 2006-03-01 2007-02-27 感光性有机膜用显影液组合物 Active CN101395537B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP054823/2006 2006-03-01
JP2006054823 2006-03-01
PCT/JP2007/053568 WO2007099925A1 (ja) 2006-03-01 2007-02-27 感光性有機膜用現像液組成物

Publications (2)

Publication Number Publication Date
CN101395537A CN101395537A (zh) 2009-03-25
CN101395537B true CN101395537B (zh) 2011-12-21

Family

ID=38459031

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2007800071927A Active CN101395537B (zh) 2006-03-01 2007-02-27 感光性有机膜用显影液组合物

Country Status (5)

Country Link
JP (1) JP4850237B2 (ja)
KR (1) KR20080098369A (ja)
CN (1) CN101395537B (ja)
TW (1) TW200805003A (ja)
WO (1) WO2007099925A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007273826A (ja) * 2006-03-31 2007-10-18 Tokyo Electron Ltd リフロー方法、パターン形成方法および液晶表示装置用ｔｆｔ素子の製造方法
US8754005B2 (en) * 2012-08-28 2014-06-17 Kimberly-Clark Worldwide, Inc. Color-changing composition and material

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1501179A (zh) * 2002-10-10 2004-06-02 ͬ�Ϳ�ҵ��ʽ���� 光刻法用洗涤液和基板的处理方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3417432B2 (ja) * 1994-12-08 2003-06-16 東京応化工業株式会社 レジスト用現像液組成物
JP3832813B2 (ja) * 2001-11-30 2006-10-11 富士写真フイルム株式会社 感赤外線感光性組成物
JP4143808B2 (ja) * 2002-05-09 2008-09-03 三菱瓦斯化学株式会社 レジスト用現像液組成物
JP4810076B2 (ja) * 2003-09-18 2011-11-09 日本電気株式会社 基板処理方法及びそれに用いる薬液
JP2005159294A (ja) * 2003-09-18 2005-06-16 Nec Kagoshima Ltd 基板処理方法及びそれに用いる薬液
JP4369255B2 (ja) * 2004-01-22 2009-11-18 株式会社パーカーコーポレーション レジスト現像液および当該レジスト現像液を用いた半導体装置の製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1501179A (zh) * 2002-10-10 2004-06-02 ͬ�Ϳ�ҵ��ʽ���� 光刻法用洗涤液和基板的处理方法

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
JP昭58-108230A 1983.06.28
JP特开2004-151677A 2004.05.27
JP特开2005-208329A 2005.08.04

Also Published As

Publication number Publication date
JPWO2007099925A1 (ja) 2009-07-16
TW200805003A (en) 2008-01-16
KR20080098369A (ko) 2008-11-07
WO2007099925A1 (ja) 2007-09-07
CN101395537A (zh) 2009-03-25
JP4850237B2 (ja) 2012-01-11

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Owner name: NLT TECHNOLOGIES, LTD.

Free format text: FORMER OWNER: NAGASE CHEMTEX CORP.

Effective date: 20150312

Free format text: FORMER OWNER: NLT TECHNOLOGIES, LTD.

Effective date: 20150312

C41 Transfer of patent application or patent right or utility model
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CP01 Change in the name or title of a patent holder

Address after: Kanagawa

Patentee after: NLT TECHNOLOGIES, Ltd.

Address before: Kanagawa

Patentee before: Nec Lcd Technologies Ltd.

TR01 Transfer of patent right

Effective date of registration: 20150312

Address after: Kanagawa

Patentee after: Nec Lcd Technologies Ltd.

Address before: Osaka

Patentee before: Nagase Chemtex Corp.

Patentee before: Nec Lcd Technologies Ltd.